EP2903026A4 - Radiation detection element and radiograph detection device - Google Patents
Radiation detection element and radiograph detection deviceInfo
- Publication number
- EP2903026A4 EP2903026A4 EP13840886.9A EP13840886A EP2903026A4 EP 2903026 A4 EP2903026 A4 EP 2903026A4 EP 13840886 A EP13840886 A EP 13840886A EP 2903026 A4 EP2903026 A4 EP 2903026A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- radiograph
- detection device
- radiation
- detection element
- radiation detection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000001514 detection method Methods 0.000 title 2
- 230000005855 radiation Effects 0.000 title 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
- G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
- G01T1/16—Measuring radiation intensity
- G01T1/24—Measuring radiation intensity with semiconductor detectors
- G01T1/241—Electrode arrangements, e.g. continuous or parallel strips or the like
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
- G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
- G01T1/16—Measuring radiation intensity
- G01T1/24—Measuring radiation intensity with semiconductor detectors
- G01T1/247—Detector read-out circuitry
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14603—Special geometry or disposition of pixel-elements, address-lines or gate-electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14603—Special geometry or disposition of pixel-elements, address-lines or gate-electrodes
- H01L27/14605—Structural or functional details relating to the position of the pixel elements, e.g. smaller pixel elements in the center of the imager compared to pixel elements at the periphery
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14632—Wafer-level processed structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14665—Imagers using a photoconductor layer
- H01L27/14676—X-ray, gamma-ray or corpuscular radiation imagers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
- H01L31/0264—Inorganic materials
- H01L31/0272—Selenium or tellurium
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
- H01L31/085—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors the device being sensitive to very short wavelength, e.g. X-ray, Gamma-rays
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14643—Photodiode arrays; MOS imagers
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- Health & Medical Sciences (AREA)
- Molecular Biology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- High Energy & Nuclear Physics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Toxicology (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Measurement Of Radiation (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
- Apparatus For Radiation Diagnosis (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012218426 | 2012-09-28 | ||
PCT/JP2013/076421 WO2014051118A1 (en) | 2012-09-28 | 2013-09-27 | Radiation detection element and radiograph detection device |
Publications (3)
Publication Number | Publication Date |
---|---|
EP2903026A1 EP2903026A1 (en) | 2015-08-05 |
EP2903026A4 true EP2903026A4 (en) | 2016-05-11 |
EP2903026B1 EP2903026B1 (en) | 2017-10-25 |
Family
ID=50388507
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP13840886.9A Active EP2903026B1 (en) | 2012-09-28 | 2013-09-27 | Radiation detection element and radiograph detection device |
Country Status (6)
Country | Link |
---|---|
US (1) | US9651685B2 (en) |
EP (1) | EP2903026B1 (en) |
JP (1) | JP5770945B2 (en) |
CN (1) | CN104685629B (en) |
TW (1) | TWI655755B (en) |
WO (1) | WO2014051118A1 (en) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6138754B2 (en) * | 2014-03-03 | 2017-05-31 | 富士フイルム株式会社 | Radiographic imaging system, radiographic imaging device, radiographic imaging device control method, and radiographic imaging device control program |
KR102347817B1 (en) * | 2015-07-02 | 2022-01-10 | 삼성디스플레이 주식회사 | Display apparatus |
JP2017098830A (en) * | 2015-11-26 | 2017-06-01 | キヤノン株式会社 | Radiation imaging device, radiation imaging system, and manufacturing method of radiation imaging device |
WO2018123907A1 (en) * | 2016-12-27 | 2018-07-05 | シャープ株式会社 | Imaging panel and production method for same |
CN107507843B (en) * | 2017-06-05 | 2020-05-08 | 上海奕瑞光电子科技股份有限公司 | Pixel structure and X-ray image sensor |
EP3699613A1 (en) * | 2017-10-18 | 2020-08-26 | Sony Semiconductor Solutions Corporation | Charge detection sensor and potential measuring system |
CN109087927B (en) * | 2018-08-15 | 2021-01-29 | 京东方科技集团股份有限公司 | Array substrate, X-ray detection panel and X-ray detection device |
US11353759B2 (en) * | 2018-09-17 | 2022-06-07 | Nuclera Nucleics Ltd. | Backplanes with hexagonal and triangular electrodes |
KR102659426B1 (en) * | 2018-12-27 | 2024-04-19 | 엘지디스플레이 주식회사 | Digital x-ray detector |
CN110324548B (en) * | 2019-06-27 | 2021-11-09 | Oppo广东移动通信有限公司 | Pixel unit circuit, signal processing method and storage medium |
FR3117268B1 (en) * | 2020-12-08 | 2022-12-09 | St Microelectronics Crolles 2 Sas | Pixel of a light sensor and method of manufacturing the same |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003255049A (en) * | 2002-03-06 | 2003-09-10 | Canon Inc | Light-detecting apparatus and radiation-detecting apparatus |
US20070177044A1 (en) * | 2006-01-27 | 2007-08-02 | Shunsuke Maruyama | Solid-state image pickup device |
US20110121189A1 (en) * | 2009-11-20 | 2011-05-26 | Fujifilm Corporation | Radiation detector |
US20110174957A1 (en) * | 2010-01-15 | 2011-07-21 | Fujifilm Corporation | Radiation detection element |
EP2743986A1 (en) * | 2011-08-12 | 2014-06-18 | FUJIFILM Corporation | Radiation detection element, radiograph detection panel, and radiograph detection device |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4264251B2 (en) * | 2002-12-09 | 2009-05-13 | 富士フイルム株式会社 | Solid-state imaging device and operation method thereof |
JP5043380B2 (en) * | 2005-07-25 | 2012-10-10 | キヤノン株式会社 | Radiation detection apparatus and radiation detection system |
JP4832034B2 (en) * | 2005-09-14 | 2011-12-07 | 富士フイルム株式会社 | MOS image sensor |
US7880787B2 (en) | 2005-09-14 | 2011-02-01 | Fujifilm Corporation | MOS image sensor |
JP2007081139A (en) * | 2005-09-14 | 2007-03-29 | Fujifilm Corp | Mos image sensor |
US20100059753A1 (en) * | 2006-06-16 | 2010-03-11 | Silk Displays | Matrix electronic devices using opaque substrates and fabrication method therefor |
US7965326B2 (en) * | 2006-09-27 | 2011-06-21 | Fujifilm Corporation | Semiconductor element, method of driving semiconductor element and solid imaging apparatus |
JP2008198910A (en) * | 2007-02-15 | 2008-08-28 | Fujifilm Corp | Radiation image detection device and its manufacturing method |
JP2013068472A (en) * | 2011-09-21 | 2013-04-18 | Fujifilm Corp | Radiation detection element, radiation image detection panel, and radiation image imaging apparatus |
-
2013
- 2013-09-27 CN CN201380049999.2A patent/CN104685629B/en active Active
- 2013-09-27 JP JP2014538660A patent/JP5770945B2/en active Active
- 2013-09-27 TW TW102135035A patent/TWI655755B/en active
- 2013-09-27 WO PCT/JP2013/076421 patent/WO2014051118A1/en active Application Filing
- 2013-09-27 EP EP13840886.9A patent/EP2903026B1/en active Active
-
2015
- 2015-03-16 US US14/658,249 patent/US9651685B2/en active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003255049A (en) * | 2002-03-06 | 2003-09-10 | Canon Inc | Light-detecting apparatus and radiation-detecting apparatus |
US20070177044A1 (en) * | 2006-01-27 | 2007-08-02 | Shunsuke Maruyama | Solid-state image pickup device |
US20110121189A1 (en) * | 2009-11-20 | 2011-05-26 | Fujifilm Corporation | Radiation detector |
US20110174957A1 (en) * | 2010-01-15 | 2011-07-21 | Fujifilm Corporation | Radiation detection element |
EP2743986A1 (en) * | 2011-08-12 | 2014-06-18 | FUJIFILM Corporation | Radiation detection element, radiograph detection panel, and radiograph detection device |
Non-Patent Citations (1)
Title |
---|
See also references of WO2014051118A1 * |
Also Published As
Publication number | Publication date |
---|---|
TW201419510A (en) | 2014-05-16 |
EP2903026B1 (en) | 2017-10-25 |
JP5770945B2 (en) | 2015-08-26 |
TWI655755B (en) | 2019-04-01 |
US20160178763A1 (en) | 2016-06-23 |
JPWO2014051118A1 (en) | 2016-08-25 |
WO2014051118A1 (en) | 2014-04-03 |
US9651685B2 (en) | 2017-05-16 |
EP2903026A1 (en) | 2015-08-05 |
CN104685629B (en) | 2016-04-06 |
CN104685629A (en) | 2015-06-03 |
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