EP2897767A4 - Incorporating additives into fixed abrasive webs for improved cmp performance - Google Patents
Incorporating additives into fixed abrasive webs for improved cmp performanceInfo
- Publication number
- EP2897767A4 EP2897767A4 EP13838975.4A EP13838975A EP2897767A4 EP 2897767 A4 EP2897767 A4 EP 2897767A4 EP 13838975 A EP13838975 A EP 13838975A EP 2897767 A4 EP2897767 A4 EP 2897767A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- fixed abrasive
- incorporating additives
- cmp performance
- improved cmp
- abrasive webs
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000000654 additive Substances 0.000 title 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
- B24B37/245—Pads with fixed abrasives
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
- B24D3/34—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents characterised by additives enhancing special physical properties, e.g. wear resistance, electric conductivity, self-cleaning properties
- B24D3/342—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents characterised by additives enhancing special physical properties, e.g. wear resistance, electric conductivity, self-cleaning properties incorporated in the bonding agent
- B24D3/344—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents characterised by additives enhancing special physical properties, e.g. wear resistance, electric conductivity, self-cleaning properties incorporated in the bonding agent the bonding agent being organic
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1436—Composite particles, e.g. coated particles
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/31051—Planarisation of the insulating layers
- H01L21/31053—Planarisation of the insulating layers involving a dielectric removal step
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Composite Materials (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Polishing Bodies And Polishing Tools (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201261703815P | 2012-09-21 | 2012-09-21 | |
PCT/US2013/060022 WO2014047014A1 (en) | 2012-09-21 | 2013-09-17 | Incorporating additives into fixed abrasive webs for improved cmp performance |
Publications (2)
Publication Number | Publication Date |
---|---|
EP2897767A1 EP2897767A1 (en) | 2015-07-29 |
EP2897767A4 true EP2897767A4 (en) | 2016-07-27 |
Family
ID=50341881
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP13838975.4A Withdrawn EP2897767A4 (en) | 2012-09-21 | 2013-09-17 | Incorporating additives into fixed abrasive webs for improved cmp performance |
Country Status (8)
Country | Link |
---|---|
US (1) | US20150217424A1 (en) |
EP (1) | EP2897767A4 (en) |
JP (1) | JP2015532895A (en) |
KR (1) | KR20150058302A (en) |
CN (1) | CN104822495A (en) |
SG (1) | SG11201502225XA (en) |
TW (1) | TW201420706A (en) |
WO (1) | WO2014047014A1 (en) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9649741B2 (en) * | 2014-07-07 | 2017-05-16 | Jh Rhodes Company, Inc. | Polishing material for polishing hard surfaces, media including the material, and methods of forming and using same |
US9873180B2 (en) | 2014-10-17 | 2018-01-23 | Applied Materials, Inc. | CMP pad construction with composite material properties using additive manufacturing processes |
US10875153B2 (en) | 2014-10-17 | 2020-12-29 | Applied Materials, Inc. | Advanced polishing pad materials and formulations |
US11745302B2 (en) | 2014-10-17 | 2023-09-05 | Applied Materials, Inc. | Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing process |
KR20240015161A (en) * | 2016-01-19 | 2024-02-02 | 어플라이드 머티어리얼스, 인코포레이티드 | Porous chemical mechanical polishing pads |
CN106947396B (en) * | 2017-03-23 | 2019-02-26 | 河南联合精密材料股份有限公司 | Lapping liquid suspension system, lapping liquid and preparation method thereof |
CN109251678A (en) * | 2017-07-13 | 2019-01-22 | 安集微电子科技(上海)股份有限公司 | A kind of chemical mechanical polishing liquid |
CN108747876B (en) * | 2018-06-11 | 2021-03-19 | 河北思瑞恩新材料科技有限公司 | Preparation method of paint surface grinding sand disc |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20090176443A1 (en) * | 2006-12-22 | 2009-07-09 | Kollodge Jeffrey S | Structured fixed abrasive articles including surface treated nano-ceria filler, and method for making and using the same |
US20120094487A1 (en) * | 1997-04-30 | 2012-04-19 | 3M Innovative Properties Company | Compositions and methods for modifying a surface suited for semiconductor fabrication |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100571892B1 (en) * | 1997-04-30 | 2006-04-18 | 미네소타 마이닝 앤드 매뉴팩춰링 캄파니 | Method of Planarizing the Upper Surface of a Semiconductor Wafer |
US6121143A (en) * | 1997-09-19 | 2000-09-19 | 3M Innovative Properties Company | Abrasive articles comprising a fluorochemical agent for wafer surface modification |
US20030176151A1 (en) * | 2002-02-12 | 2003-09-18 | Applied Materials, Inc. | STI polish enhancement using fixed abrasives with amino acid additives |
CN1886232A (en) * | 2003-11-26 | 2006-12-27 | 3M创新有限公司 | Method of abrading a workpiece |
US7435162B2 (en) * | 2005-10-24 | 2008-10-14 | 3M Innovative Properties Company | Polishing fluids and methods for CMP |
US8591764B2 (en) * | 2006-12-20 | 2013-11-26 | 3M Innovative Properties Company | Chemical mechanical planarization composition, system, and method of use |
EP2217670A4 (en) * | 2007-10-31 | 2011-07-13 | 3M Innovative Properties Co | Composition, method and process for polishing a wafer |
JP5351967B2 (en) * | 2008-08-28 | 2013-11-27 | スリーエム イノベイティブ プロパティズ カンパニー | Structured abrasive article, method for its manufacture, and use in wafer planarization |
SG10201401549SA (en) * | 2009-06-22 | 2014-06-27 | Cabot Microelectronics Corp | CMP Compositions And Methods For Suppressing Polysilicon Removal Rates |
US8348723B2 (en) * | 2009-09-16 | 2013-01-08 | 3M Innovative Properties Company | Structured abrasive article and method of using the same |
SG185523A1 (en) * | 2010-05-11 | 2012-12-28 | 3M Innovative Properties Co | Fixed abrasive pad with surfactant for chemical mechanical planarization |
US8723046B2 (en) * | 2010-06-22 | 2014-05-13 | Nissha Printing Co., Ltd. | Narrow frame touch input sheet with good anticorrosion property and manufacturing method thereof |
EP3851248B1 (en) * | 2011-12-30 | 2024-04-03 | Saint-Gobain Ceramics & Plastics, Inc. | Composite shaped abrasive particles and method of forming same |
-
2013
- 2013-09-17 SG SG11201502225XA patent/SG11201502225XA/en unknown
- 2013-09-17 EP EP13838975.4A patent/EP2897767A4/en not_active Withdrawn
- 2013-09-17 WO PCT/US2013/060022 patent/WO2014047014A1/en active Application Filing
- 2013-09-17 CN CN201380049086.0A patent/CN104822495A/en active Pending
- 2013-09-17 JP JP2015533125A patent/JP2015532895A/en active Pending
- 2013-09-17 US US14/425,697 patent/US20150217424A1/en not_active Abandoned
- 2013-09-17 KR KR1020157009287A patent/KR20150058302A/en not_active Application Discontinuation
- 2013-09-18 TW TW102133978A patent/TW201420706A/en unknown
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20120094487A1 (en) * | 1997-04-30 | 2012-04-19 | 3M Innovative Properties Company | Compositions and methods for modifying a surface suited for semiconductor fabrication |
US20090176443A1 (en) * | 2006-12-22 | 2009-07-09 | Kollodge Jeffrey S | Structured fixed abrasive articles including surface treated nano-ceria filler, and method for making and using the same |
Non-Patent Citations (1)
Title |
---|
See also references of WO2014047014A1 * |
Also Published As
Publication number | Publication date |
---|---|
US20150217424A1 (en) | 2015-08-06 |
EP2897767A1 (en) | 2015-07-29 |
JP2015532895A (en) | 2015-11-16 |
WO2014047014A1 (en) | 2014-03-27 |
KR20150058302A (en) | 2015-05-28 |
CN104822495A (en) | 2015-08-05 |
SG11201502225XA (en) | 2015-05-28 |
TW201420706A (en) | 2014-06-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 20150309 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR |
|
AX | Request for extension of the european patent |
Extension state: BA ME |
|
DAX | Request for extension of the european patent (deleted) | ||
RA4 | Supplementary search report drawn up and despatched (corrected) |
Effective date: 20160623 |
|
RIC1 | Information provided on ipc code assigned before grant |
Ipc: C09C 1/68 20060101ALI20160617BHEP Ipc: C09K 3/14 20060101ALI20160617BHEP Ipc: B24D 3/34 20060101AFI20160617BHEP |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION HAS BEEN WITHDRAWN |
|
18W | Application withdrawn |
Effective date: 20190605 |