EP2784600A2 - Herstellungsverfahren eines mikromechanischen Bauteils, das im wesentlichen eben ist, und mikromechanisches Bauteil, das mindestens einen Teil aus Siliziumoxid umfasst - Google Patents

Herstellungsverfahren eines mikromechanischen Bauteils, das im wesentlichen eben ist, und mikromechanisches Bauteil, das mindestens einen Teil aus Siliziumoxid umfasst Download PDF

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Publication number
EP2784600A2
EP2784600A2 EP14162203.5A EP14162203A EP2784600A2 EP 2784600 A2 EP2784600 A2 EP 2784600A2 EP 14162203 A EP14162203 A EP 14162203A EP 2784600 A2 EP2784600 A2 EP 2784600A2
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EP
European Patent Office
Prior art keywords
channels
walls
micromechanical component
cellular structure
silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP14162203.5A
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English (en)
French (fr)
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EP2784600A3 (de
Inventor
Cornel Marxer
Jean-Philippe ROBERT
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sercalo Microtechnology Ltd
Original Assignee
Silicior SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Silicior SA filed Critical Silicior SA
Publication of EP2784600A2 publication Critical patent/EP2784600A2/de
Publication of EP2784600A3 publication Critical patent/EP2784600A3/de
Withdrawn legal-status Critical Current

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    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B15/00—Escapements
    • G04B15/02—Escapements permanently in contact with the regulating mechanism
    • G04B15/04—Cylinder escapements
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B15/00—Escapements
    • G04B15/14—Component parts or constructional details, e.g. construction of the lever or the escape wheel
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B17/00—Mechanisms for stabilising frequency
    • G04B17/04—Oscillators acting by spring tension
    • G04B17/06—Oscillators with hairsprings, e.g. balance
    • G04B17/066—Manufacture of the spiral spring

Definitions

  • the present invention relates to processes for manufacturing micromechanical parts, essentially planar, from a silicon substrate. It relates more specifically to a method of manufacturing such parts, formed at least locally, of silicon oxide. The present invention also relates to micromechanical parts comprising at least one portion consisting of silicon oxide.
  • silicon in the mechanical precision watch industry has grown significantly in recent years. It is used for the manufacture of essentially flat micromechanical parts, such as anchors, escape wheels, spirals or pendulums. Indeed, silicon advantageously replaces, in some applications, metals or metal alloys, and this for various reasons. Its machining techniques, by photolithography and deep reactive ion etching (DRIE), allow to obtain forms of great complexity with a precision of the order of one micron, from substrates of thin silicon or silicon on insulator. In addition, silicon is insensitive to the magnetic field, and has interesting mechanical properties from the tribological point of view. For more information on these topics, please refer to the documents EP 1422436 , WO2009068091 and EP 2284629 .
  • Silicon oxide SiO 2 is transparent and bright, as long as its surface is perfectly polished. Its aesthetic potential is therefore important. Nevertheless, the etching of the silicon oxide is of a lesser precision and a speed lower than that of the silicon. The resin layer necessary for the protection of the oxide during the etching process is important, and the final aesthetic appearance is poor, particularly because of the roughness produced by the etching. The manufacture of micro-mechanical silicon oxide parts by the methods known to those skilled in the art, is difficult and the result is unsatisfactory.
  • the method according to the invention makes it possible to manufacture micromechanical parts comprising at least a portion of silicon oxide, without using an etching step of the oxide.
  • the surface state of the oxide is not affected, and the piece has a locally transparent and glossy appearance that can produce a particularly aesthetic optical effect.
  • the invention also relates to a micromechanical component comprising at least one portion formed of silicon oxide.
  • the formed portion of silicon oxide has a plurality of adjacent channels separated by thin walls, forming a rigid cell structure.
  • the manufacturing method according to the invention of an essentially planar micromechanical component preferentially applies, for economic reasons, to the batch production or 'batch' of a multitude of small parts. It comprises a first step a, of machining one or more micromechanical parts 1, from a flat silicon substrate 10, so as to form the contours.
  • the substrate 10 is, for example, consisting of a monocrystalline or poly-crystalline silicon plate, typically between 50 and 200 micrometers thick, the face of which advantageously has a mirror-polished appearance.
  • a film 11 made of a material other than silicon adhering to the rear face of the plate 10 acts as a barrier layer.
  • the film 11, of thickness 0.5 to 20 microns, consists for example of aluminum, gold, parylene, or other material capable of being deposited in a thin layer.
  • a silicon-on-insulator plate, better known as SOI (Silicon On Insulator) will be used.
  • the parts 1 are machined by photolithography and etching methods well known to those skilled in the art, or by any other alternative method for micromachining silicon with a resolution of about one micrometer.
  • the Deep Reactive Ion Etching Deep Reactive Ion Etching (DRIE) method will be used to etch the silicon vertically to a thickness of up to 300 microns.
  • DRIE Deep Reactive Ion Etching Deep Reactive Ion Etching
  • Thin connecting beams 12, visible in figure 2 connect the parts 1 to each other and to the substrate 10, so as to maintain said substrate in one piece during the following steps.
  • a plurality of adjacent channels 13, separated by thin walls 14, are machined perpendicularly to the plane of the part 1.
  • the thin-walled channel assembly 13 1 forms a rigid cellular structure 15 extending less on a portion 15 of the part 1.
  • the rigidity of the cellular structure 15 is conferred by the ratio between the radial and longitudinal dimensions of the channels 13, which is between 5 and 30.
  • the channels 13 being deep relative to their width, they oppose compression and torsion forces.
  • Their section may be square, rectangular, circular, or other, depending on the use and the nature of the parts 1. Particularly advantageously, one will opt for a hexagonal section, forming a honeycomb structure ', whose mechanical properties are well determined and provide optimum rigidity for a minimal amount of material.
  • the thin walls 14 have a thickness typically between 0.5 and 5 micrometers for reasons which will become apparent in the remainder of this disclosure.
  • the arrangement of the channels 13 may be periodic or any, provided that the thickness of the walls 14 remains within the aforementioned range.
  • the machining of the channels 13 separated by thin walls 14 makes it possible to constitute a rigid cellular structure 15 formed essentially of vacuum, but nevertheless rigid and resistant to mechanical stresses.
  • the cell structure 15 thus formed is more or less extended on the surface of the parts 1, depending on the desired aesthetic effect.
  • a solid zone 16, intended for fastening parts 1 or any other mechanical function will be free of structuring, in order to withstand mounting and clamping forces on an axis or other metal part.
  • the cellular structure 15 may be limited by a casing 17, of thickness substantially equal to that of the thin walls 14, drawing the contours of the parts 1, and intended to close all the channels 13.
  • machining step 1 of the workpiece 1 and the channels 13 can be divided into two distinct steps, the first intended to form the contours of the workpiece 1, the second dedicated to the etching of the channels 13.
  • the differences in terms of dimension of structures can be significant from one stage to another, and the skilled person may be required to choose different etching parameters, so as to optimize each of them. It follows that step a will be or not divided into two substeps, depending on cost or manufacturing constraints.
  • the film 11 is removed on the back side by a chemical or physicochemical process.
  • the parts 1 are then secured between them and the substrate 10, thanks to the fine beams 12 which connect them.
  • a third step consists of a thermal oxidation of the whole of the substrate 10 and of the parts 1 which form it, for a time sufficient to oxidize the thin walls 14 to the core.
  • Such an oxidation is generally a operation at high temperature, for example between 1000 ° C and 1200 ° C, in a humid atmosphere, of a duration of the order of twenty hours or more.
  • the precise parameters of the oxidation are determined by those skilled in the art, depending on the thickness of the thin walls 14 to be oxidized, and other data, such as the exact nature of the substrate 10 (polycrystalline or monocrystalline), its crystalline orientation, the desired final rendering, etc.
  • the thickness of the walls 14 is multiplied approximately by a factor 2.17 during the oxidation, that is, the channels 13, the walls 14, and more generally, all the different portions of the parts 1 are dimensioned, during the step a, taking into account the gain in material procured by oxidation.
  • nodes 20 where the walls 14 compete are formed by the convergence of three or four walls 14. They have a diagonal dimension greater than the thickness of the walls 14. It follows that their core 21 can remain stainless after the oxidation step c, as shown in figure 3b . The piece 1 then has an unsightly appearance. To overcome this drawback, it will avoid the convergence of four walls 14 in a node 20, as shown in FIG. figure 3a because no possibility of thinning of their heart is possible. Rather, nodes 20 formed of the convergence of three walls 14, as illustrated in FIG. figure 3c , allowing thinning 22 of the node 20 on the opposite side to one of the three walls 14. This thinning 22 is compensated by the contribution of material provided by the oxidation, visible in figure 3d .
  • surface treatments may be carried out locally or on all of the parts 1, after the thermal oxidation step c.
  • a deposition of silicon nitride or diamond makes it possible to increase the hardness of the pieces 1, whereas a physicochemical type of metal deposition, for example a gold deposit, on the anthracite zones confers an appearance even more aesthetic.
  • a physicochemical type of metal deposition for example a gold deposit
  • the pieces 1 are separated from the substrate 10 by breaking the connecting beams 12.
  • FIG 4 and 5 Two examples of pieces thus produced are illustrated in figure 4 and 5 .
  • the piece 1 forms an entirely transparent watch movement escapement anchor, with the exception of two solid areas 16 defining two holes 18 and 19 for mounting part 1, and two pallets 23 and 24.
  • the piece is bounded by an envelope 17, which in practice should not cut the channels 13 below a minimum size.
  • Exhibit 1 illustrated in figure 5 is a spiral equipping a watch exhaust. Its cellular structure is of rectangular type, the rectangles being of variable sizes and in a non-periodic arrangement along the spiral.
  • the geometry of the channels 13 and their arrangement are chosen to provide mechanical characteristics given to the spiral.
  • micro-mechanical parts transparent at least locally.
  • present invention is not limited to the embodiments described above, but extends to all variants within the scope of those skilled in the art, falling within the scope of the claims below. It will be noted, in particular, that other micro-machining processes of parts 1 and channels 13 having a sufficient resolution can be used, apart from the DRIE etching.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Micromachines (AREA)
EP14162203.5A 2013-03-28 2014-03-28 Herstellungsverfahren eines mikromechanischen Bauteils, das im wesentlichen eben ist, und mikromechanisches Bauteil, das mindestens einen Teil aus Siliziumoxid umfasst Withdrawn EP2784600A3 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH00686/13A CH707797A1 (fr) 2013-03-28 2013-03-28 Procédé de fabrication d'une pièce micro-mécanique essentiellement plane, et pièce micro-mécanique comportant au moins une portion formée d'oxyde de silicium.

Publications (2)

Publication Number Publication Date
EP2784600A2 true EP2784600A2 (de) 2014-10-01
EP2784600A3 EP2784600A3 (de) 2016-04-20

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EP14162203.5A Withdrawn EP2784600A3 (de) 2013-03-28 2014-03-28 Herstellungsverfahren eines mikromechanischen Bauteils, das im wesentlichen eben ist, und mikromechanisches Bauteil, das mindestens einen Teil aus Siliziumoxid umfasst

Country Status (2)

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EP (1) EP2784600A3 (de)
CH (1) CH707797A1 (de)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3168696A1 (de) * 2015-11-11 2017-05-17 Nivarox-FAR S.A. Herstellungsverfahren für ein werkstück auf siliziumbasis mit mindestens einem motiv mit optischen täuschungselementen
JP2018048935A (ja) * 2016-09-23 2018-03-29 セイコーエプソン株式会社 機械部品の製造方法、及び時計の製造方法
EP3339978A1 (de) * 2016-12-20 2018-06-27 The Swatch Group Research and Development Ltd Uhrwerkskomponente aus verbundwerkstoff
WO2019076742A1 (fr) * 2017-10-20 2019-04-25 Tronic's Microsystems Procede de fabrication d'une piece micromecanique en silicium
CH714293A1 (fr) * 2017-11-01 2019-05-15 Griffes Consulting Sa Structure nid d'abeille.

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1422436A1 (de) 2002-11-25 2004-05-26 CSEM Centre Suisse d'Electronique et de Microtechnique SA Spiraluhrwerkfeder und Verfahren zu deren Herstellung
WO2009068091A1 (fr) 2007-11-28 2009-06-04 Manufacture Et Fabrique De Montres Et Chronomètres Ulysse Nardin Le Locle S.A. Oscillateur mécanique présentant un coefficient thermoélastique optimisé
EP2284629A1 (de) 2009-08-13 2011-02-16 ETA SA Manufacture Horlogère Suisse Thermokompensierter mechanischer Resonator

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10130379A1 (de) * 2001-06-23 2003-01-02 Bosch Gmbh Robert Mikromechanischer Massenflusssensor und Verfahren zu dessen Herstellung
DE10219254B4 (de) * 2002-04-30 2011-08-11 Robert Bosch GmbH, 70469 Mikromechanisches Bauelement mit einem Isolationsbereich und entsprechendes Herstellungsverfahren
CH700640B1 (fr) * 2009-03-19 2014-09-30 Mhvj Manufacture Horlogère Vallée De Joux Pièce d'horlogerie allegée et renforcée.
CH701988B1 (fr) * 2009-10-07 2014-06-30 Nivarox Sa Procédé de fabrication d'un évidement oblique dans une couche de silicium.
EP2363762B1 (de) * 2010-03-04 2017-11-22 Montres Breguet SA Uhr mit einem mechanischen Hochfrequenzuhrwerk
CH704906B1 (fr) * 2011-05-09 2020-06-30 Lvmh Swiss Mft Sa C/O Zenith Succursale De Lvmh Swiss Mft Sa Ressort spiral en silicium pour montre mécanique.

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1422436A1 (de) 2002-11-25 2004-05-26 CSEM Centre Suisse d'Electronique et de Microtechnique SA Spiraluhrwerkfeder und Verfahren zu deren Herstellung
WO2009068091A1 (fr) 2007-11-28 2009-06-04 Manufacture Et Fabrique De Montres Et Chronomètres Ulysse Nardin Le Locle S.A. Oscillateur mécanique présentant un coefficient thermoélastique optimisé
EP2284629A1 (de) 2009-08-13 2011-02-16 ETA SA Manufacture Horlogère Suisse Thermokompensierter mechanischer Resonator

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3168696A1 (de) * 2015-11-11 2017-05-17 Nivarox-FAR S.A. Herstellungsverfahren für ein werkstück auf siliziumbasis mit mindestens einem motiv mit optischen täuschungselementen
EP3168697A1 (de) * 2015-11-11 2017-05-17 Nivarox-FAR S.A. Herstellungsverfahren für ein werkstück auf siliziumbasis mit mindestens einem motiv mit optischen täuschungselementen
US9740174B2 (en) 2015-11-11 2017-08-22 Nivarox-Far S.A. Method for fabrication of a silicon-based component with at least one optical illusion pattern
JP2018048935A (ja) * 2016-09-23 2018-03-29 セイコーエプソン株式会社 機械部品の製造方法、及び時計の製造方法
EP3339978A1 (de) * 2016-12-20 2018-06-27 The Swatch Group Research and Development Ltd Uhrwerkskomponente aus verbundwerkstoff
WO2018115009A1 (fr) * 2016-12-20 2018-06-28 The Swatch Group Research And Development Ltd Composant horloger en materiau composite
JP2019536051A (ja) * 2016-12-20 2019-12-12 ザ・スウォッチ・グループ・リサーチ・アンド・ディベロップメント・リミテッド 複合材料によって作られた計時器用部品
US11679577B2 (en) 2016-12-20 2023-06-20 The Swatch Group Research And Development Ltd Timepiece component made of composite material
WO2019076742A1 (fr) * 2017-10-20 2019-04-25 Tronic's Microsystems Procede de fabrication d'une piece micromecanique en silicium
FR3072688A1 (fr) * 2017-10-20 2019-04-26 Tronic's Microsystems Procede de fabrication d'une piece micromecanique en silicium
CH714293A1 (fr) * 2017-11-01 2019-05-15 Griffes Consulting Sa Structure nid d'abeille.

Also Published As

Publication number Publication date
EP2784600A3 (de) 2016-04-20
CH707797A1 (fr) 2014-09-30

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