EP2755819A4 - COATED ARTICLES, ELECTRODEPOSITION BATHS AND ASSOCIATED SYSTEMS - Google Patents

COATED ARTICLES, ELECTRODEPOSITION BATHS AND ASSOCIATED SYSTEMS

Info

Publication number
EP2755819A4
EP2755819A4 EP20120831829 EP12831829A EP2755819A4 EP 2755819 A4 EP2755819 A4 EP 2755819A4 EP 20120831829 EP20120831829 EP 20120831829 EP 12831829 A EP12831829 A EP 12831829A EP 2755819 A4 EP2755819 A4 EP 2755819A4
Authority
EP
European Patent Office
Prior art keywords
coated articles
associated systems
electrodeposition baths
electrodeposition
baths
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP20120831829
Other languages
German (de)
French (fr)
Other versions
EP2755819B1 (en
EP2755819A1 (en
Inventor
Nazila Dadvand
Urso John D
Jonathan C Trenkle
Alan C Lund
John Cahalen
Christopher A Schuh
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Xtalic Corp
Original Assignee
Xtalic Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US13/232,291 external-priority patent/US20120121925A1/en
Priority claimed from US13/232,261 external-priority patent/US20120118755A1/en
Application filed by Xtalic Corp filed Critical Xtalic Corp
Publication of EP2755819A1 publication Critical patent/EP2755819A1/en
Publication of EP2755819A4 publication Critical patent/EP2755819A4/en
Application granted granted Critical
Publication of EP2755819B1 publication Critical patent/EP2755819B1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/64—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of silver
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10—Electroplating with more than one layer of the same or of different metals
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10—Electroplating with more than one layer of the same or of different metals
    • C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/48—After-treatment of electroplated surfaces
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/615—Microstructure of the layers, e.g. mixed structure
    • C25D5/617—Crystalline layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/615—Microstructure of the layers, e.g. mixed structure
    • C25D5/619—Amorphous layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/623—Porosity of the layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/12—Process control or regulation
    • C25D21/14—Controlled addition of electrolyte components
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18—Electroplating using modulated, pulsed or reversing current

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
EP12831829.2A 2011-09-14 2012-09-14 Silver alloy coated articles Active EP2755819B1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/232,291 US20120121925A1 (en) 2010-03-12 2011-09-14 Coated articles, electrodeposition baths, and related systems
US13/232,261 US20120118755A1 (en) 2010-03-12 2011-09-14 Coated articles, electrodeposition baths, and related systems
PCT/US2012/055495 WO2013040400A1 (en) 2011-09-14 2012-09-14 Coated articles, electrodeposition baths, and related systems

Publications (3)

Publication Number Publication Date
EP2755819A1 EP2755819A1 (en) 2014-07-23
EP2755819A4 true EP2755819A4 (en) 2015-04-15
EP2755819B1 EP2755819B1 (en) 2016-09-14

Family

ID=47883783

Family Applications (1)

Application Number Title Priority Date Filing Date
EP12831829.2A Active EP2755819B1 (en) 2011-09-14 2012-09-14 Silver alloy coated articles

Country Status (4)

Country Link
EP (1) EP2755819B1 (en)
JP (1) JP6159726B2 (en)
CN (2) CN104080606B (en)
WO (1) WO2013040400A1 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2755819B1 (en) * 2011-09-14 2016-09-14 Xtalic Corporation Silver alloy coated articles
JP2015014019A (en) * 2013-07-03 2015-01-22 パナソニック株式会社 Surface treatment method of electrical contact, electrical contact member, connector and contact treatment agent
EP3417089B1 (en) * 2016-02-16 2023-12-13 Xtalic Corporation Articles including a multi-layer coating and methods
CN106521284A (en) * 2016-11-24 2017-03-22 苏州华意铭铄激光科技有限公司 Composite resistance strain material for high-performance electrical equipment
KR101913568B1 (en) * 2017-04-26 2018-10-31 재단법인대구경북과학기술원 Porous acupuncture-needle plated noble metal-nanoparticles and Manufacturing method thereof
JP7770766B2 (en) * 2020-02-25 2025-11-17 Ｄｏｗａメタルテック株式会社 Silver-plated material and its manufacturing method

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5225253A (en) * 1992-04-17 1993-07-06 General Motors Corporation Method of forming silver/molybdenum surface coating material
US20110014488A1 (en) * 2004-12-17 2011-01-20 Integran Technologies, Inc. Fine-Grained Metallic Coatings Having the Coeficient of Thermal Expansion Matched to the One of the Substrate

Family Cites Families (20)

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Publication number Priority date Publication date Assignee Title
US3762882A (en) * 1971-06-23 1973-10-02 Di Coat Corp Wear resistant diamond coating and method of application
GB1418108A (en) * 1972-09-12 1975-12-17 Siemens Ag Preparation of a catalytic material
SU1035655A1 (en) * 1980-12-12 1983-08-15 Предприятие П/Я А-1955 Electrochemical controllable resistor
JPS61248314A (en) * 1985-04-24 1986-11-05 松下電工株式会社 Making of contact material
US5525206A (en) * 1995-02-01 1996-06-11 Enthone-Omi, Inc. Brightening additive for tungsten alloy electroplate
JPH10302866A (en) * 1997-04-28 1998-11-13 Harness Sogo Gijutsu Kenkyusho:Kk Mating connection terminal
JP2003183882A (en) * 2001-12-11 2003-07-03 Kobe Steel Ltd Tinned electronic material
SG121757A1 (en) * 2003-02-11 2006-05-26 Agency Science Tech & Res Thin film magnetic recording media
JP2005062624A (en) * 2003-08-18 2005-03-10 Seiko Epson Corp Reflective film and manufacturing method thereof, color filter and manufacturing method thereof, electro-optical device substrate, electro-optical device, and electronic apparatus
JP4176081B2 (en) * 2005-01-19 2008-11-05 日本航空電子工業株式会社 Contact manufacturing method
JP4823214B2 (en) * 2005-03-22 2011-11-24 田中貴金属工業株式会社 REFLECTOR FOR LIGHT EMITTING ELEMENT, MANUFACTURING METHOD THEREOF, AND LIGHT EMITTING DEVICE HAVING THE REFLECTOR
US7695808B2 (en) * 2005-11-07 2010-04-13 3M Innovative Properties Company Thermal transfer coating
JP5144302B2 (en) * 2007-02-20 2013-02-13 株式会社神戸製鋼所 Reflective film laminate
US9005420B2 (en) * 2007-12-20 2015-04-14 Integran Technologies Inc. Variable property electrodepositing of metallic structures
CN102272356A (en) * 2008-11-07 2011-12-07 克斯塔里克公司 Electrodeposition baths, systems and methods
US8652649B2 (en) * 2009-07-10 2014-02-18 Xtalic Corporation Coated articles and methods
JP5719179B2 (en) * 2010-01-25 2015-05-13 株式会社神戸製鋼所 Reflective film laminate
US9694562B2 (en) * 2010-03-12 2017-07-04 Xtalic Corporation Coated articles and methods
WO2011112939A1 (en) * 2010-03-12 2011-09-15 Xtalic Corporation Coated articles and methods
EP2755819B1 (en) * 2011-09-14 2016-09-14 Xtalic Corporation Silver alloy coated articles

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5225253A (en) * 1992-04-17 1993-07-06 General Motors Corporation Method of forming silver/molybdenum surface coating material
US20110014488A1 (en) * 2004-12-17 2011-01-20 Integran Technologies, Inc. Fine-Grained Metallic Coatings Having the Coeficient of Thermal Expansion Matched to the One of the Substrate

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
BOGUSH V ET AL: "Electroless deposition of novel Ag-W thin films", MICROELECTRONIC ENGINEERING, ELSEVIER PUBLISHERS BV., AMSTERDAM, NL, vol. 70, no. 2-4, November 2003 (2003-11-01), pages 489 - 494, XP004467966, ISSN: 0167-9317, DOI: 10.1016/S0167-9317(03)00414-3 *
NIKOLA RADIC ET AL: "Thin films of completely immiscible Ag-W system", CROATIAN SCIENTIFIC BIBLIOGRAPHY (CROSBI), 8 January 2008 (2008-01-08), XP055173398, Retrieved from the Internet <URL:https://bib.irb.hr/prikazi-rad?rad=316918&table=zbornik&lang=en&print=true> [retrieved on 20150303] *
See also references of WO2013040400A1 *

Also Published As

Publication number Publication date
CN106947986B (en) 2019-07-19
CN106947986A (en) 2017-07-14
JP2014526615A (en) 2014-10-06
CN104080606B (en) 2016-12-07
EP2755819B1 (en) 2016-09-14
EP2755819A1 (en) 2014-07-23
CN104080606A (en) 2014-10-01
WO2013040400A1 (en) 2013-03-21
JP6159726B2 (en) 2017-07-05

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