EP2588899A1 - Spectral filter having a structured membrane at the sub-wavelength scale, and method for manufacturing such a filter - Google Patents
Spectral filter having a structured membrane at the sub-wavelength scale, and method for manufacturing such a filterInfo
- Publication number
- EP2588899A1 EP2588899A1 EP11738988.2A EP11738988A EP2588899A1 EP 2588899 A1 EP2588899 A1 EP 2588899A1 EP 11738988 A EP11738988 A EP 11738988A EP 2588899 A1 EP2588899 A1 EP 2588899A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- bars
- period
- pattern
- filter
- membrane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000012528 membrane Substances 0.000 title claims abstract description 59
- 230000003595 spectral effect Effects 0.000 title claims abstract description 51
- 238000004519 manufacturing process Methods 0.000 title claims description 11
- 238000000034 method Methods 0.000 title description 12
- 239000000758 substrate Substances 0.000 claims abstract description 23
- 238000001914 filtration Methods 0.000 claims abstract description 21
- 239000003989 dielectric material Substances 0.000 claims abstract description 15
- 230000000737 periodic effect Effects 0.000 claims abstract description 9
- 239000011159 matrix material Substances 0.000 claims description 12
- 230000005540 biological transmission Effects 0.000 claims description 11
- 238000005530 etching Methods 0.000 claims description 9
- 239000000463 material Substances 0.000 claims description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 8
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 4
- 239000005083 Zinc sulfide Substances 0.000 claims description 4
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 claims description 4
- 238000003384 imaging method Methods 0.000 claims description 4
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 4
- 239000002253 acid Substances 0.000 claims description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 3
- 238000000151 deposition Methods 0.000 claims description 3
- 238000003331 infrared imaging Methods 0.000 claims description 3
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 3
- 235000012239 silicon dioxide Nutrition 0.000 claims description 3
- 239000000377 silicon dioxide Substances 0.000 claims description 3
- RBORBHYCVONNJH-UHFFFAOYSA-K yttrium(iii) fluoride Chemical compound F[Y](F)F RBORBHYCVONNJH-UHFFFAOYSA-K 0.000 claims description 3
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 claims description 3
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 2
- 229910052984 zinc sulfide Inorganic materials 0.000 claims description 2
- 230000010287 polarization Effects 0.000 description 20
- 230000003287 optical effect Effects 0.000 description 14
- 230000004044 response Effects 0.000 description 8
- 238000000411 transmission spectrum Methods 0.000 description 7
- 230000005684 electric field Effects 0.000 description 6
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 6
- 230000005855 radiation Effects 0.000 description 5
- 230000007246 mechanism Effects 0.000 description 4
- 238000004458 analytical method Methods 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 238000003486 chemical etching Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000001000 micrograph Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000008520 organization Effects 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 230000001427 coherent effect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000012886 linear function Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- -1 zinc sulphide (ZnS) Chemical compound 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/002—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of materials engineered to provide properties not available in nature, e.g. metamaterials
- G02B1/005—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of materials engineered to provide properties not available in nature, e.g. metamaterials made of photonic crystals or photonic band gap materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/26—Reflecting filters
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/08—Optical arrangements
- G01J5/0801—Means for wavelength selection or discrimination
- G01J5/0802—Optical filters
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1809—Diffraction gratings with pitch less than or comparable to the wavelength
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
Definitions
- the present invention relates to the field of spectral filters with membrane structured at sublength wave scale, and more particularly the field of spectral filters for wavelength radiation in the infrared spectral band.
- Spectral filters consisting of stacks of thin layers (interference filters) are known. However, since they involve a large number of thin layers, these components have a fragility as soon as they are subjected to cycles of temperature variations, for example when they are arranged in a cryostat, especially for applications. in the infrared. Indeed, these cycles lead to embrittlement of the structure due to the thermal expansion coefficients that differ from one material to another and therefore from one layer to another, resulting in stresses between the layers and a risk of shear separation.
- a filter operating in the infrared will require thicker layers than a filter operating in the visible, and very quickly, one will be faced with technological difficulties related to the thickness. In particular, the characteristics of the filter (width and spectral position) being directly related to the thickness, it is extremely complicated to juxtapose different filters on the same component, which can be useful for multispectral applications for example.
- An object of the present invention is to provide a spectral filter with a wavelength dielectric membrane for filtering visible or infrared wavelength radiation, which notably has greater robustness and greater stability of optical performance in use.
- the invention relates to a spectral filter adapted for filtering an incident light wave by reflection of said wave in a spectral band centered on at least a first central wavelength ⁇ given, the filter comprising a substrate with a through hole and a diaphragm formed of dielectric material.
- the membrane is suspended above the orifice and is structured to form a set of bars organized in the form of a two-dimensional pattern repeated in two directions, the repetition of the pattern in at least one direction being periodic or quasi-periodic, with a first period less than the central wavelength ⁇ .
- the organization of the bars of a filter thus produced has shown, in particular with respect to the filters of the prior art, substantially improved properties of robustness and optical stability.
- the dielectric material is selected from silicon dioxide, manganese oxide, silicon carbide, silicon nitride, zinc sulfide, yttrium trifluoride, alumina .
- the width of a bar is substantially less than ⁇ / 2 ⁇ where n is the refractive index of the material of which the membrane is formed.
- the bars may have a section of substantially square, rectangular or circular shape, the latter variant to obtain a filter of greater selectivity.
- the pattern has a parallelogram-like shape.
- the membrane is then structured to form a two-dimensional grid with first bars parallel to a first direction and second bars parallel to a second direction, the first bars being formed by the repetition according to said first period of a first sub-pattern comprising at least one bar.
- the first sub-pattern may include one or a plurality of parallel bars, to adapt the spectral response of the filter.
- the first direction and the second direction are substantially perpendicular.
- the second bars are also formed by the repetition according to a second period of a second sub-pattern comprising at least one bar per period.
- the second period is less than the central wavelength ⁇ .
- the second period is identical to the first period and the first and second sub-patterns are similar, making the structure symmetrical and in particular allowing the realization of a filter insensitive to the polarization of the incident wave.
- the second period is different from the first period, allowing, for example, selective filtering spectrally as a function of the polarization of the incident wave.
- two adjacent second bars are spaced a minimum distance, substantially greater than three times the central wavelength ⁇ .
- the filter then has an optical response close to a filter with a structured one-dimensional membrane, while having improved robustness and reliability.
- the pattern may comprise bars arranged in at least three different directions, in particular making it possible to obtain a better angular acceptance while keeping a certain degree of insensitivity to the polarization of the incident wave.
- the invention relates to a multispectral matrix comprising a plurality of spectral filters according to the first aspect, adapted to filter different central wavelengths, the membranes of the filters being suspended over the same substrate.
- a matrix has robustness and optical stability despite greater dimensions and keeps a constant thickness, the filter wavelength of each filter being determined by the patterns of the structured membrane and not its thickness.
- the invention relates to an infrared imaging system comprising an infrared detector and a filter according to the first aspect or a multispectral matrix according to the second aspect, said filter or said matrix being used in transmission or in reflection.
- the imaging system comprises means for rotating the filter or the matrix, making it possible to vary the angle of incidence of the incident wave on the at least one filter (s) to obtain one or more wavelength tunable filters.
- the invention relates to a method for manufacturing a spectral filter adapted for the reflection filtering of an incident wave in a spectral band centered on at least a first central wavelength ⁇ given comprising:
- the process also comprises an isotropic etching of the bars, for example by immersion of the filter thus obtained in a solution of a dilute acid allowing a controlled attack of the material of which the bars are made in order to round and / or reducing the section of said bars in a controlled manner.
- Figure 1 shows a sectional view of an exemplary embodiment of a filter according to the invention.
- Figure 2 is a diagram schematically illustrating steps of a method of manufacturing a self-suspended membrane according to one embodiment of the invention.
- Figure 3 represents an image taken under a scanning electron microscope of a self-suspended structured membrane for a filter according to a variant of the invention.
- Figure 4 is a graph showing the measured transmission spectrum of a membrane filter according to the embodiment illustrated in Figure 2.
- Fig. 5 is a graph showing measured transmission spectra of a membrane filter according to the embodiment illustrated in Fig. 2 for different angles of incidence.
- FIG. 6 represents a scanning electron microscope image of a self-suspended structured membrane for a filter according to another variant of the invention.
- Figure 7 is a graph showing the measured transmission spectra of a membrane filter of the type of Figure 6, respectively in TE and TM mode.
- Figures 8A and 8B illustrate two examples of structured membranes according to two embodiments of a filter according to the invention.
- FIGS. 9A and 9B illustrate variants of structured membranes of a filter according to the invention, respectively with hexagon and parallelogram-shaped patterns showing triangles.
- Figure 10 illustrates a multispectral matrix incorporating a plurality of filters in one embodiment of the invention.
- FIG. 1 shows a sectional view of a filter equipped with a self-suspended membrane in an exemplary embodiment of the invention. It is an illustrative scheme whose elements are not represented on their true scale.
- the filter generally comprises a substrate 10, an orifice 20 passing through the substrate 10 and a structured membrane 30 suspended above the orifice 20.
- the membrane is formed of dielectric material.
- dielectric material is generally meant a material or a stack of materials whose dielectric permittivity has a positive real part and an imaginary part zero or very small in front of the real part.
- the membrane is structured to form a set of bars organized in the form of a two-dimensional pattern, the pattern being repeated in two directions.
- the reason may comprise bars arranged in two directions, it is then for example of parallelepiped shape, rectangle or square. It can take other forms, with bars arranged in at least three directions, for example a hexagon shape or have a complex structure with bars arranged in an outline and within this contour, as will be described later. In Figure 1, only first bars 32 are visible in section.
- the substrate 10 is for example a silicon substrate, typically of the order of a few hundred micrometers thick. In use, the filter can be used in transmission (band cut) or in reflection (pass band).
- FIG. 2 describes in simplified manner the steps of an exemplary method of manufacturing a bandpass filter according to the invention, for example of the type described in FIG. 1.
- a layer 40 dielectric material is deposited on the front face of a substrate 10 (face intended to receive the incident light, see Figure 1).
- the deposition can be performed by a plasma-assisted chemical vapor deposition technique.
- a thickness of the layer 40 of dielectric material is generally between 0.5 micron and a few microns.
- the dielectric material may be, for example, a nitride such as silicon nitride (Si 3 N 4 ), a carbide such as silicon carbide (SiC), an oxide such as silicon dioxide (SiO 2 ), oxide of manganese (MnO), alumina (Al 2 O 3 ), a sulphide such as zinc sulphide (ZnS), a fluoride such as yttrium trifluoride (YbF 3 ).
- the structured membrane 30 is formed using, for example, a UV or electronic lithography method so as to obtain a grid with the desired pattern.
- a third step S3 the orifice 20 is engraved on the rear face of the substrate 10 in a given pattern (square, rectangular opening, etc.).
- the orifice 20 passes through the substrate 10 so that the membrane 30 is suspended from a peripheral portion of an opening 210 of the orifice 20.
- the etching of the substrate 10 can be carried out for example by chemical etching in a bath of tetramethylammonium hydroxide (TMAH).
- TMAH tetramethylammonium hydroxide
- a back surface of the substrate 10 may be covered with a layer of silicon oxide (SiO 2 ) comprising a passage for TMAH. This makes it possible to selectively etch the rear face of the substrate.
- the shape of the passage on the silicon oxide layer deposited at the rear of the substrate 10 is related to the shape of the orifice 20 obtained by etching. You can also protect the front and the structure with one or several layers of protection. Typically, the surface of the opening 210 of the orifice 20 at the front face of the substrate 10 is of the order of a few square millimeters to several hundred square millimeters.
- the method thus described makes it possible to obtain a suspended structured membrane 30 whose two-dimensional pattern makes it possible to impart rigidity to the structure.
- the presence of bars arranged in different directions makes it possible to prevent transverse movement of the bars in the event of vibrations during use.
- Applicants have thus found a much better optical performance stability, making it possible to test the filters thus produced in use condition, which had not been possible until now with the suspended membranes of the prior art.
- bars are obtained whose section is substantially square or rectangular.
- the sample undergoes isotropic etching of its bars, for example by immersing it in a solution of a dilute acid, which chemically attacks the material of which the bars are made. Isotropic etching is faster on the edges of the bars. It allows to round then reduce the section of the bars in a controlled manner. Bars of very small sections can thus be easily manufactured.
- this chemical etching can be done for example in a dilute hydrofluoric acid solution (HF) for several minutes.
- substantially round section bars in particular by reducing the size and roughness of the bars, a better selectivity in the filtering function.
- FIG. 3 illustrates a first example of a structured membrane for producing a filter according to the invention.
- the membrane 30 is structured to form a two-dimensional grid with first bars 32 parallel to a first direction Di and second bars 34 parallel to a second direction D 2 .
- the first bars 32 are periodically arranged in a first period Ti and the second bars 34 are also arranged periodically, but with a period T 2 greater than Ti.
- Both directions Di and D 2 are substantially perpendicular and the bars are organized in the form of a substantially rectangular pattern 33 repeated in each direction.
- the periods ⁇ and T 2 are respectively equal to about 3 ⁇ and 20 ⁇
- the width of the bars is about 500 nm and the bars are substantially square section.
- FIG. 4 represents the transmission spectrum 41 measured for the spectral filter represented in FIG. 3, with an incident wave in an incidence plane perpendicular to the bars 32, having an angle of incidence of 5 ° defined with respect to the normal at the plane of the membrane and a polarization of the incident electric field parallel to the first bars 32 (TE polarizations).
- the spectral response 41 is compared with the calculated spectrum 42 of a one-dimensional structure, having the same number of first bars 32 arranged with the same Ti period, for a similar incident wave.
- the filter obtained according to this embodiment has a very selective optical resonance phenomenon around 3.3 ⁇ .
- the transmission coefficient reaches 0.03 at the cut-off wavelength.
- the spectrum has a second dip around 2.9 ⁇ .
- FIG. 5 thus illustrates transmission spectra of the spectral filter represented in FIG. 3, measured for several angles of incidence (respectively 0 °, 10 °, 20 °).
- angles of incidence there is a main depression, centered around the wavelength 3.2 ⁇ .
- the appearance of a second resonance mode is explained by the non-zero angle of incidence. It is thus possible by modifying the angle of incidence and by filtering on one side of the central wavelength to adjust the filtering wavelength.
- the cut-off wavelength depends on the period of the bars 32 spaced apart with a sublung wave period and the resulting filter is polarizing, only the TE polarization being reflected by the resonant mechanism.
- the wave transmitted at the cut-off wavelength is polarized according to the TM polarization.
- Such a filter can be used in transmission (band-cut filter) or in reflection (bandpass filter) for example in an imaging system.
- the polarization analysis system may comprise an infrared imaging system with said spectral filter optimized for filtering at a given cut-off wavelength in the infrared spectral band, a detector sensitive to the length of the beam. cut-off wave of the filter and a device for rotating the polarization of the incident wave. If the incident wave comprises a component with a linear polarization, which is for example the case of an infrared radiation emitted by an artificial object (vehicle or building type for example), the signal measured in transmission will be variable with the position polarization rotation device (and minimal for example when the incident polarization is TE).
- the second bars 34 may be arranged periodically in a period T 2 of the order of the period Ti of the first bars 32.
- the periodic arrangement of the first bars 32 in a direction Di with a period ⁇ makes it possible to obtain a filtering effect around a first cut-off wavelength ⁇ as a function of ⁇ for a component of the incident electric field parallel to the direction Di.
- the periodic arrangement of the second bars 34 with a period T 2 close to ⁇ makes it possible to obtain a filtering effect at a second cut-off wavelength ⁇ 2 close to ⁇ for a component of the incident electric field parallel to the direction D 2 .
- a spectral filter with a membrane thus structured allows for example a selective wavelength filtering, performed by selecting the polarization of the incident wave.
- FIG. 6 illustrates a scanning electron microscope image of an example of a structured membrane 30 made using the method previously described, comprising first and second bars 32 and 34, of substantially square cross-section at 500 nm, the bars being respectively parallel to two directions Di and D 2 perpendicular and being arranged in the same period T of the order of 3 ⁇ .
- the bars are thus organized in this example in the form of a substantially square pattern 33 repeated in each direction. Since the period of the first and second bars is identical, the cut-off wavelengths ⁇ 0 for an incident wave polarized with a polarization TE in the direction Di and D 2 are identical. In normal incidence, this allows in particular to extinguish the wavelength ⁇ 0 in a radiation transmitted independently of the polarization of the incident wave.
- the first and second bars have the same width and the same thickness, and the width of the resonance is therefore identical for the components of the field along the directions Di and D 2 .
- the incident wave transmitted by the membrane is spectrally filtered independently of the polarization of the incident field.
- FIG. 7 illustrates the transmission spectra 71, 72 measured at normal incidence of the filter as shown in FIG. 6, respectively for an incident wave whose electric field is oriented in the direction Di and for an incident wave whose electric field is oriented in the direction D 2 .
- the transmission spectra are superimposed.
- such a filter can be used in reflection or in transmission, for example in an imaging system.
- the membrane may be structured to form a two-dimensional grid with first bars 32 parallel to a first direction and second bars 34 parallel to a second direction, the first bars being formed by the repetition according to the first period ( ⁇ ) of a first sub-pattern 320 comprising a plurality of bars.
- a structure makes it possible to obtain a multi-resonant filter for a component of the electric field parallel to the direction of the first bars.
- Figure 8A illustrates an example of such a structure.
- the structure 30 is obtained in this example by the repetition in two non-parallel directions of a first sub-pattern 320 comprising two bars 321 and 322 per period and a second sub-pattern 340 comprising a bar 34 per period.
- the two bars 321 and 322 of the first sub-pattern 320 have identical, for example circular, sections, and the periods of the first and second sub-patterns are substantially identical, the main pattern according to which are arranged the bars being substantially square.
- the sub-pattern 320 comprises two bars 323 and 324 per period, but the bar 323 has a smaller section than the section of the bar 324.
- a section variation of the bars of the structure allows to modify the width of the resonance around the cut-off wavelength.
- the first sub-pattern and / or the second sub-pattern may comprise more than two bars.
- the bars of the first sub-pattern and / or the second sub-pattern may be regularly spaced in the sub-pattern or may be irregularly spaced and may be of different section.
- the structure may be symmetrical with respect to the bisector of the directions D1 and D2 with the same number of sub-patterns per period, making it possible to produce a spectral filter insensitive to polarization.
- Figures 9A and 9B illustrate alternative patterns in which the bars of the membrane can be organized.
- the pattern 33 is hexagonal, repeated periodically along two directions Di and D 2 with periods Ti and T 2 .
- the pattern 33 is complex, with a general parallelogram shape, a bar being furthermore arranged along a diagonal of the parallelogram, the pattern being again periodically repeated in two directions D1 and D2 with periods T1 and T2.
- a transmission response of the filter is expected with greater angular acceptance, while preserving insensitivity to the polarization.
- the pattern according to which the bars are organized can be repeated almost periodically, that is to say with a period of slow variation.
- the filtering function is effective when the number of repetitions of the pattern is at least equal to the quality factor of the filter, defined as the ratio of the central wavelength of filtering by the spectral width halfway. height.
- the quality factor of the filter defined as the ratio of the central wavelength of filtering by the spectral width halfway. height.
- the period varies slowly, that is to say from a value substantially less than the spectral width at mid-height for a number of bars substantially equal to the quality factor, the function of filtering while dragging the filtering wavelength.
- the variation of the period can be a linear function of the distance, according to the periodicity direction of the pattern.
- the quasi-periodic repetition provides a filtered response whose cutoff wavelength ⁇ 0 varies continuously from one end of the filter to the other, covering a whole spectral range.
- a filter of length 10 mm in this first direction makes it possible to cover the entire II transmission band of the atmosphere (3 to 5 microns) with a spectral shift of ⁇ / 5 on Q bars where Q is the quality factor and ⁇ the width at half height of a periodic filter.
- a minimum periodicity substantially equal to three times the wavelength provides, for example, an unfiltered transmission.
- Figure 10 illustrates a multispectral matrix 50 comprising several filters spectral 1 juxtaposed.
- the filters 1 can be adapted to present different spectral responses.
- the filters 1 can be adapted to filter several juxtaposed spectral bands. This can be used to analyze an image on successive wavelength bands.
- the structured membranes according to the invention have a thickness that is almost independent of their optical properties.
- the spectral response of the structured membranes according to the invention can in fact be determined mainly by the period of the bars on the suspended structure and by the material chosen to form the structure.
- the structure produced is also more robust and optically stable because of the organization of the bars in the form of a two-dimensional pattern repeated in two directions, the manufacture of a multispectral matrix 50 of constant thickness with several filters is made possible.
- the spectral filter and the method of producing the spectral filter according to the invention comprise various variants, modifications and improvements which will be obvious to those skilled in the art. it being understood that these various variants, modifications and improvements are within the scope of the invention, as defined by the following claims.
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- Optics & Photonics (AREA)
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- Crystallography & Structural Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
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Abstract
Description
Claims
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1055226A FR2961913B1 (en) | 2010-06-29 | 2010-06-29 | SPECTRAL FILTER WITH WAVELENGTH SUB-LENGTH STRUCTURED MEMBRANE AND METHOD OF MANUFACTURING SUCH A FILTER |
PCT/EP2011/060694 WO2012000928A1 (en) | 2010-06-29 | 2011-06-27 | Spectral filter having a structured membrane at the sub-wavelength scale, and method for manufacturing such a filter |
Publications (1)
Publication Number | Publication Date |
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EP2588899A1 true EP2588899A1 (en) | 2013-05-08 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP11738988.2A Withdrawn EP2588899A1 (en) | 2010-06-29 | 2011-06-27 | Spectral filter having a structured membrane at the sub-wavelength scale, and method for manufacturing such a filter |
Country Status (6)
Country | Link |
---|---|
US (1) | US20130187049A1 (en) |
EP (1) | EP2588899A1 (en) |
JP (1) | JP5868398B2 (en) |
FR (1) | FR2961913B1 (en) |
IL (1) | IL223992A (en) |
WO (1) | WO2012000928A1 (en) |
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US10930108B2 (en) * | 2016-07-08 | 2021-02-23 | High 5 Games, LLC | Gaming device having an additional symbol award within a play matrix |
US10642056B2 (en) * | 2016-10-19 | 2020-05-05 | CSEM Centre Suisse d'Electronique et de Microtechnique SA—Recherche et Développement | Multispectral or hyperspectral imaging and imaging system based on birefringent subwavelength resonating structure |
CN113189689B (en) * | 2021-04-30 | 2022-04-22 | 扬州大学 | Long-wavelength-pass filter based on super-surface array structure |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2618957B2 (en) * | 1987-12-24 | 1997-06-11 | 株式会社クラレ | Polarizing optical element |
JPH0572411A (en) * | 1991-06-13 | 1993-03-26 | Mitsubishi Electric Corp | Adjustment device for angle of incidence |
JPH09223658A (en) * | 1996-02-16 | 1997-08-26 | Nikon Corp | Manufacture of silicon nitride membrane and member of silicon nitride membrane |
JPH09297198A (en) * | 1996-05-08 | 1997-11-18 | Nikon Corp | X-ray filter |
JP2001124927A (en) * | 1999-10-29 | 2001-05-11 | Canon Inc | Beam splitter and optical device applying the same |
US6285020B1 (en) * | 1999-11-05 | 2001-09-04 | Nec Research Institute, Inc. | Enhanced optical transmission apparatus with improved inter-surface coupling |
DE10054503B4 (en) * | 2000-11-03 | 2005-02-03 | Ovd Kinegram Ag | Light diffractive binary lattice structure and security element with such a lattice structure |
JP2003171190A (en) * | 2001-12-04 | 2003-06-17 | Toshiba Ceramics Co Ltd | Ceramic member having coarse surface and method for producing the same |
US6891676B2 (en) * | 2003-01-10 | 2005-05-10 | Bookham Technology Plc | Tunable spectral filter |
JP4033008B2 (en) * | 2003-03-17 | 2008-01-16 | 日産自動車株式会社 | Night vision device for vehicles |
JP2005129833A (en) * | 2003-10-27 | 2005-05-19 | Nec Kansai Ltd | Method of manufacturing semiconductor laser |
US7453645B2 (en) * | 2004-12-30 | 2008-11-18 | Asml Netherlands B.V. | Spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby |
JP4881056B2 (en) * | 2006-05-01 | 2012-02-22 | キヤノン株式会社 | Photonic crystal electromagnetic wave device including electromagnetic wave absorber and method for producing the same |
JP5176387B2 (en) * | 2007-05-18 | 2013-04-03 | 大日本印刷株式会社 | Membrane structure manufacturing method |
US8536551B2 (en) * | 2008-06-12 | 2013-09-17 | Gigaphoton Inc. | Extreme ultra violet light source apparatus |
WO2010034385A1 (en) * | 2008-09-26 | 2010-04-01 | Asml Netherlands B.V. | Spectral purity filter, lithographic apparatus, and method for manufacturing a spectral purity filter |
-
2010
- 2010-06-29 FR FR1055226A patent/FR2961913B1/en not_active Expired - Fee Related
-
2011
- 2011-06-27 EP EP11738988.2A patent/EP2588899A1/en not_active Withdrawn
- 2011-06-27 JP JP2013517225A patent/JP5868398B2/en not_active Expired - Fee Related
- 2011-06-27 WO PCT/EP2011/060694 patent/WO2012000928A1/en active Application Filing
- 2011-06-27 US US13/807,793 patent/US20130187049A1/en not_active Abandoned
-
2012
- 2012-12-30 IL IL223992A patent/IL223992A/en active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
JP5868398B2 (en) | 2016-02-24 |
US20130187049A1 (en) | 2013-07-25 |
IL223992A (en) | 2017-04-30 |
WO2012000928A1 (en) | 2012-01-05 |
FR2961913A1 (en) | 2011-12-30 |
FR2961913B1 (en) | 2013-03-08 |
JP2013536452A (en) | 2013-09-19 |
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