EP2559993A3 - X-ray diffraction instrument for measuring an object larger than the x-ray detector - Google Patents

X-ray diffraction instrument for measuring an object larger than the x-ray detector Download PDF

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Publication number
EP2559993A3
EP2559993A3 EP12179985.2A EP12179985A EP2559993A3 EP 2559993 A3 EP2559993 A3 EP 2559993A3 EP 12179985 A EP12179985 A EP 12179985A EP 2559993 A3 EP2559993 A3 EP 2559993A3
Authority
EP
European Patent Office
Prior art keywords
ray
ray diffraction
ray detector
detector
diffraction instrument
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP12179985.2A
Other languages
German (de)
French (fr)
Other versions
EP2559993A2 (en
Inventor
Yun Wang
Hisamitu Hatou
Toshikazu Kikuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of EP2559993A2 publication Critical patent/EP2559993A2/en
Publication of EP2559993A3 publication Critical patent/EP2559993A3/en
Withdrawn legal-status Critical Current

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Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/20008Constructional details of analysers, e.g. characterised by X-ray source, detector or optical system; Accessories therefor; Preparing specimens therefor
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01LMEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L1/00Measuring force or stress, in general
    • G01L1/25Measuring force or stress, in general using wave or particle radiation, e.g. X-rays, microwaves, neutrons
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01LMEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L5/00Apparatus for, or methods of, measuring force, work, mechanical power, or torque, specially adapted for specific purposes
    • G01L5/0047Apparatus for, or methods of, measuring force, work, mechanical power, or torque, specially adapted for specific purposes measuring forces due to residual stresses
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00Investigating materials by wave or particle radiation
    • G01N2223/60Specific applications or type of materials
    • G01N2223/62Specific applications or type of materials powders

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  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • Analytical Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Toxicology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

There is provided an X-ray diffraction instrument (10) including: a two-dimensional plate-like X-ray detector (2); an X-ray emitter (1) integrated with the X-ray detector (2) so as to penetrate the plate of the X-ray detector; a cylinder-like shield (3) to define an orientation of the X-ray emitter (1) and to prevent X-ray leakage, the X-ray detector (2) being attached to one open end of the cylinder-like shield (3); and a standard powder attachment device (4) to attach a standard powder for X-ray diffraction measurement to a surface of an object (5) to be measured. The X-ray diffraction instrument can perform an X-ray diffraction measurement on an object (5) larger than the X-ray detector. The invented X-ray diffraction instrument is small in size, and can perform accurate X-ray diffraction measurement of stationary immovable objects without limitation of the orientation of the measurement surface. In addition, X-ray leakage is prevented for operator safety.
EP12179985.2A 2011-08-18 2012-08-10 X-ray diffraction instrument for measuring an object larger than the x-ray detector Withdrawn EP2559993A3 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011178976A JP5347001B2 (en) 2011-08-18 2011-08-18 X-ray diffractometer

Publications (2)

Publication Number Publication Date
EP2559993A2 EP2559993A2 (en) 2013-02-20
EP2559993A3 true EP2559993A3 (en) 2013-10-23

Family

ID=47010202

Family Applications (1)

Application Number Title Priority Date Filing Date
EP12179985.2A Withdrawn EP2559993A3 (en) 2011-08-18 2012-08-10 X-ray diffraction instrument for measuring an object larger than the x-ray detector

Country Status (4)

Country Link
US (1) US8923480B2 (en)
EP (1) EP2559993A3 (en)
JP (1) JP5347001B2 (en)
CA (1) CA2785413A1 (en)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012122737A (en) * 2010-12-06 2012-06-28 Hitachi-Ge Nuclear Energy Ltd X-ray diffraction device
JP5861841B2 (en) * 2013-05-10 2016-02-16 パルステック工業株式会社 X-ray diffraction measurement device
US10598556B2 (en) 2013-08-21 2020-03-24 United Technologies Corporation Method for in-situ markers for thermal mechanical structural health monitoring
JP5955301B2 (en) * 2013-11-14 2016-07-20 株式会社神戸製鋼所 Residual stress calculation method
JP6037237B2 (en) * 2014-02-04 2016-12-07 パルステック工業株式会社 X-ray diffractometer and measurement method using X-ray diffractometer
CN103983653B (en) * 2014-05-29 2016-08-31 中国科学院青海盐湖研究所 The X-ray diffractometer multifunctional sample platform measuring block solid sample
EP2980404A1 (en) 2014-07-31 2016-02-03 Siemens Aktiengesellschaft Determining a yaw direction of a wind turbine
JP5954642B1 (en) * 2015-03-20 2016-07-20 パルステック工業株式会社 X-ray diffractometer and method for determining necessity of triaxial residual stress measurement
JP5958584B1 (en) * 2015-03-24 2016-08-02 パルステック工業株式会社 X-ray diffraction measurement apparatus and X-ray diffraction measurement method
US9939393B2 (en) * 2015-09-28 2018-04-10 United Technologies Corporation Detection of crystallographic properties in aerospace components
JP6155538B2 (en) * 2015-11-30 2017-07-05 パルステック工業株式会社 X-ray diffraction measurement apparatus and X-ray diffraction measurement method
JP6842084B2 (en) * 2017-02-03 2021-03-17 国立大学法人東北大学 Portable 3-axis stress measuring device
JP6776181B2 (en) * 2017-05-31 2020-10-28 株式会社神戸製鋼所 Stress measurement method
JP6815933B2 (en) * 2017-05-31 2021-01-20 株式会社神戸製鋼所 Stress measurement method
JP2019124481A (en) * 2018-01-12 2019-07-25 株式会社神戸製鋼所 Residual stress measurement method
US11543310B2 (en) * 2020-12-18 2023-01-03 Metal Industries Research & Development Centre Method for measuring residual stress of curved-surface bulk material
CN111238707A (en) * 2020-02-27 2020-06-05 西安交通大学 Mono-crystal/oriented-crystal stress measuring system and method of monochromatic and polychromatic light X-ray
CN114062406B (en) * 2022-01-04 2022-03-22 中国工程物理研究院流体物理研究所 Time-resolved polycrystalline X-ray diffraction target device

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2259708A (en) * 1937-06-14 1941-10-21 Schiebold Ernst Testing materials by x-ray
US2462374A (en) * 1944-10-04 1949-02-22 Philips Lab Inc Stress analysis by x-ray diffraction
US4042825A (en) * 1976-07-09 1977-08-16 Colorado Seminary Stressed-unstressed standard for X-ray stress analysis and method of making same
US5741707A (en) * 1992-12-31 1998-04-21 Schlumberger Technology Corporation Method for quantitative analysis of earth samples
US6353656B1 (en) * 1998-07-24 2002-03-05 Technology For Energy Corporation Radioisotope based x-ray residual stress analysis apparatus
JP2005241308A (en) * 2004-02-24 2005-09-08 Railway Technical Res Inst X-ray diffraction device and x-ray diffraction system
US20120140888A1 (en) * 2010-12-06 2012-06-07 Hitachi-Ge Nuclear Energy, Ltd. X-ray diffraction instrument

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4263510A (en) * 1979-07-30 1981-04-21 General Electric Company Combined x-ray diffraction and fluorescence spectroscopy apparatus with environmentally controllable chamber
JPH06317484A (en) 1993-04-30 1994-11-15 Nippon Steel Corp X-ray exposure method and equipment for measuring stress in microregion
JP3519292B2 (en) 1998-11-13 2004-04-12 理学電機株式会社 X-ray diffraction measurement method for minute area and X-ray diffraction apparatus for minute area
JP2005351780A (en) 2004-06-11 2005-12-22 Rigaku Corp X-ray analyzer
JP5339253B2 (en) * 2009-07-24 2013-11-13 国立大学法人金沢大学 X-ray stress measurement method

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2259708A (en) * 1937-06-14 1941-10-21 Schiebold Ernst Testing materials by x-ray
US2462374A (en) * 1944-10-04 1949-02-22 Philips Lab Inc Stress analysis by x-ray diffraction
US4042825A (en) * 1976-07-09 1977-08-16 Colorado Seminary Stressed-unstressed standard for X-ray stress analysis and method of making same
US5741707A (en) * 1992-12-31 1998-04-21 Schlumberger Technology Corporation Method for quantitative analysis of earth samples
US6353656B1 (en) * 1998-07-24 2002-03-05 Technology For Energy Corporation Radioisotope based x-ray residual stress analysis apparatus
JP2005241308A (en) * 2004-02-24 2005-09-08 Railway Technical Res Inst X-ray diffraction device and x-ray diffraction system
US20120140888A1 (en) * 2010-12-06 2012-06-07 Hitachi-Ge Nuclear Energy, Ltd. X-ray diffraction instrument

Also Published As

Publication number Publication date
US20130044864A1 (en) 2013-02-21
JP2013040876A (en) 2013-02-28
EP2559993A2 (en) 2013-02-20
US8923480B2 (en) 2014-12-30
CA2785413A1 (en) 2013-02-18
JP5347001B2 (en) 2013-11-20

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Inventor name: HATOU, HISAMITU

Inventor name: KIKUCHI, TOSHIKAZU

Inventor name: WANG, YUN

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