EP2401237A1 - Corrosion inhibiting compositions - Google Patents
Corrosion inhibiting compositionsInfo
- Publication number
- EP2401237A1 EP2401237A1 EP09840896A EP09840896A EP2401237A1 EP 2401237 A1 EP2401237 A1 EP 2401237A1 EP 09840896 A EP09840896 A EP 09840896A EP 09840896 A EP09840896 A EP 09840896A EP 2401237 A1 EP2401237 A1 EP 2401237A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- acid
- corrosion inhibitor
- chelating agent
- corrosion
- film forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C22/05—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions
- C23C22/60—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using alkaline aqueous solutions with pH greater than 8
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/04—Aqueous dispersions
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F11/00—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
- C23F11/08—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F11/00—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
- C23F11/08—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
- C23F11/10—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids using organic inhibitors
Definitions
- the present invention relates to corrosion inhibiting compositions for metals and metal alloys in the presence of water, oxygen or high ionic activity aqueous or semi- aqueous solutions. More particularly, there is provided corrosion inhibiting compositions containing monomeric chelating agents which form 5-8 membered ring chelating structures with a base metal including iron and iron alloys, such as steel, together with a film forming polymeric chelating agent which are used with aqueous and/or organic solvents.
- Corrosion inhibitors are commonly found in cleaning and stripping compositions used in the semiconductor industries where various metals such as aluminum, aluminum alloys, titanium, titanium alloys, titanium/tungsten, tungsten, copper, etc are utilized.
- Oxidizing agents which form a protective film typically of metal oxide. None of the corrosion inhibitor types are effective for all mechanisms of corrosion or for all metal or metal alloys. Oxygen scavengers are not particularly effective at eliminating oxygen induced corrosion of iron or its alloys in the presence of an aqueous solution of high ionic character. Neither prior art corrosion inhibitors used in the semiconductor industry that are chelating agents or oxygen scavengers are effective in preventing corrosion of iron or carbon steel in the presence of water, oxygen or high ionic activity aqueous or semi-aqueous solutions.
- Patent No. 3,996,147 to Settineri et al discloses the use of sulfonium corrosion inhibitors which inhibit corrosion of metal surfaces, particularly ferrous and cuprous metal surfaces in aqueous acid solutions alone or in combination with other chelating agents such as an aminocarboxylic acid, for example, ethylene diaminetetraacetic acid (EDTA).
- EDTA ethylene diaminetetraacetic acid
- Patent No. 5,334,332 to Lee et al which is herein incorporated by reference discloses chelating agents and solvent systems which can be used with the inhibitors of the present invention.
- the reference does not disclose a film forming polymeric chelating agent.
- Patent Nos. 5,707,947 and 5,753,601 which are herein incorporated by reference, disclose phenol derivatives that adsorb onto or absorb into the surface of neutral (zero valent) metals and/or chelation of their anions with the oxidized cationic metal surface which reduces the dissolution rate of the oxidized surface.
- the present invention relates to corrosion inhibiting compositions and the methods for their use containing film forming polymeric chelating agents which form 5, 6, 7, or 8-membered ring structures with a transition metal, which is oxidizable to a single or multivalent stable state including surfaces of iron and iron alloys.
- the film forming polymeric chelating agents are neutralized to about neutral or caustic pH.
- a monomelic chelating agent there is included a monomelic chelating agent.
- the ratio of monomelic chelating agent to film forming agent is about 5: 1 to 1 : 5.
- the neutralizing agent is a sterically hindered amine or a non- metal hydroxide.
- a sterically hindered amine can also be used in combinations with a metal hydroxide base to obtain the desired pH.
- Use of a metal hydroxide base alone will provide inferior corrosion protection from the composition of the invention.
- an effective oxygen scavenger in the corrosion inhibiting compositions an effective oxygen scavenger.
- compositions which contain a monomelic chelating agent in combination with a film forming polymeric chelating agent that forms 5-8 membered rings with the metal atoms or surface metal elements of a transition metal or alloy which is oxidizable to a single or multivalent stable state including but not limited to iron and iron alloy surfaces.
- the preferred film forming polymeric chelating agent is one which forms a stable chelating ring, preferably of 5, 6, or 7-elements or atoms (such elements will typically include, but not limited to the atom of the metal substrate, C, O, N and others).
- film forming polymeric chelating agents which can be used include:
- Polyacrylic acids and co-polymers thereof such as polyacrylic-co-maleic acid (PACM) which are miscible with water and compatible with many polar solvents.
- PAM polyacrylic-co-maleic acid
- the monomelic chelating agents include the known multi (ie; 1-3) hydroxy phenols, (ie; catechol, pyrogallol, 1, 2 or 1, 8- di-hydroxy naphthalene, which form 5 or 6-membered rings, etc.) multi-functional aromatic acids and the multi-functional aliphatic carboxylic or amino acids, hemi mallitic acid and trimallitic acid and polymers and copolymers thereof.
- the above plus dianions of alpha or beta bifunctional aliphatic acids can chelate and form 6, 7, or 8-membered rings for example, malonic acid and EDTA.
- the ratio of monomelic chelating agents to film forming agents is about 5: 1 tol :5.
- Aromatic chelating agents include gallic acid, pyrogallol, catechol, o- benzodicarboxylic acid, benzoic acid, ammonium benzoate, phthalic anhydride, mallitic acid, tetramethyl ammonium gallate, and derivatives thereof, and the like.
- Multifunctinal aliphatic or non aromatic cyclic chelating agents include malonic acid, EDTA, CDTA, imino diacetic acid, maleic acid, malic acid, D,L-maleic acid, cyclohexanl 1,2-dicarboxylic acid and the like, form stable 6, 7 or 8 membered rings with the base metals at or about neutral or caustic pH.
- the preferred monomelic chelating agent is malonic acid which is also neutralized in the same manner as the polymeric chelating film formor.
- neutralization of the chelating agent can be performed with alkali or alkaline earth metal caustic such as barium, magnesium, sodium or potassium hydroxide, or an organic base
- alkali or alkaline earth metal caustic such as barium, magnesium, sodium or potassium hydroxide, or an organic base
- the strongest chelation occurs when the neutralizing base is a sterically hindered amine or a non-metal hydroxide such as triethanolamine (TEA) and tetramethylammonium hydroxide (TMAH) or other alkanolamines.
- TAA triethanolamine
- TMAH tetramethylammonium hydroxide
- a preferred method of neutralization is to partially neutralize with an alkali metal caustic such as NaOH or KOH and then complete the neutralization with a sterically hindered amine, or substituted ammonium hydroxide.
- an effective film forming chelation compound and a strong monomer chelation compound provide an effective corrosion inhibitor system.
- further effectiveness can be achieved by the addition of an oxygen scavenger.
- Some chelating agents are also oxygen scavengers. The most common oxygen scavengers are nitrates, sulfites, and hydroquinone.
- the oxygen scavengers include tetramethylaminosulfite (TMAS), tetramethylaminonitrite, alkali metal sulfite including sodium sulfite, and potassium sulfite, alkali metal nitrite including sodium nitrite and potassium nitrite, ammonium sulfite, ammonium nitrite, and the like.
- TMAS tetramethylaminosulfite
- alkali metal sulfite including sodium sulfite
- potassium sulfite alkali metal nitrite including sodium nitrite and potassium nitrite
- ammonium sulfite ammonium nitrite
- Other O 2 scavengers known include ascorbic acid, multi-hydroxy aromatics such as catechol, pyrogallol, hydroquinone, a hydroxyl-N-heterocyclic such as 8-hydroxyquinoline and others. Most preferred is hydroquinone.
- the corrosion inhibitors of the invention have been found to be particularly more advantageous in high ionic aqueous media than prior art corrosion inhibitors. They are especially more advantageous over previous inhibitors for iron and steel products. They are preferably used in compositions having a pH of 6.0 to 11.0.
- the inhibitors of the invention can be formulated with aqueous and semi-aqueous organic solvent systems in an amount of about 0.25 to 10% by weight of composition, preferably about 0.5 to 5%.
- the solvents and various co-solvents and cleaning compositions in which the corrosion inhibitors may be used are seen, for example, in U.S. Pat. No. 5,334,332 to Lee, U.S. Pat. Nos. 4,395,479; 4,428,871; and 4,401748 issued to Ward et al and U.S. Patent No. 5,308,745 issued to Schwartzkopf, which are herein incorporated by reference.
- Preferred solvents in the patents include water solutions of tetramethylammonium hydroxide (TMAH), various pyrrolidinone compounds such as N- methylpyrrolidnone (NMP), gamma-butyrolactone (BLO), diethyleneglycol monoalkyl ether, alkanolamines including monoethanolamine, triethanolamine (TEA), 2-amino-2- ethoxyethanol, polar solvents including alkylene glycol, poly-alkylene glycols, ethylenediamine, alkyl and dialkyl aliphatic amides such as DMAC and the like.
- TMAH tetramethylammonium hydroxide
- NMP N- methylpyrrolidnone
- BLO gamma-butyrolactone
- diethyleneglycol monoalkyl ether alkanolamines including monoethanolamine, triethanolamine (TEA), 2-amino-2- ethoxyethanol
- polar solvents including alkylene glycol,
- a typical lapping or slurry composition comprises; about 1-30% by weight of in situ formed aqueous or semi aqueous aluminum hydroxide,
- salt compounds selected from the group consisting of sodium or potassium sulfate, tetramethylammonium sulfate, tetraethylammonium sulfate and alkali or alkaline earth metal sulfate,
- a corrosion inhibitor comprising polyacrylic-co-maleic acid at a film forming average molecular weight of about 1500 or greater and malonic acid.
- the polyacrylic-co-maleic acid and malonic acid being present in a ratio of 5 : 1 to 1 :5,
- an oxygen scavenger can be included.
- Example 1 is illustrative of the invention and are not limited to the scope of the invention.
- a corrosion inhibitor composition of the invention was prepared by admixing the following:
- aqueous abrasive slurry, lapping, stripping and cleaning composition that may include triethanolamine (TEA), which is also a neutralizing base, and dissolved salts create a high ionic strength aqueous mixture.
- TAA triethanolamine
- Tests were conducted measuring the effect of the corrosion inhibitor system visually and by optical microscopy without an oxygen scavenger using carbon steel.
- the compositions were prepared by partially neutralizing the corrosion inhibitor with 1.0N sodium hydroxide and then bringing the pH to 8.5 with TEA.
- One half of sample strips of spring carbon steel were suspended into the test media comprising a 15% salt solution of neutralized aluminum sulfate for six hours at ambient temperature.
- the test pieces were rinsed with D.I. water and blown dry with nitrogen.
- the results were as follows: % Aqueous % Commercial Neutralized Corrosion
- Stripping and cleaning compositions for photoresists were prepared as follows with the corrosion inhibitor of Example 1 and tested according to Example 2.
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Dispersion Chemistry (AREA)
- Preventing Corrosion Or Incrustation Of Metals (AREA)
- Detergent Compositions (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Corrosion inhibiting composition for use in aqueous or semi-aqueous stripping, cleaning, abrasive lapping and abrasive slurry compositions that form 5, 6, 7, or 8- membered chelating rings with a base metal together with a film forming polymeric chelation agent. Optionally there is included an oxygen scavenger.
Description
CORROSION INHIBITING COMPOSITIONS
The present invention relates to corrosion inhibiting compositions for metals and metal alloys in the presence of water, oxygen or high ionic activity aqueous or semi- aqueous solutions. More particularly, there is provided corrosion inhibiting compositions containing monomeric chelating agents which form 5-8 membered ring chelating structures with a base metal including iron and iron alloys, such as steel, together with a film forming polymeric chelating agent which are used with aqueous and/or organic solvents.
Background off the Imvemfrioπi
Corrosion inhibitors are commonly found in cleaning and stripping compositions used in the semiconductor industries where various metals such as aluminum, aluminum alloys, titanium, titanium alloys, titanium/tungsten, tungsten, copper, etc are utilized.
The different functional classifications by which corrosion inhibitor compounds can be categorized are as follows:
1. Chelating agents
2. Reducing agents
3. Oxygen scavengers
4. Film forming agents
5. Oxidizing agents which form a protective film, typically of metal oxide. None of the corrosion inhibitor types are effective for all mechanisms of corrosion or for all metal or metal alloys. Oxygen scavengers are not particularly effective at
eliminating oxygen induced corrosion of iron or its alloys in the presence of an aqueous solution of high ionic character. Neither prior art corrosion inhibitors used in the semiconductor industry that are chelating agents or oxygen scavengers are effective in preventing corrosion of iron or carbon steel in the presence of water, oxygen or high ionic activity aqueous or semi-aqueous solutions.
Patent No. 3,996,147 to Settineri et al discloses the use of sulfonium corrosion inhibitors which inhibit corrosion of metal surfaces, particularly ferrous and cuprous metal surfaces in aqueous acid solutions alone or in combination with other chelating agents such as an aminocarboxylic acid, for example, ethylene diaminetetraacetic acid (EDTA).
Patent No. 5,334,332 to Lee et al, which is herein incorporated by reference discloses chelating agents and solvent systems which can be used with the inhibitors of the present invention. The reference does not disclose a film forming polymeric chelating agent.
Patent Nos. 5,707,947 and 5,753,601, which are herein incorporated by reference, disclose phenol derivatives that adsorb onto or absorb into the surface of neutral (zero valent) metals and/or chelation of their anions with the oxidized cationic metal surface which reduces the dissolution rate of the oxidized surface.
Summary off the Imventiom
The present invention relates to corrosion inhibiting compositions and the methods for their use containing film forming polymeric chelating agents which form 5,
6, 7, or 8-membered ring structures with a transition metal, which is oxidizable to a single or multivalent stable state including surfaces of iron and iron alloys. The film forming polymeric chelating agents are neutralized to about neutral or caustic pH.
Optionally, there is included a monomelic chelating agent.
The ratio of monomelic chelating agent to film forming agent is about 5: 1 to 1 : 5.
Advantageously, the neutralizing agent is a sterically hindered amine or a non- metal hydroxide. Such a sterically hindered amine can also be used in combinations with a metal hydroxide base to obtain the desired pH. Use of a metal hydroxide base alone will provide inferior corrosion protection from the composition of the invention.
Additionally, it is advantageous to include in the corrosion inhibiting compositions an effective oxygen scavenger.
It is a general object of the present invention to provide a corrosion inhibiting composition which can be used on a large variety of metal surfaces.
It is another object of the invention to provide a corrosion inhibiting composition containing chelating agents which form a 5, 6, 7, or 8-membered chelating rings with the atomic or surface metal elements or alloy.
It is yet another object of the invention to provide about neutral or alkaline cleaning, stripping and abrasive lapping compositions which contain corrosion inhibitors including a film forming chelating agent.
It is still another object of the invention to provide corrosion inhibitors for lapping, polishing (as in chemical mechanical polishing/planarization) and wire cutting systems that employ abrasive slurries and cleaners.
Description of the Preferred Embodiments
There is provided corrosion inhibiting compositions which contain a monomelic chelating agent in combination with a film forming polymeric chelating agent that forms 5-8 membered rings with the metal atoms or surface metal elements of a transition metal or alloy which is oxidizable to a single or multivalent stable state including but not limited to iron and iron alloy surfaces. The preferred film forming polymeric chelating agent is one which forms a stable chelating ring, preferably of 5, 6, or 7-elements or atoms (such elements will typically include, but not limited to the atom of the metal substrate, C, O, N and others). Examples of film forming polymeric chelating agents which can be used include:
1. Poly ortho-di or trihydroxyl, carboxy or sulfoxy aromatic compounds, for example novolacs, poly o-di or tricarboxylic acid styrenes, resoles, and
2. Polyacrylic acids and co-polymers thereof such as polyacrylic-co-maleic acid (PACM) which are miscible with water and compatible with many polar solvents.
The monomelic chelating agents include the known multi (ie; 1-3) hydroxy phenols, (ie; catechol, pyrogallol, 1, 2 or 1, 8- di-hydroxy naphthalene, which form 5 or 6-membered rings, etc.) multi-functional aromatic acids and the multi-functional aliphatic carboxylic or amino acids, hemi mallitic acid and trimallitic acid and polymers and copolymers thereof. The above plus dianions of alpha or beta bifunctional aliphatic acids can chelate and form 6, 7, or 8-membered rings for example, malonic acid and EDTA.. The ratio of monomelic chelating agents to film forming agents is about 5: 1 tol :5.
Aromatic chelating agents include gallic acid, pyrogallol, catechol, o- benzodicarboxylic acid, benzoic acid, ammonium benzoate, phthalic anhydride, mallitic acid, tetramethyl ammonium gallate, and derivatives thereof, and the like.
Other chelating agents glutaric acid which forms an 8-membered ring and compounds of the general formulas:
1. HO2C - (CH2)H - CO2H wherein n is 0-3
2. HO2C - (NH2)D - CO2H wherein n is 1-3
3. HO2C - (SH)n - CO2H wherein n is 1-3
4. HO2C - CH2 - NH - (CH2)n - CO2H wherein n is O or 1
5. H2N - (CHR)n - CO2H wherein n is 1 -4 and R is hydrogen, alkyl of 1-4 carbon atoms, alkylene of 1-4 carbon atoms, aryl or benzo.
6. HO2 - (CHR)n - SH - CO2H wherein R is hydrogen or alkyl and n is 1-3
Multifunctinal aliphatic or non aromatic cyclic chelating agents include malonic acid, EDTA, CDTA, imino diacetic acid, maleic acid, malic acid, D,L-maleic acid, cyclohexanl 1,2-dicarboxylic acid and the like, form stable 6, 7 or 8 membered rings with the base metals at or about neutral or caustic pH. The preferred monomelic chelating agent is malonic acid which is also neutralized in the same manner as the polymeric chelating film formor.
Although neutralization of the chelating agent can be performed with alkali or alkaline earth metal caustic such as barium, magnesium, sodium or potassium hydroxide, or an organic base, the strongest chelation occurs when the neutralizing base is a sterically hindered amine or a non-metal hydroxide such as triethanolamine (TEA) and tetramethylammonium hydroxide (TMAH) or other alkanolamines. In this manner, the counter positive ion of the neutralizing base is large and bulky, not allowing for the close proximity to the negatively charged polymer or monomelic agent. This means that the negative charge on the polymer or monomelic agent is more isolated from the positive counter ion and is more available for the formation of a strong chelation bond with the base metal. A preferred method of neutralization is to partially neutralize with an alkali metal caustic such as NaOH or KOH and then complete the neutralization with a sterically hindered amine, or substituted ammonium hydroxide.
To prevent the corrosion of iron and iron alloys, the combination of an effective film forming chelation compound and a strong monomer chelation compound provide an effective corrosion inhibitor system. However, further effectiveness can be achieved by the addition of an oxygen scavenger. Some chelating agents are also oxygen scavengers. The most common oxygen scavengers are nitrates, sulfites, and hydroquinone. The oxygen scavengers include tetramethylaminosulfite (TMAS), tetramethylaminonitrite, alkali metal sulfite including sodium sulfite, and potassium sulfite, alkali metal nitrite including sodium nitrite and potassium nitrite, ammonium sulfite, ammonium nitrite, and the like. Other O2 scavengers known include ascorbic acid, multi-hydroxy aromatics such as catechol, pyrogallol, hydroquinone, a hydroxyl-N-heterocyclic such as
8-hydroxyquinoline and others. Most preferred is hydroquinone. The oxygen scavengers can be utilized in an amount of about 0.1 to 50% of the total inhibitor composition.
The corrosion inhibitors of the invention have been found to be particularly more advantageous in high ionic aqueous media than prior art corrosion inhibitors. They are especially more advantageous over previous inhibitors for iron and steel products. They are preferably used in compositions having a pH of 6.0 to 11.0.
The inhibitors of the invention can be formulated with aqueous and semi-aqueous organic solvent systems in an amount of about 0.25 to 10% by weight of composition, preferably about 0.5 to 5%. The solvents and various co-solvents and cleaning compositions in which the corrosion inhibitors may be used are seen, for example, in U.S. Pat. No. 5,334,332 to Lee, U.S. Pat. Nos. 4,395,479; 4,428,871; and 4,401748 issued to Ward et al and U.S. Patent No. 5,308,745 issued to Schwartzkopf, which are herein incorporated by reference. Preferred solvents in the patents include water solutions of tetramethylammonium hydroxide (TMAH), various pyrrolidinone compounds such as N- methylpyrrolidnone (NMP), gamma-butyrolactone (BLO), diethyleneglycol monoalkyl ether, alkanolamines including monoethanolamine, triethanolamine (TEA), 2-amino-2- ethoxyethanol, polar solvents including alkylene glycol, poly-alkylene glycols, ethylenediamine, alkyl and dialkyl aliphatic amides such as DMAC and the like.
A typical lapping or slurry composition comprises; about 1-30% by weight of in situ formed aqueous or semi aqueous aluminum hydroxide,
about 1 to 30% by weight of salt compounds selected from the group consisting of sodium or potassium sulfate, tetramethylammonium sulfate, tetraethylammonium sulfate and alkali or alkaline earth metal sulfate,
about 0.25 to 10% by weight of a corrosion inhibitor comprising polyacrylic-co-maleic acid at a film forming average molecular weight of about 1500 or greater and malonic acid. The polyacrylic-co-maleic acid and malonic acid being present in a ratio of 5 : 1 to 1 :5,
about 1-50% by weight of an abrasive material, the remainder being water.
Optionally, an oxygen scavenger can be included.
The following Examples are illustrative of the invention and are not limited to the scope of the invention.
Example 1
A corrosion inhibitor composition of the invention was prepared by admixing the following:
Ingredient Pants by Weight
Polyacrylic acid - co-maleic acid (PACM) 1.00
(mols. Wt. 1500)
Malonic acid 1.00
Hydroquinone 0.25
0.5 to 5% by weight of the corrosion inhibitors can be added to an aqueous abrasive slurry, lapping, stripping and cleaning composition that may include triethanolamine (TEA), which is also a neutralizing base, and dissolved salts create a high ionic strength aqueous mixture.
Example 2
Tests were conducted measuring the effect of the corrosion inhibitor system visually and by optical microscopy without an oxygen scavenger using carbon steel. The compositions were prepared by partially neutralizing the corrosion inhibitor with 1.0N sodium hydroxide and then bringing the pH to 8.5 with TEA. One half of sample strips of spring carbon steel were suspended into the test media comprising a 15% salt solution of neutralized aluminum sulfate for six hours at ambient temperature. At the end of the time the test pieces were rinsed with D.I. water and blown dry with nitrogen. The results were as follows:
% Aqueous % Commercial Neutralized Corrosion
Salt SoIutioE % MaIonk % PACM Ferrous CJ. to pH Results
15 0.5 0.5 8.5 No Corrosion
15 0.75 1.5 8.5 No Corrosion
15 1 2 8.5 No Corrosion
15 1.25 1.25 8.5 No Corrosion
15 1.5 0.75 8.5 No Corrosion
15 - DeCore BEPS 8.5 Visual Surface
1- 2% Etching
15 - - Colacor-400 ~ -8.0 Significant Surface 0.05-0.5% Corrosion
15 - - DeCore -APCI-95 - -8.0 Significant Surface
1-2% Corrosion
15 - - DeCore -1MT 100LF ~ 8.0 Significant Surface 0.2-.05% Corrosion
15 - DeTrope CA-100 - 8.0 Surface Corrosion 1-2% Visual
Example 3
Stripping and cleaning compositions for photoresists were prepared as follows with the corrosion inhibitor of Example 1 and tested according to Example 2.
Ingredient Wt. % Wt. % Corrosion Corrosion on a Ferrous
Inhibitor Steel Surface
1. Triethanol amine 90 1.5 None
Water 10
2. Triethanol amine 30 1.5 None
Water 50
Ethylene glycol 20
Monoethyl ether
3. Polyethylene glycol 50 1.5 None
Water 50 (neutralized w/NaOH)
4. N-methylpyrrolidinone 45 1.5 None
Water 40
Sulfolane 15
5. Hydroxylamine 30 1.5 None (50% aq. solution) 2-amino-2-ethoxyethanol 20 Water 50
6. DMAc 55 1.5 None
MEA 15
Water 30
7. Water 70 1.5 None
TEA 10
50% H.A. aq. 20
Claims
1. A corrosion inhibitor for use in an aqueous or semi-aqueous solvent system which consists of; a) a monomelic chelating agent selected from the group consisting of a multifunctional aromatic acid, multifunctional aromatic anhydride, multifunctional aliphatic acid, multi-functional aliphatic anhydride, aromatic or aliphatic amino acids, aromatic or aliphatic di or tri-amines and b) an acidic film forming polymeric chelating agent which forms a 5, 6, or 7- membered chelating ring with a metal surface of a transition metal which is oxidizable to a single or multivalent stable state, said corrosion inhibitor being neutralized or partially neutralized; whereby said corrosion inhibitor forms a 5-7 member chelating ring with said metal surface.
2. The corrosion inhibitor of claim 1 including an oxygen scavenger.
3. The corrosion inhibitor of claim 2 in which said oxygen scavenger is selected from the group consisting of 8-hydroxyquinoline, ascorbic acid, aliphatic alkanol amines, N, N-dialkyl hydroxylamine, hydroquinone, o-dihydroxy or o-trihydroxy substituted aromatic_compounds, alkali metal sulfite, alkali metal nitrite and tetramethyl ammonium sulfite or nitrile.
4. The corrosion inhibitor of claim 1 wherein said monomelic chelating agent is selected from the group consisting of malonic acid, oxalic acid, maleic acid, malic acid, o-aminobenzoic acid, gallic acid, phthalic cid, oxamic acid, ammonium benzoateΛ catechol, pyrogallol and iminodiacetic acid.
5. The corrosion inhibitor of claim 1 wherein the film forming polymeric chelating agent is selected from the group consisting of polymers or co-polymers of o-di-or tri- hydroxyl, carboxy or sulfoxy aromatic compounds, poly o-di or tri-carboxylic acid styrenes and acrylic acids and maleic acid.
6. The corrosion inhibitor of claim 5 wherein said film forming polymeric chelating agent is a novolac.
7. The corrosion inhibitor of claim 1 wherein said film forming polymer chelating agent is polyacrylic acid-co-maleic acid or polyacrylic acid or polymaleic acid.
8. The corrosion inhibitor of claim 1 which is neutralized with a sterically hindered amine or tetraalkyl ammonium hydroxide.
9. The corrosion inhibitor of claim 8 which is partially neutralized with an alkali metal hydroxide.
10. In a stripping, cleaning, lapping or abrasive slurry suspension composition, the improvement which comprises about 1 to 10% by weight of the inhibitor of claim 1 in said composition.
11. In a stripping, cleaning, lapping, polishing or cutting slurry suspension composition for an iron or steel surface, the improvement which comprises including the corrosion inhibitor of claim 1.
12. A cleaning, lapping and slurry suspension composition consisting of; o About 95-99.9% by weight of said cleaning, lapping and slurry suspension composition, o About 0.1% to 5% by weight of a corrosion inhibitor comprising polyacrylic acid-co-maleic acid and malonic acid, or polyacrylic acid-co-maleic acid and oxalic acid being present.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/US2009/001197 WO2010098734A1 (en) | 2009-02-26 | 2009-02-26 | Corrosion inhibiting compositions |
Publications (1)
Publication Number | Publication Date |
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EP2401237A1 true EP2401237A1 (en) | 2012-01-04 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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EP09840896A Withdrawn EP2401237A1 (en) | 2009-02-26 | 2009-02-26 | Corrosion inhibiting compositions |
Country Status (6)
Country | Link |
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EP (1) | EP2401237A1 (en) |
JP (1) | JP2012519234A (en) |
KR (1) | KR20110135894A (en) |
CN (1) | CN102026931A (en) |
SG (1) | SG173426A1 (en) |
WO (1) | WO2010098734A1 (en) |
Families Citing this family (6)
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CN105980483A (en) * | 2014-02-12 | 2016-09-28 | 共同印刷株式会社 | Oxygen-absorbing resin composition and oxygen-absorbing film |
KR102416071B1 (en) * | 2014-12-12 | 2022-07-06 | 삼성전자주식회사 | Electronic device for chagring and method for controlling power in electronic device for chagring |
US10619056B2 (en) | 2015-09-03 | 2020-04-14 | Ppg Industries Ohio, Inc. | Corrosion inhibitors and coating compositions containing the same |
CN107057667B (en) * | 2017-04-28 | 2020-04-21 | 中国石油天然气集团公司 | Modified phenolic crosslinking agent and preparation method and application thereof |
CN107694762B (en) * | 2017-11-10 | 2019-07-02 | 中南大学 | A kind of composition and method for floating of the flotation collecting rutile from ore |
CN112501617B (en) * | 2020-11-12 | 2021-11-23 | 陕西科技大学 | Double-hydrophobic-chain modified L-histidine corrosion inhibitor and preparation method and application thereof |
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JPH0497152A (en) * | 1990-08-09 | 1992-03-30 | Kansai Paint Co Ltd | Method for forming pattern from photopolymerizable composition |
US5279771A (en) * | 1990-11-05 | 1994-01-18 | Ekc Technology, Inc. | Stripping compositions comprising hydroxylamine and alkanolamine |
JP3160344B2 (en) * | 1991-01-25 | 2001-04-25 | アシュランド インコーポレーテッド | Organic stripping composition |
US5709756A (en) * | 1996-11-05 | 1998-01-20 | Ashland Inc. | Basic stripping and cleaning composition |
JP3827141B2 (en) * | 1998-01-27 | 2006-09-27 | ロード コーポレーション | Water-based primer or paint |
JP2000252243A (en) * | 1998-12-28 | 2000-09-14 | Hitachi Chem Co Ltd | Polishing liquid for metal and polishing method using the same |
US6828289B2 (en) * | 1999-01-27 | 2004-12-07 | Air Products And Chemicals, Inc. | Low surface tension, low viscosity, aqueous, acidic compositions containing fluoride and organic, polar solvents for removal of photoresist and organic and inorganic etch residues at room temperature |
US6649138B2 (en) * | 2000-10-13 | 2003-11-18 | Quantum Dot Corporation | Surface-modified semiconductive and metallic nanoparticles having enhanced dispersibility in aqueous media |
US7427361B2 (en) * | 2003-10-10 | 2008-09-23 | Dupont Air Products Nanomaterials Llc | Particulate or particle-bound chelating agents |
US7288021B2 (en) * | 2004-01-07 | 2007-10-30 | Cabot Microelectronics Corporation | Chemical-mechanical polishing of metals in an oxidized form |
DE102004012078A1 (en) * | 2004-03-12 | 2005-09-29 | Werner Kammann Maschinenfabrik Gmbh & Co. Kg | Device for feeding and removing objects to and from a machine for decorating the same |
US20070243372A1 (en) * | 2006-04-13 | 2007-10-18 | Mowrey Douglas H | Aqueous adhesive |
JP4710915B2 (en) * | 2008-02-08 | 2011-06-29 | 日立化成工業株式会社 | Polishing method |
-
2009
- 2009-02-26 KR KR1020107026289A patent/KR20110135894A/en not_active Application Discontinuation
- 2009-02-26 JP JP2011552005A patent/JP2012519234A/en active Pending
- 2009-02-26 CN CN200980114371XA patent/CN102026931A/en active Pending
- 2009-02-26 SG SG2010077907A patent/SG173426A1/en unknown
- 2009-02-26 WO PCT/US2009/001197 patent/WO2010098734A1/en active Application Filing
- 2009-02-26 EP EP09840896A patent/EP2401237A1/en not_active Withdrawn
Non-Patent Citations (1)
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See references of WO2010098734A1 * |
Also Published As
Publication number | Publication date |
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SG173426A1 (en) | 2011-09-29 |
CN102026931A (en) | 2011-04-20 |
JP2012519234A (en) | 2012-08-23 |
WO2010098734A1 (en) | 2010-09-02 |
KR20110135894A (en) | 2011-12-20 |
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