EP2351170A4 - Method and apparatus for laser control in a two chamber gas discharge laser - Google Patents

Method and apparatus for laser control in a two chamber gas discharge laser

Info

Publication number
EP2351170A4
EP2351170A4 EP09822307.6A EP09822307A EP2351170A4 EP 2351170 A4 EP2351170 A4 EP 2351170A4 EP 09822307 A EP09822307 A EP 09822307A EP 2351170 A4 EP2351170 A4 EP 2351170A4
Authority
EP
European Patent Office
Prior art keywords
laser
gas discharge
chamber gas
control
laser control
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP09822307.6A
Other languages
German (de)
French (fr)
Other versions
EP2351170A1 (en
Inventor
Robert N Jacques
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Cymer LLC
Original Assignee
Cymer Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US12/255,347 external-priority patent/US7756171B2/en
Priority claimed from US12/255,367 external-priority patent/US7720120B2/en
Priority claimed from US12/255,385 external-priority patent/US7751453B2/en
Application filed by Cymer Inc filed Critical Cymer Inc
Publication of EP2351170A1 publication Critical patent/EP2351170A1/en
Publication of EP2351170A4 publication Critical patent/EP2351170A4/en
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70025—Production of exposure light, i.e. light sources by lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H01S3/0057—Temporal shaping, e.g. pulse compression, frequency chirping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/102—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
    • H01S3/104—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2308—Amplifier arrangements, e.g. MOPA
    • H01S3/2325—Multi-pass amplifiers, e.g. regenerative amplifiers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/034—Optical devices within, or forming part of, the tube, e.g. windows, mirrors
EP09822307.6A 2008-10-21 2009-10-20 Method and apparatus for laser control in a two chamber gas discharge laser Withdrawn EP2351170A4 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US12/255,347 US7756171B2 (en) 2008-10-21 2008-10-21 Method and apparatus for laser control in a two chamber gas discharge laser
US12/255,367 US7720120B2 (en) 2008-10-21 2008-10-21 Method and apparatus for laser control in a two chamber gas discharge laser
US12/255,385 US7751453B2 (en) 2008-10-21 2008-10-21 Method and apparatus for laser control in a two chamber gas discharge laser
PCT/US2009/005694 WO2010047771A1 (en) 2008-10-21 2009-10-20 Method and apparatus for laser control in a two chamber gas discharge laser

Publications (2)

Publication Number Publication Date
EP2351170A1 EP2351170A1 (en) 2011-08-03
EP2351170A4 true EP2351170A4 (en) 2013-04-10

Family

ID=42119575

Family Applications (1)

Application Number Title Priority Date Filing Date
EP09822307.6A Withdrawn EP2351170A4 (en) 2008-10-21 2009-10-20 Method and apparatus for laser control in a two chamber gas discharge laser

Country Status (5)

Country Link
EP (1) EP2351170A4 (en)
JP (2) JP2012506634A (en)
KR (1) KR101742715B1 (en)
TW (1) TWI389409B (en)
WO (1) WO2010047771A1 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012506634A (en) * 2008-10-21 2012-03-15 サイマー インコーポレイテッド Method and apparatus for laser control in a two-chamber gas discharge laser
US10816905B2 (en) * 2015-04-08 2020-10-27 Cymer, Llc Wavelength stabilization for an optical source
US11081852B2 (en) * 2017-04-24 2021-08-03 Cymer, Llc Laser light energy and dose control using repetition rate based gain estimators
US10096969B1 (en) * 2017-09-14 2018-10-09 Cymer, Llc Method for dither free adaptive and robust dose control for photolithography
CN115224581B (en) * 2021-04-15 2024-04-05 北京科益虹源光电技术有限公司 Energy compensation method and device for laser
CN113783100B (en) * 2021-05-31 2023-04-11 北京科益虹源光电技术有限公司 Energy compensation method and device of laser

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020141470A1 (en) * 2001-03-21 2002-10-03 Kiyoharu Nakao Injection locking type or MOPA type of laser device
US20030234854A1 (en) * 2002-06-19 2003-12-25 Nikon Corporation Laser beam source control method and unit, exposure method and apparatus, and device manufacturing method
WO2004012308A2 (en) * 2002-07-31 2004-02-05 Cymer, Inc. Control system for a two chamber gas discharge laser
US20050226300A1 (en) * 2004-03-31 2005-10-13 Steiger Thomas D Very high repetition rate narrow band gas discharge laser system
US20060146900A1 (en) * 2001-08-29 2006-07-06 Cymer, Inc. Multi-chamber gas discharge laser bandwidth control through discharge timing

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2293730B (en) * 1994-09-28 1998-08-05 Roke Manor Research Apparatus for use in equipment providing a digital radio link between a fixed and a mobile radio unit
US5835520A (en) * 1997-04-23 1998-11-10 Cymer, Inc. Very narrow band KrF laser
EP1019992B1 (en) * 1997-10-10 2006-06-14 Cymer, Inc. Pulse energy control for excimer laser
US6154681A (en) * 1998-04-03 2000-11-28 Johnson Controls Technology Company Asynchronous distributed-object building automation system with support for synchronous object execution
US6693939B2 (en) * 2001-01-29 2004-02-17 Cymer, Inc. Laser lithography light source with beam delivery
US6963595B2 (en) * 2001-08-29 2005-11-08 Cymer, Inc. Automatic gas control system for a gas discharge laser
US6999492B2 (en) * 2002-11-20 2006-02-14 Lambda Physik Ag Reduced-maintenance excimer laser with oil-free solid state pulser
JP2004288674A (en) * 2003-03-19 2004-10-14 Fuji Xerox Co Ltd Surface-emitting semiconductor laser and optical communication system using it
EP1743405A4 (en) * 2003-07-30 2009-11-11 Tcz Pte Ltd Very high energy, high stability gas discharge laser surface treatment system
JP4229275B2 (en) * 2003-10-20 2009-02-25 株式会社小松製作所 Two-stage ArF excimer laser equipment for exposure
US7471708B2 (en) * 2005-03-31 2008-12-30 Cymer, Inc. Gas discharge laser output light beam parameter control
JP5202315B2 (en) * 2005-08-09 2013-06-05 サイマー インコーポレイテッド Bandwidth control of multi-chamber gas discharge laser by discharge timing
JP2012506634A (en) * 2008-10-21 2012-03-15 サイマー インコーポレイテッド Method and apparatus for laser control in a two-chamber gas discharge laser

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020141470A1 (en) * 2001-03-21 2002-10-03 Kiyoharu Nakao Injection locking type or MOPA type of laser device
US20060146900A1 (en) * 2001-08-29 2006-07-06 Cymer, Inc. Multi-chamber gas discharge laser bandwidth control through discharge timing
US20030234854A1 (en) * 2002-06-19 2003-12-25 Nikon Corporation Laser beam source control method and unit, exposure method and apparatus, and device manufacturing method
WO2004012308A2 (en) * 2002-07-31 2004-02-05 Cymer, Inc. Control system for a two chamber gas discharge laser
US20050226300A1 (en) * 2004-03-31 2005-10-13 Steiger Thomas D Very high repetition rate narrow band gas discharge laser system

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of WO2010047771A1 *

Also Published As

Publication number Publication date
EP2351170A1 (en) 2011-08-03
TWI389409B (en) 2013-03-11
JP2012506634A (en) 2012-03-15
JP2015111718A (en) 2015-06-18
WO2010047771A1 (en) 2010-04-29
KR101742715B1 (en) 2017-06-01
KR20110086020A (en) 2011-07-27
TW201023462A (en) 2010-06-16

Similar Documents

Publication Publication Date Title
EP2133134A4 (en) Apparatus and method for treating discharge gas
EP2127728A4 (en) Method and apparatus for treating discharge gas
TWI365948B (en) Method and apparatus for controlling gas flow to a processing chamber
EP1984975A4 (en) Method and apparatus for producing plasma
EP2229465A4 (en) Method and apparatus for generating plasma
EP2004358A4 (en) Apparatus and method for welding
EP2212017A4 (en) Gas generation dispenser apparatus and method for on-demand fluid delivery
SG10201705046SA (en) Methods and apparatus for dual confinement and ultra-high pressure in an adjustable gap plasma chamber
GB0720655D0 (en) Method and apparatus for welding
EP2176929A4 (en) Method and apparatus for pulsed harmonic ultraviolet lasers
EP2328389A4 (en) Plasma temperature control apparatus and plasma temperature control method
EP2208881A4 (en) Fuel supply apparatus and fuel supply method
EP2082824A4 (en) Plasma cutting method, and plasma cutting apparatus
EP2001044A4 (en) Plasma generating apparatus and plasma generating method
GB2471280B (en) Apparatus and method for introducing a gas into a liquid
IL210700A (en) Method and apparatus for supplying gas from a multi- container system
GB2467276B (en) Apparatus and method for achieving a reduction in outgassing
TWI372189B (en) Apparatus and method for controlling plasma potential
EP2093009A4 (en) Method for controlling arc welding and arc welding apparatus
EP2033258A4 (en) Method and apparatus for controlling battery
PL2353347T3 (en) Device and method for producing and/or confining a plasma
GB0720650D0 (en) Method and apparatus for welding
GB0706287D0 (en) A laser method and apparatus
EP2351170A4 (en) Method and apparatus for laser control in a two chamber gas discharge laser
IL184280A0 (en) Apparatus and method for auto-titrating a laser

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 20110517

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO SE SI SK SM TR

DAX Request for extension of the european patent (deleted)
A4 Supplementary search report drawn up and despatched

Effective date: 20130312

RIC1 Information provided on ipc code assigned before grant

Ipc: H01S 3/13 20060101AFI20130306BHEP

Ipc: H01S 3/104 20060101ALI20130306BHEP

RIN1 Information on inventor provided before grant (corrected)

Inventor name: JACQUES, ROBERT, N.

17Q First examination report despatched

Effective date: 20130905

RAP1 Party data changed (applicant data changed or rights of an application transferred)

Owner name: CYMER, LLC

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN

18D Application deemed to be withdrawn

Effective date: 20200211