EP2334599A1 - Method for producing neopentasilanes - Google Patents
Method for producing neopentasilanesInfo
- Publication number
- EP2334599A1 EP2334599A1 EP09783870A EP09783870A EP2334599A1 EP 2334599 A1 EP2334599 A1 EP 2334599A1 EP 09783870 A EP09783870 A EP 09783870A EP 09783870 A EP09783870 A EP 09783870A EP 2334599 A1 EP2334599 A1 EP 2334599A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- neopentasilanes
- ether compounds
- general formula
- thf
- producing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/04—Hydrides of silicon
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
Definitions
- the invention relates to a process for the preparation of neopentasilanes from polysilanes in the presence of ether compounds.
- Neopentasilanes tetrakis (silyl) silanes are used for the deposition of Si-C in CVD processes.
- neopentasilanes The preparation of neopentasilanes is described in WO 20080513281. There, hexahalodisilane is reacted with tertiary amines as catalysts to give mixtures containing tetrakis (trihalosilyl) silane. The tetrakis (trihalosilyl) silane is reduced to tetrakis (silyl) silane with diisobutylaluminum hydride, which suffers from the disadvantage that tertiary amines are often corrosive and must be handled with care, and traces of nitrogen also affect the semiconducting properties of silicon In many applications, therefore, the content of nitrogen is specified.
- the invention relates to a process for the preparation of neopentasilanes of the general formula (1)
- Ether compounds (E) are readily available and easily separated chemicals.
- Preferred ether compounds (E) are cyclic organic ether compounds which preferably have at least 5 ring atoms and preferably at most 30 ring atoms, such as 1,3-dioxolane, tetrahydrofuran, tetrahydropyran, tetrahydropyran, 1,4-dioxane, [12] crown-4, [15 ] crown-fifth
- the cyclic ether compounds (E) may have hydrocarbon substituents, in particular alkyl radicals having 1 to 6 carbon atoms, preferably methyl and ethyl.
- substituted cyclic ether compounds (E) are 4-methyl-1,3-dioxolane, 3-methyl-tetrahydrofuran, 2, 2-dimethyl-1,4-dioxane.
- linear or branched organic ether compounds (E) such as mono- and polyethers.
- Preferred monoethers are ethers having a boiling point of at least 60 ° C. at 1 bar, for example di-n-propyl ether.
- Polyethers which can also be used are polyalkylene glycols, such as polyethylene glycol and polypropylene glycol.
- the average molar masses Mn of the polyalkylene glycols are preferably at least 150, in particular at least 500 and preferably at most 10000, in particular at most 5000.
- neopentasilane of the general formula (1) can have identical or different meanings of R in one molecule.
- all R have the same meanings. Particularly preferred are the meanings H and Cl.
- x is preferably 0 or 1.
- the reaction is preferably carried out at least -5 0 C, more preferably at least 50 ° C and in particular at least 100 0 C, and preferably at most 300 0 C, in particular at most 25O 0 C.
- the reaction is preferably carried out for at least 1 hour, more preferably at least 3 hours and in particular at least 10 hours and preferably at most 10 days,
- silicon compound of the general formula (2) On 100 parts by weight of silicon compound of the general formula (2) are preferably at least 0.1, more preferably at least 0.5 and especially at least 2 parts by weight of ether compounds (E), and preferably at most 50, more preferably at most 20 and in particular at most 10 parts by weight of ether compounds (E), used.
- the reaction mixture is preferably separated by distillation after the reaction. This can be done either under normal pressure, overpressure or reduced pressure.
- the reaction may be carried out in the presence or absence of inert gas, such as nitrogen, helium or argon; but it can also be carried out in air, as long as the moisture content is a maximum of 10 ppbw.
- inert gas such as nitrogen, helium or argon
- the distillation is preferably carried out in the presence of nitrogen.
- the examples below are carried out at a pressure of the surrounding atmosphere, ie at about 1000 hPa, and at room temperature, ie at about 23 ° C. and at a relative atmospheric humidity of about 50%.
- the content of impurities was determined by gas chromatography.
- Example 3 For this experiment were added about 5 g of hexachlorodisilane and about I g catalyst in a mutually vers ⁇ hraubtes steel tube and heated in an oil bath at 170 0 C.
- the investigated catalysts were ⁇ 15 -Crown- 5 98%, 1, 4, 10, 13 -pentaossacidopentadecano (crown ethers)
- THP Formation of a mixture of oligochlorosilanes analogous to Example 3 and solid.
- Example 3 The investigations were carried out as described in Example 3 in a steel tube at 100 or 150 0 C for 1.3 days.
Abstract
The invention relates to a method for producing neopentasilanes of the general formula (1) Si (SiR3) 4 (1), wherein silicon compounds of the general formula (2) R3Si-(Si-)xSiR3 (2), wherein R is selected from H, Cl, Br, and I and x stands for a nonnegative integer up to 5, are reacted in the presence of ether compounds (E).
Description
Verfahren zur Herstellung von Neopentasilanen Process for the preparation of neopentasilanes
Die Erfindung betrifft ein Verfahren zur Herstellung von Neopentasilanen aus Polysilanen in Gegenwart von Etherverbindun- gen.The invention relates to a process for the preparation of neopentasilanes from polysilanes in the presence of ether compounds.
Neopentasilane (Tetrakis (silyl) silane) werden für die Abscheidung von Si-C in CVD-Verfahren eingesetzt.Neopentasilanes (tetrakis (silyl) silanes) are used for the deposition of Si-C in CVD processes.
Die Herstellung von Neopentasilanen ist in WO 20080513281 beschrieben. Dort wird Hexahalodisilan mit tertiären Aminen als Katalysatoren zu Gemischen enthaltend Tetrakis (trihalosilyl) ~ silan umgesetzt. Das Tetrakis (trihalosilyl} silan wird mit Dii- sobutylaluminiumhydrid zu Tetrakis (silyl) silan reduziert. Das Verfahren weist den Nachteil auf, dass tertiäre Amine häufig korrosiv sind und deshalb mit Sorgfalt gehandhabt werden müssen. Außerdem beeinflussen Spuren von Stickstoff die halbleitenden Eigenschaften von Silizium, bei vielen Anwendungen ist daher der Gehalt an Stickstoff spezifiziert.The preparation of neopentasilanes is described in WO 20080513281. There, hexahalodisilane is reacted with tertiary amines as catalysts to give mixtures containing tetrakis (trihalosilyl) silane. The tetrakis (trihalosilyl) silane is reduced to tetrakis (silyl) silane with diisobutylaluminum hydride, which suffers from the disadvantage that tertiary amines are often corrosive and must be handled with care, and traces of nitrogen also affect the semiconducting properties of silicon In many applications, therefore, the content of nitrogen is specified.
Gegenstand der Erfindung ist ein Verfahren zur Herstellung von Neopentasilanen der allgemeinen Formel (1)The invention relates to a process for the preparation of neopentasilanes of the general formula (1)
Si(SiR3)4 (1) ,Si (SiR 3 ) 4 (1),
bei dem bei dem Siliciumverbindungen der allgemeinen Formel (2)in which silicon compounds of the general formula (2)
R3Si- (Si-)xSiR3 (2) ,R 3 Si (Si) x SiR 3 (2),
wobei R ausgewählt wird aus H, Cl, Br und J und x eine nichtnegative ganze Zahl bis 5 bedeutet, in Gegenwart von Etherverbindungen (E) umgesetzt werden.
Etherverbindungen (E) sind leicht zugängliche und leicht abzutrennende Chemikalien.wherein R is selected from H, Cl, Br and J and x is a nonnegative integer to 5, in the presence of ether compounds (E) are reacted. Ether compounds (E) are readily available and easily separated chemicals.
Bevorzugte Etherverbindungen (E) sind cyclische organische Etherverbindungen, die vorzugsweise mindestens 5 Ringatome und vorzugsweise höchstens 30 Ringatome aufweisen, wie 1,3- Dioxolan, Tetrahydrofuran, Tetrahydropyran, Tetrahydropyran, 1,4-Dioxan, [12]Krone-4, [15]Krone-5. Die cyclischen Etherverbindungen (E) können Kohlenwasserstoffsubtituenten aufweisen, insbesondere Alkylreste mit 1 bis 6 Kohlenstofatomen, bevorzugt Methyl und Ethyl . Beispiele für substituierte cyclische Etherverbindungen (E) sind 4-Methyl-l, 3-dioxolan, 3 -Methyl - tetrahydrofuran, 2, 2-Dimethyl-l, 4-dioxan. Ebenfalls bevorzugt sind lineare oder verzweigte organische Etherverbindungen (E) , wie Mono- und Polyether. Als Monoether sind Ether mit einem Siedepunkt von mindestens 600C bei 1 bar bevorzugt, beispielsweise Di-n-propylether .Preferred ether compounds (E) are cyclic organic ether compounds which preferably have at least 5 ring atoms and preferably at most 30 ring atoms, such as 1,3-dioxolane, tetrahydrofuran, tetrahydropyran, tetrahydropyran, 1,4-dioxane, [12] crown-4, [15 ] crown-fifth The cyclic ether compounds (E) may have hydrocarbon substituents, in particular alkyl radicals having 1 to 6 carbon atoms, preferably methyl and ethyl. Examples of substituted cyclic ether compounds (E) are 4-methyl-1,3-dioxolane, 3-methyl-tetrahydrofuran, 2, 2-dimethyl-1,4-dioxane. Also preferred are linear or branched organic ether compounds (E), such as mono- and polyethers. Preferred monoethers are ethers having a boiling point of at least 60 ° C. at 1 bar, for example di-n-propyl ether.
Als Polyether können auch Polyalkylenglycole, wie Polyethy- lenglycol und Polypropylenglycol eingesetzt werden. Die mittle- ren Molmassen Mn der Polyalkylenglycole betragen vorzugsweise mindestens 150, insbesondere mindestens 500 und vorzugsweise höchstens 10000, insbesondere höchstens 5000.Polyethers which can also be used are polyalkylene glycols, such as polyethylene glycol and polypropylene glycol. The average molar masses Mn of the polyalkylene glycols are preferably at least 150, in particular at least 500 and preferably at most 10000, in particular at most 5000.
Das Neopentasilan der allgemeinen Formel (1) kann in einem Mo- lekül gleiche oder verschiedene Bedeutungen von R aufweisen.The neopentasilane of the general formula (1) can have identical or different meanings of R in one molecule.
Vorzugsweise weisen alle R die gleichen Bedeutungen auf. Besonders bevorzugt sind die Bedeutungen H und Cl. x bedeutet vorzugsweise die Werte 0 oder 1.Preferably, all R have the same meanings. Particularly preferred are the meanings H and Cl. x is preferably 0 or 1.
Die Umsetzung erfolgt vorzugsweise bei mindestens -50C, besonders bevorzugt bei mindestens 50° C und insbesondere bei mindestens 1000C, und vorzugsweise bei höchstens 3000C, insbesondere bei höchstens 25O0C.
Die Umsetzung wird vorzugsweise mindestens 1 Stunde, besonders bevorzugt mindestens 3 Stunden und insbesondere mindestens 10 Stunden und vorzugsweise höchstens 10 Tage durchgeführt ,The reaction is preferably carried out at least -5 0 C, more preferably at least 50 ° C and in particular at least 100 0 C, and preferably at most 300 0 C, in particular at most 25O 0 C. The reaction is preferably carried out for at least 1 hour, more preferably at least 3 hours and in particular at least 10 hours and preferably at most 10 days,
Auf 100 Gewichtsteile Siliciumverbindung der allgemeinen Formel (2) werden vorzugsweise mindestens 0,1, besonders bevorzugt mindestens 0,5 und insbesondere mindestens 2 Gewichtsteile Etherverbindungen (E) , und vorzugsweise höchstens 50, besonders bevorzugt höchstens 20 und insbesondere höchstens 10 Ge- wichtsteile Etherverbindungen (E), eingesetzt.On 100 parts by weight of silicon compound of the general formula (2) are preferably at least 0.1, more preferably at least 0.5 and especially at least 2 parts by weight of ether compounds (E), and preferably at most 50, more preferably at most 20 and in particular at most 10 parts by weight of ether compounds (E), used.
Das Reaktionsgemisch wird nach der Umsetzung vorzugsweise durch Destillation aufgetrennt. Diese kann entweder unter Normaldruck, Überdruck oder reduziertem Druck erfolgen.The reaction mixture is preferably separated by distillation after the reaction. This can be done either under normal pressure, overpressure or reduced pressure.
Die Umsetzung kann in Anwesenheit oder Abwesenheit von Schutzgas, wie Stickstoff, Helium oder Argon durchgeführt werden; sie kann aber auch an Luft durchgeführt werden, solange der Feuchtigkeitsgehalt maximal 10 ppbw beträgt. Bevorzugt wird aus Kos- tengründen die Destillation in Anwesenheit von Stickstoff durchgeführt .The reaction may be carried out in the presence or absence of inert gas, such as nitrogen, helium or argon; but it can also be carried out in air, as long as the moisture content is a maximum of 10 ppbw. For reasons of cost, the distillation is preferably carried out in the presence of nitrogen.
Sofern nicht anders angegeben, werden die nachstehenden Bei- spiele bei einem Druck der umgebenden Atmosphäre, also etwa bei 1000 hPa, und bei Raumtemperatur, also bei etwa 230C sowie bei einer relativen Luftfeuchtigkeit von etwa 50 % durchgeführt.Unless stated otherwise, the examples below are carried out at a pressure of the surrounding atmosphere, ie at about 1000 hPa, and at room temperature, ie at about 23 ° C. and at a relative atmospheric humidity of about 50%.
In den folgenden Beispielen wurde der Gehalt an Verunreinigun- gen gaschromatographisch bestimmt .In the following examples, the content of impurities was determined by gas chromatography.
Beispiel 1example 1
In einem mit Stickstoff überlagerten Dreihalskolben mit Thermoelement, Rückflusskühler und Stopfen wurden 127 g Hexachlordi- silan und 10 g Tetrahydrofuran vorgelegt und unter Rühren zum
Sieden erhitzt. Bei ca. 1000C wurde bereits am Kühler die Bildung eines Kondensates beobachtet, obwohl Hexachlordisilan erst bei 1540C siedet. Mit zunehmender Dauer sank die zur Bildung eines Kondensates benötigte Temperatur weiter ab auf etwa 7O0C. Nach 7 Stunden wurde die Heizung abgestellt. Die zunächst dünnflüssige Reaktionsmischung kühlte auf 300C ab. Bei dieser Temperatur wurde die Mischung plötzlich trübe, die Temperatur stieg ohne externe Heizung wieder auf etwa 350C. Es bildete sich ein kristalliner Feststoff, die Mischung konnte aber wei- terhin leicht gerührt werden.In a nitrogen-overlaid three-necked flask equipped with a thermocouple, reflux condenser and stopper, 127 g of hexachlorodi- silane and 10 g of tetrahydrofuran were initially charged and added with stirring to Boil boiling. At about 100 0 C, the formation of a condensate was already observed on the cooler, although hexachlorodisilane boiling only at 154 0 C. With increasing duration, the temperature required for the formation of a condensate decreased further down to about 7O 0 C. After 7 hours, the heat was turned off. The initially low-viscosity reaction mixture cooled to 30 0 C. At this temperature, the mixture suddenly became cloudy, the temperature rose without external heating again to about 35 0 C. It is a crystalline solid formed, but the mix could be easily stirred terhin WEI.
Am nächsten Tag wurde der entstandene Feststoff von der überstehenden Lösung abgetrennt und mit Si29~NMR charakterisiert. Es wurden die Signale von Tetrachlorsilan und Dodekachlorneo- pentasilan beobachtet.The next day, the resulting solid was separated from the supernatant solution and characterized by Si29 NMR. The signals of tetrachlorosilane and dodecachlorone pentasilane were observed.
Beispiel 2Example 2
In der Folge wurden bei Raumtemperatur verschiedene Mischungen von THF (1 g) und Hexachlordisilanen {10 g) mehrere Tage gela- gert. Es bildete sich wieder neben unreagiertem Hexachlordisilan Tetrachlorsilan und Dodekachlorneopentasilan. (Nachweis über Si29)Subsequently, at room temperature, various mixtures of THF (1 g) and hexachlorodisilanes {10 g) were stored for several days. It formed again next to unreacted hexachlorodisilane tetrachlorosilane and dodecachloroneopentasilane. (Proof via Si29)
Beispiel 3 Zu diesem Versuch wurden ca. 5 g Hexachlordisilan und ca. I g Katalysator in ein beidseitig versσhraubtes Stahlrohr gegeben und im Ölbad auf 1700C erwärmt.Example 3 For this experiment were added about 5 g of hexachlorodisilane and about I g catalyst in a mutually versσhraubtes steel tube and heated in an oil bath at 170 0 C.
Die untersuchten Katalysatoren waren ~ 15 -Crown- 5 98%, 1, 4, 10, 13 -pentaossacidopentadecano (Kronenether)The investigated catalysts were ~ 15 -Crown- 5 98%, 1, 4, 10, 13 -pentaossacidopentadecano (crown ethers)
- Silikonöl AK20 (nicht erfindungsgemäss)- Silicone oil AK20 (not according to the invention)
- THF- THF
- 1,4-Dioxan
Alle Substanzen verursachten die Bildung eines komplexen Gemisches von Tetrachlorsilan, Octachlortrisilan, Dekachlorisopert- tasilan und Dodekachlorneopentasilan. Im Falle des Silikonöls war die Zersetzung allerdings nur in geringem Umfang aufgetre- ten. Ein reines Hexachlordisilan als Referenz blieb untersetzt, selbst bei einer Temperatur von 21O0C / 24 Stunden.- 1,4-dioxane All substances caused the formation of a complex mixture of tetrachlorosilane, octachlorotrisilane, decachloroisopertazilane and dodecachlorneopentasilane. In the case of the silicone oil, however, the decomposition occurred only to a small extent. A pure hexachlorodisilane as a reference remained opaque, even at a temperature of 21O 0 C / 24 hours.
Beispiel 4Example 4
In einem mit Argon überlagertem Kolben, der mit Thermometer, Rückflusskühler und Magnetrührer versehen war, wurden 106 g He- xachlordisilan und 10 g Tetrahydrofuran vorgelegt. Die Mischung wurde 5 Stunden am Rückfluss erwärmt und anschließend abgekühlt. Bei 260C trat diesmal wieder eine exotherme Reaktion auf (Temperaturanstieg um ca. 4°C) . Am nächsten Tag wurde nochmals 5 Stunden am Rückfluss gekocht, wieder trat beim Abkühlen bei 260C ein Temperaturanstieg um 4°C auf. Es wurde daraus geschlossen, dass bei der Kristallisation des Adduktes Tetrachlorsilan und Dodekachlorneopentasilan Wärme freigesetzt wird. Nach Abkühlen waren jeweils farblose Kristalle entstanden, die in einem Handschuhkasten abfiltriert und mit Tetrachlorsilan nachgewaschen wurden. Es konnten ca. 32 g Peststoff erhalten werden.In an argon-overlaid flask equipped with thermometer, reflux condenser and magnetic stirrer, 106 g of hexachlorodisilane and 10 g of tetrahydrofuran were charged. The mixture was heated at reflux for 5 hours and then cooled. At 26 0 C, this time again an exothermic reaction occurred (temperature increase by about 4 ° C). The next day a further 5 hours was refluxed, again on cooling at 26 0 C, a temperature increase of 4 ° C on. It was concluded that in the crystallization of the adduct tetrachlorosilane and dodecachlorneopentasilan heat is released. After cooling, each colorless crystals were formed, which were filtered off in a glove box and washed with tetrachlorosilane. It could be obtained about 32 g of pesticide.
Das Si29 NMR bestätigte, dass es sich hierbei um das Addukt handelte. In der Thermogravimetrie werden zwei Stufen beobachtet, eine bei ca. 8O0C (Abspalten des Tetrachlorsilanes) und bei ca. 2800C (Verdampfen des Dodekachlorneopentasilans) . In der DSC sind bei 54°C (Verdampfen überschüssigen Tetrachlorsi- lans) und bei 740C {Abspaltung des Tetrachlorsilans aus dem Ad- dukt) zwei Signale zu ersehen. Das sich bei ca. 2900C abzeichnende Verdampfen wird von einer exothermen Reaktion abgelöst. Dies steht im Einklang mir der Gravimetrie, bei der ein nicht verdampfbarer Rückstand von ca. 14% verblieb.
Beispiel 5Si29 NMR confirmed that this was the adduct. In the thermogravimetry, two stages are observed, one at approximately 8O 0 C (cleavage of the Tetrachlorsilanes) and at about 280 0 C (evaporation of Dodekachlorneopentasilans). In the DSC (evaporating excess tetrachlorosilane) and at 74 0 C {elimination of the tetrachlorosilane from the ad domestic product) are seen two peaks at 54 ° C. The evaporation, which starts at approx. 290 ° C, is replaced by an exothermic reaction. This is consistent with gravimetry, which left a non-volatile residue of about 14%. Example 5
Untersuchung der Abhängigkeit der Zersetzung Hexachlordisilan von der Menge TetrahydrofuranInvestigation of the dependence of decomposition hexachlorodisilane on the amount of tetrahydrofuran
Die Untersuchungen wurden wie in Beispiel 3 beschrieben imThe investigations were as described in Example 3 in
Stahlrohr bei 2100C / 3 Tage durchgeführt. Die Mischungen wurden auch die gleiche Zeit bei Raumtemperatur gelagert .Steel tube performed at 210 0 C / 3 days. The mixtures were also stored at room temperature for the same time.
9,3% THP: Bildung eines Gemisches von Oligochlorsilanen analog Beispiel 3 und Feststoff.9.3% THP: Formation of a mixture of oligochlorosilanes analogous to Example 3 and solid.
5,1% THF: dto5.1% THF: dto
1% THF: dto1% THF: dto
0,5% THF: dto0.5% THF: dto
0,25 % THF: dto 470 ppm THF: Spuren von Zersetzung0.25% THF: dto 470 ppm THF: traces of decomposition
240 ppm THF: Spuren von Zersetzung240 ppm THF: traces of decomposition
Beispiel 6Example 6
Die Untersuchungen wurden wie in Beispiel 3 beschrieben im Stahlrohr bei 100 bzw. 1500C für 1,3 Tage durchgeführt.The investigations were carried out as described in Example 3 in a steel tube at 100 or 150 0 C for 1.3 days.
Bei 1000C reichen 0,1% THF aus, um die Zersetzung zu beginnen. Auch bei geringen Zusätzen von THF wird die Bildung des festen Dodekachlorneopentasilans beobachtet .
At 100 ° C., 0.1% THF is sufficient to begin the decomposition. Even with minor additions of THF, the formation of the solid dodecachloroneopentasilane is observed.
Claims
1. Verfahren zur Herstellung von Neopentasilanen der allgemeinen Formel (1)1. Process for the preparation of neopentasilanes of the general formula (1)
Si(SiR3)4 (1) ,Si (SiR 3 ) 4 (1),
bei dem bei dem Siliciumverbindungen der allgemeinen Formel (2)in which silicon compounds of the general formula (2)
R3Si- (Si-UxSiR3 (2),R 3 Si (Si-U x SiR 3 (2),
wobeiin which
R ausgewählt wird aus H, Cl, Br und J und x eine nichtnegative ganze Zahl bis 5 bedeutet, in Gegenwart von Etherverbindungen (E) umgesetzt werden.R is selected from H, Cl, Br and J, and x is a nonnegative integer to 5, in the presence of ether compounds (E).
2. Verfahren nach Anspruch 1, bei dem cyclische organische Etherverbindungen (E) , die mindestens 5 Riπgatome und höchstens 30 Ringatome aufweisen, eingesetzt werden.2. The method of claim 1, wherein the cyclic organic ether compounds (E), which have at least 5 Riπgatome and at most 30 ring atoms are used.
3. Verfahren nach Anspruch 1 oder 2, bei dem das Weopentasilan in einem Molekül gleiche Bedeutungen von R aufweist, die ausgewählt werden aus H und Cl .3. The method of claim 1 or 2, wherein the Weopentasilan in a molecule has the same meanings of R, which are selected from H and Cl.
4. Verfahren nach Anspruch 1 bis 3, bei dem x die Werte 0 oder 1 bedeutet.4. The method of claim 1 to 3, wherein x is 0 or 1 means.
5. Verfahren nach Anspruch 1 bis 4, bei dem auf 100 Gewichtsteile Siliciumverbindung der allgemeinen Formel (2) mindestens 0,2 Gewichtsteile Etherverbindungen (E) einge- setzt werden. 5. The method of claim 1 to 4, wherein at least 0.2 parts by weight of ether compounds (E) are used for 100 parts by weight of silicon compound of the general formula (2).
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DE102008042934A DE102008042934A1 (en) | 2008-10-17 | 2008-10-17 | Process for the preparation of neopentasilanes |
PCT/EP2009/063136 WO2010043551A1 (en) | 2008-10-17 | 2009-10-09 | Method for producing neopentasilanes |
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DE102009027194A1 (en) * | 2009-06-25 | 2010-12-30 | Wacker Chemie Ag | Process for the preparation of dodecahalogen neopentasilanes |
DE102010062984A1 (en) | 2010-12-14 | 2012-06-14 | Evonik Degussa Gmbh | Process for the preparation of higher halogen and hydridosilanes |
DE102011005387A1 (en) | 2011-03-10 | 2012-09-13 | Wacker Chemie Ag | Process for reducing the aluminum content of neopentasilane |
DE102013010099B4 (en) * | 2013-06-18 | 2015-07-09 | Evonik Industries Ag | Processes for producing structured coatings, structured coatings prepared by the process and their use |
JP6346555B2 (en) * | 2013-12-20 | 2018-06-20 | 株式会社日本触媒 | Cyclic halosilane neutral complex |
JP6655599B2 (en) * | 2014-07-22 | 2020-02-26 | モメンティブ パフォーマンス マテリアルズ ゲーエムベーハーMomentive Performance Materials GmbH | Method for cleaving silicon-silicon and / or silicon-chlorine bonds in mono-, poly- and / or oligosilanes |
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JPS6191011A (en) | 1984-10-08 | 1986-05-09 | Mitsui Toatsu Chem Inc | Production of silicon hydride |
WO2006009876A2 (en) * | 2004-06-17 | 2006-01-26 | Cengent Therapeutics, Inc. | Trisubstituted nitrogen modulators of tyrosine phosphatases |
JP5103480B2 (en) * | 2006-10-24 | 2012-12-19 | ダウ・コーニング・コーポレイション | Composition containing neopentasilane and method for producing the same |
DE102008025260B4 (en) * | 2008-05-27 | 2010-03-18 | Rev Renewable Energy Ventures, Inc. | Halogenated polysilane and thermal process for its preparation |
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2008
- 2008-10-17 DE DE102008042934A patent/DE102008042934A1/en not_active Withdrawn
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2009
- 2009-10-09 WO PCT/EP2009/063136 patent/WO2010043551A1/en active Application Filing
- 2009-10-09 US US13/062,868 patent/US8883111B2/en not_active Expired - Fee Related
- 2009-10-09 JP JP2011531450A patent/JP5373094B2/en not_active Expired - Fee Related
- 2009-10-09 CN CN200980140834XA patent/CN102186774A/en active Pending
- 2009-10-09 EP EP09783870A patent/EP2334599A1/en not_active Withdrawn
- 2009-10-09 KR KR1020117007245A patent/KR101336407B1/en not_active IP Right Cessation
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Also Published As
Publication number | Publication date |
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US20110171098A1 (en) | 2011-07-14 |
DE102008042934A1 (en) | 2010-04-22 |
JP5373094B2 (en) | 2013-12-18 |
WO2010043551A1 (en) | 2010-04-22 |
US8883111B2 (en) | 2014-11-11 |
CN102186774A (en) | 2011-09-14 |
JP2012505815A (en) | 2012-03-08 |
KR20110063502A (en) | 2011-06-10 |
KR101336407B1 (en) | 2013-12-04 |
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