EP2210456A2 - Method and generator circuit for production of plasmas by means of radio-frequency excitation - Google Patents

Method and generator circuit for production of plasmas by means of radio-frequency excitation

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Publication number
EP2210456A2
EP2210456A2 EP08848965A EP08848965A EP2210456A2 EP 2210456 A2 EP2210456 A2 EP 2210456A2 EP 08848965 A EP08848965 A EP 08848965A EP 08848965 A EP08848965 A EP 08848965A EP 2210456 A2 EP2210456 A2 EP 2210456A2
Authority
EP
European Patent Office
Prior art keywords
frequency
voltage
generator circuit
phase
operating frequency
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP08848965A
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German (de)
French (fr)
Inventor
Roland Gesche
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Aurion Anlagentechnik GmbH
Original Assignee
Aurion Anlagentechnik GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Aurion Anlagentechnik GmbH filed Critical Aurion Anlagentechnik GmbH
Publication of EP2210456A2 publication Critical patent/EP2210456A2/en
Withdrawn legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32155—Frequency modulation
    • H01J37/32165—Plural frequencies

Definitions

  • the invention relates to a method and a generator circuit for generating plasmas by means of high-frequency excitation.
  • Plasmas are used in many sedimentation, etch, and film formation processes (eg, RF sputtering, PECVD).
  • the excitation of plasmas by means of DC voltage, microwaves or by high frequency is known.
  • the present invention is concerned with the excitation by means of high frequency, which is particularly suitable for sputtering operations.
  • a power generator is connected through a matching network to a plasma electrode in a vacuum chamber to perform a low pressure plasma process.
  • the matching network is set for the operating frequency of the generator to operate at its nominal impedance.
  • a second plasma generator is used, in addition to high frequency over a the Vacuum chamber surrounding induction coil into the chamber and thus couples energy into the plasma chamber.
  • the nonlinearity of the impedance of the plasma gives rise to harmonics at multiples of the frequency of the generator flowing from the electrode back into the matching network.
  • the reflection factors encountered by these harmonics are undefined and uncontrolled. This results in a waveform of the voltage on the plasma electrode which is periodic with the operating frequency of the generator but which has an uncontrolled course within the voltage period. Lack of reproducibility of a process, "mystical" process changes after service, repair or replacement of high-frequency components are the result. The process is dependent on the design and structure of the high-frequency supply, in particular the matching network.
  • Multiplexer be split. They are then each guided to adjustable impedances, so that they defined
  • the invention has for its object to provide a method and a generator circuit for generating plasmas by means of high frequency excitation, with which the timing of the high frequency excitation can be controlled reproducible.
  • At least one further high-frequency voltage in each case a multiple of this operating frequency and in each case adjustable amplitude and phase, is superimposed in phase to provide a plasma-maintaining voltage of a high-frequency voltage with a defined operating frequency.
  • At least two high-frequency power generators are provided, one of which operates at an operating frequency and one or the other at a multiple of this operating frequency. All high frequency power generators are phase locked together.
  • the relative phase position and the respective amplitude of a high-frequency power generator can be suitably regulated individually.
  • the voltages of the high-frequency power generators with their respective signal frequency are each passed through a separate matching circuit and superimposed on the supply line to the plasma electrode by means of multiplexer.
  • the waveform of the voltage can be specifically controlled.
  • an oscillator and at least one frequency multiplier may be used, which generate the harmonics.
  • the frequency multipliers are then suitably followed in each case by a phase shifter.
  • the coupling to the plasma electrode via a broadband amplifier or more narrow-band amplifier for each frequency.
  • the so-called self-bias DC voltage can be influenced.
  • a small peak voltage (square wave voltage) or a high peak voltage (pulse voltage) can be set. This provides a variety of options for controllable and reproducible process design.
  • the invention will be explained below with reference to an embodiment.
  • the accompanying drawing shows a generator circuit according to the invention.
  • the output of a high-frequency power generator 1, which generates an operating frequency f is fed via a matching network 5 to a multiplexer 9 whose output is in turn connected to an electrode 10 in a vacuum chamber 11.
  • the matching network 5 is tuned to the operating frequency f of the high-frequency power generator 1.
  • high-frequency power generators 2, 3, 4 each operate at an n-times the operating frequency f, where n is for example 2, 3 and 4, that is, they each generate a harmonic of the operating frequency f. All high frequency power generators 1 to 4 are phase locked coupled together (for example by synchronization, not shown). Via the multiplexer 9, the high-frequency power generators 1 to 4 are connected to the electrode 10 of the vacuum chamber 11. Each harmonic is passed to the multiplexer 9 via its own matching network 6, 7, 8. In this way, the harmonics can be adapted in each case, that is, adjusted according to magnitude and phase, and thus tuned to the harmonics produced in the plasma, by encountering reflection factors F 2 , F 3 , F 4 in the return flow.

Abstract

According to the method, a voltage which maintains the plasma is produced by superimposing on a radio-frequency voltage at a defined operating frequency at least one further radio-frequency voltage, in each case at a multiple of this operating frequency, and in each case with a variable amplitude and phase, on a phase-locked basis. At least two radio-frequency power generators (1 to 4) are provided for a corresponding generator circuit, one (1) of which operates at a defined operating frequency (f) and the other or others of which (2 to 4) each operate at a multiple of this operating frequency (f). All the radio-frequency power generators (1 to 4) are coupled to one another on a phase-locked basis, and the relative phase angle as well as the respective amplitude of each radio-frequency power generator (1 to 4) can be regulated individually by means of a dedicated matching circuit (5 to 8). As an alternative to this, it is possible to provide an oscillator which operates at a defined operating frequency (f) and at least one further frequency multiplier, which is connected downstream from the oscillator, said frequency multiplier or multipliers producing harmonics of this operating frequency (f).

Description

VERFAHREN UND GENERATORSCHALTUNG ZUR ERZEUGUNG VON PLASMEN MITTELS HOCHFREQUENZANREGUNGMETHOD AND GENERATOR CIRCUIT FOR THE PRODUCTION OF PLASMS BY HIGH FREQUENCY EXCITING
Die Erfindung betrifft ein Verfahren und eine Generatorschaltung zur Erzeugung von Plasmen mittels Hochfrequenzanregung .The invention relates to a method and a generator circuit for generating plasmas by means of high-frequency excitation.
Plasmen werden bei vielen Sedimentations-, Ätz- und Schichtbildungsprozessen (zum Beispiel HF-Sputtern, PECVD) eingesetzt. Bekannt ist die Anregung von Plasmen mittels Gleichspannung, Mikrowellen oder durch Hochfrequenz. Vorliegende Erfindung befasst sich mit der Anregung mittels Hochfrequenz, die insbesondere für Sputtervorgänge geeignet ist .Plasmas are used in many sedimentation, etch, and film formation processes (eg, RF sputtering, PECVD). The excitation of plasmas by means of DC voltage, microwaves or by high frequency is known. The present invention is concerned with the excitation by means of high frequency, which is particularly suitable for sputtering operations.
Bei einem Plasmaerzeuger auf der Basis von Hochfrequenzanregung wird ein Leistungsgenerator über ein Anpassungsnetzwerk an eine Plasmaelektrode in einer Vakuumkammer angeschlossen, um einen Niederdruck-Plasmaprozess durchzuführen. Typisch sind Generatoren mit einer Frequenz von f = 13,56 MHz bei einer Leistung von 300 W bis 50 kW. Das Anpassungsnetzwerk wird für die Arbeitsfrequenz des Generators so eingestellt, dass dieser an seiner Nennimpedanz betrieben wird.In a plasma generator based on high frequency excitation, a power generator is connected through a matching network to a plasma electrode in a vacuum chamber to perform a low pressure plasma process. Typical are generators with a frequency of f = 13.56 MHz with a power of 300 W to 50 kW. The matching network is set for the operating frequency of the generator to operate at its nominal impedance.
Gegebenenfalls wird noch ein zweiter Plasmaerzeuger eingesetzt, der zusätzlich Hochfrequenz über eine die Vakuumkammer umgebende Induktionsspule in die Kammer und damit Energie in den Plasmaraum einkoppelt.Optionally, a second plasma generator is used, in addition to high frequency over a the Vacuum chamber surrounding induction coil into the chamber and thus couples energy into the plasma chamber.
Durch die Nichtlinearität der Impedanz des Plasmas entstehen Harmonische mit Vielfachen der Frequenz des Generators, die von der Elektrode aus zurück in das Anpassungsnetzwerk fließen. Die Reflexionsfaktoren, auf die diese Harmonischen treffen, sind nicht definiert und werden nicht kontrolliert. Dadurch entsteht an der Plasmaelektrode eine Kurvenform der Spannung, die mit der Arbeitsfrequenz des Generators periodisch ist, die aber innerhalb der Spannungsperiode einen nicht kontrollierten Verlauf hat. Mangelnde Reproduzierbarkeit eines Prozesses, „mystische" Prozessänderungen nach Service, Reparatur oder Austausch von Hochfrequenzkomponenten sind die Folge. Der Prozess wird abhängig vom Design und Aufbau der Hochfrequenzversorgung, insbesondere des Anpassungsnetzwerkes.The nonlinearity of the impedance of the plasma gives rise to harmonics at multiples of the frequency of the generator flowing from the electrode back into the matching network. The reflection factors encountered by these harmonics are undefined and uncontrolled. This results in a waveform of the voltage on the plasma electrode which is periodic with the operating frequency of the generator but which has an uncontrolled course within the voltage period. Lack of reproducibility of a process, "mystical" process changes after service, repair or replacement of high-frequency components are the result.The process is dependent on the design and structure of the high-frequency supply, in particular the matching network.
Nach der US 6 537 421 B2 ist ein Plasmaerzeuger bekannt, bei dem zur Beherrschung dieses Problems zwischen Plasmaelektrode und Anpassungsnetzwerk Filter geschaltet sind, die jeweils auf eine Harmonische der Arbeitsfrequenz des Hochfrequenzgenerators abgestimmt sind.According to US Pat. No. 6,537,421 B2, a plasma generator is known in which filters are connected to control this problem between the plasma electrode and the matching network, which filters are each tuned to a harmonic of the operating frequency of the high-frequency generator.
Nach der US 7 084 369 B2 ist eine weitere Lösung bekannt, nach der die rücklaufenden Wellen in einem frequenzselektivenAccording to US Pat. No. 7,084,369 B2, another solution is known according to which the returning waves are in a frequency-selective manner
Multiplexer aufgeteilt werden. Sie werden anschließend jeweils auf einstellbare Impedanzen geführt, so dass sie definierteMultiplexer be split. They are then each guided to adjustable impedances, so that they defined
Reflexionfaktoren finden. Somit lassen sich zwar reproduzierbare Verhältnisse schaffen, die Einflussnahme auf die Kurvenform der Hochfrequenzanregung ist jedoch limitiert. Der Erfindung liegt die Aufgabe zugrunde, ein Verfahren und eine Generatorschaltung zum Erzeugen von Plasmen mittels Hochfrequenzanregung anzugeben, mit denen der Zeitverlauf der Hochfrequenzanregung reproduzierbar kontrolliert werden kann.Find reflection factors. Thus, although reproducible conditions can be created, the influence on the waveform of the high-frequency excitation is limited. The invention has for its object to provide a method and a generator circuit for generating plasmas by means of high frequency excitation, with which the timing of the high frequency excitation can be controlled reproducible.
Erfindungsgemäß wird die Aufgabe gelöst durch die Merkmale der Ansprüche 1, 2 und 4. Zweckmäßige Ausgestaltungen sind Gegenstand der jeweiligen Unteransprüche.According to the invention the object is achieved by the features of claims 1, 2 and 4. Advantageous embodiments are the subject of the respective subclaims.
Danach wird zur Bereitstellung einer das Plasma aufrechterhaltenden Spannung einer hochfrequenten Spannung mit einer definierten Arbeitsfrequenz mindestens eine weitere hochfrequente Spannung mit jeweils einem Vielfachen dieser Arbeitsfrequenz und jeweils einstellbarer Amplitude und Phase phasenstarr überlagert.Thereafter, at least one further high-frequency voltage, in each case a multiple of this operating frequency and in each case adjustable amplitude and phase, is superimposed in phase to provide a plasma-maintaining voltage of a high-frequency voltage with a defined operating frequency.
Zur Realisierung des Verfahrens sind mindestens zwei Hochfrequenz-Leistungsgeneratoren vorgesehen, von denen einer bei einer Arbeitsfrequenz und der oder die anderen bei jeweils einem Vielfachen dieser Arbeitsfrequenz arbeiten. Alle Hochfrequenz-Leistungsgeneratoren sind phasenstarr miteinander gekoppelt. Die relative Phasenlage und die jeweilige Amplitude eines Hochfrequenz-Leistungsgenerators können zweckmäßig einzeln geregelt werden. Die Spannungen der Hochfrequenz- Leistungsgeneratoren mit ihrer jeweiligen Signalfrequenz werden jeweils über eine eigene Anpassungsschaltung geführt und an der Zuleitung zur Plasmaelektrode mittels Multiplexer überlagert. Durch die Einstellung der verschiedenen Amplituden und Phasenlagen kann die Kurvenform der Spannung gezielt kontrolliert werden. Statt mehrerer Hochfrequenz-Leistungsgeneratoren können alternativ auch ein Oszillator und mindestens ein Frequenzvervielfacher eingesetzt werden, der oder die die Harmonischen erzeugen. Den Frequenzvervielfachern wird dann zweckmäßig jeweils ein Phasenschieber nachgeschaltet. Die Ankopplung an die Plasmaelektrode erfolgt über einen Breitbandverstärker oder mehrere schmalbandige Verstärker für die jeweilige Frequenz.To implement the method, at least two high-frequency power generators are provided, one of which operates at an operating frequency and one or the other at a multiple of this operating frequency. All high frequency power generators are phase locked together. The relative phase position and the respective amplitude of a high-frequency power generator can be suitably regulated individually. The voltages of the high-frequency power generators with their respective signal frequency are each passed through a separate matching circuit and superimposed on the supply line to the plasma electrode by means of multiplexer. By adjusting the various amplitudes and phase angles, the waveform of the voltage can be specifically controlled. Instead of a plurality of high-frequency power generators, alternatively, an oscillator and at least one frequency multiplier may be used, which generate the harmonics. The frequency multipliers are then suitably followed in each case by a phase shifter. The coupling to the plasma electrode via a broadband amplifier or more narrow-band amplifier for each frequency.
Mit dem Verfahren kann zum Beispiel die so genannte selfbias- DC-Spannung beeinflusst werden. Neben einer Sinusspannung kann dann auch eine kleine Spitzenspannung (Rechteckspannung) oder eine hohe Spitzenspannung (Pulsspannung) eingestellt werden. Dies ergibt vielfältige Möglichkeiten zur kontrollierbaren und reproduzierbaren Prozessgestaltung.With the method, for example, the so-called self-bias DC voltage can be influenced. In addition to a sine wave voltage, a small peak voltage (square wave voltage) or a high peak voltage (pulse voltage) can be set. This provides a variety of options for controllable and reproducible process design.
Die Erfindung soll nachstehend anhand eines Ausführungsbeispiels näher erläutert werden. Die zugehörige Zeichnung zeigt eine erfindungsgemäße Generatorschaltung. Der Ausgang eines Hochfrequenz-Leistungsgenerators 1, der eine Arbeitsfrequenz f erzeugt, wird über ein Anpassungsnetzwerk 5 an einen Multiplexer 9 geführt, dessen Ausgang wiederum an eine Elektrode 10 in einer Vakuumkammer 11 geschaltet ist. Das Anpassungsnetzwerk 5 ist auf die Arbeitsfrequenz f des Hochfrequenz-Leistungsgenerators 1 abgestimmt.The invention will be explained below with reference to an embodiment. The accompanying drawing shows a generator circuit according to the invention. The output of a high-frequency power generator 1, which generates an operating frequency f, is fed via a matching network 5 to a multiplexer 9 whose output is in turn connected to an electrode 10 in a vacuum chamber 11. The matching network 5 is tuned to the operating frequency f of the high-frequency power generator 1.
Weitere Hochfrequenz-Leistungsgeneratoren 2, 3, 4 arbeiten jeweils bei einem n-fachen der Arbeitsfrequenz f, wobei n beispielsweise 2, 3 und 4 beträgt, das heißt, sie erzeugen jeweils eine Harmonische der Arbeitsfrequenz f. Alle Hochfrequenz-Leistungsgeneratoren 1 bis 4 sind phasenstarr miteinander gekoppelt (zum Beispiel durch Synchronisation, nicht gezeigt) . Über den Multiplexer 9 sind die Hochfrequenz- Leistungsgeneratoren 1 bis 4 mit der Elektrode 10 der Vakuumkammer 11 verbunden. Jede Harmonische wird über ein eigenes Anpassungsnetzwerk 6, 7, 8 an den Multiplexer 9 geführt. Damit können die Harmonischen jeweils angepasst, das heißt nach Betrag und Phase eingestellt und damit auf die im Plasma entstehenden Harmonischen abgestimmt werden, indem sie im Zurückfließen auf Reflexionsfaktoren F2, F3, F4 treffen.Further high-frequency power generators 2, 3, 4 each operate at an n-times the operating frequency f, where n is for example 2, 3 and 4, that is, they each generate a harmonic of the operating frequency f. All high frequency power generators 1 to 4 are phase locked coupled together (for example by synchronization, not shown). Via the multiplexer 9, the high-frequency power generators 1 to 4 are connected to the electrode 10 of the vacuum chamber 11. Each harmonic is passed to the multiplexer 9 via its own matching network 6, 7, 8. In this way, the harmonics can be adapted in each case, that is, adjusted according to magnitude and phase, and thus tuned to the harmonics produced in the plasma, by encountering reflection factors F 2 , F 3 , F 4 in the return flow.
Mit der Anregung der Harmonischen lässt sich dann je nach den Erfordernissen eine sinusförmige oder auch eine pulsförmige oder eine rechteckförmige Spannung für das Plasma erzeugen. With the excitation of the harmonics can then be generated depending on the requirements of a sinusoidal or a pulsed or rectangular voltage for the plasma.
Liste der BezugszeichenList of reference numbers
1-4 Hochfrequenz-Leistungsgenerator 5-8 Anpassungsnetzwerk1-4 High Frequency Power Generator 5-8 Adjustment Network
9 Multiplexer9 multiplexers
10 Elektrode10 electrode
11 Vakuumkammer11 vacuum chamber
f Arbeitsfrequenz n 2, 3, 4...f operating frequency n 2, 3, 4 ...
F Reflexionsfaktor F reflection factor

Claims

Patentansprüche claims
1. Verfahren zur Erzeugung von Plasmen mittels Hochfrequenzanregung, dadurch gekennzeichnet, dass zur Bereitstellung einer das Plasma aufrechterhaltenden Spannung eine hochfrequente Spannung mit einer definierten Arbeitsfrequenz und mindestens eine weitere hochfrequente Spannung mit jeweils einem Vielfachen dieser Arbeitsfrequenz und jeweils einstellbarer Amplitude und Phase phasenstarr überlagert werden.1. A method for generating plasmas by means of high-frequency excitation, characterized in that to provide a plasma-maintaining voltage, a high-frequency voltage with a defined operating frequency and at least one further high-frequency voltage, each with a multiple of this operating frequency and each adjustable amplitude and phase are superimposed phase-locked.
2. Generatorschaltung zur Erzeugung von Plasmen mittels Hochfrequenzanregung zur Realisierung des Verfahrens nach Anspruch 1, dadurch gekennzeichnet, dass zur Bereitstellung einer das Plasma aufrechterhaltenden Spannung mindestens zwei Hochfrequenz-Leistungsgeneratoren (1 bis 4) vorgesehen sind, von denen einer (1) bei einer definierten Arbeitsfrequenz (f) und der oder die die anderen2. generator circuit for generating plasmas by means of high frequency excitation for realizing the method according to claim 1, characterized in that for providing a plasma maintaining voltage at least two high-frequency power generators (1 to 4) are provided, of which one (1) at a defined Working frequency (f) and the one or the other
(2 bis 4) bei jeweils einem Vielfachen dieser Arbeitsfrequenz(2 to 4) at a multiple of this working frequency
(f) arbeiten, alle Hochfrequenz-Leistungsgeneratoren (1 bis 4) phasenstarr miteinander gekoppelt sind und die relative Phasenlage sowie die jeweilige Amplitude jedes Hochfrequenz- Leistungsgenerators (1 bis 4) mittels einer eigenen Anpassungsschaltung (5 bis 8) einzeln regelbar sind. (F) work, all high-frequency power generators (1 to 4) are phase-locked together and the relative phase position and the respective amplitude of each high-frequency power generator (1 to 4) by means of a separate matching circuit (5 to 8) are individually controllable.
3. Generatorsschaltung nach Anspruch 2, dadurch gekennzeichnet, dass die Hochfrequenz-Leistungsgeneratoren (1 bis 4) über einen Multiplexer (9) mit einer Elektrode [ 10) einer Vakuumkammer (11) verbunden sind.3. generator circuit according to claim 2, characterized in that the high-frequency power generators (1 to 4) via a multiplexer (9) with an electrode [10] a vacuum chamber (11) are connected.
4. Generatorschaltung zur Erzeugung von Plasmen mittels Hochfrequenzanregung zur Realisierung des Verfahrens nach Anspruch 1, dadurch gekennzeichnet, dass zur Bereitstellung einer das Plasma aufrechterhaltenden Spannung ein bei einer definierten Arbeitsfrequenz (f) arbeitender Oszillator und mindestens ein weiterer, dem Oszillator nachgeschalteter Frequenzvervielfacher vorgesehen sind, der oder die Harmonische dieser Arbeitsfrequenz (f) erzeugen .4. Generator circuit for generating plasmas by means of high-frequency excitation for realizing the method according to claim 1, characterized in that to provide a plasma-maintaining voltage at a defined operating frequency (f) operating oscillator and at least one further, the oscillator downstream frequency multiplier are provided generate the harmonic or this operating frequency (f).
5. Generatorschaltung nach Anspruch 4, dadurch gekennzeichnet, dass den Frequenzvervielfachern jeweils ein Phasenschieber nachgeschaltet ist.5. Generator circuit according to claim 4, characterized in that the frequency multipliers each have a phase shifter downstream.
6. Generatorschaltung nach Anspruch 5 oder 6, dadurch gekennzeichnet, dass die Ausgangsspannung der Frequenzvervielfacher auf einen Breitbandverstärker geführt ist. 6. Generator circuit according to claim 5 or 6, characterized in that the output voltage of the frequency multiplier is guided on a broadband amplifier.
7. Generatorschaltung nach Anspruch 5 oder 6, dadurch gekennzeichnet, dass jedem Frequenzvervielfacher ein Verstärker nachgeschaltet ist. 7. Generator circuit according to claim 5 or 6, characterized in that each frequency multiplier, an amplifier is connected downstream.
EP08848965A 2007-11-14 2008-10-28 Method and generator circuit for production of plasmas by means of radio-frequency excitation Withdrawn EP2210456A2 (en)

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DE102007055010A DE102007055010A1 (en) 2007-11-14 2007-11-14 Method and generator circuit for generating plasmas by means of high-frequency excitation
PCT/EP2008/064620 WO2009062845A2 (en) 2007-11-14 2008-10-28 Method and generator circuit for production of plasmas by means of radio-frequency excitation

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Title
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See also references of WO2009062845A2 *

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US20110006687A1 (en) 2011-01-13
CN101971714A (en) 2011-02-09

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