Classifications

• • H—ELECTRICITY
  • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
  • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
  • H05H1/00—Generating plasma; Handling plasma
  • H05H1/24—Generating plasma
  • H05H1/26—Plasma torches
  • H05H1/32—Plasma torches using an arc
  • H05H1/34—Details, e.g. electrodes, nozzles
• • H—ELECTRICITY
  • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
  • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
  • H05H1/00—Generating plasma; Handling plasma
  • H05H1/24—Generating plasma
  • H05H1/26—Plasma torches
  • H05H1/32—Plasma torches using an arc
  • H05H1/34—Details, e.g. electrodes, nozzles
  • H05H1/3478—Geometrical details
• • H—ELECTRICITY
  • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
  • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
  • H05H1/00—Generating plasma; Handling plasma
  • H05H1/24—Generating plasma
  • H05H1/26—Plasma torches
  • H05H1/32—Plasma torches using an arc
  • H05H1/34—Details, e.g. electrodes, nozzles
  • H05H1/36—Circuit arrangements

Definitions

• the present invention relates to a cathode assembly of plasma generating devices and a method of generating plasma, and more particularly to pulsed plasma.
• a plasma generating device comprises a cathode and an anode.
• a plasma generating gas which is typically a noble gas, flows in a channel extending longitudinally between the cathode and through the anode. As the plasma generating gas traverses the plasma channel it is heated and converted to plasma by an electric arc established between the cathode and the anode. Portions of the plasma channel may be formed by one or more intermediate electrodes.
• the first phase occurs when an electric spark is established between the cathode and the anode.
• the second phase occurs when positively charged ions, formed as a result of the motion of negatively charged electrons in the electric spark, bombard the cathode.
• the third phase occurs after a portion of the cathode is sufficiently heated by the ion bombardment that it begins to emit a sufficient number of electrons to sustain the current between the cathode and the anode for heating the plasma generating gas.
• the electric arc heats the plasma generating gas, which forms plasma.
• the plasma generating gas has to go through all three phases.
• pulsed corona discharge is generated.
• a truly pulsed flow refers to a flow that completely ceases during the off period of the pulse.
• a drawback of devices and methods of the first type is that the generated corona discharge has a fixed maximum temperature of approximately 2000 0 C.
• the corona discharge formed in the device never becomes high temperature plasma because it is not heated by an electric arc. Therefore, devices that generate pulsed corona discharge cannot be used for some applications that require a temperature above 2000°C. Accordingly, applications of devices of the first type are limited by the nature of the electrical discharge process, that is capable of producing a corona discharge, but not high temperature plasma.
• Devices of the second type generate plasma by heating the flow of plasma generating gas passing through a plasma channel by an electric arc that is established between a cathode and an anode that forms the plasma channel.
• a pulsed DC voltage is applied between the anode and the cathode.
• a predetermined constant bias voltage may or may not be added to the pulsed DC voltage.
• the number of free electrons in the plasma generating gas increases, resulting in a decrease in the resistance of the plasma and an exponential increase of the electric current flowing through the plasma.
• the number of free electrons in the plasma generating gas decreases, resulting in an increase in resistance of the plasma and an exponential decrease in the current flowing through the plasma.
• the standby current is undesirable because a truly pulsed plasma flow is not generated.
• the device does not generate pulsed plasma, but rather a continuous plasma flow with power spikes, called pulses, thus simulating pulsed plasma.
• the off-period is substantially longer than a pulse, the device outputs a significant amount of energy during the off period and, therefore, it cannot be utilized effectively for applications that require a truly pulsed plasma flow. For example, if the device is used for skin treatment, it may have to be removed from the skin surface after each pulse, so that the skin is not exposed to the low power plasma during the off period. This impairs the usability and safety of the device.
• Difficulties in generating a truly pulsed plasma flow by the means of heating the plasma generating gas with an electric arc are primarily due to the nature of the processes occurring on the cathode and the anode. In general, and for medical applications especially, it is critical to ensure operation free from the erosion of the anode and the cathode when the current rapidly increases. During the rapid current increase the temperature of the cathode may be low and not easily controlled during subsequent repetitions of the pulse.
• the area of attachment of the arc to the cathode strongly depends on the initial temperature of the cathode. When the cathode is cold, the area of attachment is relatively small.
• the temperature of the cathode increases, so that during a rapid current increase the area of attachment expands over the entire surface area of the cathode and even over a cathode holder. Under these circumstances, the cathode fall begins to fluctuate and the cathode erosion begins. Furthermore, if the area of attachment of the electric arc reaches the cathode holder it begins to melt thus introducing undesirable impurities into the plasma flow. For the proper cathode functionality, it is necessary to control the exact location and the size of the area of attachment of the electric arc to the cathode surface during rapid current increases in each pulse of plasma.
• An electric arc tends to attach to surface imperfections (also called irregularities) on the cathode.
• surface imperfections also called irregularities
• a typical surface imperfection used in the prior art is cathode tapering.
• Cathode tapering creates a tip to which the arc tends to attach.
• Another way to create an imperfection is by cutting a cylindrical cathode at an angle. This too creates an imperfection to which the arc tends to attach.
• 3,566,185 apair of cathodes is used for sputtering of metallic traces from the cathodes by using particles isolated between the cathodes by a magnetic field.
• U.S. Pat. No. 4,785,220 multiple cathodes are provided in a revolving drum such that the cathodes may be interchanged without breaking the vacuum seal of a vacuum chamber in which electric discharges occur.
• U.S. Pat. No. 4,713,170 discloses a water purifying system in which multiple cathodes are spaced around an anode. This multi-cathode configuration is used for decreasing the disturbance on the flow of water passing through the purifier.
• a multiple cathode assembly of electrically insulated cathodes are used for extending the life of an ion beam apparatus by alternating a cathode involved in the electric arc generation.
• multiple parallel cathodes, spaced from each other, are used in a plasma spray device for expanding the cross section of the plasma flow to prevent clogging of a plasma channel with powder particles.
• prior art references disclosing multiple cathodes are not concerned with problems associated with generation of pulsed plasma.
• a cathode assembly for pulsed plasma generation comprises a cathode holder connected to a plurality of longitudinally aligned cathodes.
• the cathodes in the assembly are clustered as close together as possible.
• the cathodes are preferably made of tungsten containing lanthanum.
• the cathodes preferably have the same diameter but different lengths. Optimally the length difference between the two cathodes closest in length approximately equals to the diameter of a cathode in the assembly, which is preferably 0.5 mm.
• the cathode assembly is used in devices for generating pulsed plasma based on the heating of a plasma generating gas by an electric arc established between one of the cathodes and an anode.
• the cathode assembly comprises (a) a cathode holder; and (b) a cluster of a plurality of longitudinally aligned cathodes connected to the cathode holder, with each cathode in physical contact with at least one other cathode.
• a plasma generating gas is passed between the cathodes and the anode, preferably through a plasma channel.
• a plasma generating gas is passed between the cathodes and the anode, preferably through a plasma channel.
• a high frequency, high amplitude voltage wave between the anode and the cathodes, a large number of free electrons is produced. These electrons form a spark discharge.
• the spark ionizes the plasma generating gas, which enters the glow discharge phase.
• positive ions that are formed due to the ionization of the gas atoms bombard the cathodes, thus heating it.
• the plasma generating gas enters the arc discharge phase, and the arc is established between the cathodes and the anode.
• the arc attaches to all cathodes in the assembly.
• the current is reduced to the magnitude sufficient to sustain the arc or a slightly greater magnitude. This causes the area of the arc attachment to decrease. The area of attachment decreases so that the arc attaches to a single cathode. After this low current is maintained for a period of time, the current is raised to the operational level of the pulse. The area of attachment does not increase significantly, and electron emission occurs only from the single cathode. After the operational current is maintained for a desired duration, the device enters the off-period with no current and no voltage applied.
• This method of operation avoids the problems of unstable operation associated with prior art methods. If a multi-cathode assembly is operated according to this method, the cathodes do not overheat and the area of attachment does not expand to the cathode holder. This ensures a stable operation of the plasma generating device. The method of operation also provides certain benefits when used in the cathode assemblies having a single cathode.
• the method of generating a pulse of plasma comprises (a) passing a first current through one or more cathodes and an anode; (b) passing a second current through the one or more cathodes and the anode, the magnitude of the second current being less than the magnitude of the first current; (c) passing a third current through the one or more cathodes and the anode, the magnitude of the third current being greater than the magnitude of the first current; and (d) ceasing the third current passing through the one or more cathodes and the anode.
• FIG. 1 illustrates a basic device for pulsed plasma generation
• FIG. 2 illustrates a cathode assembly of the preferred embodiment in three dimensions
• FIG. 3 illustrates a device for generating pulsed plasma adopted for skin treatment
• FIG. 4A illustrates a pattern of voltage between an anode and cathodes for generation of each pulse
• FIG. 4B illustrates a pattern of current applied to cathodes, plasma generating gas in a plasma channel, and an anode for generation of each pulse;
• FIGs. 5A-I illustrate processes that occur in a plasma channel during the generation of a pulse;
• FIG. 6A illustrates the temperature of a cathode in a single cathode assembly and the area of arc attachment after a number of pulses generated according to the methods presently known in the prior art
• FIG. 6B illustrates the temperature of cathodes in a multi-cathode assembly and the area of arc attachment after a number of pulses generated according to the embodiments of the present invention
• FIG. 7A is a sketch of a microscopic view of a single-cathode assembly after 500 pulses generated according to the prior art methods.
• FIG. 7B is a sketch of a microscopic view of a multi-cathode assembly after 40,000 pulses generated according to embodiments of the method of the present invention.
• a cathode assembly having multiple cathodes is a part of a plasma generating device.
• FIG. 1 shows a schematic view of the longitudinal cross section of such a device.
• Cathode holder 2 holds three cathodes 10, 20, and 30 longitudinally aligned with one another.
• Anode 4 is located at a distance from the cathodes.
• the cathodes initially, have flat surfaces 12, 22, and 32, respectively, at the ends closest to anode 4 (the "anode ends").
• the flat surface forms edges 14, 24, and 34, respectively.
• the cathodes must be clustered.
• clustered it is meant that all of the cathodes are arranged as a single group with every cathode longitudinally touching at least one other cathode and none of the cathodes separate from the group.
• the cathodes preferably are clustered as close together as possible. However, it is sufficient that each cathode in the assembly is in physical contact with at least one other cathode in the cluster.
• the cathodes in the assembly may have different diameters. In the preferred embodiment, however, cathodes 10, 20, 30 have the same diameter, preferably 0.5 mm.
• At least one cathode in the assembly has a length which is different from the length of at least one other cathode.
• all cathodes in the assembly have different lengths.
• the smallest difference in length between two cathodes is approximately equal to the diameter of a cathode, which is 0.5 mm in the preferred embodiment of the assembly.
• the device hosting the cathode assembly also comprises plasma channel 6 extending between cathodes 10, 20, 30 and through anode 4.
• the plasma channel is formed by one or more intermediate electrodes.
• the anode ends of cathodes 10, 20, 30 are located in a plasma chamber connected to the plasma channel.
• the cathode assembly may be used in other devices, such as for example pulsed plasma generating device shown in FIG. 3.
• Devices that may host the cathode assembly are not limited to plasma generating devices, however.
• the cathode assembly may be used in a light source or as a part of a communication device.
• the cathode assembly may be used in any device that requires establishing electric arcs of short duration between cathodes and an anode.
• the device shown in FIG. 3 comprises the cathode assembly shown in FIG. 2 having cathode holder 2 and cathodes 10, 20, and 30.
• the device further comprises anode 4 and one or more intermediate electrodes 42a-e electrically insulated from anode 4 and from each other.
• Plasma channel 6 is formed by the intermediate electrodes 42a- e and anode 4.
• intermediate electrode 42a also forms a plasma chamber 8.
• a plasma generating gas typically a noble gas, such as argon
• the plasma generating gas flows along cathodes 10, 20, 30 into the plasma chamber 8, then into plasma channel 6, and then the plasma generating gas exits the device through the opening in anode 4.
• an extension nozzle is affixed at the anode end of the device.
• the extension nozzle forms an extension channel connected to the plasma channel.
• a tubular insulator element covers a longitudinal portion of the inside surface of the extension channel.
• the extension nozzle has one or more oxygen carrying gas inlets.
• a plasma generating device such as the one shown in FIG. 3 is typically connected to one or more electronic circuits that control (1) voltage applied between anode 4 and cathodes 10, 20, 30 and (2) current passing through cathodes 10, 20, 30, plasma generating gas in plasma channel 6, and anode 4.
• the circuit for controlling the current is a current source, known in the art. These circuits are used for generation of each pulse of plasma. All cathodes in the assembly are electrically connected to each other and are connected to the same circuits, so cathodes 10, 20, 30 have the same electric potential and there is no voltage between individual cathodes, only between anode 4 and all cathodes 10, 20, 30.
• the process of a plasma pulse formation is controlled by (1) applying the voltage between the cathodes and the anode and (2) controlling the current passing through the plasma generating gas.
• the process of plasma generation includes three phases: (1) a spark discharge, (2) a glow discharge, and (3) an arc discharge.
• An electric arc in the arc discharge phase heats the plasma generating gas flowing through plasma channel 6, forming plasma.
• Generation of each plasma pulse requires the plasma generating gas to go through all three phases.
• the resistance of the plasma generating gas Prior to generation of a pulse, the resistance of the plasma generating gas is close to infinity. A small number of free electrons are present in the plasma generating gas due to ionization of atoms by cosmic rays.
• a high amplitude, high frequency voltage wave is applied between anode 4 and cathodes 10, 20, 30. This wave increases the number of free electrons in plasma channel 6, between cathodes 10, 20, 30 and anode 4.
• a DC voltage is applied between anode 4 and cathodes 10, 20, 30 and a DC current is passed through cathodes 10, 20, 30, plasma generating gas, and anode 4, forming a spark discharge between cathodes 10, 20, 30 and anode 4.
• the resistance of the plasma generating gas drops, and the glow discharge phase begins.
• the glow discharge phase positively charged ions are attracted to cathodes 10, 20, 30 under the influence of the electric field created by the voltage between the cathodes and anode 4.
• the temperature of the anode ends of the cathodes increases.
• the temperature reaches the temperature of thermionic electron emission the arc discharge phase begins. Initially, the arc attaches to all cathodes in the assembly. The current passing through the plasma generating gas is then reduced, so the area of attachment decreases to almost the minimum area of attachment capable of sustaining the arc. Because the area of the arc attachment is small, the area of attachment is confined to a single cathode in the assembly.
• the current required to sustain the arc discharge which depends on a cathode's diameter, is relatively low. After the current has been reduced and maintained at that level for a period of time, it is increased rapidly to the operational level of a pulse.
• the area of the arc attachment increases insignificantly, and only a single cathode continues to emit electrons for the rest of the pulse. Decreasing the area of the arc attachment, and then maintaining that small area, so that only a single cathode emits electrons from a controlled area is critical to the operation of a truly pulsed plasma devices.
• FIG. 4A shows the voltage applied between anode 4 and cathodes 10, 20, 30
• FIG. 4B shows the current flowing through the plasma from one or more of cathodes 10, 20, 30 to anode 4 through the plasma generating gas in plasma channel 6.
• the values for the voltage, current, and time described below are those preferred for the method when used in connection with a three-cathode assembly in a pulsed plasma device shown in FIG. 3.
• this method is used for other embodiments of the multi-cathode assembly or when a multi-cathode assembly is used in another device, other values for the voltage, current, and time may be preferable.
• FIG. 4A shows a graph of the voltage applied between anode 4 and cathodes 10, 20, 30.
• a bias voltage 202 Prior to generation of a plasma pulse, at time to, a bias voltage 202 is generated.
• the bias voltage may be 100 - 1,000 Volts, but preferably is 400 - 500 Volts.
• the bias voltage is applied between anode 4 and cathodes 10, 20, 30, by an electronic circuit.
• generating bias voltage 202 does not generate any current through the plasma generating gas in plasma channel 6, because the resistance of the plasma generating gas is close to infinity.
• a capacitor is used for sustaining the bias voltage.
• a high frequency, high amplitude voltage wave 204 is applied between anode 4 and cathodes 10, 20, 30.
• the amplitude of the wave is at least 1 kV, but is preferably around 5 kV.
• the high frequency, high amplitude voltage wave 204 is damped, with exponentially decreasing amplitude, as shown in FIG. 4A.
• the frequency of the wave is at least 300 kHz, preferably around 500 kHz.
• the duration of the high voltage, high frequency wave is at least two wavelengths.
• the duration of the wave with the frequency of 500 kHz should be at least 0.4 microseconds; however a longer wave of 15 - 20 microseconds is preferable.
• the high frequency, high amplitude voltage wave 204 is the only voltage controlled part of the pulse plasma generation. During the remainder of the pulse, the voltage is simply maintained between anode 4 and cathodes 10, 20, 30 as a result of the current passing through the plasma generating gas between cathodes 10, 20, 30 and anode 4.
• the high frequency, high amplitude voltage wave 204 creates a rapid alternating motion of the free electrons in the plasma generating gas inside plasma channel 6.
• the rapidly moving free electrons strike out electrons from atoms of the plasma generating gas flowing through plasma channel 6. This process is known as electron avalanche.
• the quantity of free electrons reaches the number sufficient for creation of a spark discharge between cathodes 10, 20, 30 and anode 4, as shown in FIG. 5B.
• a spark would first be established between the cathodes and intermediate electrode 42a closest to the cathodes.
• sparks are created between the free electrons in the plasma generating gas flowing through plasma channel 6 and other intermediate electrodes 42b-e that form plasma channel 6.
• a spark discharge between cathodes 10, 20, 30 and anode 4, shown in FIG. 5C is created.
• the spark discharge ionizes a number of atoms in the plasma generating gas, thus, increasing the conductivity of the plasma generating gas and lowering its resistance, preferably to 200 - 1,000 ⁇ .
• the free electrons that are created as a result of ionization are confined to a relatively small volume 302 shown in FIG. 5C.
• voltage 206 in the range of 100 - 1,000 Volts, but preferably around 400 - 500 Volts, is applied between anode 4 and cathodes 10, 20, 30.
• the voltage applied at time / 2 is equal to bias voltage 202 of the high frequency, high amplitude voltage wave 204.
• voltage 206 is exponentially decreasing with time, as shown in FlG. 4A.
• the plasma generating gas has enough free electrons to conduct electricity.
• cathodes 10, 20, 30 have not been sufficiently heated to achieve thermionic electron emission that would enable a sustainable electric arc that would maintain generation of the plasma flow with characteristics required for a particular application, such as, for example, skin treatment.
• the discharge voltage 206 begins the glow discharge phase.
• cathodes 10, 20, 30 to begin emitting electrons thermionically, their surfaces 12, 22, and 32 have to reach a certain temperature specific to the cathode material, referred to as thermionic electron emission temperature or temperature of thermionic electron emission.
• the temperature of electron emission is approximately 2,800° - 3,200° K.
• the glow discharge shown in FIG. 5D is a self-sustaining discharge with cold cathodes emitting electrons due to secondary emission, mostly due to the ionic bombardment.
• a distinctive feature of this discharge is a layer of positive space charge at the cathodes, with a strong electric field at the surface and considerable potential drop 100 - 400 Volts, in the preferred embodiment. This drop is known in the art as a cathode fall. If the current is increased, the glow discharge will at a specific level transfer into an arc discharge and will by then have reached a sufficient surface temperature to emit electrons thermionically.
• the current passing through cathodes 10, 20, 30, the plasma generating gas in plasma channel 6, and anode 4 increases from 0 A to a predetermined first current preferably in the range of 4 - 6 A. Preferably, this current is maintained for 1 - 10 ms.
• the predetermined voltage when the current begins to increase is between e '05 - e '1 ' 5 times the voltage at time / 2 , but preferably it is approximately e ⁇ times the voltage at time J 2 .
• the voltage applied between anode 4 and cathodes 10, 20, 30 at time / 2 is approximately 400 Volts.
• the current through the plasma generating gas is increased to approximately 5 A.
• the current increase is a ramp 208 with duration of 300 - 500 microseconds between J 3 and / 4 .
• the cathodes begin to emit electrons thermionically from their surfaces 12, 22, and 32 as shown in FIG. 5E. The electron emission at this time is sufficient to sustain an electric arc required for generating the plasma of desired properties.
• the arc discharge phase begins and the arc between cathodes 10, 20, 30 and anode 4 along plasma channel 6 is established.
• the resistance of the plasma in the flow is approximately 1 - 3 ⁇ .
• the current can be increased to an operational level required for a particular application as shown in FIG. 5F.
• increasing the current to the operational level at this time would lead to the following undesired effects.
• FIG. 5D-F all cathodes in the assembly are involved in the glow discharge phase and then subsequently in the arc discharge phase. Bodies of cathodes 10, 20, 30 continue to be bombarded by the positively charged ions during the glow discharge phase and the arc attaches to the surface area of all cathodes during the arc discharge phase.
• the temperature of cathodes 10, 20, 30 does not drop to the original non-operational level, so that the glow discharge and arc discharge phases occur when the cathodes are still heated from the previous pulse. As greater portions of the cathodes become sufficiently heated to emit electrons with each pulse, the area of plasma attachment increases. At some time, after approximately 300 - 500 pulses, the plasma attaches to the entire surface area of the cathodes and begins to attach to cathode holder 2 as well.
• the cathode holder As the arc attaches to cathode holder 2, the cathode holder becomes heated to the point that it begins to sputter and emit electrons along with electrode materials. This introduces impurities in the plasma flow, which for some applications, especially medical applications, is unacceptable. Furthermore, the cathode holder, which has a melting point significantly lower than that of the cathodes, begins to melt. As the portions of the cathode holder that come in contact with one or more cathodes begin the melt, those cathodes are damaged. This damage results in an imperfection, to which the electric arc could attach during subsequent pulses.
• Attachment of the arc to this imperfection at the base of one or more cathodes may also result in the electric arc terminating outside of the plasma channel. This results in the inability to control whether the plasma is formed in the plasma channel. Additionally, the uncontrolled surface of attachment leads to fluctuations of electric potential on the cathodes. In general, uncontrolled expansion of the area of the arc attachment, leads to unstable operation of the device.
• the current is decreased to the second current.
• the current decrease is a ramp 209 with duration of 300 - 500 microseconds.
• the current is preferably decreased to a level between the minimal current required to sustain the arc discharge and approximately three times that current. For some embodiments this current is in the range of 0.33 - 1.0 A.
• the second current is maintained 5 - 20 ms.
• the current drop results in a decrease of the cross section of the electric arc between cathodes 10, 20, 30 and anode 4 as well as in a decreased area of the arc attachment.
• the decreased current reduces the area of attachment to the size that does not significantly exceed the minimum area.
• the arc does not attach to the entire surface area of the cathodes.
• the emitted electrons concentrate in a relatively small volume and are emitted from a small area, shown in FIG. 5G.
• the ionic current heating the cathode remains strong enough to sustain the thermionic electron emission from the cathode, because of the high current density flux through the small area of attachment.
• This ionic current results in a very high temperature at the area of the arc attachment and the surrounding volume. Decreasing the current applied to cathodes 10, 20, 30, plasma generating gas, and anode 4 in this manner ensures that the arc attaches only to a single cathode, and furthermore that the attachment of the arc is constrained to a relatively small area.
• the cathode diameter has the most significant effect on the minimum sustainable current that may be passed through the cathode while still maintaining an electric arc between the cathode and the anode.
• the minimum current for the cathode with diameter of 1.0 mm and length of 5 mm is approximately 1 A.
• the minimum current for the cathode with diameter of 0.5 mm and length of 5 mm is approximately 0.5 A.
• the minimum current for the cathode with diameter of 0.5 mm and length of 35 mm is approximately 0.3 A.
• the plasma attaches to only one cathode, it is possible to sustain the electric arc with a relatively small current, compared to the current required for sustaining the arc if it attached to all cathodes in the assembly, as for example between / 4 to / 5 .
• the current required to sustain the arc is approximately a half of what it would have been if the arc attached to all three cathodes.
• the current is increased to the third current, the operational level required for a particular application, preferably in the range of 10 - 80 A.
• the current increase is a ramp 211 with duration of 300 - 500 microseconds between t ⁇ and t&. The rate of increase is 1,000 - 10,000 A/s.
• operational voltage preferably in the range of 30 - 90 Volts remains between anode 4 and cathodes 10, 20, 30 as a result of the geometry of the device and the current passing between one of cathodes 10, 20, 30 and anode 4.
• the current reaches the operational level, and the fully developed plasma flow is maintained at the operational current level 214 and the operational voltage level 216, which are preferably 10 - 80 A and 30 - 90 Volts, respectively. These operational levels are maintained for the desired duration for a particular application. For example, for skin treatment, the preferred duration t ⁇ - / 8 is 5 - 100 ms.
• FIG. 5H shows an electric arc between one of the cathodes, cathode 10, and anode 4 that sustains a fully developed plasma flow. During the operational period of the pulse, The electric arc has a cross-section that is not significantly larger than the cross-section of the arc during period / 6 - t ⁇ , when the second current is passed.
• FIG. 6A schematically illustrates the temperature and the area of attachment for a single-cathode assembly for a sequence of pulses generated according to the prior art methods.
• the upper graph shows the current as a function of time.
• the middle graph shows the temperature of the cathode as a function of time.
• the bottom graph shows the area of arc attachment to the cathode assembly as a function of time.
• FIG. 6A shows only four pulses for the purposes of illustration, the actual processes may occur over the span of about 300 - 500 pulses.
• the first illustrated pulse may be the first actual pulse
• the second illustrated pulse may be the 150th actual pulse
• the third illustrated pulse may be the 300th actual pulse
• the fourth illustrated pulse may be the 450th actual pulse.
• the cathode is cold, and the arc attaches to a small area of the cathode surface.
• the current passing through the cathode during the first illustrated pulse increases the temperature of the cathode.
• the temperature of the cathode decreases somewhat before the next pulse, it does not decrease to its original non-operational temperature.
• the area of arc attachment does not increase, however, the temperature of the cathode increases even further.
• the temperature decreases somewhat, but does not reach even the temperature of the cathode before the second pulse.
• the temperature further increases and exceeds critical temperature To, above which the entire body of the cathode is able to thermionically emit electrons.
• the area of attachment increases rapidly with each next pulse. As shown in FIG. 6A, by the fourth illustrated pulse, the area of arc attachment covers the entire cathode surface.
• FIG. 6B schematically illustrates the temperature and the area of attachment of the preferred embodiment of the multi-cathode assembly for a sequence of pulses generated according to embodiments of this invention.
• the current pulses correspond to the ones shown in FIG. 4B and described above.
• the illustrated pulses correspond to the actual pulses in the same manner as in FIG. 6A.
• in each pulse of current after the arc is started it attaches to all cathodes in the assembly.
• the current then decreases to reduce the area of attachment to only a single cathode, and only then is the current increased to the operational level. Because for substantially the entire duration of the pulse, the arc attaches to a small area, the entire body of the cathode is not significantly heated.
• the cathodes cool rapidly because a large portion of the cathode assembly was relatively cold during the pulse.
• the temperature of the cathode drops to a non-operational temperature before the next actual pulse. Therefore, when the next actual current pulse begins, the cathodes in the assembly have the original non-operational temperature.
• the temperature of the cathodes again drops to original non-operational level. Because the temperature of the cathodes never exceeds To, the area of attachment does not increase and remains approximately the same for tens of thousands pulses as shown in the bottom graph of FIG. 6B.
• FIG. 7 A is a sketch of a microscopic view of a single-cathode assembly after 500 pulses generated according to the prior art methods.
• Area 350 is the area of attachment of the electric arc during the last pulse of the 500-pulse session.
• Cathode holder 352 has melted and area 350 includes the entire cathode.
• Microscopic examination of the cathode showed that the area of attachment is heavily eroded, which is due to the temperature instability of the cathode that results from the method of operation without regard for controlling the area of attachment.
• FIG. 7B is a sketch of a microscopic view of a multi-cathode assembly after 40,000 pulses generated according to embodiments of the method of the present invention.
• Area 360 is the area of attachment during the last pulse of the 40,000-pulse session.
• the cathode holder and the longitudinal portion of the cathodes closest to the holder are unaffected because the arc never attaches to them.
• the portions of the cathodes that are covered by the area of attachment are affected insignificantly by the arc because the arc attaches to that area only between U and J 5 , as shown in FIG. 5F, and after / 5 , the area of attachment is reduced to a small area on one of the cathodes, so that the remainder of the cathodes is not affected by the arc.
• the arc begins to attach to the next shortest cathode, cathode 30.
• cathode 30 After a few thousand pulses, the end of cathode 30 loses its well defined edge 34 as well.
• the arc attaches to different cathodes in the order of increasing length. After the arc has been attaching to the longest cathode, and because of the heat absorbed by its anode end, ends of all of the cathodes closest to the anode lose their well defined edges due to some melting. [0061] Once this happens, the arc begins to attach to the shortest cathode again.
• the arc attaches to cathode 10 for a few thousands of pulses, until the anode further loses the definition of its edge 14. At this point, the arc begins to attach to the second shortest cathode, cathode 20, that has the anode end with a better defined edge 22 than edge 12 In a few thousand pulses, the arc attaches to the next shortest cathode, etc. [0062] For the cathode assembly shown in FIG. 2, experiments have shown that the arc attaches to cathode 10 for approximately 10,000 pulses, then it attaches to cathode 20 for the next approximately 10,000 pulses, and then to cathode 30 for the next approximately 10,000 pulses.

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