EP2126629A4 - Dispositif et procédé de fabrication d'un filtre à particules comportant des micropores espacés régulièrement - Google Patents

Dispositif et procédé de fabrication d'un filtre à particules comportant des micropores espacés régulièrement

Info

Publication number
EP2126629A4
EP2126629A4 EP08743851A EP08743851A EP2126629A4 EP 2126629 A4 EP2126629 A4 EP 2126629A4 EP 08743851 A EP08743851 A EP 08743851A EP 08743851 A EP08743851 A EP 08743851A EP 2126629 A4 EP2126629 A4 EP 2126629A4
Authority
EP
European Patent Office
Prior art keywords
manufacturing
particulate filter
regularly spaced
micropores
spaced micropores
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP08743851A
Other languages
German (de)
English (en)
Other versions
EP2126629A1 (fr
Inventor
John C Wolfe
Paul Ruchhoeft
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
University of Houston
Original Assignee
University of Houston
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US11/856,615 external-priority patent/US7960708B2/en
Application filed by University of Houston filed Critical University of Houston
Publication of EP2126629A1 publication Critical patent/EP2126629A1/fr
Publication of EP2126629A4 publication Critical patent/EP2126629A4/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D67/00—Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
    • B01D67/0002—Organic membrane manufacture
    • B01D67/0023—Organic membrane manufacture by inducing porosity into non porous precursor membranes
    • B01D67/0032—Organic membrane manufacture by inducing porosity into non porous precursor membranes by elimination of segments of the precursor, e.g. nucleation-track membranes, lithography or laser methods
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D67/00—Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
    • B01D67/0002—Organic membrane manufacture
    • B01D67/0023—Organic membrane manufacture by inducing porosity into non porous precursor membranes
    • B01D67/0032—Organic membrane manufacture by inducing porosity into non porous precursor membranes by elimination of segments of the precursor, e.g. nucleation-track membranes, lithography or laser methods
    • B01D67/0034—Organic membrane manufacture by inducing porosity into non porous precursor membranes by elimination of segments of the precursor, e.g. nucleation-track membranes, lithography or laser methods by micromachining techniques, e.g. using masking and etching steps, photolithography
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
    • B01D71/06—Organic material
    • B01D71/48—Polyesters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2037—Exposure with X-ray radiation or corpuscular radiation, through a mask with a pattern opaque to that radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • H01J37/3056—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching for microworking, e. g. etching of gratings or trimming of electrical components
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2323/00—Details relating to membrane preparation
    • B01D2323/42—Details of membrane preparation apparatus
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2325/00—Details relating to properties of membranes
    • B01D2325/02—Details relating to pores or porosity of the membranes
    • B01D2325/028—Microfluidic pore structures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3174—Etching microareas
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31752—Lithography using particular beams or near-field effects, e.g. STM-like techniques
    • H01J2237/31755—Lithography using particular beams or near-field effects, e.g. STM-like techniques using ion beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31777—Lithography by projection
    • H01J2237/31788—Lithography by projection through mask

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Micromachines (AREA)
EP08743851A 2007-03-13 2008-03-13 Dispositif et procédé de fabrication d'un filtre à particules comportant des micropores espacés régulièrement Withdrawn EP2126629A4 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US89459307P 2007-03-13 2007-03-13
US11/856,615 US7960708B2 (en) 2007-03-13 2007-09-17 Device and method for manufacturing a particulate filter with regularly spaced micropores
PCT/US2008/056848 WO2008112888A1 (fr) 2007-03-13 2008-03-13 Dispositif et procédé de fabrication d'un filtre à particules comportant des micropores espacés régulièrement

Publications (2)

Publication Number Publication Date
EP2126629A1 EP2126629A1 (fr) 2009-12-02
EP2126629A4 true EP2126629A4 (fr) 2011-12-21

Family

ID=39760043

Family Applications (1)

Application Number Title Priority Date Filing Date
EP08743851A Withdrawn EP2126629A4 (fr) 2007-03-13 2008-03-13 Dispositif et procédé de fabrication d'un filtre à particules comportant des micropores espacés régulièrement

Country Status (3)

Country Link
EP (1) EP2126629A4 (fr)
JP (1) JP2010521291A (fr)
WO (1) WO2008112888A1 (fr)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011139445A1 (fr) * 2010-05-03 2011-11-10 Creatv Microtech, Inc. Microfiltres en polymère et procédés de fabrication de ceux-ci
TWI464843B (zh) * 2011-03-02 2014-12-11 Unimicron Technology Corp 封裝基板
DE102011017696A1 (de) * 2011-04-28 2012-10-31 Siemens Aktiengesellschaft Mikrosieb und Verfahren zum Herstellen eines Mikrosiebs
US10576430B2 (en) 2017-12-11 2020-03-03 General Electric Company System and method for manufacturing a membrane filter

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL9401260A (nl) 1993-11-12 1995-06-01 Cornelis Johannes Maria Van Ri Membraan voor microfiltratie, ultrafiltratie, gasscheiding en katalyse, werkwijze ter vervaardiging van een dergelijk membraan, mal ter vervaardiging van een dergelijk membraan, alsmede diverse scheidingssystemen omvattende een dergelijk membraan.
US5786396A (en) * 1996-08-21 1998-07-28 Tonen Chemical Corporation Method of producing microporous polyolefin membrane
AU7291398A (en) * 1997-05-06 1998-11-27 Thermoceramix, L.L.C. Deposited resistive coatings
AU780338B2 (en) * 1999-12-08 2005-03-17 Baxter International Inc. Microporous filter membrane, method of making microporous filter membrane and separator employing microporous filter membranes
AU2003239533A1 (en) * 2002-05-20 2003-12-12 The University Of Houston System Energetic neutral particle lithographic apparatus and process
US7597815B2 (en) * 2003-05-29 2009-10-06 Dressel Pte. Ltd. Process for producing a porous track membrane
JP2005174590A (ja) * 2003-12-08 2005-06-30 Denso Corp スタータ用電磁スイッチ
US7106416B2 (en) * 2003-12-10 2006-09-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
DE102004034983A1 (de) * 2004-07-16 2006-02-02 Carl Zeiss Jena Gmbh Lichtrastermikroskop

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
HAN K ET AL: "Fabrication and characterization of polymeric microfiltration membranes using aperture array lithography", JOURNAL OF MEMBRANE SCIENCE, ELSEVIER SCIENTIFIC PUBL.COMPANY. AMSTERDAM, NL, vol. 249, no. 1-2, 1 March 2005 (2005-03-01), pages 193 - 206, XP004731307, ISSN: 0376-7388, DOI: 10.1016/J.MEMSCI.2004.09.044 *
HUDEK P ET AL: "Directly sputtered stress-compensated carbon protective layer for silicon stencil masks*", JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B: MICROELECTRONICSPROCESSING AND PHENOMENA, AMERICAN VACUUM SOCIETY, NEW YORK, NY, US, vol. 17, no. 6, 1 November 1999 (1999-11-01), pages 3127 - 3131, XP012007889, ISSN: 0734-211X, DOI: 10.1116/1.590966 *

Also Published As

Publication number Publication date
JP2010521291A (ja) 2010-06-24
EP2126629A1 (fr) 2009-12-02
WO2008112888A1 (fr) 2008-09-18

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