EP2093305A1 - Verfahren zum Aufbringen von Nanopartikeln auf eine Unterlage - Google Patents

Verfahren zum Aufbringen von Nanopartikeln auf eine Unterlage Download PDF

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Publication number
EP2093305A1
EP2093305A1 EP08151463A EP08151463A EP2093305A1 EP 2093305 A1 EP2093305 A1 EP 2093305A1 EP 08151463 A EP08151463 A EP 08151463A EP 08151463 A EP08151463 A EP 08151463A EP 2093305 A1 EP2093305 A1 EP 2093305A1
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EP
European Patent Office
Prior art keywords
nanoparticles
support
atmospheric plasma
colloidal solution
plasma
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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EP08151463A
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English (en)
French (fr)
Inventor
François RENIERS
Frédéric Demoisson
Jean-Jacques Pireaux
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Universite Libre de Bruxelles ULB
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Universite Libre de Bruxelles ULB
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Application filed by Universite Libre de Bruxelles ULB filed Critical Universite Libre de Bruxelles ULB
Priority to EP08151463A priority Critical patent/EP2093305A1/de
Priority to KR1020107005411A priority patent/KR20100072184A/ko
Priority to PCT/EP2008/060676 priority patent/WO2009021988A1/fr
Priority to CA2696081A priority patent/CA2696081A1/en
Priority to CN200880111576A priority patent/CN101821421A/zh
Priority to JP2010520582A priority patent/JP2010535624A/ja
Priority to US12/673,437 priority patent/US20120003397A1/en
Priority to EP08787216.4A priority patent/EP2179071B1/de
Publication of EP2093305A1 publication Critical patent/EP2093305A1/de
Withdrawn legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • C23C4/06—Metallic material
    • C23C4/08—Metallic material containing only metal elements
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C24/00—Coating starting from inorganic powder
    • C23C24/02—Coating starting from inorganic powder by application of pressure only
    • C23C24/04—Impact or kinetic deposition of particles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • C23C4/06—Metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • C23C4/10—Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying

Definitions

  • the present invention relates to a method for depositing and fixing nanoparticles on any support.
  • nanoparticle describes an aggregate of small molecules, or an assembly of a few tens to a few thousand atoms, forming a particle whose dimensions are of the order of one nanometer, that is to say say less than 1000nm (1 ⁇ ). Because of their size, these particles possess particular physical, electrical, chemical and magnetic properties and give the supports on which they are applied new physical, electrical, chemical, magnetic and mechanical properties.
  • Nanoparticles are of growing interest because of their involvement in the development of many devices used in very different fields, such as the detection of biological or chemical compounds, the detection of chemical gases or vapors, the elaboration of batteries. fuel or hydrogen storage devices, the production of electronic or optical nanostructures, new chemical catalysts, biosensors, or so-called intelligent coatings, such as self-cleaning coatings or which have a particular biological activity, antibacterial for example.
  • the present invention aims to propose a method of depositing nanoparticles on a support which does not have the drawbacks of the state of the art.
  • the present invention aims to provide a fast, inexpensive process and easy implementation.
  • the present invention also discloses the use of a colloidal solution of nanoparticles for the deposition of nanoparticles on a support, and the use of an atmospheric plasma for the deposition of nanoparticles on a support, which do not have the disadvantages of state of the art.
  • nanoparticle means an aggregate of small molecules, or an assembly of a few hundred to a few thousand atoms, forming a particle whose dimensions are of the order of one nanometer, generally less than 100 nm.
  • colloidal solution is intended to mean a homogeneous suspension of particles in which the solvent is a liquid and the solute a solid that is homogeneously dispersed in the form of very fine particles.
  • Colloidal solutions can take various forms, liquid, gel or paste.
  • the colloidal solutions are intermediate between the suspensions, which are heterogeneous media comprising microscopic particles dispersed in a liquid, and the true solutions, in which the solute (s) are in the state of molecular division in the solvent.
  • “Atmospheric plasma” is understood to mean a partially or totally ionized gas which comprises electrons, ions (molecular or atomic), atoms or molecules, and radicals, out of thermodynamic equilibrium, whose electron temperature is significantly greater. to that of ions and neutrals, and whose pressure is between about 1 mbar and about 1200 mbar.
  • the present invention also discloses the use of a colloidal solution of nanoparticles for depositing nanoparticles on a support using an atmospheric plasma.
  • the present invention also describes the use of an atmospheric plasma for the deposition of nanoparticles on a support, said nanoparticles being in the form of a colloidal solution of nanoparticles, and said colloidal solution being nebulized on the surface of said support in said atmospheric plasma.
  • the figure 1 represents the size distribution of the gold particles of a colloidal solution.
  • the figure 2 represents an image obtained by transmission electron microscopy (TEM) of a colloidal solution of gold particles.
  • TEM transmission electron microscopy
  • the figure 3 schematically represents an atmospheric plasma torch.
  • the figure 4 represents X-ray photoelectron spectroscopy (XPS) spectra of the surface of HOPG graphite after plasma gold nanoparticle deposition.
  • XPS X-ray photoelectron spectroscopy
  • the figure 5 represents atomic force microscopy (AFM) images of a HOPG graphite sample a) before, and b) after deposition of gold nanoparticles.
  • AFM atomic force microscopy
  • the figure 6 represents high resolution electron microscopy images of secondary electrons (FEG-SEM) of a HOPG graphite sample a) before, b) and c) after depositing gold nanoparticles.
  • FEG-SEM secondary electrons
  • magnification x 2000 magnification x 2000
  • magnification x 25000 magnification x 80000.
  • EDS Energy dispersive analysis
  • the figure 7 represents the comparison of the experimental XPS spectrum of Au 4f level presented in Figure 4 (b) and spectrum modeled using a Volmer-Weber growth model.
  • the figure 8 represents an X-ray photoelectron spectroscopy spectrum (XPS) of the surface of HOPG graphite after deposition of gold nanoparticles without the use of a plasma.
  • XPS X-ray photoelectron spectroscopy spectrum
  • the figure 9 represents a high-resolution electron microscopy image of secondary electrons (FEG-SEM) of a HOPG graphite sample after the deposition of gold nanoparticles without the use of a plasma.
  • FEG-SEM secondary electrons
  • the figure 10 represents an image (magnification x 100000) obtained by high resolution electron microscopy of secondary electrons (FEG-SEM) of a steel sample after deposition of gold nanoparticles.
  • the figure 11 represents an image (magnification ⁇ 3000) obtained by high-resolution electron microscopy of secondary electrons (FEG-SEM) of a glass sample after deposition of gold nanoparticles.
  • the figure 12 represents an image (magnification x 50000) obtained by high-resolution electron microscopy of secondary electrons (FEG-SEM) of a sample of PVC polymer after deposition of gold nanoparticles
  • the figure 13 represents an image (magnification ⁇ 10000) obtained by high resolution electron microscopy of the secondary electrons (FEG-SEM) of a sample of HDPE polymer after deposition of gold nanoparticles.
  • the method for deposition of nanoparticles according to the invention involves a colloidal solution or suspension of nanoparticles which is deposited on any support with the aid of an atmospheric plasma, said atmospheric plasma being able to be generated by any suitable device making use of of an atmospheric plasma.
  • the deposition of nanoparticles according to the invention uses only a low energy consumption.
  • the deposition of nanoparticles is rapid because the activation of the support and the nebulization of the nanoparticles, and possibly also the prior cleaning of the support, are carried out in the atmospheric plasma, or in the flow of the atmospheric plasma, in a single step or one continuous process.
  • the process according to the invention allows a strong adhesion of the nanoparticles to the support.
  • This technique makes it possible to control the properties of the interface and to adjust the deposition of the nanoparticles on the support.
  • this method does not require expensive installations and is easily implemented industrially.
  • the colloidal solution of nanoparticles can be prepared by any technique and / or any suitable means.
  • the support, on which the colloidal solution of nanoparticles is deposited is any suitable material that can be covered with nanoparticles, any material whatever its nature and / or its shape.
  • it is a solid support, a gel or a nano-structured material.
  • the plasma is any suitable atmospheric plasma. It is a plasma generated at a pressure of between about 1 mbar and about 1200 mbar. Preferably, it is an atmospheric plasma whose macroscopic temperature of the gas can vary for example between room temperature and about 400 ° C. Preferably, the plasma is generated by an atmospheric plasma torch.
  • An atmospheric plasma does not use vacuum, which makes it inexpensive and easy to maintain.
  • the atmospheric plasma makes it possible to clean and activate the surface of the support, either by functionalizing it, for example by creating oxygen, nitrogen, sulfur, and / or hydrogenated groups, or by creating surface defects, for example gaps, steps, and / or stings.
  • the activation of the support and the nebulization of the colloidal solution are concomitant, namely in the plasma, or in the plasma flow, generated by a device making use of an atmospheric plasma.
  • the nebulization of the colloidal solution occurs at the same time, or immediately after, the activation of the support by the atmospheric plasma.
  • the nebulization of the colloidal solution can be done either in the discharge zone or in the post-discharge zone of the atmospheric plasma.
  • the nebulization of the colloidal solution is in the post-discharge zone of the plasma because, in certain cases, this can present additional benefits. This may not contaminate the device generating the plasma. This may make it possible to facilitate the treatment of polymeric supports, to avoid the degradation of the support to be coated, and also, for example, not to cause melting, oxidation, degradation and / or aggregation of the nanoparticles.
  • the nebulization of the colloidal solution is any nebulization adequate and can be done in any orientation with respect to the surface of the support.
  • the nebulization is substantially parallel to the support, but it can also be done for example at an angle of about 45 °, or for example at an angle of about 75 °.
  • gold nanoparticles have been deposited on highly oriented pyrolytic graphite (HOPG), a support which has chemical properties similar to those of multiwall carbon nanotubes (MWCNTs).
  • HOPG highly oriented pyrolytic graphite
  • HOPG Highly Oriented Pyrolytic Graphite
  • HOPG Highly Oriented Pyrolytic Graphite
  • this graphite with a size of 10 mm x 10 mm x 1 mm, has an angle called "mosaic spread angle" of 0.8 ° ⁇ 0.2 ° and a lateral grit size. greater than 1 mm.
  • Some surface layers of the graphite are previously detached with adhesive tape, before the graphite sample is immersed in an ethanol solution for 5 minutes, advantageously under ultrasonication.
  • the colloidal suspension is prepared for example according to the method of thermal reduction of citrate as described in the article by Turkevich et al. J. Faraday Discuss. Chem. Soc. (1951), page 11 55, according to the following reaction: 6 HAuCl 4 + K 3 C 6 H 5 O 7 + 5 H 2 O ⁇ 6 Au + 6 CO 2 + 21 HCl + 3 KCl, in which the citrate acts as a reducing agent and as a stabilizer.
  • a gold solution is prepared by adding 95 ml of a 134 mM aqueous solution of tetrachloroauric acid (HAuCl 4 , 3H 2 O, Merck) and 5 ml of a 34 mM aqueous solution of trisodium citrate ( C 6 Hg0 7 Na 3 , 2H 2 O, Merck) with 900 mL of distilled water. The solution thus obtained is then boiled for 15 minutes. In a pale yellow color, the gold solution then changes to a red color in the space of one to three minutes.
  • HuCl 4 tetrachloroauric acid
  • trisodium citrate C 6 Hg0 7 Na 3 , 2H 2 O, Merck
  • This method of thermal reduction of the citrate makes it possible to obtain a stable dispersion of gold particles, whose gold concentration is 134 mM, and whose particles have an average diameter of approximately 10 nm and approximately 10% of polydispersity ( Figure 1 ).
  • the deposition of the gold colloidal suspension on the highly oriented pyrolytic graphite is effected, for example, using an AtomfloTM-250 plasma source (Surfx Technologies LLC).
  • the diffuser of the plasma torch comprises two perforated aluminum electrodes, 33 mm in diameter, and separated by a gap of 1.6 mm wide.
  • the diffuser is placed inside a sealed chamber, preferably under an argon atmosphere, preferably at room temperature.
  • the upper electrode of the plasma source is connected to a radio frequency generator, for example 13.56 MHz, while the lower electrode is grounded.
  • the plasma torch operates at 80 W and the plasma is formed by feeding the torch upstream of the electrodes with the plasma gas, which is preferably argon, at a flow rate of 30 L / min for example.
  • the space between the graphite sample HOPG and the lower electrode is 6 ⁇ 1 mm. This space is under atmospheric pressure.
  • the graphite support is subjected to the plasma flow of the plasma torch, for for example about 2 minutes, which allows cleaning and activating the support.
  • the colloidal suspension for example 3 to 5 ml, is nebulized, preferably in the post-discharge zone of the plasma torch, preferably substantially parallel to the sample ( Figure 3 ).
  • the colloidal suspension is injected for about 5 minutes, by periodic pulsations of about one second, spaced apart for about 15 seconds.
  • the samples are then washed in an ethanol solution under ultrasonication for about 5 minutes.
  • XPS X-ray photoelectron spectroscopy
  • the charge effects on the measured binding energy positions were corrected by setting the binding energy of the carbon spectral envelope, C (1s), to 284.6 eV, a generally accepted value for contamination. accidental carbon surface.
  • C (1s) carbon spectral envelope
  • the spectra of carbon, oxygen and gold have been deconvolved in using a baseline model of Shirley and a Gaussian-Lorentzian model.
  • FIG. figure 4 The XPS spectra of the surface of HOPG graphite coated with nanoparticles are represented in FIG. figure 4 .
  • the figure 4 a) shows the presence of carbon at a percentage of 77.8%, oxygen at a percentage of 14.9%, potassium at a percentage of 3.2% and gold at a percentage of 1.0%. Traces of silica were also detected; these are impurities incorporated in the HOPG graphite samples.
  • This analysis indicates a high gold adhesion to HOPG graphite although the samples were washed in an ethanol solution under ultrasonication. It should be noted that with or without the ultrasonic ethanol cleaning step, the amount of gold deposited on the HOPG graphite is similar.
  • the surface morphology of HOPG graphite coated with nanoparticles was studied by performing Atomic Force Microscopy (AFM) images recorded using a PicoSPM® LE instrument with a functioning Nanoscope IIIa (Digital Instruments, Veeco) controller. under ambient conditions.
  • the microscope is equipped with a 25 ⁇ m analyzer and operates in contact mode.
  • the cantilever used is a Nanosensors NC-AFM Pointprobe® low-frequency silica probe (Wetzlar-Blankenfeld, Germany) having an integrated pyramidal end with a radius of curvature of 110 nm.
  • the spring constant of the cantilever is between 30 and 70 N m -1 and its free resonance frequency measurement is 163.1 kHz.
  • the images were recorded at scan rates of 0.5 to 1 line per second.
  • Atomic force microscopy images (1 ⁇ m x 1 ⁇ m) before and after the deposition of the nanoparticles by plasma treatment are represented in FIG. figure 5 .
  • the graphite is covered with clusters, or islands, of gold that are either isolated, and have a diameter less than 0.003 ⁇ m, or branched, and have a diameter greater than 0.1 ⁇ m. These islands are dispersed homogeneously with a recovery rate of about 12%.
  • the graphite samples are first deposited on a copper strip of a sample holder before being introduced into the analysis chamber under a pressure of approximately 10 -8 mbar.
  • Table 1 summarizes the characteristics of the structure of the islands of gold on the HOPG graphite resulting from the analysis of three Au4f spectra by the QUASES-Tougaard software, which express themselves in recovery rate and height of the islands of gold.
  • the growth mode is of the Volmer-Weber type (3D structure in islands) Table 1: Samples Height of islands of gold h (nm) Percentage of recovery (%) Thickness of carbon (contamination layer) (nm) AT 10.6 9.9 1.0 B 11.1 15.0 0.6 VS 9.2 6, 0 0.2
  • the height of the islands of gold varies between 9.2 and 10.6 nm, values substantially identical to the average diameter of the nanoparticles of the colloidal suspension ( Figure 1 ).
  • the surface of the support is covered with islands of gold of about 10 nm.
  • a gold coverage percentage of about 10% is in agreement with the recovery rate determined by atomic force microscopy and scanning electron microscopy.
  • a comparative test was carried out between a deposit of gold nanoparticles on HOPG according to the process of the invention and a deposit of gold nanoparticles on HOPG by nebulization of a colloidal solution of gold without the use of atmospheric plasma. ( Figures 8 and 9 ). After the deposition of the nanoparticles and before analysis, the samples, obtained with or without plasma treatment, were washed with ethanol for about 5 minutes with ultrasound.
  • gold nanoparticles are deposited on a steel support ( Figure 10 ) according to the method of the invention.
  • gold nanoparticles are deposited on a glass support ( Figure 11 ) according to the method of the invention.
  • gold nanoparticles are deposited on a polymer support, ie PVC ( Figure 12 ) or HDPE ( Figure 13 ) according to the method of the invention.
  • the microscopy images of Figures 12 and 13 were obtained after covering the samples with a metal layer.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Manufacture Of Metal Powder And Suspensions Thereof (AREA)
EP08151463A 2007-08-14 2008-02-14 Verfahren zum Aufbringen von Nanopartikeln auf eine Unterlage Withdrawn EP2093305A1 (de)

Priority Applications (8)

Application Number Priority Date Filing Date Title
EP08151463A EP2093305A1 (de) 2008-02-14 2008-02-14 Verfahren zum Aufbringen von Nanopartikeln auf eine Unterlage
KR1020107005411A KR20100072184A (ko) 2007-08-14 2008-08-14 지지체에 나노입자를 퇴적시키는 방법
PCT/EP2008/060676 WO2009021988A1 (fr) 2007-08-14 2008-08-14 Procédé de dépôt de nanoparticules sur un support
CA2696081A CA2696081A1 (en) 2007-08-14 2008-08-14 Method for depositing nanoparticles on a support
CN200880111576A CN101821421A (zh) 2007-08-14 2008-08-14 在载体上沉积纳米微粒的方法
JP2010520582A JP2010535624A (ja) 2007-08-14 2008-08-14 支持体上にナノ粒子を付着するための方法
US12/673,437 US20120003397A1 (en) 2007-08-14 2008-08-14 Method for depositing nanoparticles on a support
EP08787216.4A EP2179071B1 (de) 2007-08-14 2008-08-14 Verfahren zum aufbringen von nanopartikeln auf eine unterlage

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Application Number Priority Date Filing Date Title
EP08151463A EP2093305A1 (de) 2008-02-14 2008-02-14 Verfahren zum Aufbringen von Nanopartikeln auf eine Unterlage

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105499797A (zh) * 2016-02-22 2016-04-20 上海拓宝机电科技有限公司 大型侧开孔薄壁件激光熔覆所用的支撑装置
EP3960703A1 (de) * 2020-08-26 2022-03-02 Institute Jozef Stefan Verfahren zur in-situ-synthese und -abscheidung von metalloxidnanopartikeln mit atmosphärendruckplasma

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WO2004035496A2 (en) * 2002-07-19 2004-04-29 Ppg Industries Ohio, Inc. Article having nano-scaled structures and a process for making such article
US20050031876A1 (en) * 2003-07-18 2005-02-10 Songwei Lu Nanostructured coatings and related methods
FR2877015A1 (fr) * 2004-10-21 2006-04-28 Commissariat Energie Atomique Revetement nanostructure et procede de revetement.
DE102006005775A1 (de) * 2006-02-07 2007-08-09 Forschungszentrum Jülich GmbH Thermisches Spritzverfahren mit kolloidaler Suspension

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105499797A (zh) * 2016-02-22 2016-04-20 上海拓宝机电科技有限公司 大型侧开孔薄壁件激光熔覆所用的支撑装置
CN105499797B (zh) * 2016-02-22 2017-04-19 安徽拓宝增材制造科技有限公司 大型侧开孔薄壁件激光熔覆所用的支撑装置
EP3960703A1 (de) * 2020-08-26 2022-03-02 Institute Jozef Stefan Verfahren zur in-situ-synthese und -abscheidung von metalloxidnanopartikeln mit atmosphärendruckplasma

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