EP2058521B1 - Pumping unit and corresponding heating device - Google Patents

Pumping unit and corresponding heating device Download PDF

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Publication number
EP2058521B1
EP2058521B1 EP08168232A EP08168232A EP2058521B1 EP 2058521 B1 EP2058521 B1 EP 2058521B1 EP 08168232 A EP08168232 A EP 08168232A EP 08168232 A EP08168232 A EP 08168232A EP 2058521 B1 EP2058521 B1 EP 2058521B1
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EP
European Patent Office
Prior art keywords
inlet
heating
pumping unit
outlet
discharge
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EP08168232A
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German (de)
French (fr)
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EP2058521A1 (en
Inventor
Thierry Neel
Morgan Gelhaye
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Pfeiffer Vacuum SAS
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Alcatel Lucent SAS
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    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C29/00—Component parts, details or accessories of pumps or pumping installations, not provided for in groups F04C18/00 - F04C28/00
    • F04C29/04—Heating; Cooling; Heat insulation
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B53/00—Component parts, details or accessories not provided for in, or of interest apart from, groups F04B1/00 - F04B23/00 or F04B39/00 - F04B47/00
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
    • F04B37/10—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use
    • F04B37/14—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use to obtain high vacuum
    • F04B37/16—Means for nullifying unswept space
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C18/00—Rotary-piston pumps specially adapted for elastic fluids
    • F04C18/08—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing
    • F04C18/12—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type
    • F04C18/126—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type with radially from the rotor body extending elements, not necessarily co-operating with corresponding recesses in the other rotor, e.g. lobes, Roots type
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C2220/00—Application
    • F04C2220/10—Vacuum
    • F04C2220/12—Dry running
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C2220/00—Application
    • F04C2220/30—Use in a chemical vapor deposition [CVD] process or in a similar process
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C2280/00—Arrangements for preventing or removing deposits or corrosion
    • F04C2280/02—Preventing solid deposits in pumps, e.g. in vacuum pumps with chemical vapour deposition [CVD] processes

Definitions

  • the present invention relates to a pumping unit comprising a single-stage dry vacuum pump, such as rotary lobes type "Roots".
  • the invention also relates to the use of a corresponding heating device.
  • Dry vacuum pumps are particularly used in semiconductor, flat panel or photovoltaic substrate manufacturing processes in which significant quantities of abrasive powders are generated.
  • rotary lobe pumps also known as "Roots” pumps with two or three lobes (bi-lobes, tri-lobes).
  • the rotary lobe pumps “Roots” comprise two rotors of identical profiles, rotating inside a stator in opposite directions. During rotation, the sucked gas is trapped in the free space between the rotors and the stator, then it is discharged by the exhaust. The operation is carried out without any mechanical contact between the rotors and the body of the pump, which allows the total absence of oil in the compression chamber.
  • these pumps require a particular parameterization, especially of the temperature, when they are used with processes pollutants, such as semiconductor processes and more particularly the CVD ("Chemical Vapor Deposition") processes, among which the LPCVD ("low-pressure chemical vapor deposition") processes or in English “Low Pressure Chemical Vapor Deposition”), ALD ("Atomic Layer Deposition”), MOCVD ("Chemical Vapor Deposition of Organic Metal” or “Metal-Organic Chemical Vapor Deposition”) or PECVD (“Plasma Enhanced Chemical Vapor Deposition”).
  • CVD Chemical Vapor Deposition
  • LPCVD low-pressure chemical vapor deposition
  • ALD Atomic Layer Deposition
  • MOCVD Chemical Vapor Deposition of Organic Metal
  • Metal-Organic Chemical Vapor Deposition Metal-Organic Chemical Vapor Deposition
  • PECVD Pasma Enhanced Chemical Vapor Deposition
  • Reducing the failure rate of the pumps on these powder-generating processes is essential so as not to hinder the manufacturing processes.
  • one solution consists in keeping the gases at a sufficiently high temperature to maintain in gaseous form the species that may condense or risk initiating chemical reactions in the compression stage.
  • a radiative heating means integrated in the discharge of a turbomolecular pump we know, for example, of the document JP2002021775 , considered as describing the closest prior art, a radiative heating means integrated in the discharge of a turbomolecular pump.
  • a heating blanket is defined as metal wires sandwiched between textile layers.
  • these covers have the disadvantage of being bulky and expensive. Moreover their efficiency and the homogeneity of the heating depend on their installation, and a bad contact between the cover and the pump body can lead to cold zones where the gases can condense.
  • a cooling constraint of certain targeted functional areas of the pump such as bearings, gears and the motor part, as well as the lubricating fluid.
  • a heating blanket is not always suitable, particularly in the case of small single-stage pumps, because it makes the cooling of the functional areas less effective. But it is this very weak cooling that generates a temperature profile on the pump body favoring the birth of deposits.
  • the object of the present invention is therefore to provide a pumping unit whose heating is optimized so as to prevent mechanical malfunctions, such as mechanical seizures, while allowing maintenance of the functional areas and the lubricant at a lower temperature.
  • the subject of the invention is a pumping unit comprising a single-stage dry vacuum pump having a compression stage body having a gas inlet and a gas outlet, and comprising respectively on the inlet and the output an inlet and outlet flange connection, and a heating means of said vacuum pump.
  • the heating means comprises two heating resistors disposed respectively at the inlet and the outlet of the gases, in planes parallel to each other and perpendicular to the direction of the gas to be pumped, so as to heat by thermal diffusion the floor body between the entrance and the exit.
  • the invention also relates to the use of a heating device for a single-stage dry vacuum pump having a compression stage body having an inlet and a gas outlet, respectively comprising the inlet and the output an inlet flange (16) and discharge connection.
  • the heating device comprises two heating resistances disposed respectively at the gas inlet and at the gas outlet, in planes parallel to each other and perpendicular to the direction of the gas to be pumped so as to heat by thermal diffusion. floor body between the entrance and the exit.
  • At least one heating resistor has a shape of a circular arc strip.
  • At least one heating resistor comprises a plurality of holes in order to be fixed to an intake and / or discharge flange connection of a pumping unit as previously described.
  • the heating device comprises a temperature sensor and a temperature controller adapted to control the supply of the heating resistor.
  • a pumping unit 1 comprising a single-stage dry vacuum pump 2, an inlet flange connection 16 and a discharge flange connection 18.
  • the vacuum pump 2 comprises a motor 3, two oil pans 5 and 6, two bearings 7 and 9 and a compression stage 11.
  • the engine 3, the two oil sump 5 and 6 and the two bearings 7 and 9 are cooled by a cooling circuit 12 with a liquid, such as water at ambient temperature, circulating in particular at the interface between the oil sump 5 and 6 and bearings 7 and 9.
  • a liquid such as water at ambient temperature
  • the stage 11 comprises a stage body 13 in which two rotors can rotate (not visible).
  • the stage body 13 has a gas inlet 15 located on the upper part of the stage 11 and a gas outlet 17 on the lower part of the stage 11 ( figure 1 ).
  • the gas to be pumped can thus be sucked from the gas intake inlet 15 of the stage 11 (arrow 19) to the discharge outlet of the gases 7 (arrow 21).
  • the inlet flange connection 16 is disposed at the inlet 15 of the pump 2 and the discharge flange connection 18 at the outlet 17 of the vacuum pump 2.
  • the discharge flange connection 18 comprises a discharge flange 28 which connects the outlet 17 of the pump 2 to a vacuum line intended to be connected to the intake inlet of a primary vacuum pump.
  • a high-volume single-stage vacuum pump 2 which is connected in series to a lower-flow primary pump that can pump the pumped gases to atmospheric pressure (not shown).
  • the inlet flange connection 16 includes an inlet flange 26 which connects the inlet 15 of the pump 2 to a gas inlet vacuum line, for example from a process chamber.
  • the invention is also applicable to any type of rotary lobe-type single-stage dry vacuum pump 2 such as a single-stage Roots pump with two lobes or more.
  • the pumping unit 1 comprises a first heating resistor 24 (see FIG. figure 2 ) which is a circular arc-shaped piece disposed at the discharge flange connection 18, so as to be able to heat said stage body 13 by thermal diffusion.
  • the surface heated by the heating resistor 24 is maximum on the flow path of the gases (arrows 19, 21) at the discharge 17 ( figure 1 ).
  • the axial space in the direction of the pumped gas flow 19, 21 is minimal, which makes it possible to connect the suction of a primary pump to the nearest vacuum pump 2 single-stage, and allows to limit the congestion of the pumping group.
  • stage body 13 is thus heated at the discharge 17, the most critical zone of the pump 2, since in this zone the gases are at a higher pressure and therefore more conducive to condensing.
  • the heating resistor 24 is always arranged in the same way on the pump 2, that is to say that the quality of the contact between the heating resistor 24 and the connection with discharge flanges 18 is not dependent on its implementation as was the case in the prior art.
  • an electrical resistance heating makes it possible to quickly reach a predefined operating temperature of the stage body 13 of the pump 2, which reduces the startup time of the vacuum pumps 2.
  • the heating resistor 24 is disposed at the discharge flange 28 of the discharge flange connection 18. It is advantageously further placed in contact with a corresponding surface of the discharge flange 28.
  • the corresponding surface of the discharge flange 28 has dimensions substantially identical to those of the surface of the heating resistor 24 so as to optimize the surface to be heated.
  • the pumping unit 1 further comprises a second heating resistor 29, disposed at the inlet of the gases 15, so as to be able to heat by heat diffusion said stage body 13 between the inlet 15 and the outlet 17.
  • the pumping unit 1 comprises a second heating resistor 29 also having a shape of a circular arc strip, arranged at the level of the inlet flange connection 16, so as to be able to heat diffusion heat said stage body 13 between said inlet 15 and said outlet 17.
  • the second heating resistor 29 is disposed at the inlet flange 26 and is advantageously placed in contact with a corresponding surface of the flange 26.
  • the pump 2 comprises only one stage 11, a heating of the stage body 13 is obtained in all the circulation zones. gas, ensuring that the stage body 13 is heated wherever the gas flows, so that it can not condense there.
  • the pump 2 can be cooled normally, so that the heating constraints on the one hand, and the cooling of targeted functional areas on the other hand, can be respected. It is thus ensured that a thermal gradient is maintained between, on the one hand, the engine 3, the oil sump 5 and 6 and the bearings 7 and 9 and, on the other hand, the stage body 13.
  • said flange connections 16, 18 are located in parallel planes, so that said two heating resistors 24, 29 are placed in planes parallel to each other and perpendicular to the direction of flow of the gas to be pumped 19, 21.
  • the heating resistors 24, 29 are located on either side of the gas flowing in the stage 11, which makes it possible to obtain a symmetrical thermal profile in the stage body 13, in the axis 25 of the flow of pumped gas 19, 21.
  • the second heating resistor 29 is also an arcuate band-shaped part, which makes it possible to optimize the heated surface, as for the first heating resistor 24 placed at the discharge 17.
  • the heating resistors 24, 29 are centered around an axis 25, preferably rectilinear, defining the general direction of circulation of the gases 19, 21.
  • the heating resistors 24, 29 can be attached to the inlet flange 16 and / or discharge 18 connections.
  • at least one heating resistor 24, 29 has a plurality of holes for fixing the heating resistor 24, 29 at the inlet flange connections 16 and / or the discharge connections 18.
  • a heating resistor 24 having four holes 31, corresponding to the four fixing holes of the discharge flange 28, for fixing the resistor 24 to the discharge flange connection 18, via fastening screws 30.
  • the pumping unit 1 advantageously comprises a plurality of spacers 27.
  • at least one annular spacer 27 is disposed around each hole 31.
  • the spacers 27 are arranged between the heating resistor 24 and the head of the fixing screws 30 so as to ensure the reproducibility of the thermal contact between the resistor 24 and the flanges 26, 28.
  • the spacers 27 make it possible to limit the stroke of the fastening screws 30 in order to avoid crushing the heating resistors 24, 29 when they are fastened to the flanges 26, 28.
  • the heating resistors 24, 29 are for example formed by a resistive wire molded in an electrically insulating sheath, and they comprise a thermally insulating foam, for example silicone, fixed on a face opposite to the face facing the flange connection 16 or 18.
  • At least one heating resistor is integrated in the intake flange connection 16 and / or discharge 18 (not shown).
  • values of heating resistances 24, 29 are chosen so that a temperature of the stage body 13 can be maintained between 50 ° C. and 120 ° C.
  • the pumping unit 1 comprises a temperature sensor and a temperature controller, the controller being able to control the supply of the heating resistor 24, 29, in particular by measuring the sensor, so as to controlling the temperature of the stage body 13 of the pump 2 (not shown).
  • the temperature sensor for example a type K or R thermocouple or a platinum resistance thermometer, is placed at the level of the heating resistor 24, 29 or the body of the stage 13 and advantageously in contact with a flange connection surface 16 and / or 18.
  • the temperature sensor is integrated, for example cast, into the heating resistor 24 29.
  • the temperature controller may also be adapted to regulate the temperature of the heating resistor 24, 29 by a conventional PID control loop.
  • a temperature controller With a temperature controller, it is able to absorb temperature fluctuations occurring during the course of a process.
  • the position of the heating resistors 24, 29 has been studied to ensure a symmetry of the thermal profile of the pump body to prevent deposits and seizure of the pump. It is thus ensured to obtain the necessary temperature in the body of the stage 13 of the pump 2, while allowing effective cooling of the functional zones 3, 5, 6, 7, 8, 9. In particular the cooling of the bearings 7 and 9 must ensure a sufficiently low temperature to ensure the proper functioning of the bearings.
  • a stable pump body temperature of 2 allows to minimize the thermal variations of the pump body 2 which could be detrimental to it.
  • the temperature control makes it possible to maintain a high temperature of the stage body 13, including during the maintenance phases of the pump 2 where the pump 2 is stopped and thus to limit the risks of seizure which can occur at the moment restarts of the vacuum pump 2.
  • a pumping unit 1 comprising a first heating resistor 24 and a second heating resistor 29, preferably in the form of a circular arc band, arranged parallel to the level of the connection with discharge flanges 18 and the connection with inlet flanges 16 respectively and perpendicular to the direction of the gas to be pumped so as to be able to heat said stage body 13 by thermal diffusion, the stage body 13 is heated in a controlled manner.

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Applications Or Details Of Rotary Compressors (AREA)
  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
  • General Induction Heating (AREA)
  • Compressor (AREA)

Abstract

The unit (1) has a single staged dry vacuum pump (2) e.g. single staged bilobed root pump, including a compression stage body (13) provided with gas inlet and outlet (15, 17). A heating unit has removable heating resistors (24, 29) arranged at the inlet and the outlet, respectively, in planes that are parallel between them and are perpendicular to directions (19, 21) of gas to be pumped to heat the body by thermal diffusion between the inlet and the outlet, where the resistors are in the form of circular arc shaped bands.

Description

La présente invention concerne une unité de pompage comportant une pompe à vide sèche mono-étagée, telle qu'à lobes rotatifs de type « Roots ». L'invention concerne également l'utilisation d'un dispositif de chauffage correspondant.The present invention relates to a pumping unit comprising a single-stage dry vacuum pump, such as rotary lobes type "Roots". The invention also relates to the use of a corresponding heating device.

Les pompes à vide sèches sont notamment employées dans les procédés de fabrication de semi-conducteurs, d'écrans plats ou de substrats photovoltaïques, dans lesquels des quantités non négligeables de poudres abrasives sont générées.Dry vacuum pumps are particularly used in semiconductor, flat panel or photovoltaic substrate manufacturing processes in which significant quantities of abrasive powders are generated.

On distingue, parmi les pompes à vide connues, les pompes mono-étagées qui ne comportent qu'un seul étage de compression dans lequel circule un gaz à pomper entre une entrée d'admission des gaz et une sortie de refoulement des gaz.Among the known vacuum pumps, there are single-stage pumps which comprise only one compression stage in which a gas to be pumped circulates between a gas intake inlet and a gas discharge outlet.

Par exemple, on connaît les pompes à lobes rotatifs également connues sous le nom de pompes « Roots » avec deux ou trois lobes (bi-lobes, tri-lobes).For example, known rotary lobe pumps also known as "Roots" pumps with two or three lobes (bi-lobes, tri-lobes).

De façon générale, les pompes à lobes rotatifs « Roots » comprennent deux rotors de profils identiques, tournant à l'intérieur d'un stator en sens opposé. Lors de la rotation, le gaz aspiré est emprisonné dans l'espace libre compris entre les rotors et le stator, puis il est refoulé par l'échappement. Le fonctionnement s'effectue sans aucun contact mécanique entre les rotors et le corps de la pompe, ce qui permet l'absence totale d'huile dans la chambre de compression.In general, the rotary lobe pumps "Roots" comprise two rotors of identical profiles, rotating inside a stator in opposite directions. During rotation, the sucked gas is trapped in the free space between the rotors and the stator, then it is discharged by the exhaust. The operation is carried out without any mechanical contact between the rotors and the body of the pump, which allows the total absence of oil in the compression chamber.

Etant donné que le fonctionnement de ces pompes s'effectue sans contact mécanique entre les stators et les rotors à lobes, mais via de très faibles jeux, ces pompes nécessitent un paramétrage particulier, notamment de la température, lorsqu'elles sont utilisées avec des procédés polluants, tels que les procédés semi-conducteurs et plus particulièrement les procédés CVD (« Déposition par Vapeur Chimique » en anglais ou « Chemical Vapor Déposition »), parmi lesquels les procédés LPCVD (« Déposition par Vapeur Chimique à basse pression» ou en anglais « Low Pressure Chemical Vapor Deposition »), ALD (« Déposition de couches atomiques » ou en anglais « Atomic Layer Déposition »), MOCVD (« Déposition par Vapeur chimique de Métal Organique » ou en anglais « Metal-Organic Chemical Vapour Déposition ») ou PECVD (« Déposition par Vapeur chimique en présence de plasma » ou en anglais « Plasma Enhanced Chemical Vapor Deposition »).Since the operation of these pumps is carried out without mechanical contact between the stators and the lobe rotors, but via very small clearances, these pumps require a particular parameterization, especially of the temperature, when they are used with processes pollutants, such as semiconductor processes and more particularly the CVD ("Chemical Vapor Deposition") processes, among which the LPCVD ("low-pressure chemical vapor deposition") processes or in English "Low Pressure Chemical Vapor Deposition"), ALD ("Atomic Layer Deposition"), MOCVD ("Chemical Vapor Deposition of Organic Metal" or "Metal-Organic Chemical Vapor Deposition") or PECVD ("Plasma Enhanced Chemical Vapor Deposition").

Ces procédés utilisent des gaz dont on souhaite éviter la condensation ou la solidification en poudre. En effet, une accumulation importante de poudre sur les parties mobiles des étages de compression conduit très rapidement à l'arrêt de la pompe, notamment par grippage mélanique.These processes use gases which it is desired to avoid condensation or powder solidification. Indeed, a large accumulation of powder on the moving parts of the compression stages very quickly leads to stopping the pump, in particular by melanic seizure.

Or, le maintien des jeux fonctionnels à l'intérieur de l'étage de la pompe est important pour assurer une durée de fonctionnement maximale.However, maintaining the functional clearances inside the pump stage is important to ensure maximum operating time.

La réduction du taux de défaillance des pompes sur ces procédés générateurs de poudre est essentielle pour ne pas gêner les processus de fabrication.Reducing the failure rate of the pumps on these powder-generating processes is essential so as not to hinder the manufacturing processes.

Pour cela, une solution consiste à conserver les gaz à une température suffisamment élevée pour maintenir sous forme gazeuse les espèces risquant de se condenser ou risquant d'amorcer des réactions chimiques dans l'étage de compression. On connait par exemple du document JP2002021775 , considéré comme décrivant l'art antérieur le plus proche, un moyen de chauffage par rayonnement, intégré dans le refoulement d'une pompe turbomoléculaire.For this, one solution consists in keeping the gases at a sufficiently high temperature to maintain in gaseous form the species that may condense or risk initiating chemical reactions in the compression stage. We know, for example, of the document JP2002021775 , considered as describing the closest prior art, a radiative heating means integrated in the discharge of a turbomolecular pump.

Toutefois, cette mise en oeuvre n'est pas toujours possible sur des pompes mono-étagées. Notamment, dans les procédés semi-conducteurs tels que LPCVD, l'énergie thermique dégagée par la compression ne suffit pas toujours pour maintenir une température du corps de pompe assez élevée du fait des faibles valeurs de pressions et de flux.However, this implementation is not always possible on single-stage pumps. In particular, in semiconductor processes such as LPCVD, the thermal energy released by the compression is not always sufficient to maintain a sufficiently high temperature of the pump body due to the low pressure and flow values.

Pour pallier à cela, il est connu d'isoler thermiquement les corps de pompe par des couvertures isolantes ou chauffantes, comme décrit par exemple dans le document JP-2007-262906 . Une couverture chauffante se définit comme des fils métalliques pris en sandwich entre des couches textiles. Toutefois, ces couvertures présentent l'inconvénient d'être encombrantes et onéreuses. De plus leur efficacité et l'homogénéité du chauffage dépendent de leur mise en place, et un mauvais contact entre la couverture et le corps de pompe peut entraîner des zones froides où les gaz peuvent se condenser.To overcome this, it is known to thermally insulate the pump bodies by insulating blankets or heating, as described for example in the document JP-2007-262906 . A heating blanket is defined as metal wires sandwiched between textile layers. However, these covers have the disadvantage of being bulky and expensive. Moreover their efficiency and the homogeneity of the heating depend on their installation, and a bad contact between the cover and the pump body can lead to cold zones where the gases can condense.

Or, les pompes présentent souvent un carter anguleux sur lequel un ajustement précis des couvertures est quasiment impossible.However, the pumps often have a sharp housing on which a precise adjustment of the covers is almost impossible.

Par ailleurs, à cette contrainte de maintenir les gaz circulant dans la pompe à une température prédéfinie, s'ajoute une contrainte de refroidissement de certaines zones fonctionnelles ciblées de la pompe, telles que les paliers, les engrenages et la partie motorisation, ainsi que le fluide lubrifiant.Moreover, to this constraint to maintain the gases circulating in the pump at a predefined temperature, is added a cooling constraint of certain targeted functional areas of the pump, such as bearings, gears and the motor part, as well as the lubricating fluid.

On comprend donc qu'une couverture chauffante n'est pas toujours adaptée, en particulier dans le cas des petites pompes mono-étagées, car elle rend le refroidissement des zones fonctionnelles moins efficace. Or c'est ce refroidissement même faible qui génère un profil de température sur le corps de pompe favorisant la naissance de dépôts.It is therefore understood that a heating blanket is not always suitable, particularly in the case of small single-stage pumps, because it makes the cooling of the functional areas less effective. But it is this very weak cooling that generates a temperature profile on the pump body favoring the birth of deposits.

Le but de la présente invention est donc de proposer une unité de pompage dont le chauffage est optimisé de façon à prévenir des dysfonctionnements mécaniques, tels que des grippages mécaniques, tout en permettant le maintien des zones fonctionnelles et du lubrifiant à température plus basse.The object of the present invention is therefore to provide a pumping unit whose heating is optimized so as to prevent mechanical malfunctions, such as mechanical seizures, while allowing maintenance of the functional areas and the lubricant at a lower temperature.

A cet effet, l'invention a pour objet une unité de pompage comportant une pompe à vide sèche mono-étagée présentant un corps d'étage de compression ayant une entrée des gaz et une sortie des gaz, et comportant respectivement sur l'entrée et la sortie un raccordement à brides d'admission et de refoulement, et un moyen de chauffage de ladite pompe à vide.For this purpose, the subject of the invention is a pumping unit comprising a single-stage dry vacuum pump having a compression stage body having a gas inlet and a gas outlet, and comprising respectively on the inlet and the output an inlet and outlet flange connection, and a heating means of said vacuum pump.

Selon l'invention, le moyen de chauffage comporte deux résistances chauffantes disposées respectivement à l'entrée et à la sortie des gaz, dans des plans parallèles entre eux et perpendiculaires à la direction du gaz à pomper, de manière à chauffer par diffusion thermique le corps d'étage entre l'entrée et la sortie.According to the invention, the heating means comprises two heating resistors disposed respectively at the inlet and the outlet of the gases, in planes parallel to each other and perpendicular to the direction of the gas to be pumped, so as to heat by thermal diffusion the floor body between the entrance and the exit.

Suivant d'autres caractéristiques de l'unité de pompage,

  • les résistances chauffantes sont centrées autour d'un axe définissant la direction générale de circulation des gaz ;
  • l'unité de pompage comporte au moins une résistance chauffante présentant une forme de bande d'arc de cercle, disposée au niveau des raccordements à brides de refoulement et d'admission, de manière à pouvoir chauffer par diffusion thermique ledit corps d'étage entre l'entrée et la sortie ;
  • lesdits raccordements à brides sont situés dans des plans parallèles, de sorte que lesdites deux résistances chauffantes sont placées dans des plans parallèles entre eux et perpendiculaires à la direction de circulation du gaz à pomper ;
  • au moins une résistance chauffante comporte une pluralité de trous pour la fixation de la résistance chauffante aux raccordements à brides d'admission et/ou de refoulement ;
  • au moins une résistance chauffante est fixée aux raccordements à brides d'admission et/ou de refoulement au moyen de vis de fixation et d'entretoises disposées entre la résistance chauffante et la tête des vis de fixation ; au moins une résistance chauffante est intégrée dans le raccordement à brides d'admission et/ou de refoulement ;
  • l'unité de pompage comporte un circuit pour le refroidissement du moteur (3), des deux carters d'huile (5, 6) et des paliers (7, 9) apte à assurer un gradient thermique entre d'une part le moteur (3), les carters d'huile (5, 6) et les paliers (7, 9), et d'autre part, le corps d'étage (13);
  • l'unité de pompage comporte un capteur de température et un contrôleur de température, ledit contrôleur étant apte à contrôler l'alimentation de la résistance chauffante, de manière à contrôler la température dudit corps d'étage de la pompe.
According to other characteristics of the pumping unit,
  • the heating resistors are centered around an axis defining the general direction of circulation of the gases;
  • the pumping unit comprises at least one heating resistor having a shape of a circular arc strip, arranged at the level of the connections with discharge and intake flanges, so as to be able to heat by heat diffusion said stage body between entry and exit;
  • said flange connections are located in parallel planes, so that said two heating resistors are placed in planes parallel to each other and perpendicular to the direction of flow of the gas to be pumped;
  • at least one heating resistor has a plurality of holes for attaching the heating resistor to the inlet and / or discharge flange connections;
  • at least one heating resistor is attached to the intake and / or discharge flange connections by means of fixing screws and spacers disposed between the heating resistor and the head of the fixing screws; at least one heating resistor is integrated in the intake and / or discharge flange connection;
  • the pumping unit comprises a circuit for cooling the motor (3), two oil pans (5, 6) and bearings (7, 9) capable of ensuring a thermal gradient between, on the one hand, the motor ( 3), the oil sump (5, 6) and the bearings (7, 9), and on the other hand, the stage body (13);
  • the pumping unit comprises a temperature sensor and a temperature controller, said controller being able to control the supply of the heating resistor, so as to control the temperature of said pump stage body.

L'invention a aussi pour objet l'utilisation d'un dispositif de chauffage pour une pompe à vide sèche mono-étagée présentant un corps d'étage de compression ayant une entrée et une sortie des gaz, comportant respectivement sur l'entrée et la sortie un raccordement à brides d'admission (16) et de refoulement.The invention also relates to the use of a heating device for a single-stage dry vacuum pump having a compression stage body having an inlet and a gas outlet, respectively comprising the inlet and the output an inlet flange (16) and discharge connection.

Selon l'invention le dispositif de chauffage comporte deux résistances chauffantes disposées respectivement à l'entrée des gaz et à la sortie des gaz, dans des plans parallèles entre eux et perpendiculaires à la direction du gaz à pomper de manière à chauffer par diffusion thermique le corps d'étage entre l'entrée et la sortie.According to the invention, the heating device comprises two heating resistances disposed respectively at the gas inlet and at the gas outlet, in planes parallel to each other and perpendicular to the direction of the gas to be pumped so as to heat by thermal diffusion. floor body between the entrance and the exit.

Selon une variante, au moins une résistance chauffante présente une forme de bande d'arc de cercle.According to a variant, at least one heating resistor has a shape of a circular arc strip.

Selon une autre variante, au moins une résistance chauffante comporte une pluralité de trous pour pouvoir être fixée à un raccordement à brides d'admission et/ou de refoulement d'une unité de pompage telle que précédemment décrite.According to another variant, at least one heating resistor comprises a plurality of holes in order to be fixed to an intake and / or discharge flange connection of a pumping unit as previously described.

Avantageusement, le dispositif de chauffage comporte un capteur de température et un contrôleur de température apte à contrôler l'alimentation de la résistance chauffante.Advantageously, the heating device comprises a temperature sensor and a temperature controller adapted to control the supply of the heating resistor.

D'autres avantages et caractéristiques apparaîtront à la lecture de la description de l'invention, ainsi que sur les dessins annexés sur lesquels :

  • la figure 1 est une vue de coté d'une unité de pompage selon l'invention,
  • la figure 2 est une vue en perspective d'une résistance chauffante de l'invention,
  • les figures 3 et 4 sont des vues en perspective de dessus et de dessous d'une bride de refoulement selon une variante de réalisation.
Other advantages and characteristics will appear on reading the description of the invention, as well as on the appended drawings in which:
  • the figure 1 is a side view of a pumping unit according to the invention,
  • the figure 2 is a perspective view of a heating resistor of the invention,
  • the Figures 3 and 4 are perspective views from above and below of a discharge flange according to an alternative embodiment.

Sur ces figures, les éléments identiques portent les mêmes numéros de référence.In these figures, the identical elements bear the same reference numbers.

On distingue sur la figure 1, une unité de pompage 1 comportant une pompe à vide 2 sèche mono-étagée, un raccordement à brides d'admission 16 et un raccordement à brides de refoulement 18.We distinguish on the figure 1 , a pumping unit 1 comprising a single-stage dry vacuum pump 2, an inlet flange connection 16 and a discharge flange connection 18.

La pompe à vide 2 comporte un moteur 3, deux carters d'huile 5 et 6, deux paliers 7 et 9 et un étage de compression 11.The vacuum pump 2 comprises a motor 3, two oil pans 5 and 6, two bearings 7 and 9 and a compression stage 11.

Le moteur 3, les deux carters d'huile 5 et 6 et les deux paliers 7 et 9 sont refroidis par un circuit de refroidissement 12 par un liquide, tel que de l'eau à température ambiante, circulant notamment à l'interface entre les carters d'huile 5 et 6 et les paliers 7 et 9.The engine 3, the two oil sump 5 and 6 and the two bearings 7 and 9 are cooled by a cooling circuit 12 with a liquid, such as water at ambient temperature, circulating in particular at the interface between the oil sump 5 and 6 and bearings 7 and 9.

L'étage 11 comporte un corps d'étage 13 dans lequel deux rotors peuvent tourner (non visibles).The stage 11 comprises a stage body 13 in which two rotors can rotate (not visible).

Le corps d'étage 13 possède une entrée des gaz 15 située sur la partie supérieure de l'étage 11 et une sortie des gaz 17 sur la partie inférieure de l'étage 11 (figure 1).The stage body 13 has a gas inlet 15 located on the upper part of the stage 11 and a gas outlet 17 on the lower part of the stage 11 ( figure 1 ).

En fonctionnement, le gaz à pomper peut ainsi être aspiré depuis l'entrée d'admission des gaz 15 de l'étage 11 (flèche 19) vers la sortie de refoulement des gaz 7 (flèche 21).In operation, the gas to be pumped can thus be sucked from the gas intake inlet 15 of the stage 11 (arrow 19) to the discharge outlet of the gases 7 (arrow 21).

Le raccordement à brides d'admission 16 est disposé à l'entrée 15 de la pompe 2 et le raccordement à brides de refoulement 18 à la sortie 17 de la pompe à vide 2.The inlet flange connection 16 is disposed at the inlet 15 of the pump 2 and the discharge flange connection 18 at the outlet 17 of the vacuum pump 2.

Le raccordement à brides de refoulement 18 comporte une bride de refoulement 28 qui connecte la sortie 17 de la pompe 2 à une ligne de vide destinée à être reliée à l'entrée d'admission d'une pompe à vide primaire.The discharge flange connection 18 comprises a discharge flange 28 which connects the outlet 17 of the pump 2 to a vacuum line intended to be connected to the intake inlet of a primary vacuum pump.

En général, on prévoit une pompe à vide 2 mono-étagée de fort débit que l'on connecte en série à une pompe primaire de moindre débit pouvant refouler les gaz pompés à la pression atmosphérique (non représentée).In general, there is provided a high-volume single-stage vacuum pump 2 which is connected in series to a lower-flow primary pump that can pump the pumped gases to atmospheric pressure (not shown).

Le raccordement à brides d'admission 16 comporte une bride d'admission 26 qui connecte l'entrée 15 de la pompe 2 à une ligne de vide d'admission des gaz, par exemple provenant d'une chambre de procédés.The inlet flange connection 16 includes an inlet flange 26 which connects the inlet 15 of the pump 2 to a gas inlet vacuum line, for example from a process chamber.

Bien entendu, l'invention s'applique également à tout type de pompe à vide 2 sèche mono-étagée de type à lobes rotatifs tels qu'une pompe Roots mono-étagée à deux lobes ou plus.Of course, the invention is also applicable to any type of rotary lobe-type single-stage dry vacuum pump 2 such as a single-stage Roots pump with two lobes or more.

Selon un mode de réalisation de l'invention, l'unité de pompage 1 comporte une première résistance chauffante 24 (voir figure 2) qui est une pièce en forme de bande d'arc de cercle disposée au niveau du raccordement à brides de refoulement 18, de manière à pouvoir chauffer ledit corps d'étage 13 par diffusion thermique.According to one embodiment of the invention, the pumping unit 1 comprises a first heating resistor 24 (see FIG. figure 2 ) which is a circular arc-shaped piece disposed at the discharge flange connection 18, so as to be able to heat said stage body 13 by thermal diffusion.

Ainsi, la surface chauffée par la résistance chauffante 24 est maximale sur le chemin d'écoulement des gaz (flèches 19, 21) au refoulement 17 (figure 1).Thus, the surface heated by the heating resistor 24 is maximum on the flow path of the gases (arrows 19, 21) at the discharge 17 ( figure 1 ).

Par ailleurs, l'encombrement axial dans le sens du flux de gaz pompés 19, 21 est minimal, ce qui permet de connecter l'aspiration d'une pompe primaire au plus proche de la pompe à vide 2 mono-étagée, et permet ainsi de limiter l'encombrement du groupe de pompage.Furthermore, the axial space in the direction of the pumped gas flow 19, 21 is minimal, which makes it possible to connect the suction of a primary pump to the nearest vacuum pump 2 single-stage, and allows to limit the congestion of the pumping group.

Le corps d'étage 13 est ainsi chauffé au niveau du refoulement 17, zone la plus critique de la pompe 2 étant donné que dans cette zone, les gaz sont à pression plus élevée et donc plus propices à se condenser.The stage body 13 is thus heated at the discharge 17, the most critical zone of the pump 2, since in this zone the gases are at a higher pressure and therefore more conducive to condensing.

On est en outre assuré que la résistance chauffante 24 est toujours disposée de la même manière sur la pompe 2, c'est-à-dire que la qualité du contact entre la résistance chauffante 24 et le raccordement à brides de refoulement 18 n'est pas dépendante de sa mise en place comme c'était le cas dans l'art antérieur.It is furthermore ensured that the heating resistor 24 is always arranged in the same way on the pump 2, that is to say that the quality of the contact between the heating resistor 24 and the connection with discharge flanges 18 is not dependent on its implementation as was the case in the prior art.

De plus, un chauffage par résistance électrique permet d'atteindre rapidement une température de fonctionnement prédéfinie du corps d'étage 13 de la pompe 2, ce qui réduit le temps de mise en route des pompes à vides 2.In addition, an electrical resistance heating makes it possible to quickly reach a predefined operating temperature of the stage body 13 of the pump 2, which reduces the startup time of the vacuum pumps 2.

Avantageusement et comme représenté sur les figures 3 et 4, la résistance chauffante 24 est disposée au niveau de la bride de refoulement 28 du raccordement à brides de refoulement 18. Elle est avantageusement encore placée en contact avec une surface correspondante de la bride de refoulement 28.Advantageously and as shown on Figures 3 and 4 the heating resistor 24 is disposed at the discharge flange 28 of the discharge flange connection 18. It is advantageously further placed in contact with a corresponding surface of the discharge flange 28.

La surface correspondante de la bride de refoulement 28 présente des dimensions sensiblement identiques à celles de la surface de la résistance chauffante 24 de manière à optimiser la surface à chauffer.The corresponding surface of the discharge flange 28 has dimensions substantially identical to those of the surface of the heating resistor 24 so as to optimize the surface to be heated.

L'unité de pompage 1 comporte en outre une deuxième résistance chauffante 29, disposée au niveau de l'entrée des gaz 15, de manière à pouvoir chauffer par diffusion thermique ledit corps d'étage 13 entre l'entrée 15 et la sortie 17.The pumping unit 1 further comprises a second heating resistor 29, disposed at the inlet of the gases 15, so as to be able to heat by heat diffusion said stage body 13 between the inlet 15 and the outlet 17.

Selon une variante illustrée en figure 1, l'unité de pompage 1 comporte une deuxième résistance chauffante 29 présentant également une forme de bande d'arc de cercle, disposée au niveau du raccordement à brides d'admission 16, de manière à pouvoir chauffer par diffusion thermique ledit corps d'étage 13 entre ladite entrée 15 et ladite sortie 17.According to a variant illustrated in figure 1 , the pumping unit 1 comprises a second heating resistor 29 also having a shape of a circular arc strip, arranged at the level of the inlet flange connection 16, so as to be able to heat diffusion heat said stage body 13 between said inlet 15 and said outlet 17.

Avantageusement, comme pour la première résistance chauffante 24 disposée en sortie 17, la deuxième résistance chauffante 29 est disposée au niveau de la bride d'admission 26 et elle est avantageusement placée en contact avec une surface correspondante de la bride 26.Advantageously, as for the first heating resistor 24 disposed at the outlet 17, the second heating resistor 29 is disposed at the inlet flange 26 and is advantageously placed in contact with a corresponding surface of the flange 26.

Ainsi, on obtient un chauffage ciblé par diffusion thermique entre l'entrée 15 et la sortie 17. Donc, comme la pompe 2 ne comporte qu'un étage 11, on obtient un chauffage du corps d'étage 13 dans toutes les zones de circulation du gaz, assurant que le corps d'étage 13 est chauffé partout où le gaz circule, de sorte qu'il ne pourra pas s'y condenser.Thus, a targeted heating by thermal diffusion between the inlet 15 and the outlet 17 is obtained. Thus, since the pump 2 comprises only one stage 11, a heating of the stage body 13 is obtained in all the circulation zones. gas, ensuring that the stage body 13 is heated wherever the gas flows, so that it can not condense there.

En outre, dans les zones où le gaz ne circule pas, la pompe 2 peut être refroidie normalement, de sorte que les contraintes de chauffage d'une part, et de refroidissement de zones fonctionnelles ciblées d'autre part, peuvent être respectées. On est ainsi assuré qu'un gradient thermique est maintenu entre d'une part le moteur 3, les carters d'huile 5 et 6 et les paliers 7 et 9 et d'autre part, le corps d'étage 13.In addition, in the areas where the gas does not circulate, the pump 2 can be cooled normally, so that the heating constraints on the one hand, and the cooling of targeted functional areas on the other hand, can be respected. It is thus ensured that a thermal gradient is maintained between, on the one hand, the engine 3, the oil sump 5 and 6 and the bearings 7 and 9 and, on the other hand, the stage body 13.

De plus, on est assuré que le profil de chauffage est maîtrisé et reproductible.In addition, it is ensured that the heating profile is controlled and reproducible.

Avantageusement, et comme représenté sur la figure 1, lesdits raccordements à brides 16, 18 sont situés dans des plans parallèles, de sorte que lesdites deux résistances chauffantes 24, 29 sont placées dans des plans parallèles entre eux et perpendiculaires à la direction de circulation du gaz à pomper 19, 21.Advantageously, and as shown on the figure 1 , said flange connections 16, 18 are located in parallel planes, so that said two heating resistors 24, 29 are placed in planes parallel to each other and perpendicular to the direction of flow of the gas to be pumped 19, 21.

Les résistances chauffantes 24, 29 sont donc situées de part et d'autre du gaz circulant dans l'étage 11, ce qui permet d'obtenir un profil thermique symétrique dans le corps d'étage 13, dans l'axe 25 du flux de gaz pompé 19, 21.The heating resistors 24, 29 are located on either side of the gas flowing in the stage 11, which makes it possible to obtain a symmetrical thermal profile in the stage body 13, in the axis 25 of the flow of pumped gas 19, 21.

De préférence, la deuxième résistance chauffante 29 est également une pièce en forme de bande d'arc de cercle, ce qui permet d'optimiser la surface chauffée, comme pour la première résistance chauffante 24 placée au refoulement 17.Preferably, the second heating resistor 29 is also an arcuate band-shaped part, which makes it possible to optimize the heated surface, as for the first heating resistor 24 placed at the discharge 17.

Avantageusement, les résistances chauffantes 24, 29 sont centrées autour d'un axe 25, de préférence rectiligne, définissant la direction générale de circulation des gaz 19, 21.Advantageously, the heating resistors 24, 29 are centered around an axis 25, preferably rectilinear, defining the general direction of circulation of the gases 19, 21.

En outre, on peut fixer les résistances chauffantes 24, 29 aux raccordements à brides d'admission 16 et/ ou de refoulement 18. Ainsi on prévoit qu'au moins une résistance chauffante 24, 29 comporte une pluralité de trous pour la fixation de la résistance chauffante 24, 29 aux raccordements à brides d'admission 16 et/ou de refoulement 18.In addition, the heating resistors 24, 29 can be attached to the inlet flange 16 and / or discharge 18 connections. Thus, it is expected that at least one heating resistor 24, 29 has a plurality of holes for fixing the heating resistor 24, 29 at the inlet flange connections 16 and / or the discharge connections 18.

On a représenté sur les figures 2 à 4, une résistance chauffante 24 comportant quatre trous 31, correspondants aux quatre trous de fixation de la bride de refoulement 28, pour la fixation de la résistance 24 au raccordement à bride de refoulement 18, via des vis de fixations 30.We have shown on Figures 2 to 4 , a heating resistor 24 having four holes 31, corresponding to the four fixing holes of the discharge flange 28, for fixing the resistor 24 to the discharge flange connection 18, via fastening screws 30.

L'unité de pompage 1 comporte avantageusement une pluralité d'entretoises 27. De préférence, au moins une entretoise 27 annulaire est disposée autour de chaque trou 31.The pumping unit 1 advantageously comprises a plurality of spacers 27. Preferably, at least one annular spacer 27 is disposed around each hole 31.

Les entretoises 27 sont disposées entre la résistance chauffante 24 et la tête des vis de fixation 30 de manière à assurer la reproductibilité du contact thermique entre la résistance 24 et les brides 26, 28.The spacers 27 are arranged between the heating resistor 24 and the head of the fixing screws 30 so as to ensure the reproducibility of the thermal contact between the resistor 24 and the flanges 26, 28.

De plus, les entretoises 27 permettent de limiter la course des vis de fixation 30 pour éviter l'écrasement des résistances chauffantes 24, 29 lors de leur fixation aux brides 26, 28.In addition, the spacers 27 make it possible to limit the stroke of the fastening screws 30 in order to avoid crushing the heating resistors 24, 29 when they are fastened to the flanges 26, 28.

Les résistances chauffantes 24, 29 sont par exemple formées par un fil résistif moulé dans une gaine électriquement isolante, et elles comportent une mousse thermiquement isolante, par exemple en silicone, fixée sur une face opposée à la face en regard avec le raccordement à brides 16 ou 18.The heating resistors 24, 29 are for example formed by a resistive wire molded in an electrically insulating sheath, and they comprise a thermally insulating foam, for example silicone, fixed on a face opposite to the face facing the flange connection 16 or 18.

Il est possible d'optimiser encore le transfert thermique entre la résistance chauffante 24, 29 et les raccordements à brides 16, 18 en disposant une plaque de maintien, pour serrer la résistance chauffante 24, 29 contre le raccordement à brides 16, 18.It is possible to further optimize the heat transfer between the heating resistor 24, 29 and the flange connections 16, 18 by disposing a heating plate. holding, to tighten the heating resistor 24, 29 against the flange connection 16, 18.

On obtient ainsi une résistance chauffante 24, 29 amovible, pouvant être facilement changée par exemple, en cas de défaillance.This produces a heating resistor 24, 29 removable, which can be easily changed for example, in case of failure.

Alternativement, au moins une résistance chauffante est intégrée dans le raccordement à brides d'admission 16 et/ou de refoulement 18 (non représenté).Alternatively, at least one heating resistor is integrated in the intake flange connection 16 and / or discharge 18 (not shown).

Avec des résistances chauffantes 24, 29 fixées ou intégrées aux raccordements à brides 16 et 18, on peut équiper une pompe à vide mono-étagée standard 2 sans avoir à modifier ni la pompe à vide 2, ni son entrée 15 ou sa sortie 17.With heating resistors 24, 29 fixed or integrated in the flange connections 16 and 18, it is possible to equip a standard single-stage vacuum pump 2 without having to modify either the vacuum pump 2, its inlet 15 or its outlet 17.

On choisit avantageusement des valeurs de résistances chauffantes 24, 29 permettant de pouvoir maintenir une température du corps d'étage 13 comprise entre 50°C et 120°C.Advantageously, values of heating resistances 24, 29 are chosen so that a temperature of the stage body 13 can be maintained between 50 ° C. and 120 ° C.

Par ailleurs, on prévoit avantageusement que l'unité de pompage 1 comporte un capteur de température et un contrôleur de température, le contrôleur étant apte à contrôler l'alimentation de la résistance chauffante 24, 29, notamment par la mesure du capteur, de manière à contrôler la température du corps d'étage 13 de la pompe 2 (non représentés).Furthermore, it is advantageously provided that the pumping unit 1 comprises a temperature sensor and a temperature controller, the controller being able to control the supply of the heating resistor 24, 29, in particular by measuring the sensor, so as to controlling the temperature of the stage body 13 of the pump 2 (not shown).

Pour cela, le capteur de température, par exemple un thermocouple de type K ou R ou un thermomètre à résistance de platine, est placé au niveau de la résistance chauffante 24, 29 ou du corps de l'étage 13 et avantageusement en contact avec une surface du raccordement à brides 16 et/ou 18.For this, the temperature sensor, for example a type K or R thermocouple or a platinum resistance thermometer, is placed at the level of the heating resistor 24, 29 or the body of the stage 13 and advantageously in contact with a flange connection surface 16 and / or 18.

De préférence, le capteur de température est intégré, par exemple coulé, dans la résistance chauffante 24 29.Preferably, the temperature sensor is integrated, for example cast, into the heating resistor 24 29.

Le contrôleur de température peut en outre être apte à réguler la température de la résistance chauffante 24, 29 par une boucle de régulation classique de type PID.The temperature controller may also be adapted to regulate the temperature of the heating resistor 24, 29 by a conventional PID control loop.

Avec un contrôleur de température, on est capable d'absorber les fluctuations de température survenant lors du déroulement d'un procédé.With a temperature controller, it is able to absorb temperature fluctuations occurring during the course of a process.

Ces fluctuations peuvent provenir soit d'une baisse temporelle de régime de la pompe à vide 2, qui aurait été traduite par une baisse de la température, due par exemple à une diminution en entrée 15 de la pression ou du flux des gaz, soit au contraire, d'une augmentation de la puissance de chauffage en cas de flux de pompage important.These fluctuations can come either from a temporal fall in the speed of the vacuum pump 2, which would have been translated by a drop in temperature, due for example to a decrease in the inlet 15 of the pressure or the flow of the gases, or contrary, an increase in heating power in case of large pumping flow.

Cette régulation de la température permet au corps 13 de pompe 2 de ne pas être en surchauffe, ce qui est à la fois consommateur d'énergie et néfaste pour les zones fonctionnelles 3, 5, 6, 7, 8 ,9 de la pompe 2 qui doivent rester à température plus froide.This regulation of the temperature allows the body 13 of the pump 2 to not be overheated, which is both energy and harmful to the functional areas 3, 5, 6, 7, 8, 9 of the pump 2 which must stay cooler.

La position des résistances chauffantes 24, 29 a donc été étudiée pour garantir une symétrie du profil thermique du corps de pompe permettant d'éviter les dépôts et le grippage de la pompe. On est ainsi assuré d'obtenir la température nécessaire dans le corps du d'étage 13 de la pompe 2, tout en permettant un refroidissement efficace des zones fonctionnelles 3, 5, 6, 7, 8 ,9. Notamment le refroidissement des paliers 7 et 9 doit assurer une température suffisamment basse pour garantir le bon fonctionnement des roulements.The position of the heating resistors 24, 29 has been studied to ensure a symmetry of the thermal profile of the pump body to prevent deposits and seizure of the pump. It is thus ensured to obtain the necessary temperature in the body of the stage 13 of the pump 2, while allowing effective cooling of the functional zones 3, 5, 6, 7, 8, 9. In particular the cooling of the bearings 7 and 9 must ensure a sufficiently low temperature to ensure the proper functioning of the bearings.

Par ailleurs, une température de corps 13 de pompe 2 stable permet de minimiser les variations thermiques du corps 13 de pompe 2 qui pourraient lui être préjudiciables.Furthermore, a stable pump body temperature of 2 allows to minimize the thermal variations of the pump body 2 which could be detrimental to it.

De plus, la régulation de température permet de maintenir une température élevée du corps d'étage 13, y compris durant les phases de maintenance de la pompe 2 où la pompe 2 est arrêtée et ainsi de limiter les risques de grippage qui peuvent survenir au moment des redémarrages de la pompe à vide 2.In addition, the temperature control makes it possible to maintain a high temperature of the stage body 13, including during the maintenance phases of the pump 2 where the pump 2 is stopped and thus to limit the risks of seizure which can occur at the moment restarts of the vacuum pump 2.

Cette régulation fine de la température n'est possible que par l'agencement particulier des résistances chauffantes 24, 29 avec les zones à chauffer. On comprend donc qu'avec une unité de pompage 1 comportant une première résistance chauffante 24 et une deuxième résistance chauffante 29, de préférence en forme de bande d'arc de cercle, disposée parallèlement au niveau du raccordement à brides de refoulement 18 et du raccordement à brides d'admission 16 respectivement et perpendiculairement à la direction du gaz à pomper, de manière à pouvoir chauffer ledit corps d'étage 13 par diffusion thermique, on chauffe le corps d'étage 13 de façon maîtrisée.This fine regulation of the temperature is only possible by the particular arrangement of the heating resistors 24, 29 with the zones to be heated. It will thus be understood that with a pumping unit 1 comprising a first heating resistor 24 and a second heating resistor 29, preferably in the form of a circular arc band, arranged parallel to the level of the connection with discharge flanges 18 and the connection with inlet flanges 16 respectively and perpendicular to the direction of the gas to be pumped so as to be able to heat said stage body 13 by thermal diffusion, the stage body 13 is heated in a controlled manner.

Claims (10)

  1. Pumping unit comprising a single-stage dry vacuum pump (2) having a compression stage body (13) that has an inlet (15) for the gases and an outlet (17) for the gases, respectively comprising on the inlet (15) and the outlet (17) a connection via intake (16) and discharge (18) flanges, and a heating means of said vacuum pump, characterized in that the heating means comprises two heating elements (24) and (29) arranged respectively at the inlet (15) and at the outlet (17) for the gases, in planes parallel to one another and perpendicular to the direction of the gas to be pumped (19, 21) so as to heat by thermal diffusion the stage body (13) between said inlet (15) and said outlet (17).
  2. Pumping unit according to Claim 1, in which the heating elements (24, 29) are centred about an axis (25) defining the general direction of circulation of the gases (19, 21).
  3. Pumping unit according to one of Claims 1 and 2, in which at least one heating element (24, 29) has the form of an arc of circle strip, arranged at the level of the connections via discharge (18) and intake (16) flanges.
  4. Pumping unit according to Claim 3, in which at least one heating element (24, 29) includes a plurality of holes (31) for fixing the heating element (24, 29) to the connections via intake (16) and/or discharge (18) flanges.
  5. Pumping unit according to Claim 4, in which said heating element (24, 29) is fixed to the connections via intake (16) and/or discharge (18) flanges by means of fixing screws (30) and spacers (27) arranged between the heating element (24, 29) and the head of the fixing screws (30).
  6. Pumping unit according to one of Claims 1 to 3, in which at least one heating element is incorporated in the connection via intake (16) and/or discharge (18) flanges.
  7. Pumping unit according to one of the preceding claims, also comprising a circuit for cooling the motor (3), the two oil pans (5, 6) and the bearings (7, 9) capable of providing a thermal gradient between on the one hand the motor (3), the oil pans (5, 6) and the bearings (7, 9), and, on the other hand, the stage body (13).
  8. Use of a heating device so as to heat by thermal diffusion the compression stage body (13) of a single-stage dry vacuum pump between an inlet (15) for the gases and an outlet (17) for the gases of said compression stage body, the single-stage dry vacuum pump including respectively on the inlet (15) and the outlet (17) a connection via intake (16) and discharge (18) flanges, and said heating device including two heating elements (24, 29) that can be arranged respectively at the inlet (15) for the gases and at the outlet (17) for the gases, in planes parallel to one another and perpendicular to the direction of the gas to be pumped (19, 21).
  9. Use of a heating device according to Claim 8, in which at least one heating element (24, 29) has the form of an arc of circle strip.
  10. Use of a heating device according to Claim 9, in which at least one heating element (24, 29) includes a plurality of holes (31) so that it can be fixed to a connection via intake (16) and/or discharge (18) flanges of a pumping unit (1).
EP08168232A 2007-11-09 2008-11-04 Pumping unit and corresponding heating device Active EP2058521B1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0758936A FR2923556A1 (en) 2007-11-09 2007-11-09 PUMPING UNIT AND CORRESPONDING HEATING DEVICE

Publications (2)

Publication Number Publication Date
EP2058521A1 EP2058521A1 (en) 2009-05-13
EP2058521B1 true EP2058521B1 (en) 2011-03-23

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ID=39539726

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Application Number Title Priority Date Filing Date
EP08168232A Active EP2058521B1 (en) 2007-11-09 2008-11-04 Pumping unit and corresponding heating device

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EP (1) EP2058521B1 (en)
KR (1) KR101487021B1 (en)
AT (1) ATE503113T1 (en)
DE (1) DE602008005690D1 (en)
FR (1) FR2923556A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3842642B1 (en) 2010-04-19 2022-09-14 Ebara Corporation Dry vacuum pump apparatus

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112032021B (en) * 2020-09-10 2024-04-26 北京通嘉宏瑞科技有限公司 Temperature regulation and control device for vacuum pump and use method

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL214846A (en) * 1956-02-27
JPH0653883B2 (en) * 1985-08-02 1994-07-20 大同特殊鋼株式会社 Method and apparatus for collecting binder in vacuum sintering
JPS6233703U (en) * 1985-08-13 1987-02-27
JPS6419198A (en) * 1987-07-15 1989-01-23 Hitachi Ltd Vacuum pump
JP3734613B2 (en) * 1997-12-26 2006-01-11 株式会社荏原製作所 Turbo molecular pump
JP3912964B2 (en) * 2000-07-03 2007-05-09 三菱重工業株式会社 Turbo molecular pump
JP2007262906A (en) * 2006-03-27 2007-10-11 Nabtesco Corp Two-stage type vacuum pump

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3842642B1 (en) 2010-04-19 2022-09-14 Ebara Corporation Dry vacuum pump apparatus

Also Published As

Publication number Publication date
DE602008005690D1 (en) 2011-05-05
KR20090048359A (en) 2009-05-13
KR101487021B1 (en) 2015-01-28
EP2058521A1 (en) 2009-05-13
ATE503113T1 (en) 2011-04-15
FR2923556A1 (en) 2009-05-15

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