EP2039810A3 - Method and devices for increasing the service life of a process solution for chemical-reductive metal coating - Google Patents
Method and devices for increasing the service life of a process solution for chemical-reductive metal coating Download PDFInfo
- Publication number
- EP2039810A3 EP2039810A3 EP08022592A EP08022592A EP2039810A3 EP 2039810 A3 EP2039810 A3 EP 2039810A3 EP 08022592 A EP08022592 A EP 08022592A EP 08022592 A EP08022592 A EP 08022592A EP 2039810 A3 EP2039810 A3 EP 2039810A3
- Authority
- EP
- European Patent Office
- Prior art keywords
- process solution
- coating
- chemical
- interfering
- aid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1617—Purification and regeneration of coating baths
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
- C25D21/14—Controlled addition of electrolyte components
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/16—Regeneration of process solutions
- C25D21/22—Regeneration of process solutions by ion-exchange
Abstract
Die Erfindung betrifft ein Verfahren und Vorrichtungen zur Verlängerung der Nutzungsdauer einer Prozesslösung, die bei der chemisch-reduktiven Metallabscheidung verwendet wird. In dem Verfahren erfolgt die pH-Wert-Einstellung und die Nachdosierung der Ionen des Beschichtungsmetalls ohne störende Gegenionen durch Aufgabe der Prozesslösung, gegebenenfalls nach Verdünnung, auf mindestens einen mit Ionen des Beschichtungsmetalls beladenen schwachsauren Kationenaustauscher. Die Nachdosierung des Reduktionsmittels erfolgt entweder in einem Hilfskreislauf oder in eine verdünnte Prozesslösung. Bevorzugt werden aus dem Reduktionsmittel stammende störende Kationen mit Hilfe eines starksaueren Protonenbeladenen Kationenaustauschers und störende Anionen mit Hilfe eines schwachbasischen Anionenaustauschers abgetrennt. Bei der Metallabscheidung sich in der Prozesslösung anreichende störende Kationen werden bevorzugt mit Hilfe eines starksauren Protonen-beladenen Kationenaustauschers abgetrennt. Das Verfahren ermöglicht eine nahezu konstante Zusammensetzung der Prozesslösung mit geringem Fremdstoffgehalt. Dadurch wird eine besondere Qualität der Beschichtung bewirkt. Die Verlängerung der Nutzungsdauer der Prozesslösung steigert die Wirtschaftlichkeit und Umweltverträglichkeit der chemisch-reduktiven Metallbeschichtung. The invention relates to a method and apparatus for extending the service life of a process solution used in chemical-reductive metal deposition. In the process, the pH adjustment and the post-dosing of the ions of the coating metal without interfering counterions by abandonment of the process solution, optionally after dilution, to at least one loaded with ions of the coating metal weakly acidic cation exchanger. The redosing of the reducing agent takes place either in an auxiliary circuit or in a dilute process solution. Preference is given to removing interfering cations originating from the reducing agent with the aid of a strongly acidic proton-loaded cation exchanger and interfering anions with the aid of a weakly basic anion exchanger. In the case of metal deposition, interfering cations which accumulate in the process solution are preferably separated off with the aid of a strongly acidic proton-loaded cation exchanger. The process allows a nearly constant composition of the process solution with low impurity content. This causes a special quality of the coating. The extension of the useful life of the process solution increases the economic efficiency and environmental compatibility of the chemical-reductive metal coating.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2003122120 DE10322120A1 (en) | 2003-05-12 | 2003-05-12 | Methods and devices for extending the service life of a process solution for chemical-reductive metal coating |
EP04738516A EP1623058A2 (en) | 2003-05-12 | 2004-05-12 | Method and devices for increasing the service life of a process solution for chemical-reductive metal coating |
Related Parent Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP04738516A Division EP1623058A2 (en) | 2003-05-12 | 2004-05-12 | Method and devices for increasing the service life of a process solution for chemical-reductive metal coating |
EP04738516.6 Division | 2004-05-12 |
Publications (3)
Publication Number | Publication Date |
---|---|
EP2039810A2 EP2039810A2 (en) | 2009-03-25 |
EP2039810A3 true EP2039810A3 (en) | 2011-11-02 |
EP2039810A8 EP2039810A8 (en) | 2011-12-14 |
Family
ID=33440894
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP08022592A Withdrawn EP2039810A3 (en) | 2003-05-12 | 2004-05-12 | Method and devices for increasing the service life of a process solution for chemical-reductive metal coating |
EP04738516A Withdrawn EP1623058A2 (en) | 2003-05-12 | 2004-05-12 | Method and devices for increasing the service life of a process solution for chemical-reductive metal coating |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP04738516A Withdrawn EP1623058A2 (en) | 2003-05-12 | 2004-05-12 | Method and devices for increasing the service life of a process solution for chemical-reductive metal coating |
Country Status (3)
Country | Link |
---|---|
EP (2) | EP2039810A3 (en) |
DE (1) | DE10322120A1 (en) |
WO (1) | WO2004101866A2 (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102004038693B4 (en) * | 2004-08-10 | 2010-02-25 | Blasberg Werra Chemie Gmbh | Apparatus and method for removing foreign matter from process solutions and process for regenerating a cation exchanger |
ES2698205T3 (en) | 2005-11-25 | 2019-02-01 | Macdermid Enthone Inc | Procedure and device for the purification of process solutions |
DE102008056776A1 (en) | 2008-11-11 | 2010-05-12 | Enthone Inc., West Haven | Galvanic bath and method for the deposition of zinciferous layers |
DE102018008312A1 (en) * | 2018-10-22 | 2020-04-23 | RIAG Oberflächentechnik AG | Process for coating substrate surfaces, device with coating bath, density measuring device, removal device, adding devices and control |
CN110880449B (en) * | 2019-09-30 | 2022-07-19 | 王偲偲 | Silicon wafer cleaning method |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4863612A (en) * | 1987-08-10 | 1989-09-05 | Kinetico, Inc. | Apparatus and method for recovering materials from process baths |
US5112392A (en) * | 1991-06-21 | 1992-05-12 | Martin Marietta Energy Systems, Inc. | Recovery process for electroless plating baths |
DE4310366C1 (en) * | 1993-03-30 | 1994-10-13 | Fraunhofer Ges Forschung | Method for regenerating aqueous coating baths operating in an electroless manner |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2726969A (en) | 1953-12-03 | 1955-12-13 | Gen Motors Corp | Chemical reduction plating process |
US2726968A (en) | 1953-12-03 | 1955-12-13 | Gen Motors Corp | Electroless nickel solution control |
DE19851180C1 (en) * | 1998-11-06 | 2000-04-20 | Guv Ges Fuer Umweltvertraeglic | Chemical reduction metal plating solution is regenerated using a weakly basic anion exchanger for hypophosphite ion recycle to the cathodic chamber of an electrodialysis cell |
-
2003
- 2003-05-12 DE DE2003122120 patent/DE10322120A1/en not_active Ceased
-
2004
- 2004-05-12 EP EP08022592A patent/EP2039810A3/en not_active Withdrawn
- 2004-05-12 EP EP04738516A patent/EP1623058A2/en not_active Withdrawn
- 2004-05-12 WO PCT/DE2004/001043 patent/WO2004101866A2/en active Application Filing
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4863612A (en) * | 1987-08-10 | 1989-09-05 | Kinetico, Inc. | Apparatus and method for recovering materials from process baths |
US4863612B1 (en) * | 1987-08-10 | 1994-11-01 | Kineticon Inc | Apparatus and method for recovering materials from process baths |
US5112392A (en) * | 1991-06-21 | 1992-05-12 | Martin Marietta Energy Systems, Inc. | Recovery process for electroless plating baths |
DE4310366C1 (en) * | 1993-03-30 | 1994-10-13 | Fraunhofer Ges Forschung | Method for regenerating aqueous coating baths operating in an electroless manner |
Non-Patent Citations (1)
Title |
---|
CLEAN PRODUCTS AND PROCESSES, vol. 2, no. 4, 2001, HEIDELBERG, pages 209 - 219, XP008041196 * |
Also Published As
Publication number | Publication date |
---|---|
EP2039810A8 (en) | 2011-12-14 |
WO2004101866A3 (en) | 2005-07-21 |
WO2004101866A2 (en) | 2004-11-25 |
EP2039810A2 (en) | 2009-03-25 |
DE10322120A1 (en) | 2004-12-09 |
EP1623058A2 (en) | 2006-02-08 |
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Legal Events
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RIC1 | Information provided on ipc code assigned before grant |
Ipc: C25D 21/14 20060101ALI20110927BHEP Ipc: C25D 21/22 20060101AFI20110927BHEP Ipc: C23C 18/16 20060101ALI20110927BHEP |
|
RIN1 | Information on inventor provided before grant (corrected) |
Inventor name: SCHWARZ, REINHARD Inventor name: SCHIFFER, ALEXANDER |
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STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
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18D | Application deemed to be withdrawn |
Effective date: 20111201 |