EP2016608A4 - Debris reduction in electron-impact x-ray sources - Google Patents

Debris reduction in electron-impact x-ray sources

Info

Publication number
EP2016608A4
EP2016608A4 EP07748112.5A EP07748112A EP2016608A4 EP 2016608 A4 EP2016608 A4 EP 2016608A4 EP 07748112 A EP07748112 A EP 07748112A EP 2016608 A4 EP2016608 A4 EP 2016608A4
Authority
EP
European Patent Office
Prior art keywords
electron
impact
ray sources
debris reduction
debris
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP07748112.5A
Other languages
German (de)
French (fr)
Other versions
EP2016608B1 (en
EP2016608A1 (en
Inventor
Hans M Hertz
Mikael Otendal
Tomi Tuohimaa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jettec AB
Original Assignee
Jettec AB
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jettec AB filed Critical Jettec AB
Publication of EP2016608A1 publication Critical patent/EP2016608A1/en
Publication of EP2016608A4 publication Critical patent/EP2016608A4/en
Application granted granted Critical
Publication of EP2016608B1 publication Critical patent/EP2016608B1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H01J35/08—Anodes; Anti cathodes
    • H01J35/112—Non-rotating anodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H01J35/08—Anodes; Anti cathodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/003—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/003—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state
    • H05G2/005—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state containing a metal as principal radiation generating component
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2207/00—Particular details of imaging devices or methods using ionizing electromagnetic radiation such as X-rays or gamma rays
    • G21K2207/005—Methods and devices obtaining contrast from non-absorbing interaction of the radiation with matter, e.g. phase contrast
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2235/00—X-ray tubes
    • H01J2235/08—Targets (anodes) and X-ray converters
    • H01J2235/081—Target material
    • H01J2235/082—Fluids, e.g. liquids, gases

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • X-Ray Techniques (AREA)
EP07748112.5A 2006-05-11 2007-05-08 Method and system of debris reduction in electron-impact x-ray sources Active EP2016608B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
SE0601048A SE530094C2 (en) 2006-05-11 2006-05-11 Method for generating X-rays by electron irradiation of a liquid substance
PCT/SE2007/000448 WO2007133144A1 (en) 2006-05-11 2007-05-08 Debris reduction in electron-impact x-ray sources

Publications (3)

Publication Number Publication Date
EP2016608A1 EP2016608A1 (en) 2009-01-21
EP2016608A4 true EP2016608A4 (en) 2014-06-18
EP2016608B1 EP2016608B1 (en) 2016-08-17

Family

ID=38694151

Family Applications (1)

Application Number Title Priority Date Filing Date
EP07748112.5A Active EP2016608B1 (en) 2006-05-11 2007-05-08 Method and system of debris reduction in electron-impact x-ray sources

Country Status (7)

Country Link
US (1) US8170179B2 (en)
EP (1) EP2016608B1 (en)
JP (1) JP5220728B2 (en)
KR (1) KR101380847B1 (en)
CN (1) CN101490790B (en)
SE (1) SE530094C2 (en)
WO (1) WO2007133144A1 (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104022004B (en) * 2009-01-26 2016-09-21 伊克斯拉姆公司 X-ray window
US8681943B2 (en) 2009-01-26 2014-03-25 Excillum Ab X-ray window
CN103250226B (en) * 2010-12-22 2016-02-24 伊克斯拉姆公司 Electron beam in alignment and focal X-ray source
US20140161233A1 (en) * 2012-12-06 2014-06-12 Bruker Axs Gmbh X-ray apparatus with deflectable electron beam
CN105190823B (en) * 2013-02-13 2017-11-17 皇家飞利浦有限公司 multi X-ray beam tube
JP2015025759A (en) * 2013-07-26 2015-02-05 Hoya株式会社 Substrate inspection method, substrate manufacturing method, and substrate inspection device
JP5889968B2 (en) * 2014-07-11 2016-03-22 エクシルム・エービーＥｘｃｉｌｌｕｍ ＡＢ X-ray window
JP2017522697A (en) 2014-07-17 2017-08-10 シーメンス アクチエンゲゼルシヤフトＳｉｅｍｅｎｓ Ａｋｔｉｅｎｇｅｓｅｌｌｓｃｈａｆｔ Fluid injector for x-ray tube and method for providing a liquid anode by liquid metal jet
CN106455285A (en) * 2016-11-14 2017-02-22 上海联影医疗科技有限公司 Target assembly and accelerator provided with same
RU2706713C1 (en) * 2019-04-26 2019-11-20 Общество С Ограниченной Ответственностью "Эуф Лабс" High-brightness short-wave radiation source
EP3525556A1 (en) * 2018-02-09 2019-08-14 Excillum AB A method for protecting an x-ray source, and an x-ray source
US10910188B2 (en) 2018-07-25 2021-02-02 Varian Medical Systems, Inc. Radiation anode target systems and methods

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001046962A1 (en) * 1999-12-20 2001-06-28 Philips Electron Optics B.V. 'x-ray microscope having an x-ray source for soft x-rays

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL88347C (en) * 1951-08-18
US4953191A (en) * 1989-07-24 1990-08-28 The United States Of America As Represented By The United States Department Of Energy High intensity x-ray source using liquid gallium target
US5052034A (en) * 1989-10-30 1991-09-24 Siemens Aktiengesellschaft X-ray generator
JP3602356B2 (en) * 1998-12-02 2004-12-15 三菱電機株式会社 Electromagnetic wave generator
DE19905802A1 (en) * 1999-02-12 2000-08-17 Philips Corp Intellectual Pty X-ray tube
US6711233B2 (en) * 2000-07-28 2004-03-23 Jettec Ab Method and apparatus for generating X-ray or EUV radiation
WO2002011499A1 (en) * 2000-07-28 2002-02-07 Jettec Ab Method and apparatus for generating x-ray or euv radiation
DE10050811A1 (en) * 2000-10-13 2002-04-18 Philips Corp Intellectual Pty Electron beam transparent window
US6760406B2 (en) * 2000-10-13 2004-07-06 Jettec Ab Method and apparatus for generating X-ray or EUV radiation
DE10062928A1 (en) * 2000-12-16 2002-06-20 Philips Corp Intellectual Pty X-ray tube with liquid metal target
EP1485935A1 (en) * 2002-03-08 2004-12-15 Koninklijke Philips Electronics N.V. A device for generating x-rays having a liquid metal anode
WO2003096764A1 (en) * 2002-05-13 2003-11-20 Jettec Ab Method and arrangement for producing radiation
SE523503C2 (en) * 2002-07-23 2004-04-27 Jettec Ab Capillary
JP2004213993A (en) * 2002-12-27 2004-07-29 Toyota Macs Inc Soft x ray light source
DE10306668B4 (en) * 2003-02-13 2009-12-10 Xtreme Technologies Gmbh Arrangement for generating intense short-wave radiation based on a plasma
DE10326279A1 (en) * 2003-06-11 2005-01-05 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Plasma-based generation of X-radiation with a layered target material
DE102004005241B4 (en) * 2004-01-30 2006-03-02 Xtreme Technologies Gmbh Method and device for the plasma-based generation of soft X-rays
DE102004015590B4 (en) * 2004-03-30 2008-10-09 GE Homeland Protection, Inc., Newark Anode module for a liquid metal anode X-ray source and X-ray source with an anode module

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001046962A1 (en) * 1999-12-20 2001-06-28 Philips Electron Optics B.V. 'x-ray microscope having an x-ray source for soft x-rays

Also Published As

Publication number Publication date
KR20090024143A (en) 2009-03-06
SE530094C2 (en) 2008-02-26
JP5220728B2 (en) 2013-06-26
CN101490790A (en) 2009-07-22
CN101490790B (en) 2012-05-09
EP2016608B1 (en) 2016-08-17
JP2009537062A (en) 2009-10-22
SE0601048L (en) 2007-11-12
US8170179B2 (en) 2012-05-01
KR101380847B1 (en) 2014-04-04
EP2016608A1 (en) 2009-01-21
WO2007133144A1 (en) 2007-11-22
US20090141864A1 (en) 2009-06-04

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