CN106455285A - Target assembly and accelerator provided with same - Google Patents
Target assembly and accelerator provided with same Download PDFInfo
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- CN106455285A CN106455285A CN201611029691.3A CN201611029691A CN106455285A CN 106455285 A CN106455285 A CN 106455285A CN 201611029691 A CN201611029691 A CN 201611029691A CN 106455285 A CN106455285 A CN 106455285A
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H6/00—Targets for producing nuclear reactions
Abstract
The invention relates to a target assembly. The target assembly comprises a target which is used for receiving an electron beam to produce high-dose-rate photon ray with energy level of less than or equal to 6MV, wherein the target is 0.2-0.65mm thick, and the target is made from one of tungsten, gold, tantalum, rhenium and tungsten alloy.
Description
Technical field
The present invention relates to a kind of target assembly and the accelerator with the target assembly.
Background technology
Clinac includes accelerator and beam collimation part.Accelerator generally includes accelerating tube and target group
Part, wherein, accelerating tube is used for accelerating the electronics that sends from electron gun, and target assembly generally includes usually high atomic number
Target and the substrate of the aforementioned target of fixation.Beam bombardment from accelerating tube can produce photon beam on target, the photon
Bundle is irradiated to the tumor portion to be treated of patient again through beam collimation part, example of primary collimator, secondary collimator etc.
Position, to kill tumor.
It is well known that the thickness of target can affect the amount of electrons that the photon amount for producing and leakage are penetrated, for example, work as target
When crossing thin, the photon amount of generation is on the low side while the amount of electrons penetrated of leakage is more, conversely, when target is blocked up, leaking the amount of electrons that penetrates and subtracting
Few photon amount simultaneously can also decline.Therefore, the thickness of target generally select in a specific range with more photon amounts with
And weigh between less amount of electrons.In prior art, thicker target is typically chosen so which is producing more photon amount
While leak as few as possible radio.
Content of the invention
The invention provides a kind of target assembly, including target, which is used for receiving electron beam to produce high dose rate and energy level is little
In the Photon beam for being equal to 6MV, wherein, the thickness of the target be 0.2-0.6mm, the target material selected from tungsten, gold, tantalum, rhenium,
One kind of tungsten alloy.
Specifically, the thickness of the target is 0.2-0.65mm, 0.2-0.6mm, 0.2-0.55mm, 0.2-0.5mm, 0.2-
0.45mm、0.2-0.4mm、0.2-0.35mm、0.25-0.65mm、0.25-0.6mm、0.25-0.55mm、0.25-0.5mm、
0.25-0.45mm、0.25-0.4mm、0.3-0.65mm、0.3-0.6mm、0.3-0.55mm、0.3-0.5mm、0.3-0.45mm、
0.35-0.65mm、0.35-0.6mm、0.35-0.55mm、0.35-0.5mm、0.4-0.65mm、0.4-0.6mm、0.4-
0.55mm, 0.45-0.65mm, 0.45-0.6mm or 0.5-0.65mm.
Selectively, the thickness of the target is 0.34-0.36mm.
Selectively, the thickness of the target is 0.44-0.46mm.
Specifically, under FF pattern, the high dose rate be more than or equal to 500MU/min；Or under FFF pattern, institute
State high dose rate be more than or equal to 1000MU/min.Optionally, it is more than or equal to 1000MU/min under FFF pattern.
According to a further aspect in the invention, a kind of accelerator is disclosed, and which includes accelerating tube and aforesaid target assembly, institute
Accelerating tube is stated for accelerating electronics, the target of the target assembly is used for reception and penetrates to produce photon from the electronics of the accelerating tube
Line.
Specifically, the accelerator is clinac.
Description of the drawings
Fig. 1 is the graph of relation of the thickness of tungsten target and photon energy flux in target assembly；
Fig. 2 is the graph of relation of the thickness of tungsten target and electron energy flux in target assembly；And
Fig. 3 is the graph of relation of the depth of target assembly and temperature；
Fig. 4 is a kind of thermal effect figure of the target assembly of embodiment；
Fig. 5 is the unit cell energy deposition curve of the target assembly in vertical central cross-section of Fig. 4；
Fig. 6 is the unit cell energy deposition curve of the target assembly in horizontal centre section of Fig. 4；
Fig. 7 shows a kind of schematic diagram of the target assembly according to the present invention；And
Fig. 8 shows a kind of schematic diagram of the accelerator according to the present invention.
Specific embodiment
Understandable for enabling the above objects, features and advantages of the present invention to become apparent from, below in conjunction with the accompanying drawings to the present invention
Specific embodiment explain.
Target assembly proposed by the present invention includes substrate and the target being fixed on substrate.Specifically, substrate can be by copper
Or the good material of heat conductivility such as rustless steel is made, fixed fluted, the target quilt by way of such as welding of ceiling substrate
It is fixed on substrate, the optional such as tungsten of target, gold, tantalum, the alloy of rhenium or these metals.Generally, target is from tungsten or tungsten
Alloy, here the alloy of tungsten include tungsten and other metals, other metals can be for example rhenium or rustless steel, normally,
In the alloy of tungsten, the mass ratio of other metals is very low, for example, only account within 10%.In addition, the alloy of the tungsten as target is general
Composite target can be also referred to as.More preferably, it is additionally provided with for cooling down target in the substrate and near target
Part, such as water pipe.Optionally, the target can also directly contact cooling medium and be cooled, the cooling medium such as may be used
Think water.The target assembly of the present invention is typically coupled together with accelerating tube, and, for convenient disassembly, the target assembly is generally made
Outside the vaccum case of accelerating tube being set to for a single component, for example, in the air is directly exposed to.The present invention is proposed
Target assembly can be used in clinac in, wherein, target assembly can be placed in the treatment head of clinac
Interior and couple on beam path with aforesaid accelerating tube, so, the high-velocity electron beam from accelerating tube is bombarded to target assembly
Target on, produce photon beam, the photon beam can be used for treat patient tumor.
In radiotherapy, the energy level of the photon beam of outgoing is usually specialization, for example, 4MV, 6MV, 10MV, 15MV,
18MV, 21MV, require to be typically also specialization simultaneously for close rate, and for example, the close rate under FF pattern is 200MU/
Min, 400MU/min, 500MU/min or 600MU/min.For photon energy levels of a relatively high (such as 10MV, 15MV, 18MV,
Situation 21MV), because Single Electron is larger to the contribution of close rate, relatively low target current can just produce desired dose
Dose rate, even if the desired close rate up to 600MU/ under FF pattern (Flattening Filter, with expansion filter)
Min or under FFF pattern (Flattening Filter Free, do not have expansion filter) up to 1400MU/min, with
When, during target practice Single Electron produce and deposit to the heat in target account for incident electron energy ratio also relatively small,
So the heat conduction of target is not a trouble.But for photon energy levels relatively low (such as 4MV, 6MV) while close rate phase
To higher situation, because higher target current can just produce desired close rate, for example, close rate is wished under FF pattern
For 500MU/min, and higher target current necessarily leads to substantial amounts of heat deposition, so, the radiating of target has just become problem.?
This, it should be pointed out that is present invention is particularly suitable for the energy level of outgoing photon beam is less than or equal to 6MV and its close rate is high agent
The situation of dose rate, and those of ordinary skill in the art know so-called " high dose rate " under FF pattern and FFF pattern being referred to
Scope be different, this is because FFF pattern is exactly the situation that FF pattern gets rid of expansion filter, so for concrete shape
The expansion filter of shape, those of ordinary skill in the art are to calculate another kind of pattern according to the close rate under a kind of pattern
Under close rate.In this application, " high dose rate " ordinary circumstance is referred to more than or equal to 500MU/min under FF pattern, or
Person is more than or equal to 1000MU/min under FFF pattern.For the linear accelerator with one of them pattern of FF and FFF pattern
For, when FF pattern close rate more than or equal to 500MU/min or FFF pattern close rate more than or equal to 1000MU/min or
Though FF pattern close rate less than 500MU/min but removes expansion filter (that is, substantive FFF pattern) post dose rate and is more than or equal to
During 1000MU/min, the protection domain of this patent is each fallen within.For the linear accelerator with FF and FFF both of which
Speech, as long as the close rate of one of which pattern falls into above range, that is, falls into the scope of this patent.Specifically, when under FF pattern
Close rate not less than 1000MU/min or works as agent under FF pattern more than or equal to close rate under 500MU/min or FFF pattern
Dose rate less than 500MU/min but under FFF pattern close rate not less than 1000MU/min when, each fall within the protection domain of this patent.
In other words, FFF pattern here goes out pencil state except clearly included including clinac, it is also possible to including medical straight
Although line accelerator only clearly includes going out pencil state but being removed the state tested by its expansion filter for FF.
In prior art, relatively low while the of a relatively high situation of close rate, some renowned companies for photon energy levels
Tend to by Target Design be more than but be close to 0.8mm, such as 0.89mm, 1mm, in order to can while high dose rate is obtained
Electron leak is penetrated and is preferably minimized, according to Fig. 1 and Fig. 2, the selection of this thickness can be understood.Work as Fig. 1, Fig. 1 give
Target is the thickness of target and the circular cross-section for waiting on central plane centered on the centers such as machinery and with 2.5cm as radius during tungsten
The graph of relation of interior photon energy flux.Wherein, the center such as so-called refers to the transverse rotation of the frame of radiotherapy equipment
The intersection point of the longitudinal axis of axis and treatment head, waits central plane to refer to through aforementioned isocenter point and the longitudinal direction with treatment head
The vertical plane of axis.It will be seen from figure 1 that during the apex of the curve, the thickness of tungsten target is about 0.65mm, when in the song
Choose on the right side of the summit of line the target thickness when, as the thickness of target is more and more thicker, photon conversion efficiency is more and more lower, phase
Ying Di, close rate can also diminish.See that Fig. 2, Fig. 2 give when target is for tungsten the thickness of target and wait on central plane with machine again
The graph of relation of electron energy flux in circular cross-section centered on Xie Deng center and with 2.5cm as radius.Can from Fig. 2
Go out, as the thickness of tungsten target is thicker, electron energy flux is less, i.e. leakage is penetrated fewer.The tungsten target thickness 0.89mm of prior art,
The right side of the abscissa (about 0.65mm) corresponding to the hump that 1mm falls in Fig. 1, but still it is larger in photon conversion efficiency to fall
Region in.That is, in order that electron leak is penetrated less, part has been made in photon conversion efficiency and has been given way, because making part concession
Photon conversion efficiency remain in preferably interval, therefore this balance is worth.
Although the target design of prior art is penetrated between the two in close rate and electron leak and achieves preferable balance, however, right
The heat deposition of target itself but considers deficiency, in other words the heat deposition of target itself is transferred to thermal component (usually water-cooled portion
Part) process, the therefore requirement to thermal component in such target assembly structure just seems especially harsh.
In the target assembly of the present invention, the thickness of target be carefully chosen as relatively thin, conventional thicker to be different from
Target, thus it is possible, on the one hand, the close rate being substantially the same with thicker target can be realized, on the other hand, easily realize preferable
Target assembly integral heat sink effect, or, in other words, requirement to substrate or thermal component is harsh not as in the past
?.The present invention is more from close rate and the thickness for balancing to select target of hot property.The target assembly of the present invention is particularly suitable
In photon energy levels, when 6MV is as follows, close rate is the occasion of high dose rate.
It will be seen from figure 1 that when on the left of the summit of the curve, (including the summit) chooses the thickness of the target, with
The thickness more and more thinner of target, photon energy flux is more and more lower, i.e. photon conversion efficiency step-down, close rate step-down.More specifically
Ground, in the starting stage that thickness declines, the fall of photon energy flux is more gentle, but with thickness more and more thinner, light
The fall of sub- flux of energy is increasing.Left field on summit can obtain the light essentially identical with its right side area
Sub- flux of energy, but when the left field carries out thickness selection, the thinner thickness of tungsten target.
Referring back to Fig. 3, Fig. 3 show under FF pattern the emergent light gestational edema foot energy level be 6MV, close rate be 500MU/min
When, tungsten target thickness is respectively the depth of the target assembly that is simulated during 0.45mm and 1.0mm and the relation song of temperature by ANSYS software
Line, its abscissa represents the depth location of target assembly, and vertical coordinate represents the temperature of the target assembly at corresponding depth location.?
This, copper selected by the substrate of the target assembly.
Specifically, when the thickness of tungsten target is 1.0mm and the thickness of copper base is 2.4mm, the temperature change of target assembly
It is：From the rapid rising in about 694 degrees Celsius of tungsten target surface, and apart from tungsten target by the surface of beam bombardment about 0.2mm's
Depth, has reached maximum temperature, i.e. about 791 degrees Celsius, then rapid decline, and in tungsten target and the knot of copper base
Drop to about 300 degrees Celsius near conjunction face, in copper base, due to the impact of water-cooling section, temperature change is more gentle, most
Eventually, 150 degrees Celsius are tended in the lower surface of copper base.
When the thickness of tungsten target is 0.45mm and the thickness of copper base is 2.4mm, the temperature change of target assembly is：From tungsten
About 551 degrees Celsius of target surface rises rapidly, and apart from tungsten target by the surface of beam bombardment about 0.2mm depth, reaches
Arrived maximum temperature, i.e. about 645 degrees Celsius, then rapid decline, and near the faying face of tungsten target and copper base under
About 370 degrees Celsius are dropped to, is then lentamente declined again, finally, tend to 200 degrees Celsius in the temperature of the lower surface of copper base.
Prove through many experiments, under FF pattern, the emergent light gestational edema foot energy level be 6MV, close rate be 500MU/min
When, no matter from many thick tungsten targets, on the longitudinal direction for being basically perpendicular to tungsten target surface, apart from tungsten target surface about 0.2mm depth
At degree, temperature is up to highest.
Similarly, prove through many experiments, under FF pattern, be that 6MV, close rate are in emergent light gestational edema foot energy level
During 600MU/min, no matter from many thick tungsten targets, on the longitudinal direction for being basically perpendicular to tungsten target surface, apart from tungsten target surface
About 0.2mm depth temperature is up to highest.
Similarly, prove through many experiments, under FFF pattern, be that 6MV, close rate are in emergent light gestational edema foot energy level
During 1000MU/min, no matter from many thick tungsten targets, on the longitudinal direction for being basically perpendicular to tungsten target surface, apart from tungsten target surface
About 0.2mm depth temperature is up to highest.
In addition, it is to be appreciated that because the energy deposition in tungsten target is integration of the energy on thickness, with tungsten
The thickness of target is continuously increased, and the heat energy deposition in tungsten target is more.Be easy to it is appreciated that in order that the hot property of tungsten target more preferably,
So design tungsten target is more preferable：In tungsten target heat energy deposition should fewer and meanwhile the thickness of target become thinner so that target and
The faying face of substrate is the closer to the thermal self-restraint stress in tungsten target.Therefore, in theory the thickness of tungsten target closer to 0.2mm, hot property
Better.On this basis, if the factor of consideration close rate, by calculating, for meeting photon energy levels at most under FF pattern
6MV while close rate at least 500MU/min, or under FFF pattern for meet photon energy levels at most 6MV and meanwhile close rate at least
For 1000MU/min, then the value that the thickness of tungsten target takes more than 0.2mm is feasible.If consideration improves close rate, can also fit
When the thickness for increasing tungsten target, but it is less than 0.65mm.
Accordingly, it is considered to the balance of close rate and hot property, the thickness of tungsten target can be selected between 0.2-0.65mm.Also may be used
With in 0.2-0.6mm, 0.2-0.55mm, 0.2-0.5mm, 0.2-0.45mm, 0.2-0.4mm, 0.2-0.35mm, 0.25-
0.65mm、0.25-0.6mm、0.25-0.55mm、0.25-0.5mm、0.25-0.45mm、0.25-0.4mm、0.3-0.65mm、
0.3-0.6mm、0.3-0.55mm、0.3-0.5mm、0.3-0.45mm、0.35-0.65mm、0.35-0.6mm、0.35-0.55mm、
0.35-0.5mm, 0.4-0.65mm, 0.4-0.6mm, 0.4-0.55mm, 0.45-0.65mm, 0.45-0.6mm or 0.5-
Select between 0.65mm.
For example, in a kind of example, the thickness of tungsten target is chosen as 0.34mm, in another kind of example, the thickness choosing of tungsten target
0.35mm is selected as, in another example, the thickness of tungsten target is chosen as 0.36mm.
For example, in a kind of example, the thickness of tungsten target is chosen as 0.44mm, in another kind of example, the thickness choosing of tungsten target
0.45mm is selected as, in another example, the thickness of tungsten target is chosen as 0.46mm.
In practical application, when the target assembly is applied in clinac, when under FF pattern, from the target surface of tungsten target
The photon beam of opposition side outgoing can be via being then mapped to by upper and lower collimating device collimation after example of primary collimator and expansion filter again
On human tumor.Now, expansion filter can filter out the excess electron that the leakage of aforementioned thin target is penetrated.When under FFF pattern, can
Electronic filter (for example, aluminium foil or Copper Foil) is arranged so which is under FFF pattern with the downstream of the beam direction in target assembly
Reach for filtering out the excess electron that the leakage of aforementioned thin target is penetrated on beam channel.So, the opposition side from the target surface of tungsten target goes out
The photon beam that penetrates can be via being then mapped on human tumor by upper and lower collimating device collimation after example of primary collimator and electronic filter again.
It is appreciated that the set location of the electronic filter is not specially required, except needing to be placed on along beam direction
The downstream of aforementioned thin target.
In a kind of example, the thickness for selecting tungsten target is 0.35mm, and the thickness of copper product substrate is the target assembly of 2.4mm,
Actual test is carried out.Actual test result shows, in FF pattern, when the energy level of photon beam is 4MV, close rate reaches 500MU/
Min, tungsten target is going out bundle 40 minutes every time, amounts to and remains to remain intact after irradiating 30 hours, this water-cooled for being adopted before relatively
The constant but target of part is had clear improvement for the experiment of thick target.
Further, in a kind of example, the thickness for selecting tungsten target is 0.35mm, and the thickness of copper product substrate is 2.4mm
Target assembly, carried out actual test.Actual test result shows, in FFF pattern, when the energy level of photon beam is 4MV, close rate
1000MU/min is reached, tungsten target is going out bundle 40 minutes every time, amounts to and remains to remain intact after irradiating 30 hours, this institute before relatively
Using the constant but target of water-cooling section have clear improvement for the experiment of thick target.
In another kind of example, the thickness for selecting tungsten target is 0.45mm, and the thickness of copper product substrate is the target group of 2.4mm
Part, has carried out actual test.Actual test result shows, in FF pattern, when the energy level of photon beam is 6MV, close rate reaches
500MU/min, tungsten target is going out bundle 40 minutes every time, amounts to and remains to remain intact after irradiating 30 hours, and this is adopted relatively before
The constant but target of water-cooling section have clear improvement for the experiment of thick target.
Further, in another kind of example, the thickness for selecting tungsten target is 0.45mm, and the thickness of copper product substrate is
The target assembly of 2.4mm, has carried out actual test.Actual test result shows, in FFF pattern, when the energy level of photon beam is 6MV,
Close rate reaches 1000MU/min, and tungsten target is going out bundle 40 minutes every time, amounts to and remains to remain intact after irradiating 30 hours, and this is relative
The constant but target of water-cooling section for being adopted before is had clear improvement for the experiment of thick target.
In another example, the thickness for selecting tungsten target is 0.45mm, and the thickness of copper product substrate is the target group of 2.4mm
Part, has carried out actual test.Actual test result shows, in FF pattern, when the energy level of photon beam is 6MV, close rate reaches
600MU/min, tungsten target is going out bundle 40 minutes every time, amounts to and remains to remain intact after irradiating 30 hours, and this is adopted relatively before
The constant but target of water-cooling section have clear improvement for the experiment of thick target.
In another example, the thickness for selecting tungsten target is 0.45mm, and the thickness of copper product substrate is the target group of 2.4mm
Part, has carried out actual test.Actual test result shows, in FFF pattern, when the energy level of photon beam is 6MV, close rate reaches
1200MU/min, tungsten target is going out bundle 40 minutes every time, amounts to and remains to remain intact after irradiating 30 hours, and this is adopted relatively before
The constant but target of water-cooling section have clear improvement for the experiment of thick target.
And, other experiments also indicate that impact very little of the water-cooling section to the hot property of tungsten target itself.Here, can also lead to
Cross analog result to further appreciate that its hot property.As shown in figure 4, have a common boundary in the flamboyancy region to be formed in black and white, different
Gray areas represent different temperature provinces, and gray scale is deeper, and to represent temperature higher, it is seen that areas of higher temperature is located at the inside of target,
Face down from the combination of target and substrate, temperature reduces rapidly.As shown in figure 5, in the vertical direction, unit cell energy deposition
The maximum of (that is, the energy deposition that single particle is produced) occurs in the depth of rough 0.2mm, from target and the faying face of substrate
Downwards, unit cell energy deposition but reduces rapidly, and after the certain depth for reaching substrate, the trend eases up, but unit grain
Sub- energy deposition substantially diminishes.As shown in fig. 6, in the horizontal direction, in the central area of target, unit cell energy deposition
Peak value is rendered as, and as off-axis distance is more remote, unit cell energy deposition declines rapidly and to after certain off-axis distance,
Unit cell energy deposition quickly falls to and is close to zero.
Referring to Fig. 7, the invention also discloses a kind of schematic diagram of aforementioned target assembly 100, wherein, target assembly 100 includes base
Plate 102, the target 104 being fixed on the substrate 102 and setting are to the cooling-part 106 on substrate 102, wherein, the target
104 are made up of tungsten, the cooling-part 106 be.
Referring to Fig. 8, the invention also discloses a kind of accelerator 300, specifically, the accelerator 300 accelerates for medical linear
Device.More specifically, the clinac 300 includes aforesaid target assembly 100 and accelerating tube 200.The accelerating tube 200 is used
In accelerated electron beam, the target of the target assembly 100 is used for receiving electron beam and producing photon beam.
According to inventor experiment find, when the material of target is replaced by other high atomic number materials, such as gold or
When tantalum or rhenium, it is also possible to realize photon energy levels less than or equal to 6MV and meanwhile close rate be high dose rate, while, moreover it is possible to realize with
The essentially identical hot property of aforesaid tungsten target.
Found according to inventor's experiment, when the material of target is replaced by tungsten alloy, such as tungsten-rhenium alloy, can also realize
Photon energy levels are less than or equal to 6MV while close rate is high dose rate, while, moreover it is possible to realize the heat essentially identical with aforesaid tungsten target
Performance.It is appreciated that in tungsten alloy, other tenors in addition to tungsten are little, and run-of-the-mill is no more than 10%.
Although present disclosure is as above, the present invention is not limited to this.Any those skilled in the art, without departing from this
In the spirit and scope of invention, can all make various changes or modifications, therefore protection scope of the present invention should be with claim institute
The scope of restriction is defined.
Claims (8)
1. a kind of target assembly, including target, which is used for receiving electron beam to produce high dose rate and photon of the energy level less than or equal to 6MV
Ray, wherein, the thickness of the target is 0.2-0.65mm, and the material of the target is selected from tungsten, gold, tantalum, rhenium, one kind of tungsten alloy.
2. target assembly according to claim 1, wherein, the thickness of the target is 0.2-0.6mm, 0.2-0.55mm, 0.2-
0.5mm、0.2-0.45mm、0.2-0.4mm、0.2-0.35mm、0.25-0.65mm、0.25-0.6mm、0.25-0.55mm、
0.25-0.5mm、0.25-0.45mm、0.25-0.4mm、0.3-0.65mm、0.3-0.6mm、0.3-0.55mm、0.3-0.5mm、
0.3-0.45mm、0.35-0.65mm、0.35-0.6mm、0.35-0.55mm、0.35-0.5mm、0.4-0.65mm、0.4-
0.6mm, 0.4-0.55mm, 0.45-0.65mm, 0.45-0.6mm or 0.5-0.65mm.
3. target assembly according to claim 1, wherein, the thickness of the target is 0.34-0.36mm.
4. target assembly according to claim 1, wherein, the thickness of the target is 0.44-0.46mm.
5. target assembly according to claim 1, wherein, under FF pattern, the high dose rate be more than or equal to 500MU/
min；Or under FFF pattern, the high dose rate be more than or equal to 1000MU/min.
6. target assembly according to claim 1, wherein, the high dose rate be more than or equal to 1000MU/ under FFF pattern
min.
7. a kind of accelerator, which includes accelerating tube and the target assembly as described in any one of claim 1-6, and the accelerating tube is used
In electronics is accelerated, the target of the target assembly is used for electronics of the reception from the accelerating tube to produce Photon beam.
8. accelerator according to claim 7, wherein, the accelerator be.
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112587811A (en) * | 2020-12-13 | 2021-04-02 | 中国航空工业集团公司北京航空精密机械研究所 | Tungsten-copper alloy homogenizing block for medical linear accelerator |
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