EP1925036A4 - Nitride semiconductor light emitting device and production thereof - Google Patents

Nitride semiconductor light emitting device and production thereof

Info

Publication number
EP1925036A4
EP1925036A4 EP20060797950 EP06797950A EP1925036A4 EP 1925036 A4 EP1925036 A4 EP 1925036A4 EP 20060797950 EP20060797950 EP 20060797950 EP 06797950 A EP06797950 A EP 06797950A EP 1925036 A4 EP1925036 A4 EP 1925036A4
Authority
EP
European Patent Office
Prior art keywords
production
light emitting
emitting device
semiconductor light
nitride semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP20060797950
Other languages
German (de)
French (fr)
Other versions
EP1925036B1 (en
EP1925036A1 (en
Inventor
Hiroshi Osawa
Takashi Hodota
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyoda Gosei Co Ltd
Original Assignee
Toyoda Gosei Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2005312819A external-priority patent/JP4202353B2/en
Application filed by Toyoda Gosei Co Ltd filed Critical Toyoda Gosei Co Ltd
Publication of EP1925036A1 publication Critical patent/EP1925036A1/en
Publication of EP1925036A4 publication Critical patent/EP1925036A4/en
Application granted granted Critical
Publication of EP1925036B1 publication Critical patent/EP1925036B1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/005Processes
    • H01L33/0093Wafer bonding; Removal of the growth substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/36Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
    • H01L33/40Materials therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/26Materials of the light emitting region
    • H01L33/30Materials of the light emitting region containing only elements of Group III and Group V of the Periodic Table
    • H01L33/32Materials of the light emitting region containing only elements of Group III and Group V of the Periodic Table containing nitrogen

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Led Devices (AREA)
EP06797950.0A 2005-09-13 2006-09-07 Nitride semiconductor light emitting device and production method thereof Active EP1925036B1 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2005265300 2005-09-13
US71873805P 2005-09-21 2005-09-21
JP2005312819A JP4202353B2 (en) 2005-09-13 2005-10-27 Nitride-based semiconductor light-emitting device and manufacturing method thereof
PCT/JP2006/318231 WO2007032421A1 (en) 2005-09-13 2006-09-07 Nitride semiconductor light emitting device and production thereof

Publications (3)

Publication Number Publication Date
EP1925036A1 EP1925036A1 (en) 2008-05-28
EP1925036A4 true EP1925036A4 (en) 2013-05-08
EP1925036B1 EP1925036B1 (en) 2016-04-13

Family

ID=37865005

Family Applications (1)

Application Number Title Priority Date Filing Date
EP06797950.0A Active EP1925036B1 (en) 2005-09-13 2006-09-07 Nitride semiconductor light emitting device and production method thereof

Country Status (4)

Country Link
US (1) US7786489B2 (en)
EP (1) EP1925036B1 (en)
KR (1) KR100975711B1 (en)
WO (1) WO2007032421A1 (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4939014B2 (en) * 2005-08-30 2012-05-23 国立大学法人徳島大学 Group III nitride semiconductor light emitting device and method for manufacturing group III nitride semiconductor light emitting device
US8097478B2 (en) 2007-06-29 2012-01-17 Showa Denko K.K. Method for producing light-emitting diode
KR100946523B1 (en) 2008-04-24 2010-03-11 엘지이노텍 주식회사 Semiconductor light emitting device and fabrication method thereof
DE102008035254A1 (en) * 2008-07-29 2010-02-11 Osram Opto Semiconductors Gmbh Optoelectronic semiconductor chip and optoelectronic component
JP2011151074A (en) * 2010-01-19 2011-08-04 Mitsubishi Electric Corp Method for manufacturing nitride semiconductor device
KR101039999B1 (en) * 2010-02-08 2011-06-09 엘지이노텍 주식회사 Semiconductor light emitting device and fabrication method thereof
TWI491066B (en) * 2010-06-07 2015-07-01 Hon Hai Prec Ind Co Ltd Led and method for manufacting the same
TWI528583B (en) * 2010-06-18 2016-04-01 鴻海精密工業股份有限公司 Led and method for manufacting the same
KR101289602B1 (en) * 2011-04-21 2013-07-24 영남대학교 산학협력단 Light emitting diode

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1385215A2 (en) * 2002-07-08 2004-01-28 Nichia Corporation Nitride semiconductor device comprising bonded substrate and fabrication method of the same
JP2004047704A (en) * 2002-07-11 2004-02-12 Sharp Corp Method for manufacturing nitride semiconductor light emitting element and article therefor
WO2005029573A1 (en) * 2003-09-19 2005-03-31 Tinggi Technologies Private Limited Fabrication of semiconductor devices
US20050242365A1 (en) * 2004-04-28 2005-11-03 Yoo Myung C Vertical structure semiconductor devices

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11293493A (en) 1984-04-13 1999-10-26 Sony Corp Electroplating device
JP3511970B2 (en) 1995-06-15 2004-03-29 日亜化学工業株式会社 Nitride semiconductor light emitting device
JP4060511B2 (en) 2000-03-28 2008-03-12 パイオニア株式会社 Method for separating nitride semiconductor device
JP2002314138A (en) * 2001-04-09 2002-10-25 Toshiba Corp Light emitting device
US8294172B2 (en) * 2002-04-09 2012-10-23 Lg Electronics Inc. Method of fabricating vertical devices using a metal support film
US20030189215A1 (en) 2002-04-09 2003-10-09 Jong-Lam Lee Method of fabricating vertical structure leds
JP4233268B2 (en) * 2002-04-23 2009-03-04 シャープ株式会社 Nitride-based semiconductor light-emitting device and manufacturing method thereof
CN100483612C (en) * 2003-06-04 2009-04-29 刘明哲 Method of fabricating vertical structure compound semiconductor devices
EP1521312A3 (en) * 2003-09-30 2008-01-16 Osram Opto Semiconductors GmbH Optoelectronic device having a metallised carrier
TWI232505B (en) * 2003-10-07 2005-05-11 Arima Optoelectronics Corp Manufacturing method of LED and its structure

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1385215A2 (en) * 2002-07-08 2004-01-28 Nichia Corporation Nitride semiconductor device comprising bonded substrate and fabrication method of the same
JP2004047704A (en) * 2002-07-11 2004-02-12 Sharp Corp Method for manufacturing nitride semiconductor light emitting element and article therefor
WO2005029573A1 (en) * 2003-09-19 2005-03-31 Tinggi Technologies Private Limited Fabrication of semiconductor devices
US20050242365A1 (en) * 2004-04-28 2005-11-03 Yoo Myung C Vertical structure semiconductor devices

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
See also references of WO2007032421A1 *
WEISS K ET AL: "Development of different copper seed layers with respect to the copper electroplating process", MICROELECTRONIC ENGINEERING, ELSEVIER PUBLISHERS BV., AMSTERDAM, NL, vol. 50, no. 1-4, 1 January 2000 (2000-01-01), pages 433 - 440, XP004237698, ISSN: 0167-9317, DOI: 10.1016/S0167-9317(99)00312-3 *

Also Published As

Publication number Publication date
KR20080037720A (en) 2008-04-30
WO2007032421A1 (en) 2007-03-22
EP1925036B1 (en) 2016-04-13
US7786489B2 (en) 2010-08-31
EP1925036A1 (en) 2008-05-28
KR100975711B1 (en) 2010-08-12
US20090045433A1 (en) 2009-02-19

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