EP1920274A1 - Methods for structuring substrate surfaces - Google Patents
Methods for structuring substrate surfacesInfo
- Publication number
- EP1920274A1 EP1920274A1 EP06762976A EP06762976A EP1920274A1 EP 1920274 A1 EP1920274 A1 EP 1920274A1 EP 06762976 A EP06762976 A EP 06762976A EP 06762976 A EP06762976 A EP 06762976A EP 1920274 A1 EP1920274 A1 EP 1920274A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- structuring
- substrate
- substrates
- structured
- coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 52
- 238000000034 method Methods 0.000 title claims abstract description 41
- 230000003287 optical effect Effects 0.000 claims abstract description 14
- 238000003980 solgel method Methods 0.000 claims abstract description 14
- 238000000576 coating method Methods 0.000 claims description 21
- 239000011248 coating agent Substances 0.000 claims description 20
- 239000002184 metal Substances 0.000 claims description 20
- 229910052751 metal Inorganic materials 0.000 claims description 20
- 239000011521 glass Substances 0.000 claims description 16
- 239000002245 particle Substances 0.000 claims description 14
- 239000000919 ceramic Substances 0.000 claims description 8
- 238000009499 grossing Methods 0.000 claims description 8
- 229910052782 aluminium Inorganic materials 0.000 claims description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 7
- 239000004033 plastic Substances 0.000 claims description 6
- 229920003023 plastic Polymers 0.000 claims description 6
- 238000003618 dip coating Methods 0.000 claims description 5
- 239000000203 mixture Substances 0.000 claims description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 4
- 238000004049 embossing Methods 0.000 claims description 4
- 238000005530 etching Methods 0.000 claims description 4
- 239000004973 liquid crystal related substance Substances 0.000 claims description 4
- 229910052710 silicon Inorganic materials 0.000 claims description 4
- 239000010703 silicon Substances 0.000 claims description 4
- 238000005488 sandblasting Methods 0.000 claims description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 2
- 229910052804 chromium Inorganic materials 0.000 claims description 2
- 239000011651 chromium Substances 0.000 claims description 2
- 150000001875 compounds Chemical class 0.000 claims description 2
- 238000010894 electron beam technology Methods 0.000 claims description 2
- 229910052759 nickel Inorganic materials 0.000 claims description 2
- 229910052709 silver Inorganic materials 0.000 claims description 2
- 239000004332 silver Substances 0.000 claims description 2
- 238000005507 spraying Methods 0.000 claims description 2
- 239000010936 titanium Substances 0.000 claims description 2
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- 229910052726 zirconium Inorganic materials 0.000 claims description 2
- 239000000463 material Substances 0.000 description 5
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- 230000006978 adaptation Effects 0.000 description 2
- 238000005422 blasting Methods 0.000 description 2
- 238000001354 calcination Methods 0.000 description 2
- 239000010431 corundum Substances 0.000 description 2
- 229910052593 corundum Inorganic materials 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000005056 compaction Methods 0.000 description 1
- 239000008139 complexing agent Substances 0.000 description 1
- 230000009189 diving Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000005329 float glass Substances 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 239000005337 ground glass Substances 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000011236 particulate material Substances 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 239000013557 residual solvent Substances 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/25—Oxides by deposition from the liquid phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
- C03C17/007—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character containing a dispersed phase, e.g. particles, fibres or flakes, in a continuous phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C19/00—Surface treatment of glass, not in the form of fibres or filaments, by mechanical means
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/009—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/4505—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements characterised by the method of application
- C04B41/4535—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements characterised by the method of application applied as a solution, emulsion, dispersion or suspension
- C04B41/4537—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements characterised by the method of application applied as a solution, emulsion, dispersion or suspension by the sol-gel process
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/52—Multiple coating or impregnating multiple coating or impregnating with the same composition or with compositions only differing in the concentration of the constituents, is classified as single coating or impregnation
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
- C04B41/81—Coating or impregnation
- C04B41/85—Coating or impregnation with inorganic materials
- C04B41/87—Ceramics
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
- C04B41/81—Coating or impregnation
- C04B41/89—Coating or impregnation for obtaining at least two superposed coatings having different compositions
- C04B41/90—Coating or impregnation for obtaining at least two superposed coatings having different compositions at least one coating being a metal
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
- G02B5/021—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures
- G02B5/0221—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures the surface having an irregular structure
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0268—Diffusing elements; Afocal elements characterized by the fabrication or manufacturing method
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0273—Diffusing elements; Afocal elements characterized by the use
- G02B5/0278—Diffusing elements; Afocal elements characterized by the use used in transmission
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0273—Diffusing elements; Afocal elements characterized by the use
- G02B5/0284—Diffusing elements; Afocal elements characterized by the use used in reflection
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2350/00—Pretreatment of the substrate
- B05D2350/30—Change of the surface
- B05D2350/33—Roughening
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2350/00—Pretreatment of the substrate
- B05D2350/30—Change of the surface
- B05D2350/33—Roughening
- B05D2350/38—Roughening by mechanical means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
- B05D3/068—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation using ionising radiations (gamma, X, electrons)
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2204/00—Glasses, glazes or enamels with special properties
- C03C2204/08—Glass having a rough surface
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2111/00—Mortars, concrete or artificial stone or mixtures to prepare them, characterised by specific function, property or use
- C04B2111/80—Optical properties, e.g. transparency or reflexibility
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
- Y10T428/24612—Composite web or sheet
- Y10T428/2462—Composite web or sheet with partial filling of valleys on outer surface
Definitions
- the present invention relates to methods for structuring surfaces of substrates, wherein a substrate is structured in a first step and in a second step for partially smoothing the
- Structuring is coated in the sol-gel method, in particular a diffusely scattering surface is obtained. Structured substrates in this way and their use in optical applications are also the subject of the present invention.
- Structured surfaces play a role in a variety of applications and processes.
- Surface-structured substrates are also becoming increasingly important in optical applications, e.g. as diffusers or as reflectors.
- Optical diffusers are scattered surfaces where incident light diffuses diffusely.
- Common examples of the use of optical diffusers are, for example, focusing screens in photography or projection technology onto which an image is projected. The light that strikes the screen for imaging is scattered by it, ie deflected in different directions. This scattering ensures that the image projected onto the ground-glass screen can be recognized from different directions.
- the present invention accordingly provides methods for structuring surfaces of substrates, wherein a substrate is structured in a first step and is coated in a second step for partially smoothing the structuring in the sol-gel process, in particular a diffusely scattering surface is obtained.
- a structured surface in the sense of the present invention is a surface which has a regular or irregular structure, in particular in the form of grooves, depressions or protrusions of any kind.
- the depressions and bulges can assume any shape and are in the nanometer to millimeter size range.
- the method according to the invention has the advantage that it is simple to carry out and offers the possibility of producing diffusely scattering structurings.
- the user is thus given the opportunity to produce the required structured surface for his needs, both process steps are technically easy to handle, easy to perform and easy to control.
- Suitable applications are all optical systems in which a scattering of the light is needed.
- the method according to the invention may be suitable for the production of diffusers for liquid crystal displays.
- a backlight for LCDs which ensures a sufficient contrast.
- battery-LCD's for example in laptops
- reflectors that should fulfill at least the following requirements:
- Suitable substrates in the present invention are glass substrates, ceramic substrates, metal substrates or plastic substrates, preferably glass, metal or ceramic substrates and very particularly preferably glass substrates or metal substrates. Glass substrates or metal substrates having structured surfaces are particularly suitable for optical applications, in particular for LCD 's.
- Suitable materials for the glass substrates are all known glasses, for example float glass, cast glass from all glass compositions known to those skilled in the art, A, C, D, E, ECR, R or S glasses.
- metal substrates are, for example, polished or blank drawn metal sheets with a mean roughness of ⁇ 1 micron.
- Suitable plastic substrates consist for example of PMMA or polycarbonate.
- Suitable ceramic substrates are all ceramics known to the person skilled in the art, in particular transparent ceramics, which can be structured by one of the methods mentioned below.
- structuring of the surface of the substrate takes place in a first step.
- the structuring can be done by the action of particle beams, laser beams, etching or embossing.
- the structuring method is adapted to the respective substrate in order to achieve optimum structuring.
- embossing processes are primarily suitable for substrates made of plastics or - A -
- Metals wherein preferably plastics are structured by means of embossing.
- Etching methods are particularly suitable for glass or ceramic substrates, wherein all variants of etching methods known to those skilled in the art can be used, e.g. RIE (Reactive Ion Etching).
- a structuring with particle beams takes place, it being possible for the particle beams to be sandblasting or electron beams.
- sandblasting means all particle beams whose particles are not to be assigned to the atomic or subatomic size range (for example electrons).
- the size of the particles can be in a range from 1 .mu.m to 4 mm, depending on the desired structuring and the particulate material used.
- the particles preferably have a size of 5 ⁇ m to 1 mm and in particular of 20 ⁇ m to 200 ⁇ m.
- Suitable blasting materials are all common materials, e.g. Sand, glass, corundum, plastics, ceramics, nut shells, corncob granules, steel of all grades and composition, metals, e.g. Aluminum and / or mixtures thereof.
- it is glass or corundum particles, in particular with a particle size of 5 to 100 microns and most preferably with a particle size of 50 to ⁇ O microns.
- the jet pressure as well as the angle of incidence and the direction of the jet medium also influence the structure of the surface.
- jet pressures up to 10 bar, preferably up to 6 bar are used, the angle of incidence usually being between 5 and 90 °, preferably between 30 and 80 °.
- the respective adaptation of the mentioned parameters to the particle materials for setting the desired type and depth of structuring is subject to the general skill of a person skilled in the art.
- the actual blasting process becomes Achieving the required reproducibility of the structure mutatis mutandis performed by a suitable machine.
- the structures obtained in this way usually still have edges that can adversely affect the properties in later applications.
- a smoothing of the structuring by coating in the sol-gel process is carried out in a second step of the method according to the invention.
- depressions created during structuring are partially refilled and corresponding edges are smoothed by additional coating (see Figure 1).
- appropriate sols for example of T ⁇ O 2 and SiO 2 sols
- a refractive index adaptation for controlling the optical effects can be achieved.
- the second step taking place in the method according to the invention thus serves not only to smooth the structuring produced in the first step but also to adapt the optical properties of the structured surface obtained therewith.
- Suitable sols for the sol-gel process are all sols known to those skilled in the art, for example sols of compounds of the elements titanium, zirconium, silicon, aluminum and / or mixtures thereof.
- silicon sols are used. Sols or precursors of this type are known and commercially available.
- the silicon sols are those in which the SiO 2 particles have been obtained by hydrolytic polycondensation of tetraalkoxysilane, in particular tetraethoxysilane (TEOS), in an aqueous-alcoholic-ammoniacal medium.
- TEOS tetraethoxysilane
- aqueous and / or solvent-containing sols prepared in another way can also be used as the coating solution.
- the coating solution may additionally contain surfactants.
- the usable coating solutions for the sol-gel process may contain other components, such as leveling agents or complexing agents.
- the respective solids content in the coating solution is usually in the range of 0.1 to 20 wt .-%, preferably 2 to 10 wt .-%.
- Coating solutions of the abovementioned types are described, for example, in DE 198 28 231, US Pat. No. 4,775,520, US Pat. No. 5,378,400, DE 196 42 419, EP 1 199 288 or WO 03/027015, the disclosure contents of which are hereby included by reference in the present invention.
- the coating in the sol-gel process is carried out according to the general principles known to the person skilled in the art, e.g. by dip coating, spraying or by flow curtain.
- dip coating the structured substrate is immersed in the coating solution; in the spray process, the substrate is coated with the coating medium by means of single-component or multi-component nozzles.
- the coating is carried out through a free-flowing curtain of the coating medium, under which the substrate to be coated is moved through.
- the coating is carried out in the sol-gel process by means of dip coating.
- the prestructured substrate is dipped with a lifting device into a cuvette filled with sol and then withdrawn from the cuvette at a uniform speed.
- the thickness of the applied layer depends on the depth and structure of the structuring carried out in the first method step. If structuring takes place with the formation of many edges, corners and steps or greater differences in height between the highest and lowest points of the structure, then the proportion of the smoothing layer must be correspondingly greater.
- An exact coordination of the individual parameters structuring and subsequent smoothing is subject to the skill of the art.
- the individual parameters are preferably matched to one another in such a way that the structured surface fulfills the conditions mentioned above for an optimal diffuser / reflector. Controlling the thickness of the coating in the
- the sol-gel process essentially depends on the pulling rate of the structured substrate during coating. The higher the pulling speed, the thicker the layer obtained. Usually, the drawing speeds are in the range of 0.1 to 100 mm / sec, and preferably in the range of 1.6 to 8 mm / sec. Of course, the coating process can also be repeated one or more times until the desired smoothing of the structuring is achieved.
- the structured substrate can be calcined. Calcination removes the residual solvent content from the applied layer.
- the calcination temperatures are usually from 300 to 700 ° C., in particular from 500 to 600 ° C.
- the structured surface is additionally coated with a metal layer.
- This additional step follows the coating in the sol-gel process and can be carried out at any time afterwards.
- the coating with a metal layer may be wet-chemically, e.g. by suitable reduction methods, in the CVD and / or PVD method, the PVD methods being preferred.
- Suitable metals for the additional metal layer are, for example, aluminum, silver, chromium, nickel or other reflective metal layers.
- the metal layer is aluminum.
- the thickness of the additional metal layer depends on the material and the desired properties and is usually in the range of 10 to 150 nm and in particular in the range of 30 to 100 nm.
- substrates with a structured surface prepared by one of the processes according to the invention.
- Another object of the present invention is the use of structured surface substrates obtainable according to the methods described above as diffusers and / or reflectors in optical applications.
- the optical applications may be any of the optical applications known to those skilled in the art, e.g. cameras of all types, projection devices and screens, liquid crystal displays, magnification systems, e.g. Microscopes, etc.
- the substrates according to the invention are preferably used in liquid crystal displays.
- the structured substrates according to the present invention can be used particularly advantageously, e.g. as a reflective background to replace a backlight and thus reduce the power consumption of the display. Further fields of application of the structured substrates according to the present invention will be apparent to those skilled in the art without inventive step.
- Example 1 A glass plate having a thickness of 1 mm is filled with glass beads of a
- Size range from 10 to 50 microns at a jet pressure of 2 bar and irradiated from a distance of 200 mm.
- the plate is dedusted and a total of three times in an aqueous-alcoholic SiO 2 sol (solids content: 3
- the plate is in each case for 10
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Abstract
The invention relates to methods for structuring substrate surfaces. A substrate is structured in a first step and is coated in a sol-gel process in a second step in order to partially smooth the structure, particularly a diffusely scattering surface being obtained. The invention further relates to substrates structured in said manner as well as the use thereof in optical applications.
Description
Verfahren zur Strukturierung von Oberflächen von Substraten Process for structuring surfaces of substrates
Die vorliegende Erfindung betrifft Verfahren zur Strukturierung von Oberflächen von Substraten, wobei ein Substrat in einem ersten Schritt strukturiert wird und in einem zweiten Schritt zur teilweisen Glättung derThe present invention relates to methods for structuring surfaces of substrates, wherein a substrate is structured in a first step and in a second step for partially smoothing the
Strukturierung im Sol-Gel-Verfahren beschichtet wird, wobei insbesondere eine diffus streuende Oberfläche erhalten wird. Auf diese Weise strukturierte Substrate sowie deren Verwendung in optischen Anwendungen sind ebenfalls Gegenstand der vorliegenden Erfindung.Structuring is coated in the sol-gel method, in particular a diffusely scattering surface is obtained. Structured substrates in this way and their use in optical applications are also the subject of the present invention.
Strukturierte Oberflächen spielen bei einer Reihe von Anwendungen und Prozessen eine Rolle. Zunehmend erlangen oberflächenstrukturierte Substrate auch in optischen Anwendungen Bedeutung, z.B. als Diffusoren oder als Reflektoren. Bei optischen Diffusoren handelt es sich um Streuflächen, an denen einfallendes Licht diffus gestreut wird. Gängige Beispiele für den Einsatz optischer Diffusoren sind beispielsweise Mattscheiben in der Fotografie- oder Projektionstechnik, auf die ein Bild projiziert wird. Das Licht, das zur Bilderzeugung auf die Mattscheibe trifft, wird von diesem gestreut, also in unterschiedliche Richtungen abgelenkt. Durch diese Streuung wird erreicht, dass das auf die Mattscheibe projizierte Bild aus unterschiedlichen Richtungen erkennbar ist. Es besteht daher ein Bedarf an Verfahren, mit denen diffus streuende Oberflächen bereitgestellt werden können.Structured surfaces play a role in a variety of applications and processes. Surface-structured substrates are also becoming increasingly important in optical applications, e.g. as diffusers or as reflectors. Optical diffusers are scattered surfaces where incident light diffuses diffusely. Common examples of the use of optical diffusers are, for example, focusing screens in photography or projection technology onto which an image is projected. The light that strikes the screen for imaging is scattered by it, ie deflected in different directions. This scattering ensures that the image projected onto the ground-glass screen can be recognized from different directions. Thus, there is a need for methods that can provide diffuse scattering surfaces.
Es bestand daher die Aufgabe, Verfahren zur Strukturierung einerIt was therefore the task of a method for structuring a
Substratoberfläche bereit zu stellen, die einfach handhabbar sind und die die Bereitstellung strukturierter Oberflächen für eine große Bandbreite von Anwendungen ermöglichen.To provide substrate surfaces that are easy to handle and that enable the provision of structured surfaces for a wide range of applications.
Verfahren der vorliegenden Erfindung erfüllen das komplexeMethods of the present invention accomplish the complex
Anforderungsprofil in überraschender weise. Gegenstand der vorliegenden Erfindung sind demgemäss Verfahren zur Strukturierung von Oberflächen
von Substraten, wobei ein Substrat in einem ersten Schritt strukturiert wird und in einem zweiten Schritt zur teilweisen Glättung der Strukturierung im Sol-Gel-Verfahren beschichtet wird, wobei insbesondere eine diffus streuende Oberfläche erhalten wird.Requirements profile in a surprising way. The present invention accordingly provides methods for structuring surfaces of substrates, wherein a substrate is structured in a first step and is coated in a second step for partially smoothing the structuring in the sol-gel process, in particular a diffusely scattering surface is obtained.
Eine strukturierte Oberfläche im Sinne der vorliegenden Erfindung ist eine Oberfläche, die eine regel- oder unregelmäßige Struktur, insbesondere in Form von Rillen, Vertiefungen oder Ausbuchtungen jeder Art, aufweist. Die Vertiefungen und Ausbuchtungen können dabei jede beliebige Form annehmen und liegen im Nanometer- bis Millimeter-Größenbereich.A structured surface in the sense of the present invention is a surface which has a regular or irregular structure, in particular in the form of grooves, depressions or protrusions of any kind. The depressions and bulges can assume any shape and are in the nanometer to millimeter size range.
Das erfindungsgemäße Verfahren hat den Vorteil, dass es einfach auszuführen ist und dabei die Möglichkeit bietet, diffus streuende Strukturierungen zu erzeugen. Dem Anwender wird damit die Möglichkeit gegeben, die für seine Bedürfnisse erforderliche strukturierte Oberfläche herzustellen, wobei beide Verfahrensschritte technisch gut handhabbar, einfach durchzuführen und gut steuerbar sind. Als Anwendungen eignen sich alle optischen Systeme, bei denen eine Streuung des Lichtes benötigt wird.The method according to the invention has the advantage that it is simple to carry out and offers the possibility of producing diffusely scattering structurings. The user is thus given the opportunity to produce the required structured surface for his needs, both process steps are technically easy to handle, easy to perform and easy to control. Suitable applications are all optical systems in which a scattering of the light is needed.
In einer speziellen Ausführungsform kann sich das erfindungsgemäße Verfahren zur Herstellung von Diffusoren für Flüssigkristalldisplays eignen. Im Allgemeinen wird für LCD's eine Hintergrundbeleuchtung eingesetzt, die für einen ausreichenden Kontrast sorgt. Insbesondere bei batteriegestützten LCD's, beispielsweise in Notebooks, macht sich der damit verbundene Energieverbrauch negativ bemerkbar, weil die Laufzeit der Batterie zusätzlich begrenzt wird. Aus diesem Grund ist man an einer Entwicklung von LCD's interessiert, die ohne eine Hintergrundbeleuchtung auskommen. Hierzu ist der Einsatz von Reflektoren nötig, die mindestens folgende Anforderungen erfüllen sollten:In a specific embodiment, the method according to the invention may be suitable for the production of diffusers for liquid crystal displays. Generally s is used, a backlight for LCDs, which ensures a sufficient contrast. Especially with battery-LCD's, for example in laptops, to make the energy consumption associated negative impact, because the battery life is also limited. For this reason, one is interested in a development of LCD ' s, which do without a backlight. This requires the use of reflectors that should fulfill at least the following requirements:
- Einfallendes Licht soll gleichmäßig über die gesamte Fläche des Displays im Blickwinkelbereich des Betrachters verteilt werden
- Außerhalb des Blickwinkelbereichs soll möglichst keine Reflektion erfolgen- Incident light should be evenly distributed over the entire surface of the display in the viewing angle of the viewer - If possible, no reflection should be made outside the viewing angle range
- Durch die Strukturierung sollen keine Interferenzerscheinungen auftreten.- Due to the structuring no interference phenomena should occur.
Mit dem Verfahren gemäß der vorliegenden Erfindung ist die Bereitstellung derartig strukturierter Oberflächen denkbar.With the method according to the present invention, the provision of such structured surfaces is conceivable.
Als Substrate eignen sich in der vorliegenden Erfindung Glassubstrate, Keramiksubstrate, Metallsubstrate oder Kunststoffsubstrate, vorzugsweise handelt es sich um Glas-, Metall- oder Keramiksubstrate und ganz besonders bevorzugt um Glassubstrate oder Metallsubstrate. Glassubstrate oder Metallsubstrate mit strukturierten Oberflächen eignen sich in besonderer Weise für optische Anwendungen, insbesondere für LCD's.Suitable substrates in the present invention are glass substrates, ceramic substrates, metal substrates or plastic substrates, preferably glass, metal or ceramic substrates and very particularly preferably glass substrates or metal substrates. Glass substrates or metal substrates having structured surfaces are particularly suitable for optical applications, in particular for LCD 's.
Als Material für die Glassubstrate eignen sich alle bekannten Gläser, beispielsweise Floatglas, Gussglas aus allen dem Fachmann bekannten Glaszusammensetzungen, A-, C-, D-, E-, ECR-, R- oder S-Gläser. Als Metallsubstrate eignen sich beispielsweise polierte oder blank gezogene Metallbleche mit einem mittleren Rauhwert von < 1 μm.Suitable materials for the glass substrates are all known glasses, for example float glass, cast glass from all glass compositions known to those skilled in the art, A, C, D, E, ECR, R or S glasses. As metal substrates are, for example, polished or blank drawn metal sheets with a mean roughness of <1 micron.
Geeignete Kunststoffsubstrate bestehen beispielweise aus PMMA oder Polycarbonat. Als Keramiksubstrate eignen sich alle dem Fachmann bekannten Keramiken, insbesondere transparente Keramiken, die sich mit einer der nachfolgend genannten Methoden strukturieren lassen.Suitable plastic substrates consist for example of PMMA or polycarbonate. Suitable ceramic substrates are all ceramics known to the person skilled in the art, in particular transparent ceramics, which can be structured by one of the methods mentioned below.
In dem zweistufigen Verfahren der vorliegenden Erfindung erfolgt in einem ersten Schritt eine Strukturierung der Oberfläche des Substrates. Die Strukturierung kann dabei durch Einwirkung von Partikelstrahlen, Laserstrahlen, Ätzverfahren oder durch Prägeverfahren erfolgen. Idealerweise wird das Strukturierungsverfahren an das jeweilige Substrat angepasst, um eine optimale Strukturierung zu erreichen. So eignen sich Prägeverfahren vornehmlich bei Substraten aus Kunststoffen oder
- A -In the two-stage process of the present invention, structuring of the surface of the substrate takes place in a first step. The structuring can be done by the action of particle beams, laser beams, etching or embossing. Ideally, the structuring method is adapted to the respective substrate in order to achieve optimum structuring. Thus, embossing processes are primarily suitable for substrates made of plastics or - A -
Metallen, wobei vorzugsweise Kunststoffe mit Hilfe von Prägeverfahren strukturiert werden. Ätzverfahren eignen sich insbesondere für Glas- oder Keramiksubstrate, wobei alle dem Fachmann bekannten Varianten von Ätzverfahren eingesetzt werden können, z.B. RIE (Reactive Ion Etching).Metals, wherein preferably plastics are structured by means of embossing. Etching methods are particularly suitable for glass or ceramic substrates, wherein all variants of etching methods known to those skilled in the art can be used, e.g. RIE (Reactive Ion Etching).
Vorzugsweise erfolgt eine Strukturierung mit Partikelstrahlen, wobei es sich bei den Partikelstrahlen um Sandstrahlen oder Elektronenstrahlen handeln kann. Unter Sandstrahlen werden im Sinne der vorliegenden Erfindung alle Partikelstrahlen verstanden, deren Partikel nicht dem atomaren oder subatomaren Größenbereich (z.B. Elektronen) zuzuordnen sind. Die Größe der Partikel kann dabei in einem Bereich von 1 μm bis 4 mm liegen, abhängig von der gewünschten Strukturierung und dem eingesetzten Partikelmaterial. Bevorzugt weisen die Partikel eine Größe von 5 μm bis 1 mm und insbesondere von 20 μm bis 200 μm auf.Preferably, a structuring with particle beams takes place, it being possible for the particle beams to be sandblasting or electron beams. For the purposes of the present invention, sandblasting means all particle beams whose particles are not to be assigned to the atomic or subatomic size range (for example electrons). The size of the particles can be in a range from 1 .mu.m to 4 mm, depending on the desired structuring and the particulate material used. The particles preferably have a size of 5 μm to 1 mm and in particular of 20 μm to 200 μm.
Als Strahlmaterialien kommen alle gängigen Materialien in Frage, z.B. Sand, Glas, Korund, Kunststoffe, Keramiken, Nussschalen, Maiskolbengranulat, Stahl jeglicher Güte und Zusammensetzung, Metalle, wie z.B. Aluminium und/oder Mischungen hieraus. Vorzugsweise handelt es sich um Glas- oder Korundpartikel, insbesondere mit einer Korngröße von 5 bis 100 μm und ganz besonders bevorzugt mit einer Korngröße von 50 bis βO μm.Suitable blasting materials are all common materials, e.g. Sand, glass, corundum, plastics, ceramics, nut shells, corncob granules, steel of all grades and composition, metals, e.g. Aluminum and / or mixtures thereof. Preferably, it is glass or corundum particles, in particular with a particle size of 5 to 100 microns and most preferably with a particle size of 50 to βO microns.
Der Strahldruck sowie der Auftreffwinkel und die Richtung des Strahlmediums beeinflussen ebenfalls die Struktur der Oberfläche.The jet pressure as well as the angle of incidence and the direction of the jet medium also influence the structure of the surface.
Üblicherweise werden Strahldrücke bis 10 bar, vorzugsweise bis 6 bar eingesetzt, wobei der Auftreffwinkel üblicherweise zwischen 5 und 90°, vorzugsweise zwischen 30 und 80° liegt. Die jeweilige Anpassung der genannten Parameter an die Partikelmaterialien zur Einstellung der gewünschten Art und Tiefe der Strukturierung unterliegt dem allgemeinen Können eines Fachmanns. Der eigentliche Strahlvorgang wird zur
Erreichung der erforderlichen Reproduzierbarkeit der Struktur sinngemäß durch eine geeignete Maschine durchgeführt.Usually, jet pressures up to 10 bar, preferably up to 6 bar are used, the angle of incidence usually being between 5 and 90 °, preferably between 30 and 80 °. The respective adaptation of the mentioned parameters to the particle materials for setting the desired type and depth of structuring is subject to the general skill of a person skilled in the art. The actual blasting process becomes Achieving the required reproducibility of the structure mutatis mutandis performed by a suitable machine.
Die auf diese Weise erhaltenen Strukturen weisen in der Regel noch Kanten auf, die die Eigenschaften in den späteren Anwendungen negativ beeinflussen können. Aus diesem Grund wird in einem zweiten Schritt der erfindungsgemäßen Verfahren eine Glättung der Strukturierung durch Beschichtung im Sol-Gel-Verfahren vorgenommen. Durch diese Glättung werden bei der Strukturierung erzeugte Vertiefungen teilweise wieder aufgefüllt und entsprechende Kanten durch zusätzliche Beschichtung geglättet (siehe Abbildung 1 ). Darüber hinaus kann durch geeignete Mischung entsprechender Sole, z.B. von TΪO2 und Siθ2-Solen, in den Sol- Gel-Verfahren eine Brechzahlanpassung zur Steuerung der optischen Effekte erzielt werden. Der in den erfindungsgemäßen Verfahren erfolgende zweite Schritt dient damit nicht nur der Glättung der im ersten Schritt erzeugten Strukturierung, sondern kann auch der Anpassung der optischen Eigenschaften der damit erhaltenen strukturierten Oberfläche dienen.The structures obtained in this way usually still have edges that can adversely affect the properties in later applications. For this reason, a smoothing of the structuring by coating in the sol-gel process is carried out in a second step of the method according to the invention. As a result of this smoothing, depressions created during structuring are partially refilled and corresponding edges are smoothed by additional coating (see Figure 1). In addition, by appropriate mixing of appropriate sols, for example of TΪO 2 and SiO 2 sols, in the sol-gel method, a refractive index adaptation for controlling the optical effects can be achieved. The second step taking place in the method according to the invention thus serves not only to smooth the structuring produced in the first step but also to adapt the optical properties of the structured surface obtained therewith.
Als Sole für das Sol-Gel-Verfahren eignen sich alle dem Fachmann bekannten Sole, z.B. Sole von Verbindungen der Elemente Titan, Zirkonium, Silizium, Aluminium und/oder Mischungen hieraus. Vorzugsweise werden Silizium-Sole eingesetzt. Sole bzw. Vorstufen dieses Typs sind bekannt und kommerziell erhältlich. Üblicherweise handelt es sich bei den Silizium-Solen um jene, bei denen die Siθ2-Partikel durch hydrolytische Polykondensation von Tetraalkoxysilan, insbesondere Tetraethoxysilan (TEOS), in einem wässrig-alkoholischen- ammoniakalischen Medium erhalten worden sind. Selbstverständlich können auch auf andere Weise hergestellte wässrige und/oder lösemittelhaltige Sole als Beschichtungslösung eingesetzt werden.
Darüber hinaus kann die Beschichtungslösung zusätzlich Tenside enthalten. Weiterhin können die einsetzbaren Beschichtungslösungen für das Sol-Gel-Verfahren weitere Komponenten enthalten, wie z.B. Verlaufsmittel oder Komplexbildner.Suitable sols for the sol-gel process are all sols known to those skilled in the art, for example sols of compounds of the elements titanium, zirconium, silicon, aluminum and / or mixtures thereof. Preferably, silicon sols are used. Sols or precursors of this type are known and commercially available. Usually, the silicon sols are those in which the SiO 2 particles have been obtained by hydrolytic polycondensation of tetraalkoxysilane, in particular tetraethoxysilane (TEOS), in an aqueous-alcoholic-ammoniacal medium. Of course, aqueous and / or solvent-containing sols prepared in another way can also be used as the coating solution. In addition, the coating solution may additionally contain surfactants. Furthermore, the usable coating solutions for the sol-gel process may contain other components, such as leveling agents or complexing agents.
Der jeweilige Feststoffanteil in der Beschichtungslösung liegt üblicherweise im Bereich von 0.1 bis 20 Gew.-%, vorzugsweise bei 2 bis 10 Gew.-%.The respective solids content in the coating solution is usually in the range of 0.1 to 20 wt .-%, preferably 2 to 10 wt .-%.
Beschichtungslösungen der oben genannten Arten sind beispielsweise in DE 198 28 231 , US 4,775,520, US 5,378,400, DE 196 42 419, EP 1 199 288 oder WO 03/027015 beschrieben, deren Offenbarungsgehalte hiermit unter Bezugnahme in die vorliegende Erfindung mit eingeschlossen sind. Die Beschichtung im Sol-Gel-Verfahren erfolgt nach den allgemeinen und dem Fachmann bekannten Prinzipien, z.B. durch Tauchbeschichtung, Sprühverfahren oder mittels Fließvorhang. Bei der Tauchbeschichtung wird das strukturierte Substrat in die Beschichtungslösung eingetaucht, bei den Sprühverfahren erfolgt eine Beschichtung des Substrates mit dem Beschichtungsmedium mittels Ein- oder Mehrstoffdüsen. Bei Verwendung eines Fließvorhangs erfolgt die Beschichtung durch einen frei fließenden Vorhang des Beschichtungsmediums, unter dem das zu beschichtende Substrat hindurch bewegt wird. Vorzugsweise erfolgt die Beschichtung im Sol-Gel-Verfahren mittels Tauchbeschichtung. Dazu wird in der einfachsten Ausführungsform das vorstrukturierte Substrat mit einer Hubvorrichtung in eine mit SoI gefüllte Küvette getaucht und anschließend mit einer gleichmäßigen Geschwindigkeit aus der Küvette herausgezogen.Coating solutions of the abovementioned types are described, for example, in DE 198 28 231, US Pat. No. 4,775,520, US Pat. No. 5,378,400, DE 196 42 419, EP 1 199 288 or WO 03/027015, the disclosure contents of which are hereby included by reference in the present invention. The coating in the sol-gel process is carried out according to the general principles known to the person skilled in the art, e.g. by dip coating, spraying or by flow curtain. In the case of dip coating, the structured substrate is immersed in the coating solution; in the spray process, the substrate is coated with the coating medium by means of single-component or multi-component nozzles. When using a flow curtain, the coating is carried out through a free-flowing curtain of the coating medium, under which the substrate to be coated is moved through. Preferably, the coating is carried out in the sol-gel process by means of dip coating. For this purpose, in the simplest embodiment, the prestructured substrate is dipped with a lifting device into a cuvette filled with sol and then withdrawn from the cuvette at a uniform speed.
Die Dicke der aufgebrachten Schicht richtet sich nach der Tiefe und Struktur der im ersten Verfahrensschritt vorgenommenen Strukturierung. Erfolgt eine Strukturierung unter Ausbildung vieler Kanten, Ecken und Stufen bzw. größer Höhenunterschiede zwischen den höchsten und tiefsten Punkten der Struktur, so ist der Anteil der glättenden Schicht entsprechend größer zu wählen. Eine genaue Abstimmung der einzelnen Parameter bei
der Strukturierung und der anschließenden Glättung unterliegt dem Fachwissen des Fachmanns. Vorzugsweise werden die einzelnen Parameter so aufeinander abgestimmt, dass die strukturierte Oberfläche die eingangs genannten Bedingungen für einen optimalen Diffusor/Reflektor erfüllt. Die Steuerung der Dicke bei der Beschichtung imThe thickness of the applied layer depends on the depth and structure of the structuring carried out in the first method step. If structuring takes place with the formation of many edges, corners and steps or greater differences in height between the highest and lowest points of the structure, then the proportion of the smoothing layer must be correspondingly greater. An exact coordination of the individual parameters structuring and subsequent smoothing is subject to the skill of the art. The individual parameters are preferably matched to one another in such a way that the structured surface fulfills the conditions mentioned above for an optimal diffuser / reflector. Controlling the thickness of the coating in the
Sol-Gel-Verfahren hängt im Falle der Tauchbeschichtung im wesentlichen von der Ziehgeschwindigkeit des strukturierten Substrates beim Beschichten ab. Je größer die Ziehgeschwindigkeit ist, desto dicker ist die erhaltene Schicht. Üblicherweise liegen die Ziehgeschwindigkeiten im Bereich von 0.1 bis 100 mm/sec und vorzugsweise im Bereich von 1.6 bis 8 mm/sec. Selbstverständlich kann der Beschichtungsvorgang auch ein- oder mehrfach wiederholt werden, bis die gewünschte Glättung der Strukturierung erreicht ist.In the case of dip coating, the sol-gel process essentially depends on the pulling rate of the structured substrate during coating. The higher the pulling speed, the thicker the layer obtained. Usually, the drawing speeds are in the range of 0.1 to 100 mm / sec, and preferably in the range of 1.6 to 8 mm / sec. Of course, the coating process can also be repeated one or more times until the desired smoothing of the structuring is achieved.
Zur Verdichtung und Verfestigung der aufgebrachten Schicht kann das strukturierte Substrat kalziniert werden. Durch die Kalzinierung werden die restlichen Lösemittelanteile aus der aufgebrachten Schicht entfernt. Die Kalzinierungstemperaturen liegen üblicherweise bei 300 bis 7000C, insbesondere bei 500 bis 6000C.For compaction and solidification of the applied layer, the structured substrate can be calcined. Calcination removes the residual solvent content from the applied layer. The calcination temperatures are usually from 300 to 700 ° C., in particular from 500 to 600 ° C.
In einer weiteren Ausführungsform der vorliegenden Erfindung wird die strukturierte Oberfläche zusätzlich mit einer Metallschicht beschichtet. Dieser zusätzliche Schritt schließt sich an die Beschichtung im Sol-Gel- Verfahren an und kann jederzeit nachträglich vorgenommen werden. Die Beschichtung mit einer Metallschicht kann nasschemisch, z.B. durch geeignete Reduktionsverfahren, im CVD- und/oder PVD-Verfahren erfolgen, wobei die PVD-Verfahren bevorzugt sind.In a further embodiment of the present invention, the structured surface is additionally coated with a metal layer. This additional step follows the coating in the sol-gel process and can be carried out at any time afterwards. The coating with a metal layer may be wet-chemically, e.g. by suitable reduction methods, in the CVD and / or PVD method, the PVD methods being preferred.
Als Metall für die zusätzliche Metallschicht eignen sich beispielsweise Aluminium, Silber, Chrom, Nickel oder andere spiegelnde Metallschichten. Vorzugsweise handelt es sich bei der Metallschicht um Aluminium.
Die Dicke der zusätzlichen Metallschicht richtet sich nach dem Material und den gewünschten Eigenschaften und liegt üblicherweise im Bereich von 10 bis 150 nm und insbesondere im Bereich von 30 bis 100 nm.Suitable metals for the additional metal layer are, for example, aluminum, silver, chromium, nickel or other reflective metal layers. Preferably, the metal layer is aluminum. The thickness of the additional metal layer depends on the material and the desired properties and is usually in the range of 10 to 150 nm and in particular in the range of 30 to 100 nm.
Ebenfalls Gegenstand der vorliegenden Erfindung sind Substrate mit strukturierter Oberfläche, hergestellt nach einem der erfindungsgemäßen Verfahren.Likewise provided by the present invention are substrates with a structured surface, prepared by one of the processes according to the invention.
Ein weiterer Gegenstand der vorliegenden Erfindung ist die Verwendung von Substraten mit strukturierter Oberfläche, die gemäß den oben beschriebenen Verfahren erhältlich sind, als Diffusoren und/oder Reflektoren in optischen Anwendungen. Bei den optischen Anwendungen kann es sich um alle dem Fachmann bekannten optischen Anwendungen handeln, z.B. um Kameras jeder Bauart, Projektionsgeräte und -leinwände, Flüssigkristalldisplays, Vergrößerungssysteme, z.B. Mikroskope etc. Vorzugsweise finden die erfindungsgemäßen Substrate Anwendung in Flüssigkristalldisplays. Dort lassen sich die strukturierten Substrate gemäß der vorliegenden Erfindung besonders vorteilhaft einsetzen, z.B. als reflektierenden Hintergrund, um eine Hintergrundbeleuchtung zu ersetzen und damit den Energieverbrauch des Displays verringern zu können. Weitere Anwendungsgebiete der strukturierten Substrate gemäß der vorliegenden Erfindung erschließen sich dem Fachmann ohne erfinderisches Zutun.Another object of the present invention is the use of structured surface substrates obtainable according to the methods described above as diffusers and / or reflectors in optical applications. The optical applications may be any of the optical applications known to those skilled in the art, e.g. cameras of all types, projection devices and screens, liquid crystal displays, magnification systems, e.g. Microscopes, etc. The substrates according to the invention are preferably used in liquid crystal displays. There, the structured substrates according to the present invention can be used particularly advantageously, e.g. as a reflective background to replace a backlight and thus reduce the power consumption of the display. Further fields of application of the structured substrates according to the present invention will be apparent to those skilled in the art without inventive step.
Die nachfolgenden Beispiele sollen die vorliegende Erfindung näher erläutern, ohne sie jedoch zu begrenzen.The following examples are intended to illustrate the present invention without, however, limiting it.
BeispieleExamples
Beispiel 1 : Eine Glasplatte mit einer Dicke von 1 mm wird mit Glasperlen einesExample 1: A glass plate having a thickness of 1 mm is filled with glass beads of a
Größenbereichs von 10 bis 50 μm bei einem Strahldruck von 2 bar und aus einer Entfernung von 200 mm bestrahlt. Die Platte wird entstaubt und
insgesamt dreimal in ein wässrig-alkoholisches Siθ2-Sol (Feststoffgehalt: 3Size range from 10 to 50 microns at a jet pressure of 2 bar and irradiated from a distance of 200 mm. The plate is dedusted and a total of three times in an aqueous-alcoholic SiO 2 sol (solids content: 3
Gew.-%) mit einer Ziehgeschwindigkeit von 4 mm/sec eingetaucht.% By weight) at a pulling rate of 4 mm / sec.
Zwischen den einzelnen Tauchschritten wird die Platte jeweils für 10Between the individual diving steps, the plate is in each case for 10
Minuten bei Raumtemperatur getrocknet. Nach dem Beschichten und Trocknen wird eine Aluminiumschicht mit einerDried at room temperature for a few minutes. After coating and drying, an aluminum layer with a
Schichtdicke von 70 nm auf das strukturierte und beschichtete Substrat aufgebracht.Layer thickness of 70 nm applied to the structured and coated substrate.
Man erhält eine Glasplatte mit einer strukturierten Oberfläche mit diffus streuenden Eigenschaften.
This gives a glass plate with a structured surface with diffusely scattering properties.
Claims
1. Verfahren zur Strukturierung von Oberflächen von Substraten, dadurch gekennzeichnet, dass ein Substrat in einem ersten Schritt strukturiert wird und in einem zweiten Schritt zur teilweisen Glättung der1. A method for structuring surfaces of substrates, characterized in that a substrate is structured in a first step and in a second step for partially smoothing the
Strukturierung im Sol-Gel-Verfahren beschichtet wirdStructuring in the sol-gel process is coated
2. Verfahren gemäß Anspruch 1 , dadurch gekennzeichnet, dass eine diffus streuende Oberfläche erhalten wird.2. The method according to claim 1, characterized in that a diffusely scattering surface is obtained.
3. Verfahren gemäß Anspruch 1 oder 2, dadurch gekennzeichnet, dass die Strukturierung durch Einwirkung von Partikelstrahlen, Laserstrahlen, Ätzverfahren oder durch Prägeverfahren erfolgt.3. The method according to claim 1 or 2, characterized in that the structuring is carried out by the action of particle beams, laser beams, etching or embossing.
4. Verfahren gemäß Anspruch 3, dadurch gekennzeichnet, dass es sich bei den Partikelstrahlen um Sandstrahlen oder Elektronenstrahlen handelt.4. The method according to claim 3, characterized in that it is the sandblasting or electron beams in the particle beams.
5. Verfahren gemäß einem oder mehreren der Ansprüche 1 bis 4, dadurch gekennzeichnet, dass es sich bei den im Sol-Gel-Verfahren eingesetzten Solen um Sole von Verbindungen der Elemente Titan, Zirkonium, Aluminium, Silicium und/oder Mischungen hieraus handelt.5. The process as claimed in one or more of claims 1 to 4, wherein the sols used in the sol-gel process are sols of compounds of the elements titanium, zirconium, aluminum, silicon and / or mixtures thereof.
6. Verfahren gemäß einem oder mehreren der Ansprüche 1 bis 5, dadurch gekennzeichnet, dass die Beschichtung im Sol-Gel-Verfahren mittels6. The method according to one or more of claims 1 to 5, characterized in that the coating in the sol-gel method by means of
Tauchbeschichtung, Sprühverfahren oder mittels Fließvorhang erfolgt.Dip coating, spraying or using a flow curtain.
7. Verfahren gemäß einem oder mehreren der Ansprüche 1 bis 6, dadurch gekennzeichnet, dass die strukturierte Oberfläche zusätzlich mit einer Metallschicht beschichtet wird. 7. The method according to one or more of claims 1 to 6, characterized in that the structured surface is additionally coated with a metal layer.
8. Verfahren gemäß Anspruch 7, dadurch gekennzeichnet, dass die Beschichtung mit einer Metallschicht nasschemisch, im CVD- und/oder PVD-Verfahren erfolgt.8. The method according to claim 7, characterized in that the coating is carried out with a metal layer wet-chemically, in the CVD and / or PVD method.
9. Verfahren gemäß Anspruch 7 oder 8, dadurch gekennzeichnet, dass es sich bei dem Metall um Aluminium, Silber, Chrom, Nickel oder andere spiegelnde Metallschichten handelt.9. The method according to claim 7 or 8, characterized in that it is the metal to aluminum, silver, chromium, nickel or other reflective metal layers.
10. Substrate mit strukturierter Oberfläche, hergestellt nach einem oder mehreren der Verfahren 1 bis 9.10. Structured surface substrates prepared according to one or more of the methods 1 to 9.
11. Substrate gemäß Anspruch 10, dadurch gekennzeichnet, dass es sich bei dem Substrat um ein Glassubstrat, Keramiksubstrat, Metallsubstrat oder Kunststoff Substrat handelt.11. Substrates according to claim 10, characterized in that the substrate is a glass substrate, ceramic substrate, metal substrate or plastic substrate.
12. Verwendung von Substraten mit strukturierter Oberfläche, hergestellt nach einem oder mehreren der Verfahren 1 bis 9, als Diffusoren und/oder Reflektoren in optischen Anwendungen.12. The use of structured surface substrates prepared according to one or more of the methods 1 to 9 as diffusers and / or reflectors in optical applications.
13. Verwendung gemäß Anspruch 12, dadurch gekennzeichnet, dass es sich bei den optischen Anwendungen um Flüssigkristalldisplays handelt. Use according to claim 12, characterized in that the optical applications are liquid-crystal displays.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102005041242A DE102005041242A1 (en) | 2005-08-31 | 2005-08-31 | Producing structured surface on substrate, for use as diffuser or reflector for optical applications, e.g. in liquid crystal displays, by structuring then partially smoothing by sol-gel coating process |
PCT/EP2006/007708 WO2007025628A1 (en) | 2005-08-31 | 2006-08-04 | Methods for structuring substrate surfaces |
Publications (1)
Publication Number | Publication Date |
---|---|
EP1920274A1 true EP1920274A1 (en) | 2008-05-14 |
Family
ID=37057391
Family Applications (1)
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---|---|---|---|
EP06762976A Withdrawn EP1920274A1 (en) | 2005-08-31 | 2006-08-04 | Methods for structuring substrate surfaces |
Country Status (9)
Country | Link |
---|---|
US (1) | US20080193721A1 (en) |
EP (1) | EP1920274A1 (en) |
JP (1) | JP2009508149A (en) |
KR (1) | KR20080042150A (en) |
CN (1) | CN101253423B (en) |
AU (1) | AU2006286834B2 (en) |
DE (1) | DE102005041242A1 (en) |
TW (1) | TW200724979A (en) |
WO (1) | WO2007025628A1 (en) |
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US7736750B2 (en) * | 2006-12-14 | 2010-06-15 | Ppg Industries Ohio, Inc. | Coated non-metallic sheet having a brushed metal appearance, and coatings for and method of making same |
FR2944147B1 (en) * | 2009-04-02 | 2011-09-23 | Saint Gobain | METHOD FOR MANUFACTURING TEXTURED EXTERNAL SURFACE STRUCTURE FOR ORGANIC ELECTROLUMINESCENT DIODE DEVICE AND STRUTURE WITH TEXTURED EXTERNAL SURFACE |
FR2944145B1 (en) * | 2009-04-02 | 2011-08-26 | Saint Gobain | METHOD FOR MANUFACTURING TEXTURED SURFACE STRUCTURE FOR ORGANIC ELECTROLUMINESCENT DIODE DEVICE AND STRUCTURE WITH TEXTURED SURFACE |
FR2953212B1 (en) * | 2009-12-01 | 2013-07-05 | Saint Gobain | REACTIVE ION ETCHING SURFACE STRUCTURING METHOD, STRUCTURED SURFACE AND USES THEREOF. |
TW201123479A (en) * | 2009-12-29 | 2011-07-01 | Chung Shan Inst Of Science | Method of fabricating a transparent conducting thin film with regular pattern. |
DE102010004741B4 (en) | 2010-01-14 | 2023-02-23 | Schott Ag | Process for manufacturing a composite material and kitchen utensil |
CN103304147A (en) * | 2012-03-07 | 2013-09-18 | 利科光学股份有限公司 | Method for locally forming smooth surface on matte glass |
FR2992313B1 (en) * | 2012-06-21 | 2014-11-07 | Eurokera | VITROCERAMIC ARTICLE AND METHOD OF MANUFACTURE |
FR2993266B1 (en) * | 2012-07-13 | 2014-07-18 | Saint Gobain | TRANSLUCENT GLAZING COMPRISING AT LEAST ONE MOTIF, PREFERABLY TRANSPARENT |
CN103943524A (en) * | 2013-01-21 | 2014-07-23 | 源贸科技股份有限公司 | Viewing method for substrate with uneven surface |
WO2015050750A1 (en) | 2013-10-02 | 2015-04-09 | 3M Innovative Properties Company | Microstuctured diffuser comprising first microstructured layer and coating, optical stacks, and method |
JP2017507103A (en) * | 2014-01-29 | 2017-03-16 | コーニング インコーポレイテッド | Glass for display lighting processed with laser |
US9500941B2 (en) * | 2014-04-16 | 2016-11-22 | Seiko Epson Corporation | Illumination device and projector |
JP6712372B2 (en) | 2015-03-02 | 2020-06-24 | エーエスエムエル ネザーランズ ビー.ブイ. | Radiation system |
CN108660404A (en) * | 2018-03-20 | 2018-10-16 | 武汉理工大学 | A kind of high infrared reflection composite coating and preparation method thereof |
CN110642524B (en) * | 2019-10-31 | 2020-06-30 | 山东大学 | Method for preparing microstructure on glass surface by titanium dioxide nanoparticle assisted infrared nanosecond laser |
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- 2006-08-04 CN CN200680031371XA patent/CN101253423B/en not_active Expired - Fee Related
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- 2006-08-04 US US12/065,171 patent/US20080193721A1/en not_active Abandoned
- 2006-08-04 KR KR1020087007619A patent/KR20080042150A/en not_active Application Discontinuation
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Also Published As
Publication number | Publication date |
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AU2006286834B2 (en) | 2012-03-08 |
JP2009508149A (en) | 2009-02-26 |
CN101253423B (en) | 2011-03-09 |
KR20080042150A (en) | 2008-05-14 |
TW200724979A (en) | 2007-07-01 |
AU2006286834A1 (en) | 2007-03-08 |
CN101253423A (en) | 2008-08-27 |
WO2007025628A8 (en) | 2007-06-21 |
WO2007025628A1 (en) | 2007-03-08 |
DE102005041242A1 (en) | 2007-03-01 |
US20080193721A1 (en) | 2008-08-14 |
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