EP1747905B1 - Security feature and method for producing it - Google Patents
Security feature and method for producing it Download PDFInfo
- Publication number
- EP1747905B1 EP1747905B1 EP06014552.1A EP06014552A EP1747905B1 EP 1747905 B1 EP1747905 B1 EP 1747905B1 EP 06014552 A EP06014552 A EP 06014552A EP 1747905 B1 EP1747905 B1 EP 1747905B1
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- EP
- European Patent Office
- Prior art keywords
- layer
- mask
- laser
- substrate foil
- security
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
- B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
- B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
- B42D25/40—Manufacture
- B42D25/405—Marking
- B42D25/41—Marking using electromagnetic radiation
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
- B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
- B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
- B42D25/30—Identification or security features, e.g. for preventing forgery
- B42D25/355—Security threads
Definitions
- the invention relates to a security element for security papers, documents of value and the like having a carrier film with a cover layer, which in particular has visible in transmitted light coating-free areas in the form of patterns, characters or codes.
- the invention further relates to a method for producing such security elements.
- Security documents are often provided with security elements for the purpose of security, which allow verification of the authenticity of the value document and at the same time serve as protection against unauthorized reproduction.
- Value documents within the meaning of the present invention are, in particular, bank notes, shares, bonds, certificates, vouchers, checks, high-quality admission tickets, but also other papers which are subject to counterfeiting, such as passports and other identity documents, as well as product security elements such as labels, seals, packaging and the like.
- value document in the following includes all such documents and product assurance means.
- the security elements are often provided with a so-called negative writing.
- This negative writing is formed for example by metal-free areas in an otherwise continuous metallic coating of the carrier material of the security element.
- WO 99/13157 describes a washing method in which a translucent carrier sheet is printed with a desired pattern using a high pigment ink. Due to the high pigment content, the ink forms a porous, sublime color after drying. On the printed carrier film is then a thin Coating formed, which only partially covers the color body in the field of paint because of its large surface and the porous structure. The application of paint and the overlying covering layer can then be removed by washing with a suitable solvent, so that recesses are produced in the covering layer in the originally printed regions of the carrier film. By the achievable sharp contours can be introduced by printing a logo, for example, a legible negative writing in the cover layer.
- the present invention seeks to propose a method for producing a generic security element, which avoids the disadvantages of the prior art.
- the method should combine a fast production suitable for production conditions with high quality and high security against forgery of the generated security elements.
- the carrier film is transparent for the predetermined laser wavelength and the mask is applied to the second main surface of the carrier film, that is to say on the main surface opposite the absorbent covering layer.
- the mask can then be applied directly after a hologram embossing, so that an excellent registration to the hologram design can be achieved.
- the process steps do not have to be carried out in the stated order. Rather, it may be advantageous if first the mask is applied to the second main surface of the carrier film, and only then the absorbent cover layer is applied to the first main surface of the carrier film.
- the mask is printed on the first or second major surface of the carrier film.
- the printing layer of the mask can be formed in both process variants by a thin ink layer, in particular a thin opaque white layer.
- the mask is applied directly after a step of embossing a diffraction structure in the carrier film.
- the mask is thereby positioned to the diffraction structure, so that the information formed by the openings of the mask in the register is an information formed by the diffraction structure.
- the mask is applied as a negative mask whose areas transparent to the laser radiation of the defined wavelength define the shape of the desired coating-free areas.
- the mask must not be completely impermeable in the non-transparent areas, it is sufficient if there is such a large part the laser radiation absorbs that the remaining residual radiation no longer has the intensity required to remove the cover layer.
- the negative mask has openings in the form of the desired coating-free areas.
- an opaque cover layer or a color layer can be applied as the absorbent cover layer. It is self-evident that not only a single layer but also a layer sequence with a plurality of superimposed layers can be applied as cover layer, such as the color shift effect thin-layer element mentioned below.
- a metal layer or a layer sequence containing a metal layer is applied as cover layer, wherein the metal layer preferably consists of aluminum, copper, gold, iron, chromium, nickel, silver, platinum, palladium, titanium, another non-ferrous metal, or an alloy of these metals consists.
- the cover layer forms the metallization layer of a diffractive diffraction structure. The metal layer is locally removed by the action of the laser radiation or converted into a transparent modification. Both cases are referred to in this description as ablation of the cover layer.
- the method according to the invention is suitable not only for the local removal of thin cover layers (about 10 nm or more), but in particular also for the local removal of comparatively thick layers or layer sequences.
- a layer sequence with a total thickness of more than 400 nm, in particular more than 800 nm, can be applied as cover layer.
- a thin-film element with a color-shift effect is applied as the cover layer.
- a thin-film element expediently has a reflection layer, an absorber layer and a dielectric spacer layer arranged between the reflection layer and the absorber layer.
- Such a thin-film element can be applied with a layer thickness of up to about 1 .mu.m and according to the invention provided with coating-free regions.
- thin-film elements having a plurality of successive dielectric layers with different refractive indices even several ⁇ m of layer thickness are possible.
- These extremely thick layers can also be locally removed by the method according to the invention in order to produce desired patterns, characters or codes in the cover layer.
- the mask may represent an auxiliary layer which is removed after the laser application.
- the mask can also be formed by a layer which itself becomes part of the finished security element, and therefore does not have to be removed after laser application.
- the mask may be formed in particular by a metal layer.
- the mask is advantageously structured by a washing process or an etching process.
- the security element contains a thin-film element with a color-shift effect, the absorber layer of the thin-film element assuming the role of the cover layer and the reflection layer of the thin-film element assuming the role of the mask.
- the absorber layer is then removed by means of laser application through the reflection-layer mask.
- a color layer is applied as the cover layer and a reflection layer is applied as the mask. Again, the top layer is removed after the structuring of the reflection layer by the mask thus formed.
- a further advantageous embodiment is obtained when a color layer or a colored hologram embossing lacquer is used as the cover layer, and the metallization layer of a diffractive diffraction structure is used as the mask. In this way, attractive color effects can be produced in hologram films.
- the loading of the carrier film with the laser radiation advantageously takes place over a large area in order to simultaneously detect a plurality of mask openings or transparent regions of the mask.
- a laser spot is advantageously generated in the plane of the carrier film with a laser source and the carrier film is guided past the laser spot along a web running direction.
- the laser spot is smaller than the relevant width of the carrier foil or a benefit of the carrier foil, so that the laser spot is moved over a deflection device at high speed along the width direction of the running carrier foil.
- the laser spot is produced with such an extent in the plane of the carrier film that it covers substantially all the width of at least one benefit of the carrier film extending perpendicular to the web running direction without beam deflection. It is understood that the laser spot has peripheral areas in which the mask contains no openings, no longer needs to capture.
- the carrier film advantageously passes the laser spot at a high web speed of about 50 m / min or more, preferably even about 100 m / min or more. If several benefits are arranged side by side on the carrier foil, a plurality of laser sources can be used, each of which detects one of the benefits.
- Nd YAG lasers at 1.064 ⁇ m
- frequency doubled Nd YAG lasers at 532 nm or diode lasers in the near infrared, at about 808 nm or 940 nm can be used.
- the cover layer is permeable or reflective in this variant of the invention for the fixed laser wavelength, so that it is not removed by the laser radiation.
- the absorbent areas of the positive mask on the other hand, strongly absorb the laser radiation and heat up until the underlying cover layer is dissolved or converted by the resulting heating or chemical reaction.
- the invention also includes a security element for security papers, documents of value and the like having a carrier film with a cover layer, which has coatable regions in the form of patterns, characters or codes which can be produced in particular by transmitted light, which can be produced according to one of the method variants described above.
- the security element may in particular be a security thread or a wide security band.
- the security element is preferably equipped with an optically variable effect, preferably with a diffractive diffraction structure, in particular in the form of an embossed relief structure, and / or a Farbkipp concise harsh.
- Fig.1 shows a schematic representation of a banknote 10 with a window security thread 12, which is provided with a recognizable in particular transparent transparency 14.
- the negative writing in the embodiment for illustration only from the letter sequence "PL", it understands However, in practice, longer strings or strings, associated with patterns or codes, may be provided.
- FIGS. 2 and 3 each show a cross section of the security thread at an intermediate step of the production method
- FIGS Fig. 4 is a view of the finished security thread.
- a transparent carrier foil 20 which has opposing main faces 22 and 24.
- a mask 28 is printed on the second main surface 24 of the carrier film, which has openings 30 in the form of the desired negative writing.
- the mask 28 is formed by a thin opaque white layer.
- a full-surface opaque cover layer 26 is then applied.
- a 30 nm thick aluminum layer is vapor-deposited on the carrier film 20 as cover layer 26.
- Fig. 2 shows the carrier film after the printing of the mask 28 and the vapor deposition of the aluminum layer 26th
- the cover layer 26 may in particular be the metallization layer of a diffractive diffraction structure, which is subsequently impressed into the carrier film, such as a hologram.
- the cover layer 26 may also be formed by a more complex layer sequence, for example, by a thin-film element in other embodiments Color-shifting effect comprising a metallic reflection layer, a dielectric spacer layer and a semi-transparent absorber layer. Even such comparatively thick outer layers can be completely removed locally by the procedure described below and thus provided with a high-contrast negative information.
- the carrier film 20, as in Fig. 3 shown irradiated from the side of the second main surface 24 with the radiation of a pulsed Nd: YAG laser with ⁇ 1.064 microns (arrows 32).
- the laser radiation 32 is incident through the openings 30 of the mask and the transparent support film 20 on the aluminum layer 26, which is locally removed by the action of the laser radiation in the exposed areas or converted into a transparent modification.
- coating-free regions 34 are formed in the otherwise opaque cover layer 26, as best seen in the top view of FIG Fig. 4 to recognize.
- the introduced information appears as negative writing 34 in light of the dark metallic background of the cover layer 26. It is understood that other characters, patterns or codes can be introduced into the cover layer in the manner described.
- the generation of negative information by masking and laser ablation offers two major advantages: Firstly, a color with fine pigments can be used for the printing of the mask, so that when using laser radiation in the near infrared line widths down to 5 microns can be achieved. With shorter wavelength laser radiation, the resolution may even be increased even further. On the other hand, the demetalization with the laser with a suitable choice of Beam parameters and beam guidance done very quickly, so that a high throughput is achieved.
- the method according to the invention can advantageously also be combined with conventional demetallization methods, as described below with reference to FIGS. 5 to 9 explained.
- a security element 60 comprising a transparent carrier film 62, an optional hologram embossing lacquer layer 64 and a color shift effect thin-film element 66 comprising an absorber layer 68, for example an 8 nm thick chromium layer, a dielectric spacer layer 70, for example a 450 nm thick layer of SiO 2 or MgF 2 , and a reflector layer 72, for example, a 40 nm thick aluminum layer consists.
- an absorber layer 68 for example an 8 nm thick chromium layer
- a dielectric spacer layer 70 for example a 450 nm thick layer of SiO 2 or MgF 2
- a reflector layer 72 for example, a 40 nm thick aluminum layer
- the reflector layer 72 is already provided with recesses 74 in the form of the desired negative writing, which were produced in an upstream process step, for example by a washing process of the type mentioned above or by an etching process.
- the structured reflector layer 72 acts as a mask for the subsequently performed laser demetallization, wherein the Fig. 5 shows a situation in which the layer structure of the right image portion 76 has already been exposed to laser radiation 80, while the security element in the left part of the image 78 is not yet processed.
- the thin chromium layer 68 can already be removed with such a low irradiation energy that the reflector layer 72 substantially remains intact, so that the laser creates a structured thin-film element with recesses 74 in the reflector layer 72 and congruent uncoated regions 82 in the absorber layer 68.
- the dielectric spacer layer 70 is still present in the exemplary embodiment after laser application, but this does not affect the visual impression of the negative information, since the spacer layer 70 is transparent.
- the described two-stage approach has the advantage that the removal of the thin absorber layer requires a significantly lower laser energy than the removal of the entire thin-film element.
- the structured reflector layer itself is not removed and can therefore serve as a mask, so that it is possible to dispense with the application of a separate mask.
- existing devices and process steps for a washing process or an etching step can be used further.
- the layer structure of the thin-film element 66 may also be applied in reverse order to the carrier foil 62, as in FIG Fig. 6 shown.
- the laser application 80 then takes place from the opposite side of the security element through the transparent carrier film 62.
- the reflector layer 72 structured by a washing process acts as a mask for the laser ablation of the thin absorber layer 68.
- a laser application 80 from the rear side of the carrier film 62 also lends itself to other designs. For example, as based on the Fig. 7 illustrated, first applied an aluminum layer 84 on a support film 62 and with a washing process in the form of the desired negative information be structured. On the aluminum layer 84, a color layer 86 is then printed in order to produce an example of copper or gold-colored color impression of the security element. During the laser treatment, the layer sequence of aluminum layer 84 and color layer 86 is subsequently exposed to laser radiation 80 from the rear side of the carrier film 62, wherein the structured aluminum layer 84 acts as a mask for the removal of the color layer 86. With a suitable adjustment of the laser energy, it is possible in this way to remove only the color layer 86 matched to the aluminum layer 84 and thus to introduce a negative information in a copper or gold-colored reflection layer.
- the shows Fig. 8 a hologram foil 90, in which a color layer 92 is printed on a transparent carrier foil 62. Over the color layer 92, a hologram embossing lacquer layer 94 and a metal layer 96 of aluminum are deposited. Recesses 98 in the form of the desired negative information were introduced into the metal layer 96 by means of an etching process. In order to remove the ink layer 92 in the region of the recesses 98, the structure formed in this way is exposed to laser radiation 80, the structured metal layer 96 acting as a mask. The resulting hologram sheet 90 shows an example copper or gold hologram with transparent negative information.
- the design of the Fig. 8 is used when the laser energy needed to remove the color layer 92 is small enough not to significantly affect the metal layer 96. If a higher energy is required, then, for example, after the etching process, the resist layer 100 applied to the metal layer 96 may initially be preserved, as in FIG Fig. 9 shown. The resist 100 then protects the metal layer 96 from undesired damage during the laser application and is removed only after the laser has been applied.
- FIGS. 8 and 9 can of course be carried out with reverse layer construction. The sequence of the mask and the layer to be removed is then reversed and the laser application takes place from the back of the film.
- FIGS. 10 and 11 show the principle of laser demetallization with mask technology on a moving film web.
- the running film web 40 from the in 10 and 11 only one section is shown schematically, has the same structure as the security thread of Fig. 2 contains, therefore, a carrier film 20, on whose one major surface an opaque cover layer 26 and on the other major surface of a mask 28 is applied.
- the running direction of the film web 40 is indicated by the arrow 42.
- a possible high value compatible with the reliable introduction of the laser markings is selected for the web speed of the film web 40.
- the film web 40 usually has several adjacent benefits, of which in 10 and 11 for the sake of clarity only one is shown.
- the side-by-side benefits can be achieved either by deflecting the laser beam or by using multiple, For example, the width of a benefit detecting laser sources are covered.
- the infrared radiation 44 of a diode laser 46 is deflected via an optical device 48 and thrown in the form of a laser spot 50 in the plane of the running film web 40.
- the mask openings 30 of the mask 28 are in Fig. 10 for the sake of clarity compared to the laser spot 50 shown exaggerated.
- mask apertures 30 are typically designed to produce microfonts or other micropatterns and thus significantly smaller than the extent of the laser spot, which may be a few millimeters or even a few tens of mm.
- the laser beam 50 is therefore smaller than the relevant width of the film web 40.
- the laser beam is therefore reciprocated in a direction 52 perpendicular to the web 42 in order to reach all mask openings along the width of the film web. This can be achieved for example in a conventional manner by a movable mirror or a mirrored polygon in the optical device 48.
- a sufficiently strong laser source 46 it is also possible to dispense with scanning the width of the film web 40, as shown in FIG Fig. 11 shown.
- the laser spot is generated in this variant by a suitable optics of the optical device 48 with such an extent in the plane of the film web 40 that it covers substantially the entire width of the film web or a benefit on the film web.
- the local removal of the cover layer 26 can thus be done without deflection of the laser beam and thus at the highest possible speed.
- a 13 mm wide film web 40 is driven at a web speed 42 of 100 m / min.
- the laser source used is a continuous-wave diode laser 46 with an output power P of 2.8 kW.
- an approximately rectangular laser spot 54 with a size of 13 ⁇ 8 mm 2 can be set on the film web, so that the entire width of the film web is covered by the laser spot.
- an energy density of 130 kJ / m 2 which is sufficient for demetallizing a 30 nm thick aluminum layer 26 in the region of the mask openings 30, is obtained for each surface element applied.
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Description
Die Erfindung betrifft ein Sicherheitselement für Sicherheitspapiere, Wertdokumente und dergleichen mit einer Trägerfolie mit einer Deckschicht, welche insbesondere im Durchlicht erkennbare beschichtungsfreie Bereiche in Form von Mustern, Zeichen oder Codierungen aufweist. Die Erfindung betrifft ferner ein Verfahren zur Herstellung derartiger Sicherheitselemente.The invention relates to a security element for security papers, documents of value and the like having a carrier film with a cover layer, which in particular has visible in transmitted light coating-free areas in the form of patterns, characters or codes. The invention further relates to a method for producing such security elements.
Wertdokumente werden zur Absicherung oft mit Sicherheitselementen ausgestattet, die eine Überprüfung der Echtheit des Wertdokuments gestatten und die zugleich als Schutz vor unerlaubter Reproduktion dienen. Wertdokumente im Sinne der vorliegenden Erfindung sind insbesondere Banknoten, Aktien, Anleihen, Urkunden, Gutscheine, Schecks, hochwertige Eintrittskarten, aber auch andere fälschungsgefährdete Papiere, wie Pässe und sonstige Ausweisdokumente, sowie Produktsicherungselemente, wie Etiketten, Siegel, Verpackungen und dergleichen. Der Begriff "Wertdokument" schließt im Folgenden alle derartigen Dokumente und Produktsicherungsmittel ein.Security documents are often provided with security elements for the purpose of security, which allow verification of the authenticity of the value document and at the same time serve as protection against unauthorized reproduction. Value documents within the meaning of the present invention are, in particular, bank notes, shares, bonds, certificates, vouchers, checks, high-quality admission tickets, but also other papers which are subject to counterfeiting, such as passports and other identity documents, as well as product security elements such as labels, seals, packaging and the like. The term "value document" in the following includes all such documents and product assurance means.
Zur Erhöhung der Sicherheit und als Fälschungsschutz sind die Sicherheitselemente oft mit einer so genannten Negativschrift versehen. Diese Negativschrift wird beispielsweise durch metallfreie Bereiche in einer ansonsten durchgehenden metallischen Beschichtung des Trägermaterials des Sicherheitselements gebildet.To increase security and as counterfeit protection, the security elements are often provided with a so-called negative writing. This negative writing is formed for example by metal-free areas in an otherwise continuous metallic coating of the carrier material of the security element.
Zur Herstellung derartiger metallfreier Bereiche ist in der Druckschrift
Mit einem derartigen Waschverfahren können allerdings nur relativ dünne Schichten demetallisiert werden. Schichtaufbauten mit einer größeren Gesamtdicke können oft nicht oder nur zum Teil demetallisiert werden, da der Schichtaufbau die Waschfarbe in diesem Fall für ein vollständiges Auswaschen zu stark umschließt. Auch die erreichbare Linienbreite für Negativschriften ist durch die Größe der Pigmente der Waschfarbe auf Werte oberhalb von etwa 60 µm begrenzt.With such a washing process, however, only relatively thin layers can be demetallized. Layer structures with a greater total thickness can often not be demetallized or only partially demetallized, since the layer structure encloses the wash ink in this case too much for a complete washout. The achievable line width for negative writings is also limited to values above about 60 μm by the size of the pigments of the wash ink.
Es ist auch vorgeschlagen worden, Negativschriften in Sicherheitselementen mit einem Laser zu erzeugen. Dies ist gegenwärtig jedoch nur an einer stehenden Folie oder bei sehr geringen Bahngeschwindigkeiten möglich. Aufgrund der runden Geometrie des Laserstrahls und der gepulsten Betriebsweise des Lasers können auch keine scharfen Kanten erzeugt werden. Vielmehr ist die Form des Laserflecks der einzelnen Einschüsse an den Begrenzungslinien der eingebrachten Muster oder Zeichen sichtbar. Die Auflösung ist durch den Fokusdurchmesser, der typischerweise oberhalb von 10 µm liegt, begrenzt. Wird das Material bei kleinem Fokusdurchmesser abgetragen, dauert die Demetallisierung für einen wirtschaftlichen Produktionseinsatz viel zu lange.
Ausgehend davon liegt der Erfindung die Aufgabe zugrunde, ein Verfahren zur Herstellung eines gattungsgemäßen Sicherheitselements vorzuschlagen, das die Nachteile des Stands der Technik vermeidet. Insbesondere soll das Verfahren eine schnelle, für Produktionsbedingungen geeignete Herstellung mit hoher Qualität und hoher Fälschungssicherheit der erzeugten Sicherheitselemente verbinden.Based on this, the present invention seeks to propose a method for producing a generic security element, which avoids the disadvantages of the prior art. In particular, the method should combine a fast production suitable for production conditions with high quality and high security against forgery of the generated security elements.
Diese Aufgabe wird durch das Verfahren zur Herstellung eines Sicherheitselements mit den Merkmalen des Hauptanspruchs gelöst. Ein solchermaßen hergestelltes Sicherheitselement ist im nebengeordneten Anspruch angegeben. Weiterbildungen der Erfindung sind Gegenstand der Unteransprüche.This object is achieved by the method for producing a security element having the features of the main claim. A thus produced security element is specified in the independent claim. Further developments of the invention are the subject of the dependent claims.
Nach einem ersten Aspekt der Erfindung enthält ein Verfahren zur Herstellung eines Sicherheitselements der eingangs genannten Art die Verfahrensschritte:
- Festlegen einer Laserwellenlänge zum Einbringen der beschichtungsfreien Bereiche;
- Bereitstellen einer Trägerfolie mit einander gegenüberliegenden ersten und zweiten Hauptflächen;
- Aufbringen einer die festgelegte Wellenlänge absorbierenden Deckschicht auf eine erste Hauptfläche der Trägerfolie;
- Aufbringen einer Maske, die die Gestalt der gewünschten beschichtungsfreien Bereiche definiert, auf die erste oder zweite Hauptfläche der Trägerfolie; und
- Beaufschlagen der mit der Maske versehenen Hauptfläche der Trägerfolie mit Laserstrahlung der festgelegten Wellenlänge, um die absorbierende Deckschicht der ersten Hauptfläche lokal abzutragen.
- Determining a laser wavelength for introducing the coating-free regions;
- Providing a carrier film having opposing first and second major surfaces;
- Applying a predetermined wavelength absorbing cover layer to a first major surface of the support film;
- Applying a mask defining the shape of the desired coating-free regions to the first or second major surface of the carrier film; and
- Subjecting the masked major surface of the carrier film to laser radiation of the predetermined wavelength to locally ablate the absorbent overcoat of the first major surface.
Als besonders günstig hat es sich herausgestellt, wenn die Trägerfolie für die festgelegte Laserwellenlänge transparent ist und die Maske auf die zweite Hauptfläche der Trägerfolie, also auf der der absorbierenden Deckschicht gegenüberliegenden Hauptfläche aufgebracht wird. Beispielsweise kann die Maske dann direkt nach einer Hologrammprägung aufgebracht werden, so dass eine ausgezeichnete Passerung zum Hologrammdesign erreicht werden kann.It has proven to be particularly favorable if the carrier film is transparent for the predetermined laser wavelength and the mask is applied to the second main surface of the carrier film, that is to say on the main surface opposite the absorbent covering layer. For example, the mask can then be applied directly after a hologram embossing, so that an excellent registration to the hologram design can be achieved.
Die Verfahrensschritte müssen selbstverständlich nicht in der genannten Reihenfolge ausgeführt werden. Vielmehr kann es vorteilhaft sein, wenn zunächst die Maske auf die zweite Hauptfläche der Trägerfolie aufgebracht wird, und erst danach die absorbierende Deckschicht auf die erste Hauptfläche der Trägerfolie aufgebracht wird.Of course, the process steps do not have to be carried out in the stated order. Rather, it may be advantageous if first the mask is applied to the second main surface of the carrier film, and only then the absorbent cover layer is applied to the first main surface of the carrier film.
Bevorzugt wird die Maske auf die erste oder zweite Hauptfläche der Trägerfolie aufgedruckt.Preferably, the mask is printed on the first or second major surface of the carrier film.
In einem zweiten Erfindungsaspekt enthält ein gattungsgemäßes Verfahren die Verfahrensschritte:
- Festlegen einer Laserwellenlänge zum Einbringen der beschichtungsfreien Bereiche;
- Bereitstellen einer für die festgelegte Laserwellenlänge transparenten Trägerfolie mit einander gegenüberliegenden ersten und zweiten Hauptflächen;
- Aufbringen einer Maske, die die Gestalt der gewünschten beschichtungsfreien Bereiche definiert, auf eine erste Hauptfläche der Trägerfolie;
- Aufbringen einer die festgelegte Wellenlänge absorbierenden Deckschicht direkt oder über Zwischenschichten auf die Maske; und
- Beaufschlagen der zweiten Hauptfläche der Trägerfolie mit Laserstrahlung der festgelegten Wellenlänge, um die absorbierende Deckschicht der ersten Hauptfläche lokal abzutragen.
- Determining a laser wavelength for introducing the coating-free regions;
- Providing a carrier film that is transparent to the predetermined laser wavelength and having opposing first and second major surfaces;
- Applying a mask defining the shape of the desired coating-free regions to a first major surface of the carrier film;
- Applying a predetermined wavelength absorbing cover layer directly or via intermediate layers to the mask; and
- Subjecting the second major surface of the carrier film to laser radiation of the predetermined wavelength to locally ablate the absorbent covering layer of the first major surface.
Die Druckschicht der Maske kann in beiden Verfahrensvarianten durch eine dünne Farbschicht, insbesondere eine dünne Deckweißschicht, gebildet sein.The printing layer of the mask can be formed in both process variants by a thin ink layer, in particular a thin opaque white layer.
Gemäß einer vorteilhaften Weiterbildung wird die Maske direkt nach einem Schritt des Einprägens einer Beugungsstruktur in die Trägerfolie aufgebracht. Vorzugsweise wird die Maske dabei zur Beugungsstruktur positioniert, so dass die von den Öffnungen der Maske gebildete Information im Passer zu einer von der Beugungsstruktur gebildeten Information steht.According to an advantageous development, the mask is applied directly after a step of embossing a diffraction structure in the carrier film. Preferably, the mask is thereby positioned to the diffraction structure, so that the information formed by the openings of the mask in the register is an information formed by the diffraction structure.
In einer vorteilhaften Ausgestaltung wird die Maske als Negativmaske aufgebracht, deren für die Laserstrahlung der festgelegten Wellenlänge transparente Bereiche die Gestalt der gewünschten beschichtungsfreien Bereiche definieren. Die Maske muss dabei in den nicht-transparenten Bereichen nicht vollständig undurchlässig sein, es genügt, wenn sie dort einen so großen Teil der Laserstrahlung absorbiert, dass die verbleibende Reststrahlung nicht mehr die zum Abtragen der Deckschicht erforderliche Intensität aufweist. Insbesondere bietet es sich an, dass die Negativmaske Öffnungen in Gestalt der gewünschten beschichtungsfreien Bereiche aufweist.In an advantageous embodiment, the mask is applied as a negative mask whose areas transparent to the laser radiation of the defined wavelength define the shape of the desired coating-free areas. The mask must not be completely impermeable in the non-transparent areas, it is sufficient if there is such a large part the laser radiation absorbs that the remaining residual radiation no longer has the intensity required to remove the cover layer. In particular, it is advisable that the negative mask has openings in the form of the desired coating-free areas.
Als absorbierende Deckschicht kann insbesondere eine opake Deckschicht oder eine Farbschicht aufgebracht werden. Es versteht sich, dass als Deckschicht nicht nur eine Einzelschicht, sondern auch eine Schichtenfolge mit mehreren übereinander liegenden Schichten aufgebracht werden kann, wie etwa das weiter unten erwähnte Dünnschichtelement mit Farbkippeffekt.In particular, an opaque cover layer or a color layer can be applied as the absorbent cover layer. It is self-evident that not only a single layer but also a layer sequence with a plurality of superimposed layers can be applied as cover layer, such as the color shift effect thin-layer element mentioned below.
In bevorzugten Ausgestaltungen wird als Deckschicht eine Metallschicht oder eine eine Metallschicht enthaltende Schichtenfolge aufgebracht, wobei die Metallschicht bevorzugt aus Aluminium, Kupfer, Gold, Eisen, Chrom, Nickel, Silber, Platin, Palladium, Titan, einem anderen Buntmetall, oder einer Legierung dieser Metalle besteht. In einer vorteilhaften Ausgestaltung bildet die Deckschicht die Metallisierungsschicht einer diffraktiven Beugungsstruktur. Die Metallschicht wird durch die Einwirkung der Laserstrahlung lokal entfernt oder in eine transparente Modifikation umgewandelt. Beide Fälle werden im Rahmen dieser Beschreibung als Abtragung der Deckschicht bezeichnet.In preferred embodiments, a metal layer or a layer sequence containing a metal layer is applied as cover layer, wherein the metal layer preferably consists of aluminum, copper, gold, iron, chromium, nickel, silver, platinum, palladium, titanium, another non-ferrous metal, or an alloy of these metals consists. In an advantageous embodiment, the cover layer forms the metallization layer of a diffractive diffraction structure. The metal layer is locally removed by the action of the laser radiation or converted into a transparent modification. Both cases are referred to in this description as ablation of the cover layer.
Das erfindungsgemäße Verfahren eignet sich nicht nur zur lokalen Abtragung von dünnen Deckschichten (etwa 10 nm oder mehr), sondern insbesondere auch zur lokalen Abtragung von vergleichsweise dicken Schichten oder Schichtenfolgen. Als Deckschicht kann daher beispielsweise eine Schichtenfolge mit einer Gesamtdicke von mehr als 400 nm, insbesondere von mehr als 800 nm, aufgebracht werden.The method according to the invention is suitable not only for the local removal of thin cover layers (about 10 nm or more), but in particular also for the local removal of comparatively thick layers or layer sequences. For example, a layer sequence with a total thickness of more than 400 nm, in particular more than 800 nm, can be applied as cover layer.
Gemäß einer vorteilhaften Ausgestaltung wird als Deckschicht ein Dünnschichtelement mit Farbkippeffekt aufgebracht. Ein derartiges Dünnschichtelement weist zweckmäßig eine Reflexionsschicht, eine Absorberschicht und eine zwischen der Reflexionsschicht und der Absorberschicht angeordnete dielektrische Abstandsschicht auf. Ein derartiges Dünnschichtelement kann mit einer Schichtdicke bis zu etwa 1 µm aufgebracht und erfindungsgemäß mit beschichtungsfreien Bereichen versehen werden. Bei Dünnschichtelementen mit mehreren aufeinander folgenden dielektrischen Schichten mit unterschiedlichen Brechzahlen sind sogar mehrere µm Schichtdicke möglich. Auch diese extrem dicken Schichten können mit dem erfindungsgemäßen Verfahren lokal abgetragen werden, um gewünschte Muster, Zeichen oder Codierungen in der Deckschicht zu erzeugen.According to an advantageous embodiment, a thin-film element with a color-shift effect is applied as the cover layer. Such a thin-film element expediently has a reflection layer, an absorber layer and a dielectric spacer layer arranged between the reflection layer and the absorber layer. Such a thin-film element can be applied with a layer thickness of up to about 1 .mu.m and according to the invention provided with coating-free regions. In the case of thin-film elements having a plurality of successive dielectric layers with different refractive indices, even several μm of layer thickness are possible. These extremely thick layers can also be locally removed by the method according to the invention in order to produce desired patterns, characters or codes in the cover layer.
Im Rahmen der Erfindung kann die Maske eine Hilfsschicht darstellen, die nach der Laserbeaufschlagung entfernt wird. Die Maske kann aber auch durch eine Schicht gebildet werden, die selbst Teil des fertigen Sicherheitselements wird, und die daher nach der Laserbeaufschlagung nicht entfernt werden muss. In letztem Fall kann die Maske insbesondere durch eine Metallschicht gebildet sein. Vor der Laserbeaufschlagung wird die Maske mit Vorteil durch ein Waschverfahren oder ein Ätzverfahren strukturiert.In the context of the invention, the mask may represent an auxiliary layer which is removed after the laser application. However, the mask can also be formed by a layer which itself becomes part of the finished security element, and therefore does not have to be removed after laser application. In the latter case, the mask may be formed in particular by a metal layer. Before the laser application, the mask is advantageously structured by a washing process or an etching process.
In einer vorteilhaften Ausgestaltung enthält das Sicherheitselement ein Dünnschichtelement mit Farbkippeffekt, wobei die Absorberschicht des Dünnschichtelements die Rolle der Deckschicht und die Reflexionsschicht des Dünnschichtelements die Rolle der Maske übernimmt. Nach der Strukturierung der Reflexionsschicht zur Erzeugung der gewünschten Negativinformation, die beispielsweise durch ein Waschverfahren oder einen Ätzschritt erfolgen kann, wird die Absorberschicht dann mittels Laserbeaufschlagung durch die Reflexionsschicht-Maske hindurch abgetragen.In an advantageous embodiment, the security element contains a thin-film element with a color-shift effect, the absorber layer of the thin-film element assuming the role of the cover layer and the reflection layer of the thin-film element assuming the role of the mask. After the structuring of the reflection layer to produce the desired negative information, which can take place, for example, by a washing process or an etching step, the absorber layer is then removed by means of laser application through the reflection-layer mask.
In einer anderen, ebenfalls vorteilhaften Ausgestaltung wird als Deckschicht eine Farbschicht und als Maske eine Reflexionsschicht aufgebracht. Auch hier wird die Deckschicht nach der Strukturierung der Reflexionsschicht durch die so gebildete Maske abgetragen.In another, likewise advantageous embodiment, a color layer is applied as the cover layer and a reflection layer is applied as the mask. Again, the top layer is removed after the structuring of the reflection layer by the mask thus formed.
Eine weitere vorteilhafte Ausgestaltung entsteht, wenn als Deckschicht eine Farbschicht oder ein farbiger Hologramm-Prägelack, und als Maske die Metallisierungsschicht einer diffraktiven Beugungsstruktur eingesetzt wird. Auf diese Weise lassen sich attraktive Farbeffekte in Hologrammfolien erzeugen.A further advantageous embodiment is obtained when a color layer or a colored hologram embossing lacquer is used as the cover layer, and the metallization layer of a diffractive diffraction structure is used as the mask. In this way, attractive color effects can be produced in hologram films.
Um eine hohe Bearbeitungsgeschwindigkeit zu erreichen, erfolgt die Beaufschlagung der Trägerfolie mit der Laserstrahlung mit Vorteil großflächig, um eine Mehrzahl von Maskenöffnungen oder transparenten Bereichen der Maske gleichzeitig zu erfassen.In order to achieve a high processing speed, the loading of the carrier film with the laser radiation advantageously takes place over a large area in order to simultaneously detect a plurality of mask openings or transparent regions of the mask.
Beim Einsatz des erfindungsgemäßen Verfahrens an einer laufenden Folienbahn wird zweckmäßig mit einer Laserquelle ein Laserfleck in der Ebene der Trägerfolie erzeugt und die Trägerfolie entlang einer Bahnlaufrichtung an dem Laserfleck vorbeigeführt. In einer Erfindungsvariante ist der Laserfleck dabei kleiner als die maßgebliche Breite der Trägerfolie oder eines Nutzens der Trägerfolie, so dass der Laserfleck über eine Ablenkeinrichtung mit hoher Geschwindigkeit entlang der Breitenrichtung der laufenden Trägerfolie hin- und herbewegt wird.When using the method according to the invention on a moving film web, a laser spot is advantageously generated in the plane of the carrier film with a laser source and the carrier film is guided past the laser spot along a web running direction. In one variant of the invention, the laser spot is smaller than the relevant width of the carrier foil or a benefit of the carrier foil, so that the laser spot is moved over a deflection device at high speed along the width direction of the running carrier foil.
Gemäß einer anderen, ebenfalls bevorzugten Erfindungsvariante wird der Laserfleck mit einer solchen Ausdehnung in der Ebene der Trägerfolie erzeugt, dass er ohne Strahlablenkung im Wesentlichen die gesamte, sich senkrecht zur Bahnlaufrichtung erstreckende Breite zumindest eines Nutzens der Trägerfolie erfasst. Es versteht sich, dass der Laserfleck Randbereiche, in denen die Maske keine Öffnungen enthält, nicht mehr erfassen muss. Die Trägerfolie wird bei dieser Variante mit Vorteil mit einer hohen Bahngeschwindigkeit von etwa 50 m/min oder mehr, vorzugsweise sogar von etwa 100 m/min oder mehr an dem Laserfleck vorbeigeführt. Sind mehrere Nutzen nebeneinander auf der Trägerfolie angeordnet, können mehrere Laserquellen eingesetzt werden, die jeweils einen der Nutzen erfassen.According to another, likewise preferred variant of the invention, the laser spot is produced with such an extent in the plane of the carrier film that it covers substantially all the width of at least one benefit of the carrier film extending perpendicular to the web running direction without beam deflection. It is understood that the laser spot has peripheral areas in which the mask contains no openings, no longer needs to capture. In this variant, the carrier film advantageously passes the laser spot at a high web speed of about 50 m / min or more, preferably even about 100 m / min or more. If several benefits are arranged side by side on the carrier foil, a plurality of laser sources can be used, each of which detects one of the benefits.
Zur Laserbeaufschlagung hat sich der Einsatz eines oder mehrerer Laser im sichtbaren oder infraroten Spektralbereich als vorteilhaft gezeigt. Insbesondere können Nd:YAG-Laser bei 1,064 µm, frequenzverdoppelte Nd:YAG-Laser bei 532 nm oder Diodenlaser im nahen Infrarot, etwa bei 808 nm oder 940 nm zum Einsatz kommen.For laser application, the use of one or more lasers in the visible or infrared spectral range has been found to be advantageous. In particular, Nd: YAG lasers at 1.064 μm, frequency doubled Nd: YAG lasers at 532 nm or diode lasers in the near infrared, at about 808 nm or 940 nm can be used.
Gemäß einer weiteren Erfindungsvariante enthält ein Verfahren zur Herstellung eines Sicherheitselements der eingangs genannten Art die Schritte:
- Festlegen einer Laserwellenlänge zum Einbringen der beschichtungsfreien Bereiche;
- Bereitstellen einer Trägerfolie mit einander gegenüberliegenden ersten und zweiten Hauptflächen;
- Aufbringen einer die festgelegte Wellenlänge im Wesentlichen nicht absorbierenden Deckschicht auf eine erste Hauptfläche der Trägerfolie;
- Aufbringen einer Positivmaske mit die festgelegte Wellenlänge absorbierenden Bereichen, die die Gestalt der gewünschten beschichtungsfreien Bereiche definieren, auf die Deckschicht; und
- Beaufschlagen der mit der Maske versehenen Hauptfläche der Trägerfolie mit Laserstrahlung der festgelegten Wellenlänge, um die Deckschicht der ersten Hauptfläche unterhalb der absorbierenden Bereiche der Positivmaske lokal abzutragen.
- Determining a laser wavelength for introducing the coating-free regions;
- Providing a carrier film having opposing first and second major surfaces;
- Applying a cover layer substantially non-absorbing the predetermined wavelength to a first major surface of the support film;
- Applying a positive mask having the predetermined wavelength absorbing regions defining the shape of the desired coating-free regions to the cover layer; and
- Subjecting the masked major surface of the carrier film to laser radiation of the predetermined wavelength to locally ablate the first major surface cap layer below the positive mask absorbent regions.
Die Deckschicht ist bei dieser Erfindungsvariante für die festgelegte Laserwellenlänge durchlässig oder reflektierend, so dass sie von der Laserstrahlung nicht abgetragen wird. Die absorbierenden Bereiche der Positivmaske absorbieren die Laserstrahlung dagegen stark und erhitzen sich, bis die darunter liegende Deckschicht durch die entstehende Erwärmung oder eine chemische Reaktion aufgelöst oder umgewandelt wird. Bezüglich der weiteren Ausgestaltungen des Verfahrens wird auf die obigen Ausführungen verwiesen, die mutatis mutandis auch für das Verfahren dieser Erfindungsvariante gelten.The cover layer is permeable or reflective in this variant of the invention for the fixed laser wavelength, so that it is not removed by the laser radiation. The absorbent areas of the positive mask, on the other hand, strongly absorb the laser radiation and heat up until the underlying cover layer is dissolved or converted by the resulting heating or chemical reaction. With regard to the further embodiments of the method, reference is made to the above statements, which mutatis mutandis also apply to the method of this variant of the invention.
Die Erfindung enthält auch ein Sicherheitselement für Sicherheitspapiere, Wertdokumente und dergleichen mit einer Trägerfolie mit einer Deckschicht, die insbesondere im Durchlicht erkennbare beschichtungsfreie Bereiche in Form von Mustern, Zeichen oder Codierungen aufweist, welches nach einem der oben beschriebenen Verfahrensvarianten hergestellt werden kann. Bei dem Sicherheitselement kann es sich insbesondere um einen Sicherheitsfaden oder ein breites Sicherheitsband handeln. Das Sicherheitselement ist vorzugsweise mit einem optisch variablen Effekt, vorzugsweise mit einer diffraktiven Beugungsstruktur, insbesondere in Form einer geprägten Reliefstruktur, und/oder einer Farbkippeffektschicht ausgestattet.The invention also includes a security element for security papers, documents of value and the like having a carrier film with a cover layer, which has coatable regions in the form of patterns, characters or codes which can be produced in particular by transmitted light, which can be produced according to one of the method variants described above. The security element may in particular be a security thread or a wide security band. The security element is preferably equipped with an optically variable effect, preferably with a diffractive diffraction structure, in particular in the form of an embossed relief structure, and / or a Farbkippeffektschicht.
Weitere Ausführungsbeispiele sowie Vorteile der Erfindung werden nachfolgend anhand der Figuren erläutert, bei deren Darstellung auf eine maßstabs- und proportionsgetreue Wiedergabe verzichtet wurde, um die Anschaulichkeit zu erhöhen.Further embodiments and advantages of the invention will be explained below with reference to the figures, in the representation thereof to a scale and proportioned reproduction has been omitted in order to increase the clarity.
Es zeigen:
- Fig.1
- eine schematische Darstellung einer Banknote mit einem eingebetteten Fenstersicherheitsfaden nach einem Ausführungsbeispiel der Erfindung,
- Fig. 2 und 3
- einen Querschnitt eines Sicherheitsfadens wie in
Fig. 1 jeweils bei einem Zwischenschritt des erfindungsgemäßen Herstellungsverfahrens, - Fig. 4
- eine Aufsicht auf den fertigen Sicherheitsfaden,
- Fig. 5 bis 9
- jeweils einen Zwischenschritt bei der erfindungsgemäßen Herstellung verschiedener Sicherheitselemente, wobei der linke Bildteil die Situation vor der Laserbeaufschlagung und der rechte Bildteil die Situation nach der Laserbeaufschlagung zeigt, und
- Fig. 10 und 11
- das Prinzip der Laserdemetallisierung mit Maskentechnik an laufenden Folienbahnen.
- Fig.1
- a schematic representation of a banknote with an embedded window security thread according to an embodiment of the invention,
- FIGS. 2 and 3
- a cross section of a security thread as in
Fig. 1 in each case at an intermediate step of the production method according to the invention, - Fig. 4
- a view of the finished security thread,
- Fig. 5 to 9
- in each case an intermediate step in the inventive production of different security elements, wherein the left part of the image shows the situation before the laser application and the right part of the image shows the situation after the laser application, and
- 10 and 11
- the principle of laser demetallization with mask technology on running film webs.
Die Erfindung wird nun am Beispiel einer Banknote näher erläutert.
Der Schichtaufbau und die Herstellung eines erfindungsgemäßen Sicherheitsfadens werden nun anhand der
Zur Herstellung eines erfindungsgemäßen Sicherheitsfadens wird zunächst eine transparente Trägerfolie 20 bereitgestellt, die einander gegenüberliegende Hauptflächen 22 und 24 aufweist.To produce a security thread according to the invention, first a
In einem weiteren Verfahrensschritt wird auf die zweite Hauptfläche 24 der Trägerfolie eine Maske 28 aufgedruckt, die Öffnungen 30 in Gestalt der gewünschten Negativschrift aufweist. Im Ausführungsbeispiel ist die Maske 28 durch eine dünne Deckweißschicht gebildet.In a further method step, a
Auf eine erste Hauptfläche 22 der Trägerfolie wird dann eine vollflächige opake Deckschicht 26 aufgebracht. Im Ausführungsbeispiel ist als Deckschicht 26 eine 30 nm dicke Aluminiumschicht auf die Trägerfolie 20 aufgedampft.
Bei der Deckschicht 26 kann es sich insbesondere um die Metallisierungsschicht einer in die Trägerfolie nachfolgend eingeprägten diffraktiven Beugungsstruktur, wie etwa einem Hologramm, handeln. Die Deckschicht 26 kann in anderen Ausführungsbeispielen auch durch eine komplexere Schichtenfolge gebildet sein, beispielsweise durch ein Dünnschichtelement mit Farbkippeffekt, das eine metallische Reflexionsschicht, eine dielektrische Abstandsschicht und eine semitransparente Absorberschicht umfasst. Auch solche vergleichsweise dicken Deckschichten können durch das nachfolgend beschriebene Vorgehen lokal vollständig abgetragen und so mit einer kontrastreichen Negativinformation versehen werden.The
Anschließend wird die Trägerfolie 20, wie in
Wird der so hergestellte Sicherheitsfaden im Durchlicht betrachtet, so tritt die eingebrachte Information als Negativschrift 34 hell vor dem dunklen metallischen Hintergrund der Deckschicht 26 hervor. Es versteht sich, dass auf die beschriebene Weise auch andere Zeichen, Muster oder Codierungen in die Deckschicht eingebracht werden können.If the security thread produced in this way is viewed in transmitted light, the introduced information appears as negative writing 34 in light of the dark metallic background of the
Die Erzeugung der Negativinformation durch Maskentechnik und Laserabtragung bietet zwei wesentliche Vorteile: Zum einen kann für den Druck der Maske eine Farbe mit feinen Pigmenten verwendet werden, so dass beim Einsatz von Laserstrahlung im nahen Infrarot Linienbreiten bis herab zu 5 µm erreicht werden können. Mit kürzerwelliger Laserstrahlung kann die Auflösung unter Umständen sogar noch weiter gesteigert werden. Zum anderen kann die Demetallisierung mit dem Laser bei geeigneter Wahl der Strahlparameter und Strahlführung sehr schnell erfolgen, so dass ein hoher Durchsatz erreicht wird.The generation of negative information by masking and laser ablation offers two major advantages: Firstly, a color with fine pigments can be used for the printing of the mask, so that when using laser radiation in the near infrared line widths down to 5 microns can be achieved. With shorter wavelength laser radiation, the resolution may even be increased even further. On the other hand, the demetalization with the laser with a suitable choice of Beam parameters and beam guidance done very quickly, so that a high throughput is achieved.
Das erfindungsgemäße Verfahren kann mit Vorteil auch mit herkömmlichen Demetallisierungsverfahren kombiniert werden, wie nachfolgend anhand der
Zunächst zeigt die
In der in
Die strukturierte Reflektorschicht 72 wirkt als Maske für die nachfolgend durchgeführte Laserdemetallisierung, wobei die
Die dünne Chromschicht 68 kann dabei bereits mit einer so geringen Bestrahlungsenergie entfernt werden, dass die Reflektorschicht 72 im Wesentlichen unversehrt bleibt, so dass durch die Laserung ein strukturiertes Dünnschichtelement mit Aussparungen 74 in der Reflektorschicht 72 und deckungsgleichen unbeschichteten Bereichen 82 in der Absorberschicht 68 entsteht. Die dielektrische Abstandsschicht 70 ist im Ausführungsbeispiel auch nach Laserbeaufschlagung noch vorhanden, was den visuellen Eindruck der Negativinformation aber nicht beeinträchtigt, da die Abstandsschicht 70 transparent ist.The
Die geschilderte zweistufige Vorgehensweise bietet den Vorteil, dass die Abtragung der dünnen Absorberschicht eine wesentlich geringere Laserenergie erfordert als die Abtragung des gesamten Dünnschichtelements. Bei geeigneter Einstellung der Laserenergie wird die strukturierte Reflektorschicht selbst nicht abgetragen und kann daher als Maske dienen, so dass auf das Aufbringen einer separaten Maske verzichtet werden kann. Für die Strukturierung der Reflektorschicht können bestehende Einrichtungen und Prozessschritte für ein Waschverfahren oder einen Ätzschritt weiter genutzt werden.The described two-stage approach has the advantage that the removal of the thin absorber layer requires a significantly lower laser energy than the removal of the entire thin-film element. With a suitable adjustment of the laser energy, the structured reflector layer itself is not removed and can therefore serve as a mask, so that it is possible to dispense with the application of a separate mask. For the structuring of the reflector layer, existing devices and process steps for a washing process or an etching step can be used further.
Der Schichtaufbau des Dünnschichtelements 66 kann auch in umgekehrter Reihenfolge auf der Trägerfolie 62 aufgebracht sein, wie in
Eine Laserbeaufschlagung 80 von der Rückseite der Trägerfolie 62 her bietet sich auch bei anderen Gestaltungen an. Beispielsweise kann, wie anhand der
Derartige Farbwirkungen können auch bei Hologrammfolien vorteilhaft eingesetzt werden. Beispielsweise zeigt die
Statt einer separaten Farbschicht 92 kann auch ein farbiger Hologramm-Prägelack 94 verwendet werden, wobei die Transparenz durch eine Zerstörung der im Lack enthaltenen Farbpigmente durch die Laserstrahlung erreicht wird.Instead of a
Die Gestaltung der
Auch die Gestaltungen der
Die Folienbahn 40 weist in der Regel mehrere nebeneinander liegende Nutzen auf, von denen in
Die Infrarotstrahlung 44 eines Diodenlasers 46 wird über eine Optikeinrichtung 48 umgelenkt und in Form eines Laserflecks 50 in die Ebene der laufenden Folienbahn 40 geworfen. Die Maskenöffnungen 30 der Maske 28 sind in
Bei dem Ausführungsbeispiel der
Wird eine ausreichend starke Laserquelle 46 eingesetzt, kann auf ein Abscannen der Breite der Folienbahn 40 auch verzichtet werden, wie in der Darstellung der
Im Ausführungsbeispiel der
Mit den genannten Parametern ergibt sich für jedes beaufschlagte Flächenelement noch eine Energiedichte von 130 kJ/m2, die ausreichend ist, um eine 30 nm dicke Aluminiumschicht 26 im Bereich der Maskenöffnungen 30 zu demetallisieren.With the mentioned parameters, an energy density of 130 kJ / m 2 , which is sufficient for demetallizing a 30 nm
Wird das erfindungsgemäße Verfahren in der oben beschriebenen Weise beispielsweise mit einem Waschverfahren oder einem Ätzschritt kombiniert, so genügen wesentlich geringer Energiedichten zur Abtragung. Beispielsweise können in Dünnschichtelemente mit Farbkippeffekt dann mit Energiedichten unterhalb von 2,5 kJ/m2 Negativinformationen gewünschter Form eingebracht werden.If the method according to the invention is combined in the manner described above, for example with a washing method or an etching step, then substantially lower energy densities are sufficient for ablation. For example, in thin-film elements with a color-shift effect, it is then possible to introduce negative information of the desired shape at energy densities below 2.5 kJ / m 2 .
Claims (15)
- A method for manufacturing a security element, for security papers, value documents and the like, that includes a substrate foil having a cover layer that comprises, in the form of patterns, characters or codes, coating-free regions that are perceptible especially in transmitted light, the security element including a thin-film element that has a color-shift effect and that comprises a reflection layer, an absorber layer and a dielectric spacing layer arranged between the reflection layer and the absorber layer, and the absorber layer assumes the role of the cover layer, and the method comprising the following method steps:- determining a laser wavelength for introducing the coating-free regions;- providing a substrate foil having opposing first and second main surfaces;- applying to a first main surface of the substrate foil a cover layer that absorbs the determined wavelength;- applying to the first main surface of the substrate foil a mask that defines the shape of the desired coating-free regions; and- impinging on the masked main surface of the substrate foil with laser radiation of the determined wavelength to locally ablate the absorbent cover layer of the first main surface; the mask not being removed after the laser impingement and forming part of the security element, and the mask being formed by a metal layer, and the absorber layer of the thin-film element being applied as the cover layer, and the reflection layer of the thin-film element being applied as the mask.
- A method for manufacturing a security element, for security papers, value documents and the like, that includes a substrate foil having a cover layer that comprises, in the form of patterns, characters or codes, coating-free regions that are perceptible especially in transmitted light, the security element including a thin-film element that has a color-shift effect and that comprises a reflection layer, an absorber layer and a dielectric spacing layer arranged between the reflection layer and the absorber layer, and the absorber layer assumes the role of the cover layer, and the method comprising the following method steps:- determining a laser wavelength for introducing the coating-free regions;- providing a substrate foil that is transparent for the determined laser wavelength and that has opposing first and second main surfaces;- applying to a first main surface of the substrate foil a mask that defines the shape of the desired coating-free regions;- applying to the mask, directly or via intermediate layers, a cover layer that absorbs the determined wavelength; and- impinging on the second main surface of the substrate foil with laser radiation of the determined wavelength to locally ablate the absorbent cover layer of the first main surface; the mask not being removed after the laser impingement and forming part of the security element, and the mask being formed by a metal layer, and the absorber layer of the thin-film element being applied as the cover layer, and the reflection layer of the thin-film element being applied as the mask.
- The method according to at least one of claims 1 or 2, characterized in that the mask is applied directly after a step of embossing a diffraction pattern in the substrate foil.
- The method according to claim 3, characterized in that the mask is positioned toward the diffraction pattern such that the piece of information formed by the openings in the mask is in register with a piece of information formed by the diffraction pattern.
- The method according to at least one of claims 1 to 4, characterized in that, as the mask, a negative mask is applied whose regions that are transparent for the laser radiation of the determined wavelength define the shape of the desired coating-free regions.
- The method according to claim 5, characterized in that the negative mask comprises openings in the shape of the desired coating-free regions.
- The method according to one of claims 1 to 6, characterized in that the substrate foil is impinged on extensively with the laser radiation to cover a plurality of mask openings or transparent regions of the mask simultaneously.
- The method according to at least one of claims 1 to 7, characterized in that, with a laser source, a laser spot is produced in the plane of the substrate foil, and the substrate foil is guided past the laser spot along a running direction.
- The method according to claim 8, characterized in that the laser spot is moved back and forth along the running substrate foil width direction that extends perpendicular to the running direction.
- The method according to claim 8, characterized in that the laser spot is produced having such a dimension in the plane of the substrate foil that, without beam deflection, it covers substantially the entire width, extending perpendicular to the running direction, of at least one up of the substrate foil.
- The method according to claim 10, characterized in that the substrate foil is guided past the laser spot at a web speed of about 50 m/min or more, preferably of about 100 m/min or more.
- The method according to at least one of claims 1 to 11, characterized in that, for laser impingement, one or more lasers in the visible or infrared spectral range, especially Nd:YAG lasers or diode lasers, are used.
- A security element for security papers, value documents and the like, having a substrate foil having a cover layer that comprises, in the form of patterns, characters or codes, coating-free regions that are perceptible especially in transmitted light, the security element including a thin-film element that has a color-shift effect and that comprises a reflection layer, an absorber layer and a dielectric spacing layer arranged between the reflection layer and the absorber layer, and the absorber layer assumes the role of the cover layer, and is obtainable through the method according to one of claims 1 to 12.
- The security element according to claim 13, characterized in that the security element is a security thread or a wide security band.
- A value document, especially a banknote, that is furnished with a security element according to one of claims 13 or 14.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102005034671A DE102005034671A1 (en) | 2005-07-25 | 2005-07-25 | Security element and method for its production |
Publications (3)
Publication Number | Publication Date |
---|---|
EP1747905A2 EP1747905A2 (en) | 2007-01-31 |
EP1747905A3 EP1747905A3 (en) | 2014-07-09 |
EP1747905B1 true EP1747905B1 (en) | 2016-05-04 |
Family
ID=37036990
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP06014552.1A Not-in-force EP1747905B1 (en) | 2005-07-25 | 2006-07-13 | Security feature and method for producing it |
Country Status (2)
Country | Link |
---|---|
EP (1) | EP1747905B1 (en) |
DE (1) | DE102005034671A1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110774795A (en) * | 2019-10-12 | 2020-02-11 | 中国人民银行印制科学技术研究所 | Security element and method for producing a security element |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102006034854A1 (en) * | 2006-07-25 | 2008-01-31 | Ovd Kinegram Ag | A method for generating a laser mark in a security document and such a security document |
DE102008008685A1 (en) | 2008-02-12 | 2009-08-13 | Giesecke & Devrient Gmbh | Security element and method for its production |
DE102008013073B4 (en) | 2008-03-06 | 2011-02-03 | Leonhard Kurz Stiftung & Co. Kg | Process for producing a film element and film element |
DE102012103758A1 (en) * | 2012-04-27 | 2013-10-31 | Schreiner Group Gmbh & Co. Kg | Tamper-proof foil |
DE102013007484A1 (en) * | 2013-04-29 | 2014-10-30 | Giesecke & Devrient Gmbh | Optically variable security element |
DE102013106827A1 (en) * | 2013-06-28 | 2014-12-31 | Leonhard Kurz Stiftung & Co. Kg | Method for producing a multilayer body and multilayer body |
DE102013113283A1 (en) | 2013-11-29 | 2015-06-03 | Leonhard Kurz Stiftung & Co. Kg | Multilayer body and method for its production |
RU2677967C1 (en) | 2015-05-04 | 2019-01-22 | Федригони Спа | Bilateral protective element |
DE102016003181A1 (en) * | 2016-03-15 | 2017-09-21 | Giesecke+Devrient Mobile Security Gmbh | Card-shaped data carrier |
DE102017004784A1 (en) * | 2017-05-18 | 2018-11-22 | Giesecke+Devrient Currency Technology Gmbh | Method for producing a security element with a metallized relief area and associated security element |
GB2566706B (en) * | 2017-09-21 | 2020-08-26 | De La Rue Int Ltd | A method of manufacturing a security sheet |
DE102017010744A1 (en) * | 2017-11-21 | 2019-05-23 | Giesecke+Devrient Currency Technology Gmbh | Method for producing a security element with an opening in a metallic layer produced by laser radiation |
DE102018004054A1 (en) * | 2018-05-18 | 2019-11-21 | Giesecke+Devrient Currency Technology Gmbh | Manufacturing method for a security element |
EP3881943A1 (en) * | 2020-03-20 | 2021-09-22 | Karl Wörwag Lack- und Farbenfabrik GmbH & Co. KG | Transfer coating film for coating a workpiece |
US20230333293A1 (en) * | 2022-04-15 | 2023-10-19 | Precision Converting Technologies, LLC | Optical security feature |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA1228225A (en) * | 1984-11-09 | 1987-10-20 | National Research Council Of Canada | Method of manufacturing an optical interference authenticating device |
DE10356146A1 (en) * | 2003-12-02 | 2005-06-30 | Giesecke & Devrient Gmbh | Data carrier and method for its production |
-
2005
- 2005-07-25 DE DE102005034671A patent/DE102005034671A1/en not_active Withdrawn
-
2006
- 2006-07-13 EP EP06014552.1A patent/EP1747905B1/en not_active Not-in-force
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110774795A (en) * | 2019-10-12 | 2020-02-11 | 中国人民银行印制科学技术研究所 | Security element and method for producing a security element |
CN110774795B (en) * | 2019-10-12 | 2021-06-08 | 中钞印制技术研究院有限公司 | Security element and method for producing a security element |
Also Published As
Publication number | Publication date |
---|---|
EP1747905A2 (en) | 2007-01-31 |
EP1747905A3 (en) | 2014-07-09 |
DE102005034671A1 (en) | 2007-02-01 |
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