EP1692923A2 - Undulator and method for operation thereof - Google Patents
Undulator and method for operation thereofInfo
- Publication number
- EP1692923A2 EP1692923A2 EP04820401A EP04820401A EP1692923A2 EP 1692923 A2 EP1692923 A2 EP 1692923A2 EP 04820401 A EP04820401 A EP 04820401A EP 04820401 A EP04820401 A EP 04820401A EP 1692923 A2 EP1692923 A2 EP 1692923A2
- Authority
- EP
- European Patent Office
- Prior art keywords
- undulator
- partial
- field
- undulators
- current
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims description 9
- 230000010287 polarization Effects 0.000 claims abstract description 15
- 230000005469 synchrotron radiation Effects 0.000 claims abstract description 13
- 239000000463 material Substances 0.000 claims abstract description 11
- 239000002245 particle Substances 0.000 claims abstract description 8
- 239000004020 conductor Substances 0.000 abstract description 11
- 230000005855 radiation Effects 0.000 description 6
- 238000010894 electron beam technology Methods 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 239000002887 superconductor Substances 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- 238000010276 construction Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000005670 electromagnetic radiation Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
- H05H7/04—Magnet systems, e.g. undulators, wigglers; Energisation thereof
Definitions
- the invention relates to undulators which serve as a source for electromagnetic radiation - hereinafter also referred to as light - which is generated from a particle stream (for example from electrons) which passes through the undulator, and to a method for operating an undulator.
- Undulators are used in particular for the generation of X-rays in synchrotron radiation sources.
- the first solution leads to complex mechanical constructions in order to allow the magnets to move under the strong forces that occur there.
- the Berlin electron synchrotron BESSY uses permanent magnet undulators with a mechanically changeable polarization direction.
- a variant of this technique is disclosed in JP 103 02 999 A.
- the second solution is only of limited use in normal operation, e.g. B. at low radiation energies, and therefore of no practical importance.
- a superconducting undulator is to be specified which allows the setting and changing of the direction of polarization of the synchrotron radiation without mechanical movement. This should, for example, be able to switch the direction of polarization of the synchrotron radiation from linear to circular or to change the helicity direction, the helicity describing the direction of rotation of the electric field.
- the idea on which the invention is based is to switch the direction of polarization of the emitted synchrotron radiation by designing the conductor arrangement of a superconducting undulator such that the direction of polarization is changed by changing the Current direction in the superconducting conductor arrangement without mechanical
- Movements can be set or changed. With these precautions, the direction of polarization of the emitted radiation can be switched from linear to cyclic or the helicity changed.
- an undulator according to the invention The basic structure of an undulator according to the invention is explained with reference to FIG. 1.
- the operation of an undulator according to the invention with a variable polarization direction is based on the attachment of two different conductor arrangements (windings) made of superconducting material, which can be supplied with current independently of one another.
- An undulator according to the invention accordingly consists of two superconducting partial undulators, namely a) a first partial undulator, through whose superconducting material with a high current carrying capacity the current Ii flows and which is also referred to as an inner undulator in relation to its distance from the electron beam E, and b) from a second partial undulator, through the superconducting * material of high current carrying capacity, the current I 2 flows and which is ⁇ larger than the first partial undulator from the electron beam E and is therefore also referred to as an outer undulator, where allow the two currents Ii and I 2 to be set independently of one another.
- the second partial undulator has a conductor arrangement essentially in the x direction and, according to the prior art, generates an undulator field which is essentially oriented in the z direction.
- a particle stream (electron beam) that would pass through this undulator in the y direction would produce linearly polarized light.
- the conductor arrangement of the first partial undulator is designed in such a way that its conductor has an angle in the range between 15 ° and 75 °, preferably between 30 ° and 60 °, particularly preferably approximately 30 °, approximately 45 ° or approximately 60 °, both to the conductors of the second partial undulator, which are arranged in the x direction, and to the direction of the electron beam, which is arranged in the y direction.
- an undulator field is generated in the first partial undulator which, like in the second partial undulator, has a component in the z direction, but also a component other than zero in the x direction.
- the radiation generated with it is circularly polarized and has a certain helicity.
- a superconducting undulator according to the invention is operated as follows: First, a first current with a value I 1 is switched on, which flows through the superconductor of the first (inner) partial undulator, whereby circularly polarized light of a certain direction is generated. In general, however, this direction does not match the desired helicity for the circular radiation. In order to achieve a match, a second current with a value I 2 is switched on, which flows through the superconductor of the second (outer) partial undulator, the value I 2 being selected such that it partially compensates for the undulator field in the z direction , so that one finally obtains the desired helicity of the circular radiation.
- the present invention therefore allows the helicity of the emitted synchrotron radiation to be set to any desired value without the need for mechanical movements. This means that light can be generated with both directions of rotation, elliptically polarized light and linearly polarized light, while at the same time significantly simplifying the effort for undulators with a variable polarization direction.
- FIG. 1 basic arrangement of an undulator according to the invention
- FIG. 2 sections through an undulator according to the invention.
- planar undulator 3 which generates an undulator field in the z direction
- domestic undulator 4 which generates an undulator field, which has components both in the z direction and in the x direction.
- the domestic undulator 4 takes an angle of 45 ° with respect to the planar undulator 3.
- the undulator itself consists of an iron body 1, which is surrounded with magnetically inactive material 2, into which the superconducting windings of the planar partial undulator 3 and the heating partial undulator 4 are introduced.
- B 2 and B x denote the amounts of the ignitor fields in the z and x directions.
- the period length is 50 mm.
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Particle Accelerators (AREA)
- Transition And Organic Metals Composition Catalysts For Addition Polymerization (AREA)
- Organic Insulating Materials (AREA)
Abstract
Description
Claims
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10358225A DE10358225B3 (en) | 2003-12-12 | 2003-12-12 | Undulator and method for its operation |
PCT/EP2004/013466 WO2005060322A2 (en) | 2003-12-12 | 2004-11-27 | Undulator and method for operation thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1692923A2 true EP1692923A2 (en) | 2006-08-23 |
EP1692923B1 EP1692923B1 (en) | 2007-04-25 |
Family
ID=34625667
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP04820401A Active EP1692923B1 (en) | 2003-12-12 | 2004-11-27 | Undulator and method for operation thereof |
Country Status (7)
Country | Link |
---|---|
US (1) | US7129807B2 (en) |
EP (1) | EP1692923B1 (en) |
JP (1) | JP4445973B2 (en) |
AT (1) | ATE360976T1 (en) |
DE (2) | DE10358225B3 (en) |
DK (1) | DK1692923T3 (en) |
WO (1) | WO2005060322A2 (en) |
Families Citing this family (34)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102006039655A1 (en) | 2006-08-24 | 2008-03-20 | Carl Zeiss Smt Ag | Illumination system for a microlithography projection exposure apparatus, projection exposure apparatus with such an illumination system, method for producing a microstructured component with such a projection exposure apparatus and microstructured component produced by this method |
DE102006056052B4 (en) | 2006-11-28 | 2009-04-16 | Forschungszentrum Karlsruhe Gmbh | Planar-helical undulator |
DE102007010414A1 (en) | 2007-03-01 | 2008-09-04 | Babcock Noell Gmbh | Wound body for electromagnetic superconducting undulators and wigglers for producing X-ray beams in synchronous beam sources comprises metal sheets held together by connecting elements |
DE202007019359U1 (en) | 2007-03-01 | 2012-03-08 | Babcock Noell Gmbh | Winding body for electromagnetic undulators |
DE102008024073A1 (en) * | 2008-05-17 | 2009-12-17 | Forschungszentrum Karlsruhe Gmbh | Device for reducing the phase error of a superconducting undulator |
EP2342953A4 (en) * | 2008-09-15 | 2014-09-17 | Univ Singapore | Single-coil superconducting miniundulator |
DE102008053162B3 (en) * | 2008-10-24 | 2010-07-29 | Karlsruher Institut für Technologie | Undulator for generating synchrotron radiation |
EP2742569B1 (en) * | 2011-08-09 | 2019-04-10 | Cornell University | Compact undulator system |
DE102012218076A1 (en) | 2012-10-04 | 2014-04-10 | Carl Zeiss Smt Gmbh | Illumination optics for extreme UV projection lithography, is designed such that any pairs of illumination light sub-bundles which are guided by different channels hit illumination field point during operation of optics |
CN104246617B (en) | 2012-03-09 | 2018-09-25 | 卡尔蔡司Smt有限责任公司 | The illumination optics unit of EUV projection lithography and optical system comprising the illumination optics unit |
DE102012214063A1 (en) * | 2012-08-08 | 2014-02-13 | Carl Zeiss Smt Gmbh | Illumination system for a projection exposure apparatus for EUV projection lithography |
DE102012219936A1 (en) * | 2012-10-31 | 2014-04-30 | Carl Zeiss Smt Gmbh | EUV light source for generating a useful output beam for a projection exposure apparatus |
DE102013202590A1 (en) | 2013-02-19 | 2014-09-04 | Carl Zeiss Smt Gmbh | EUV light source for generating a useful output beam for a projection exposure apparatus |
DE102013203294A1 (en) | 2013-02-27 | 2014-08-28 | Carl Zeiss Smt Gmbh | Optical assembly for polarization rotation |
EP3011645B1 (en) | 2013-06-18 | 2019-03-13 | ASML Netherlands B.V. | Lithographic method and system |
DE102013212363A1 (en) | 2013-06-27 | 2014-07-31 | Carl Zeiss Smt Gmbh | Facet mirror for illumination optics of optical system of lighting system in projection exposure system for EUV projection lithography at lighting field, has facet main assembly plane arranged in facet mirror surfaces of reflecting facets |
CN105745579B (en) * | 2013-09-25 | 2019-02-22 | Asml荷兰有限公司 | Beam transmission device and method |
DE102013223808A1 (en) | 2013-11-21 | 2014-12-11 | Carl Zeiss Smt Gmbh | Optical mirror device for reflecting a bundle of EUV light |
DE102013223935A1 (en) | 2013-11-22 | 2015-05-28 | Carl Zeiss Smt Gmbh | Illumination system for EUV exposure lithography |
DE102014205579A1 (en) | 2014-03-26 | 2015-10-01 | Carl Zeiss Smt Gmbh | EUV light source for a lighting device of a microlithographic projection exposure apparatus |
DE102014222884A1 (en) | 2014-11-10 | 2016-05-25 | Carl Zeiss Smt Gmbh | Illuminating device for a projection exposure system |
DE102014215088A1 (en) | 2014-07-31 | 2016-02-04 | Carl Zeiss Smt Gmbh | Illuminating device for a projection exposure system |
DE102014221173A1 (en) | 2014-10-17 | 2016-04-21 | Carl Zeiss Smt Gmbh | The radiation source module |
DE102014221175A1 (en) | 2014-10-17 | 2016-04-21 | Carl Zeiss Smt Gmbh | Illumination optics for a projection exposure system |
CN104409129B (en) * | 2014-11-17 | 2017-02-22 | 中国科学院上海微系统与信息技术研究所 | Undulator |
TWI701517B (en) | 2014-12-23 | 2020-08-11 | 德商卡爾蔡司Smt有限公司 | Optical component |
DE102014226918A1 (en) | 2014-12-23 | 2016-06-23 | Carl Zeiss Smt Gmbh | Optical component |
DE102014226917A1 (en) | 2014-12-23 | 2015-12-17 | Carl Zeiss Smt Gmbh | Illumination system for EUV projection lithography |
DE102014226921A1 (en) | 2014-12-23 | 2016-06-23 | Carl Zeiss Smt Gmbh | The radiation source module |
DE102014226920A1 (en) | 2014-12-23 | 2016-06-23 | Carl Zeiss Smt Gmbh | Optical component |
DE102015212878A1 (en) | 2015-07-09 | 2017-01-12 | Carl Zeiss Smt Gmbh | Beam control device |
DE102015215216A1 (en) | 2015-08-10 | 2017-02-16 | Carl Zeiss Smt Gmbh | Optical system |
DE102015220955A1 (en) | 2015-10-27 | 2015-12-17 | Carl Zeiss Smt Gmbh | Optical component |
DE102016217426A1 (en) | 2016-09-13 | 2017-08-24 | Carl Zeiss Smt Gmbh | beamsplitter |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63226899A (en) * | 1987-03-16 | 1988-09-21 | Ishikawajima Harima Heavy Ind Co Ltd | Superconductive wigller |
JPH02306599A (en) * | 1989-05-19 | 1990-12-19 | Sumitomo Electric Ind Ltd | Superconducting helical wiggler |
JP3566830B2 (en) * | 1997-04-25 | 2004-09-15 | 日本原子力研究所 | Flat hybrid undulator with circular, elliptical or variable polarization |
-
2003
- 2003-12-12 DE DE10358225A patent/DE10358225B3/en not_active Expired - Fee Related
-
2004
- 2004-11-27 DK DK04820401T patent/DK1692923T3/en active
- 2004-11-27 WO PCT/EP2004/013466 patent/WO2005060322A2/en active IP Right Grant
- 2004-11-27 DE DE502004003647T patent/DE502004003647D1/en active Active
- 2004-11-27 EP EP04820401A patent/EP1692923B1/en active Active
- 2004-11-27 JP JP2006543422A patent/JP4445973B2/en not_active Expired - Fee Related
- 2004-11-27 AT AT04820401T patent/ATE360976T1/en active
-
2006
- 2006-02-27 US US11/363,427 patent/US7129807B2/en active Active
Non-Patent Citations (1)
Title |
---|
See references of WO2005060322A3 * |
Also Published As
Publication number | Publication date |
---|---|
EP1692923B1 (en) | 2007-04-25 |
US20060158288A1 (en) | 2006-07-20 |
DE502004003647D1 (en) | 2007-06-06 |
WO2005060322A2 (en) | 2005-06-30 |
US7129807B2 (en) | 2006-10-31 |
JP2007514285A (en) | 2007-05-31 |
WO2005060322A3 (en) | 2006-02-23 |
DE10358225B3 (en) | 2005-06-30 |
JP4445973B2 (en) | 2010-04-07 |
ATE360976T1 (en) | 2007-05-15 |
DK1692923T3 (en) | 2007-08-20 |
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