EP1687878A1 - Wärmesenke für einen gepulsten laserdiodenbarren mit optimierter thermischer zeitkonstante - Google Patents
Wärmesenke für einen gepulsten laserdiodenbarren mit optimierter thermischer zeitkonstanteInfo
- Publication number
- EP1687878A1 EP1687878A1 EP04802812A EP04802812A EP1687878A1 EP 1687878 A1 EP1687878 A1 EP 1687878A1 EP 04802812 A EP04802812 A EP 04802812A EP 04802812 A EP04802812 A EP 04802812A EP 1687878 A1 EP1687878 A1 EP 1687878A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- optoelectronic component
- heat sink
- time constant
- thermal time
- component according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 230000005693 optoelectronics Effects 0.000 claims abstract description 62
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 4
- 239000002826 coolant Substances 0.000 claims description 4
- 229910052802 copper Inorganic materials 0.000 claims description 4
- 239000010949 copper Substances 0.000 claims description 4
- 238000000034 method Methods 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 230000003287 optical effect Effects 0.000 claims description 2
- 239000000758 substrate Substances 0.000 claims description 2
- 230000007774 longterm Effects 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 3
- 238000004088 simulation Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 2
- 230000017525 heat dissipation Effects 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 230000006978 adaptation Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/024—Arrangements for thermal management
- H01S5/02407—Active cooling, e.g. the laser temperature is controlled by a thermo-electric cooler or water cooling
- H01S5/02423—Liquid cooling, e.g. a liquid cools a mount of the laser
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/024—Arrangements for thermal management
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/022—Mountings; Housings
- H01S5/0235—Method for mounting laser chips
- H01S5/02355—Fixing laser chips on mounts
- H01S5/0237—Fixing laser chips on mounts by soldering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/062—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
- H01S5/06209—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes in single-section lasers
- H01S5/06216—Pulse modulation or generation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
- H01S5/4025—Array arrangements, e.g. constituted by discrete laser diodes or laser bar
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/85—Packages
- H10H20/858—Means for heat extraction or cooling
- H10H20/8586—Means for heat extraction or cooling comprising fluids, e.g. heat-pipes
Definitions
- a microchannel heat sink for high-power laser diodes is described for example in DE 43 15 580 AI.
- attempts are made in such microchannel heat sinks to keep the heat resistance between the component and the heat sink as low as possible. This takes place, for example, in that the wall thickness of the walls between the microchannels or the outer wall of the heat sink on the side adjoining the optoelectronic component is kept low. In addition to the thermal resistance, this also lowers the heat capacity of the heat sink.
- the time course of the temperature changes of an optoelectronic component during a switching process can often be approximated by the exponential functions
- ⁇ T (t) is the temperature change, i.e. the difference between the current temperature and the initial temperature, at the time t, where ti and t 2 are the associated switching times for a temperature increase or a temperature decrease.
- ⁇ T m is the limit value of the temperature increase against which ⁇ T (t) would converge for t -> oo. This limit value would be reached in the case of a longer operating time in cw mode.
- ⁇ T M depends in particular on the thermal resistance between the optoelectronic component and the heat sink.
- ⁇ is a thermal time constant that also depends on various parameters, such as, for example, the heat capacity, the heat resistance to the heat sink or the heat-radiating surface of the component. The greater ⁇ is, the slower the temperature changes take place.
- the invention has for its object to provide an optoelectronic component with a heat sink, in which the mechanical alternating loads resulting from the pulse operation are reduced. Furthermore, a method for its production is to be specified.
- the thermal time constant ⁇ is reduced adapted to the amplitude of the temperature changes to the pulse duration D.
- the amplitude of the temperature changes is understood to mean the difference between the highest and the lowest temperature of the optoelectronic component during a pulse.
- the thermal time constant is the constant ⁇ in the previously given equations for ⁇ T (t).
- the thermal time constant x of an optoelectronic component is to be understood in the context of the invention as the best approximation for x, which can be determined, for example, by fitting the above-mentioned equations to the actual temperature profile. If in doubt, the time can be used for this, which corresponds to a possibly extrapolated temperature drop to 1 / e times the initial temperature.
- the thermal time constant x preferably applies to the temperature changes of the optoelectronic component during of the pulsed operation x ⁇ 0.5 D. Particularly preferred is x ⁇ D.
- the invention thus achieves that a reduction in the temperature changes with regard to the long-term stability of the component is advantageous even if the reduced changes take place at a somewhat higher temperature level than larger changes on a comparatively small amount lower temperature level.
- the invention is particularly advantageous for radiation-emitting optoelectronic components whose output power is 20 W or more and / or whose pulse frequency is between 0.1 Hz and 10 Hz.
- the radiation-emitting optoelectronic component can be a laser diode bar.
- the heat sink to which the optoelectronic component is connected is preferably an actively cooled heat sink.
- This can have, for example, a microchannel system through which a coolant, for example water, flows.
- the optoelectronic component is connected, for example, to a surface of the heat sink using a solder connection.
- the thermal time constant x is advantageously dimensioned by the wall thickness of a wall of the microchannel system adjacent to the optoelectronic component.
- This wall thickness is advantageously 0.5 mm or more.
- the wall thickness is particularly preferably 1 mm or more, for example between 1 mm and 2 mm inclusive.
- the heat sink can contain copper in particular. It is in Other materials that have good thermal conductivity are also conceivable within the scope of the invention.
- FIG. 1 shows a schematically illustrated cross section through an exemplary embodiment of an optoelectronic component according to the invention
- FIG. 2 shows a simulation of the heating of an optoelectronic component on a time scale from 0 ms to 300 ms for four different embodiments of a heat sink and
- FIG 3 shows a simulation of the heating of an optoelectronic component on a time scale from 0 ms to 1000 ms for four different embodiments of a heat sink.
- the optoelectronic component 1 shown schematically in FIG. 1 is connected to a heat sink 3.
- a heat sink 3 For this purpose, it is fastened, for example, to a surface 8 of the heat sink 3 with a solder connection 2.
- the heat sink 3 is an actively cooled heat sink, which has a microchannel system 6 with an inlet 4 and an outlet 5 for a coolant which flows through the microchannel system 6.
- the coolant is a liquid, especially water, or a gas.
- the radiation-emitting optoelectronic component 1 emits pulses with a pulse duration D.
- the optoelectronic component 1 can be a high-power diode laser or a high-power diode laser bar.
- the invention is particularly advantageous for radiation-emitting opto- electronic components 1, which have an output power of 20 W or more.
- the pulses are emitted at a pulse frequency f which is, for example, between 0.1 Hz and 10 Hz.
- the heat sink 3 serves on the one hand to dissipate the heat generated by the power loss of the optoelectronic component 1.
- the thermal constant x By setting the thermal constant x to a value x> 0.5 D, preferably x> D, the temperature changes in the pulse mode are also reduced.
- the thermal time constant x can be set, for example, by dimensioning the wall thickness 7 of the wall of the heat sink 3 adjoining the optoelectronic component 1. This wall thickness corresponds to the distance between the surface 8 of the heat sink 3 facing the optoelectronic component 1 and the microchannel 6 closest to the surface 8.
- An increase in the wall thickness 7 causes an increase in the thermal time constant x. This is illustrated by the simulation calculations shown in FIGS. 2 and 3 of the time dependency of the temperature increase ⁇ T of an optoelectronic component 1 for different values of wall thickness 7.
- Curve 9 represents the time course of the temperature increase for an actively cooled heat sink with a wall thickness of 0.1 mm represents curve 10 for an actively cooled heat sink 3 in which the wall thickness 7 is 1 mm, curve 11 for an actively cooled heat sink 3 in which the wall thickness 7 is 2 mm and curve 12 for a passive heat sink, which is formed by a copper block without an actively cooled microchannel system.
- the thermal time constants x are approximately 10 ms with a wall thickness of 0.1 mm (curve 9), approximately 20 ms for 1 mm wall thickness (curve 10), about 60 ms for 2 mm wall thickness (curve 11) and about 400 ms for the passive heat sink (curve 12).
- thermo time constant x which is achieved in curves 9 and 10 by increasing the wall thicknesses 7, or in curve 12 by using a passive heat sink, is advantageous if the thermal time constant x is greater than half that Pulse duration D, preferably greater than the pulse duration D, is.
- the temperature increase ⁇ T reaches a maximum of approximately 86% of the limit value ⁇ T ⁇
- approximately 63% of the limit value ⁇ T ⁇ is approximately 66% of the limit value ⁇ T ⁇ .
- the inventive adaptation of the thermal time constant x to the pulse duration D achieves an advantageous reduction in the temperature changes during the pulse duration.
- an increase in the wall thickness 7 or the use of a passive heat sink for an optoelectronic component in cw mode is disadvantageous, since in this case, as is simulated in FIG would set ⁇ T. This is due to the fact that the actively cooled heat sensors ken with an increased wall thickness 7 or the passive heat sink have an increased thermal resistance between the optoelectronic component 1 and the heat sink 3.
- the dimensioning of the wall thickness of the heat sink makes it possible with relatively little effort to vary the thermal time constant and thus provide a heat sink which is optimally adapted to the pulsed operation.
- other alternatives for setting the thermal time constant x as a function of the intended pulse duration are also conceivable.
- the area and / or the thickness of the substrate on which the optoelectronic component is formed could also be varied.
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
Abstract
Description
Claims
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10355602 | 2003-11-28 | ||
| DE102004004097A DE102004004097A1 (de) | 2003-11-28 | 2004-01-27 | Optoelektronisches Bauelement mit einer Wärmesenke |
| PCT/DE2004/002603 WO2005053122A1 (de) | 2003-11-28 | 2004-11-24 | Wärmesenke für einen gepulsten laserdiodenbarren mit optimierter thermischer zeitkonstante |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| EP1687878A1 true EP1687878A1 (de) | 2006-08-09 |
Family
ID=34635115
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP04802812A Withdrawn EP1687878A1 (de) | 2003-11-28 | 2004-11-24 | Wärmesenke für einen gepulsten laserdiodenbarren mit optimierter thermischer zeitkonstante |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20070160097A1 (de) |
| EP (1) | EP1687878A1 (de) |
| JP (1) | JP2007512690A (de) |
| KR (1) | KR20060107823A (de) |
| TW (1) | TWI255087B (de) |
| WO (1) | WO2005053122A1 (de) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8762097B2 (en) * | 2006-08-04 | 2014-06-24 | Apple Inc. | Method and apparatus for a thermal control system based on virtual temperature sensor |
| DE102007017113A1 (de) * | 2007-01-31 | 2008-08-07 | Osram Opto Semiconductors Gmbh | Halbleiterbauelement mit einer optisch aktiven Schicht, Anordnung mit einer Vielzahl von optisch aktiven Schichten und Verfahren zur Herstellung eines Halbleiterbauelements |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2582368B2 (ja) * | 1987-05-08 | 1997-02-19 | 日本電信電話株式会社 | 半導体レ−ザの発振波長安定化装置 |
| DE19506093C2 (de) * | 1995-02-22 | 2000-12-07 | Dilas Diodenlaser Gmbh | Diodenlaserbauelement |
| FR2736764B1 (fr) * | 1995-07-13 | 1997-08-08 | Thomson Csf | Source laser a semiconducteurs |
| US5734672A (en) * | 1996-08-06 | 1998-03-31 | Cutting Edge Optronics, Inc. | Smart laser diode array assembly and operating method using same |
| US6449295B1 (en) * | 1999-11-23 | 2002-09-10 | Litton Systems, Inc. | Method and system for generating laser light |
| DE10229712B4 (de) * | 2002-07-02 | 2009-06-25 | Jenoptik Laserdiode Gmbh | Halbleitermodul |
| US6724792B2 (en) * | 2002-09-12 | 2004-04-20 | The Boeing Company | Laser diode arrays with replaceable laser diode bars and methods of removing and replacing laser diode bars |
-
2004
- 2004-11-24 JP JP2006540159A patent/JP2007512690A/ja not_active Withdrawn
- 2004-11-24 US US10/580,972 patent/US20070160097A1/en not_active Abandoned
- 2004-11-24 KR KR1020067012883A patent/KR20060107823A/ko not_active Withdrawn
- 2004-11-24 WO PCT/DE2004/002603 patent/WO2005053122A1/de not_active Ceased
- 2004-11-24 EP EP04802812A patent/EP1687878A1/de not_active Withdrawn
- 2004-11-26 TW TW093136548A patent/TWI255087B/zh not_active IP Right Cessation
Non-Patent Citations (1)
| Title |
|---|
| See references of WO2005053122A1 * |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2007512690A (ja) | 2007-05-17 |
| TWI255087B (en) | 2006-05-11 |
| WO2005053122A1 (de) | 2005-06-09 |
| KR20060107823A (ko) | 2006-10-16 |
| TW200527786A (en) | 2005-08-16 |
| US20070160097A1 (en) | 2007-07-12 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
| 17P | Request for examination filed |
Effective date: 20060420 |
|
| AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): DE FR GB |
|
| 17Q | First examination report despatched |
Effective date: 20061121 |
|
| DAX | Request for extension of the european patent (deleted) | ||
| RBV | Designated contracting states (corrected) |
Designated state(s): DE FR GB |
|
| RAP1 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: OSRAM OPTO SEMICONDUCTORS GMBH |
|
| RAP1 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: OSRAM OPTO SEMICONDUCTORS GMBH |
|
| STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION HAS BEEN WITHDRAWN |
|
| 18W | Application withdrawn |
Effective date: 20080909 |