EP1565266A1 - Microsysteme fluidique comportant des couches de passivation creant des champs, appliquees sur des microelectrodes - Google Patents

Microsysteme fluidique comportant des couches de passivation creant des champs, appliquees sur des microelectrodes

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Publication number
EP1565266A1
EP1565266A1 EP03776918A EP03776918A EP1565266A1 EP 1565266 A1 EP1565266 A1 EP 1565266A1 EP 03776918 A EP03776918 A EP 03776918A EP 03776918 A EP03776918 A EP 03776918A EP 1565266 A1 EP1565266 A1 EP 1565266A1
Authority
EP
European Patent Office
Prior art keywords
electrode
channel
layer
passivation layer
electrode device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP03776918A
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German (de)
English (en)
Other versions
EP1565266B1 (fr
Inventor
Torsten Müller
Thomas Schnelle
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Revvity Cellular Technologies GmbH
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Evotec OAI AG
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Filing date
Publication date
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Publication of EP1565266A1 publication Critical patent/EP1565266A1/fr
Application granted granted Critical
Publication of EP1565266B1 publication Critical patent/EP1565266B1/fr
Anticipated expiration legal-status Critical
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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L3/00—Containers or dishes for laboratory use, e.g. laboratory glassware; Droppers
    • B01L3/50—Containers for the purpose of retaining a material to be analysed, e.g. test tubes
    • B01L3/502—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures
    • B01L3/5027—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip
    • B01L3/502761—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip specially adapted for handling suspended solids or molecules independently from the bulk fluid flow, e.g. for trapping or sorting beads, for physically stretching molecules
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B03—SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03C—MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03C5/00—Separating dispersed particles from liquids by electrostatic effect
    • B03C5/02—Separators
    • B03C5/022—Non-uniform field separators
    • B03C5/026—Non-uniform field separators using open-gradient differential dielectric separation, i.e. using electrodes of special shapes for non-uniform field creation, e.g. Fluid Integrated Circuit [FIC]
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L2200/00—Solutions for specific problems relating to chemical or physical laboratory apparatus
    • B01L2200/06—Fluid handling related problems
    • B01L2200/0647—Handling flowable solids, e.g. microscopic beads, cells, particles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L2200/00—Solutions for specific problems relating to chemical or physical laboratory apparatus
    • B01L2200/06—Fluid handling related problems
    • B01L2200/0647—Handling flowable solids, e.g. microscopic beads, cells, particles
    • B01L2200/0652—Sorting or classification of particles or molecules
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L2200/00—Solutions for specific problems relating to chemical or physical laboratory apparatus
    • B01L2200/06—Fluid handling related problems
    • B01L2200/0647—Handling flowable solids, e.g. microscopic beads, cells, particles
    • B01L2200/0668—Trapping microscopic beads
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L2300/00—Additional constructional details
    • B01L2300/06—Auxiliary integrated devices, integrated components
    • B01L2300/0627—Sensor or part of a sensor is integrated
    • B01L2300/0645—Electrodes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L2300/00—Additional constructional details
    • B01L2300/16—Surface properties and coatings
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L2400/00—Moving or stopping fluids
    • B01L2400/04—Moving fluids with specific forces or mechanical means
    • B01L2400/0403—Moving fluids with specific forces or mechanical means specific forces
    • B01L2400/0415—Moving fluids with specific forces or mechanical means specific forces electrical forces, e.g. electrokinetic

Definitions

  • the invention relates to a fluidic microsystem with the features according to the preamble of claim 1 and methods for particle manipulation according to the preamble of claim
  • suspended particles e.g. biological cells, cell groups, cell components, macromolecules or synthetic particles in suspension solutions
  • fluidic microsystems with high-frequency electrical fields that are generated with microelectrodes in channels of the microsystem
  • Non-contact particle manipulation e.g. moving, stopping, deflecting, assembling, etc.
  • Non-contact particle manipulation is based on negative dielectrophoresis. It is known to at least partially cover the microelectrodes arranged on channel walls with an electrically insulating thin layer in order to avoid undesired interactions between the microelectrodes and the suspension medium or the particles, such as, for. B. Ohm 'see losses, electrolysis, induction of transmembrane potentials, etc. to minimize (passivation of the microelectrodes).
  • the fluidic microsystems contain spatial electrode arrangements.
  • the microelectrodes are on opposite, z. B. lower and upper channel walls with typical distances in the range of 10 microns to 100 microns arranged (see T. Müller et al. In “Biosensors &Bioelectronics", Vol. 14, 1999, pp 247-256).
  • the microelectrodes must be shaped in a certain way and arranged relative to one another. tode arrangements this is associated with a high adjustment effort of the channel walls (chip levels). The accuracy must be better than 5 ⁇ m with typical dimensions of the microsystem in the cm range. Furthermore, problems arise in the manufacture of the microsystem.
  • the passivation layers on microelectrodes effect field shielding. This can be used, for example, to amplify or weaken field gradients in the channel according to a certain spatial profile (see BT Schnell et al., See above and G. Fuhr et al. In “Sensors and Materials", Vol. 7/2 , 1995, pp. 131-146)
  • the weakening influence of the passivation layer is relatively weak in the suspension liquids with a low electrolyte content (low conductivity).
  • the object of the invention is to provide an improved fluidic microsystem with which the disadvantages of conventional microsystems are countered.
  • the object of the invention is in particular to provide a microsystem with a simplified structure, in particular a simplified electrode arrangement and a simplified contacting, increased functional reliability and an expanded area of application, in particular in the manipulation of biological particles.
  • the object of the invention is also to provide an improved method for field formation in fluidic microsystems, in particular for dielectrophoretic manipulation of particles.
  • a basic idea of the invention is a fluidic microsystem with at least one channel through which a particle suspension can flow, on the channel walls of which are arranged electrode devices for generating electrical alternating voltage fields in the channel, of which a first electrode device for field formation is structured and a second electrode device is flat, unstructured is formed with a passivation layer in such a way that the structuring of the first electrode device has characteristic dimensions smaller than the flat electrode layer of the second electrode device and the passivation layer of the second electrode device is a closed layer that completely covers the electrode surface of the second electrode device.
  • the first electrode device which is, for example, a lower electrode device on the lower chip level or base surface in the operating position, has to be structured for field formation
  • a second electrode device in particular as one Upper electrode device on the upper chip level or top surface of the channel
  • a flat, completely passivated electrode layer can be provided, which only requires a single connection line for connection to a voltage supply or, if the second electrode device is operated potential-free, no connection line.
  • the flat second electrode device can be produced without complicated masking steps during wafer processing.
  • the closed passivation layer on the second electrode means that undesirable electrode processes completely avoided.
  • first and second electrode devices can be provided on different channel walls, which form the top surfaces, bottom surfaces and / or side surfaces.
  • a structured electrode device preferably on the bottom surface
  • a non-structured, flat electrode device preferably on the cover surface
  • the first electrode device can have at least one structured electrode layer with individual partial electrodes, which in their entirety form the structuring or at least one first structural element, as is known per se from conventional microelectrode arrangements.
  • the provision of a large number of sub-electrodes can be advantageous with respect to the separate controllability of each sub-electrode.
  • the separate controllability is important, for example, if the fields in the channel are to be varied depending on certain external influences or measurement results.
  • the partial electrodes preferably comprise individually controllable electrode strips, that is to say microelectrodes with an elongated line shape with a typical width in the range from 50 nm to 100 ⁇ m and a typical length of up to 5 mm.
  • the partial electrodes can carry passivation layers, which may have a defined opening corresponding to the position of the partial electrodes.
  • the first electrode device can also be formed by a flat electrode layer with a closed passivation layer, which, in order to form the structuring of the first electrode device, has layer structures on which the field penetration from the electrode layer into the channel is modified compared to the surrounding areas of the passivation layer is given.
  • the structure of the microsystem can thereby be further simplified, since the mutually opposite electrode devices each comprise a flat, completely passivated electrode layer.
  • the layer structures in the first passivation layer of the first (for example lower) electrode device enable a plurality of functional elements to be strung together in the channel profile. In contrast to the first embodiment mentioned above, these cannot be controlled individually, but they also enable design and adaptation to a specific manipulation task.
  • the second passivation layer of the second (preferably) upper electrode device can in turn have layer structures for field formation in the channel.
  • This structuring of the second passivation layer can be combined with a structured electrode layer (several partial electrodes) according to the first embodiment or with a flat electrode layer with a structured passivation according to the second embodiment.
  • the structuring of the second passivation layer can have advantages with regard to the field formation in the channel.
  • the layer structures on which the field penetration into the channel is modulated are formed, for example, by regions of changed (reduced or increased thickness) in the passivation layer. These lowered or protruding layer structures can advantageously be produced by a simple etching process.
  • the shape of the layer structures can be adjusted by masking. Protruding layer structures are preferred in particular when forming the passivation layer with materials with a relatively high dielectric constant.
  • the layer structures can comprise regions which have at least one different material than the surrounding passivation layer, which is characterized in particular by a changed dielectric constant. Both forms of the layer structures, that is to say the thickness variation and the material variation, can be provided in combination.
  • the passivation layers can be formed from different layer materials in multiple layers.
  • passivation layers are at least partially formed by layer materials whose dielectric properties are reversibly or irreversibly changeable (“smart isolation”).
  • the layer materials are, for example, between different modifications by a laser treatment (eg crystalline ⁇ -> amorphous), which are characterized by different DK values, such changeable materials are known, for example, from writable or rewritable optical memories (CD), or alternatively polymers can be used as changeable layer materials, the conductivity of which is at least once as in a direct laser writing method can be changed by laser irradiation.
  • specific prototypes (for example for rapid prototyping) can be produced in a particularly favorable manner.
  • both electrode devices are completely covered with possibly structured passivation layers, this can be particularly advantageous if an additional electrode device for generating a DC voltage field is provided in the microsystem (or externally on the microsystem) or via an external coupling e.g. DC fields can be applied to the system using a current key.
  • DC voltage fields static fields
  • pulsed DC voltage fields can be generated, which are used, for example, for electroporation or electrofusion applications.
  • the channel with the above-described electrode devices is advantageously equipped with at least one transverse channel in which a third electrode device for generating electrical DC voltage fields is arranged in the transverse channel. Passivation of the first and second electrode devices means that the transport processes in the transverse channel remain undisturbed.
  • passivation layers in comparison to bare electrodes is that the resistance of bare electrodes can change by orders of magnitude even if monolayers are deposited on them. This can happen relatively easily during chip manufacture or during operation and in particular jeopardizes the function of dielectric elements if the layers are not homogeneous. To avoid this problem, additional measures (plasma etching, etc.) had to be implemented be settled. Additional layers on passivation layers, on the other hand, have a much less disruptive effect. This improves the functional reliability of the microsystems.
  • Another object of the invention is a method for dielectrophoretic manipulation of suspended particles in fluidic microsystems by field formation using lateral structures in passivation layers on electrodes.
  • FIGS. 1A-1E schematic views of various exemplary embodiments of microsystems according to the invention (sections),
  • FIG. 2 another schematic illustration of a
  • Electrode device with a structured passivation layer
  • FIGS. 3A-3D Curve representations to illustrate the field effect of the passivation layers provided according to the invention
  • FIGS. 4A, B an exemplary embodiment of the invention with a gradient structure in the passivation layer
  • FIGS. 7A, 7B schematic illustrations of a further exemplary embodiment of a fluidic microsystem according to the invention.
  • FIG. 1A A part of a fluidic microsystem 100 according to the invention is shown in FIG. 1A in a schematic perspective view.
  • the microsystem 100 contains at least one channel 10, which is formed between two plate-shaped chip elements, namely the bottom element or substrate 20 and the cover element 30. Other parts of the microsystem, in particular side walls, spacers and the like. are not shown for reasons of clarity.
  • the substrate 20 forms a first (lower) channel wall with a bottom surface 21 facing the channel 10, on which a first electrode device, possibly with a first passivation layer (see below), is arranged.
  • the cover element 30 forms the second (upper) channel wall with a cover surface 31 facing the channel 10, on which the second electrode device (see below) is arranged accordingly.
  • At least one of the electrode devices is connected to an AC voltage source (not shown) for field generation in the channel 10.
  • the passivation layer is provided on at least one of the electrode devices.
  • the channel 10 is formed by a free space between the chip elements 20, 30. It can be flowed through by a liquid, in particular a particle suspension, and has a height, for example, in the range from 5 ⁇ m to 1 mm and transverse and length dimensions in ⁇ m to cm, which are selected depending on the application. Area.
  • the chip elements 20, 30 typically consist of glass, silicon or an electrically non-conductive polymer.
  • the layer structure comprising electrode devices and passivation layer is shown in the right, enlarged section of FIG. 1A.
  • the first electrode device 40 and a first passivation layer 50 are located on the bottom surface 21 of the substrate 20 (see, for example, FIG. 1C).
  • the layer structure is formed using known planar technology by deposition of the desired materials on the substrate.
  • the electrode device consists of an electrically conductive material, e.g. B. a metal or conductive oxide, e.g. B. Sn doped ln 2 0 3 , (ITO), indium cadmium oxide (In x Cd ⁇ - x O), Cd 2 Sn0, or a conductive polymer (z. B.
  • the thickness of the electrode device is, for example, in the range from 50 n to 2 ⁇ m.
  • the passivation layer 50 is a dielectric insulation layer with a thickness in the range from 0.1 ⁇ m to 10 ⁇ m. It consists, for example, of polyimide or an electrically insulating oxide, e.g. B. silicon oxide, silicon nitride.
  • the first electrode device 40 for field formation is structured in the channel. It is generally equipped with at least one first structural element, which in the example shown comprises four electrode elements or partial electrodes 41, which are formed in a strip shape on the bottom surface 21 in a manner known per se.
  • the partial electrodes 41 can be provided with a passivation layer (not shows), which may have openings on the surfaces of the partial electrodes 41 in a manner known per se.
  • the second electrode device 60 on the cover surface 31 comprises a flat electrode layer 61 (shown in dashed lines) with a closed second electrode surface which is completely covered by a second passivation layer 70.
  • the first structural elements 41 of the first electrode device 40 form a smaller effective electrode area than the second electrode area 61 of the second electrode device 60 (the sum of the individual areas of the first electrode device 40 is smaller than the second electrode area 61).
  • the electrode devices 40, 60 are subjected to electrical voltages, field line profiles are formed which unite on the bottom surface 21 at the partial electrodes 41 with an increased field line density and end on the top surface 31 in the electrode layer 61.
  • the electrical field in the channel is shaped according to the shape of the partial electrodes. For example, a field barrier or a field cage is formed with which the movement of particles in the channel can be influenced or particles can be retained.
  • the electrode layer 61 of the second electrode device 60 can be connected to a control device via a connecting line.
  • advantageously only one connecting line is sufficient to form the counterelectrode, for example for a field cage with a barrier shape corresponding to the partial electrodes 41.
  • the second electrode device can be connected to a control device on the cover surface 31 be arranged. In this so-called “floating” state, the potential of the second electrode device is formed automatically as a function of the surrounding potential conditions. A charge distribution is formed in each of the electrode layers, which compensates for the field occurring in the channel inside the electrode layer. In this case, advantageously contacting can be completely dispensed with.
  • Figure IC illustrates an example of the above. second embodiment of the invention, in which both electrode devices 40, 60 are formed by flat, closed electrode layers 42, 61, which are each covered by closed passivation layers 50, 60.
  • the first (lower) electrode device 40 is equipped with at least one structure element, which in this embodiment is formed by a structure in the first passivation layer 50.
  • the layer structure in the first passivation layer 50 comprises areas 51 with z. B. reduced thickness and / or different materials compared to the rest of the passivation layer.
  • the areas 51 have a geometric shape laterally in the layer plane corresponding to the conventionally formed microelectrodes, that is to say, for example, a strip shape.
  • the second electrode device 60 is formed, as in FIG. 1B, by an electrode layer with a closed, unstructured passivation layer 70.
  • the geometric shape of the passage of the electric field from the electrode layer 42 into the channel is set in a predetermined manner in accordance with the shape of the regions 51.
  • the areas 51 can, for example, form a line-up element with a funnel-shaped field barrier (FIG. IC).
  • FOG. IC funnel-shaped field barrier
  • several structured areas can be realized in one Passivation layer, which covers a closed electrode layer. This has the advantage that a fluidic microsystem, e.g. B. is a sorting system with several functional elements with only two, on opposite channel walls and provided with structured passivation electrodes, where possibly only one electrode is controlled with a high-frequency voltage and the other electrode is left in the floating state.
  • the principle can be modified such that the first electrode device is constructed on the bottom surface 21 with a plurality of partial electrodes 41 as in FIG. 1B, while the second electrode device 60 is covered with a structured passivation layer 70.
  • the structured areas 71 in the passivation layer 70 have, for example, a geometric shape corresponding to the orientation of the opposing partial electrodes 41 to form the field cage.
  • the structuring can be provided on both passivation layers, that is to say both on the bottom surface and on the top surface.
  • FIG. 2 illustrates a section of an electrode device according to the invention with a structured passivation layer in an enlarged, exploded perspective view.
  • the electrode layer 40 with a dielectric insulation layer or passivation layer 50 processed thereon with a structured area 51.
  • the thickness d P of the passivation layer 50 is, for example, 600 nm.
  • the thickness d s is at the structured area 51 one Value of z. B. 200 nm reduced or formed with a changed composition that has different electrical properties, a changed dielectric constant or a changed specific electrical conductivity.
  • the passivation layer 50 can be structured, for example, by photolithography. If the first and / or second passivation layer is at least partially formed by a layer material whose dielectric properties are reversibly or irreversibly variable, the structuring can be carried out, for example, by laser irradiation in accordance with the geometry of the desired structures.
  • FIGS. 3A to 3D illustrate the effect of the passivation layers structured according to the invention on the basis of the results of model calculations.
  • the structure of the two electrode devices on channel walls with the channel through which the suspension flows is modeled by a liquid-filled plate capacitor assuming infinitely large capacitor plates, in which, for example, an electrode is provided with a passivation layer.
  • the field strength inside the channel (or the plate capacitor) depends on the frequency as well as on the dielectric and geometric conditions.
  • the modeling is carried out with the following parameters: dielectric constant of the suspension or solution between the capacitor plates: 80, dielectric constant of the passivation layer: 5 and conductivity of the passivation layer: 10 ⁇ 5 S / m.
  • FIG. 3A illustrates the relative field strength E re ⁇ (field strength with passivation layer / field strength without passivation layer) in the channel depending on the frequency f with different conductivities of the aqueous suspension in the channel.
  • the thickness of the passivation layer is 1% of the distance between the electrode device.
  • FIG. 3A shows that the field coupling into the channel depends on the conductivity of the suspension and the frequency. Surprisingly, it can be seen that the insulating effect of the passivation layer depends on the frequency and increases with increasing electrolyte content.
  • FIG. 3B shows the phase position ⁇ (in rad) of the electric field with the same parameters as in FIG. 3A.
  • the phase angle ⁇ is also strongly frequency-dependent with increasing conductivity.
  • electrical field gradients in the channel with respect to the phase and the amplitude can be realized with homogeneous electrodes. This can be used, for example, to implement an octupole cage, which conventionally required eight electrodes, with only four electrodes, with each electrode being approx. 90 ° phase-shifted signals.
  • FIG. 3C shows the relative field strength E re ⁇ in the channel as a function of the frequency with different thicknesses of the passivation layer, which is given in each case as a percentage relative to the electrode spacing.
  • the modeling is done with a water-filled channel (conductivity: 0.3 S / m). It shows that the field penetration is considerably reduced with increasing thickness of the passivation layer and that this effect is frequency-dependent.
  • an increase in the field strength in the channel can be achieved locally at the structured areas (eg 51 in FIG. IC, E) by reducing the thickness. This effect is depends on the frequency. This means that a functional element in the fluidic microsystem can be activated or ineffective depending on the frequency.
  • the results according to FIG. 3 show a particular advantage of the invention in that the modulation of the field in the channel by the structured passivation is particularly effective with lower conductivities of the suspension in the channel.
  • artificial particles especially plastic, e.g. B. latex beads
  • low conductivities With a salt content of 1 mM, for example, a conductivity of approx. 14 mS / m.
  • Biological cells are often handled in media with a conductivity around 1 S / m.
  • a short-term (up to 10 min) dielectric manipulation with low conductivity up to 1 mS / m is well tolerated.
  • 0.05-0.3 S / m is used for the dielectric manipulation.
  • the structured passivation layers form frequency filters. Certain field components with certain frequencies are allowed to pass through the structured areas (e.g. 51) due to a high field penetration, while other frequency components are attenuated (see FIG. 3). This effect depends on the thickness and / or composition of the structured areas of the passivation layer. If the electrode devices with high-frequency voltage signals with a z. B. rectangular waveform can be driven, which accordingly represents a superposition of a plurality of frequencies, the frequency composition in the channel can be modulated by the passivation layer. Since the dielectrophoretic effect of the electrical fields is particularly frequency-dependent, the function of the respective electrode device can be set via the frequency of the control voltage.
  • the structuring of the passivation layer can be inhomogeneous.
  • an area 51 of reduced thickness in the passivation layer 50 according to FIG. 4A may have a thickness gradient in it.
  • the field penetration is lower at one end 51a with a greater thickness than at the opposite end 51b with the smaller thickness.
  • a filter for different particle types or sizes can be formed solely by a strip-shaped passivation structure according to FIG. 4B.
  • a particle mixture flowing in the direction of the arrow in a subchannel hits the field barrier which is formed on the structured region 51.
  • the small particles which are influenced relatively little by a strong field, can pass the field barrier at area 51 without deflection, while the larger particles are first deflected into an area with reduced field penetration. Accordingly, after the passage of the area 51, the particles of different sizes follow different paths in the channel.
  • FIG. 5 shows with further details an inventive dielectric filter element in which the first electrode insert direction 40 is provided at the upper chip level.
  • the base element 20 and the cover element 30 are formed by glass substrates which are mounted one above the other at a distance from one another and form the upper and lower limits of the channel 10.
  • the distance h is, for example, in the range from 5 ⁇ m to 100 ⁇ m.
  • An electrode strip 41 with a passivation layer 50 is provided on the upper cover surface 31.
  • the electrode strip 41 is connected to a voltage supply (not shown) via a connecting line 43.
  • the passivation layer 50 is opened above the electrode strip 41.
  • An unstructured electrode layer 61 and a structured passivation layer 70 are attached to the base part 20 as the second electrode device.
  • the passivation layer 70 is reduced in thickness and / or the composition is varied.
  • the relative field strength at a frequency of 1 MHz increases from 0.1 to 0.7 in the channel over the structured area 71 (see FIG. 3C ).
  • a field barrier is formed by the field gradient, which, for example, retains large particles and lets small particles through.
  • the acting restraining force scales quadratically with the field strength.
  • a passivation layer (not shown) with a Wear a thickness of 5 ⁇ m.
  • DK dielectric constant
  • the channel 10 is filled with water at 10 mS / m. Sinusoidal signals with a frequency of 10 MHz are applied to the electrodes. Concentrated field line profiles are formed between the opposite electrode devices 40, 60, which form two field barriers for the particles flowing in the channel 10.
  • FIGS. 7A and 7B each illustrate schematic top views of the upper (A) and lower (B) channel wall of a fluidic system 100 according to the invention with the channel 10, which is split into two sub-channels 11, 12, viewed from the channel 10.
  • Two deflectors 81, 82, a hook 83 and a switch (switch) 84 are arranged in the channel 10 as dielectric functional elements 80, as is known per se from fluidic microsystem technology.
  • measuring devices e.g. B. particle detectors may be provided.
  • the lower chip level (FIG. 7B) is constructed in a manner known per se with individually controllable partial electrodes.
  • the partial electrodes z. B. 41 with different geometric designs each have a connecting line 43 which lead to connection points (bond pads) 44.
  • the electrode areas not required for the dielectric manipulation of the particles are completely passivated.
  • the passivation is open above the active electrode areas (see e.g. at 52).
  • the upper chip level (FIG. 7A) has a simpler structure.
  • a single electrode layer (not shown) with a closed electrode surface is provided, on which a passivation layer (not shown) with structured areas 71 is formed.
  • a voltage supply generator
  • the field-forming structures can be arranged offset in the channel direction in order to form a field driving in the channel direction.
  • a lateral electrode distance (in the channel direction) is preferably set that is greater than the channel height.
  • FIG. 8 shows an example of a microsystem 100 according to the invention, in which both the lower and the upper electrode device are completely covered with passivation layers, which may be structured, and additionally a transverse channel 13 branching perpendicularly or obliquely from the channel 10 is provided with a third electrode device 90 for generating a DC voltage field is.
  • a liquid or particle transport can take place between the electrodes 91, 92 by electro-osmosis or electrophoresis under the action of the direct voltage field (see double arrow), which is caused by the passivation of the first and second electrode devices remains undisturbed.
  • electroporation or electrofusion processes can be triggered when entering the transverse channel 13 when using pulsed direct voltages.

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  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

L'invention concerne un microsystème fluidique (100) comportant au moins un canal (10), à travers lequel peut s'écouler une suspension de particules, et des premiers et deuxièmes dispositifs à électrodes (40, 60) qui sont placés sur des premières et deuxièmes parois de canal (21, 31) pour produire des champs électriques présentant une tension alternative dans le canal (10). Le premier dispositif à électrodes (40) servant à produire un champ dans le canal est équipé d'au moins un premier élément de structure (41, 51). Le deuxième dispositif à électrodes (60) présente une couche d'électrode (61) plane présentant une deuxième surface d'électrode fermée qui comporte une deuxième couche de passivation (70). Le premier élément de structure (41, 51) forme une surface d'électrode active plus petite que la deuxième surface d'électrode. La deuxième couche de passivation (70) est une couche fermée qui recouvre complètement la deuxième couche d'électrode (61).
EP03776918.9A 2002-11-29 2003-11-26 Microsysteme fluidique et procede comportant des couches de passivation creant des champs, appliquees sur des microelectrodes Expired - Lifetime EP1565266B1 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE10255858A DE10255858A1 (de) 2002-11-29 2002-11-29 Fluidisches Mikrosystem mit feldformenden Passivierungsschichten auf Mikroelektroden
DE10255858 2002-11-29
PCT/EP2003/013319 WO2004050252A1 (fr) 2002-11-29 2003-11-26 Microsysteme fluidique comportant des couches de passivation creant des champs, appliquees sur des microelectrodes

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EP1565266A1 true EP1565266A1 (fr) 2005-08-24
EP1565266B1 EP1565266B1 (fr) 2013-04-10

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EP03776918.9A Expired - Lifetime EP1565266B1 (fr) 2002-11-29 2003-11-26 Microsysteme fluidique et procede comportant des couches de passivation creant des champs, appliquees sur des microelectrodes

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US (1) US7455758B2 (fr)
EP (1) EP1565266B1 (fr)
DE (1) DE10255858A1 (fr)
WO (1) WO2004050252A1 (fr)

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Also Published As

Publication number Publication date
WO2004050252A1 (fr) 2004-06-17
EP1565266B1 (fr) 2013-04-10
DE10255858A1 (de) 2004-06-17
US7455758B2 (en) 2008-11-25
US20060024802A1 (en) 2006-02-02

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