EP1554117B1 - Precurseur de plaque d'impression lithographique thermosensible - Google Patents

Precurseur de plaque d'impression lithographique thermosensible Download PDF

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Publication number
EP1554117B1
EP1554117B1 EP03808735A EP03808735A EP1554117B1 EP 1554117 B1 EP1554117 B1 EP 1554117B1 EP 03808735 A EP03808735 A EP 03808735A EP 03808735 A EP03808735 A EP 03808735A EP 1554117 B1 EP1554117 B1 EP 1554117B1
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EP
European Patent Office
Prior art keywords
group
aryl
heterocyclic
aralkyl
heteroaryl
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EP03808735A
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German (de)
English (en)
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EP1554117A1 (fr
Inventor
Marc Agfa Graphics N.V. Van Damme
Johan Agfa Graphics N.V. Loccufier
Bert Agfa Graphics N.V. Groenendaal
Huub Agfa Graphics N.V. Van Aert
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Agfa NV
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Agfa Graphics NV
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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/02—Positive working, i.e. the exposed (imaged) areas are removed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/04—Negative working, i.e. the non-exposed (non-imaged) areas are removed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/06—Developable by an alkaline solution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/26—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
    • B41C2210/262—Phenolic condensation polymers, e.g. novolacs, resols
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/145—Infrared

Definitions

  • the present invention relates to a heat-sensitive lithographic printing plate precursor.
  • Lithographic printing presses use a so-called printing master such as a printing plate which is mounted on a cylinder of the printing press.
  • the master carries a lithographic image on its surface and a print is obtained by applying ink to said image and then transferring the ink from the master onto a receiver material, which is typically paper.
  • ink as well as an aqueous fountain solution (also called dampening liquid) are supplied to the lithographic image which consists of oleophilic (or hydrophobic, i.e. ink-accepting, water-repelling) areas as well as hydrophilic (or oleophobic, i.e. water-accepting, ink-repelling) areas.
  • driographic printing the lithographic image consists of ink-accepting and ink-abhesive (ink-repelling) areas and during driographic printing, only ink is supplied to the master.
  • Printing masters are generally obtained by the so-called computer-to-film method wherein various pre-press steps such as typeface selection, scanning, color separation, screening, trapping, layout and imposition are accomplished digitally and each color selection is transferred to graphic arts film using an image-setter.
  • the film can be used as a mask for the exposure of an imaging material called plate precursor and after plate processing, a printing plate is obtained which can be used as a master.
  • a typical printing plate precursor for computer-to-film methods comprise a hydrophilic support and an image-recording layer of a photosensitive polymer layers which include UV-sensitive diazo compounds, dichromate-sensitized hydrophilic colloids and a large variety of synthetic photopolymers. Particularly diazo-sensitized systems are widely used.
  • Upon image-wise exposure typically by means of a film mask in a UV contact frame, the exposed image areas become insoluble and the unexposed areas remain soluble in an aqueous alkaline developer.
  • the plate is then processed with the developer to remove the diazonium salt or diazo resin in the unexposed areas.
  • the exposed areas define the image areas (printing areas) of the printing master, and such printing plate precursors are therefore called 'negative-working'.
  • positive-working materials wherein the exposed areas define the non-printing areas, are known, e.g. plates having a novolac/naphtoquinone-diazide coating which dissolves in the developer only at exposed areas.
  • thermoplastic polymer latex In addition to the above photosensitive materials, also heat-sensitive printing plate precursors have become very popular. Such thermal materials offer the advantage of daylight-stability and are especially used in the so-called computer-to-plate method wherein the plate precursor is directly exposed, i.e. without the use of a film mask. The material is exposed to heat or to infrared light and the generated heat triggers a (physico-)chemical process, such as ablation, polymerization, insolubilisation by cross-linking of a polymer, heat-induced solubilisation, decomposition, or particle coagulation of a thermoplastic polymer latex.
  • a (physico-)chemical process such as ablation, polymerization, insolubilisation by cross-linking of a polymer, heat-induced solubilisation, decomposition, or particle coagulation of a thermoplastic polymer latex.
  • the known heat-sensitive printing plate precursors typically comprise a hydrophilic support and a coating containing an oleophilic polymer, which is alkali-soluble in exposed areas (positive working material) or in non-exposed areas (negative working material) and an IR-absorbing compound.
  • an oleophilic polymer is typically a phenolic resin.
  • WO99/01795 describes a method for preparing a positive working resist pattern on a substrate wherein the coating composition comprises a polymeric substance having functional groups such that the functionalised polymeric substance has the property that it is developer insoluble prior to delivery of radiation and developer soluble thereafter.
  • Suitable functional groups are known to favor hydrogen bonding and may comprise amino, amido, chloro, fluoro, carbonyl, sulphinyl and sulphonyl groups and these groups are bonded to the polymeric substance by an esterification reaction with the phenolic hydroxy group to form a resin eater.
  • EP-A 0 934 822 discloses a heat-sensitive lithographic printing plate precursor comprising a support having a hydrophilic surface and an oleophilic coating thereon, said coating comprising an infrared light absorbing agent and a polymer which comprises a phenolic monomeric unit wherein at least some of the phenolic hydroxyl groups are esterified.
  • EP-A 1 072 432 describes an image forming material which comprises a recording layer which is formed of a composition whose solubility in water or in an alkali aqueous solution is altered by the effects of light or heat.
  • This recording layer comprises a polymer of vinyl phenol or a phenolic polymer, wherein hydroxy groups and alkoxy groups are directly linked to the aromatic hydrocarbon ring.
  • the alkoxy group is composed of 20 or less carbon atoms.
  • US 3,929,488 describes a light sensitive positive-working printing plate comprising an azo-dye which is a novolac resin, bearing diazophenyl chromophoric moiety on the phenolic ring, and which undergoes a color change in the presence of the light decomposition product of a diazonium salt.
  • This color change is caused by a protonation of the azo-dye nitrogens by the acid produced by the diazonium salt on exposure to light.
  • This azo-dye is used as an indicator dye which allows to inspect the light-struck areas on the plate. In comparison with conventional indicator dyes, this azo-dye has an increased solubility in the developer solution and, consequently, is not left behind after development on the plate.
  • the most favored azo-dye as indicator dye in these light-sensitive compositions which can undergo such a strong color change in the visible light range by protonation is an azo-dye, derived of an azoic coupling of diphenylamine-4-diazonium fluoroborate with novolac.
  • the most widely used polymers in these coatings are phenolic resins and it has been found in the above prior art that the printing run length can be improved by modifying such resins by a chemical substitution reaction on the hydroxyl group of the phenolic group. However, this modification reaction decreases the number of free hydroxyl groups on the polymer and thereby reduces the solubility of the coating in an alkaline developer.
  • the modification reaction proposed in the present invention enables to increase the chemical resistance of the coating without substantially reducing the developability of the coating.
  • This chemical resistance can be measured by several tests.
  • a suitable method for quantifying the chemical resistance is described as Test 4 in the examples.
  • a preferred precursor in accordance with the present invention is characterized by a weight loss of the coating lower than 45 %, calculated as described in the mentioned Test 4, more preferably lower than 35 %, and most preferably lower than 20 %.
  • the substituent Q of the polymer comprising a phenolic monomeric unit substituted as described above, is an aromatic group which may comprise at least one heteroatom selected from nitrogen, oxygen or sulfur, preferentially nitrogen or sulfur atom. Said heteroatom can be part of the aromatic ring and/or may be present in a substituent attached to said ring.
  • the substituent Q may have the structure A-(T) n .
  • A represents a mono-cyclic 5- or 6-membered aromatic group or a 5- or 6-membered aromatic ring annelated with another ring system. Annelated means that two ring systems have two vicinal carbon atoms in common.
  • the polymers used in this invention can be obtained via several routes, e.g. by reacting a polymer containing a phenolic monomeric unit with a diazonium salt or by reacting a phenolic monomer with a diazonium salt and subsequently polymerizing or polycondensating this reacted monomer.
  • These pre-modified monomers can preferentially be copolymerized or copolycondensated with other monomers.
  • reaction of a diazonium salt with a phenolic group under alkaline conditions produces a coupling of a diazo-group onto the aromatic ring structure and is schematically represented as shown in the following general scheme: wherein Q represents an aromatic group and wherein R is a hydrogen atom or a substituent such as an alkyl group.
  • the diazonium salts for the purpose of this application can be derived from the diazotisation of a corresponding aromatic amine followed by a diazotising reagent, such as a nitrite salt, in the presence of an acid, such as HCl, H 2 SO 4 or H 3 PO 4 .
  • a diazotising reagent such as a nitrite salt
  • Most of the diazonium salts are relatively stable at low temperature such as about 0°C to about 5°C and they are soluble in water or in a mixture of water and an organic solvent such as acetic acid or 1-methoxy-2-propanol.
  • a solution of the diazonium salt can be used for a further reaction with a solution of a polymer containing phenolic groups.
  • This azo-coupling reaction an aromatic diazo-group is substituted on the aromatic ring structure of the phenolic group.
  • This azoic coupling can take place in the ortho-or para-position of the hydroxyl group, depending on the availability of these position for such a coupling reaction e.g. depending on which position the polycondensation reaction of the phenolic monomeric compounds and formaldehyde has taken place.
  • Examples of aromatic amines which can be diazotised to a diazonium salt, which can further be used in an azo-coupling with a phenolic group are the following compounds: AM-01: AM-02: AM-03: AM-04: AM-05: AM-06: AM-07: AM-08: AM-10: AM-14: AM-15: AM-16 : AM-17: AM-18: AM-19: AM-20: AM-21: AM-22: AM-27: AM-28: AM-29: AM-30: AM-31: AM-32: AM-33: AM-34: AM-35: AM-36:
  • Polymers containing phenolic monomeric units can be a random, an alternating, a block or graft copolymer of different monomers and may be selected from e.g. polymers or copolymers of vinylphenol, novolac resins or resol resins. A novolac resin is preferred.
  • the novolac resin or resol resin may be prepared by polycondensation of at least one member selected from aromatic hydrocarbons such as phenol, o-cresol, p-cresol, m-cresol, 2,5-xylenol, 3,5-xylenol, resorcinol, pyrogallol, bisphenol, bisphenol A, trisphenol, o-ethylphenol, p-etylphenol, propylphenol, n-butylphenol, t-butylphenol, 1-naphtol and 2-naphtol, with at least one aldehyde or ketone selected from aldehydes such as formaldehyde, glyoxal, acetoaldehyde, propionaldehyde, benzaldehyde and furfural and ketones such as acetone, methyl ethyl ketone and methyl isobutyl ketone, in the presence of an acid catalyst.
  • the weight average molecular weight, measured by gel permeation chromatography using universal calibration and polystyrene standards, of the novolac resin is preferably from 500 to 150,000 g/mol, more preferably from 1,500 to 15,000 g/mol.
  • the poly(vinylphenol) resin may also be a polymer of one or more hydroxy-phenyl containing monomers such as hydroxystyrenes or hydroxy-phenyl (meth)acrylates.
  • hydroxystyrenes are o-hydroxystyrene, m-hydroxystyrene, p-hydroxystyrene, 2-(o-hydroxyphenyl)propylene, 2-(m-hydroxyphenyl)propylene and 2-(p-hydroxyphenyl)propylene.
  • Such a hydroxystyrene may have a substituent such as chlorine, bromine, iodine, fluorine or a C 1-4 alkyl group, on its aromatic ring.
  • An example of such hydroxy-phenyl (meth)acrylate is 2-hydroxy-phenyl methacrylate.
  • the poly(vinylphenol) resin may usually be prepared by polymerizing one or more hydroxy-phenyl containing monomer in the presence of a radical initiator or a cationic polymerization initiator.
  • the poly(vinylphenol) resin may also be prepared by copolymerizing one or more of these hydroxy-phenyl containing monomers with other monomeric compounds such as acrylate monomers, methacrylate monomers, acrylamide monomers, methacrylamide monomers, vinyl monomers, aromatic vinyl monomers or diene monomers.
  • the weight average molecular weight, measured by gel permeation chromatography using universal calibration and polystyrene standards, of the poly(vinylphenol) resin is preferably from 1.000 to 200,000 g/mol, more preferably from 1,500 to 50,000 g/mol.
  • polymers containing phenolic monomeric units which can be modified with a diazonium salt are:
  • Dowanol PMA consists of 2-methoxy-1-methyl-ethylacetate.
  • the polymer of the present invention may contain more than one type of an azo-aryl group.
  • each type of azo-aryl groups can be incorporated successively or a mixture of different diazonium salts can be reacted onto the polymer.
  • the preferred amount of each type of azo-aryl group incorporated in the polymer is between 0.5 mol % and 80 mol %, more preferably between 1 mol % and 60 mol %, most preferably 2 mol % and 50 mol %.
  • other polymers such as unmodified phenolic resins, can be added to the coating composition.
  • the polymer of the present invention are preferably added to the coating in a concentration range of 5 % by weight to 98 % by weight of the total coating, more preferably between 10 % by weight to 95 % by weight. If the heat-sensitive coating is composed of more than one layer, the polymer of the present invention is present in at least one of these layers, e.g. in a top-layer. The polymer can also be present in more than one layer of the coating, e.g. in a top-layer and in an intermediate layer.
  • the support has a hydrophilic surface or is provided with a hydrophilic layer.
  • the support may be a sheet-like material such as a plate or it may be a cylindrical element such as a sleeve which can be slid around a print cylinder of a printing press.
  • the support is a metal support such as aluminum or stainless steel.
  • a particularly preferred lithographic support is an electrochemically grained and anodized aluminum support. Graining and anodizing of aluminum lithographic supports is well known.
  • the grained aluminum support used in the material of the present invention is preferably an electrochemically grained support.
  • the acid used for graining can be e.g. nitric acid.
  • the acid used for graining preferably comprises hydrogen chloride.
  • the grained and anodized aluminum support may be post-treated to improve the hydrophilic properties of its surface.
  • the aluminum support may be silicated by treating its surface with a sodium silicate solution at elevated temperature, e.g. 95°C.
  • a phosphate treatment may be applied which involves treating the aluminum oxide surface with a phosphate solution that may further contain an inorganic fluoride.
  • the aluminum oxide surface may be rinsed with an organic acid and/or salt thereof, e.g. carboxylic acids, hydroxycarboxylic acids, sulfonic acids or phosphonic acids, or their salts, e.g.
  • succinates succinates, phosphates, phosphonates, sulfates, and sulfonates.
  • a citric acid or citrate solution is preferred. This treatment may be carried out at room temperature or may be carried out at a slightly elevated temperature of about 30 to 50°C.
  • a further post-treatment involves rinsing the aluminum oxide surface with a bicarbonate solution.
  • the aluminum oxide surface may be treated with polyvinylphosphonic acid, polyvinylmethylphosphonic acid, phosphoric acid esters of polyvinyl alcohol, polyvinylsulfonic acid, polyvinylbenzenesulfonic acid, sulfuric acid esters of polyvinyl alcohol, and acetals of polyvinyl alcohols formed by reaction with a sulfonated aliphatic aldehyde. It is further evident that one or more of these post-treatments may be carried out alone or in combination.
  • the support can also be a flexible support, which is provided with a hydrophilic layer, hereinafter called 'base layer'.
  • the flexible support is e.g. paper, plastic film, thin aluminum or a laminate thereof.
  • Preferred examples of plastic film are polyethylene terephthalate film, polyethylene naphthalate film, cellulose acetate film, polystyrene film, polycarbonate film, etc.
  • the plastic film support may be opaque or transparent.
  • the base layer is preferably a cross-linked hydrophilic layer obtained from a hydrophilic binder cross-linked with a hardening agent such as formaldehyde, glyoxal, polyisocyanate or a hydrolyzed tetra-alkylorthosilicate.
  • the thickness of the hydrophilic base layer may vary in the range of 0.2 to 25 ⁇ m and is preferably 1 to 10 ⁇ m.
  • the hydrophilic binder for use in the base layer is e.g. a hydrophilic (co)polymer such as homopolymers and copolymers of vinyl alcohol, acrylamide, methylol acrylamide, methylol methacrylamide, acrylic acid, methacrylic acid, hydroxyethyl acrylate, hydroxyethyl methacrylate or maleic anhydride/vinylmethylether copolymers.
  • the hydrophilicity of the (co)polymer or (co)polymer mixture used is preferably the same as or higher than the hydrophilicity of polyvinyl acetate hydrolyzed to at least an extent of 60% by weight, preferably 80% by weight.
  • the amount of hardening agent, in particular tetraalkyl orthosilicate, is preferably at least 0.2 parts per part by weight of hydrophilic binder, more preferably between 0.5 and 5 parts by weight, most preferably between 1 parts and 3 parts by weight.
  • the hydrophilic base layer may also contain substances that increase the mechanical strength and the porosity of the layer. For this purpose colloidal silica may be used.
  • the colloidal silica employed may be in the form of any commercially available water dispersion of colloidal silica for example having an average particle size up to 40 nm, e.g. 20 nm.
  • inert particles of larger size than the colloidal silica may be added e.g. silica prepared according to Stöber as described in J. Colloid and Interface Sci., Vol. 26, 1968, pages 62 to 69 or alumina particles or particles having an average diameter of at least 100 nm which are particles of titanium dioxide or other heavy metal oxides.
  • silica prepared according to Stöber as described in J. Colloid and Interface Sci., Vol. 26, 1968, pages 62 to 69 or alumina particles or particles having an average diameter of at least 100 nm which are particles of titanium dioxide or other heavy metal oxides.
  • hydrophilic base layers for use in accordance with the present invention are disclosed in EP-A- 601 240 , GB-P- 1 419 512 , FR-P- 2 300 354 , US-P- 3 971 660 , and US-P- 4 284 705 . It is particularly preferred to use a film support to which an adhesion improving layer, also called support layer, has been provided.
  • Particularly suitable adhesion improving layers for use in accordance with the present invention comprise a hydrophilic binder and colloidal silica as disclosed in EP-A- 619 524 , EP-A- 620 502 and EP-A- 619 525 .
  • the amount of silica in the adhesion improving layer is between 200 mg/m 2 and 750 mg/m 2 .
  • the ratio of silica to hydrophilic binder is preferably more than 1 and the surface area of the colloidal silica is preferably at least 300 m 2 /gram, more preferably at least 500 m 2 / gram.
  • the coating provided on the support is heat-sensitive and can preferably be handled in normal working lighting conditions (daylight, fluorescent light) for several hours.
  • the coating preferably does not contain UV-sensitive compounds which have an absorption maximum in the wavelength range of 200 nm to 400 nm such as diazo compounds, photoacids, photoinitiators, quinone diazides, or sensitizers.
  • the coating neither contains compounds which have an absorption maximum in the blue and green visible light wavelength range between 400 and 600 nm.
  • the printing plate precursor is positive-working, i.e. after exposure and development the exposed areas of the oleophilic layer are removed from the support and define hydrophilic, non-image (non-printing) areas, whereas the unexposed layer is not removed from the support and defines an oleophilic image (printing) area.
  • the printing plate precursor is negative-working, i.e. the image areas correspond to the exposed areas.
  • the coating may comprise one or more distinct layers. Besides the layers discussed hereafter, the coating may further comprise e.g.
  • a suitable negative-working alkaline developing printing plate comprises a phenolic resin and a latent Brönsted acid which produces acid upon heating or IR radiation. These acids catalyze crosslinking of the coating in a post-exposure heating step and thus hardening of the exposed regions. Accordingly, the non-exposed regions can be washed away by a developer to reveal the hydrophilic substrate underneath.
  • the polymer used in the present invention is added to the coating composition and replaces at least part of the phenolic resin.
  • the coating is capable of heat-induced solubilization, i.e. the coating is resistant to the developer and ink-accepting in the non-exposed state and becomes soluble in the developer upon exposure to heat or infrared light to such an extent that the hydrophilic surface of the support is revealed thereby.
  • the coating may contain additional polymeric binders that are soluble in an aqueous alkaline developer.
  • Preferred polymers are phenolic resins, e.g. novolac, resoles, polyvinyl phenols and carboxy-substituted polymers. Typical examples of such polymers are described in DE-A-4007428 , DE-A-4027301 and DE-A-4445820 .
  • the coating also contains one or more dissolution inhibitors.
  • Dissolution inhibitors are compounds which reduce the dissolution rate of the hydrophobic polymer in the aqueous alkaline developer at the non-exposed areas of the coating and wherein this reduction of the dissolution rate is destroyed by the heat generated during the exposure so that the coating readily dissolves in the developer at exposed areas.
  • the dissolution inhibitor exhibits a substantial latitude in dissolution rate between the exposed and non-exposed areas.
  • the dissolution inhibitor has a good dissolution rate latitude when the exposed coating areas have dissolved completely in the developer before the non-exposed areas are attacked by the developer to such an extent that the ink-accepting capability of the coating is affected.
  • the dissolution inhibitor(s) can be added to the layer which comprises the hydrophobic polymer discussed above.
  • the dissolution rate of the non-exposed coating in the developer is preferably reduced by interaction between the hydrophobic polymer and the inhibitor, due to e.g. hydrogen bonding between these compounds.
  • Suitable dissolution inhibitors are preferably organic compounds which comprise at least one aromatic group and a hydrogen bonding site, e.g. a carbonyl group, a sulfonyl group, or a nitrogen atom which may be quaternized and which may be part of a heterocyclic ring or which may be part of an amino substituent of said organic compound.
  • Suitable dissolution inhibitors of this type have been disclosed in e.g. EP-A 825927 and 823327 .
  • Water-repellent polymers represent an another type of suitable dissolution inhibitors.
  • Such polymers seem to increase the developer resistance of the coating by repelling the aqueous developer from the coating.
  • the water-repellent polymers can be added to the layer comprising the hydrophobic polymer and/or can be present in a separate layer provided on top of the layer with the hydrophobic polymer.
  • the water-repellent polymer forms a barrier layer which shields the coating from the developer and the solubility of the barrier layer in the developer or the penetrability of the barrier layer by the developer can be increased by exposure to heat or infrared light, as described in e.g. EP-A 864420 , EP-A 950517 and WO99/21725 .
  • the water-repellent polymers are polymers comprising siloxane and/or perfluoroalkyl units.
  • the coating contains such a water-repellent polymer in an amount between 0.5 and 25 mg/m 2 , preferably between 0.5 and 15 mg/m 2 and most preferably between 0.5 and 10 mg/m 2 .
  • the water-repellent polymer is also ink-repelling, e.g. in the case of polysiloxanes, higher amounts than 25 mg/m 2 can result in poor ink-acceptance of the non-exposed areas.
  • An amount lower than 0.5 mg/m 2 on the other hand may lead to an unsatisfactory development resistance.
  • the polysiloxane may be a linear, cyclic or complex cross-linked polymer or copolymer.
  • the term polysiloxane compound shall include any compound which contains more than one siloxane group -Si(R,R')-O-, wherein R and R' are optionally substituted alkyl or aryl groups.
  • Preferred siloxanes are phenylalkylsiloxanes and dialkylsiloxanes.
  • the number of siloxane groups in the (co)polymer is at least 2, preferably at least 10, more preferably at least 20. It may be less than 100, preferably less than 60.
  • the water-repellent polymer is a block-copolymer or a graft-copolymer of a poly(alkylene oxide) block and a block of a polymer comprising siloxane and/or perfluoroalkyl units.
  • a suitable copolymer comprises about 15 to 25 siloxane units and 50 to 70 alkylene oxide groups.
  • Preferred examples include copolymers comprising phenylmethylsiloxane and/or dimethylsiloxane as well as ethylene oxide and/or propylene oxide, such as Tego Glide 410, Tego Wet 265, Tego Protect 5001 or Silikophen P50/X, all commercially available from Tego Chemie, Essen, Germany.
  • Such a copolymer acts as a surfactant which upon coating, due to its bifunctional structure, automatically positions itself at the interface between the coating and air and thereby forms a separate top layer even when the whole coating is applied from a single coating solution. Simultaneously, such surfactants act as a spreading agent which improves the coating quality.
  • the water-repellent polymer can be applied in a second solution, coated on top of the layer comprising the hydrophobic polymer. In that embodiment, it may be advantageous to use a solvent in the second coating solution that is not capable of dissolving the ingredients present in the first layer so that a highly concentrated water-repellent phase is obtained at the top of the coating.
  • one or more development accelerators are included in the coating, i.e. compounds which act as dissolution promoters because they are capable of increasing the dissolution rate of the non-exposed coating in the developer.
  • Suitable dissolution accelerators are cyclic acid anhydrides, phenols or organic acids.
  • cyclic acid anhydride examples include phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, tetrachlorophthalic anhydride, maleic anhydride, chloromaleic anhydride, alpha -phenylmaleic anhydride, succinic anhydride, and pyromellitic anhydride, as described in U.S. Patent No. 4,115,128 .
  • phenols examples include bisphenol A, p-nitrophenol, p-ethoxyphenol, 2,4,4'-trihydroxybenzophenone, 2,3,4-trihydroxy-benzophenone, 4-hydroxybenzophenone, 4,4',4"-trihydroxy-triphenylmethane, and 4,4',3",4"-tetrahydroxy-3,5,3',5'-tetramethyltriphenyl-methane, and the like.
  • organic acids include sulfonic acids, sulfinic acids, alkylsulfuric acids, phosphonic acids, phosphates, and carboxylic acids, as described in, for example, JP-A Nos. 60-88,942 and 2-96,755 .
  • organic acids include p-toluenesulfonic acid, dodecylbenzenesulfonic acid, p-toluenesulfinic acid, ethylsulfuric acid, phenylphosphonic acid, phenylphosphinic acid, phenyl phosphate, diphenyl phosphate, benzoic acid, isophthalic acid, adipic acid, p-toluic acid, 3,4-dimethoxybenzoic acid, phthalic acid, terephthalic acid, 4-cyclohexene-1,2-dicarboxylic acid, erucic acid, lauric acid, n-undecanoic acid, and ascorbic acid.
  • the amount of the cyclic acid anhydride, phenol, or organic acid contained in the coating is preferably in the range of 0.05 to 20% by weight, relative to the coating as a whole.
  • the polymer which contains a phenolic monomeric unit modified as described in the present invention can be used in conventional photosensitive printing plate precursors wherein at least part of the conventional phenolic polymer is replaced by at least one of the polymers modified as described in the present invention.
  • the material of the present invention is image-wise exposed to infrared light, which is converted into heat by an infrared light absorbing agent, which may be a dye or pigment having an absorption maximum in the infrared wavelength range.
  • the concentration of the sensitizing dye or pigment in the coating is typically between 0.25 and 10.0 wt.%, more preferably between 0.5 and 7.5 wt.% relative to the coating as a whole.
  • Preferred IR-absorbing compounds are dyes such as cyanine or merocyanine dyes or pigments such as carbon black.
  • a suitable compound is the following infrared dye :
  • the coating may further contain an organic dye which absorbs visible light so that a perceptible image is obtained upon imagewise exposure and subsequent development.
  • a dye is often called contrast dye or indicator dye.
  • the dye has a blue color and an absorption maximum in the wavelength range between 600nm and 750 nm.
  • the dye absorbs visible light, it preferably does not sensitize the printing plate precursor, i.e. the coating does not become more soluble in the developer upon exposure to visible light.
  • Suitable examples of such a contrast dye are the quaternized triarylmethane dyes.
  • Another suitable compound is the following dye:
  • the infrared light absorbing compound and the contrast dye may be present in the layer comprising the hydrophobic polymer, and/or in the barrier layer discussed above and/or in an optional other layer.
  • the infrared light absorbing compound is concentrated in or near the barrier layer, e.g. in an intermediate layer between the layer comprising the hydrophobic polymer and the barrier layer.
  • the printing plate precursor of the present invention can be exposed to infrared light with LEDs or a laser.
  • a laser emitting near infrared light having a wavelength in the range from about 750 to about 1500 nm is used, such as a semiconductor laser diode, a Nd:YAG or a Nd:YLF laser.
  • the required laser power depends on the sensitivity of the image-recording layer, the pixel dwell time of the laser beam, which is determined by the spot diameter (typical value of modern plate-setters at 1/e 2 of maximum intensity : 10-25 ⁇ m), the scan speed and the resolution of the exposure apparatus (i.e.
  • ITD plate-setters for thermal plates are typically characterized by a very high scan speed up to 1500 m/s and may require a laser power of several Watts.
  • the Agfa Galileo T is a typical example of a plate-setter using the ITD-technology.
  • XTD plate-setters operate at a lower scan speed typically from 0.1 m/s to 10 m/s and have a typical laser-output-power per beam from 20 mW up to 500 mW.
  • the known plate-setters can be used as an off-press exposure apparatus, which offers the benefit of reduced press down-time.
  • XTD plate-setter configurations can also be used for on-press exposure, offering the benefit of immediate registration in a multi-color press. More technical details of on-press exposure apparatuses are described in e.g. US 5,174,205 and US 5,163,368 .
  • the non-image areas of the coating can be removed by immersion in an aqueous alkaline developer, which may be combined with mechanical rubbing, e.g. by a rotating brush.
  • the developer preferably has a pH above 10, more preferably above 12.
  • the development step may be followed by a rinsing step, a gumming step, a drying step and/or a post-baking step.
  • the printing plate thus obtained can be used for conventional, so-called wet offset printing, in which ink and an aqueous dampening liquid is supplied to the plate.
  • Another suitable printing method uses so-called single-fluid ink without a dampening liquid.
  • Single-fluid ink consists of an ink phase, also called the hydrophobic or oleophilic phase, and a polar phase which replaces the aqueous dampening liquid that is used in conventional wet offset printing.
  • Suitable examples of single-fluid inks have been described in US 4,045,232 ; US 4,981,517 and US 6,140,392 .
  • the single-fluid ink comprises an ink phase and a polyol phase as described in WO 00/32705 .
  • the above prepared diazonium solution was added dropwise to the phenolic polymer solution over a 10 minute period after which stirring was continued for 30 minutes at 0°C and 2 hours at room temperature. The resulting mixture was then added to 1.5 liters ice-water over a 30 minute period while continuously stirring. The polymer precipitated from the aqueous medium and was isolated by filtration. The desired product was finally obtained by washing with water and subsequent drying at 45°C.
  • the above prepared diazonium solution was added dropwise to the phenolic polymer solution over a 20 minute period after which stirring was continued for 30 minutes at 0°C and 2 hours at room temperature. The resulting mixture was then added to 1.5 liters ice-water over a 30 minute period while continuously stirring. The polymer precipitated from the aqueous medium and was isolated by filtration. The desired product was finally obtained by washing with water and subsequent drying at 45°C.
  • polymer MP-06 The preparation of polymer MP-06 was carried out in the same way as that of polymer MP-04 with the exception that 31.1 g AM-03 was used instead of 31.3 g AM-01 and that in the mixture of 137.7 g of POL-01 solution (40 % by weight) and 115 g NaOAc.3H 2 O 1000 ml 1-methoxy-2-propanol was added instead of 200 ml 1-methoxy-2-propanol.
  • the above prepared diazonium solution was added dropwise to the phenolic polymer solution over a 30 minute period after which stirring was continued for 30 minutes at 0°C and 2 hours at room temperature.
  • 50 ml 1-methoxy-2-propanol and 50 ml N,N-dimethylacetamide were added to dissolve the precipitated product.
  • the resulting mixture was then added to 3 liters ice-water over a 30 minute period while continuously stirring.
  • the polymer precipitated from the aqueous medium and was isolated by filtration.
  • the desired product was finally obtained by washing with water and subsequent drying at 45°C.
  • the above prepared diazonium solution was added dropwise to the phenolic polymer solution over a 30 minute period after which stirring was continued for 30 minutes at 0°C and 2 hours at room temperature.
  • the resulting mixture was then added to 3 liters ice-water over a 30 minute period while continuously stirring.
  • the polymer precipitated from the aqueous medium and was isolated by filtration.
  • the desired product was finally obtained by washing with water and subsequent drying at 45°C.
  • polymer MP-09 The preparation of polymer MP-09 was carried out in the same way as that of polymer MP-08 with the exception that 30 g of the phenolic polymer POL-06 dissolved in 125 ml 1-methoxy-2-propanol was used instead of POL-05.
  • the above prepared diazonium solution was added dropwise to the phenolic polymer solution over a 30 minute period after which stirring was continued for 30 minutes at 0°C and 2 hours at room temperature.
  • the resulting mixture was then added to 3 liters ice-water over a 30 minute period while continuously stirring.
  • the polymer precipitated from the aqueous medium and was isolated by filtration.
  • the desired product was finally obtained by washing with water and with a mixture water/methanol (volume ratio: 7/3) and subsequent drying at 45°C.
  • the above prepared diazonium solution was added dropwise to the phenolic polymer solution over a 60 minute period after which stirring was continued for 30 minutes at 0°C and 2 hours at room temperature.
  • the resulting mixture was then added to 3.5 liters ice-water over a 30 minute period while continuously stirring.
  • the desired product was finally obtained by washing with water and subsequent drying at 45°C.
  • polymer MP-12 was carried out in the same way as that of polymer MP-11 with the exception that 48 g of the phenolic polymer POL-09 dissolved in 270 ml N,N-dimethylacetamide was used instead of POL-08.
  • polymer MP-13 The preparation of polymer MP-13 was carried out in the same way as that of polymer MP-11 with the exception that 48 g of the phenolic polymer POL-10 dissolved in 280 ml N,N-dimethylacetamide was used instead of POL-08.
  • polymer MP-14 The preparation of polymer MP-14 was carried out in the same way as that of polymer MP-11 with the exception that 48 g of the phenolic polymer POL-11 dissolved in 235 ml N,N-dimethylacetamide was used instead of POL-08.
  • polymer MP-15 was carried out in the same way as that of polymer MP-04 with the exception that a mixture of 13.3 g AM-07 dissolved in 300 ml 1-methoxy-2-propanol and 200 ml water was used instead of AM-01.
  • polymer MP-16 The preparation of polymer MP-16 was carried out in the same way as that of polymer MP-05 with the exception that a mixture of 21.3 g AM-07 dissolved in 480 ml 1-methoxy-2-propanol and 180 ml water was used instead of AM-01.
  • polymer MP-17 The preparation of polymer MP-17 was carried out in the same way as that of polymer MP-03 with the exception that a mixture of 5.3 g AM-07 dissolved in 120 ml 1-methoxy-2-propanol and 80 ml water was used and that a mixture of 125.2 g of POL-02 solution (44 % by weight), 46 g NaOAc.3H 2 O and 200 ml 1-methoxy-2-propanol was used.
  • polymer MP-18 was carried out in the same way as that of polymer MP-04 with the exception that a mixture of 13.3 g AM-07 dissolved in 300 ml 1-methoxy-2-propanol and 200 ml water was used and that a mixture of 125.2 g of POL-02 solution (44 % by weight), 115 g NaOAc.3H 2 O and 300 ml 1-methoxy-2-propanol was used.
  • the above prepared diazonium solution was added dropwise to the phenolic polymer solution over a 30 minute period after which stirring was continued for 30 minutes at 0°C and 30 minutes at 10°C.
  • the resulting mixture was then added to 2.5 liters ice-water over a 30 minute period while continuously stirring.
  • the polymer precipitated from the aqueous medium and was isolated by filtration.
  • the desired product was finally obtained by washing with water and with a mixture water/methanol (volume ratio: 6/4) and subsequent drying at 45°C.
  • the above prepared diazonium solution was added dropwise to the phenolic polymer solution over a 30 minute period after which stirring was continued for 120 minutes at 15°C.
  • the resulting mixture was then added to 2 liters ice-water over a 30 minute period while continuously stirring.
  • the polymer precipitated from the aqueous medium and was isolated by filtration.
  • the desired product was finally obtained by washing with water and subsequent drying at 45°C.
  • polymer MP-21 was carried out in the same way as that of polymer MP-20 with the exception that in the preparation of the diazonium salt a mixture of 5.3 g AM-10 and 50 ml of acetic acid, 5 ml concentrated HCl and 2.3 g NaNO 2 in 6 ml water were used, and that in the preparation of the phenolic polymer solution 32.6 g NaOAc.3H 2 O was used instead of the quantities given in the preparation of polymer MP-20.
  • polymer MP-22 was carried out in the same way as that of polymer MP-20 with the exception that in the preparation of the diazonium salt a mixture of 2.6 g AM-10 and 25 ml of acetic acid, 2.5 ml concentrated HCl and 1.1 g NaNO 2 in 3 ml water were used, and that in the preparation of the phenolic polymer solution 16.3 g NaOAc.3H 2 O was used instead of the quantities given in the preparation of polymer MP-20.
  • polymer MP-23 The preparation of polymer MP-23 was carried out in the same way as that of polymer MP-20 with the exception that in the preparation of the diazonium salt a mixture of 1.33 g AM-10 and 15 ml of acetic acid, 1.3 ml concentrated HCl and 0.57 g NaNO 2 in 2 ml water were used, and that in the preparation of the phenolic polymer solution 8.2 g NaOAC.3H 2 O was used instead of the quantities given in the preparation of polymer MP-20.
  • the above prepared diazonium solution was added dropwise to the phenolic polymer solution over a 60 minute period after which stirring was continued for 30 minutes at 0°C and 2 hours at room temperature.
  • the resulting mixture was then added to 5 liters ice-water over a 60 minute period while continuously stirring.
  • the polymer precipitated from the aqueous medium and was isolated by filtration.
  • the desired product was finally obtained by washing with water and subsequent drying at 45°C.
  • the coating solution was coated on an electrochemically grained and anodized aluminum substrate at a wet thickness of 20 ⁇ m. The coating was dried for 1 minute at 130°C.
  • the chemical resistance was tested by contacting a droplet of 40 ⁇ l of a test solution on different spots of the coating. After 3 minutes, the droplet was removed from the coating with a cotton pad. The attack on the coating due to each test solution was rated by visual inspection as follows:
  • Tables 1 to 4 The results for the test solutions on each coating are summarized in Tables 1 to 4.
  • the Tables also contain information about the type of the phenolic polymer used in the modification reaction, the type of modification reagens and the degree of modifications (in mol %) and the MP-number of the prepared polymer.
  • Table 1 Example number Type Phenolic Polymer Type reagens Degree modif. (mol%) Prep. Polym. MP-nr.
  • Table 1 demonstrate that these polymers, modified according to the present invention, give rise to a significant increase of the chemical resistance of the coating compared with the unmodified polymer.
  • Table 2 Example number Type Phenolic Polymer Type reagens Degree modif. (mol%) Prep. Polym. MP-nr.
  • Table 2 demonstrate that other polymers, modified according to the present invention, give rise to a significant increase of the chemical resistance of the coating compared with the unmodified polymers.
  • Table 3 Example number Type Phenolic Polymer Type reagens Degree modif. (mol%) Prep. Polym. MP-nr.
  • Table 3 demonstrate that these polymers, modified according to the present invention with different types of azo-aryl groups in different amounts, give rise to a significant increase of the chemical resistance of the coating.
  • Table 4 Example number Type Phenolic Polymer Type reagens Degree modif. (mol%) Prep. Polym. MP-nr. TEST 1 Test solution 1 TEST 1 Test solution 3
  • Example 26 POL-01 AM-01 + AM-07 10 10 MP-28 1 2
  • a coating solution was prepared by mixing the following ingredients:
  • the plate was mounted on a "ABDick 360" press using "K+E 800 Skinnex Black”, commercially available from BASF, as ink and "Emerald Premium MXEH", commercially available from ANCHOR, as fountain.
  • the run length was determined based on the maximum number of prints that could be printed without any significant sign of wear on the printing area.
  • the run length test was stopped at 100 000 copies.
  • the run lengths are summarized in Table 5.
  • Table 5 also contains information about the type of the phenolic polymer used in the modification reaction, the type of modification reagens, the degree of modifications (in mol %) and the MP-number of prepared polymer.
  • Table 5 Example number Type Phenolic Polymer Type reagens Degree modif. (mol%) Prep. Polym.
  • the coating solution was coated on an electrochemically grained and anodized aluminum substrate at a wet thickness of 26 ⁇ m on a coating line at a speed of 8 m/min using a drying temperature of 130°C.
  • the printing plate precursors were exposed on a CreoScitex Trendsetter 3244 at the energy density (in mJ/cm 2 ) listed in Table 6.
  • the imagewise exposed printing plate precursors were processed in an Agfa Autolith T processor, operating at a speed of 0.96 m/min and at 25°C, and using Agfa TD5000 as developer and RC795, commercially available from AGFA, as gum.
  • the processed plates were used as a print master on a Sakurai Oliver 52 printing press using K+E 800 Skinnex Black, commercially available from BASF, as ink and 4% Emerald Premium MXEH as fountain solution.
  • the plates were printed up to 100 000 (or 100K) prints and the run length was determined as indicated in Table 6.
  • Table 6 Example number Type Phenolic Polymer Type reagens Degree modif. (mol%) Prep. Polym. MP-nr.
  • Example number Type of material the same as Weight “A” Weight “B” Weight “C” TEST 4 percentage weight loss Comparative example 14 Comparative example 13 7.5276 7.5222 7.5165 49
  • Example 40 Example 36 7.3785 7.3785 7.3683 0
  • Example 41 Example 37 7.3169 7.3163 7.3064 6
  • Example 42 Example 38 7.3655 7.3647 7.3548 7
  • Example 43 Example 39 7.3816 7.3813 7.3720 3
  • Comparative Example 15 and the Invention Example 44 were prepared in the same way as Comparative Example 13 and Example 39 as described in Test 3 and as indicated in Table 6.
  • Test solution 4 and Test solution 5 were used instead of Test solution 1, 2 or 3:
  • Example number Type of material the same as Test 5 Test solution 4 Test 5 Test solution 5 Comparative example 15 Comparative example 13 4 2 Example 44 Example 39 2 1
  • Example 44 in Table 8 demonstrate that a coating, based on a polymer which is modified according to the present invention, give rise to a significant increase of the chemical resistance against press chemicals.
  • a coating solution was prepared by mixing the following ingredients:
  • the coating solution was coated on an electrochemically grained and anodized aluminum substrate at a wet thickness of 16 ⁇ m. The coating was dried for 5 minutes at 90°C.
  • the printing plate precursors were exposed on a CreoScitex Trendsetter 3244 at an exposure energy of 300 mJ/cm 2 . Next the printing plate precursors were heated for 1 minute at 110°C.
  • the imagewise exposed and preheated printing plate precursors were processed with New Unidev, commercially available from AGFA, as developer, thereby removing the non-image areas. After rinsing with water the final printing plate was obtained.

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Claims (18)

  1. Un précurseur de plaque d'impression lithographique thermosensible comprenant un support ayant une surface hydrophile et un revêtement oléophile appliqué sur la surface hydrophile, ledit revêtement contenant :
    - un agent absorbant les rayons infrarouges et
    - un polymère possédant une unité monomère phénolique, le groupe phényle de l'unité monomère phénolique étant substitué par un groupe de structure -N=N-Q dans laquelle le groupe -N=N- est lié par covalence à un atome de carbone du groupe phényle et Q est un groupe aromatique.
  2. Précurseur de plaque d'impression lithographique selon la revendication 1, caractérisé en ce que Q est un groupe comprenant au moins un hétéroatome.
  3. Précurseur de plaque d'impression lithographique selon la revendication 2, caractérisé en ce que l'hétéroatome est un atome d'azote, un atome d'oxygène ou un atome de sulfure.
  4. Précurseur de plaque d'impression lithographique selon les revendications 1, 2 ou 3, caractérisé en ce que Q répond à la structure A-(T)n
    où A représente un groupe aromatique monocyclique pentagonal ou hexagonal ou un groupe aromatique pentagonal ou hexagonal fusionné à un autre système de noyaux,
    n représente un nombre entier compris entre 0 et le nombre maximal de positions disponibles sur le groupe aromatique A et chaque groupe T représente -SO2-NH-R1, -NH-SO2-R4, -CO-NR1-R2, -NR1-CO-R4, -NR1-CO-NR2-R3, -NR1-CS-NR2-R3, -NR1-CO-O-R1, -O-CO-NR1-R2, -O-CO-R4, -CO-O-R2, -CO-R3, -SO3-R1, -O-SO2-R4, -SO2-R1, -SO-R4, -P(=O)(-O-R1)(-O-R2), -O-P(=O)(-O-R1)(-O-R2), -NR1-R2, -O-R2, -S-R2, -N=N-R4, -CN, -NO2, un halogénure ou -M-R1, où M représente un groupe de liaison divalent contenant 1 à 8 atomes de carbone,
    où R1, R2 et R3 représentent, indépendamment l'un de l'autre, un atome d'hydrogène, un groupe alkyle éventuellement substitué, un groupe alkényle éventuellement substitué, un groupe alkynyle éventuellement substitué, un groupe cycloalkyle éventuellement substitué, un groupe hétérocyclique éventuellement substitué, un groupe aryle éventuellement substitué, un groupe hétéroaryle éventuellement substitué, un groupe aralkyle éventuellement substitué ou un groupe hétéroaralkyle éventuellement substitué,
    où R4 et R5 représentent un groupe alkyle éventuellement substitué, un groupe alkényle éventuellement substitué, un groupe alkynyle éventuellement substitué, un groupe cycloalkyle éventuellement substitué, un groupe hétérocyclique éventuellement substitué, un groupe aryle éventuellement substitué, un groupe hétéroaryle éventuellement substitué, un groupe aralkyle éventuellement substitué ou un groupe hétéroaralkyle éventuellement substitué,
    ou où au moins deux groupes parmi les groupes R1 à R5 représentent ensemble les atomes nécessaires pour former une structure cyclique.
  5. Précurseur de plaque d'impression lithographique selon l'une quelconque des revendications 1 à 3, caractérisé en ce que le groupe -N=N-Q répond à la formule suivante:
    Figure imgb0070
     où :
    X représente CD3, ND4 ou N,
    Y représente les atomes nécessaires pour former un noyau aromatique pentagonal ou hexagonal, ces atomes étant choisis parmi CD3, ND4, N, S ou O,
    D1, D2 et D3 représentent un atome d'hydrogène, un groupe alkyle éventuellement substitué, un groupe alkényle éventuellement substitué, un groupe alkynyle éventuellement substitué, un groupe cycloalkyle éventuellement substitué, un groupe hétérocyclique éventuellement substitué, un groupe aryle éventuellement substitué, un groupe hétéroaryle éventuellement substitué, un groupe aralkyle éventuellement substitué ou un groupe hétéroaralkyle éventuellement substitué, -SO2-NH-D5, -NH-SO2-D7, -CO-NR5-D6, -ND5-CO-D7, -O-CO-D7, -CO-O-D5, -CO-D5, -SO3-D5, -SO2-D5, -SO-D7, -P(=O)(-O-D5)(-O-D6), -ND5-D6, -O-D5, -S-D5, -CN, -NO2, un atome d'halogène ou -M-D5, où M représente un groupe de liaison divalent contenant 1 à 8 atomes de carbone,
    où D4, D5 et D6 représentent, indépendamment l'un de l'autre, un atome d'hydrogène, un groupe alkyle éventuellement substitué, un groupe alkényle éventuellement substitué, un groupe alkynyle éventuellement substitué, un groupe cycloalkyle éventuellement substitué, un groupe hétérocyclique éventuellement substitué, un groupe aryle éventuellement substitué, un groupe hétéroaryle éventuellement substitué, un groupe aralkyle éventuellement substitué ou un groupe hétéroaralkyle éventuellement substitué,
    où D7 représente un groupe alkyle éventuellement substitué, un groupe alkényle éventuellement substitué, un groupe alkynyle éventuellement substitué, un groupe cycloalkyle éventuellement substitué, un groupe hétérocyclique éventuellement substitué, un groupe aryle éventuellement substitué, un groupe hétéroaryle éventuellement substitué, un groupe aralkyle éventuellement substitué ou un groupe hétéroaralkyle éventuellement substitué,
    ou où au moins deux groupes parmi les groupes D1 à D7 représentent ensemble les atomes nécessaires pour former une structure cyclique.
  6. Précurseur de plaque d'impression lithographique selon l'une quelconque des revendications 1 à 3, caractérisé en ce que le groupe -N=N-Q répond à la formule suivante :
    Figure imgb0071
     où :
    Z1 et Z2 représentent, indépendamment l'un de l'autre, CE1 ou N, où E1 représente un atome d'hydrogène, un groupe alkyle éventuellement substitué, un groupe alkényle éventuellement substitué, un groupe alkynyle éventuellement substitué, un groupe cycloalkyle éventuellement substitué, un groupe hétérocyclique éventuellement substitué, un groupe aryle éventuellement substitué, un groupe hétéroaryle éventuellement substitué, un groupe aralkyle éventuellement substitué ou un groupe hétéroaralkyle éventuellement substitué,
    p représente 0, 1, 2, 3 ou 4,
    r représente 0, 1, 2 ou 3,
    E2 et E3 représentent, indépendamment l'un de l'autre, un atome d'hydrogène, un groupe alkyle éventuellement substitué, un groupe alkényle éventuellement substitué, un groupe alkynyle éventuellement substitué, un groupe cycloalkyle éventuellement substitué, un groupe hétérocyclique éventuellement substitué, un groupe aryle éventuellement substitué, un groupe hétéroaryle éventuellement substitué, un groupe aralkyle éventuellement substitué ou un groupe hétéroaralkyle éventuellement substitué, -SO2-NH-E4, -NH-SO2-E6, -CO-NE4-E5, -NE4-CO-E6, -O-CO-E6, -CO-O-E4, -CO-E4, -SO3-E4, -SO2-E4, -SO-E6, -P(=O)(-O-E4)(-O-E5), -NE4-E5, -O-E4, -S-E4, -CN, -NO2, un atome d'halogène ou -M-E4, où M représente un groupe de liaison divalent contenant 1 à 8 atomes de carbone,
    où E4 et E5 représentent, indépendamment l'un de l'autre, un atome d'hydrogène, un groupe alkyle éventuellement substitué, un groupe alkényle éventuellement substitué, un groupe alkynyle éventuellement substitué, un groupe cycloalkyle éventuellement substitué, un groupe hétérocyclique éventuellement substitué, un groupe aryle éventuellement substitué, un groupe hétéroaryle éventuellement substitué, un groupe aralkyle éventuellement substitué ou un groupe hétéroaralkyle éventuellement substitué,
    où E6 représente un groupe alkyle éventuellement substitué, un groupe alkényle éventuellement substitué, un groupe alkynyle éventuellement substitué, un groupe cycloalkyle éventuellement substitué, un groupe hétérocyclique éventuellement substitué, un groupe aryle éventuellement substitué, un groupe hétéroaryle éventuellement substitué, un groupe aralkyle éventuellement substitué ou un groupe hétéroaralkyle éventuellement substitué,
    ou où au moins deux groupes parmi les groupes E1 à E6 représentent ensemble les atomes nécessaires pour former une structure cyclique.
  7. Précurseur de plaque d'impression lithographique selon l'une quelconque des revendications 1 à 3, caractérisé en ce que le groupe -N=N-Q répond à la formule suivante :
    Figure imgb0072
     où :
    q représente 0, 1, 2, 3, 4 ou 5,
    F1 représente un atome d'hydrogène, un groupe alkyle éventuellement substitué, un groupe alkényle éventuellement substitué, un groupe alkynyle éventuellement substitué, un groupe cycloalkyle éventuellement substitué, un groupe hétérocyclique éventuellement substitué, un groupe aryle éventuellement substitué, un groupe hétéroaryle éventuellement substitué, un groupe aralkyle éventuellement substitué ou un groupe
    hétéroaralkyle éventuellement substitué, -SO2-NH-F2, -NH-SO2-F4, -CO-NF2-F3, -NF2-CO-F4, -O-CO-F4, -CO-O-F2, -CO-F2, -SO3-F2, -SO2-F2, -SO-F4, -P(=O)(-O-F2)(-O-F3), -NF2-F3, -O-F2, -S-F2, -CN, -NO2, un atome d'halogène ou -M-F2, où M représente un groupe de liaison divalent contenant 1 à 8 atomes de carbone,
    où F2 et F3 représentent, indépendamment l'un de l'autre, un atome d'hydrogène, un groupe alkyle éventuellement substitué, un groupe alkényle éventuellement substitué, un groupe alkynyle éventuellement substitué, un groupe cycloalkyle éventuellement substitué, un groupe hétérocyclique éventuellement substitué, un groupe aryle éventuellement substitué, un groupe hétéroaryle éventuellement substitué, un groupe aralkyle éventuellement substitué ou un groupe hétéroaralkyle éventuellement substitué, où F4 représente un groupe alkyle éventuellement substitué, un groupe alkényle éventuellement substitué, un groupe alkynyle éventuellement substitué, un groupe cycloalkyle éventuellement substitué, un groupe hétérocyclique éventuellement substitué, un groupe aryle éventuellement substitué, un groupe hétéroaryle éventuellement substitué, un groupe aralkyle éventuellement substitué ou un groupe hétéroaralkyle éventuellement substitué,
    ou où au moins deux groupes parmi les groupes F1 à F4 représentent ensemble les atomes nécessaires pour former une structure cyclique.
  8. Précurseur de plaque d'impression lithographique selon l'une quelconque des revendications 1 à 3, caractérisé en ce que le groupe -N=N-Q répond à la formule suivante :
    Figure imgb0073
     où :
    p représente 0, 1, 2, 3 ou 4,
    G1 représente un atome d'hydrogène, un groupe alkyle éventuellement substitué, un groupe alkényle éventuellement substitué, un groupe alkynyle éventuellement substitué, un groupe cycloalkyle éventuellement substitué, un groupe hétérocyclique éventuellement substitué, un groupe aryle éventuellement substitué, un groupe hétéroaryle éventuellement substitué, un groupe aralkyle éventuellement substitué ou un groupe hétéroaralkyle éventuellement substitué, -SO2-NH-G2, -NH-SO2-G4, -CO-NG2-G3, -NG2-CO-G4, -O-CO-G4, -CO-O-G2, -CO-G2, -SO3-G2, -SO2-G2, -SO-G4, -P(=O)(-O-G2)(-O-G3), -NG2-G3, -O-G2 -S-G2, -CN, -NO2, un atome d'halogène ou -M-G2, où M représente un groupe de liaison divalent contenant 1 à 8 atomes de carbone,
    Z3 représente O, S ou NG5,
    où G2, G3 et G5 représentent, indépendamment l'un de l'autre, un atome d'hydrogène, un groupe alkyle éventuellement substitué, un groupe alkényle éventuellement substitué, un groupe alkynyle éventuellement substitué, un groupe cycloalkyle éventuellement substitué, un groupe hétérocyclique éventuellement substitué, un groupe aryle éventuellement substitué, un groupe hétéroaryle éventuellement substitué, un groupe aralkyle éventuellement substitué ou un groupe hétéroaralkyle éventuellement substitué,
    où G4 représente un groupe alkyle éventuellement substitué, un groupe alkényle éventuellement substitué, un groupe alkynyle éventuellement substitué, un groupe cycloalkyle éventuellement substitué, un groupe hétérocyclique éventuellement substitué, un groupe aryle éventuellement substitué, un groupe hétéroaryle éventuellement substitué, un groupe aralkyle éventuellement substitué ou un groupe hétéroaralkyle éventuellement substitué,
    ou où au moins deux groupes parmi les groupes G1 à G5 représentent ensemble les atomes nécessaires pour former une structure cyclique.
  9. Précurseur de plaque d'impression lithographique selon l'une quelconque des revendications 1 à 3, caractérisé en ce que le groupe -N=N-Q répond à la formule suivante:
    Figure imgb0074
     où :
    r représente 0, 1, 2 ou 3,
    U1 représente un atome d'hydrogène, un groupe alkyle éventuellement substitué, un groupe alkényle éventuellement substitué, un groupe alkynyle éventuellement substitué, un groupe cycloalkyle éventuellement substitué, un groupe hétérocyclique éventuellement substitué, un groupe aryle éventuellement substitué, un groupe hétéroaryle éventuellement substitué, un groupe aralkyle éventuellement substitué ou un groupe hétéroaralkyle éventuellement substitué, -SO2-NH-U2, -NH-SO2-U4, -CO-NU2-U3, -NU2-CO-U4, -O-CO-U4, -CO-O-U2, -CO-U2, -SO3-U2, -SO2-U2, -SO-U4, -P(=O)(-O-U2)(-O-U3), -NU2-U3, -O-U2, -S-U2, -CN, -NO2, un atome d'halogène ou -M-U2, où M représente un groupe de liaison divalent contenant 1 à 8 atomes de carbone,
    où U2, U3, U5 et U6 représentent, indépendamment l'un de l'autre, un atome d'hydrogène, un groupe alkyle éventuellement substitué, un groupe alkényle éventuellement substitué, un groupe alkynyle éventuellement substitué, un groupe cycloalkyle éventuellement substitué, un groupe hétérocyclique éventuellement substitué, un groupe aryle éventuellement substitué, un groupe hétéroaryle éventuellement substitué, un groupe aralkyle éventuellement substitué ou un groupe hétéroaralkyle éventuellement substitué,
    où U4 représente un groupe alkyle éventuellement substitué, un groupe alkényle éventuellement substitué, un groupe alkynyle éventuellement substitué, un groupe cycloalkyle éventuellement substitué, un groupe hétérocyclique éventuellement substitué, un groupe aryle éventuellement substitué, un groupe hétéroaryle éventuellement substitué, un groupe aralkyle éventuellement substitué ou un groupe hétéroaralkyle éventuellement substitué,
    ou où au moins deux groupes parmi les groupes U1 à U4 représentent ensemble les atomes nécessaires pour former une structure cyclique
    ou où U5 et U6 représentent ensemble les atomes nécessaires pour former une structure cyclique.
  10. Précurseur de plaque d'impression lithographique selon l'une quelconque des revendications 1 à 3, caractérisé en ce que le groupe -N=N-Q répond à la formule suivante :
    Figure imgb0075
     où :
    r représente 0, 1, 2 ou 3,
    p représente 0, 1, 2, 3 ou 4,
    V1 et V2 représentent, indépendamment l'un de l'autre, un atome d'hydrogène, un groupe alkyle éventuellement substitué, un groupe alkényle éventuellement substitué, un groupe alkynyle éventuellement substitué, un groupe cycloalkyle éventuellement substitué, un groupe hétérocyclique éventuellement substitué, un groupe aryle éventuellement substitué, un groupe hétéroaryle éventuellement substitué, un groupe aralkyle éventuellement substitué ou un groupe hétéroaralkyle éventuellement substitué, -SO2-NH-V3, -NH-SO2-V5, -CO-NV3-V4, -NV3-CO-V5, -O-CO-V5, -CO-O-V3, -CO-V3, -SO3-V3, -SO2-V3, -SO-V5, -P(=O)(-O-V3)(-O-V4), -NV3-V4, -O-V3, -S-V3, -CN, -NO2, un atome d'halogène ou -M-V3, où M représente un groupe de liaison divalent contenant 1 à 8 atomes de carbone,
    où V3 et V4 représentent, indépendamment l'un de l'autre, un atome d'hydrogène, un groupe alkyle éventuellement substitué, un groupe alkényle éventuellement substitué, un groupe alkynyle éventuellement substitué, un groupe cycloalkyle éventuellement substitué, un groupe hétérocyclique éventuellement substitué, un groupe aryle éventuellement substitué, un groupe hétéroaryle éventuellement substitué, un groupe aralkyle éventuellement substitué ou un groupe hétéroaralkyle éventuellement substitué,
    où V5 représente un groupe alkyle éventuellement substitué, un groupe alkényle éventuellement substitué, un groupe alkynyle éventuellement substitué, un groupe cycloalkyle éventuellement substitué, un groupe hétérocyclique éventuellement substitué, un groupe aryle éventuellement substitué, un groupe hétéroaryle éventuellement substitué, un groupe aralkyle éventuellement substitué ou un groupe hétéroaralkyle éventuellement substitué,
    ou où au moins deux groupes parmi les groupes V1 à V5 représentent ensemble les atomes nécessaires pour former une structure cyclique.
  11. Précurseur de plaque d'impression lithographique selon l'une quelconque des revendications 1 à 3, caractérisé en ce que le groupe -N=N-Q répond à la formule suivante :
    Figure imgb0076
     où :
    r représente 0, 1, 2 ou 3,
    W1 représente un atome d'hydrogène, un groupe alkyle éventuellement substitué, un groupe alkényle éventuellement substitué, un groupe alkynyle éventuellement substitué, un groupe cycloalkyle éventuellement substitué, un groupe hétérocyclique éventuellement substitué, un groupe aryle éventuellement substitué, un groupe hétéroaryle éventuellement substitué, un groupe aralkyle éventuellement substitué ou un groupe hétéroaralkyle éventuellement substitué, -SO2-NH-W2, -NH-SO2-W4, -CO-NW2-W3, -NU2-CO-W4, -O-CO-W4, -CO-O-W2, -CO-W2, -SO3-W2, -SO2-W2, -SO-W4, -P(=O)(-O-W2)(-O-W3), -NW2-W3, -O-W2, -S-W2, -CN, -NO2, un atome d'halogène ou -M-W2, où M représente un groupe de liaison divalent contenant 1 à 8 atomes de carbone,
    où W2, W3, W5 et W6 représentent, indépendamment l'un de l'autre, un atome d'hydrogène ou un groupe alkyle éventuellement substitué, un groupe alkényle éventuellement substitué, un groupe alkynyle éventuellement substitué, un groupe cycloalkyle éventuellement substitué, un groupe hétérocyclique éventuellement substitué, un groupe aryle éventuellement substitué, un groupe hétéroaryle éventuellement substitué, un groupe aralkyle éventuellement substitué ou un groupe hétéroaralkyle éventuellement substitué,
    où W4 représente un groupe alkyle éventuellement substitué, un groupe alkényle éventuellement substitué, un groupe alkynyle éventuellement substitué, un groupe cycloalkyle éventuellement substitué, un groupe hétérocyclique éventuellement substitué, un groupe aryle éventuellement substitué, un groupe hétéroaryle éventuellement substitué, un groupe aralkyle éventuellement substitué ou un groupe hétéroaralkyle éventuellement substitué,
    ou où au moins deux groupes parmi les groupes W1 à W6 représentent ensemble les atomes nécessaires pour former une structure cyclique.
  12. Précurseur de plaque d'impression lithographique selon l'une quelconque des revendications 1 à 3, caractérisé en ce que le groupe -N=N-Q répond à une des formules suivantes :
    Figure imgb0077
    Figure imgb0078
    Figure imgb0079
    Figure imgb0080
    Figure imgb0081
    Figure imgb0082
    Figure imgb0083
    Figure imgb0084
  13. Précurseur de plaque d'impression lithographique selon l'une quelconque des revendications précédentes, caractérisé en ce que le polymère contenant une unité monomère phénolique est une novolaque, un résol ou un polyvinylphénol.
  14. Précurseur de plaque d'impression lithographique selon l'une quelconque des revendications 1 à 13, caractérisé en ce que le revêtement contient en outre un acide latent de Brönsted et un composé réticulable par un acide et que le précurseur est un précurseur de plaque d'impression lithographique à effet négatif.
  15. Précurseur de plaque d'impression lithographique selon l'une quelconque des revendications 1 à 13, caractérisé en ce que le revêtement contient en outre un inhibiteur de dissolution et que le précurseur est un précurseur de plaque d'impression lithographique à effet positif.
  16. Précurseur de plaque d'impression lithographique selon la revendication 15, caractérisé en ce que l'inhibiteur de dissolution est choisi parmi :
    - un composé organique contenant au moins un groupe aromatique et un site de liaison hydrogène et/ou
    - un polymère ou un agent tensioactif contenant des unités de siloxane et/ou de perfluoroalkyle.
  17. Utilisation d'un polymère contenant une unité monomère phénolique, le groupe phényle de l'unité monomère phénolique étant substitué par un groupe de structure -N=N-Q dans laquelle le groupe -N=N- est lié par covalence à un atome de carbone du groupe phényle et Q est un groupe aromatique,
    dans un revêtement d'un précurseur de plaque d'impression lithographique thermosensible à effet positif qui contient en outre :
    - un agent absorbant les rayons infrarouges et
    - inhibiteur de dissolution,
    afin d'augmenter la résistance chimique du revêtement aux liquides et produits chimiques utilisés pour l'impression.
  18. Utilisation d'un polymère contenant une unité monomère phénolique, le groupe phényle de l'unité monomère phénolique étant substitué par un groupe de structure -N=N-Q dans laquelle le groupe -N=N- est lié par covalence à un atome de carbone du groupe phényle et Q est un groupe aromatique,
    dans un revêtement d'un précurseur de plaque d'impression lithographique thermosensible à effet négatif qui contient en outre :
    - un agent absorbant les rayons infrarouges,
    - un acide latent de Brônsted et
    - un composé réticulable par un acide,
    afin d'augmenter la résistance chimique du revêtement aux liquides et produits chimiques utilisés pour l'impression.
EP03808735A 2002-10-15 2003-09-29 Precurseur de plaque d'impression lithographique thermosensible Expired - Fee Related EP1554117B1 (fr)

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EP03808735A EP1554117B1 (fr) 2002-10-15 2003-09-29 Precurseur de plaque d'impression lithographique thermosensible
PCT/EP2003/050664 WO2004035310A1 (fr) 2002-10-15 2003-09-29 Precurseur de plaque d'impression lithographique thermosensible

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US7205084B2 (en) 2003-12-18 2007-04-17 Agfa-Gevaert Heat-sensitive lithographic printing plate precursor
EP1697144A1 (fr) 2003-12-18 2006-09-06 Agfa-Gevaert N.V. Pr curseur positif de plaque d'impression lithographique
US7678533B2 (en) 2005-06-30 2010-03-16 Agfa Graphics, N.V. Heat-sensitive lithographic printing plate precursor
EP2025512B1 (fr) 2007-08-14 2011-05-18 Agfa Graphics N.V. Procédé de fabrication d'une plaque d'impression lithographique
JP4790682B2 (ja) * 2007-09-28 2011-10-12 富士フイルム株式会社 平版印刷版原版
EP2159049B1 (fr) 2008-09-02 2012-04-04 Agfa Graphics N.V. Précurseur de plaque d'impression lithographique sensible à la chaleur et à action positive
EP2213690B1 (fr) 2009-01-30 2015-11-11 Agfa Graphics N.V. Nouvelle résine alcaline soluble
ES2381535T3 (es) 2009-06-18 2012-05-29 Agfa Graphics N.V. Precursor de plancha de impresión litográfica
EP2329951B1 (fr) 2009-12-04 2012-06-20 AGFA Graphics NV Précurseur de plaque d'impression lithographique
EP2366545B1 (fr) 2010-03-19 2012-12-05 Agfa Graphics N.V. Précurseur de plaque d'impression lithographique
EP2420383B1 (fr) * 2010-08-20 2013-10-16 Agfa Graphics N.V. Système numérique pour créer un support d'impression flexographique
EP2668039B1 (fr) 2011-01-25 2015-06-03 AGFA Graphics NV Precurseur de plaque lithographique
ES2427137T3 (es) 2011-02-18 2013-10-29 Agfa Graphics N.V. Precursor de plancha de impresión litográfica
CN103879168B (zh) * 2012-12-21 2016-02-17 乐凯华光印刷科技有限公司 一种长印程热敏版
BR112015015795A2 (pt) 2013-01-01 2017-07-11 Agfa Graphics Nv copolímeros de etilenovinil acetal e seu uso em precursores de chapas de impressão litográfica
EP2933278B1 (fr) 2014-04-17 2018-08-22 Agfa Nv Copolymères (éthylène, acétal de vinyle) et leur utilisation dans des précurseurs de plaque d'impression lithographique
EP2944657B1 (fr) 2014-05-15 2017-01-11 Agfa Graphics Nv Copolymères (éthylène, acétal de vinyle) et leur utilisation dans des précurseurs de plaque d'impression lithographique
EP2955198B8 (fr) 2014-06-13 2018-01-03 Agfa Nv Copolymères d'éthylène et d'acétal de vinyle et leur utilisation dans des précurseurs de plaques d'impression lithographique
EP2963496B1 (fr) 2014-06-30 2017-04-05 Agfa Graphics NV Précurseur de plaque d'impression lithographique comprenant des copolymères (éthylène, acétal de vinyle)
EP3130465B1 (fr) 2015-08-12 2020-05-13 Agfa Nv Précurseur de plaque d'impression lithographique thermosensible

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