EP1551908A2 - Coating composition and method for the production thereof - Google Patents
Coating composition and method for the production thereofInfo
- Publication number
- EP1551908A2 EP1551908A2 EP03750644A EP03750644A EP1551908A2 EP 1551908 A2 EP1551908 A2 EP 1551908A2 EP 03750644 A EP03750644 A EP 03750644A EP 03750644 A EP03750644 A EP 03750644A EP 1551908 A2 EP1551908 A2 EP 1551908A2
- Authority
- EP
- European Patent Office
- Prior art keywords
- group
- layer
- scratch
- coating agent
- mol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000000034 method Methods 0.000 title claims abstract description 35
- 239000008199 coating composition Substances 0.000 title claims abstract description 29
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 22
- 230000003678 scratch resistant effect Effects 0.000 claims abstract description 38
- 239000000758 substrate Substances 0.000 claims abstract description 16
- 150000001875 compounds Chemical class 0.000 claims description 57
- -1 glycidyloxy group Chemical group 0.000 claims description 48
- 239000011248 coating agent Substances 0.000 claims description 36
- 238000006460 hydrolysis reaction Methods 0.000 claims description 22
- 239000010936 titanium Substances 0.000 claims description 22
- 239000003795 chemical substances by application Substances 0.000 claims description 21
- 230000007062 hydrolysis Effects 0.000 claims description 21
- 238000000576 coating method Methods 0.000 claims description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 18
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 claims description 17
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 15
- 230000008569 process Effects 0.000 claims description 15
- 125000003545 alkoxy group Chemical group 0.000 claims description 14
- 229910052719 titanium Inorganic materials 0.000 claims description 14
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 claims description 13
- 229910052782 aluminium Inorganic materials 0.000 claims description 13
- 229910052726 zirconium Inorganic materials 0.000 claims description 13
- 125000003700 epoxy group Chemical group 0.000 claims description 11
- 239000006120 scratch resistant coating Substances 0.000 claims description 11
- 239000002245 particle Substances 0.000 claims description 9
- 239000007787 solid Substances 0.000 claims description 9
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 claims description 9
- 229910052710 silicon Inorganic materials 0.000 claims description 8
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 claims description 7
- 125000000217 alkyl group Chemical group 0.000 claims description 7
- 229910052796 boron Inorganic materials 0.000 claims description 7
- 229910052736 halogen Inorganic materials 0.000 claims description 7
- 150000002367 halogens Chemical class 0.000 claims description 7
- 125000003342 alkenyl group Chemical group 0.000 claims description 6
- 239000002904 solvent Substances 0.000 claims description 6
- 229910052718 tin Inorganic materials 0.000 claims description 6
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 claims description 5
- 239000002879 Lewis base Substances 0.000 claims description 5
- 125000000218 acetic acid group Chemical group C(C)(=O)* 0.000 claims description 5
- 125000003668 acetyloxy group Chemical group [H]C([H])([H])C(=O)O[*] 0.000 claims description 5
- 125000004448 alkyl carbonyl group Chemical group 0.000 claims description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 5
- 125000003118 aryl group Chemical group 0.000 claims description 5
- 229910052794 bromium Inorganic materials 0.000 claims description 5
- 239000003054 catalyst Substances 0.000 claims description 5
- 238000003851 corona treatment Methods 0.000 claims description 5
- 150000007527 lewis bases Chemical class 0.000 claims description 5
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 claims description 5
- 239000004417 polycarbonate Substances 0.000 claims description 5
- 229920000515 polycarbonate Polymers 0.000 claims description 5
- 238000003980 solgel method Methods 0.000 claims description 5
- 125000004213 tert-butoxy group Chemical group [H]C([H])([H])C(O*)(C([H])([H])[H])C([H])([H])[H] 0.000 claims description 5
- 238000011282 treatment Methods 0.000 claims description 5
- 229910052684 Cerium Inorganic materials 0.000 claims description 4
- 150000001298 alcohols Chemical class 0.000 claims description 4
- 229910052740 iodine Inorganic materials 0.000 claims description 4
- 125000001424 substituent group Chemical group 0.000 claims description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 3
- 239000000654 additive Substances 0.000 claims description 3
- 125000003277 amino group Chemical group 0.000 claims description 3
- 229910052799 carbon Inorganic materials 0.000 claims description 3
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 3
- 125000005843 halogen group Chemical group 0.000 claims description 3
- 125000001183 hydrocarbyl group Chemical group 0.000 claims description 3
- 239000004033 plastic Substances 0.000 claims description 3
- 229920003023 plastic Polymers 0.000 claims description 3
- 125000003396 thiol group Chemical group [H]S* 0.000 claims description 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 2
- 239000000975 dye Substances 0.000 claims description 2
- 229910052738 indium Inorganic materials 0.000 claims description 2
- 230000000379 polymerizing effect Effects 0.000 claims description 2
- 229910000077 silane Inorganic materials 0.000 claims description 2
- 239000003381 stabilizer Substances 0.000 claims description 2
- 229910052725 zinc Inorganic materials 0.000 claims description 2
- 230000000996 additive effect Effects 0.000 claims 1
- 238000009835 boiling Methods 0.000 claims 1
- 150000002118 epoxides Chemical group 0.000 claims 1
- 239000011256 inorganic filler Substances 0.000 claims 1
- 229910003475 inorganic filler Inorganic materials 0.000 claims 1
- GUGNSJAORJLKGP-UHFFFAOYSA-K sodium 8-methoxypyrene-1,3,6-trisulfonate Chemical compound [Na+].[Na+].[Na+].C1=C2C(OC)=CC(S([O-])(=O)=O)=C(C=C3)C2=C2C3=C(S([O-])(=O)=O)C=C(S([O-])(=O)=O)C2=C1 GUGNSJAORJLKGP-UHFFFAOYSA-K 0.000 claims 1
- 239000010410 layer Substances 0.000 abstract description 98
- 239000000203 mixture Substances 0.000 abstract description 44
- 239000011247 coating layer Substances 0.000 abstract 1
- 150000003377 silicon compounds Chemical class 0.000 description 32
- 239000000463 material Substances 0.000 description 19
- FAHBNUUHRFUEAI-UHFFFAOYSA-M hydroxidooxidoaluminium Chemical compound O[Al]=O FAHBNUUHRFUEAI-UHFFFAOYSA-M 0.000 description 12
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 11
- 229910001593 boehmite Inorganic materials 0.000 description 11
- 238000001723 curing Methods 0.000 description 10
- 239000011236 particulate material Substances 0.000 description 9
- 239000000243 solution Substances 0.000 description 7
- 239000000047 product Substances 0.000 description 6
- 238000003860 storage Methods 0.000 description 6
- 238000009736 wetting Methods 0.000 description 6
- 239000011701 zinc Substances 0.000 description 6
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 5
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 5
- 239000000843 powder Substances 0.000 description 5
- 238000005299 abrasion Methods 0.000 description 4
- 125000004423 acyloxy group Chemical group 0.000 description 4
- 125000004104 aryloxy group Chemical group 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 4
- 239000011541 reaction mixture Substances 0.000 description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 238000001994 activation Methods 0.000 description 3
- 125000004429 atom Chemical group 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 3
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 125000005395 methacrylic acid group Chemical group 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 3
- 150000004756 silanes Chemical class 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 229910052720 vanadium Inorganic materials 0.000 description 3
- 125000006017 1-propenyl group Chemical group 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- 125000001494 2-propynyl group Chemical group [H]C#CC([H])([H])* 0.000 description 2
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 2
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 230000004913 activation Effects 0.000 description 2
- 150000004703 alkoxides Chemical class 0.000 description 2
- 125000000304 alkynyl group Chemical group 0.000 description 2
- 150000004645 aluminates Chemical class 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 230000001680 brushing effect Effects 0.000 description 2
- 125000004369 butenyl group Chemical group C(=CCC)* 0.000 description 2
- KBPLFHHGFOOTCA-UHFFFAOYSA-N caprylic alcohol Natural products CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 2
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 2
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 2
- 238000003486 chemical etching Methods 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 230000002349 favourable effect Effects 0.000 description 2
- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- KLRHPHDUDFIRKB-UHFFFAOYSA-M indium(i) bromide Chemical compound [Br-].[In+] KLRHPHDUDFIRKB-UHFFFAOYSA-M 0.000 description 2
- 239000012442 inert solvent Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 125000001624 naphthyl group Chemical group 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 229920005862 polyol Polymers 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 239000011877 solvent mixture Substances 0.000 description 2
- 229910052723 transition metal Inorganic materials 0.000 description 2
- 150000003624 transition metals Chemical class 0.000 description 2
- GSUGNQKJVLXBHC-UHFFFAOYSA-N triethoxy-[4-(oxiran-2-ylmethoxy)butyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCCOCC1CO1 GSUGNQKJVLXBHC-UHFFFAOYSA-N 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- HTSGKJQDMSTCGS-UHFFFAOYSA-N 1,4-bis(4-chlorophenyl)-2-(4-methylphenyl)sulfonylbutane-1,4-dione Chemical compound C1=CC(C)=CC=C1S(=O)(=O)C(C(=O)C=1C=CC(Cl)=CC=1)CC(=O)C1=CC=C(Cl)C=C1 HTSGKJQDMSTCGS-UHFFFAOYSA-N 0.000 description 1
- CJTNLEQLKKYLFO-UHFFFAOYSA-N 1-butoxyethanol Chemical compound CCCCOC(C)O CJTNLEQLKKYLFO-UHFFFAOYSA-N 0.000 description 1
- AHFXIFMCZUNFSI-UHFFFAOYSA-N 2,2-dimethoxyethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound COC(CO[SiH](C)CCCOCC1CO1)OC AHFXIFMCZUNFSI-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- GUXLAULAZDJOEK-UHFFFAOYSA-N 3-(oxiran-2-ylmethoxy)propyl-triphenoxysilane Chemical compound C=1C=CC=CC=1O[Si](OC=1C=CC=CC=1)(OC=1C=CC=CC=1)CCCOCC1CO1 GUXLAULAZDJOEK-UHFFFAOYSA-N 0.000 description 1
- ZDZYGYFHTPFREM-UHFFFAOYSA-N 3-[3-aminopropyl(dimethoxy)silyl]oxypropan-1-amine Chemical compound NCCC[Si](OC)(OC)OCCCN ZDZYGYFHTPFREM-UHFFFAOYSA-N 0.000 description 1
- HXLAEGYMDGUSBD-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propan-1-amine Chemical compound CCO[Si](C)(OCC)CCCN HXLAEGYMDGUSBD-UHFFFAOYSA-N 0.000 description 1
- MBNRBJNIYVXSQV-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propane-1-thiol Chemical compound CCO[Si](C)(OCC)CCCS MBNRBJNIYVXSQV-UHFFFAOYSA-N 0.000 description 1
- DOYKFSOCSXVQAN-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CCO[Si](C)(OCC)CCCOC(=O)C(C)=C DOYKFSOCSXVQAN-UHFFFAOYSA-N 0.000 description 1
- IKYAJDOSWUATPI-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propane-1-thiol Chemical compound CO[Si](C)(OC)CCCS IKYAJDOSWUATPI-UHFFFAOYSA-N 0.000 description 1
- LZMNXXQIQIHFGC-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CO[Si](C)(OC)CCCOC(=O)C(C)=C LZMNXXQIQIHFGC-UHFFFAOYSA-N 0.000 description 1
- KSCAZPYHLGGNPZ-UHFFFAOYSA-N 3-chloropropyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)CCCCl KSCAZPYHLGGNPZ-UHFFFAOYSA-N 0.000 description 1
- OXYZDRAJMHGSMW-UHFFFAOYSA-N 3-chloropropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCCl OXYZDRAJMHGSMW-UHFFFAOYSA-N 0.000 description 1
- KEZMLECYELSZDC-UHFFFAOYSA-N 3-chloropropyl-diethoxy-methylsilane Chemical compound CCO[Si](C)(OCC)CCCCl KEZMLECYELSZDC-UHFFFAOYSA-N 0.000 description 1
- KNTKCYKJRSMRMZ-UHFFFAOYSA-N 3-chloropropyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)CCCCl KNTKCYKJRSMRMZ-UHFFFAOYSA-N 0.000 description 1
- DCQBZYNUSLHVJC-UHFFFAOYSA-N 3-triethoxysilylpropane-1-thiol Chemical compound CCO[Si](OCC)(OCC)CCCS DCQBZYNUSLHVJC-UHFFFAOYSA-N 0.000 description 1
- GBQYMXVQHATSCC-UHFFFAOYSA-N 3-triethoxysilylpropanenitrile Chemical compound CCO[Si](OCC)(OCC)CCC#N GBQYMXVQHATSCC-UHFFFAOYSA-N 0.000 description 1
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 1
- OTCOSAMIXUWQOA-UHFFFAOYSA-N COC(OC)(OC)CO[SiH2]C Chemical compound COC(OC)(OC)CO[SiH2]C OTCOSAMIXUWQOA-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- MVQOPRZXDLIYPY-UHFFFAOYSA-N FC(CC[Si](OC)(OC)OC)(F)F.ClCCC[Si](OC(C)=O)(OC(C)=O)OC(C)=O Chemical compound FC(CC[Si](OC)(OC)OC)(F)F.ClCCC[Si](OC(C)=O)(OC(C)=O)OC(C)=O MVQOPRZXDLIYPY-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910021617 Indium monochloride Inorganic materials 0.000 description 1
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical group CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 1
- 229910018540 Si C Inorganic materials 0.000 description 1
- 229910020175 SiOH Inorganic materials 0.000 description 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- 239000012963 UV stabilizer Substances 0.000 description 1
- 229910007926 ZrCl Inorganic materials 0.000 description 1
- RQVFGTYFBUVGOP-UHFFFAOYSA-N [acetyloxy(dimethyl)silyl] acetate Chemical compound CC(=O)O[Si](C)(C)OC(C)=O RQVFGTYFBUVGOP-UHFFFAOYSA-N 0.000 description 1
- NOZAQBYNLKNDRT-UHFFFAOYSA-N [diacetyloxy(ethenyl)silyl] acetate Chemical compound CC(=O)O[Si](OC(C)=O)(OC(C)=O)C=C NOZAQBYNLKNDRT-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 238000007605 air drying Methods 0.000 description 1
- 125000005192 alkyl ethylene group Chemical group 0.000 description 1
- DQAJDDUCDILVLR-UHFFFAOYSA-N aluminum 2,2,2-tributoxyethanolate Chemical compound [Al+3].CCCCOC(C[O-])(OCCCC)OCCCC.CCCCOC(C[O-])(OCCCC)OCCCC.CCCCOC(C[O-])(OCCCC)OCCCC DQAJDDUCDILVLR-UHFFFAOYSA-N 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- ZDOBWJOCPDIBRZ-UHFFFAOYSA-N chloromethyl(triethoxy)silane Chemical compound CCO[Si](CCl)(OCC)OCC ZDOBWJOCPDIBRZ-UHFFFAOYSA-N 0.000 description 1
- FPOSCXQHGOVVPD-UHFFFAOYSA-N chloromethyl(trimethoxy)silane Chemical compound CO[Si](CCl)(OC)OC FPOSCXQHGOVVPD-UHFFFAOYSA-N 0.000 description 1
- SLLGVCUQYRMELA-UHFFFAOYSA-N chlorosilicon Chemical compound Cl[Si] SLLGVCUQYRMELA-UHFFFAOYSA-N 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 230000000536 complexating effect Effects 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- JIOUJECYOVQAMA-UHFFFAOYSA-N dibutoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCCCO[Si](C)(OCCCC)CCCOCC1CO1 JIOUJECYOVQAMA-UHFFFAOYSA-N 0.000 description 1
- GENZKBJGWAAVIE-UHFFFAOYSA-N diethoxy-[3-(oxiran-2-ylmethoxy)propyl]-phenylsilane Chemical compound C=1C=CC=CC=1[Si](OCC)(OCC)CCCOCC1CO1 GENZKBJGWAAVIE-UHFFFAOYSA-N 0.000 description 1
- OWHSEFXLFMRCOO-UHFFFAOYSA-N diethoxy-[5-(oxiran-2-ylmethoxy)pent-1-enyl]silane Chemical compound C(C1CO1)OCCCC=C[SiH](OCC)OCC OWHSEFXLFMRCOO-UHFFFAOYSA-N 0.000 description 1
- ODADONMDNZJQMW-UHFFFAOYSA-N diethoxy-ethyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](CC)(OCC)CCCOCC1CO1 ODADONMDNZJQMW-UHFFFAOYSA-N 0.000 description 1
- UMWZTDBPOBTQIB-UHFFFAOYSA-N diethoxy-methyl-(oxiran-2-ylmethoxymethyl)silane Chemical compound CCO[Si](C)(OCC)COCC1CO1 UMWZTDBPOBTQIB-UHFFFAOYSA-N 0.000 description 1
- MRJXZRBBFSDWFR-UHFFFAOYSA-N diethoxy-methyl-[1-(7-oxabicyclo[4.1.0]heptan-4-yl)ethoxy]silane Chemical compound C1C(C(C)O[Si](C)(OCC)OCC)CCC2OC21 MRJXZRBBFSDWFR-UHFFFAOYSA-N 0.000 description 1
- HUFWVNRUIVIGCH-UHFFFAOYSA-N diethoxy-methyl-[2-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](C)(OCC)CC(C)OCC1CO1 HUFWVNRUIVIGCH-UHFFFAOYSA-N 0.000 description 1
- OTARVPUIYXHRRB-UHFFFAOYSA-N diethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](C)(OCC)CCCOCC1CO1 OTARVPUIYXHRRB-UHFFFAOYSA-N 0.000 description 1
- MNFGEHQPOWJJBH-UHFFFAOYSA-N diethoxy-methyl-phenylsilane Chemical compound CCO[Si](C)(OCC)C1=CC=CC=C1 MNFGEHQPOWJJBH-UHFFFAOYSA-N 0.000 description 1
- PKTOVQRKCNPVKY-UHFFFAOYSA-N dimethoxy(methyl)silicon Chemical compound CO[Si](C)OC PKTOVQRKCNPVKY-UHFFFAOYSA-N 0.000 description 1
- FQPPMINVIMPSDP-UHFFFAOYSA-N dimethoxy-[5-(oxiran-2-ylmethoxy)pent-1-enyl]silane Chemical compound C(C1CO1)OCCCC=C[SiH](OC)OC FQPPMINVIMPSDP-UHFFFAOYSA-N 0.000 description 1
- PBDDFKGMGASJHE-UHFFFAOYSA-N dimethoxy-methyl-(7-oxabicyclo[4.1.0]heptan-4-ylmethoxy)silane Chemical compound C1C(CO[Si](C)(OC)OC)CCC2OC21 PBDDFKGMGASJHE-UHFFFAOYSA-N 0.000 description 1
- CAEPKDWOZATEMI-UHFFFAOYSA-N dimethoxy-methyl-(oxiran-2-ylmethoxymethyl)silane Chemical compound CO[Si](C)(OC)COCC1CO1 CAEPKDWOZATEMI-UHFFFAOYSA-N 0.000 description 1
- RLFWUGYBCZFNMQ-UHFFFAOYSA-N dimethoxy-methyl-[1-(oxiran-2-ylmethoxy)ethyl]silane Chemical compound CO[Si](C)(OC)C(C)OCC1CO1 RLFWUGYBCZFNMQ-UHFFFAOYSA-N 0.000 description 1
- WHGNXNCOTZPEEK-UHFFFAOYSA-N dimethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](C)(OC)CCCOCC1CO1 WHGNXNCOTZPEEK-UHFFFAOYSA-N 0.000 description 1
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 1
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 description 1
- XCLIHDJZGPCUBT-UHFFFAOYSA-N dimethylsilanediol Chemical compound C[Si](C)(O)O XCLIHDJZGPCUBT-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- GYLXWHLPLTVIOP-UHFFFAOYSA-N ethenyl(2,2,2-trimethoxyethoxy)silane Chemical compound COC(OC)(OC)CO[SiH2]C=C GYLXWHLPLTVIOP-UHFFFAOYSA-N 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- MBGQQKKTDDNCSG-UHFFFAOYSA-N ethenyl-diethoxy-methylsilane Chemical compound CCO[Si](C)(C=C)OCC MBGQQKKTDDNCSG-UHFFFAOYSA-N 0.000 description 1
- ZLNAFSPCNATQPQ-UHFFFAOYSA-N ethenyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)C=C ZLNAFSPCNATQPQ-UHFFFAOYSA-N 0.000 description 1
- HHFAWKCIHAUFRX-UHFFFAOYSA-N ethoxide Chemical compound CC[O-] HHFAWKCIHAUFRX-UHFFFAOYSA-N 0.000 description 1
- SBRXLTRZCJVAPH-UHFFFAOYSA-N ethyl(trimethoxy)silane Chemical compound CC[Si](OC)(OC)OC SBRXLTRZCJVAPH-UHFFFAOYSA-N 0.000 description 1
- KUCGHDUQOVVQED-UHFFFAOYSA-N ethyl(tripropoxy)silane Chemical compound CCCO[Si](CC)(OCCC)OCCC KUCGHDUQOVVQED-UHFFFAOYSA-N 0.000 description 1
- YCIAPTIZYCRWAU-UHFFFAOYSA-N ethyl-[3-(oxiran-2-ylmethoxy)propyl]-dipropoxysilane Chemical compound CCCO[Si](CC)(OCCC)CCCOCC1CO1 YCIAPTIZYCRWAU-UHFFFAOYSA-N 0.000 description 1
- YYDBOMXUCPLLSK-UHFFFAOYSA-N ethyl-dimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CC[Si](OC)(OC)CCCOCC1CO1 YYDBOMXUCPLLSK-UHFFFAOYSA-N 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000011552 falling film Substances 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- VVTZNCQOVBDXRL-UHFFFAOYSA-N guanidine;propanoic acid Chemical compound NC(N)=N.CCC(O)=O VVTZNCQOVBDXRL-UHFFFAOYSA-N 0.000 description 1
- 150000004677 hydrates Chemical class 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- APHGZSBLRQFRCA-UHFFFAOYSA-M indium(1+);chloride Chemical compound [In]Cl APHGZSBLRQFRCA-UHFFFAOYSA-M 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 239000000543 intermediate Substances 0.000 description 1
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- MYWUZJCMWCOHBA-VIFPVBQESA-N methamphetamine Chemical compound CN[C@@H](C)CC1=CC=CC=C1 MYWUZJCMWCOHBA-VIFPVBQESA-N 0.000 description 1
- DRXHEPWCWBIQFJ-UHFFFAOYSA-N methyl(triphenoxy)silane Chemical compound C=1C=CC=CC=1O[Si](OC=1C=CC=CC=1)(C)OC1=CC=CC=C1 DRXHEPWCWBIQFJ-UHFFFAOYSA-N 0.000 description 1
- CUIXFHFVVWQXSW-UHFFFAOYSA-N methyl-[3-(oxiran-2-ylmethoxy)propyl]-diphenoxysilane Chemical compound C=1C=CC=CC=1O[Si](OC=1C=CC=CC=1)(C)CCCOCC1CO1 CUIXFHFVVWQXSW-UHFFFAOYSA-N 0.000 description 1
- VOARQMXRPHXHID-UHFFFAOYSA-N methyl-[3-(oxiran-2-ylmethoxy)propyl]-dipropoxysilane Chemical compound CCCO[Si](C)(OCCC)CCCOCC1CO1 VOARQMXRPHXHID-UHFFFAOYSA-N 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N n-Octanol Natural products CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- 238000000016 photochemical curing Methods 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000000678 plasma activation Methods 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 239000002685 polymerization catalyst Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000009987 spinning Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000010189 synthetic method Methods 0.000 description 1
- 238000010345 tape casting Methods 0.000 description 1
- 238000005496 tempering Methods 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 239000004753 textile Substances 0.000 description 1
- 238000001029 thermal curing Methods 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- 229920006352 transparent thermoplastic Polymers 0.000 description 1
- WOZZOSDBXABUFO-UHFFFAOYSA-N tri(butan-2-yloxy)alumane Chemical compound [Al+3].CCC(C)[O-].CCC(C)[O-].CCC(C)[O-] WOZZOSDBXABUFO-UHFFFAOYSA-N 0.000 description 1
- GYZQBXUDWTVJDF-UHFFFAOYSA-N tributoxy(methyl)silane Chemical compound CCCCO[Si](C)(OCCCC)OCCCC GYZQBXUDWTVJDF-UHFFFAOYSA-N 0.000 description 1
- FQYWWLSIKWDAEC-UHFFFAOYSA-N tributoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCCCO[Si](OCCCC)(OCCCC)CCCOCC1CO1 FQYWWLSIKWDAEC-UHFFFAOYSA-N 0.000 description 1
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 description 1
- UNKMHLWJZHLPPM-UHFFFAOYSA-N triethoxy(oxiran-2-ylmethoxymethyl)silane Chemical compound CCO[Si](OCC)(OCC)COCC1CO1 UNKMHLWJZHLPPM-UHFFFAOYSA-N 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- NFRRMEMOPXUROM-UHFFFAOYSA-N triethoxy-[1-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)C(CC)OCC1CO1 NFRRMEMOPXUROM-UHFFFAOYSA-N 0.000 description 1
- RWJUTPORTOUFDY-UHFFFAOYSA-N triethoxy-[2-(oxiran-2-ylmethoxy)ethyl]silane Chemical compound CCO[Si](OCC)(OCC)CCOCC1CO1 RWJUTPORTOUFDY-UHFFFAOYSA-N 0.000 description 1
- CFUDQABJYSJIQY-UHFFFAOYSA-N triethoxy-[2-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CC(C)OCC1CO1 CFUDQABJYSJIQY-UHFFFAOYSA-N 0.000 description 1
- NLKPPXKQMJDBFO-UHFFFAOYSA-N triethoxy-[3-(7-oxabicyclo[4.1.0]heptan-4-yl)propyl]silane Chemical compound C1C(CCC[Si](OCC)(OCC)OCC)CCC2OC21 NLKPPXKQMJDBFO-UHFFFAOYSA-N 0.000 description 1
- KPNCYSTUWLXFOE-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)butyl]silane Chemical compound CCO[Si](OCC)(OCC)CCC(C)OCC1CO1 KPNCYSTUWLXFOE-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- PSUKBUSXHYKMLU-UHFFFAOYSA-N triethoxy-[4-(7-oxabicyclo[4.1.0]heptan-4-yl)butyl]silane Chemical compound C1C(CCCC[Si](OCC)(OCC)OCC)CCC2OC21 PSUKBUSXHYKMLU-UHFFFAOYSA-N 0.000 description 1
- LFBULLRGNLZJAF-UHFFFAOYSA-N trimethoxy(oxiran-2-ylmethoxymethyl)silane Chemical compound CO[Si](OC)(OC)COCC1CO1 LFBULLRGNLZJAF-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- FNBIAJGPJUOAPB-UHFFFAOYSA-N trimethoxy-[1-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)C(CC)OCC1CO1 FNBIAJGPJUOAPB-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- ZNXDCSVNCSSUNB-UHFFFAOYSA-N trimethoxy-[2-(oxiran-2-ylmethoxy)ethyl]silane Chemical compound CO[Si](OC)(OC)CCOCC1CO1 ZNXDCSVNCSSUNB-UHFFFAOYSA-N 0.000 description 1
- HTVULPNMIHOVRU-UHFFFAOYSA-N trimethoxy-[2-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CC(C)OCC1CO1 HTVULPNMIHOVRU-UHFFFAOYSA-N 0.000 description 1
- ZQPNGHDNBNMPON-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)butyl]silane Chemical compound CO[Si](OC)(OC)CCC(C)OCC1CO1 ZQPNGHDNBNMPON-UHFFFAOYSA-N 0.000 description 1
- ZOWVSEMGATXETK-UHFFFAOYSA-N trimethoxy-[4-(7-oxabicyclo[4.1.0]heptan-4-yl)butyl]silane Chemical compound C1C(CCCC[Si](OC)(OC)OC)CCC2OC21 ZOWVSEMGATXETK-UHFFFAOYSA-N 0.000 description 1
- OBROYCQXICMORW-UHFFFAOYSA-N tripropoxyalumane Chemical compound [Al+3].CCC[O-].CCC[O-].CCC[O-] OBROYCQXICMORW-UHFFFAOYSA-N 0.000 description 1
- WGIWBXUNRXCYRA-UHFFFAOYSA-H trizinc;2-hydroxypropane-1,2,3-tricarboxylate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O.[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O WGIWBXUNRXCYRA-UHFFFAOYSA-H 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 229940068475 zinc citrate Drugs 0.000 description 1
- 235000006076 zinc citrate Nutrition 0.000 description 1
- 239000011746 zinc citrate Substances 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/50—Multilayers
- B05D7/52—Two layers
- B05D7/54—No clear coat specified
- B05D7/544—No clear coat specified the first layer is let to dry at least partially before applying the second layer
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/14—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/50—Multilayers
- B05D7/56—Three layers or more
- B05D7/58—No clear coat specified
- B05D7/586—No clear coat specified each layer being cured, at least partially, separately
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/48—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
- C08G77/58—Metal-containing linkages
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
- C09D183/06—Polysiloxanes containing silicon bound to oxygen-containing groups
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31547—Of polyisocyanurate
Definitions
- the present invention relates to a process for the production of coating compositions and the compositions obtainable thereby.
- the invention further relates to layer systems comprising a substrate (S), a scratch-resistant layer (K) and a cover layer (D) produced from the coating composition according to the invention, and a method for producing these layer systems.
- sol-gel process it is possible to produce materials that are suitable as coatings from alkoxides such as aluminum propanolate or butanolate using modified alkoxysilanes.
- sol-gel processes are essentially characterized in that a mixture of the starting components by means of a hydrolysis and condensation process to give a viscous liquid
- This synthetic method forms an organically modified inorganic backbone that has an increased surface hardness compared to conventional organic polymers.
- a crucial disadvantage, however, is that due to the high reactivity of the aluminum-containing component, no high storage stability (pot life) can be achieved. Compared to inorganic
- the layers obtained are still relatively soft. This is due to the fact that the inorganic components in the system have a strong cross-linking effect, but due to their very small size the mechanical properties such as. B. Hardness and abrasion resistance do not apply. So-called filled polymers allow the favorable mechanical properties of the inorganic components to be fully exploited, since particle sizes of several micrometers are present. However, the transparency of the materials is lost and applications in the field of optics are no longer possible.
- the use of small particles of Si02 e.g. Aerosile ®
- the upper limit of the amount of filler is determined by the high surface reactivity of the small particles, which results in agglomerations or intolerable increases in viscosity.
- DE 199 52 040 A1 discloses substrates with an abrasion-resistant diffusion barrier layer system, the diffusion barrier layer system comprising a hard base layer based on hydrolyzable epoxysilanes and a cover layer arranged above it.
- the top layer is obtained by applying a coating sol of tetraethoxysilane (TEOS) and glycidyloxypropyltrimethoxysilane (GPTS) and curing the same at a temperature ⁇ 110 ° C.
- the coating sol is produced by pre-hydrolyzing and condensing TEOS with ethanol as solvent in HCl acidic aqueous solution.
- GPTS is then stirred into the thus pre-hydrolyzed TEOS and the sol is stirred at 50 ° C.
- a disadvantage of the coating sol described in this publication is its low storage stability (pot life), as a result of which the coating sol must be processed further within a few days after its production.
- Another disadvantage of the diffusion barrier systems described in this document is that they have unsatisfactory results after the Taber wear test for use in automotive glazing.
- compositions can additionally
- Lewis bases alcoholates of titanium, zirconium or aluminum may be included.
- the compositions are made by the sol-gel process by prehydrolyzing GPTS and TEOS in HCl acid solution together, using no more than about 0.5 moles of water per mole of hydrolyzable group. After hydrolysis, Böhmitsol is added to the composition with ice cooling.
- the inspection compositions serve for the production of scratching tight layers. The overcoating of the scratch-resistant layer with a further cover layer is not described in this document.
- the invention is based on the object of an organically modified inorganic system whose hardness is significantly higher than that of the materials described in the prior art and which has high optical transparency.
- the system should also enable the production of stable, coatable intermediates with properties that are constant over time and the setting of variable surface physical and surface chemical properties such as Hydrophilicity or hydrophobicity in combination with oleophobia.
- the present invention has for its object to provide a composition with even more improved scratch resistance, adhesion, paint viscosity and elasticity, which has a lower tendency to gel and cloud compared to the compositions of the prior art.
- M is an element or a compound selected from the group consisting of Si, Ti, Zr, Sn, Ce, Al, B, VO, In and Zn
- R represents a hydrolyzable radical and m is an integer from 2 to 4, alone or together with
- R is an alkyl group, an alkenyl group, an aryl group or a hydrocarbon group with one or more halogen groups, an epoxy group, a glycidyloxy group, an amino group, a mercapto group, a methacryloxy group or represents a cyano group and a and b independently of one another have the values 1 to 3, the sum of a and b being four,
- the hydrolysis is carried out in the presence of at least 0.6 mol of water, in particular 0.8 to 2.0 mol of water, based on 1 mol of hydrolyzable radicals R.
- complete hydrolysis is carried out by using at least an equimolar amount of water, based on the hydrolyzable radicals.
- the compounds of the formulas I and II can be used in any amount.
- the compound of the formula II is preferably used in an amount of less than 0.7 mol, in particular less than 0.5 mol, based on 1 mol of the compound of the formula I.
- the hydrolysis is preferably carried out in the presence of acids, in particular aqueous hydrochloric acid.
- a pH of the reaction mixture of 2.0 to 5.0 is particularly suitable.
- the hydrolysis reaction is slightly exothermic and is preferably supported by heating to 30 to 40 ° C.
- the reaction product is preferably cooled to room temperature and stirred at room temperature for some time, in particular 1 to 3 hours.
- the coating composition obtained is preferably stored at temperatures ⁇ 10 ° C., in particular at a temperature of about 4 ° C.
- All temperature information includes a deviation of ⁇ 2 ° C.
- a room temperature is understood to be a temperature of 20 to 23 ° C.
- the overcoating sol is produced from 100 parts of a compound of the formula I and / or a hydrolysis product thereof and a compound of the formula II and / or a hydrolysis product thereof, the amount of the compound II, based on the 100 parts of the compound I, being less is less than 100 parts, preferably less than 70 parts, in particular less than 50 parts, or is completely omitted.
- the ready-to-apply top layer coating composition preferably has a solids content of 0.2 to 5%, in particular 0.5 to 3%.
- the compound of the formula I is preferably a compound
- M stands for a) Si +4 , Ti +4 , Zr +4 , Sn +4 , Ce +4 or b) Al +3 , B +3 , VO +3 ,
- R represents a hydrolyzable radical and m in the case of tetravalent elements M [case a)] 4, in the case of trivalent elements or compounds M [case b)] 3, and in the case of divalent elements [case c)] 2.
- Preferred elements for M are Si +4 , Ti +4 , Ce +4 and Al +3 , Si +4 is particularly preferred.
- hydrolyzable radicals examples include halogen (F, CI, Br and I, in particular 01 and Br), alkoxy (especially C ⁇ - alkoxy such as methoxy, ethoxy, n-propoxy, i-propoxy and n-butoxy, i-butoxy, sec-butoxy or tert-Bu.toxy), aryloxy (especially C 6-1 o-aryloxy, for example phenoxy), acyloxy (in particular C 1- acyloxy, for example acetoxy and propionyloxy) and alkylcarbonyl (for example acetyl).
- Particularly preferred hydrolyzable radicals are alkoxy groups, in particular
- TiCl 4 Ti (0C 2 H 5 ) 4 , Ti (OC 3 H 7 ) 4 , Ti (0-iC 3 H 7 ) 4 , Ti (OC 4 H 9 ) 4 , Ti (2-ethylhexoxy) 4 ;
- VOCl 3 VO (OCH 3 ) 3 ,
- radicals R can be the same or different and stand for a hydrolyzable group, preferably for an alkoxy group having 1 to 4 carbon atoms, in particular for methoxy, ethoxy, n-propoxy, i-propoxy, n- Butoxy, i-butoxy, sec-butoxy or tert-butoxy.
- tetraalkoxysilane in particular tetraethoxysilane (TEOS), is very particularly preferred.
- the compound of the formula II is preferably a compound
- RbSiR ' a II wherein the radicals R and R are identical or different (preferably identical), R is a hydrolyzable group (preferably C 1- alkoxy and in particular methoxy and ethoxy) and R is an alkyl group, an alkenyl group, an aryl group or a hydrocarbon group with one or several halogen groups, an epoxy group, a glycidyloxy group, an amino group, a mercapto group, a methacryloxy group or a cyano group.
- R is a hydrolyzable group (preferably C 1- alkoxy and in particular methoxy and ethoxy) and R is an alkyl group, an alkenyl group, an aryl group or a hydrocarbon group with one or several halogen groups, an epoxy group, a glycidyloxy group, an amino group, a mercapto group, a methacryloxy group or a cyano group.
- a can have the values 1 to 3 and b also the values 1 to 3
- Trialkoxysilanes, triacyloxysilanes and Triphenoxysilane such as methyl trimethoxysilane, triacetoxysilane methyltriethoxysilane, methyltrimethoxyethoxysilane, methyl, methyltributoxysilane, ethyltrimethoxysilane, ethyltriethoxysilane, vinyltrimethoxysilane, vinyltriethoxysilane, vinyltriacetoxysilane, vinyltri methoxyethoxysilane, oxysilane phenyltrimethoxysilane, phenyltriethoxysilane, Phenyltriacet-, ⁇ -chloropropyltrimethoxysilane, ⁇ -chloropropyltriethoxysilane , 3, 3, 3-Chlorpropyltriacetoxysilan -Trifluorpropyltrimethoxysilan ⁇ , ⁇ -methacryl
- aminoethyl (aminoethyl) - ⁇ -aminopropyltrimethoxysilane, beta-cyanoethyltriethoxysilane, methyltriphenoxysilane, chloromethyltrimethoxysilane, chloromethyltriethoxysilane .
- Glycidoxymethyltrimethoxysilane glycidoxymethyltriethoxysilane, ⁇ -Glycidoxyehtyltrimethoxysilan, ⁇ -Glycidoxyehtyltriethoxysilan, beta-glycidoxyethyltrimethoxysilane, beta-glycidoxyethyltriethoxysilane, ⁇ -glycidoxypropyltrimethoxysilane, ⁇ -glycidoxypropyltriethoxysilane, beta-glycidoxypropyltrimethoxysilane, beta-glycidoxypropyltriethoxysilane, ⁇ -glycidoxypropyltrimethoxysilane, ⁇ -glycidoxypropyltriethoxysilane, ⁇ -glycidoxypropyltrimethoxysilane, ⁇ -glycidoxypropyltriethoxysilane, ⁇ -Glycidoxypro ⁇ y
- Preferred compounds of the formula II are methyltrialkoxysilane, dimethyldialkoxysilane, glycidyloxypropyltrialkoxysilane and / or methacryloxypropyltrimethoxysilane.
- Particularly preferred compounds of the formula II are glycidyloxypropyltrimethoxysilane (GPTS), methyltriethoxysilane (MTS) and / or methacryloxypropyltrimethoxysilane (MPTS).
- water and inert solvents or solvent mixtures can optionally be added at any stage of the preparation, in particular during the hydrolysis.
- solvents are preferably alcohols which are liquid at room temperature and, moreover, are also formed during the hydrolysis of the alkoxides which are preferably used.
- Particularly preferred alcohols are C 1-8 alcohols, especially methanol, efhanol, n-propanol, i-propanol, n-butanol, i-butanol, tert-butanol, n-pentanol, i-pentanol, n-hexanol, n-octanol.
- C 1-6 glycol ethers especially n-butoxyethanol.
- Isopropanol, efhanol, butanol and / or water are particularly suitable as solvents.
- the compositions can furthermore contain customary additives such as, for example, dyes, leveling agents, UV stabilizers, IR stabilizers, photoinitiators, photosensitizers (if photochemical curing of the composition is intended) and / or thermal polymerization catalysts.
- Leveling agents are in particular those based on polyether-modified polydimethylsiloxanes. It has proven to be particularly advantageous if the viewing compositions contain leveling agents in an amount of about 0.005 to 2% by weight.
- the coating composition thus produced can be used for coating a wide variety of substrates.
- the choice of substrate materials for coating is not limited.
- the compositions are preferably suitable for coating wood, textiles, paper, stone goods, metals, glass, ceramics and plastics, and in particular are particularly suitable for coating thermoplastics, as described in Becker / Braun, Kunststoff Taschenbuch, Carl Hanser
- compositions are particularly suitable for coating transparent thermoplastics and preferably polycarbonates.
- Spectacle lenses, optical lenses, automobile lenses and plates in particular can be coated with the compositions obtained according to the invention.
- Application to the substrate is carried out using standard coating processes such as Dipping, flooding, brushing, brushing, knife coating, rolling, spraying, falling film application, spin coating and spinning.
- the coated substrate is cured.
- the curing preferably takes place thermally at temperatures in the range from 50 to 200 ° C., in particular 70 to 180 ° C. and particularly preferably 90 to 150 ° C. Under these conditions, the curing time should be 30 to 200 minutes, preferably 45 to 120 minutes.
- the layer thickness of the hardened cover layer should be 0.05 to 5 ⁇ m, preferably 0.1 to 3 ⁇ m be.
- curing can also be carried out by irradiation, which may be followed by thermal curing.
- the coating compositions produced by the process according to the invention are particularly suitable for the production of cover layers (D) in scratch-resistant coating systems.
- the coating compositions produced by the process according to the invention are particularly suitable for application to scratch-resistant layers
- scratch-resistant layers (K) based on hydrolyzable silanes with epoxy groups.
- Preferred scratch-resistant layers (K) are those which are obtainable by curing a coating composition comprising a polycondensate based on at least one silane which has been prepared by the sol-gel process and which has an epoxy group on a non-hydrolyzable substituent and, if appropriate, a curing catalyst selected from Lewis bases and alcoholates from titanium, zircon or aluminum.
- the production and properties of such scratch-resistant layers (K) are described for example in DE 43 38 361 AI.
- Scratch-resistant layers (K) which are overcoated with the coating agent produced by the process according to the invention are preferably those which contain a coating composition
- Such coating compositions result in highly scratch-resistant coatings that adhere particularly well to the material.
- the compounds (A) to (D) are explained in more detail below.
- the compounds (A) to (D) can be contained not only in the composition for the scratch-resistant layer (K), but also as an additional component (s) in the composition for the cover layer (D).
- the silicon compound (A) is a silicon compound which has 2 or 3, preferably 3, hydrolyzable radicals and one or 2, preferably one, non-hydrolyzable radical. The only or at least one of the two non-hydrolyzable residues has an epoxy group.
- hydrolyzable residues examples include halogen (F, CI, Br and I, especially CI and Br), alkoxy (especially C - ⁇ - alkoxy such as methoxy, ethoxy, n-propoxy, i-propoxy and n-butoxy, i- butoxy, sec-butoxy and tert-butoxy), aryloxy (in particular C o -io-aryloxy, for example phenoxy), acyloxy (in particular C 1-4 -acyloxy, for example acetoxy and propionyloxy) and alkylcarbonyl (for example acetyl).
- Particularly preferred hydrolyzable radicals are alkoxy groups, especially methoxy and ethoxy.
- non-hydrolyzable radicals without an epoxy group are hydrogen,
- Alkyl especially C 1-4 alkyl (such as methyl, ethyl, propyl and butyl), alkenyl (especially C 2-4 alkenyl such as vinyl, 1-propenyl, 2-propenyl and butenyl),
- Alkynyl especially C - -AJJ nyl such as acetylenyl and propargyl
- aryl in particular C 6-1 o-aryl such as phenyl and naphthyl
- substituents such as halogen and alkoxy.
- Methacrylic and methacryloxypropyl residues can also be mentioned in this connection.
- non-hydrolyzable radicals with an epoxy group are, in particular, those which have a glycidyl or glycidyloxy group.
- silicon compounds (A) which can be used according to the invention can e.g. pages 8 and 9 of EP-A-195 493, the
- Silicon compounds (A) which are particularly preferred according to the invention are those of the general formula
- radicals R are identical or different (preferably identical) and represent a hydrolyzable group (preferably C 1- alkoxy and particular methoxy and ethoxy) and R 'is a glycidyl- or glycidyloxy- (C ⁇ - 2 o) -alkylene-
- R represents the rest, in particular ß-glycidyloxyethyl, ⁇ -glycidyloxypropyl, ⁇ -glycidyl-oxybutyl, ⁇ -glycidyloxypentyl, ⁇ -glycidyloxyhexyl, ⁇ -glycidyloxyoctyl, ⁇ -glycidyl-oxy-nonyl-, ⁇ -glycidyl -Glycidyloxydodecyl- and 2- (3,4-E ⁇ oxycyclohexyl) - ethyl.
- GPTS y-glycidyloxypropyltrimethoxysilane
- the particulate materials (B) are an oxide, hydrated oxide, nitride or carbide of Si, Al and B and of transition metals, preferably Ti, Zr and Ce, with a particle size in the range from 1 to 100, preferably 2 to
- nm and particularly preferably 5 to 20 nm and mixtures thereof can be used in the form of a powder, but are preferably used in the form of a (in particular acid-stabilized) sol.
- Preferred particulate materials are Böh it, Si0 2 , Ce0 2 , ZnO, In 2 0 3 and Ti0 2 .
- Nanoscale boehmite particles are particularly preferred.
- the particulate materials are commercially available in the form of powders and the production of (acid stabilized) sols therefrom is also known in the art.
- the principle of stabilizing nanoscale titanium nitride using guanidine propionic acid is described, for example, in German patent application DE-
- the variation of the nanoscale particles is usually accompanied by a variation in the refractive index of the corresponding materials.
- the replacement of boehmite particles by Ce0 2 , Zr0 or Ti0 2 particles leads to materials with higher refractive indices, the refractive index according to the Lorentz-Lorenz equation being additively derived from the volume of the high refractive index component and the matrix.
- cerium dioxide can be used as the particulate material. This preferably has a particle size in the range from 1 to 100, preferably 2 to 50 nm and particularly preferably 5 to 20 nm. This material can be in the form of a
- Powder are used, but is preferably in the form of a (in particular acid-stabilized) sols used.
- Particulate cerium oxide is commercially available in the form of sols and powders, and the production of (acid-stabilized) sols therefrom is also known in the art.
- Compound (B) is preferably used in the composition for the scratch-resistant layer (K) in an amount of 3 to 60% by weight, based on the solids content of the coating agent for the scratch-resistant layer (K).
- silicon compounds (A) In addition to the silicon compounds (A), other hydrolyzable compounds of elements from the group consisting of Si, Ti, Zr, Al, B, Sn and V are also used to produce the scratch-resistant coating composition, and preferably with the silicon compound (s) (A) hydrolyzed.
- the compound (C) is a compound of Si, Ti, Zr, B, Sn and V of the general formula
- R represents a hydrolyzable radical
- R represents a non-hydrolyzable radical
- x can be 1 to 4 in the case of tetravalent metal atoms M (case a)) and 1 to 3 in the case of trivalent metal atoms M (case b)). If several radicals R and / or R in one
- Compound (C) are present, then they can each be the same or different.
- X is preferably greater than 1. That is, the compound (C) has at least one, preferably a plurality of hydrolyzable radicals.
- hydrolyzable radicals examples include halogen (F, CI, Br and 1, in particular
- alkoxy especially C 1- alkoxy such as methoxy, ethoxy, n-propoxy, i-propoxy and n-butoxy, i-butoxy, sec-butoxy or tert-butoxy
- aryloxy in particular C 6-1 o-aryloxy, for example phenoxy
- acyloxy in particular C 1- -acyloxy as for example Acetoxy and propionyloxy
- alkylcarbonyl e.g. acetyl
- Particularly preferred hydrolyzable radicals are alkoxy groups, especially methoxy and ethoxy.
- non-hydrolyzable radicals are hydrogen, alkyl, especially C 1- alkyl (such as methyl, ethyl, propyl and n-butyl, i-butyl, sec-butyl and tert-butyl), alkenyl (especially C 2- Alkenyl such as vinyl, 1-propenyl, 2-propenyl and butenyl), alkynyl (in particular C2- -alkynyl such as acetylenyl and propargyl) and
- Aryl in particular C ⁇ -io-aryl, such as phenyl and naphthyl
- the groups just mentioned may optionally have one or more substituents, such as halogen and alkoxy.
- substituents such as halogen and alkoxy.
- Methacrylic and methacryloxypropyl residues can also be mentioned in this connection.
- CH 2 - CH-Si (OC 2 H 4 OCH 3 ) 3
- CH 2 CH-CH 2 -Si (OCH 3 ) 3
- CH 2 CH-CH 2 -Si (OOCCH 3 ) 3
- CH 2 C (CH 3 ) -COO-C 3 H 7 -Si (OCH 3 ) 3 ,
- radicals R can be the same or different and represent a hydrolyzable group, preferably an alkoxy group having 1 to 4 carbon atoms, in particular methoxy, ethoxy, n-propoxy, i-propoxy, n -Butoxy, i-butoxy, sec-butoxy or tert-butoxy.
- these compounds (C) can also have non-hydrolyzable radicals which have a C-C double or triple bond.
- monomers preferably epoxy or hydroxyl group-containing
- Meth (acrylates) are incorporated (of course, these monomers can also have two or more functional groups of the same type, such as poly (meth) acrylates of organic polyols; the use of organic polyepoxides is also possible).
- the composition then undergoes polymerization of the organic species, as a result of which the crosslinking density and thus also the hardness of the corresponding coatings and moldings increase.
- compound (C) is preferably used in an amount of 0.2 to 1.2 mol, based on 1 mol of silicon compound (A).
- the hydrolyzable compound (D) is a compound of Ti, Zr or Al of the following general formula
- hydrolyzable groups examples include halogen (F, Cl, Br and I, particularly Cl and Br), alkoxy (especially C -.. 6 alkoxy such as methoxy, ethoxy, n-propoxy, i-propoxy and n -Butoxy, i-butoxy, sec-butoxy or tert-butoxy, n-pentyloxy, n-hexyloxy), aryloxy (in particular C 6 _o-aryloxy, for example phenoxy),
- Acyloxy especially C 1- acyloxy such as acetoxy and propionyloxy
- alkylcarbonyl e.g. acetyl
- C 1-6 alkoxy-C 2-3 alkyl group ie one derived from C 1-6 alkyl ethylene glycol or propylene glycol Group, where alkoxy has the same meaning as mentioned above.
- M aluminum and R "ethanolate, sec-butanolate, n-propanolate or n-butoxyethanolate are particularly preferred.
- Compound (D) is preferably used in the composition for the scratch-resistant layer (K) in an amount of 0.23 to 0.68 mol, based on 1 mol of silicon compound (A).
- a Lewis base (E) can additionally be used as a catalyst.
- a hydrolyzable silicon compound (F) with at least a non-hydrolyzable radical can be used which has 5 to 30 fluorine atoms bonded directly to carbon atoms, these carbon atoms being separated from Si by at least 2 atoms.
- the use of such a fluorinated silane means that the corresponding coating is additionally given hydrophobic and dirt-repellent properties.
- compositions for the scratch-resistant layer (K) can be produced by the process described in more detail below, in which a sol of the material (B) has a pH in the range from 2.0 to 6.5, preferably 2.5 to 4.0 , is reacted with a mixture of the other components.
- sols are even more preferably produced by a process which is also defined below, in which the sol as defined above is added in two portions to the mixture of (A) and (C), certain temperatures preferably being maintained, and the addition of (D) between the two
- Portions of (B) take place, likewise preferably at a certain temperature.
- the hydrolyzable silicon compound (A) can optionally be prehydrolyzed together with the compound (C) using an acidic catalyst (preferably at room temperature) in aqueous solution, preferably about
- Hydrochloric acid is preferably used as the catalyst for the pre-hydrolysis.
- the particulate materials (B) are preferably suspended in water and the pH is adjusted to 2.0 to 6.5, preferably to 2.5 to 4.0. Is preferred to
- Acidifying hydrochloric acid used When boehmite is used as the particulate material (B), a clear sol is formed under these conditions.
- the compound (C) is mixed with the compound (A).
- the first portion of the particulate material (B) suspended as described above is then added.
- the amount is preferably selected so that the water contained therein is sufficient for the semi-stoichiometric hydrolysis of the compounds (A) and (C). It is 10 to 70% by weight of the total amount, preferably 20 to
- the reaction is slightly exothermic. After the first exothermic reaction has subsided, the temperature is adjusted to about 28 to 35 ° C., preferably about 30 to 32 ° C. by tempering, until the reaction starts and an internal temperature is reached which is higher than 25 ° C., preferably higher than 30 ° C and more preferably higher than 35 ° C. After the end of the addition of the first portion of material (B), the temperature is maintained for 0.5 to 3 hours, preferably 1.5 to 2.5 hours, and then cooled to about 0 ° C. The remaining material (B) is preferably added slowly at a temperature of 0 ° C.
- the compound (D) and, if appropriate, the Lewis base (E) are also preferably added slowly after the addition of the first portion of the material (B) at about 0 ° C.
- the temperature is then kept at about 0 ° C. for 0.5 to 3 hours, preferably for 1.5 to 2.5 hours, before adding the second portion of the material (B).
- the remaining material (B) is slowly added at a temperature of approx. 0 ° C.
- the added dropwise solution is preferably pre-cooled to approximately 10 ° C. immediately before being added to the reactor.
- the cooling is preferably removed so that the reaction mixture is warmed up to a temperature of more than 15 ° C. (to room temperature) slowly without additional temperature control.
- inert solvents or solvent mixtures can optionally be added at any stage of the preparation.
- these solvents are the solvents already described at the beginning for the top layer composition.
- the scratch-resistant layer compositions can contain the usual additives already described at the beginning for the cover layer composition.
- the application and hardening of the scratch-resistant coating composition is preferably carried out thermally at 50 to 200 ° C., preferably 70 to 180 ° C. and in particular 110 to 130 ° C. Under these conditions, the curing time should be less than 120, preferably less than 90, in particular less than 60 minutes.
- the layer thickness of the hardened scratch-resistant layer (K) should be 0.5 to 30 ⁇ m, preferably 1 to 20 ⁇ m and in particular 2 to 10 ⁇ m.
- the invention also includes a layer system
- the substrate (S) is preferably plastic molded parts, sheets and foils, in particular based on polycarbonate.
- the layer systems according to the invention can be produced by a method which comprises at least the following steps:
- the scratch-resistant coating agent contains leveling agents in an amount of 0.03 to 1% by weight.
- the top layer coating composition is applied at a relative humidity of 50 to 75%, in particular 55 to 70%.
- the hardened scratch-resistant layer (K) is activated before the top layer coating agent is applied.
- Corona treatment, flame treatment, plasma treatment or chemical etching are preferred as activation processes. Flame treatment and corona treatment are particularly suitable.
- the primed polycarbonate sheets were then flooded with the basecat coating agent (example 1 or 2).
- the air drying time for dust drying was 30 minutes at 23 ° C and 63% relative humidity.
- the dust-dry plates were heated in an oven at 130 ° C for 30 minutes and then cooled to room temperature.
- the top coat coating agent (Example 3) was then also applied by flooding.
- the wet film was 30 minutes at 23 ° C and 63% Relative humidity and then the plates heated at 130 ° C for 120 minutes.
- the application parameters such as temperature, time, humidity, layer thickness, application method and the content and type of leveling agent used were varied for comparison.
- the coated plates were stored for two days at room temperature and then subjected to the following defined tests.
- the painted panels are cross-cut according to EN ISO 2409: 1994 and stored in water at 65 ° C.
- the storage time (days) from which the first loss of liability occurs in the tape test from 0 to 2 is recorded.
- Tables 1 to 9 The evaluation results are shown in Tables 1 to 9.
- Table 1 shows the wear (Taber values) and adhesion properties (cross-cut test) of the layer systems produced.
- the results show that the layer systems (Examples 4 and 5) equipped with the top layer (D) produced according to the invention have considerably better wear and adhesion properties than those which do not contain a top layer (D) (Comparative Examples 6 and 7).
- Table 2 shows the wetting and leveling properties of the top layer coating agent when applied to the scratch-resistant layer (K) and the wear properties (Taber values) of the resulting layer system as a function of the amount of leveling agent contained in the scratch-resistant coating agent , The results show that particularly good wetting and wear values are achieved when the leveling agent
- BYK 306 is contained in the scratch-resistant coating material in an amount of 0.05 to 0.2% by weight. Table 2
- Table 3 shows the wear properties (Taber values) of the layer systems as a function of the stoving time and temperature of the scratch-resistant layer (K). The results show that increasing the baking temperature to values greater than 110 ° C leads to an improvement in the Taber values.
- Table 4 shows the wear properties (Taber values) of the layer systems as a function of the solids content of the top layer (D). The results show that particularly good Taber values are achieved when the solids content in the top layer is 0.5 to 1.5% by weight.
- Table 5 shows the wear properties (Taber values) of the layer systems as a function of the type and amount of the flexibilizer contained in the top layer coating agent.
- the following were used as flexibilizers: glycidyloxypropyltrimethoxysilane (GPTS), methyltriethoxysilane (MTS) and dimethyldimethoxysilane (DMDMS).
- GPTS glycidyloxypropyltrimethoxysilane
- MTS methyltriethoxysilane
- DDMMS dimethyldimethoxysilane
- Table 6 shows the wetting and leveling properties of the top layer coating agent when applied to the scratch-resistant layer (K) and the wear properties (Taber values) of the resulting layer system as a function of the amount of leveling agent contained in the top layer coating agent.
- the results show that by using leveling agents BYK 347 and BYK 306 in an amount of at least 0.5% by weight, in particular 1-10% by weight, excellent Taber values are achieved with good wetting and leveling properties.
- Table 7 shows various physical properties of the layer systems as a function of the relative humidity when the top layer coating agent is applied to the scratch-resistant layer (K). The results show that a particularly good property profile is obtained when the top layer (D) is applied at a relative humidity of 50 to 75%, in particular 55 to 70%.
- Table 8 shows the wetting and leveling properties of the top layer coating agent when applied to the scratch-resistant layer (K) and the wear properties (Taber values) of the resulting layer systems as a function of the surface treatment (activation) of the scratch-resistant layer (K).
- the scratch-resistant layer, as in Example 2 was cured at 130 ° C. for 60 minutes and the top layer, as in Example 3, but with 0.3% BYK 306 as leveling agent.
- the application was carried out at 23 ° C and 40% relative humidity.
- the scratch-resistant layer as in Example 2 is cured at 130 ° C. for 60 minutes and the cover layer as in Example 3, but with 0.3% BYK 306 as leveling agent.
- the application was carried out at 23 ° C and 62% relative humidity. The results show that the wetting and wear properties are significantly improved by corona treatment or flame treatment of the scratch-resistant layer before the top layer is applied.
- Table 8 shows that the wetting and wear properties are significantly improved by corona treatment or flame treatment of the scratch-resistant layer
- the shelf life (pot life) of the top layer coating composition prepared by joint hydrolysis according to Example 3 was compared with the coating sol prepared by separate hydrolysis according to Example 2 of DE 199 52 040 A1. Furthermore, the wear properties (Taber values) of the layer systems produced with the two coating compositions were compared with one another. The scratch-resistant layer was produced and applied in accordance with Example 5.
- top layer coating compositions produced by the process according to the invention have a considerably improved storage stability (pot life) compared to the top layer coating compositions produced according to DE 199 52 040 A1.
- layer systems produced with the top layer coating compositions produced by the process according to the invention have improved wear properties (Taber values) compared to DE 199 52 040 A1.
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Wood Science & Technology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Geochemistry & Mineralogy (AREA)
- General Chemical & Material Sciences (AREA)
- Paints Or Removers (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Silicon Polymers (AREA)
Abstract
Description
Claims
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2002145729 DE10245729A1 (en) | 2002-10-01 | 2002-10-01 | Coating composition and process for its manufacture |
DE10245729 | 2002-10-01 | ||
PCT/EP2003/010756 WO2004031090A2 (en) | 2002-10-01 | 2003-09-26 | Scratch-resistant coating composition and method for the production thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
EP1551908A2 true EP1551908A2 (en) | 2005-07-13 |
Family
ID=32010027
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP03750644A Withdrawn EP1551908A2 (en) | 2002-10-01 | 2003-09-26 | Coating composition and method for the production thereof |
Country Status (10)
Country | Link |
---|---|
US (1) | US20040110012A1 (en) |
EP (1) | EP1551908A2 (en) |
JP (1) | JP2006501341A (en) |
KR (1) | KR20050059228A (en) |
CN (1) | CN100482721C (en) |
AU (1) | AU2003270281A1 (en) |
BR (1) | BR0306557A (en) |
DE (1) | DE10245729A1 (en) |
TW (1) | TW200413263A (en) |
WO (1) | WO2004031090A2 (en) |
Families Citing this family (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19909894A1 (en) | 1999-03-06 | 2000-09-07 | Basf Coatings Ag | Sol-gel coating for single-layer or multi-layer coatings |
DE19940858A1 (en) | 1999-08-27 | 2001-03-01 | Basf Coatings Ag | Sol-gel coating for single-layer or multi-layer coatings |
DE10200929A1 (en) * | 2002-01-12 | 2003-07-31 | Basf Coatings Ag | Polysiloxane brine, process for their preparation and their use |
EP1570715A1 (en) * | 2004-03-02 | 2005-09-07 | Eurochem N.V. | Seed pellets and soils for growing plants |
US7959980B2 (en) * | 2004-05-28 | 2011-06-14 | Ppg Industries Ohio, Inc. | Hydrophilic compositions, methods for their production, and substrates coated with such compositions |
US7354650B2 (en) * | 2004-05-28 | 2008-04-08 | Ppg Industries Ohio, Inc. | Multi-layer coatings with an inorganic oxide network containing layer and methods for their application |
DE102004046406A1 (en) * | 2004-09-24 | 2006-04-06 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Transparent coating composition and process for its preparation and correspondingly transparent coated substrates |
US7651560B2 (en) * | 2004-12-20 | 2010-01-26 | Koenig & Bauer Ag | Abhesive layer of cross-linked nanoparticles |
DE102005052939A1 (en) * | 2005-11-03 | 2007-05-10 | Degussa Gmbh | Production of coated substrates |
US7754801B2 (en) * | 2005-12-30 | 2010-07-13 | Columbia Insurance Company | Translucent coating compositions providing improved UV degradation resistance |
US20080102286A1 (en) * | 2006-10-30 | 2008-05-01 | Makoto Fukuda | Hydrophilic member and substrate for hydrophilic member |
JP5408857B2 (en) * | 2006-10-30 | 2014-02-05 | 富士フイルム株式会社 | Hydrophilic member and substrate for hydrophilic member |
US20080113188A1 (en) * | 2006-11-09 | 2008-05-15 | Shah Pratik B | Hydrophobic organic-inorganic hybrid silane coatings |
CZ301227B6 (en) * | 2007-06-07 | 2009-12-16 | Rokospol, A. S. | Composition for surface treatment of objects and building elements by applying protective layer exhibiting photocatalytic and self-cleaning activity and process for preparing and application thereof |
JP5177809B2 (en) * | 2007-07-02 | 2013-04-10 | 日東化成株式会社 | Curing catalyst for organic polymer and moisture curable composition containing the same |
JP5354511B2 (en) * | 2007-07-12 | 2013-11-27 | 日東化成株式会社 | Curing catalyst for organic polymer and moisture curable organic polymer composition containing the same |
WO2009004986A1 (en) * | 2007-07-02 | 2009-01-08 | Nitto Kasei Co., Ltd. | Curing catalyst for organic polymer and moisture-curable composition containing the same |
JP5354143B2 (en) * | 2007-07-12 | 2013-11-27 | 日東化成株式会社 | Curing catalyst for organic polymer and moisture curable composition containing the same |
EP2250226A4 (en) * | 2008-03-03 | 2012-05-23 | Univ Florida | Nanoparticle sol-gel composite hybride transparent coating materials |
DE102008040162A1 (en) | 2008-07-04 | 2010-01-07 | Evonik Degussa Gmbh | Scratch and abrasion resistant coatings on polymeric surfaces with catalytically accelerated hardening |
US7988778B2 (en) * | 2008-12-16 | 2011-08-02 | Cheng Uei Precision Industry Co., Ltd. | Method of making composite coating and product formed with the composite coating |
KR101104262B1 (en) * | 2008-12-31 | 2012-01-11 | 주식회사 노루홀딩스 | Article wih self-cleaning effect and method of preparation thereof |
JP5810662B2 (en) | 2011-06-17 | 2015-11-11 | 日産自動車株式会社 | Shift control device for automatic transmission |
CN103224720B (en) * | 2013-05-22 | 2015-09-30 | 广东雪莱特光电科技股份有限公司 | A kind of Nano aluminum oxide hydrosol paint and preparation method thereof |
JP6803836B2 (en) * | 2014-11-12 | 2020-12-23 | ユニバーシティー オブ ヒューストン システム | Weather-resistant, fungal-resistant and stain-resistant coatings, and how to apply to wood, brick or other porous materials |
JP6882170B2 (en) * | 2014-11-12 | 2021-06-02 | ユニバーシティー オブ ヒューストン システム | Fluorine-free stain-resistant, stain-resistant coatings, and methods of application on materials |
US10704191B2 (en) | 2014-11-12 | 2020-07-07 | University Of Houston System | Soil-resistant, stain-resistant coatings and methods of applying on textile or other flexible materials |
CN105907299B (en) * | 2016-06-16 | 2018-04-13 | 湖北鼎龙控股股份有限公司 | Resin lens coating composition and preparation method thereof |
DE102017211289A1 (en) | 2017-07-03 | 2019-01-03 | BSH Hausgeräte GmbH | Cooking, roasting, baking or grilling device with functional coating, as well as process for renewal of the coating |
US20210147691A1 (en) | 2018-04-27 | 2021-05-20 | Basf Coatings Gmbh | Surface-modified aluminum oxide hydroxide particles as rheology additives in aqueous coating agent compositions |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4368235A (en) * | 1980-01-18 | 1983-01-11 | General Electric Co. | Silicone resin coating composition |
US4373061A (en) * | 1980-05-30 | 1983-02-08 | General Electric Company | Silicone coating for unprimed plastic substrate and coated articles |
FR2523590B1 (en) * | 1982-03-16 | 1984-06-29 | Inst Nat Rech Chimique | BASIC LIQUID COMPOSITION SUITABLE FOR PRODUCING TRANSPARENT OR VARNISHED COATINGS ON SOLID SURFACES, PROCESS FOR OBTAINING VARNISHES AND VARNISHES THEREFROM |
JPH083074B2 (en) * | 1986-11-18 | 1996-01-17 | 東京応化工業株式会社 | Silica-based coating liquid |
DE4011044A1 (en) * | 1990-04-05 | 1991-10-10 | Fraunhofer Ges Forschung | SILANES, METHOD FOR THE PRODUCTION THEREOF AND THEIR USE FOR THE PRODUCTION OF POLYMERISATS AND POLYCONDENSATES |
DE4118184A1 (en) * | 1991-06-03 | 1992-12-10 | Inst Neue Mat Gemein Gmbh | COATING COMPOSITIONS BASED ON FLUORIC INORGANIC POLYCONDENSATES, THEIR PRODUCTION AND THEIR USE |
AU653825B2 (en) * | 1991-06-25 | 1994-10-13 | Itoh Optical Industrial Co., Ltd. | Coating composition for optical plastic moldings |
US5591380A (en) * | 1991-12-20 | 1997-01-07 | United Technologies Corporation | Preparation of alumina-silica sol gel compositions |
DE4338361A1 (en) * | 1993-11-10 | 1995-05-11 | Inst Neue Mat Gemein Gmbh | Process for the preparation of compositions based on silanes containing epoxy groups |
DE19804388C1 (en) * | 1998-02-04 | 1999-05-06 | Fraunhofer Ges Forschung | Liquid crystal polysiloxane barrier coating |
DE19840009A1 (en) * | 1998-09-02 | 2000-03-09 | Inst Neue Mat Gemein Gmbh | Process for the production of thermally deformed substrates coated with a sol-gel lacquer |
US20020061407A1 (en) * | 1998-12-29 | 2002-05-23 | Colton James P. | Abrasion resistant coating composition and coated articles |
JP4518622B2 (en) * | 1999-06-09 | 2010-08-04 | 株式会社キャステム | Coating material and food packaging film or sheet using the same |
US6451420B1 (en) * | 2000-03-17 | 2002-09-17 | Nanofilm, Ltd. | Organic-inorganic hybrid polymer and method of making same |
DE10018935A1 (en) * | 2000-04-17 | 2001-10-18 | Bayer Ag | Coating, useful as a protective layer on polycarbonate, wood and textiles, comprises an epoxy resin primer layer and an epoxide group containing hydrolysable silane scratch resistant covering layer. |
-
2002
- 2002-10-01 DE DE2002145729 patent/DE10245729A1/en not_active Withdrawn
-
2003
- 2003-09-26 BR BR0306557A patent/BR0306557A/en not_active Application Discontinuation
- 2003-09-26 EP EP03750644A patent/EP1551908A2/en not_active Withdrawn
- 2003-09-26 KR KR1020057005638A patent/KR20050059228A/en not_active Application Discontinuation
- 2003-09-26 WO PCT/EP2003/010756 patent/WO2004031090A2/en active Application Filing
- 2003-09-26 JP JP2004540727A patent/JP2006501341A/en active Pending
- 2003-09-26 AU AU2003270281A patent/AU2003270281A1/en not_active Abandoned
- 2003-09-26 CN CNB038236125A patent/CN100482721C/en not_active Expired - Fee Related
- 2003-09-29 US US10/673,903 patent/US20040110012A1/en not_active Abandoned
- 2003-10-01 TW TW92127131A patent/TW200413263A/en unknown
Non-Patent Citations (1)
Title |
---|
See references of WO2004031090A3 * |
Also Published As
Publication number | Publication date |
---|---|
CN1688640A (en) | 2005-10-26 |
DE10245729A1 (en) | 2004-04-15 |
KR20050059228A (en) | 2005-06-17 |
US20040110012A1 (en) | 2004-06-10 |
WO2004031090A3 (en) | 2004-06-17 |
AU2003270281A1 (en) | 2004-04-23 |
JP2006501341A (en) | 2006-01-12 |
AU2003270281A8 (en) | 2004-04-23 |
TW200413263A (en) | 2004-08-01 |
CN100482721C (en) | 2009-04-29 |
WO2004031090A2 (en) | 2004-04-15 |
BR0306557A (en) | 2004-11-30 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP1551908A2 (en) | Coating composition and method for the production thereof | |
EP1012212B1 (en) | Coating compounds based on silanes containing epoxide groups | |
DE60112656T2 (en) | Coating composition, coating method and coated article | |
EP1549700B1 (en) | Layer system and method for producing the same | |
DE60105665T2 (en) | Coating composition, coating method and coated articles | |
EP1549701A1 (en) | Method for producing a scratch-resistant layer system | |
WO1995013326A1 (en) | Process for the production of compounds based on silanes containing epoxy groups | |
EP1150782B1 (en) | Powder-coated substrates with top coat based on silanes containing epoxide groups | |
EP1137729B1 (en) | Powder-coated domestic appliances with a top coat based on epoxy silane | |
EP1012213B1 (en) | Coating compositions with a base consisting of silanes containing epoxide groups | |
DE10252421A1 (en) | Coating system, e.g. for polycarbonate panels or lenses, has an abrasion-resistant layer containing a silane-based polycondensate and a topcoat based on epoxyalkyl-silane and hydrolysable metal compounds | |
WO2001079368A2 (en) | Scratch-resistant coating | |
DE10325436A1 (en) | Process for the production of anti-fog scratch-resistant coating systems | |
DE19858998A1 (en) | Coating compositions containing cerium dioxide | |
JPH0764941B2 (en) | Transparent coated molding | |
JPS59161466A (en) | Multi-layered coating film | |
JPH11148048A (en) | Coating composition and plastic formed product |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 20050502 |
|
AK | Designated contracting states |
Kind code of ref document: A2 Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PT RO SE SI SK TR |
|
AX | Request for extension of the european patent |
Extension state: AL LT LV MK |
|
DAX | Request for extension of the european patent (deleted) | ||
RBV | Designated contracting states (corrected) |
Designated state(s): DE FR GB |
|
17Q | First examination report despatched |
Effective date: 20080909 |
|
GRAP | Despatch of communication of intention to grant a patent |
Free format text: ORIGINAL CODE: EPIDOSNIGR1 |
|
RTI1 | Title (correction) |
Free format text: SCRATCH-RESISTANT COATING COMPOSITION AND METHOD FOR THE PRODUCTION THEREOF |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION HAS BEEN WITHDRAWN |
|
18W | Application withdrawn |
Effective date: 20100401 |