EP1531042B1 - Précurseur de plaque d'impression lithographique sensible à la chaleur - Google Patents
Précurseur de plaque d'impression lithographique sensible à la chaleur Download PDFInfo
- Publication number
- EP1531042B1 EP1531042B1 EP20040105542 EP04105542A EP1531042B1 EP 1531042 B1 EP1531042 B1 EP 1531042B1 EP 20040105542 EP20040105542 EP 20040105542 EP 04105542 A EP04105542 A EP 04105542A EP 1531042 B1 EP1531042 B1 EP 1531042B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- heat
- printing plate
- lithographic printing
- hydrophilic
- plate precursor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Not-in-force
Links
- 238000007639 printing Methods 0.000 title claims description 62
- 239000002243 precursor Substances 0.000 title claims description 32
- 238000000576 coating method Methods 0.000 claims description 42
- 239000011248 coating agent Substances 0.000 claims description 37
- 230000002209 hydrophobic effect Effects 0.000 claims description 34
- -1 hydroxyalkyl methacrylate Chemical compound 0.000 claims description 29
- 238000000034 method Methods 0.000 claims description 29
- 229920001577 copolymer Polymers 0.000 claims description 19
- 239000000203 mixture Substances 0.000 claims description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 14
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims description 12
- 239000000178 monomer Substances 0.000 claims description 12
- 125000005647 linker group Chemical group 0.000 claims description 11
- 125000000217 alkyl group Chemical group 0.000 claims description 9
- 238000012545 processing Methods 0.000 claims description 9
- 125000003118 aryl group Chemical group 0.000 claims description 8
- 230000005660 hydrophilic surface Effects 0.000 claims description 8
- 239000006096 absorbing agent Substances 0.000 claims description 7
- 125000004122 cyclic group Chemical group 0.000 claims description 6
- 239000001257 hydrogen Substances 0.000 claims description 6
- 229910052739 hydrogen Inorganic materials 0.000 claims description 6
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 5
- 150000002148 esters Chemical class 0.000 claims description 5
- 125000001072 heteroaryl group Chemical group 0.000 claims description 5
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 claims description 4
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 claims description 4
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 claims description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims description 4
- 125000005250 alkyl acrylate group Chemical group 0.000 claims description 4
- 150000001408 amides Chemical class 0.000 claims description 4
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 claims description 4
- IMROMDMJAWUWLK-UHFFFAOYSA-N Ethenol Chemical compound OC=C IMROMDMJAWUWLK-UHFFFAOYSA-N 0.000 claims description 3
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 claims description 3
- 125000002947 alkylene group Chemical group 0.000 claims description 3
- 230000008569 process Effects 0.000 claims description 3
- OSSNTDFYBPYIEC-UHFFFAOYSA-N 1-ethenylimidazole Chemical compound C=CN1C=CN=C1 OSSNTDFYBPYIEC-UHFFFAOYSA-N 0.000 claims description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 claims description 2
- PRAMZQXXPOLCIY-UHFFFAOYSA-N 2-(2-methylprop-2-enoyloxy)ethanesulfonic acid Chemical compound CC(=C)C(=O)OCCS(O)(=O)=O PRAMZQXXPOLCIY-UHFFFAOYSA-N 0.000 claims description 2
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 claims description 2
- XHZPRMZZQOIPDS-UHFFFAOYSA-N 2-Methyl-2-[(1-oxo-2-propenyl)amino]-1-propanesulfonic acid Chemical compound OS(=O)(=O)CC(C)(C)NC(=O)C=C XHZPRMZZQOIPDS-UHFFFAOYSA-N 0.000 claims description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 2
- AGBXYHCHUYARJY-UHFFFAOYSA-N 2-phenylethenesulfonic acid Chemical compound OS(=O)(=O)C=CC1=CC=CC=C1 AGBXYHCHUYARJY-UHFFFAOYSA-N 0.000 claims description 2
- KGIGUEBEKRSTEW-UHFFFAOYSA-N 2-vinylpyridine Chemical compound C=CC1=CC=CC=N1 KGIGUEBEKRSTEW-UHFFFAOYSA-N 0.000 claims description 2
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 claims description 2
- 239000005977 Ethylene Substances 0.000 claims description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 claims description 2
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 claims description 2
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 claims description 2
- 150000003926 acrylamides Chemical class 0.000 claims description 2
- 125000000129 anionic group Chemical group 0.000 claims description 2
- 125000002091 cationic group Chemical group 0.000 claims description 2
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 claims description 2
- NLVXSWCKKBEXTG-UHFFFAOYSA-M ethenesulfonate Chemical compound [O-]S(=O)(=O)C=C NLVXSWCKKBEXTG-UHFFFAOYSA-M 0.000 claims description 2
- 239000001530 fumaric acid Substances 0.000 claims description 2
- 125000003010 ionic group Chemical group 0.000 claims description 2
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 claims description 2
- 239000011976 maleic acid Substances 0.000 claims description 2
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical class CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 claims description 2
- XJRBAMWJDBPFIM-UHFFFAOYSA-N methyl vinyl ether Chemical compound COC=C XJRBAMWJDBPFIM-UHFFFAOYSA-N 0.000 claims description 2
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 claims description 2
- IQFXJRXOTKFGPN-UHFFFAOYSA-N n-ethenyl-n-ethylethanamine Chemical compound CCN(CC)C=C IQFXJRXOTKFGPN-UHFFFAOYSA-N 0.000 claims description 2
- 229910052757 nitrogen Inorganic materials 0.000 claims description 2
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 2
- 229910052702 rhenium Inorganic materials 0.000 claims description 2
- 229910052703 rhodium Inorganic materials 0.000 claims description 2
- 150000003440 styrenes Chemical class 0.000 claims description 2
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 claims description 2
- 229920001567 vinyl ester resin Polymers 0.000 claims description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 2
- ZTWTYVWXUKTLCP-UHFFFAOYSA-N vinylphosphonic acid Chemical compound OP(O)(=O)C=C ZTWTYVWXUKTLCP-UHFFFAOYSA-N 0.000 claims description 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 3
- PVFYDPMTPBPRQA-UHFFFAOYSA-N 2-methylprop-2-enenitrile;prop-2-enenitrile Chemical compound C=CC#N.CC(=C)C#N PVFYDPMTPBPRQA-UHFFFAOYSA-N 0.000 claims 1
- 125000005399 allylmethacrylate group Chemical group 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 239000010410 layer Substances 0.000 description 26
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 18
- 238000006243 chemical reaction Methods 0.000 description 18
- 229920000642 polymer Polymers 0.000 description 14
- 239000002253 acid Substances 0.000 description 13
- 239000000976 ink Substances 0.000 description 13
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 13
- 239000000243 solution Substances 0.000 description 13
- 229910052782 aluminium Inorganic materials 0.000 description 12
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 12
- 239000000463 material Substances 0.000 description 12
- 230000015572 biosynthetic process Effects 0.000 description 10
- 239000010408 film Substances 0.000 description 10
- 229920000578 graft copolymer Polymers 0.000 description 10
- 101100533652 Homo sapiens SLIRP gene Proteins 0.000 description 9
- 102100025491 SRA stem-loop-interacting RNA-binding protein, mitochondrial Human genes 0.000 description 9
- 239000002245 particle Substances 0.000 description 9
- 239000002904 solvent Substances 0.000 description 9
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 8
- 238000003786 synthesis reaction Methods 0.000 description 8
- 239000011230 binding agent Substances 0.000 description 7
- 238000001035 drying Methods 0.000 description 7
- 239000012071 phase Substances 0.000 description 7
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 6
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 238000011282 treatment Methods 0.000 description 6
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 5
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 5
- 238000002679 ablation Methods 0.000 description 5
- 239000004411 aluminium Substances 0.000 description 5
- DNIAPMSPPWPWGF-UHFFFAOYSA-N monopropylene glycol Natural products CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 5
- SGVUHPSBDNVHKL-UHFFFAOYSA-N 1,3-dimethylcyclohexane Chemical compound CC1CCCC(C)C1 SGVUHPSBDNVHKL-UHFFFAOYSA-N 0.000 description 4
- 241001479434 Agfa Species 0.000 description 4
- RGSFGYAAUTVSQA-UHFFFAOYSA-N Cyclopentane Chemical compound C1CCCC1 RGSFGYAAUTVSQA-UHFFFAOYSA-N 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- 125000003277 amino group Chemical group 0.000 description 4
- 239000008119 colloidal silica Substances 0.000 description 4
- 239000004205 dimethyl polysiloxane Substances 0.000 description 4
- 239000000975 dye Substances 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 239000004615 ingredient Substances 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- CERQOIWHTDAKMF-UHFFFAOYSA-M methacrylate group Chemical group C(C(=C)C)(=O)[O-] CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 4
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 4
- 229920002451 polyvinyl alcohol Polymers 0.000 description 4
- 235000019422 polyvinyl alcohol Nutrition 0.000 description 4
- 239000011241 protective layer Substances 0.000 description 4
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- 229910019142 PO4 Inorganic materials 0.000 description 3
- 239000004372 Polyvinyl alcohol Substances 0.000 description 3
- 238000007743 anodising Methods 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 239000012530 fluid Substances 0.000 description 3
- 238000003384 imaging method Methods 0.000 description 3
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 3
- 235000021317 phosphate Nutrition 0.000 description 3
- 239000000049 pigment Substances 0.000 description 3
- 239000002985 plastic film Substances 0.000 description 3
- 229920006255 plastic film Polymers 0.000 description 3
- 229920001296 polysiloxane Polymers 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- 230000007704 transition Effects 0.000 description 3
- QGKMIGUHVLGJBR-UHFFFAOYSA-M (4z)-1-(3-methylbutyl)-4-[[1-(3-methylbutyl)quinolin-1-ium-4-yl]methylidene]quinoline;iodide Chemical compound [I-].C12=CC=CC=C2N(CCC(C)C)C=CC1=CC1=CC=[N+](CCC(C)C)C2=CC=CC=C12 QGKMIGUHVLGJBR-UHFFFAOYSA-M 0.000 description 2
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 description 2
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 2
- 229920002307 Dextran Polymers 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- 101100257194 Homo sapiens SMIM8 gene Proteins 0.000 description 2
- 101100537375 Homo sapiens TMEM107 gene Proteins 0.000 description 2
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 2
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- 102100024789 Small integral membrane protein 8 Human genes 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 102100036728 Transmembrane protein 107 Human genes 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 150000008064 anhydrides Chemical group 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 239000001913 cellulose Substances 0.000 description 2
- 229920002678 cellulose Polymers 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 238000000224 chemical solution deposition Methods 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- 230000006378 damage Effects 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 239000012153 distilled water Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 239000000499 gel Substances 0.000 description 2
- LEQAOMBKQFMDFZ-UHFFFAOYSA-N glyoxal Chemical compound O=CC=O LEQAOMBKQFMDFZ-UHFFFAOYSA-N 0.000 description 2
- DMEGYFMYUHOHGS-UHFFFAOYSA-N heptamethylene Natural products C1CCCCCC1 DMEGYFMYUHOHGS-UHFFFAOYSA-N 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 2
- 239000010452 phosphate Substances 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 229920002689 polyvinyl acetate Polymers 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 125000005373 siloxane group Chemical group [SiH2](O*)* 0.000 description 2
- 238000001542 size-exclusion chromatography Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- CMXIILNXYHCYPP-UHFFFAOYSA-N 1-(2-methoxyethoxy)propan-2-amine Chemical compound COCCOCC(C)N CMXIILNXYHCYPP-UHFFFAOYSA-N 0.000 description 1
- OVGRCEFMXPHEBL-UHFFFAOYSA-N 1-ethenoxypropane Chemical compound CCCOC=C OVGRCEFMXPHEBL-UHFFFAOYSA-N 0.000 description 1
- VBHXIMACZBQHPX-UHFFFAOYSA-N 2,2,2-trifluoroethyl prop-2-enoate Chemical compound FC(F)(F)COC(=O)C=C VBHXIMACZBQHPX-UHFFFAOYSA-N 0.000 description 1
- JDVGNKIUXZQTFD-UHFFFAOYSA-N 2,2,3,3,3-pentafluoropropyl prop-2-enoate Chemical compound FC(F)(F)C(F)(F)COC(=O)C=C JDVGNKIUXZQTFD-UHFFFAOYSA-N 0.000 description 1
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 1
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 1
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical group CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 1
- YTTFFPATQICAQN-UHFFFAOYSA-N 2-methoxypropan-1-ol Chemical compound COC(C)CO YTTFFPATQICAQN-UHFFFAOYSA-N 0.000 description 1
- SBVKVAIECGDBTC-UHFFFAOYSA-N 4-hydroxy-2-methylidenebutanamide Chemical compound NC(=O)C(=C)CCO SBVKVAIECGDBTC-UHFFFAOYSA-N 0.000 description 1
- YSFGBPCBPNVLOK-UHFFFAOYSA-N 6-hydroxy-2-methylhex-2-enamide Chemical compound NC(=O)C(C)=CCCCO YSFGBPCBPNVLOK-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-M Bicarbonate Chemical compound OC([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-M 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 description 1
- 108010010803 Gelatin Proteins 0.000 description 1
- CTKINSOISVBQLD-UHFFFAOYSA-N Glycidol Chemical compound OCC1CO1 CTKINSOISVBQLD-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 239000004354 Hydroxyethyl cellulose Substances 0.000 description 1
- 229920000663 Hydroxyethyl cellulose Polymers 0.000 description 1
- BJSKBZUMYQBSOQ-UHFFFAOYSA-N Jeffamine M-600 Chemical compound COCCOCC(C)OCC(C)OCC(C)OCC(C)OCC(C)OCC(C)OCC(C)OCC(C)OCC(C)N BJSKBZUMYQBSOQ-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- GYCMBHHDWRMZGG-UHFFFAOYSA-N Methylacrylonitrile Chemical compound CC(=C)C#N GYCMBHHDWRMZGG-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- CNCOEDDPFOAUMB-UHFFFAOYSA-N N-Methylolacrylamide Chemical compound OCNC(=O)C=C CNCOEDDPFOAUMB-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical class OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- 229920002472 Starch Polymers 0.000 description 1
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 229910001093 Zr alloy Inorganic materials 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 150000001241 acetals Chemical class 0.000 description 1
- HFBMWMNUJJDEQZ-UHFFFAOYSA-N acryloyl chloride Chemical compound ClC(=O)C=C HFBMWMNUJJDEQZ-UHFFFAOYSA-N 0.000 description 1
- 239000000443 aerosol Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 150000001346 alkyl aryl ethers Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 235000001014 amino acid Nutrition 0.000 description 1
- 150000001413 amino acids Chemical class 0.000 description 1
- 238000004873 anchoring Methods 0.000 description 1
- 238000002048 anodisation reaction Methods 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- 125000000732 arylene group Chemical group 0.000 description 1
- JPIYZTWMUGTEHX-UHFFFAOYSA-N auramine O free base Chemical compound C1=CC(N(C)C)=CC=C1C(=N)C1=CC=C(N(C)C)C=C1 JPIYZTWMUGTEHX-UHFFFAOYSA-N 0.000 description 1
- 238000000498 ball milling Methods 0.000 description 1
- AOJOEFVRHOZDFN-UHFFFAOYSA-N benzyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=CC=CC=C1 AOJOEFVRHOZDFN-UHFFFAOYSA-N 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 150000001720 carbohydrates Chemical class 0.000 description 1
- 235000014633 carbohydrates Nutrition 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 238000001311 chemical methods and process Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 150000008280 chlorinated hydrocarbons Chemical class 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000003776 cleavage reaction Methods 0.000 description 1
- 238000005345 coagulation Methods 0.000 description 1
- 230000015271 coagulation Effects 0.000 description 1
- 239000008199 coating composition Substances 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000000994 contrast dye Substances 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- ZXJXZNDDNMQXFV-UHFFFAOYSA-M crystal violet Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1[C+](C=1C=CC(=CC=1)N(C)C)C1=CC=C(N(C)C)C=C1 ZXJXZNDDNMQXFV-UHFFFAOYSA-M 0.000 description 1
- KBLWLMPSVYBVDK-UHFFFAOYSA-N cyclohexyl prop-2-enoate Chemical compound C=CC(=O)OC1CCCCC1 KBLWLMPSVYBVDK-UHFFFAOYSA-N 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- 239000001002 diarylmethane dye Substances 0.000 description 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 1
- 239000012954 diazonium Substances 0.000 description 1
- 150000001989 diazonium salts Chemical class 0.000 description 1
- 230000004069 differentiation Effects 0.000 description 1
- 150000002009 diols Chemical class 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- GMSCBRSQMRDRCD-UHFFFAOYSA-N dodecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCOC(=O)C(C)=C GMSCBRSQMRDRCD-UHFFFAOYSA-N 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- AFSIMBWBBOJPJG-UHFFFAOYSA-N ethenyl octadecanoate Chemical compound CCCCCCCCCCCCCCCCCC(=O)OC=C AFSIMBWBBOJPJG-UHFFFAOYSA-N 0.000 description 1
- UIWXSTHGICQLQT-UHFFFAOYSA-N ethenyl propanoate Chemical compound CCC(=O)OC=C UIWXSTHGICQLQT-UHFFFAOYSA-N 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 239000008273 gelatin Substances 0.000 description 1
- 229920000159 gelatin Polymers 0.000 description 1
- 235000019322 gelatine Nutrition 0.000 description 1
- 235000011852 gelatine desserts Nutrition 0.000 description 1
- 150000004676 glycans Chemical class 0.000 description 1
- 229940015043 glyoxal Drugs 0.000 description 1
- 229910003439 heavy metal oxide Inorganic materials 0.000 description 1
- 125000005549 heteroarylene group Chemical group 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 229920001480 hydrophilic copolymer Polymers 0.000 description 1
- 238000001027 hydrothermal synthesis Methods 0.000 description 1
- 150000001261 hydroxy acids Chemical class 0.000 description 1
- 235000019447 hydroxyethyl cellulose Nutrition 0.000 description 1
- 150000003949 imides Chemical group 0.000 description 1
- 229910001506 inorganic fluoride Inorganic materials 0.000 description 1
- 239000013067 intermediate product Substances 0.000 description 1
- 230000009878 intermolecular interaction Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000004816 latex Substances 0.000 description 1
- 229920000126 latex Polymers 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- FDZZZRQASAIRJF-UHFFFAOYSA-M malachite green Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1C(C=1C=CC=CC=1)=C1C=CC(=[N+](C)C)C=C1 FDZZZRQASAIRJF-UHFFFAOYSA-M 0.000 description 1
- 229940107698 malachite green Drugs 0.000 description 1
- 239000006224 matting agent Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- DZVCFNFOPIZQKX-LTHRDKTGSA-M merocyanine Chemical compound [Na+].O=C1N(CCCC)C(=O)N(CCCC)C(=O)C1=C\C=C\C=C/1N(CCCS([O-])(=O)=O)C2=CC=CC=C2O\1 DZVCFNFOPIZQKX-LTHRDKTGSA-M 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- VHRYZQNGTZXDNX-UHFFFAOYSA-N methacryloyl chloride Chemical compound CC(=C)C(Cl)=O VHRYZQNGTZXDNX-UHFFFAOYSA-N 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- ZQMHJBXHRFJKOT-UHFFFAOYSA-N methyl 2-[(1-methoxy-2-methyl-1-oxopropan-2-yl)diazenyl]-2-methylpropanoate Chemical compound COC(=O)C(C)(C)N=NC(C)(C)C(=O)OC ZQMHJBXHRFJKOT-UHFFFAOYSA-N 0.000 description 1
- 239000003094 microcapsule Substances 0.000 description 1
- DNTMQTKDNSEIFO-UHFFFAOYSA-N n-(hydroxymethyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NCO DNTMQTKDNSEIFO-UHFFFAOYSA-N 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 238000005935 nucleophilic addition reaction Methods 0.000 description 1
- HMZGPNHSPWNGEP-UHFFFAOYSA-N octadecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)C(C)=C HMZGPNHSPWNGEP-UHFFFAOYSA-N 0.000 description 1
- 238000007645 offset printing Methods 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 150000003009 phosphonic acids Chemical class 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- 150000003014 phosphoric acid esters Chemical class 0.000 description 1
- 125000005543 phthalimide group Chemical group 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920001921 poly-methyl-phenyl-siloxane Polymers 0.000 description 1
- 229920006289 polycarbonate film Polymers 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920006290 polyethylene naphthalate film Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920001228 polyisocyanate Polymers 0.000 description 1
- 239000005056 polyisocyanate Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920001282 polysaccharide Polymers 0.000 description 1
- 239000005017 polysaccharide Substances 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- 239000003755 preservative agent Substances 0.000 description 1
- 230000002335 preservative effect Effects 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- FBCQUCJYYPMKRO-UHFFFAOYSA-N prop-2-enyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC=C FBCQUCJYYPMKRO-UHFFFAOYSA-N 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 238000001552 radio frequency sputter deposition Methods 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 239000013557 residual solvent Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 230000007017 scission Effects 0.000 description 1
- 238000012216 screening Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000007928 solubilization Effects 0.000 description 1
- 238000005063 solubilization Methods 0.000 description 1
- 239000011877 solvent mixture Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 235000019698 starch Nutrition 0.000 description 1
- 239000008107 starch Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 125000000547 substituted alkyl group Chemical group 0.000 description 1
- 150000003890 succinate salts Chemical class 0.000 description 1
- 229940124530 sulfonamide Drugs 0.000 description 1
- 150000003456 sulfonamides Chemical class 0.000 description 1
- 125000001273 sulfonato group Chemical group [O-]S(*)(=O)=O 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 239000001117 sulphuric acid Substances 0.000 description 1
- 235000011149 sulphuric acid Nutrition 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 238000007651 thermal printing Methods 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 239000001003 triarylmethane dye Substances 0.000 description 1
- UBOXGVDOUJQMTN-UHFFFAOYSA-N trichloroethylene Natural products ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 description 1
- ROVRRJSRRSGUOL-UHFFFAOYSA-N victoria blue bo Chemical compound [Cl-].C12=CC=CC=C2C(NCC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 ROVRRJSRRSGUOL-UHFFFAOYSA-N 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
- 239000008207 working material Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1041—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by modification of the lithographic properties without removal or addition of material, e.g. by the mere generation of a lithographic pattern
Definitions
- the present invention relates to a heat-sensitive lithographic printing plate precursor.
- Lithographic printing typically involves the use of a so-called printing master such as a printing plate which is mounted on a cylinder of a rotary printing press.
- the master carries a lithographic image on its surface and a print is obtained by applying ink to said image and then transferring the ink from the master onto a receiver material, which is typically paper.
- ink as well as an aqueous fountain solution also called dampening liquid
- dampening liquid are supplied to the lithographic image which consists of oleophilic (or hydrophobic, i.e. ink-accepting, water-repelling) areas as well as hydrophilic (or oleophobic, i.e. water-accepting, ink-repelling) areas.
- driographic printing the lithographic image consists of ink-accepting and ink-abhesive (ink-repelling) areas and during driographic printing, only ink is supplied to the master.
- Printing masters are generally obtained by the so-called computer-to-film method wherein various pre-press steps such as typeface selection, scanning, color separation, screening, trapping, layout and imposition are accomplished digitally and each color selection is transferred to graphic arts film using an imagesetter.
- the film can be used as a mask for the exposure of an imaging material called plate precursor and after plate processing, a printing plate is obtained which can be used as a master.
- a typical photosensitive printing plate precursor for computer-to-film methods comprises a hydrophilic support and an image-recording layer which includes UV-sensitive compositions.
- a negative-working plate typically by means of a film mask in a UV contact frame
- the exposed image areas become insoluble and the unexposed areas remain soluble in an aqueous alkaline developer.
- the plate is then processed with the developer to remove the diazonium salt or diazo resin in the unexposed areas. So the exposed areas define the image areas (printing areas) of the printing master, and such printing plate precursors are therefore called 'negative-working'.
- positive-working materials wherein the exposed areas define the non-printing areas, are known, e.g. plates having a novolac/naphtoquinone-diazide coating which dissolves in the developer only at exposed areas.
- heat-sensitive printing plate precursors have become very popular.
- thermal materials offer the advantage of daylight-stability and are especially used in the so-called computer-to-plate method wherein the plate precursor is directly exposed, i.e. without the use of a film mask.
- the material is exposed to heat or to infrared light and the generated heat triggers a (physico-)chemical process, such as ablation, polymerization, insolubilization by cross-linking of a polymer or by particle coagulation of a thermoplastic polymer latex, and solubilization by the destruction of intermolecular interactions.
- Thermal plates which require no processing are also known; such plates are typically of the so-called ablative type, i.e. the differentiation between hydrophilic and oleophilic areas is produced by heat-induced ablation of one or more layers of the coating, so that at exposed areas a surface is revealed which has a different affinity towards ink or fountain than the surface of the unexposed coating.
- ablative plates A major problem associated with ablative plates, however, is the generation of ablation debris which may contaminate the electronics and optics of the exposure device and which needs to be removed from the plate by wiping it with a cleaning solvent, so that ablative plates are often not truly processless. Ablation debris which is deposited onto the plate's surface may also interfere during the printing process.
- US 5,893,328 , US 5,836,248 and US 5,836,249 disclose a printing material comprising a composite of zirconia alloy and ⁇ -alumina which can be imaged using similar exposure means to cause localized "melting" of the alloy in the exposed areas and thereby creating hydrophobic/oleophilic surfaces.
- a similar printing material containing an alloy of zirconium oxide and Yttrium oxide is described in US 5,870,956 .
- the high laser power output required in these prior art methods implies the use of expensive exposure devices.
- Another type of processless plates are printing plates based on a so-called "switching" reaction where a hydrophilic surface is irreversibly changed into an oleophilic surface or vice versa by imagewise exposure.
- EP 652 483 for example, describes a positive working printing plate based on an acid catalyzed cleavage of acid-labile groups pendant from a polymer backbone.
- EP 200 488 and US 4 081 572 describe negative working plates where a hydrophilic / hydrophobic conversion is obtained by a chemical reaction upon imagewise exposure to heat.
- processless plates are based on the thermally induced rupture of microcapsules and the subsequent reaction of the microencapsulated oleophilic materials (isocyanates) with functional (hydroxyl-)groups on cross-linked hydrophilic binders ( US 5,569,573 ; EP 646 476 ; W094/2395 ; WO98/29258 ).
- US 6 582 882 describes an imaging element comprising a graft copolymer having a hydrophobic backbone and a plurality of pendant hydrophilic groups or a plurality of pendant groups comprising hydrophilic and hydrophobic segments. Upon exposure of the imaging element to thermal energy, the exposed areas become less soluble in a developer than the unexposed areas.
- US 6 362 274 describes grafted copolymers comprising three sequences: one sequence for anchoring on solid particles such as pigments and fillers, one hydrophobic sequence and one hydrophilic sequence for using the copolymers in aqueous and/or organic medium.
- the disclosed copolymers are of particular interest in a wide range of paint formulations; there is no reference in the cited prior art document to lithographic printing plates.
- It is an aspect of the present invention to provide a heat sensitive lithographic printing plate precursor comprising on a support having a hydrophilic surface or which is provided with a hydrophilic layer, a coating comprising an infrared light absorbing agent and a copolymer, wherein said copolymer comprises a plurality of recurring units X having a hydrophilic polymeric pendant group and a plurality of recurring units Y having a hydrophobic polymeric pendant group.
- a heat sensitive lithographic printing plate precursor comprising on a support having a hydrophilic surface or which is provided with a hydrophilic layer, a coating comprising an infrared absorbing agent and a copolymer comprising a plurality recurring units X having a hydrophilic polymeric pendant group and a plurality of recurring units Y having a hydrophobic polymeric pendant group, said copolymer hereinafter also referred to as "double comb graftcopolymer” or "DC-graftcopolymer”.
- the recurring unit X having a hydrophilic polymeric pendant group and the recurring unit Y having a hydrophobic polymeric pendant group may be represented by the following formula's: wherein a' and c' are 0 or 1, wherein L 1 and L 2 independently represent a linking group, wherein R a , R b , R c , R d , R e and R f independently represent hydrogen, an alkyl such as methyl, ethyl, propyl, isopropyl, a cycloalkyl such as cyclopentane, cyclohexane, 1,3-dimethylcyclohexane, an aryl, a heteroaryl, a carboxylic acid, an ester of a carboxylic acid, an amide of a carboxylic acid, or an alkyl or aryl group which is substituted with a carboxylic acid, with an ester of a carboxylic acid or with an amide of a carboxylic acid, where
- the recurring units X and Y can be represented by the following formula's: wherein e and f are 0 or 1, wherein L 3 and L 4 independently represent a linking group, wherein R g , R h , R i and R j independently represent hydrogen, an alkyl such as methyl, ethyl, propyl, isopropyl, cycloalkyl such as cyclopentane, cyclohexane, 1,3-dimethylcyclohexane, aryl, or heteroaryl group, and wherein R 1 and R 2 represent respectively a hydrophilic polymeric pendant group and a hydrophobic polymeric pendant group.
- the linking groups L 1 , L 2 , L 3 and L 4 may independently represent a linking group selected form the group comprising alkylene, arylene, heteroarylene, -O-, -CO-, -CO-O-, -O-CO-, -CS-, -O-(CH 2 ) k -, -(CH 2 ) k -O-, -(CH 2 ) k -O-CO-, -O-CO-(CH 2 ) k -, -(CH 2 ) k -O-CO-(CH 2 ) 1 -, -(CH 2 ) k -COO-, -CO-O-(CH 2 ) k -,-(CH 2 ) k -COO-(CH 2 ) 1 -, -(CH 2 ) k -NH-, -NH-(CH 2 ) k -, -(CH 2 ) k -CONH-, -(CH
- L 1 and L 2 are further bound to respectively C 1 and C 2 and are trivalent groups.
- L 1 and L 2 include a nitrogen atom and form a cyclic structure; they are preferably independently represented by a linking group selected from the group comprising: -CO-N ⁇ co -, -(CH 2 ) k -N ⁇ , >N-(CH 2 ) k -, -(CH 2 ) k -CON ⁇ -, -(CH 2 ) k -CON ⁇ SO2 ->N-(CH 2 ) k -O-(CH 2 ) 1 -, -CO-N ⁇ , >N-CO-, >N-CO-O-, -O-CO-N ⁇ , -(CH 2 ) k -CO-N ⁇ , >N-CO-(CH 2 ) k -, >N-CO-NH-, >N-CS-NH-, or combinations thereof; wherein
- the hydrophilic polymeric pendant group comprises hydrophilic monomeric units which are polymerisable by an addition polymerisation or by a condensation polymerisation.
- the hydrophilic monomeric units are monomers which comprise an anionic, cationic or non-ionic group.
- hydrophilic monomers are selected from the group of alkylene oxides such as ethylene oxide, glycidol and propylene oxide, vinyl alcohol, acrylic acid, methacrylic acid, maleic acid, itaconic acid, crotonic acid, fumaric acid, hydroxyalkyl methacrylate such as hydroxyethyl methacrylate, hydroxyalkyl acrylate such as hydroxyethyl acrylate, vinylpyrolidone, acrylamides such as hydroxyethyl acrylamide, methacrylamides such as hydroxypropyl methacrylamide, vinyl methyl ether, vinyl sulfonate, vinylphosphonic acid, styrene sulfonic acid, sulphoethyl methacrylate, 2-acrylamido-2-methyl-1-propanesulfonic acid, or protonated or alkylated derivates of vinylpyridine, vinylimidazole or N-vinyl diethylamine.
- alkylene oxides such as
- the hydrophilic polymeric pendant group may also be selected from a polysaccharide, starch, a cellulose, a dextran, or derivate of cellulose or dextran.
- the hydrophobic polymeric pendant group comprise hydrophobic monomeric units which are polymerisable by an addition polymerisation or by a condensation polymerisation.
- Typical examples of recurring monomeric units having a hydrophilic polymeric pendant group are: wherein each R 3 and R 4 independently are represented by a hydrogen or an alkyl group such as methyl, n-butyl and sec-butyl, and each n by an integer > 3, and a and b by an integer > 1.
- hydrophobic monomeric units are selected from the group comprising siloxanes such as dimethylsiloxane, diphenylsiloxane and methylphenyl siloxane, perfluoroalkylethylene, alkylacrylates such as butylacrylate, 2-ethylhexylacrylate and cyclohexyl acrylate, alkyl methacrylates such as methyl methacrylate, butyl methacrylate, benzyl methacrylate, lauryl methacrylate and stearyl methacrylate, allyl methacrylate, fluorinated alkylacrylates such as trifluoroethylacrylate and pentafluoropropylacrylate, fluorinated alkylmethacrylates, ethylene, isoprene, butadiene, chlorinated or brominated monomers such as vinyl chloride or vinylidene chloride, vinyl esters such as vinyl propionate and vinyl stearate, vinyl ethers such
- Typical examples of recurring monomeric units having a hydrophobic polymeric pendant group are: wherein R 5 is represented by an alkyl group such as methyl, n-butyl and sec-butyl, and each m by an integer > 3.
- the DC-graftcopolymer comprises polyethylene oxide or a mixture of polyethylene oxide and polypropylene oxide as hydrophilic polymeric pendant group and polydimethylsiloxane or polymethylphenyl siloxane as hydrophobic polymeric pendant group.
- the DC-graftcopolymer can be prepared by several methods. In these methods, several intermediate products are previously prepared:
- a macromonomer C is copolymerised with a monomer having a reactive group G 5 , and, subsequently, B is further reacted wherein G 5 and G 2 form a covalent bound.
- a macromonomer D is copolymerised with a monomer having a reactive group G 6 , and, subsequently, A is further reacted wherein G 6 and G 1 form a covalent bound.
- a macromonomers C and D are copolymerised.
- the first and second methods are preferred, the second method is most preferred.
- the reactive groups G 1 to G 6 independently represent a group including an -OH group, an amine group, an anhydride group, an acid group, an acid chloride group or an isocyanate group.
- the reactive groups are defined in such a way that a chemical reaction is possible. For example, a reaction between an amine group as reactive group and an anhydride group as the other reactive group. Other combination are also possible.
- a polysiloxane B having an -OH group at the end of the chain can be obtained from several suppliers including Shinetsu, Itochu and Chisso.
- the polysiloxanes include any compound which contains more than one siloxane group -Si(R',R")-O-, wherein R' and R" are optionally substituted alkyl or aryl groups.
- Preferred siloxanes are phenylalkylsiloxanes and dialkylsiloxanes, e.g. phenylmethylsiloxanes and dimethylsiloxanes.
- the number of siloxane groups -Si(R',R")-O- is at least 2, preferably at least 10, more preferably at least 20. It may be less than 100, preferably less than 60.
- PDMS-MA Polydimethylsiloxane having a terminal methacrylate group
- Chisso M w 1000 g/mol, 94%
- Polydimethylsiloxane having a terminal methacrylate group with molecular weights of 5000 g/mol, 8000 g/mol, 10000 g/mol, and 160000 g/mol Higher molecular weights than 160000 g/mol or lower molecular weights than 1000 g/mol
- the polymers D can be synthesized by a reaction of a polysiloxane B having an -OH group at the end of the chain with acryloyl chloride or methacryloyl chloride.
- the products of polycondensation may also represent the recurring unit X comprising the polymeric hydrophilic pendant group and recurring unit Y comprising the polymeric hydrophobic pendant group.
- Polyesters and polyamides are for example obtained by a poycondensation reaction; polyesters can be prepared from diacids and diols, or from hydroxyacids, and polyamides can be prepared from diacids and diamines or from aminoacids.
- the coating of the heat-sensitive lithographic printing plate of the present invention switches from a hydrophilic state to a hydrophobic state upon exposure to heat and/or to infrared light.
- the same was observed when exposing the copolymer of the heat-sensitive lithographic printing plate of the present invention to heat.
- This conversion reaction is illustrated by an increase of the contact angle against water.
- the coating is applied ,for example, onto a glass substrate by spin cast coating.
- the glass substrate can be covered with more than one polymer monolayer.
- the contact angle against water changes from values ranging from 20 to 65 before exposure to heat and/or infrared light, to values ranging form 90 to 110 after the exposure.
- wet processing means a developing step wherein a liquid such as an aqueous solution or an aqueous alkaline solution is used.
- the support of the lithographic printing plate precursor has a hydrophilic surface or is provided with a hydrophilic layer.
- the support may be a sheet-like material such as a plate or it may be a cylindrical element such as a sleeve which can be slid around a print cylinder of a printing press.
- the support is a metal support such as aluminum or stainless steel.
- the support can also be a laminate comprising an aluminum foil and a plastic layer, e.g. polyester film.
- a particularly preferred lithographic support is an electrochemically grained and anodized aluminum support.
- the aluminium is preferably grained by electrochemical graining, and anodized by means of anodizing techniques employing phosphoric acid or a sulphuric acid/phosphoric acid mixture. Methods of both graining and anodization of aluminum are very well known in the art.
- both the adhesion of the printing image and the wetting characteristics of the non-image areas are improved.
- different type of grains can be obtained.
- the aluminium support By anodising the aluminium support, its abrasion resistance and hydrophilic nature are improved.
- the microstructure as well as the thickness of the Al 2 O 3 layer are determined by the anodising step, the anodic weight (g/m 2 Al 2 O 3 formed on the aluminium surface) varies between 1 and 8 g/m 2 .
- the grained and anodized aluminum support may be post-treated to improve the hydrophilic properties of its surface.
- the aluminum oxide surface may be silicated by treating its surface with a sodium silicate solution at elevated temperature, e.g. 95°C.
- a phosphate treatment may be applied which involves treating the aluminum oxide surface with a phosphate solution that may further contain an inorganic fluoride.
- the aluminum oxide surface may be rinsed with an organic acid and/or salt thereof, e.g. carboxylic acids, hydrocarboxylic acids, sulphonic acids or phosphonic acids, or their salts, e.g. succinates, phosphates, phosphonates, sulphates, and sulphonates.
- a citric acid or citrate solution is preferred. This treatment may be carried out at room temperature or may be carried out at a slightly elevated temperature of about 30 to 50°C.
- a further interesting treatment involves rinsing the aluminum oxide surface with a bicarbonate solution. Still further, the aluminum oxide surface may be treated with polyvinylphosphonic acid, polyvinylmethylphosphonic acid, phosphoric acid esters of polyvinyl alcohol, polyvinylsulfonic acid, polyvinylbenzenesulfonic acid, sulfuric acid esters of polyvinyl alcohol, and acetals of polyvinyl alcohols formed by reaction with a sulfonated aliphatic aldehyde. It is further evident that one or more of these post treatments may be carried out alone or in combination.
- the support can also be a flexible support, which is provided with a hydrophilic layer, hereinafter called 'base layer'.
- the flexible support is e.g. paper, plastic film, thin aluminum or a laminate thereof.
- Preferred examples of plastic film are polyethylene terephthalate film, polyethylene naphthalate film, cellulose acetate film, polystyrene film, polycarbonate film, etc.
- the plastic film support may be opaque or transparent.
- the base layer is preferably a cross-linked hydrophilic layer obtained from a hydrophilic binder cross-linked with a hardening agent such as formaldehyde, glyoxal, polyisocyanate or a hydrolyzed tetra-alkylorthosilicate.
- a hardening agent such as formaldehyde, glyoxal, polyisocyanate or a hydrolyzed tetra-alkylorthosilicate.
- the thickness of the hydrophilic base layer may vary in the range of 0.2 to 25 ⁇ m and is preferably 1 to 10 ⁇ m.
- the hydrophilic binder for use in the base layer is e.g.
- hydrophilic (co)polymer such as homopolymers and copolymers of vinyl alcohol, acrylamide, methylol acrylamide, methylol methacrylamide, acrylate acid, methacrylate acid, hydroxyethyl acrylate, hydroxyethyl methacrylate or maleic anhydride/vinylmethylether copolymers.
- the hydrophilicity of the (co)polymer or (co)polymer mixture used is preferably the same as or higher than the hydrophilicity of polyvinyl acetate hydrolyzed to at least an extent of 60% by weight, preferably 80% by weight.
- the amount of hardening agent, in particular tetraalkyl orthosilicate, is preferably at least 0.2 parts per part by weight of hydrophilic binder, more preferably between 0.5 and 5 parts by weight, most preferably between 1 parts and 3 parts by weight.
- the base layer may also comprise Al 2 O 3 and an optional binder.
- Deposition methods for the Al 2 O 3 onto the flexible support may be (i) physical vapor deposition including reactive sputtering, RF-sputtering, pulsed laser PVD and evaporation of aluminium, (ii) chemical vapor deposition under both vacuum and non-vacuum condition, (iii) chemical solution deposition including spray coating, dipcoating, spincoating, chemical bath deposition, selective ion layer adsorption and reaction, liquid phase deposition and electroless deposition.
- the Al 2 O 3 powder can be prepared using different techniques including flame pyrolisis, ball milling, precipitation, hydrothermal synthesis, aerosol synthesis, emulsion synthesis, sol-gel synthesis (solvent based), solution-gel synthesis (water based) and gasphase synthesis.
- the particle size of the Al 2 O 3 Powders can vary between 2 nm and 30 ⁇ m; more preferably between 100 nm and 2 ⁇ m.
- the hydrophilic base layer may also contain substances that increase the mechanical strength and the porosity of the layer.
- colloidal silica may be used.
- the colloidal silica employed may be in the form of any commercially available water dispersion of colloidal silica for example having an average particle size up to 40 nm, e.g. 20 nm.
- inert particles of larger size than the colloidal silica may be added e.g. silica prepared according to Stöber as described in J. Colloid and Interface Sci., Vol. 26, 1968, pages 62 to 69 or alumina particles or particles having an average diameter of at least 100 nm which are particles of titanium dioxide or other heavy metal oxides.
- hydrophilic base layers for use in accordance with the present invention are disclosed in EP 601240 , GB 1419512 , FR 2300354 , US 3971660 , and US 4284705 .
- the coating preferably also contains a compound which absorbs infrared light and converts the absorbed energy into heat.
- concentration of the IR absorbing compound in the coating is typically between 0.25 and 10.0 wt.%, more preferably between 0.5 and 7.5 wt.%.
- Preferred IR absorbing compounds are dyes such as cyanine and merocyanine dyes or pigments such as carbon black. Examples of suitable IR absorbers are described in e.g. EP 823327 , 978376 , 1029667 , 1053868 , 1093934 ; WO 97/39894 and 00/29214 .
- a preferred compound is the following cyanine dye :
- the protective layer generally comprises at least one water-soluble polymeric binder, such as polyvinyl alcohol, polyvinylpyrrolidone, partially hydrolyzed polyvinyl acetates, gelatin, carbohydrates or hydroxyethylcellulose, and can be produced in any known manner such as from an aqueous solution or dispersion which may, if required, contain small amounts, i.e. less than 5% by weight, based on the total weight of the coating solvents for the protective layer, of organic solvents.
- the thickness of the protective layer can suitably be any amount, advantageously up to 5.0 ⁇ m, preferably from 0.1 to 3.0 ⁇ m, particularly preferably from 0.15 to 1.0 ⁇ m.
- the coating may further contain additional ingredients.
- Preferred ingredients are e.g. additional binders, especially sulfonamide and phthalimide groups containing polymers, to improve the run length and chemical resistance of the plate. Examples of such polymers are those described in EP 933682 , EP 894622 and WO 99/63407 .
- colorants can be added such as dyes or pigments which provide a visible colour to the coating and which remain in the coating at unexposed areas so that a visible image is produced after exposure and processing. Typical examples of such contrast dyes are the amino-substituted tri- or diarylmethane dyes, e.g.
- any known method can be used.
- the above ingredients can be dissolved in a solvent mixture which does not react irreversibly with the ingredients and which is preferably tailored to the intended coating method, the layer thickness, the composition of the layer and the drying conditions.
- Suitable solvents include ketones, such as methyl ethyl ketone (butanone), as well as chlorinated hydrocarbons, such as trichloroethylene or 1,1,1-trichloroethane, alcohols, such as methanol, ethanol or propanol, ethers, such as tetrahydrofuran, glycol-monoalkyl ethers, such as ethylene glycol monoalkyl ether, e.g.
- 2-methoxy-1-propanol or propylene glycol monoalkyl ether and esters, such as butyl acetate or propylene glycol monoalkyl ether acetate. It is also possible to use a mixture which, for special purposes, may additionally contain solvents such as acetonitrile, dioxane, dimethylacetamide, dimethylsulfoxide or water.
- Any coating method can be used for applying one or more coating solutions to the hydrophilic surface of the support.
- a multi-layer coating can be applied by coating/drying each layer consecutively or by the simultaneous coating of several coating solutions at once.
- the volatile solvents are removed from the coating until the coating is self-supporting and dry to the touch.
- the residual solvent content may be regarded as an additional composition variable by means of which the composition may be optimised.
- Drying is typically carried out by blowing hot air onto the coating, typically at a temperature of at least 70°C, suitably 80-150°C and especially 90-140°C. Also infrared lamps can be used.
- the drying time may typically be 15-600 seconds.
- the printing plate precursor of the present invention can be image-wise exposed directly with heat, e.g. by means of a thermal head, or indirectly by infrared light, preferably near infrared light.
- the infrared light is preferably converted into heat by an IR light absorbing compound as discussed above.
- the heat-sensitive lithographic printing plate precursor of the present invention is preferably not sensitive to visible light.
- the coating is not sensitive to ambient daylight, i.e. visible (400-750 nm) and near UV light (300-400 nm) at an intensity and exposure time corresponding to normal working conditions so that the material can be handled without the need for a safe light environment.
- the printing plate precursor of the present invention can be exposed to infrared light by means of e.g. LEDs or a laser.
- the light used for the exposure is a laser emitting near infrared light having a wavelength in the range from about 750 to about 1500 nm, such as a semiconductor laser diode, a Nd:YAG or a Nd:YLF laser.
- the required laser power depends on the sensitivity of the image-recording layer, the pixel dwell time of the laser beam, which is determined by the spot diameter (typical value of modern plate-setters at 1/e 2 of maximum intensity : 10-25 ⁇ m), the scan speed and the resolution of the exposure apparatus (i.e. the number of addressable pixels per unit of linear distance, often expressed in dots per inch or dpi; typical value : 1000-4000 dpi).
- ITD plate-setters for thermal plates are typically characterized by a very high scan speed up to 1500 m/ and may require a laser power of several Watts.
- the Agfa Galileo T (trademark of Agfa Gevaert N.V.) is a typical example of a plate-setter using the ITD-technology.
- XTD plate-setters for thermal plates having a typical laser power from about 20 mW to about 500 mW operate at a lower scan speed, e.g. from 0.1 to 20 m/.
- the Creo Trendsetter plate-setter family (trademark of Creo) and the Agfa Excalibur plate-setter family (trademark of Agfa Gevaert N.V.) both make use of the XTD-technology.
- the known plate-setters can be used as an off-press exposure apparatus, which offers the benefit of reduced press down-time.
- XTD plate-setter configurations can also be used for on-press exposure, offering the benefit of immediate registration in a multi-color press. More technical details of on-press exposure apparatuses are described in e.g. US 5,174,205 and US 5,163,368 .
- the plate precursor according to the invention can, if required, then be post-treated with a suitable correcting agent or preservative as known in the art.
- a suitable correcting agent or preservative as known in the art.
- the layer can be briefly heated to elevated temperatures ("baking").
- bakeout agents As a result, the resistance of the printing plate to washout agents, correction agents and UV-curable printing inks also increases.
- thermal post-treatment is described, inter alia, in DE-A 14 47 963 and GB-A 1 154 749 .
- the printing plate thus obtained can be used for conventional, so-called wet offset printing, in which ink and an aqueous dampening liquid is supplied to the plate.
- Another suitable printing method uses so-called single-fluid ink without a dampening liquid.
- Single-fluid inks which are suitable for use in the method of the present invention have been described in US 4 045 232 ; US 4 981 517 and US 6 140 392 .
- the single-fluid ink comprises an ink phase, also called the hydrophobic or oleophilic phase, and a polyol phase as described in WO 00/32705 .
- PDMS-MA is purified by the following method: The PDMS-MA is purified by filtration over a two-layer comlumn of silica gel (20 cm) and aluminum oxide (Al2O3) using absolute chloroform as the mobile phase.
- Step 1 copolymerization of PDMS-MA and MSA to yield poly[PDMS-MA- co -MSA].
- Step 2 synthesis of poly[PDMS-MA- co -(MSA-graft-Jeffamine)]:
- the grafting reaction of Jeffamine M-1000 on poly[PDMS-MA-co-MSA] is a two step process, involving (i) the nucleophilic addition of the amine group to a carbonyl unit of the MSA rings to form an amic acid intermediate, and (ii) the formation of an cyclic imide with water expellation. Since both the steps require different reaction conditions the amic acid can be isolated and investigated. It turned out that the amic acid form was not stable against crosslinking in bulk and at ambient conditions, hence it had to be converted to the imide form ( Figure 1 gives a schematically representation of the reaction). wherein x, y and n are integers >1 and wherein R is H or methyl or a mixture of H and methyl.
- Double comb graftcopolymers [PDMS-MA- co -MSA]
- PDMS-MA- co -MSA Jeffamine M-1000 trietyl amine Acetic anhydride
- V xylene/DMF mg mg mg ml
- DC18 CMSA34 1 g 0.54 0.10 0.10 9
- DC20 CMSA35 1 g 1.14 0.15 0.18 9
- DC21 CMSA36 1 g 18.20 1.83 2.47 9 DC23 CMSA38 9 g 2300 3600 6300 84
- Thin films from double comb polymers DC 18, DC 20, DC 21 and DC 23 were prepared according to the following procedure: 0.2 ml of a 1 wt% polymer solution in toluene was spin casted on a glass substrate at 2000 revolutions/min for 1 minute. The contact angle ⁇ against water of the spin cast copolymer films on the glass substrate, were determined by means of sessile drop and annealing for 2 minutes at 150°C. The results are summarized in Table 3. Table 3: Contact angle ⁇ against water Double comb graftcopolymer ⁇ [°] at room temperature ⁇ [°] annealed at 150° DC18 20 100 DC20 41 98 DC21 62 101 DC23 40 98
- Table 3 clearly shows an increase in contact angle against water after annealing the substrate indicating a hydrophilic / hydrophobic conversion.
- Solution A containing double comb polymer DC 23 was combined with solution B containing 0,54% IR absorber (mixture of 0,27% PRO-JET 900NP + 0,27% PRO-JET 830NP, trademarks of Avecia).
- This coating solution was coated on a grained and anodized aluminum substrate heated at 40 °C and subsequently dried using a hair dryer.
- the compositions of the coatings are shown in Table 4.
- Table 4 Coating compositions.
- Example Nr. Solution A DC23 Solution B : 0.54%wt I.R. absorber* in toluene Coating ⁇ m wet thickness Coating after drying g/m 2 1 6 ml of a 2% DC23 1 ml 20 0,34 DC23 0,016 I.R.
- the coatings were exposed using an 830 nm IR laser (1000 mJ/cm 2 and at 4 m/s) and prints were obtained by using an off-set printer GTO 52 (available from Heidelberger Druckmaschinen AG). The printing results are shown in Table 5.
- the ink density is the optical density, measured by using a GretagMacbeth densitometer Type D19C. The values were corrected for the paper density.
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Claims (15)
- Un précurseur de plaque d'impression lithographique thermosensible comprenant sur un support ayant une surface hydrophile ou sur un support revêtu d'une couche hydrophile un revêtement contenant un agent absorbant les rayons infrarouges et un copolymère contenant une multitude d'unités structurales X et une multitude d'unités structurales Y, caractérisé en ce que X comprend un groupe latéral polymère hydrophile et Y comprend un groupe latéral polymère hydrophobe.
- Précurseur de plaque d'impression lithographique thermosensible selon la revendication 1, caractérisé en ce que l'unité structurale X répond à la formule suivante :a' et c' représentent 0 ou 1,L1 et L2 représentent, indépendamment l'un de l'autre, un groupe de liaison,Ra, Rb, Rc, Rd, Re et Rf représentent, indépendamment l'un de l'autre, un atome d'hydrogène, un groupe alkyle, un groupe cycloalkyle, un groupe aryle, un groupe hétéroaryle, un groupe acide carboxylique, un groupe ester d'un acide carboxylique, un groupe amide d'un acide carboxylique ou un groupe alkyle ou un groupe aryle substitué par un groupe acide carboxylique, un groupe ester d'un acide carboxylique ou un groupe amide d'un acide carboxylique,b' représente 0 ou 1 et si b'=0, L1 est également lié à C1 afin de former une structure cyclique,d' représente 0 ou 1 et si d'=0, L2 est également lié à C2 afin de former une structure cyclique,et R1 et R2 représentent respectivement un groupe latéral polymère hydrophile et un groupe latéral polymère hydrophobe.
- Précurseur de plaque d'impression lithographique thermosensible selon la revendication 2, caractérisé en ce que les groupes de liaison L1 et L2 formant une structure cyclique sont des groupes de liaison azotés.
- Précurseur de plaque d'impression lithographique thermosensible selon la revendication 2, caractérisé en ce que l'unité structurale X répond à la formule suivante :e représente 0 ou 1,L3 représente un groupe de liaison etRg et Rh représentent, indépendamment l'un de l'autre, un atome d'hydrogène, un groupe alkyle, un groupe cycloalkyle, un groupe aryle ou un groupe hétéroaryle.
- Précurseur de plaque d'impression lithographique thermosensible selon la revendication 2, caractérisé en ce que l'unité structurale Y répond à la formule suivante :f représente 0 ou 1,L4 représente un groupe de liaison etRi et Rj représentent, indépendamment l'un de l'autre, un atome d'hydrogène, un groupe alkyle, un groupe cycloalkyle, un groupe aryle ou un groupe hétéroaryle.
- Précurseur de plaque d'impression lithographique thermosensible selon l'une quelconque des revendications 1 à 4, caractérisé en ce que le groupe latéral polymère hydrophile comprend des unités monomères hydrophiles choisies parmi des monomères comprenant un groupe anionique, cationique ou non ionique.
- Précurseur de plaque d'impression lithographique thermosensible selon la revendication 6, caractérisé en ce que le monomère hydrophile est choisi parmi des oxydes d'alkylène, de l'alcool vinylique, de l'acide acrylique, de l'acide méthacrylique, de l'acide maléique, de l'acide itaconique, de l'acide crotonique, de l'acide fumarique, du méthacrylate d'hydroxyalkyle, de l'acrylate d'hydroxyalkyle, de la vinylpyrolidone, des acrylamides, des méthacrylamides, de l'acide vinylphosphonique, de l'acide styrènesulfonique, de l'oxyde de méthyle et de vinyle, du sulfonate de vinyle, du méthacrylate de sulfoéthyle, de l'acide 2-acrylamido-2-méthyl-1-propanesulfonique ou des dérivés protonés ou alkylés de pyridine vinylique, d'imidazole vinylique ou de diéthylamine de N-vinyle.
- Précurseur de plaque d'impression lithographique thermosensible selon l'une quelconque des revendications 1 à 3 et 5, caractérisé en ce que le groupe latéral polymère hydrophobe contient des unités monomères hydrophobes choisies parmi des siloxanes, de l'éthylène de perfluoroalkyle, des acrylates d'alkyle, des acrylates d'alkyle fluorés, des monomères chlorés ou bromés, des esters vinyliques, des éthers vinyliques, de l'éthylène, de l'isoprène, du butadiène, du styrène, des dérivés de styrène, des méthacrylates d'alkyle, des méthacrylates d'allyle, des méthacrylates d'alkyle fluorés, de l'acrylonitrile, du méthacrylonitrile, des acrylamides de N-alkyle et des méthacrylamides de N-alkyle.
- Précurseur de plaque d'impression lithographique thermosensible selon la revendication 7, caractérisé en ce que les unités monomères hydrophiles sont de l'oxyde d'éthylène ou un mélange d'oxyde d'éthylène et d'oxyde de propylène.
- Précurseur de plaque d'impression lithographique thermosensible selon la revendication 8, caractérisé en ce que les unités monomères hydrophobes sont du diméthylsiloxane ou du méthylphénylsiloxane.
- Précurseur de plaque d'impression lithographique thermosensible selon l'une quelconque des revendications précédentes, caractérisé en ce que le revêtement peut être commuté d'hydrophile en hydrophobe ou d'hydrophobe en hydrophile par chauffage et/ou par exposition à des rayons infrarouges.
- Un procédé pour la confection d'un précurseur de plaque d'impression lithographique thermosensible, comprenant l'étape dans laquelle un revêtement contenant un copolymère est appliqué sur un support ayant une surface hydrophile ou sur un support revêtu d'une couche hydrophile, ledit copolymère contenant une multitude d'unités structurales X comprenant un groupe latéral polymère hydrophile et une multitude d'unités structurales Y comprenant un groupe latéral polymère hydrophobe.
- Un procédé pour la confection d'une plaque d'impression lithographique thermosensible sans développement humide, comprenant les étapes suivantes :(i) la mise à disposition d'un précurseur de plaque d'impression lithographique selon l'une quelconque des revendications 1 à 10 et(ii)le chauffage et/ou l'irradiation infrarouge sous forme d'image du revêtement.
- Un procédé servant à augmenter l'angle de contact d'un revêtement avec de l'eau, comprenant les étapes suivantes :(i) la mise à disposition d'un précurseur de plaque d'impression lithographique selon l'une quelconque des revendications 1 à 10 et(ii)le chauffage sous forme d'image du revêtement par du rayonnement infrarouge et/ou de la chaleur.
- Un procédé servant à modifier la surface d'une plaque d'impression lithographique, dans lequel la surface hydrophile est rendue hydrophobe par chauffage ou par irradiation infrarouge d'un précurseur de plaque d'impression lithographique thermosensible selon la revendication 1.
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US4081572A (en) | 1977-02-16 | 1978-03-28 | Xerox Corporation | Preparation of hydrophilic lithographic printing masters |
JPS61255898A (ja) | 1985-04-30 | 1986-11-13 | インタ−ナショナル・ビジネス・マシ−ンズ・コ−ポレ−ション | 熱的に誘導される化学変化を用いた改良印刷装置 |
GB9322705D0 (en) | 1993-11-04 | 1993-12-22 | Minnesota Mining & Mfg | Lithographic printing plates |
US5855173A (en) | 1995-10-20 | 1999-01-05 | Eastman Kodak Company | Zirconia alloy cylinders and sleeves for imaging and lithographic printing methods |
US5839369A (en) | 1995-10-20 | 1998-11-24 | Eastman Kodak Company | Method of controlled laser imaging of zirconia alloy ceramic lithographic member to provide localized melting in exposed areas |
US5839370A (en) | 1995-10-20 | 1998-11-24 | Eastman Kodak Company | Flexible zirconia alloy ceramic lithographic printing tape and method of using same |
IT1276072B1 (it) | 1995-10-31 | 1997-10-24 | Ausimont Spa | Processo di (co)polimerizzazione di monomeri fluorurati per ottenere polimeri contenenti idrogeno |
FR2744125B1 (fr) * | 1996-01-30 | 1998-06-05 | Peintures Jefco | Copolymeres greffes, leur procede de fabrication, les compositions les contenant et leur utilisation pour la preparation de dispersions pigmentaires en milieu aqueux et/ou organique |
AU7889398A (en) | 1996-12-26 | 1998-07-31 | Asahi Kasei Kogyo Kabushiki Kaisha | Plate for direct thermal lithography and process for producing the same |
US6692890B2 (en) * | 2001-04-04 | 2004-02-17 | Kodak Polychrome Graphics Llc | Substrate improvements for thermally imageable composition and methods of preparation |
US6582882B2 (en) * | 2001-04-04 | 2003-06-24 | Kodak Polychrome Graphics Llc | Imageable element comprising graft polymer |
-
2004
- 2004-11-05 EP EP20040105542 patent/EP1531042B1/fr not_active Not-in-force
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