EP1502158A1 - Projektionsobjektiv höchster apertur - Google Patents
Projektionsobjektiv höchster aperturInfo
- Publication number
- EP1502158A1 EP1502158A1 EP03747435A EP03747435A EP1502158A1 EP 1502158 A1 EP1502158 A1 EP 1502158A1 EP 03747435 A EP03747435 A EP 03747435A EP 03747435 A EP03747435 A EP 03747435A EP 1502158 A1 EP1502158 A1 EP 1502158A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- lens
- negative
- lenses
- image
- waist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 230000005855 radiation Effects 0.000 claims abstract description 8
- 230000005499 meniscus Effects 0.000 claims description 44
- 230000003287 optical effect Effects 0.000 claims description 29
- 210000001015 abdomen Anatomy 0.000 claims description 23
- 239000000463 material Substances 0.000 claims description 13
- 230000001174 ascending effect Effects 0.000 claims description 8
- 206010010071 Coma Diseases 0.000 claims description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 6
- 238000003384 imaging method Methods 0.000 claims description 6
- 238000010276 construction Methods 0.000 claims 1
- 230000004075 alteration Effects 0.000 abstract description 10
- 238000012937 correction Methods 0.000 description 26
- 238000004519 manufacturing process Methods 0.000 description 8
- 230000000694 effects Effects 0.000 description 7
- 230000002349 favourable effect Effects 0.000 description 7
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 6
- 229910001634 calcium fluoride Inorganic materials 0.000 description 6
- 239000011521 glass Substances 0.000 description 5
- 230000001419 dependent effect Effects 0.000 description 4
- 238000013461 design Methods 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 239000013078 crystal Substances 0.000 description 3
- 229910004261 CaF 2 Inorganic materials 0.000 description 2
- 230000000295 complement effect Effects 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 230000018109 developmental process Effects 0.000 description 2
- 238000003702 image correction Methods 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000005056 compaction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 210000000887 face Anatomy 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000001393 microlithography Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000008092 positive effect Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 210000001747 pupil Anatomy 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Definitions
- the invention relates to a projection lens for imaging one arranged in the object plane of the projection lens
- Patterns in the image plane of the projection lens with ultraviolet light of a predetermined working wavelength are provided.
- Photolithographic projection lenses have been used for the manufacture of semiconductor devices and other finely structured components for several decades. They serve to project patterns of photomasks or graticules, which are also referred to below as masks or reticles, onto an object coated with a light-sensitive layer with the highest resolution on a reduced scale.
- NA numerical aperture
- attempts are being made to meet the increasing imaging requirements with purely refractive, dioptric systems, which are advantageous in terms of structure and production in comparison to catadioptric systems. With wavelengths becoming shorter and shorter, however, there are only a few sufficiently transparent materials available, the imaging constants of which are relatively close to one another.
- the object of the invention is to create a projection lens which is distinguished by a high numerical aperture on the image side and improved chromatic correction.
- a material-saving, compact structure should be made possible.
- a projection lens for imaging a pattern arranged in the object plane of the projection lens into the image plane of the projection lens with ultraviolet light of a predetermined working wavelength has a multiplicity of optical elements which are arranged along an optical axis and one which is arranged at a distance in front of the image plane system diaphragm.
- the projection lens is designed as a purely refractive (dioptric) one-waist system with an abdomen close to the object, an abdomen close to the image and an intermediate waist.
- the jet diameter can be significantly smaller than the maximum jet diameter in the area of one of the bellies, the jet diameter in the waist area, for example, less than 50% of the maximum beam diameter can be.
- a negative group is arranged in a region of divergent radiation between the waist and the system diaphragm, which has an effective curvature with a concave side directed towards the image.
- a "negative group” in this sense is a lens group with an overall negative refractive power, wherein the lens group can comprise one or more lenses.
- the effective curvature causes the negative group as a whole to be curved against the beam path.
- This curvature can be characterized by a curved surface, the The effective curvature of the lens (or the curvature surface) is characterized by a curvature radius r c , which is calculated as follows for a lens whose entrance surface has the radius n and whose exit surface has the radius r 2 :
- the effective curvature of the group is calculated as follows:
- n is the number of surfaces.
- the effective concave curvature in the image causes high incidence angles to occur, in particular on the exit sides of the one or more lenses of the negative group. These are particularly effective for the correction of high-order image errors, in particular for the aperture-dependent correction (over-correcting) of monochromatic image errors in the image field zone and the image field edge.
- the projection lens In order to be able to manufacture the projection lens particularly economically, it is necessary to minimize its use of materials. This is achieved on the one hand by the limitation to one waist and on the other hand by an ever increasing field load on the system. It is only through the invention that it is possible to achieve an effective correction of all monochromatic errors with only one waist at such a high field load.
- the field load has already increased massively, but the limit has not yet been reached.
- the correction options of the group in connection with higher overall asphericity lead to a further increase in the field load and thus a future reduction in costs of the lithographic projection lenses.
- the negative group can at least partially create corrective functions that would otherwise only be possible by providing an additional waist.
- a significant reduction in the overall length, the diameter, and a reduction in the volume of material required for production and thus a substantial reduction in the total price can be achieved in projection lenses according to the invention.
- the longitudinal color error can be significantly reduced. This means that even with a very high aperture, there is no need to use CaF 2 at around 193 nm in the largest lenses around the diaphragm.
- the negative group comprises at least one lens with negative refractive power and a concave surface directed towards the image.
- the negative refractive power can also be distributed over a plurality of successive lenses of this type having a negative refractive power, the centers of curvature for the exit surfaces on the image side each being on the image side.
- Using only one or two such lenses with a negative refractive power enables a particularly material-saving, compact structure. If two lenses are strung together, it is advantageous if the refractive power of the first lens on the object side is stronger than that of the subsequent lens on the image side of the group.
- These negative lenses can be designed as negative meniscus lenses.
- the negative group acts on medium-sized bundles of rays and can have moderate diameters.
- Lenses with negative refractive power are naturally in the area of the waist.
- the negative group presented is particularly advantageous in the ascending region of the second waist.
- the lenses in the waist often have a bend, especially in the center of the waist, which obey the principle of minimal beam deflection in order to induce as few aberrations as possible.
- the task of the crushing lenses at the waist is first to redirect a convergent tuft to a divergent tuft. This, in conjunction with the large bellies, allows the system to image field correction or Petzval correction.
- the negative group in the first part of the second abdomen differs fundamentally from the inner negative waist lenses in terms of deflection.
- the goal is not a tuft forming with balanced loads on the entry and exit side, but a deliberately asymmetrical load.
- the divergent tuft enters the lens with moderate deflection and then exits under extreme stress. This highly stressed surface allows the desired correction effect.
- the characteristic bulging surfaces of the outer negative lenses of the waist bulge towards the center of the waist.
- This lens is the image-side outer surface, which is the decisive medium-high-stress area.Without the advantageous negative group presented in the ascending area of the second waist, it would have to carry important parts of the correction of the field- and aperture-dependent image correction - However, despite massive aspherization, unacceptable zone contributions regarding field and aperture remain for crooked tufts.
- the angular load can e.g. can be quantified by the corresponding maximum incidence angle of the radiation (in gas).
- the apex of the overall characterizing curvature surface of the negative group should be in the range between approx. 30% and approx. 70%, in particular between approx. 40% and approx. 60% of the axial distance between the area of the narrowest constriction of the waist and the system cover.
- the effective curvature of the negative group can be adjusted to optimize the system properties.
- the effective curvature preferably has a curvature radius r c , whose ratio r c / DB to the diaphragm diameter DB is in the range between approximately 0.8 and approximately 2.2, preferably in the range between approximately 1.0 and approximately 2.0 , in particular in the range between approx. 1.1 and approx. 1.9.
- the projection objective in the area of the system diaphragm has an essentially symmetrical structure with biconvex positive lenses and negative with respect to a plane of symmetry perpendicular to the optical axis Meniscus lenses.
- This essentially symmetrical structure makes it possible to achieve a good correction state with lower overall asphericity even with large openings.
- the plane of symmetry is preferably close to the system aperture. It is possible to leave this symmetrical structure in the direction of increasing or increasing the refractive power of the negative lens behind the diaphragm and a reduction in refractive power of the negative lens in front of the diaphragm. This symmetrical arrangement makes it possible to manage with less aspherization effort.
- the symmetry can be changed at the expense of the negative lens upstream of the aperture, i.e. lower refractive power or substitution by asphericity in the overall system.
- the large negative lens after the aperture should always have the same orientation of the effective curvature as the curvature of the negative group in the ascending area between the waist and the system aperture.
- the system diaphragm in the sense of this application is the area closer to the image plane in which either the main beam of the image intersects the optical axis or locations are available where the
- the height of a coma beam corresponds to the height of an edge beam.
- a diaphragm (aperture diaphragm) for delimiting and possibly adjusting the aperture used can be arranged in the area of the system diaphragm. The invention makes it possible to achieve an effective correction of all errors with only one waist.
- Negative groups can at least partially assume the function of a second waist, as is the case with conventional ones
- Three-bellied systems is available. Compared to such three-bellied systems, a significant reduction in the overall length, a reduction in the length of the Manufacturing required material volume and a reduction in color errors can be achieved.
- a negative meniscus lens with a concave surface on the object side is arranged directly in front of the system aperture and a negative meniscus lens with a concave surface on the image side is arranged directly behind the system aperture.
- the system diaphragm can be freely accessible between them, for example in order to attach an adjustable diaphragm to limit the beam diameter.
- This aperture can also be moved axially when opening and closing.
- An advantageous embodiment is also provided by spherical diaphragms in connection with these single-waist systems, since the diaphragm curvature of preferred embodiments can still be used for this.
- a positive / negative doublet with a biconvex lens on the object side and a subsequent negative meniscus lens with a concave surface on the object side can be arranged directly in front of the system bezel and a doublet constructed in mirror image to the rear of the system bezel.
- the doublets on the object or image side are still framed by biconvex lenses.
- the systems can be set up so that all transparent optical elements are made of the same material. This applies in particular to 248nm, a pure quartz glass solution is technically advisable.
- synthetic quartz glass suitable for 193 nm is also used for all lenses.
- one or more near-image lenses or lenses with increased radiation and Settings load consist of another material, e.g. CaF 2 .
- Embodiments for 157 nm, in which all lenses are made of calcium fluoride or combined with another fluoride crystal material are also possible. Combinations of several different materials are also possible, for example to make it easier to correct color errors or to reduce compaction or lens heating.
- the synthetic quartz glass can be replaced by a crystal material, for example calcium fluoride, in some or all of the lenses.
- high-aperture projection objectives in particular also purely refractive projection objectives, are possible, in which the numerical aperture NA> 0.85 on the image side. It is preferably at least 0.9.
- Preferred projection objectives are distinguished by a number of favorable constructive and optical features, which alone or in combination with one another are conducive to the suitability of the objective for high-resolution microlithography.
- At least one aspherical surface is preferably arranged in the area of the system cover.
- several surfaces with aspheres come closely behind the diaphragm.
- the last optical surface before the system diaphragm and the first optical surface after the system diaphragm are aspherical.
- opposite aspherical surfaces with curvature pointing away from the diaphragm can be provided here.
- the high number of aspherical surfaces in the area of the system aperture is favorable for the correction of the spherical aberration and has a favorable effect on the setting of the isoplanasia.
- At least one positive meniscus lens with a concave surface on the object side is arranged between the waist and the system panel in the vicinity of the waist.
- a meniscus lens instead of such a meniscus lens, several, for example two, successive lenses of this type can be provided.
- Embodiments are particularly advantageous in which the effective curvature changes between the waist and the system diaphragm in this order at least between two lenses, the effective curvature of the first lens being on the object side and the effective curvature of the immediately following lens being on the image side.
- Two successive positive lenses of the respective curvatures are preferably provided. A change in the position of the center of curvature of the effective curvature thus takes place in the area between these lenses or lens groups.
- a plurality of negative lenses are preferably arranged one after the other in the region of the waist, in preferred embodiments there are at least two, preferably three negative lenses. These bear the main burden of the Petzval correction and part of the correction of the crooked tufts.
- the asphere on the front of the second lens is then also very close to the reticle, but already has very different tuft cross-sections, so that the pair of aspheres can complement each other ideally and also has an optimal effect.
- the tuft cross-sections are particularly small and this leads to the requirement to produce particularly smooth aspherical lenses.
- a lens group with a strong positive refractive power which represents the first belly of the beam guidance, preferably follows behind this input group.
- Embodiments are particularly advantageous in which the effective curvature changes between the reticle and waist, at least between two lenses, the effective curvature of the first lens being on the object side and the effective curvature of the immediately following lens being on the image side. Two successive positive lenses of the respective curvatures are preferably provided. A change in the position of the center of curvature of the effective curvature thus takes place in the area between these lenses or lens groups.
- at least one meniscus lens with positive refractive power and concave surfaces on the image side can be favorable in the area of still large beam heights in the vicinity of the object plane, since this contributes to the Petzval relief of the lens.
- Fig. 1 is a lens section through an embodiment of a refractive projection lens that for 193nm
- FIG. 2 is a lens section through an embodiment of a refractive projection lens that is suitable for 157 nm
- 3 is a lens section through an embodiment of a refractive projection lens designed for a 193 nm working wavelength
- FIG. 4 is a lens section through an embodiment of a refractive projection lens that is suitable for 157 nm
- optical axis denotes a straight line through the centers of curvature of the spherical optical components or through the axes of symmetry of aspherical elements.
- the object is a mask (reticle) with the pattern of an integrated circuit in the examples , but it can also be a different pattern, for example a grid.
- the image is formed on a wafer serving as a substrate and serving with a photoresist layer, but other substrates are also possible, for example elements for liquid crystal displays or substrates for optical gratings.
- FIG. 1 shows a characteristic structure of a purely refractive reduction objective 1 according to the invention. It serves to display a pattern of a reticle or the like arranged in an object plane 2 in an image plane 3 conjugated to the object plane on a reduced scale without obscurations or shadowing in the image field, for example in scale 4 1. It is a rotationally symmetrical one-waist system, whose lenses are along a perpendicular to
- Object and image plane standing optical axis 4 are arranged and form an object-side abdomen 6, an image-side abdomen 8 and an intermediate waist 7.
- the system diaphragm 5 is in the near-image area of large beam diameters.
- the lenses can be divided into several successive lens groups with specific properties and functions.
- a first lens group LG1 following the object plane 2 at the input of the projection lens has negative refractive power overall and serves to expand the beam coming from the object field.
- a subsequent second lens group LG2 with an overall positive refractive power forms the first belly 6 and brings the beam together again in front of the subsequent waist 7.
- a third lens group LG3 with negative refractive power In the area of the waist 7 there is followed by a fourth lens group LG4 consisting of positive meniscus lenses with positive refractive power, which is followed by a fifth lens group LG5 consisting of negative meniscus lenses with negative refractive power.
- the first lens group LG1 opens with three negative lenses 11, 12, 13, which in this order comprises a negative lens 11 with an aspherical entry side, a negative meniscus lens 12 with an image-side center of curvature and an aspherical entry side and a negative meniscus lens 13 with an object-side center of curvature and an aspherical exit side.
- at least one aspherical surface should be provided on at least one of the first two lenses 11, 12 in order to limit the generation of aberrations in this area.
- an aspherical surface is provided on each of the three negative lenses.
- the second lens group LG2 with a small air gap behind the last lens 13 of the first lens group LG1, has a biconvex positive lens 14, another biconvex positive lens 15, a positive meniscus lens 16 with a center of curvature on the image side, another positive lens 17 with an almost flat exit side, a positive meniscus lens 18 with the center of curvature of the surfaces on the image side and three further meniscus lenses 19, 20, 21 of the same direction of curvature.
- the entry side of the lens 15 and the exit side of the last meniscus lens 21 reaching the waist are aspherical. As a result, there is an asphere in the area of the waist.
- This second lens group LG2 represents the first belly 6 of the objective.
- a special feature is the positive meniscus lens 16 arranged at the largest diameter, the centers of curvature of which lie on the image side.
- This lens group is used primarily for Petzval correction, distortion and telecentricity correction and image field correction outside of the main sections.
- the first negative lens 22 of the third group is preferably a strongly biconcave lens, so that the main waist 7 opens with strongly curved surfaces.
- the fourth lens group LG4 following the waist 7 consists of two positive meniscus lenses 24, 25 with object-side concave faces, the exit side of the meniscus lens 24 on the input side being aspherical, the other surfaces being spherical. In other embodiments, only a single positive meniscus of corresponding curvature can be provided at this point.
- the subsequent fifth lens group LG5 also has two meniscus lenses 27, 28, but these each have negative refractive power and the concave surfaces are directed toward the image field 3. If necessary, only a negative meniscus can be provided at this point, the center of curvature of which lies on the wafer side.
- Such a group with at least one lens with negative refractive power is a central correction element for the function of the one-waist system in order to elegantly correct off-axis image errors. In particular, this enables a compact design with relatively small lens diameters.
- the fifth lens group LG5 is also referred to here as a negative group.
- Each of the negative meniscus lenses 27, 28 can be characterized by a curved surface shown in dashed lines, which runs centrally between the entrance and exit surface and whose radius r c is defined according to Eq. (1 ) can be calculated.
- the curvature area of the entire negative group LG5 shown in dash-dotted lines, which according to Eq. (2) can be calculated, just like the curvature surfaces of the individual lenses 27, 28, has a concave side facing the image surface 3 or a center of curvature lying on the image side. It lies in the middle between the curvature surfaces of the individual lenses 27, 28.
- the negative group is arranged approximately in the middle between the area of the narrowest constriction of the waist 7 and the system diaphragm 5 in the area of diverging beam bundles.
- the curvature directed against the beam path causes high incidence angles of the emerging radiation to occur on the exit surfaces of the two negative meniscus lenses, in particular on the exit surface of the first meniscus 27, which have a strong correction effect, in particular for the monochromatic, strongly field and pupil-dependent ones image defects.
- a single negative lens with a concave concave surface toward the image can also be provided at this point.
- Negative groups with three or more lenses are also possible. If there are several lenses, each of the lenses does not have to be a negative lens as long as the overall refractive power is negative.
- the ratio between the radius r c of the dotted curve area of the lens group LG5 and the diaphragm diameter should be between approximately 0.8 and 2.2 and in this embodiment is approximately 1.035 (total value).
- Entrance area of the second abdomen 8 a change in the position of the centers of curvature between menisci of the fourth lens group
- LG4 and the lenses of the fifth lens group LG5 takes place. Thereby can be achieved that oblique spherical aberration can be smoothed with an extreme aperture.
- the sixth lens group LG6 begins with a sequence of biconvex positive lenses 29, 30. Their collecting effect is absorbed again by a subsequent, strongly bent negative meniscus 31. This negative meniscus in front of the aperture 5 is bent towards the aperture, that is to say it has a concave surface on the object side. The corresponding counterpart sits directly behind the panel. This negative meniscus 32 is also bent to the diaphragm, it has a concave surface on the image side. This is followed by two large biconvex positive lenses 33, 34 with the largest diameter. This is followed by two positive meniscus lenses 35, 36 concave to the image plane, a weakly negative meniscus lens 37, a weak positive lens with a slightly curved entry side and an almost flat exit side, and a plane-parallel end plate 39.
- the structure of the second belly which is relatively elongated and slowly widens from the waist to the largest diameter, is constructed in the area of the system diaphragm 5 essentially symmetrically to a plane of symmetry which is perpendicular to the optical axis and is close to the system diaphragm.
- the negative meniscus lenses 31, 32, the positive lenses 30, 33 enclosing these and the biconvex lenses 29 and 34 arranged outside these doublets correspond almost mirror images.
- the central region of the second abdomen around the diaphragm thus contains only biconvex lenses as positive lenses and only curved lenses as negative lenses menisci.
- a meniscus-shaped air space is formed in each of the doublets 30, 32 and 32, 33.
- the first belly contains a weakly positive meniscus lens 19 in the descending area. This forms thicker with the following Meniscus lens 20 a strongly bent, open air space. In the airspace that follows there is a less arched, outwardly closing air meniscus. This enables an improved shell matching in the sagittal and tangential cut. At the same time, the angular load in the region of the concave entry surface of the negative lens 22 can thereby also be kept under the aperture load.
- the Petzval correction is mainly performed by the lenses in the waist area in connection with the large bellies. Still, a single waist is enough. In the case of the lens 27 of negative refractive power, which is curved in the image direction, particular care must be taken to ensure good centering, since a slight decentration would immediately result in coma contributions on the highly stressed exit surface.
- Table 1 summarizes the specification of the design in a known manner in tabular form.
- Column 1 gives the number of a refractive or otherwise distinguished surface
- column 2 the radius r of the surface (in mm)
- column 3 the distance d of the surface from the following surface (in mm), which is referred to as thickness
- column 4 the material of the optical components
- column 5 the refractive index or the refractive index of the material of the component, which follows the entry surface.
- Column 6 shows the usable free radii or half the free diameter of the lenses (in mm).
- p (h) [((1 / r) h 2 ) / (1 + SQRT (1- (1 + K) (1 / r) 2 h 2 )] + C1 * h 4 + C2 * h 6 +. ...
- the reciprocal (1 / r) of the radius indicates the surface curvature and h the distance of a surface point from the optical axis.
- p (h) gives the so-called arrow height, ie the distance of the surface point from the surface vertex in the z direction, ie in the direction of the optical axis.
- the constants K, C1, C2, ... are shown in Table 2.
- the numerical aperture on the image side is 0.93.
- the lens has a length (distance between image plane and object plane) of 1342mm, the field size is 10.5 * 26.0mm.
- FIG. 2 and Tables 3 and 4 which is designed for a working wavelength of 157 nm and is constructed exclusively from calcium fluoride components.
- the type and sequence of the lenses corresponds to the embodiment according to FIG. 1.
- the corresponding lenses and lens groups are therefore identified by the same reference numerals.
- the lens 100 is somewhat more compact with a length of 1000mm, has a numerical aperture of 0.93 and a field size of 12 * 17mm.
- a maximum wavefront RMS value of 3m ⁇ across all image heights proves one excellent correction condition of the lens.
- the example shows that the basic principles of the invention can easily be transferred to lenses for other wavelengths.
- a further embodiment 300 which is designed for a working wavelength of 193 nm, is explained with reference to FIG. 3 and tables 5 and 6.
- all lenses are made of synthetic quartz glass.
- the positive lens 38 is made of calcium fluoride and has a positive effect on transverse color errors, while at the same time producing little undesirable longitudinal color errors.
- the type and sequence of the lenses essentially corresponds to the embodiment according to FIG. 1, the difference being that the positive meniscus lens 36 there, which is concave in the image direction, is split here into two positive meniscus lenses 36, 36 'with the same sense of curvature.
- the corresponding lenses and lens groups are identified by the same reference numerals.
- the maximum wavefront RMS value is between 5 and 6m ⁇ .
- Projection lens 400 explained, in which all lenses are made of calcium fluoride.
- the crystallographic ⁇ 111> axes of most or all of the lenses are essentially parallel to the optical axis.
- the type and sequence of the lenses largely corresponds to the embodiment according to FIG. 1, which is why corresponding lenses and lens groups are designated by the same reference numerals.
- NA 0.95
- the lenses 13, 15, 16, 18, 21, 24, 26, 28, 30, 33, 35 and 36 are rotated by 60 ° around the optical axis relative to the other lenses in order to achieve a correction of birefringence effects caused by the intrinsic birefringence of calcium fluoride can be caused.
- This measure can also be provided in the embodiment according to FIG. 2.
- the relative rotation of ⁇ 100> lenses that is suitable for compensation is approximately 45 °, whereas it is approximately 60 ° for ⁇ 111> lenses. In principle, good compensation can be achieved if lenses with comparable optical paths and comparable incidence angles within the material are rotated in pairs in a planned manner.
- AREA NO. 4 AREA NO. 31 'LAEC1 HE NO. 48
- AREA NO. 7 AREA NO. 36 AREA NO. 50
Landscapes
- Lenses (AREA)
Abstract
Description
Claims
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP03747435A EP1502158A1 (de) | 2002-05-03 | 2003-04-30 | Projektionsobjektiv höchster apertur |
Applications Claiming Priority (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| WOPCT/EP02/04846 | 2002-05-03 | ||
| PCT/EP2002/004846 WO2003077036A1 (de) | 2002-03-08 | 2002-05-03 | Projektionsobjektiv höchster apertur |
| DE10224361A DE10224361A1 (de) | 2002-05-03 | 2002-05-24 | Projektionsobjektiv höchster Apertur |
| DE10224361 | 2002-05-24 | ||
| EP03747435A EP1502158A1 (de) | 2002-05-03 | 2003-04-30 | Projektionsobjektiv höchster apertur |
| PCT/EP2003/004477 WO2003093904A1 (de) | 2002-05-03 | 2003-04-30 | Projektionsobjektiv höchster apertur |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| EP1502158A1 true EP1502158A1 (de) | 2005-02-02 |
Family
ID=33542104
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP03747435A Withdrawn EP1502158A1 (de) | 2002-05-03 | 2003-04-30 | Projektionsobjektiv höchster apertur |
Country Status (1)
| Country | Link |
|---|---|
| EP (1) | EP1502158A1 (de) |
-
2003
- 2003-04-30 EP EP03747435A patent/EP1502158A1/de not_active Withdrawn
Non-Patent Citations (1)
| Title |
|---|
| See references of WO03093904A1 * |
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