EP1490733A1 - Unite collecteur dotee d'un element reflechissant destine a des systemes d'eclairage d'une longueur d'onde inferieure a 193 nm - Google Patents

Unite collecteur dotee d'un element reflechissant destine a des systemes d'eclairage d'une longueur d'onde inferieure a 193 nm

Info

Publication number
EP1490733A1
EP1490733A1 EP03711910A EP03711910A EP1490733A1 EP 1490733 A1 EP1490733 A1 EP 1490733A1 EP 03711910 A EP03711910 A EP 03711910A EP 03711910 A EP03711910 A EP 03711910A EP 1490733 A1 EP1490733 A1 EP 1490733A1
Authority
EP
European Patent Office
Prior art keywords
collector unit
segment
unit according
mirror
collector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP03711910A
Other languages
German (de)
English (en)
Inventor
Markus Weiss
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Publication of EP1490733A1 publication Critical patent/EP1490733A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70166—Capillary or channel elements, e.g. nested extreme ultraviolet [EUV] mirrors or shells, optical fibers or light guides
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/064—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface

Definitions

  • the invention relates to a collector unit for lighting systems with a wavelength ⁇ 193 nm, preferably ⁇ 126 nm, particularly preferably wavelengths in the EUV range with at least one mirror shell, which receives the rays of a bundle of rays emanating from an object and has an optical effect in relation on the rays of the beam.
  • the rays of the bundle of rays preferably strike at an angle of ⁇ 20 ° to the surface tangent of the mirror shell.
  • the invention also provides an illumination system with such a collector, a projection exposure system with an illumination system according to the invention and a method for illuminating microstructures.
  • No. 5,768,339 shows a collimator for X-rays, the collimator having a plurality of nested paraboloidal reflectors.
  • the collimator according to US Pat. No. 5,768,339 serves to shape an isotropically emitted beam from an X-ray light source into a parallel beam.
  • No. 5,763,930 shows a nested collector for a pinch plasma light source, which serves to collect the radiation emitted by the light source and to bundle it into a light guide.
  • No. 5,745,547 shows several arrangements of multichannel optics which are used to bundle the radiation from a source, in particular X-ray radiation, at one point by means of multiple reflections.
  • the invention proposes elliptically shaped reflectors according to US Pat. No. 5,745,547.
  • Mirrors are arranged so that the diverging x-rays are formed into a parallel output beam.
  • the arrangement of nested reflectors known from WO 99/27542 is used in an X-ray proximity lithography system to refocus the light from a light source, so that a virtual light source is formed.
  • the nested shells can have an ellipsoidal shape.
  • a nested reflector for high-energy photon sources has become known from US Pat. No. 6,064,072, which serves to shape the diverging X-rays into a bundle of rays running in parallel.
  • WO 00/63922 shows a nested collector which serves to collimate the neutron beam.
  • a nested collector for X-rays has become known from WO 01/08162, which is characterized by a surface roughness of the inner, reflecting surface, of the individual mirror shells of less than 12 arm.
  • the collectors shown in WO 01/08162 also include systems with multiple reflection nen, especially Woltersysteme, and are characterized by a high resolution, as required for example for X-ray lithography.
  • zirconium transmission filters can be used to filter out such undesired radiation.
  • such filters have the disadvantage of high light losses. Furthermore, they can be very easily destroyed by thermal stress.
  • Another problem with illumination optics for EUV lithography is that the light losses increase rapidly with the number of optical components.
  • the object of the invention is therefore to provide a collector unit for an illumination system for microlithography with wavelengths ⁇ 193 nm, preferably ⁇ 126 nm, particularly preferably for wavelengths in the EUV range, which on the one hand meets the requirements for uniformity and telecentricity for illumination optics are required, is sufficient, and on the other hand enables spectral filtering to the useful wavelength.
  • the aim is to prevent radiation of wavelengths other than the useful wavelength from entering the lighting system.
  • the component should be compact and the light losses occurring there should be minimized when used in an EUV lighting system.
  • a collector unit with at least one mirror shell according to the preamble of claim 1, which is characterized in that a periodic structure with at least one grating period is applied to at least part of the mirror shell.
  • a periodic structure By applying a periodic structure to the mirror shell, the bundle of rays hitting the mirror shell is diffracted.
  • the focus of the different diffraction orders are on different levels. If you arrange in one level, in one If the diffraction order is focused, for example at a diaphragm, then the other diffraction orders which are deflected into other solid angle elements cannot pass through the diaphragm and thus cannot reach the subsequent lighting system.
  • Another advantage of the collector according to the invention is that the effective exit space of the diffracted light bundle is longer than in a system in which the nested collector and the flat grid are two separate components.
  • the distance in the light path from the light source to the collector can be shortened with a comparable line density compared to a flat grating element, and an illumination system can thus be constructed in a very compact manner.
  • an optical element in the lighting system can be omitted, so that the
  • Transmission of the lighting system can be increased by approximately 30%.
  • an advantageous embodiment provides for the grating to be designed as a blaze grating with a blaze angle ⁇ .
  • the collector unit comprises a plurality of mirror shells which are arranged rotationally symmetrically to an axis of rotation. JE a ring aperture element of the object-side aperture is then assigned to the mirror shell.
  • Rotationally symmetrical collectors have further advantages.
  • the uniformity of the illumination in one plane and the shape of the pupil to be illuminated can be better controlled than in the case of lighting systems with, for example, a flat grating element.
  • rotationally symmetrical components in an illumination system have advantages in aligning the individual components with one another. Another advantage is the symmetrical behavior, for example with
  • the area illuminated by the collector unit lies, for example, in one plane and consists of ring elements, with a ring aperture element preferably being assigned to each ring element.
  • ring elements do not overlap and the ring elements close to one another largely continuously in the plane.
  • the nested collector unit according to the invention With the nested collector unit according to the invention, largely uniform illumination can be achieved in one plane.
  • the optical, for example collecting, effect of the collector for the radiation emitted by the light source and the filtering on the useful wavelength in a single component according to the invention the transmission in lighting systems can be increased and the overall length of the lighting system can be considerably reduced.
  • the mirror shells can preferably be an annular segment of an ellipsoid, a paraboloid or a hyperboloid. For a paraboloid there is a completely parallel bundle of rays and thus an infinite light source. If the shells are sections of ellipsoids, a convergent beam is formed. Collectors with shells, which are cutouts from hyperboloids, lead to a diverging beam.
  • the collector comprises as many shells as possible.
  • the collector according to the invention preferably has more than four, particularly preferably more than seven and particularly preferably more than ten reflectors in a shell-shaped arrangement.
  • a further advantage is that the divergence of the partial beam tufts of the respective mirror shell diffracted into the diaphragm plane is reduced with an increasing number of mirror shells, and thus a better separation of the different diffraction orders in the diaphragm plane is achieved.
  • the plurality of mirror shells arranged around a common axis of rotation are designed in such a way that multiple reflections occur on a mirror shell.
  • the reflection angles can be kept small by multiple reflections on a dish.
  • Systems with an even number of reflections in particular are insensitive to misalignments, in particular tilting with respect to the optical axis, which is the axis of rotation in rotationally symmetrical systems.
  • the reflectivity behaves almost linearly with the angle of incidence relative to the surface tangent, so that the reflection losses for a reflection under 16 ° or two reflections below 8 ° are approximately the same.
  • the maximum achievable aperture of the collector it is advantageous to use more than one reflection.
  • Collectors with two reflections can, for example, as Woltersystems with a first segment of a mirror shell, which is an annular section of a hyperboloid, and one second segment of a mirror shell, which is an annular section of an ellipsoid.
  • Woltersystems are known from the literature, for example from Wolter, Annalen der Physik 10, 94-114, 1952.
  • Woltersystems with a real focal length i.e. H.
  • a collection aperture of, for example, NA max ⁇ 0.985 corresponding to an aperture angle of 80 ° can be selected, whereby one is still in the highly reflective range of reflection under grazing incidence with a reflectivity> 70%.
  • the periodic grating is applied to the second segment of a shell of a winter system.
  • the first segment is preferably a section of a hyperboloid with a virtual focus.
  • the second segment is designed such that it has a focusing effect. This can be achieved in that, in the case of a linear grating with a constant line density, the surface of the second segment is concavely curved in the meridional section.
  • a meridional section is understood to mean a section that includes the optical axis.
  • the focusing effect of the second segment can also be achieved by varying the line density.
  • the surface in the meridonal section can be flat or convex.
  • the second segment which is rotationally symmetrical about the optical axis, then has the shape of a truncated cone.
  • the grid can also be applied to the first segment or to both segments. Grids on both segments are preferred when a high spectral purity is desired; Grid on the first segment, if, for example, the 0th order is to be prevented from escaping from the collector, but is absorbed on the back of the adjacent mirror shell. An aperture to block the light of the unused order can then be omitted.
  • the periodic structure on the second segment which is preferably a blaze grating with a blaze depth B or a blaze angle ⁇ , can, for example, either be introduced into the core for the galvano-plastic impression of the individual mirror shells by diamond turning, or alternatively by scratching the grating into a coating applied to the mirror shells, for example a gold coating.
  • the collector unit is designed in such a way that unused diffraction orders emerge from the unit, there is the advantage over planar grating elements that the light intensity of the emerging diffraction orders is distributed over a ring element. As a result, the thermal load on a panel element can be considerably reduced compared to conventional planar grid elements.
  • the invention also provides an illumination system with such a collector unit.
  • the lighting system is preferably a double-faceted lighting system with a first optical element with first raster elements and a second optical element with second raster elements, as shown in US Pat. No. 6,198,793 B1, the disclosure content of which is fully incorporated in the application.
  • the first and / or second raster elements can be flat facets or facets with a collecting or dispersing effect.
  • the illumination system comprising the collector according to the invention is preferably used in a projection exposure system for microlithography, such a projection exposure system being shown in PCT / EP 00/07258 is, the disclosure content is fully included in the present application.
  • Projection exposure systems include a projection lens arranged downstream of the lighting device, for example a 4-mirror projection lens as shown in US Pat. No. 6,244,717 B1, the disclosure content of which is fully incorporated in the present application.
  • FIG. 1 shows a schematic diagram of a collector with a grid that points to the second
  • FIG. 2 shows the illumination in a diaphragm plane arranged behind the collector for a shell of the collector, the illumination of the different diffraction orders being shown.
  • FIG. 3 shows a mirror shell with a first segment that forms the ring
  • FIG. 4a shows the second segment of the shell surface shown in FIG. 3 with the grid applied and the angles drawn in to derive the line number density on the grid in a meridional section
  • Figure 4b shows the first segment of the shell surface shown in Figure 3
  • FIG. 5 Detail of a blaze grating
  • FIG. 6 shows an EUV projection exposure system with a nested collector according to the invention.
  • FIG. 1 two nests of a nested collector according to the invention are shown by way of example in a meridional section, each mirror liner 100, 102 one
  • Woltersystem having a first annular segment 100.1, 102.1 with a first optical surface 100.2, 102.2 and a second annular segment 100.3, 102.3 with a second optical surface 100.4, 102.4.
  • the individual sha len 100, 102 are arranged rotationally symmetrically about the x-axis and the optical axis HA.
  • the ring aperture elements 110, 112 which are assigned to the respective mirror shells 100, 102, largely adjoin one another, ie the object-side aperture of the collector shown in FIG. 1 shows only a gap between the individual ring aperture elements due to the fini - th thickness of the mirror shells.
  • the ring aperture elements of the respective mirror shell receive a partial light bundle of the light bundle emitted by a light source 105, for example a laser plasma source.
  • a light source 105 for example a laser plasma source.
  • the first optical surface 100.2, 102.2 and the second optical surface 100.4, 102.4 also directly adjoin one another without a gap.
  • first optical surface 100.2, 102.2 and the second optical surface 100.4, 102.4 do not connect directly to one another. There is then a gap or an unused area between the optical surfaces. Cooling devices for cooling the mirror shells can then be arranged in the unused area, for example.
  • FIG. 1 also shows the diffraction orders for the grating on the second segment of the second mirror shell that are not focused in the diaphragm plane 125, namely the 0th diffraction order 131 and the +2. Diffraction order 133 shown.
  • the aperture plane 125 is defined by the z and y axes of a coordinate system, the origin of which coincides with the position of the real light source 105. This coordinate system is shown in FIG. 1.
  • the + 1st order 129 is focused in the aperture plane 125, which in the present case is the paper plane, and has a diameter ⁇ R-i.
  • Order or the O. order appear as rings in the diaphragm plane because they are defocused with respect to the diaphragm plane due to the convergent beam path. This can be seen very well in FIG. 1.
  • the focus of the O. order 150 lies in front of the aperture plane 125, the focus 151 of the +2. Order behind the aperture level 125 in the x direction.
  • the width of the circular illumination of the 0th order is ⁇ R 0 , that of
  • FIG. 3 again shows a shell of a nested collector according to the invention with two segments 102.1, 102.3.
  • the first segment 102.1 with a first optical surface is a hyperbolic surface that receives the light from the light source
  • the distance from the coordinate origin to the center Rumi point 170.1 of the first segment 102.1 projected in the meridional section on the x-axis is denoted by xi.
  • the distance from the center point 170.1 of the first segment 102.1 in the meridional section to the virtual focus 172 projected onto the x-axis is denoted by x * T. Due to the configuration of the first segment 102.1 as a hyperbola, it has a virtual focus 172 and maps the real light source 105 into a virtual light source.
  • the virtual light source is in turn emitted by the second segment 102.3 with a second optical surface on which the grating element is applied, for the +1.
  • Diffraction order 129 shown in the aperture plane 125.
  • FIG. 3 there are also the 0th diffraction order 131 and the +2.
  • Diffraction order 133 shown.
  • the distance from the virtual light source, which is in the virtual focus 172, to the center point 170.3 of the second segment 102.3 projected in the meridional section onto the x-axis is denoted by x 2 , the distance from the center point 170.3 of the second segment to the focus 127 of the +1.
  • Diffraction order projected onto the x-axis is referred to as x 2 'in the meridional section.
  • an exemplary embodiment is to be given for a nested collector with a plurality of mirror shells with two segments which are rotationally symmetrical about a common axis HA and which has a grating structure in the region of the second reflection, i. H. on the second optical surface of the second segment.
  • This is intended to filter broadband EUV radiation, such as that generated by plasma sources, for example.
  • the characteristic sizes of the system and the starting point for the subsequent calculation are given in Table 1.
  • the mapping of the source onto the panel takes place in two steps.
  • the first optical reflection surface of the first segment 102.1 is designed as a hyperboloid surface in order to create a virtual focus 172 for the second optical reflection surface of the second segment 102.3.
  • a lattice structure is introduced there that spectrally split the light.
  • the surface of the second mirror segment 102.3 is toroidally curved, ie the surface line is circular and the toroidal surface has a curvature or a radius in the meridional plane.
  • the grid line densities and the radius of the toroid surface must now be calculated so that the focus of the +1. Diffraction order comes to lie in the aperture plane.
  • the grating is advantageously designed as a blaze grating in order to achieve maximum diffraction efficiency.
  • the grid line density of the grid is chosen so that the orders are sufficiently separated to achieve a good filter function.
  • the geometry of the grid should be chosen so that the aberrations are minimal.
  • the basic geometry with the main distances are determined.
  • the grid area and the hyperboloid area are then defined with their parameters.
  • the dimensions of the surfaces are determined in such a way that the aperture is transmitted as seamlessly as possible.
  • Figure 3 is a mirror shell with a first segment 102.1 and a second
  • FIG. 4a shows in more detail the second segment 102.3 of the mirror shell with the sizes required for the derivation, and that in FIG. 4b first segment 102.1 with the sizes required for the derivation.
  • the image is divided into two approximately equal imaging steps. It is thereby achieved that the incident angle does not become excessively large for any of the reflections.
  • the diameter must be defined for every second mirror segment 102.3.
  • the radius r is defined at the center point 170.3 of the second mirror segment 102.3.
  • the center point 170.3 of the second mirror segment 102.3 was defined in FIG. 3; the radius r is the radial distance of the center point 170.3 from the optical axis HA.
  • the distances x 2 , x ' 2 and r result in the distances between the source point of the image, here the virtual focus 172 and center point 170.3, which is denoted by s 2 , and between center point 170.3 and image point, here the Focus of the 1st order 127 in the aperture plane 125, which is denoted by s 2 ' .
  • the grating line density n results from the requirement that the 0th diffraction order is separated from the 1st order in the diaphragm plane 125 by a sufficient distance g.
  • Partial light bundle and 174.0 of the partial light bundle bent into the 0th order are shown in FIG. 4a.
  • the size of the image of the light source in focus 127 of the 1st diffraction order is in the area of the diaphragm plane 125. It is now necessary to demand that the 0th diffraction order be removed from it by a multiple of the image size is.
  • z. B Assume that at ten times the distance / sufficient separation of the useful wavelength from the other radiation is achieved:
  • D denotes the diameter of the image of the light source 105 in the diaphragm plane 125.
  • the diameter D of the light source 105 is as given in Table 1.
  • the necessary diffraction angles a and? Can be used to separate the 0th and 1st diffraction orders, ie the distance g. with respect to the surface normal 180 in the center point 170.3 of the second segment and the tilt ⁇ of the surface normal 180 in the center point 170.3 with respect to the y axis.
  • angles ⁇ ' , ⁇ ' of the incoming and outgoing partial light bundles of the 1st order result in relation to the y-axis:
  • the radius RM of the second mirror segment in the meridional section i.e. H. the curvature of the surface which is rotationally symmetrical about the optical axis HA is determined by the
  • the hyperbolic surface results on the one hand from the condition that the source point and the virtual focus 172 of the light source 105 are equated with the focal points of the hyperbola. This is the case if the distance between the focal points of the hyperbola corresponds to 2c. On the other hand, the hyperbola applies to each point that the difference between the distances from the focal points is just 2a. Finally, the relationship applies to the hyperbola:
  • Table 2 shows a 6-shell nested collector that is rotationally symmetrical about the main axis HA according to the invention.
  • Each shell has a first and a second segment with a first and a second optical surface, which in the present case corresponds to the segments.
  • the first segment is a hyperboloidal surface and the periodic lattice structure is applied to the second segment.
  • the sizes related in Table 2 have all been previously defined.
  • the selected reference coordinate system lies with its origin (0,0,0) at the location of the light source 105.
  • xi Distance in the x-axis direction from the light source 105 to the center point 170.1 of the first mirror segment xi ' : Distance in the x-axis direction from the virtual focus 172 to the center point
  • M g reproduction scale of the entire image x * ⁇ a : x coordinate of the start of the first segment x ⁇ e : x coordinate of the end of the first segment y 1a : y coordinate of the start of the first segment y * ⁇ e : y coordinate of the end of the first segment a
  • b parameters of the hyperbola x 2a : x coordinate of the start of the second segment x 2e : x coordinate of the end of the second segment y ⁇ a : y coordinate of the start of the second segment y 2e : y coordinate of the end of the second segment
  • RM radius of the second segment in the meridonal plane
  • n line number density of the grating
  • ⁇ angle of the incident center beam relative to the normal at the center point of the second mirror shell
  • ß Angle of the center beam diffracted into the 1st order compared to the normal at the center point of the second mirror shell
  • ⁇ Blaze angle ⁇ m ⁇ n:
  • FIG. 5 shows a Blaze fan with an approximately triangular furrow profile.
  • Reference numeral 201 denotes the beam striking the blaze grating with the gating period P; 202 that reflected on the grid in the 0th order and 204 that in the +1.
  • Order diffracted beam, 206 the beam diffracted into the - 1st order, 208 denotes the grating normal, ⁇ the angle of the incident beam with respect to the normal 208 and ß the angle of the into +1.
  • Order diffracted beam The following equation results for the blaze angle depending on the quantities mentioned above:
  • the blaze depth B results for a given blaze angle ⁇ and line number density n
  • FIG. 6 The optical components and the beam path of some light beams of a projection exposure system with a nested collector according to the invention are shown in FIG. 6.
  • the collector according to the invention has a periodic lattice structure on the second segment. Together with the aperture 1202, which is in the vicinity of the intermediate image Z of the source in the +1. Diffraction order is arranged, so u ⁇ ge- desired wavelength, in the present case 13.5 nm, are prevented from entering the part of the lighting system located behind the aperture 1202.
  • the aperture 1202 can also be used to spatially and pressure-wise separate the light source 1000 comprising the space 1204 and the nested collector 1003 from the subsequent lighting system 1206.
  • a spatial or pressure-based separation can prevent contamination that comes from the light source into the rear lighting system located at the aperture 1202.
  • the lighting system shown in FIG. 6 comprises a nested collector 1003 according to the invention.
  • the first optical element 1102 comprises 122 first raster elements, each with an extension of 54 mm ⁇ 2.75 mm.
  • the second optical element 1104 has 122 second raster elements assigned to the first raster elements, each with a diameter of 10 mm.
  • the optical elements 1106, 1108 and 1110 essentially serve to shape the field in the object plane 1114.
  • the reticle in the object plane is a reflection mask.
  • the reticle can be moved in the drawn direction 1116 in the EUV projection system designed as a scanning system.
  • the exit pupil of the lighting system is largely homogeneously illuminated.
  • the exit pupil coincides with the entrance pupil of a subsequent projection lens.
  • the entrance pupil of the projection lens is not shown. It is located at the point of intersection of the main beam reflected by the reticle with the optical axis of the projection lens.
  • a projection objective 1126 for example with six mirrors 1128.1, 1128.2, 1128.3, 1128.4, 1128.5, 1128.6 according to the US patent application 09/503640, images the reticle onto the object 1124 to be exposed.

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Microscoopes, Condenser (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

L'invention concerne une unité collecteur destinée à des systèmes d'éclairage d'une longueur d'onde = 193 nm, de préférence, située dans la plage des longueurs d'ondes ultraviolet extrême et comprenant au moins une enveloppe réfléchissante ayant une action optique. Les rayons frappent l'enveloppe réfléchissante avec un angle d'incidence = 20° par rapport à la tangente de surface de l'enveloppe réfléchissante. On applique une structure périodique ayant au moins une période réseau au moins sur une partie de l'enveloppe réfléchissante.
EP03711910A 2002-03-28 2003-03-01 Unite collecteur dotee d'un element reflechissant destine a des systemes d'eclairage d'une longueur d'onde inferieure a 193 nm Withdrawn EP1490733A1 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE2002114259 DE10214259A1 (de) 2002-03-28 2002-03-28 Kollektoreinheit für Beleuchtungssysteme mit einer Wellenlänge <193 nm
DE10214259 2002-03-28
PCT/EP2003/002115 WO2003083579A1 (fr) 2002-03-28 2003-03-01 Unite collecteur dotee d'un element reflechissant destine a des systemes d'eclairage d'une longueur d'onde inferieure a 193 nm

Publications (1)

Publication Number Publication Date
EP1490733A1 true EP1490733A1 (fr) 2004-12-29

Family

ID=28458480

Family Applications (1)

Application Number Title Priority Date Filing Date
EP03711910A Withdrawn EP1490733A1 (fr) 2002-03-28 2003-03-01 Unite collecteur dotee d'un element reflechissant destine a des systemes d'eclairage d'une longueur d'onde inferieure a 193 nm

Country Status (5)

Country Link
EP (1) EP1490733A1 (fr)
JP (1) JP2005522026A (fr)
AU (1) AU2003218676A1 (fr)
DE (1) DE10214259A1 (fr)
WO (1) WO2003083579A1 (fr)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007003359A1 (fr) * 2005-07-01 2007-01-11 Carl Zeiss Smt Ag Unite de collecteur destinee a un systeme d'eclairage ayant des longueurs d'onde = 193 nm
WO2007045434A2 (fr) 2005-10-18 2007-04-26 Carl Zeiss Smt Ag Collecteur pour systèmes d'éclairage ayant une longueur d'onde = 193 nm
ATE528692T1 (de) * 2006-07-28 2011-10-15 Media Lario Srl Optische multireflexionssysteme und ihre herstellung
EP2083328B1 (fr) 2008-01-28 2013-06-19 Media Lario s.r.l. Collecteur d'incidence rasante pour sources à plasma produites par laser
DE102010028655A1 (de) 2010-05-06 2011-11-10 Carl Zeiss Smt Gmbh EUV-Kollektor
DE102012201497A1 (de) * 2012-02-02 2013-01-17 Carl Zeiss Smt Gmbh Kollektor mit einem Beugungsgitter
DE102014117453A1 (de) * 2014-11-27 2016-06-02 Carl Zeiss Smt Gmbh Kollektorspiegel für Mikrolithografie

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5016265A (en) * 1985-08-15 1991-05-14 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Variable magnification variable dispersion glancing incidence imaging x-ray spectroscopic telescope
US5682415A (en) * 1995-10-13 1997-10-28 O'hara; David B. Collimator for x-ray spectroscopy
US6064072A (en) * 1997-05-12 2000-05-16 Cymer, Inc. Plasma focus high energy photon source
DE10138313A1 (de) * 2001-01-23 2002-07-25 Zeiss Carl Kollektor für Beleuchtugnssysteme mit einer Wellenlänge < 193 nm
US6118577A (en) * 1998-08-06 2000-09-12 Euv, L.L.C Diffractive element in extreme-UV lithography condenser
US6469827B1 (en) * 1998-08-06 2002-10-22 Euv Llc Diffraction spectral filter for use in extreme-UV lithography condenser
US6278764B1 (en) * 1999-07-22 2001-08-21 The Regents Of The Unviersity Of California High efficiency replicated x-ray optics and fabrication method
DE10127449A1 (de) * 2001-06-07 2002-12-12 Zeiss Carl Beleuchtungssystem mit einer Vielzahl von Einzelgittern

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See references of WO03083579A1 *

Also Published As

Publication number Publication date
JP2005522026A (ja) 2005-07-21
AU2003218676A1 (en) 2003-10-13
WO2003083579A1 (fr) 2003-10-09
DE10214259A1 (de) 2003-10-23

Similar Documents

Publication Publication Date Title
EP1354325B1 (fr) Collecteur presentant une zone inutilisee, destine a des systemes d&#39;eclairage de longueur d&#39;onde inferieur ou egal a 193 nm.
EP1938150B1 (fr) Collecteur pour systèmes d&#39;éclairage ayant une longueur d&#39;onde &lt;/= 193 nm
EP1658615B1 (fr) Systeme collecteur a incidence normale et a reflexion oblique pour des sources lumineuses, en particulier des sources à plasma de décharge dans l&#39;uv extrême
DE60312871T2 (de) Gitter basierter spektraler filter zur unterdrückung von strahlung ausserhalb des nutzbandes in einem extrem-ultraviolett lithographiesystem
DE10138284A1 (de) Beleuchtungssystem mit genesteten Kollektoren
WO2003014833A2 (fr) Collecteur equipe de dispositifs de fixation servant a fixer des coupes miroirs
DE102006014380A1 (de) Projektionsobjektiv und Projektionsbelichtungsanlage mit negativer Schnittweite der Eintrittspupille
DE102011015266A1 (de) EUV-Kollektorsystem mit verbesserter EUV-Strahlungssammlung
EP0873565B1 (fr) Systeme de condenseur-monochromateur pour rayonnement x
US7084412B2 (en) Collector unit with a reflective element for illumination systems with a wavelength of smaller than 193 nm
EP1393134A2 (fr) Systeme d&#39;eclairage dote d&#39;une pluralite de grilles individuelles
EP0053723B1 (fr) Monochromateur à réseau plan
EP1481276B1 (fr) Systeme d&#39;eclairage pourvu d&#39;un collecteur emboite servant a eclairer une pupille de sortie de maniere annulaire
EP1202291B1 (fr) Système d&#39; illumination avec une grille
EP1202100A2 (fr) Système d&#39;illumination avec charge thermique réduite
EP1490733A1 (fr) Unite collecteur dotee d&#39;un element reflechissant destine a des systemes d&#39;eclairage d&#39;une longueur d&#39;onde inferieure a 193 nm
DE102017204312A1 (de) Optische Wellenlängen-Filterkomponente für ein Lichtbündel
DE60319735T2 (de) Beleuchtungssytem mit einer effizienteren kollektoroptik
DE10329141B4 (de) Faltungsgeometrien für EUV-Beleuchtungssysteme
DE102019212017A1 (de) Optisches Beleuchtungssystem zur Führung von EUV-Strahlung
WO2003081712A2 (fr) Element en reseau pour filtrer des longueurs d&#39;onde = 100 nm
DE102005043475A1 (de) Kollektor mit konischen Spiegelschalen
US20050180013A1 (en) Grating element for filtering wavelengths &lt; 100 nm
DE102005048375A1 (de) Vorrichtung und Verfahren zur Erzeugung einer vorbestimmten Ausleuchtung einer Pupille eines optischen Systems
EP1415199A2 (fr) Collecteur equipe de dispositifs de fixation servant a fixer des coupes miroirs

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 20040901

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PT RO SE SI SK TR

AX Request for extension of the european patent

Extension state: AL LT LV MK

RIN1 Information on inventor provided before grant (corrected)

Inventor name: WEISS, MARKUS

RAP1 Party data changed (applicant data changed or rights of an application transferred)

Owner name: CARL ZEISS SMT AG

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN

18D Application deemed to be withdrawn

Effective date: 20071002