EP1430354A2 - Lighting system - Google Patents
Lighting systemInfo
- Publication number
- EP1430354A2 EP1430354A2 EP02800132A EP02800132A EP1430354A2 EP 1430354 A2 EP1430354 A2 EP 1430354A2 EP 02800132 A EP02800132 A EP 02800132A EP 02800132 A EP02800132 A EP 02800132A EP 1430354 A2 EP1430354 A2 EP 1430354A2
- Authority
- EP
- European Patent Office
- Prior art keywords
- mirror
- arrangement according
- partial
- lighting arrangement
- optics
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
- G02B27/4233—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application
- G02B27/4244—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application in wavelength selecting devices
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/48—Laser speckle optics
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
- G02B27/4233—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application
- G02B27/425—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application in illumination systems
Definitions
- the invention relates to a lighting arrangement with a coherence reducer having a mirror, which by means of the mirror impresses different phase shifts depending on the position in the beam cross-section and emits it as an illuminating beam bundle by means of the mirror, and with lighting optics arranged downstream of the coherence reducer a micro-optics with a plurality of optical elements, which are arranged in a grid, and a imaging optics arranged downstream of the micro-optics, the illuminating beam bundle striking the micro-optics and thereby emitting a beam from each optical element which can be used by means of the imaging optics to illuminate an object field
- the coherence reducer serving to reduce the coherence of the radiation beam to such an extent that undesired interference phenomena and speckle in the object field do not occur as far as possible
- the coherence reducer here comprising three discrete mirror plates arranged one above the other at a predetermined distance from one another.
- the mirror plates are parallel to one another and inclined by 45 ° with respect to the incident beam of rays, so that approximately one third of the bundle of rays hits the first mirror plate, while two thirds of the bundle of rays pass behind the first mirror plate.Around half of this bundle of rays hits the second mirror plate, while the other half passes behind the second mirror plate and hits the third mirror plate - lenbundle are deflected on the mirror plates in each case by 90 ° so that the illuminating beam is emitted, which has three partial beams with mutually shifted phases due to the different distances during reflection D
- the coherence reducer described in WO 01/35451 A1 is very complex owing to the discrete mirror plates and the different phase shifts that can be impressed on the radiation beam are limited by the limited number of mirror
- the mirror has a first mirror element, the surface of which is divided into a plurality of partial mirror surfaces which are arranged parallel to one another and offset in the direction of their normal to one another, the beam of rays supplied to the Partial mirror surfaces are reflected in such a way that partial beams emanate from the partial mirror surfaces and are used to form the illuminating beam with the different phase shifts.
- phase shifts By structuring the surface of the first mirror element, a large number of discrete or discontinuous phase shifts can be set, which are impressed on the coherent beam upon reflection on the first mirror element, the mirror part surfaces preferably being flat. Then the discrete phase shifts are also staggered.
- the size of the phase shifts and the size of the sections in the beam cross section, to which the corresponding phase shifts are impressed, can be selected almost as desired and is only limited by the type of structuring.
- a coherent ray bundle is understood here to mean a ray bundle which has a finite temporal coherence length and which is partially or completely coherent spatially or laterally (ie in the beam cross section).
- the optical elements of the micro-optics are preferably arranged in a matrix or grid-like manner in one plane. Therefore, the micro-optics can easily be arranged transversely to the direction of propagation of the illuminating beam, so that each optical element is hit by a plane wavefront at the same time. Furthermore, the coherence reducer in the lighting arrangement according to the invention can be designed such that a predetermined phase shift is impressed on the beam for each optical element of the micro-optics. As a result, the phase of a wave front of the radiation striking all optical elements can be set for each optical element in such a way that the interfering interference effects in the object field are suppressed as completely as possible.
- the optical elements of the micro-optics are arranged in rows and columns and the surface of the first mirror element is structured such that a different phase shift is impressed on the beam supplied for the optical elements of each row or column.
- the illuminating beam bundle for optical elements in adjacent rows or columns striking the optical elements has a jump-like, different phase, so that interference effects of the partial beam bundle emanating from the optical elements arranged in adjacent rows are reduced.
- An individual (step-like or discontinuous) phase shift for each optical element can be achieved, for example, by assigning exactly one partial mirror surface of the first mirror element to each optical element.
- the desired phase shift can thus be achieved with only one optical part (the mirror element with the structured surface), so that the lighting arrangement can be made compact.
- Each partial mirror surface can also be assigned to exactly one optical element, with several partial mirror surfaces being assigned to the same optical element.
- the multiple mirror part surfaces are chosen so that even with a certain misalignment of e.g. In the first mirror element only radiation with the desired phase shift strikes the individual optical elements and the radiation from the misaligned partial mirror surfaces preferably strikes the dead zones (the radiation incident thereon does not reach the condenser optics) between the optical elements. This ensures, even in the event of a misalignment, that coherent radiation preferably does not strike adjacent optical elements, so that the adjustment is simplified.
- the first mirror element comprises a multiplicity of stacked plane-parallel plates (which can each have the same or different thicknesses), the face of the upper plate being set back in relation to the face of the lower plate in the case of two plates lying on top of each other ,
- the surfaces used for reflection can either be the end faces of the plates (then the width of the mirror part surfaces is determined by the thickness of the plates and the step height by the offset) or one of the plane-parallel sides of the plates (then the width of the mirror part surfaces is determined by the offset and the Step height determined by the plate thickness). In this way, the first mirror element can be implemented very simply.
- the first mirror element is formed by microstructuring techniques (such as are used, for example, in semiconductor production) and then, if necessary, to be mirrored.
- microstructuring techniques such as are used, for example, in semiconductor production
- the offset of adjacent mirror partial surfaces corresponds to at least half the time coherence length of the beam.
- partially coherent radiation as is emitted in particular by multimode lasers (e.g. excimer laser), since the partially coherent beam has a relatively short temporal coherence length (coherence length in the direction of propagation of the beam).
- multimode lasers e.g. excimer laser
- an argon fluoride excimer laser emits a beam with a wavelength of approximately 193 nm and a temporal coherence length of approximately 100 ⁇ m.
- the temporal coherence length is understood to mean a minimum (preferably the first minimum) of the temporal coherence function.
- the interference contrast is thus minimal when two beams are superimposed, which have a phase shift by the time coherence length.
- the specified choice of the offset of the mirror part surfaces ensures that the path difference for two partial beam bundles reflected by neighboring mirror part surfaces corresponds at least to the temporal coherence length.
- the two partial beam bundles which usually meet adjacent optical elements of the micro-optics, are thus incoherent to one another, since the spatial coherence is reduced or, if possible, eliminated by using the temporal coherence length.
- a preferred embodiment of the lighting arrangement according to the invention is that the first mirror element, viewed in plan view, has a continuous mirror surface. This ensures that there are virtually no shadowing effects during the reflection on the first mirror element.
- a first intermediate optics (preferably a 1: 1 imaging optics) can be arranged between the first mirror element and the micro-optics, which images the first mirror element onto the micro-optics.
- the mirror of the coherence reducer can have a second mirror element arranged upstream of the first mirror element, the surface of which is structured in such a way that it has a plurality of mirror part surfaces which are arranged parallel to one another and offset in the direction of their surface normal, of which the mirror part surfaces partial beam of rays emerging from the second mirror element has different phase shifts for different ones of the optical elements.
- this second mirror element an improved reduction in coherence can be achieved in a simple manner.
- the step heights are preferably different for the two mirror elements. If the step heights are specified in multiples of the wavelength of the supplied beam, it is advantageous, for example, that the smallest common multiple of these step heights is as large as possible.
- the step heights of the two mirror elements preferably differ by at least one order of magnitude.
- a second imaging optics (preferably a 1: 1 imaging optics) can be provided between the first and second mirror elements, which images the second mirror element onto the first mirror element. This, in turn, effectively prevents mixing of the individual partial beam bundles emanating from the individual mirror partial surfaces.
- the second mirror element viewed in plan view, can have a continuous mirror surface. As a result, almost the entire incident beam is reflected on the second mirror element, so that the losses caused by the second mirror element are extremely low.
- the two mirror elements can each be designed as a step mirror, which are rotated relative to one another, preferably by 90 °. This effectively reduces the coherence in two directions in the beam cross section, so that the illuminating beam bundle incident on the micro-optics has an extremely low coherence.
- the micro-optics can have all the same optical elements and can be designed, for example, as a microlens or shadow mask array.
- micro-optics which is also called multi-aperture optics
- the beam of rays supplied hits the mirror element at an angle of incidence which is in the range from 0 to 20 °.
- the mirror element is preceded by a beam splitter (such as a partially transparent or semitransparent plate which is inclined at 45 ° to the direction of propagation of the beam). This advantageously means that the beam cross-section is not changed during reflection on the mirror element and the shadowing effect is almost completely suppressed.
- the lighting arrangement according to the invention can be used wherever a field is to be illuminated as homogeneously as possible. This can be the case, for example, in microscopy, with steppers in semiconductor production or also in material processing.
- lasers such as e.g. Eximer lasers (e.g. krypton fluoride, argon fluoride or fluoride eximer lasers) can be used.
- Eximer lasers e.g. krypton fluoride, argon fluoride or fluoride eximer lasers
- the coherence reducer has a diffraction grating which is supplied with the supplied beam and which emits a diffracted beam of a predetermined, non-zeroth order (preferred + 1st or -1st order), which is used for formation of the radiation beam. Due to the diffraction, the diffracted beam has a continuous time offset of adjacent parts of the beam cross section in the plane which is spanned by the incident and the diffracted beam. This advantageously further reduces the interference capability of the illuminating beam.
- the diffraction grating can be arranged upstream or downstream of the first mirror element and can be designed as a reflective or transmissive diffraction grating.
- Such diffraction gratings are commercially available, so that the lighting arrangement according to the invention can be easily implemented.
- At least one of the mirror part surfaces of the first mirror element is structured such that it forms the diffraction grating.
- all mirror part surfaces can also be structured as diffraction gratings. This leads to the advantage that, in addition to impressing the sudden phase shift due to the reflection of the partial mirror surfaces, a continuous phase shift due to the diffraction is also generated, so that an excellent reduction in the interference capability of the illuminating beam is achieved with a very compact element.
- the diffraction grating or gratings can be designed such that the current-shaped phase shifts the continuous Nuclear phase shift in different directions in the beam cross section of the illuminating beam are generated.
- the diffraction grating can be designed as a blazed grating (with a sawtooth profile). This has the advantage that a large part of the diffracted light can be concentrated into a desired diffraction order, so that the loss of light at the diffraction grating is minimized.
- the diffraction grating can be used in autocollimation (angle of incidence of the incident beam and angle of reflection of the emerging diffracted beam of the desired order of diffraction are the same). As a result, the beam cross-section remains unchanged during diffraction.
- a further embodiment of the lighting arrangement according to the invention is that the coherence reducer has a beam multiplication device which divides the supplied coherent beam into several partial beams and then combines them into a beam in which the partial beams diverge.
- the partial beams of the beam bundle hit each optical element with different angles, so that each optical element emits several partial illuminating beams with different directions of propagation that can be used to illuminate the object field.
- each optical element emits not only one partial illumination beam, but several partial illumination beams with different directions of propagation, as a result of which a more uniform object field illumination can be achieved. Since several optical partial beams emanate from one optical element, the micro-optics can also have fewer optical elements with a greater spacing from one another in comparison to conventional lighting devices, so that if the distance is set according to the lateral coherence length of the coherent beam, there are no or almost no interference effects in the object field occur more.
- the beam multiplication device can be designed such that the partial beams after the division in the beam multiplication device traverse paths with different optical lengths and only then are brought together to form the beam bundle in which they diverge. In this way, undesired interference effects when the partial beams are brought together can be reduced (or completely suppressed).
- the beam multiplication device contains a first module, which has a first beam splitter and a first and a second modular arm, each with a (preferably flat) end mirror, the beam bundle striking the first beam splitter being divided into a first partial beam, which in the first module beam is coupled in, and is divided into a second partial beam which is coupled into the second modular arm, wherein at least parts of the partial beams reflected back from the end mirrors to the beam splitter are brought together by means of the first beam splitter into a beam bundle with diverging partial beams, at least one of the Both end mirrors have a flat mirror surface which is arranged such that the angle of incidence of the corresponding partial beam is not equal to 0 °.
- Both modular arms preferably enclose an angle of 90 °
- the first module is thus essentially a Michelson interferometer which is detuned with regard to the optical lengths in both modular arms, so that when the reflected partial beams are brought together, interference between the combined partial beams can be reduced and, if appropriate, also completely suppressed. Furthermore, at least one of the end mirrors is somewhat tilted so that the incident and back-reflected partial beam in the corresponding modular arm does not go through the identical path, but enclose an angle of unequal to 0 ° with one another. This makes it possible in the simplest way that the beam bundle united by the first beam splitter contains two diverging beams
- the optical lengths of the two modular arms can differ by at least half the time coherence length of the supplied beam. This ensures that undesired interference effects (which, for example, were visible in the object field) are completely prevented when the back-reflected partial beams are brought together
- the temporal coherence length is understood here to mean the coherence length in the direction of propagation of the beam (or a minimum, preferably the first minimum of the temporal coherence function), since both modular arms are run through twice by the corresponding partial beams, so there is a difference in the optical lengths of at least half the temporal one Coherence length the partial beams no longer interfere with each other when superimposed
- the difference in optical lengths can easily be set to at least half the time coherence length. This is particularly possible with so-called partially coherent radiation.
- Lich as it is emitted in particular by multimode lasers (eg excimer lasers), since the partially coherent beam has a relatively short time coherence length.
- an argon fluoride excimer laser emits a beam with a length of 193 nm and a temporal coherence length of approx. 100 ⁇ m.
- larger coherence lengths in time can also be easily compensated for by changing or adjusting the modular lengths so that the parts superimposed by the beam splitter are no longer capable of interference.
- the beam multiplication device comprises at least a second module with a second beam splitter and a third and fourth modular arm, each with an end mirror, the partial beams brought together by the first beam splitter hitting the second beam splitter and by this into a third partial beam bundle, the is coupled into the third modular arm, and a fourth partial beam is split, which is coupled into the fourth modular arm, at least parts of the third and fourth partial beams reflected back from the end mirrors of the third and fourth modular arms to the second beam splitter by means of the second beam splitter to form the beam bundle with the Partial beams with diverging directions of propagation are combined, at least one of the two end mirrors of the third and fourth modular arms having a flat mirror surface which is arranged such that the angle of incidence of each of the partial beams of the partial beam of the corresponding modular tower is not equal to 0 °.
- the second module doubles the number of diverging partial beams in the beam bundle that strikes the micro-optics, as a result of which the uniform illumination of the object field can be improved.
- the optical path lengths of the third and fourth modular towers can differ by at least half the time coherence length of the beam supplied, so that no undesired interference occurs between the partial beam bundles reflected back from the end mirrors of the third and fourth modular tower and brought together by means of the second beam splitter.
- the diverging beam coming from the second module need not be aimed directly at the micro-optics. But it can e.g. still further second modules are switched individually one after the other, so that with each further second module the number of partial beams in the beam bundle is doubled, which finally strikes the micro-optics.
- These further second modules are preferably designed like the second module already described.
- the modules can be designed such that the modular arms of the first and second modules lie in one plane or in two different planes. This can easily make a compact, at the remaining elements of the lighting device are adapted to the arrangement of the module or its arms.
- a preferred embodiment of the lighting arrangement according to the invention consists in that the first module comprises two prisms, a first of the two prisms resting with its first side on a first side of the second prism and a beam splitter layer forming the first beam splitter being arranged between the two sides, and the first modular arm being in the first prism and the second modular arm being in the second prism.
- This provides a simple technical implementation of the first module. Only basic elements that are familiar from optics and are easy to handle (such as prisms and beam splitter layers) need to be appropriately combined.
- the end mirrors of the two modular arms are realized by mirroring the corresponding prism sides. Appropriate alignment of the prism sides so that total internal reflection takes place can also be used.
- a third prism is provided, the first side of which rests on the first side of the first prism, the first beam splitter layer being provided in between, and the third side of the third prism resting on a second side of the second prism, a second beam splitter layer being arranged between them.
- the distance from adjacent optical elements of the micro-optics can be at least as large as the lateral coherence length (coherence length in the beam cross section) of the beam supplied. This virtually completely prevents interference from partial illuminating rays emanating from neighboring optical elements.
- 1 shows a schematic view of a first embodiment of the lighting arrangement according to the invention
- 2 shows a microlens array in plan view
- FIG. 3 shows a schematic view of a second embodiment of the lighting arrangement according to the invention.
- 4 shows a shadow mask array in plan view
- 5 shows a schematic view of an embodiment of the lighting arrangement with the shadow mask array
- FIGS. 1, 3 and 5 shows a schematic perspective illustration of a further development of the step mirror from FIGS. 1, 3 and 5;
- Fig. 9 is a plan view of the step mirror of Fig. 7;
- FIG. 10 shows a representation of the microlens array, the condenser optics and the object field of the lighting arrangement from FIG. 1;
- FIG. 11 shows a representation of the microlens array, the condenser optics and the object field of the lighting arrangement from FIG. 1 with an upstream beam multiplication device;
- Fig. 12 is a schematic view of an embodiment of the beam multiplier
- FIG. 13 shows a further embodiment of the beam multiplication device.
- the lighting arrangement according to the invention comprises a coherence reducer 1, which has a step mirror 2 and a 4f imaging optics 3 arranged downstream of the step mirror 2, as well as a lighting optics with a microlens array 4 and a condenser optics 5.
- the step mirror 2 is formed from a multiplicity of stacked plane-parallel plates 6 (mirrored quartz plates), the end face 7 of the upper plate 6 being set back in relation to the end face directly below the plate 6 in such a way that a step is formed.
- the exposed surface of the lower plate 6 then forms a partial mirror surface 8 of the step mirror 2.
- the step mirror 2 has as many steps (or as many mirror part surfaces 8) as the microlens array 4 comprises microlenses 9 in the drawing plane of FIG. In the embodiment described here, five steps and five microlenses 9 are shown as examples.
- the microlenses 9 of the microlens array 4 lie in one plane and are arranged in rows and columns (FIG. 2), the microlens array being shown with 5 rows and 10 columns for better clarity, and some of the microlenses 9, for example, in the top view of FIG. 2 are drawn.
- the microlens array is approximately 3 ⁇ 6 mm in size and the diameter of the microlens 9 is approximately 150 ⁇ m.
- the step mirror 2 has as many mirror part surfaces 8 as the microlens array comprises 4 rows. Thus, each step of the step mirror 2 is assigned to the microlenses 9 of a row of the microlens array 4.
- a coherent (or also partially coherent) beam bundle 10 strikes the step mirror 2 and is reflected by it towards the microlens array 4. Due to the steps of the step mirror 2, there are discontinuous or discontinuous phase shifts in the reflected beam 11.
- a wavefront W of the same phase of the incident beam 10 is shown, which for each reflected beam 11 due to the path differences generated by the step mirror 2 partial beams S1 to S5 (which form the reflected beam 11) proceeding from the steps of the step mirror 2 are offset in the direction of propagation relative to the other partial beams S1 to S5. This is shown by the position of the wave fronts W1 to W5 of the same phase in the partial beams S1 to S5.
- the offset of the wave fronts is selected by means of the step height H (which is given by the thickness of the plate 6) in the step mirror 2 such that it corresponds to the temporal coherence length of the beam 10.
- the temporal coherence length corresponds to approximately 100 ⁇ m, so that a step offset of approximately 50 ⁇ m is selected.
- this results in a path difference of approximately 100 ⁇ m for neighboring partial beams, the path difference being somewhat larger due to the oblique incidence of the beam 10.
- the angle of incidence of the beam 10 on the mirror part surfaces 8 is approximately 20 ° here.
- the steps of the step mirror 2 are shown greatly enlarged in the figures in order to be able to represent the step-shaped phase shift in the reflected beam 11.
- the reflected beam 11 thus contains a plurality of cells in the beam cross section (here five, one cell for each partial beam S1-S5), which are incoherent to one another.
- the partial beams S1-S5 are therefore no longer capable of interference, even if there is a relatively large lateral or spatial coherence length in the beam 8.
- the lateral coherence length (coherence length in the beam cross section) can be more than 500 ⁇ m. Due to the described generation of cells in the beam 11 that are offset in the direction of propagation, the lateral or spatial coherence is thus reduced or, if possible, almost completely eliminated by using the temporal coherence.
- the partial beams S1 - S5 are then imaged onto the microlens array 4 by means of the 4f imaging optics 3.
- the 4f imaging optics comprise a first and a second lens 12, 13, each of which has a focal length f on the object and image side.
- the distance of the first line se 12 to the step mirror 2 and the distance of the second lens 13 to the microlens array 4 is f and the two lenses 12, 13 are spaced apart by 2f
- the 4f imaging optics 3 (in FIG. 1 only the beam path of the partial beam bundle S1 is shown in FIG. 1 for the sake of clarity in the 4f imaging optics 3), the microlenses 9 are acted upon with the illuminating beam bundle 11 in such a way that one each with a partial beam bundle S1 to S5 Row of microlenses 9 is illuminated
- a wave front striking the microlens array 4 at one point in time has reduced coherence, since this wavefront is composed of different cells (which are not capable of interference).
- the beam bundles M1-M5 emanating from the microlens array 4 are then directed onto an object field by means of the condenser optics 5 14 (which is preferably spaced from the focal length of the condenser optics 5) so that it is homogeneously illuminated.
- the phase shifts in the partial beam bundles S1 to S5 mean that the beam bundles M1 to M5 do not interfere with one another, so that no disturbing speckle and disturbing interferences occur.
- a pupil plane P which lies between the microlens array and the condenser optics 5
- an adjustable diaphragm (not shown) can also be provided, with which the brightness of the illumination in the object field 14 and the angle spectrum on the Object field 14 -beams can be set.
- the pupil plane P is here preferably the focal plane of the microlenses 9, so that the distance between the main plane of the microscope 9 and the pupil plane corresponds to the focal length of the microscope
- the described illumination optics in the described embodiment is a so-called diffractive micro-homogenizer.
- the illuminating optics can also be designed as an imaging micro-neck homogenizer.
- a further microlens array is arranged between the microlens array 4 and the condenser optics, which preferably has the same number Has microlenses such as the microlens array 4, with in particular a 1 to 1 assignment between the microlenses of the two microlens arrays.
- the further microlens array can be designed in the same way as the microlens array.
- the illumination optics can also be a diffractive or imaging microlens homogenizer or multi-aperture optical homogenizer be trained
- the oblique incidence of the beam 10 on the step mirror 2 also increases the beam cross section in the plane of the drawing. For example, use it to convert the approximately rectangular cross section of the radiation from the argon fluoride excimer laser into an approximately square shape.
- the stepped mirror 2 can also be used to adapt the beam cross section to the shape of the microlens array 4, if this is desired.
- the direction of incidence is reversed (beam 11 falls on the step mirror and is reflected as beam 10), a corresponding reduction in the beam cross section in the plane of the drawing is achieved.
- the mirror element here the step mirror 2 can thus be used to change the cross section.
- FIG. 3 A development of the embodiment shown in FIG. 1 is shown in FIG. 3, in contrast to the embodiment shown in FIG. 1 a second step mirror 15 is additionally provided.
- the second step mirror 15 is formed in the same way as the first step mirror 2 from a plurality of plane-parallel plates 16 which are stacked one on top of the other, the plates being set back in relation to the plate 16 lying directly underneath, so that steps with flat mirror part surfaces 17 are formed.
- the second is arranged upstream of the first step mirror 2 and is rotated by 90 ° relative to the latter.
- the second step mirror 12 has a larger step height (the plates 16 are thicker than the plates 6) than the first step mirror 2, so that a reduction in the coherence in both directions in cross-section is possible.
- step height in the second mirror element 15 ensures that different phase shifts are also impressed on beam bundle positions in the beam cross section which are not immediately adjacent in cross section but are at a greater distance from one another.
- the step height is preferably chosen so that the same phase shift occurs at the earliest at beam positions whose distance is greater than the spatial coherence length.
- the step height can be selected such that even the partial light beams emanating from the microlenses 9 in the diagonally opposite corners in the microlens array 4 cannot interfere with one another.
- the step heights in the first and second mirror elements 2, 15 do not have to be constant, but can vary.
- the step mirrors 2, 15 can also be seen in cross-section, both rising and falling, and a statistical distribution of the step heights is also possible.
- the coherent beam 10 falls on the second step mirror 15 (approximately below 20 ° to the surface normal of the mirror surface 17) and is reflected by the latter towards the first step mirror.
- Partial beams lying one above the other are generated with a phase shift caused by the reflection, only one partial beam 18 with associated wavefront W of the same phase being shown in FIG. 3.
- the partial beams 18 hit the first mirror element 2 and are reflected by it in the same way as in the embodiment of FIG. 1, so that reference is made to the relevant description.
- each individual microscope 9 is exposed to incoherent radiation relative to the radiation which strikes the immediately adjacent and possibly further spaced apart microlenses 9.
- the distance between adjacent microlenses 9 can thus be significantly smaller than the spatial coherence length of the coherent beam 10 without undesired interference effects occurring in the object field 14.
- a 4f imaging optics (not shown) is arranged between the two step mirrors 2, 15, which images the mirror surface of the second step mirror 15 onto the mirror surface of the first step mirror. This can ensure that due to the existing divergence of the coherent beam 10 there is no (or only a very slight) mixing of the partial beams 18 generated during the reflection at the second step mirror.
- the shadow mask array 19 has a multiplicity of through holes 20 arranged in columns and rows, the diameter of which is selected such that, due to diffraction effects, a diverging beam of rays emerges behind each hole, which then in the same way as in the above-described embodiments by means of condenser optics 5 is mapped onto the object field (Fig. 5).
- the diffraction-related image of each through hole 20 has a size adapted to the object field 14.
- the diameter of the through holes 20 is approximately 10 ⁇ m in the exemplary embodiment described.
- the diameter of the through holes 20 is smaller than the diameter of the microlenses 9 of the lens array 4, more through holes 20 can be provided with the same beam cross section, so that more quasi-radiation sources are provided which are imaged on the object field.
- the step level is preferably adjusted so that the gangslocher incoherent parts of the reflecting beam 10 reflected on the step mirror This can be achieved by providing an adjustable aperture (not shown) between shadow mask array 19 and condenser optics 5 a very uniform adjustability of the brightness in the object field
- annular diaphragm 21 with a circular recess 22 can be arranged directly in front of the condenser optics 5, as is shown in FIG. 5, with which higher diffraction orders than the zeroth diffraction order are dimmed. Thus, if possible, only the zeroth diffraction order is imaged in the object field 14.
- the ring diaphragm 21 can of course also be arranged between the condenser optics 5 and the object field 14, directly on the condenser optics 5 or, if the condenser optics 5 comprises several optical elements, within the condenser optics 5
- FIG. 6 A further embodiment of the coherence reducer 1 is shown in FIG. 6, in which the beam 8 can be incident perpendicularly on the step mirror 2.
- a beam splitter 23 is provided, which is arranged upstream of the step mirror 2.
- the beam splitter 23 can be a partially transparent plate, the 50% of the incident radiation can be transmitted and the other half reflected.
- FIG. 6 only the beam path for the radiation that can be used to illuminate the object field 14 is shown.
- the same elements as those of the embodiment shown in FIG Identified by the same diffraction mark
- the desired phase shift is also generated in this embodiment, the shading effect on the step mirror 2 practically being eliminated due to the vertical radiation incidence.
- the coherence reducer 1 shown in FIG. 6 can be used in particular in any of the embodiments described above two such coherence reducers can be rotated by 90 ° (corresponding to the embodiment in FIG. 3)
- FIG. 7 shows a schematic perspective representation of a development of the step mirror 2 shown in the embodiments of FIGS. 1, 3 and 5.
- the mirror part surfaces 8 are each structured such that they form a reflective diffraction grating 24 Alignment of the grid furrows shown by the thin lines 25 shown.
- the grid furrows extend in the Y direction
- the reflection grating 24 has a sawtooth profile and thus represents a so-called blazed grating. With such a blazed grating, a large part of what is bent on the grating can be seen Light is concentrated on a desired diffraction order In the present example the +1 th or -1 st diffraction order is used The effect of the diffraction gratings 24 is illustrated in the top view which is shown in FIG. 9.
- the diffraction at the individual diffraction grating of the mirror partial surfaces 8 leads to a continuous time offset in each partial beam bundle S1 to S5 emanating from each mirror partial surface 8 in the plane that is spanned by the incident beam bundles 10 and the corresponding diffracted partial beam bundle S1 to S5.
- the different time offset caused by the diffraction thus occurs in the Z direction.
- the abrupt temporal offset of the partial beams emanating or diffracted from the individual partial mirrors 8 in the Y direction is of course also effected.
- the wavefront W (or the plane of the same emission time) in front of the step mirror 2 and the corresponding wave fronts W1, W2, W3, W4 and W5 after the diffraction and reflection on the step mirror 2 are shown in FIG can be referred to as a step grid element.
- this step mirror is technologically easy to manufacture.
- the diffraction gratings 24 on the mirror part surfaces 8 can easily be formed as a blaze grating by known holographic methods.
- the step mirror 2 shown in FIG. 7 is preferably used in such a way that the diffraction gratings 24 are used in the vicinity of the autocollimation condition.
- Autocollimation conditions are understood to mean that the angle of the incident beam 10 and the angle of the diffracted beam of the desired order are the same. If work is now carried out in the vicinity of the autocollimation conditions, there is a slight spatial deformation of the beam cross section by the step mirror 2.
- the structure of Fig. 6 is preferred.
- FIG. 10 shows the part with the microlens array 4, the condenser optics 5 and the object field 14 of the lighting arrangement from FIG. 1 when the diffracted beams S1 to S5 strike the microlens array 4.
- the top view is shown in FIG. 10 when the illustration in FIG. 1 corresponds to the side view. To simplify matters, only the level of the same emission time W1 of the partial beam S1 is shown.
- the imaging by means of the individual microlenses 9 causes the partial wave fronts W11, W12, W13, W14 and W15 to flip over, as a result of which a time offset D or a phase shift between the individual ones of the bundles of rays M6, M7, M8, M9, M10 emanating from the microlenses 9 are present.
- the individual bundles of rays M6 to M10 do not interfere with one another in the object field 14, so that there are no disturbing speckles and disturbing interferences
- the diffraction gratings 24 can also be provided separately from the step mirror 2 in the coherence reducer 1.
- a reflective or transmissive diffraction grating (not shown) can be arranged upstream or downstream of the step mirror 2 in the embodiment of FIG. 1
- FIG. 11 shows the microlens array, the condenser optics and the object field of the lighting arrangement from FIG. 1 with an upstream beam multiplication arrangement V, which the beam of rays 11 reflected by the step mirror 2 strikes.
- the 4f imaging optics 3 are located
- the beam multiplication device V comprises a first and a second module 27, 28, which have essentially the same structure.
- the first module 27 contains a first beam splitter 29, a first and a second modular arm 30, 31, each with an end mirror 32, 33 and is over a Connecting arm 34 connected to the second module 28, which has a second beam splitter 35 and a third and fourth modular arm 36, 37 i
- the optical path lengths of the two modular arms 30, 31 and 36, 37 of the two modules 27, 28 are each selected so that they differ by at least half the coherence length of the beam bundle 11 striking the first beam splitter 29.
- the end mirror 32 of the first modular beam 30 and the end mirror 39 of the fourth modular beam 37 are inclined so that the partial beams striking these end mirrors 32, 39 have an angle of incidence not equal to 0 °
- the beam 11 coming from the step mirror 2 strikes the first beam splitter 29 which is inclined at 45 ° with respect to the direction of the incident beam 11 and which beams the beam 11 into a first partial beam 40 which is coupled into the first modular arm 30. and split a second partial beam 41, which is coupled into the second modular arm 31.
- the two partial beams 40, 41 are reflected back to the mirror 32, 33 to the first beam splitter 29, the partial beam 42 reflected at the end mirror 32 having an angle unequal to the incident partial beam 40 0 °, while the partial beam 41 reflected at the end mirror 33 runs back into itself and strikes the first beam plate 29.
- the beams in the beam multiplication device V only the directions of propagation are shown in FIG. 11.
- each beam has a certain beam cross section
- the first beam splitter 29 superimposes parts of the back-reflected partial beams to form a beam 43 which contains two partial beams 44, 45 with divergent directions of propagation which impinge on the second beam splitter 35.
- the beam 43 is split at the beam splitter 35 and coupled into the third and fourth modular arms 36, 37, and the coupled beams are reflected at the end mirrors 38, 39 back to the second beam splitter 35 and superimposed thereon, so that a emerging beam 47 is generated. that contains four divergent partial beams 48, 49, 50 and 51.
- the beam multiplication device V therefore corresponds essentially to two series-connected, detuned Michelson interferometers, both the length of the individual arms and the orientation of the end mirrors being detuned.
- the emerging beam 47 (now drawn as a beam with a spatial extension) now strikes the microlens array 4, the further beam path after the microlens array 4 being drawn in for clarification only for one of the microlenses 9 of the microlens array 4.
- the beam path is corresponding for the other microlenses 9.
- the micro-neck Due to the different directions of propagation of the partial beams 48 to 51, the micro-neck generates four focal points or foci in the pupil plane P.
- four micro-lighting bundles M1, M2, M3, M4 emanate from their micro-focal points, their focal points (or locations with the smallest beam cross-section ) not on top of each other, but next to each other (preferably on one level). This results in a more uniform pupil filling.
- the object field 14 is then illuminated by means of the condenser optics 5.
- an adjustable diaphragm (not shown) can also be provided, as is known from microscopy, with which the brightness of the illumination in the object field 14 and the angular spectrum on the Object field 14 striking rays is adjustable. Due to the uniform pupil filling with the many focal points (number of microlenses times the number of partial beams of the beam 47), for example, the brightness can be changed very evenly by varying the diaphragm diameter (without brightness jumps).
- FIG. 12 shows a compact embodiment of the beam multiplication device V, which comprises only a single detuned Michelson interferometer.
- the beam multiplication device V contains a 90 ° prism 52 and a further prism 53 which is not a 90 ° prism. Both prisms 52, 53 are arranged such that a beam splitter layer 54 can be provided between the two mutually facing sides H1 and H2, which acts as the first beam splitter.
- the incident beam or beam bundle 11 strikes through a first catheter side K1 of the first prism 52, passes through the first prism 52 and strikes the beam splitter layer 54. A part of the incident beam 11 is reflected on the beam splitter layer 54 (upwards in FIG. 12) and the other part is transmitted.
- the reflected part is reflected back to the beam splitter layer 54 on the second catheter side K2 of the first prism 52, which is mirrored.
- the transmitted part passes through the second prism 53 and is mirrored on the corresponding side K3 of the second prism 53.
- Reflected back to the beam splitter layer 54 Parts of the beams reflected back are brought together at the beam splitter layer 54 and pass through the second prism 53 and emerge on the third side K4 of the second prism 53 as an emerging beam 47
- the first modular arm 30 is thus in the first prism 52 and the second modular arm 31 is on the second prism 53.
- the different optical path lengths in the two modular arms 30, 31 are set by the different sizes of the two prisms 52, 53 since the second side K3 of the second If prism 53 is at an angle of not equal to 90 ° with respect to the incident partial beam (thus the angle of incidence of the partial beam is not equal to 0 °), the emerging beam 47 has two partial beams 48, 49.
- the two prisms 52, 53 are preferably quartz prisms
- each beam multiplication device V shown in FIG. 12 can be connected in series, each beam multiplication device V doubling the partial beams with diverging directions of propagation in the emerging beam
- FIG. 13 A further embodiment of the beam multiplication device V is shown in FIG. 13, in which case three 90 ° -pinsms 55, 56 and 57 (preferably quartz prisms) are provided and thus three detuned Michelson interferometers, which are connected in series, are realized on the hypotenuse side H1 of the first prism 55 each abut the second and third prism 56, 57 with one of their cathetus sides K3, K5, a beam splitter layer 58 being provided in between.
- the second prism 56 with its second cathetus side K4 lies on the second cathetus side K6 of the third prism 57, again a beam splitter layer 59 being provided in between
- the two hypotenuse sides H2, H3 of the second and third prism 56, 57 and parts T1, T2 of the two cathetus sides K1, K2 of the first prism 55 are mirrored.
- three beam splits take place, so that the beam bundle that emerges 47 is composed of eight partial beams
- the hypotenuse side H2 and H3 of the second and third prism 56, 57 have a corresponding inclination (not shown) to the incident partial rays, so that this partial tilting of the two hypotenuse sides H2 and H3 with eight diverging directions of propagation (not shown) in the outgoing Beams 47 are included.
- the described beam multiplication devices V can not only be arranged downstream of the step mirror 2, but also upstream. In this case, the diverging beam already strikes the step mirror 2.
Abstract
Description
Claims
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2001148167 DE10148167A1 (en) | 2001-09-28 | 2001-09-28 | lighting arrangement |
DE10148167 | 2001-09-28 | ||
PCT/EP2002/010849 WO2003029875A2 (en) | 2001-09-28 | 2002-09-27 | Lighting system |
Publications (1)
Publication Number | Publication Date |
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EP1430354A2 true EP1430354A2 (en) | 2004-06-23 |
Family
ID=7700818
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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EP02800132A Ceased EP1430354A2 (en) | 2001-09-28 | 2002-09-27 | Lighting system |
Country Status (3)
Country | Link |
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EP (1) | EP1430354A2 (en) |
DE (1) | DE10148167A1 (en) |
WO (1) | WO2003029875A2 (en) |
Families Citing this family (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10335670A1 (en) * | 2003-08-04 | 2005-03-03 | Carl Zeiss Sms Gmbh | coherence-reducing |
DE10338244A1 (en) * | 2003-08-20 | 2005-03-10 | Zeiss Carl Sms Gmbh | Coherence reducer and manufacturing method of a coherence reducer |
DE10345430A1 (en) * | 2003-09-30 | 2005-06-02 | Carl Zeiss Sms Gmbh | lighting device |
DE10345784A1 (en) * | 2003-10-01 | 2005-04-21 | Zeiss Carl Sms Gmbh | coherence-reducing |
DE10354582A1 (en) * | 2003-11-21 | 2005-06-30 | Hentze-Lissotschenko Patentverwaltungs Gmbh & Co.Kg | Arrangement and method for suppressing speckle structures of a pulsed laser beam |
DE102004011468A1 (en) * | 2004-03-09 | 2005-09-29 | Carl Zeiss Sms Gmbh | lighting arrangement |
US7586959B2 (en) * | 2004-09-27 | 2009-09-08 | Applied Materials, Israel, Ltd. | Speckle reduction with transparent blocks |
DE102005042005A1 (en) | 2004-12-23 | 2006-07-06 | Carl Zeiss Smt Ag | Objective lens esp. as micro-lithography projection objective, has objective divided into first part-objective with single mirror and second part-objective with primary and secondary mirror |
US20070127005A1 (en) | 2005-12-02 | 2007-06-07 | Asml Holding N.V. | Illumination system |
US7532403B2 (en) | 2006-02-06 | 2009-05-12 | Asml Holding N.V. | Optical system for transforming numerical aperture |
EP1984789B1 (en) | 2006-02-17 | 2013-11-06 | Carl Zeiss SMT GmbH | Illumination system for microlithographic projection exposure apparatus comprising an illumination system of this type |
DE102006009212A1 (en) * | 2006-02-28 | 2007-08-30 | Carl Zeiss Sms Gmbh | Optical device for homogenization of laser radiation, has homogenizing module, which divides laser radiation in incoherent partial radiation lateral to each other |
US7545838B2 (en) * | 2006-06-12 | 2009-06-09 | Coherent, Inc. | Incoherent combination of laser beams |
DE102007023411A1 (en) | 2006-12-28 | 2008-07-03 | Carl Zeiss Smt Ag | Field illumination system for microlithographic projection exposure system, has illumination angle variation device influencing intensity and/or phase of light so that intensity contribution of raster units to total intensity is varied |
US8279514B2 (en) | 2007-01-24 | 2012-10-02 | Osram Ag | Optoelectronic device |
US7843558B2 (en) | 2008-06-25 | 2010-11-30 | Applied Materials South East Asia Pte. Ltd. | Optical inspection tools featuring light shaping diffusers |
DE102009009366A1 (en) | 2009-02-18 | 2010-08-19 | Limo Patentverwaltung Gmbh & Co. Kg | Device for homogenizing laser radiation |
DE102010052675A1 (en) | 2010-11-23 | 2012-05-24 | Bundesrepublik Deutschland, vertr. d. d. Bundesministerium für Wirtschaft und Technologie, dieses vertr. d. d. Präsidenten der Physikalisch-Technischen Bundesanstalt | Phase mixing device, lighting device and method for reducing the spatial coherence of electromagnetic radiation |
DE102013219057A1 (en) | 2013-09-23 | 2015-03-26 | Carl Zeiss Smt Gmbh | Facet mirror for a projection exposure machine |
CN109431455A (en) * | 2018-12-21 | 2019-03-08 | 合肥奥比斯科技有限公司 | Bimodal eyeground imaging system |
CN111221119B (en) * | 2020-03-16 | 2021-11-30 | 苏州大学 | Artificial microstructure construction method and optical system comprising artificial microstructure |
CN111190278B (en) * | 2020-03-16 | 2021-11-23 | 苏州大学 | Method for regulating and controlling light beam coherence by utilizing artificial microstructure |
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DE19812803A1 (en) * | 1998-03-16 | 1999-10-07 | Gf Mestechnik Gmbh | Spatial filter array manufacture |
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FR2385241A1 (en) * | 1976-12-23 | 1978-10-20 | Marie G R P | POLARIZATION MODE CONVERTERS FOR LASER BEAMS AND PLASMA GENERATORS USING THEM |
DE3532416A1 (en) * | 1985-09-11 | 1987-03-12 | Diehl Gmbh & Co | METHOD AND DEVICE FOR INCREASING THE PERFORMANCE DENSITY IN A FOCUSED HIGH-ENERGY LASER BEAM |
US4944580A (en) * | 1988-07-27 | 1990-07-31 | Thermo Electron Technologies Corp. | Active segmented mirror including a plurality of piezoelectric drivers |
SU1663416A1 (en) * | 1989-07-13 | 1991-07-15 | Новосибирский электротехнический институт | Interference device for measuring displacements of objects |
DE19501525C1 (en) * | 1995-01-19 | 1996-04-04 | Schneider Rundfunkwerke Ag | Interference prevention system for coherent light bundle |
DE19616863C2 (en) * | 1995-04-28 | 1998-08-06 | Fraunhofer Ges Forschung | Arrangement for coherence reduction and beam homogenization of high-power laser radiation |
WO2001035451A1 (en) * | 1999-11-09 | 2001-05-17 | Nikon Corporation | Illuminator, aligner, and method for fabricating device |
-
2001
- 2001-09-28 DE DE2001148167 patent/DE10148167A1/en not_active Withdrawn
-
2002
- 2002-09-27 EP EP02800132A patent/EP1430354A2/en not_active Ceased
- 2002-09-27 WO PCT/EP2002/010849 patent/WO2003029875A2/en not_active Application Discontinuation
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
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DE19812803A1 (en) * | 1998-03-16 | 1999-10-07 | Gf Mestechnik Gmbh | Spatial filter array manufacture |
Non-Patent Citations (1)
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Also Published As
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WO2003029875A2 (en) | 2003-04-10 |
DE10148167A1 (en) | 2003-04-17 |
WO2003029875A3 (en) | 2003-12-11 |
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