EP1323004A4 - LIGHT-SENSITIVE RESIN COMPOSITION FOR FLEXOGRAPHIC PRINTING PLATES - Google Patents

LIGHT-SENSITIVE RESIN COMPOSITION FOR FLEXOGRAPHIC PRINTING PLATES

Info

Publication number
EP1323004A4
EP1323004A4 EP01959539A EP01959539A EP1323004A4 EP 1323004 A4 EP1323004 A4 EP 1323004A4 EP 01959539 A EP01959539 A EP 01959539A EP 01959539 A EP01959539 A EP 01959539A EP 1323004 A4 EP1323004 A4 EP 1323004A4
Authority
EP
European Patent Office
Prior art keywords
resin composition
photosensitive resin
flexographic printing
printing plates
flexographic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP01959539A
Other languages
German (de)
English (en)
French (fr)
Other versions
EP1323004A1 (en
Inventor
Douglas Leach
Rosemarie Palmer-Sungail
Annabel Younghi Lee
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MacDermid Inc
Original Assignee
MacDermid Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by MacDermid Inc filed Critical MacDermid Inc
Publication of EP1323004A1 publication Critical patent/EP1323004A1/en
Publication of EP1323004A4 publication Critical patent/EP1323004A4/en
Withdrawn legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/035Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
EP01959539A 2000-08-30 2001-08-02 LIGHT-SENSITIVE RESIN COMPOSITION FOR FLEXOGRAPHIC PRINTING PLATES Withdrawn EP1323004A4 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US65174600A 2000-08-30 2000-08-30
PCT/US2001/024547 WO2002019035A1 (en) 2000-08-30 2001-08-02 Photosensitive resin composition for flexographic printing plates
US651746 2010-01-04

Publications (2)

Publication Number Publication Date
EP1323004A1 EP1323004A1 (en) 2003-07-02
EP1323004A4 true EP1323004A4 (en) 2005-06-08

Family

ID=24614063

Family Applications (1)

Application Number Title Priority Date Filing Date
EP01959539A Withdrawn EP1323004A4 (en) 2000-08-30 2001-08-02 LIGHT-SENSITIVE RESIN COMPOSITION FOR FLEXOGRAPHIC PRINTING PLATES

Country Status (5)

Country Link
EP (1) EP1323004A4 (ja)
JP (1) JP2004514159A (ja)
AU (1) AU2001281085A1 (ja)
TW (1) TW588216B (ja)
WO (1) WO2002019035A1 (ja)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010119647A1 (ja) * 2009-04-14 2010-10-21 住友ベークライト株式会社 感光性樹脂組成物、接着フィルムおよび受光装置
JP2011093308A (ja) * 2009-09-30 2011-05-12 Fujifilm Corp レーザー彫刻用樹脂組成物、レーザー彫刻用レリーフ印刷版原版とその製造方法、及び、レリーフ印刷版とその製版方法
EP3432070A4 (en) * 2016-03-16 2019-09-25 Toyobo Co., Ltd. PHOTOSENSITIVE RESIN COMPOSITION FOR FLEXOGRAPHIC PRINTING FOR WATER DEVELOPMENT, AND ORIGINAL PLATE OF PHOTOSENSITIVE RESIN FOR FLEXOGRAPHIC PRINTING OBTAINED BY USING THE SAME
EP3665232A4 (en) 2017-08-10 2021-04-07 Sun Chemical Corporation UV CURABLE COMPOSITIONS CONTAINING ACYLPHOSPHINE OXIDE PHOTOINITIATORS
CN111065964B (zh) * 2017-09-05 2023-08-11 东洋纺Mc株式会社 可水显影的柔性印刷用感光性树脂组合物、及由该组合物得到的柔性印刷用感光性树脂原版
WO2019190585A1 (en) 2018-03-27 2019-10-03 Sun Chemical Corporation Uv-curable compositions comprising cleavage type photoinitiators

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1020766A1 (en) * 1999-01-14 2000-07-19 Macdermid Incorporated Photosensitive resin composition for flexographic printing plates

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2235927B (en) * 1989-09-14 1992-10-21 Asahi Chemical Ind A sulfonic acid group-containing polyurethane and a photosensitive resin composition containing the same
JP3060656B2 (ja) * 1990-11-26 2000-07-10 セイコーエプソン株式会社 液晶表示素子
US5939205A (en) * 1996-04-16 1999-08-17 Toyo Boseki Kabushiki Kaisha Gas barrier resin film
KR100566042B1 (ko) * 1997-10-07 2006-05-25 간사이 페인트 가부시키가이샤 포지티브형전착포토레지스트조성물및패턴의제조방법

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1020766A1 (en) * 1999-01-14 2000-07-19 Macdermid Incorporated Photosensitive resin composition for flexographic printing plates

Also Published As

Publication number Publication date
JP2004514159A (ja) 2004-05-13
AU2001281085A1 (en) 2002-03-13
WO2002019035A1 (en) 2002-03-07
TW588216B (en) 2004-05-21
EP1323004A1 (en) 2003-07-02

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Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 20030328

AK Designated contracting states

Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR

AX Request for extension of the european patent

Extension state: AL LT LV MK RO SI

RBV Designated contracting states (corrected)

Designated state(s): DE ES FR GB IT

A4 Supplementary search report drawn up and despatched

Effective date: 20050426

17Q First examination report despatched

Effective date: 20100917

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN

18D Application deemed to be withdrawn

Effective date: 20110128