EP1307600A4 - PROCESS FOR REDUCING OXYGEN AND COBALT OXIDE CONTENT TO PRODUCE COBALT TARGETS FOR CATHODIC SPRAY - Google Patents
PROCESS FOR REDUCING OXYGEN AND COBALT OXIDE CONTENT TO PRODUCE COBALT TARGETS FOR CATHODIC SPRAYInfo
- Publication number
- EP1307600A4 EP1307600A4 EP01963786A EP01963786A EP1307600A4 EP 1307600 A4 EP1307600 A4 EP 1307600A4 EP 01963786 A EP01963786 A EP 01963786A EP 01963786 A EP01963786 A EP 01963786A EP 1307600 A4 EP1307600 A4 EP 1307600A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- cobalt
- procuce
- oxygen
- reducing
- oxide content
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C19/00—Alloys based on nickel or cobalt
- C22C19/03—Alloys based on nickel or cobalt based on nickel
- C22C19/05—Alloys based on nickel or cobalt based on nickel with chromium
- C22C19/051—Alloys based on nickel or cobalt based on nickel with chromium and Mo or W
- C22C19/055—Alloys based on nickel or cobalt based on nickel with chromium and Mo or W with the maximum Cr content being at least 20% but less than 30%
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B23/00—Obtaining nickel or cobalt
- C22B23/06—Refining
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C1/00—Making non-ferrous alloys
- C22C1/02—Making non-ferrous alloys by melting
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C19/00—Alloys based on nickel or cobalt
- C22C19/03—Alloys based on nickel or cobalt based on nickel
- C22C19/05—Alloys based on nickel or cobalt based on nickel with chromium
- C22C19/051—Alloys based on nickel or cobalt based on nickel with chromium and Mo or W
- C22C19/053—Alloys based on nickel or cobalt based on nickel with chromium and Mo or W with the maximum Cr content being at least 30% but less than 40%
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C19/00—Alloys based on nickel or cobalt
- C22C19/03—Alloys based on nickel or cobalt based on nickel
- C22C19/05—Alloys based on nickel or cobalt based on nickel with chromium
- C22C19/051—Alloys based on nickel or cobalt based on nickel with chromium and Mo or W
- C22C19/056—Alloys based on nickel or cobalt based on nickel with chromium and Mo or W with the maximum Cr content being at least 10% but less than 20%
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C19/00—Alloys based on nickel or cobalt
- C22C19/03—Alloys based on nickel or cobalt based on nickel
- C22C19/05—Alloys based on nickel or cobalt based on nickel with chromium
- C22C19/058—Alloys based on nickel or cobalt based on nickel with chromium without Mo and W
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US22279500P | 2000-08-03 | 2000-08-03 | |
US222795P | 2000-08-03 | ||
PCT/US2001/024396 WO2002012577A1 (en) | 2000-08-03 | 2001-08-03 | Method for reducing the oxygen and oxide content in cobalt to procuce cobalt sputtering targets |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1307600A1 EP1307600A1 (en) | 2003-05-07 |
EP1307600A4 true EP1307600A4 (en) | 2007-01-24 |
Family
ID=22833707
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP01963786A Withdrawn EP1307600A4 (en) | 2000-08-03 | 2001-08-03 | PROCESS FOR REDUCING OXYGEN AND COBALT OXIDE CONTENT TO PRODUCE COBALT TARGETS FOR CATHODIC SPRAY |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP1307600A4 (ko) |
KR (1) | KR20030019645A (ko) |
WO (1) | WO2002012577A1 (ko) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20030023640A (ko) | 2000-06-30 | 2003-03-19 | 허니웰 인터내셔널 인코포레이티드 | 금속처리방법, 그 방법에 사용되는 장치 및 그로부터제조된 금속 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1288189A (ko) * | 1971-03-29 | 1972-09-06 | ||
JPH07252565A (ja) * | 1994-03-14 | 1995-10-03 | Mitsubishi Steel Mfg Co Ltd | 磁気記録媒体用コバルト基合金およびその製造方法 |
WO1999010548A1 (en) * | 1997-08-26 | 1999-03-04 | The Alta Group, Inc. | High purity cobalt sputter target and process of manufacturing the same |
JP2000129399A (ja) * | 1998-10-22 | 2000-05-09 | Nisshin Steel Co Ltd | シャドウマスク用Fe−Ni合金及びその製造方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE69215021T2 (de) * | 1991-02-15 | 1997-04-03 | Sumitomo Electric Industries | Diamantsyntheseverfahren |
DE19609439A1 (de) * | 1995-03-14 | 1996-09-19 | Japan Energy Corp | Verfahren zum Erzeugen von hochreinem Kobalt und Sputtering-Targets aus hochreinem Kobalt |
US6123783A (en) * | 1997-02-06 | 2000-09-26 | Heraeus, Inc. | Magnetic data-storage targets and methods for preparation |
US6251337B1 (en) * | 1999-09-13 | 2001-06-26 | Acton Materials, Inc. | Apparatus and method for treating a particulate material within a rotating retort |
-
2001
- 2001-08-03 EP EP01963786A patent/EP1307600A4/en not_active Withdrawn
- 2001-08-03 KR KR10-2003-7001516A patent/KR20030019645A/ko not_active Application Discontinuation
- 2001-08-03 WO PCT/US2001/024396 patent/WO2002012577A1/en active Application Filing
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1288189A (ko) * | 1971-03-29 | 1972-09-06 | ||
JPH07252565A (ja) * | 1994-03-14 | 1995-10-03 | Mitsubishi Steel Mfg Co Ltd | 磁気記録媒体用コバルト基合金およびその製造方法 |
WO1999010548A1 (en) * | 1997-08-26 | 1999-03-04 | The Alta Group, Inc. | High purity cobalt sputter target and process of manufacturing the same |
JP2000129399A (ja) * | 1998-10-22 | 2000-05-09 | Nisshin Steel Co Ltd | シャドウマスク用Fe−Ni合金及びその製造方法 |
Non-Patent Citations (1)
Title |
---|
See also references of WO0212577A1 * |
Also Published As
Publication number | Publication date |
---|---|
KR20030019645A (ko) | 2003-03-06 |
EP1307600A1 (en) | 2003-05-07 |
WO2002012577A1 (en) | 2002-02-14 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 20030207 |
|
AK | Designated contracting states |
Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR |
|
RBV | Designated contracting states (corrected) |
Designated state(s): AT BE CH CY DE FR GB IE IT LI |
|
A4 | Supplementary search report drawn up and despatched |
Effective date: 20061227 |
|
RIC1 | Information provided on ipc code assigned before grant |
Ipc: C22C 1/06 20060101ALI20061219BHEP Ipc: C22B 23/06 20060101AFI20061219BHEP Ipc: C22C 19/07 20060101ALI20061219BHEP |
|
17Q | First examination report despatched |
Effective date: 20070510 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
|
18D | Application deemed to be withdrawn |
Effective date: 20080920 |