EP1144308A1 - Process for the preparation of inorganic compounds - Google Patents
Process for the preparation of inorganic compoundsInfo
- Publication number
- EP1144308A1 EP1144308A1 EP00907465A EP00907465A EP1144308A1 EP 1144308 A1 EP1144308 A1 EP 1144308A1 EP 00907465 A EP00907465 A EP 00907465A EP 00907465 A EP00907465 A EP 00907465A EP 1144308 A1 EP1144308 A1 EP 1144308A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- component
- process according
- acid
- aqueous liquor
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000000034 method Methods 0.000 title claims abstract description 60
- 230000008569 process Effects 0.000 title claims abstract description 59
- 238000002360 preparation method Methods 0.000 title abstract description 5
- 150000002484 inorganic compounds Chemical class 0.000 title description 2
- 229910010272 inorganic material Inorganic materials 0.000 title description 2
- 239000002253 acid Substances 0.000 claims abstract description 51
- 229910052783 alkali metal Inorganic materials 0.000 claims abstract description 31
- -1 alkali metal salt Chemical class 0.000 claims abstract description 23
- 150000001875 compounds Chemical class 0.000 claims abstract description 23
- 230000015572 biosynthetic process Effects 0.000 claims abstract description 12
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims abstract description 10
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 claims abstract description 9
- 239000010703 silicon Substances 0.000 claims abstract description 9
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 9
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract description 9
- 150000001340 alkali metals Chemical class 0.000 claims abstract description 8
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims abstract description 8
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 8
- 239000010937 tungsten Substances 0.000 claims abstract description 8
- 125000004429 atom Chemical group 0.000 claims abstract description 7
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims abstract description 5
- 229910052750 molybdenum Inorganic materials 0.000 claims abstract description 5
- 239000011733 molybdenum Substances 0.000 claims abstract description 5
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 claims abstract description 5
- 229910052720 vanadium Inorganic materials 0.000 claims abstract description 5
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical group [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims abstract description 4
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 4
- 239000001257 hydrogen Substances 0.000 claims abstract description 4
- 229910052698 phosphorus Chemical group 0.000 claims abstract description 4
- 239000011574 phosphorus Chemical group 0.000 claims abstract description 4
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 3
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims abstract description 3
- 238000004519 manufacturing process Methods 0.000 claims abstract description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 30
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical group CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 19
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 claims description 9
- 239000003960 organic solvent Substances 0.000 claims description 6
- 239000002904 solvent Substances 0.000 claims description 6
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 claims description 5
- 150000002170 ethers Chemical class 0.000 claims description 4
- 229910020628 SiW12O40 Inorganic materials 0.000 claims description 3
- 150000002576 ketones Chemical class 0.000 claims description 3
- 239000003495 polar organic solvent Substances 0.000 claims description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 2
- 229910052500 inorganic mineral Inorganic materials 0.000 claims description 2
- 239000011707 mineral Substances 0.000 claims description 2
- 229910052760 oxygen Inorganic materials 0.000 claims description 2
- 239000001301 oxygen Substances 0.000 claims description 2
- CMPGARWFYBADJI-UHFFFAOYSA-L tungstic acid Chemical compound O[W](O)(=O)=O CMPGARWFYBADJI-UHFFFAOYSA-L 0.000 claims 1
- CGFYHILWFSGVJS-UHFFFAOYSA-N silicic acid;trioxotungsten Chemical compound O[Si](O)(O)O.O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1.O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1.O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1.O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 CGFYHILWFSGVJS-UHFFFAOYSA-N 0.000 abstract description 21
- 150000007513 acids Chemical class 0.000 abstract description 10
- 239000000499 gel Substances 0.000 abstract description 6
- 150000002500 ions Chemical class 0.000 abstract description 2
- 239000011734 sodium Substances 0.000 description 18
- 239000011964 heteropoly acid Substances 0.000 description 17
- XMVONEAAOPAGAO-UHFFFAOYSA-N sodium tungstate Chemical compound [Na+].[Na+].[O-][W]([O-])(=O)=O XMVONEAAOPAGAO-UHFFFAOYSA-N 0.000 description 11
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 10
- 229910052708 sodium Inorganic materials 0.000 description 10
- 239000007864 aqueous solution Substances 0.000 description 9
- 239000000203 mixture Substances 0.000 description 9
- PBYZMCDFOULPGH-UHFFFAOYSA-N tungstate Chemical compound [O-][W]([O-])(=O)=O PBYZMCDFOULPGH-UHFFFAOYSA-N 0.000 description 9
- 239000004115 Sodium Silicate Substances 0.000 description 8
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 8
- 229910052911 sodium silicate Inorganic materials 0.000 description 8
- 239000000243 solution Substances 0.000 description 7
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- 239000006227 byproduct Substances 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- 229910052700 potassium Inorganic materials 0.000 description 6
- 239000011591 potassium Substances 0.000 description 6
- 239000003456 ion exchange resin Substances 0.000 description 5
- 229920003303 ion-exchange polymer Polymers 0.000 description 5
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 4
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- 229910052910 alkali metal silicate Inorganic materials 0.000 description 4
- 150000003863 ammonium salts Chemical class 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 239000012074 organic phase Substances 0.000 description 4
- 150000003377 silicon compounds Chemical class 0.000 description 4
- 150000003658 tungsten compounds Chemical class 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000012736 aqueous medium Substances 0.000 description 3
- IJKVHSBPTUYDLN-UHFFFAOYSA-N dihydroxy(oxo)silane Chemical compound O[Si](O)=O IJKVHSBPTUYDLN-UHFFFAOYSA-N 0.000 description 3
- 239000012467 final product Substances 0.000 description 3
- 230000020477 pH reduction Effects 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- FNIHDXPFFIOGKL-UHFFFAOYSA-N disodium;dioxido(oxo)germane Chemical compound [Na+].[Na+].[O-][Ge]([O-])=O FNIHDXPFFIOGKL-UHFFFAOYSA-N 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- YBMRDBCBODYGJE-UHFFFAOYSA-N germanium dioxide Chemical compound O=[Ge]=O YBMRDBCBODYGJE-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000012454 non-polar solvent Substances 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 239000000741 silica gel Substances 0.000 description 2
- 229910002027 silica gel Inorganic materials 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- STNJBCKSHOAVAJ-UHFFFAOYSA-N Methacrolein Chemical compound CC(=C)C=O STNJBCKSHOAVAJ-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- BNIILDVGGAEEIG-UHFFFAOYSA-L disodium hydrogen phosphate Chemical compound [Na+].[Na+].OP([O-])([O-])=O BNIILDVGGAEEIG-UHFFFAOYSA-L 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012847 fine chemical Substances 0.000 description 1
- 230000008570 general process Effects 0.000 description 1
- 229940119177 germanium dioxide Drugs 0.000 description 1
- 230000036571 hydration Effects 0.000 description 1
- 238000006703 hydration reaction Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 229910000403 monosodium phosphate Inorganic materials 0.000 description 1
- 235000019799 monosodium phosphate Nutrition 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 238000006053 organic reaction Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 239000012429 reaction media Substances 0.000 description 1
- AJPJDKMHJJGVTQ-UHFFFAOYSA-M sodium dihydrogen phosphate Chemical compound [Na+].OP(O)([O-])=O AJPJDKMHJJGVTQ-UHFFFAOYSA-M 0.000 description 1
- 235000019795 sodium metasilicate Nutrition 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000001117 sulphuric acid Substances 0.000 description 1
- 235000011149 sulphuric acid Nutrition 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 238000000844 transformation Methods 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- 229910000406 trisodium phosphate Inorganic materials 0.000 description 1
- 235000019801 trisodium phosphate Nutrition 0.000 description 1
- LSGOVYNHVSXFFJ-UHFFFAOYSA-N vanadate(3-) Chemical compound [O-][V]([O-])([O-])=O LSGOVYNHVSXFFJ-UHFFFAOYSA-N 0.000 description 1
- 230000035899 viability Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/20—Silicates
Definitions
- the present invention relates to a process for the preparation of high purity heteropoly acids of tungsten, vanadium and molybdenum in high yield.
- the invention provides a convenient and economic process for making silicotungstic acid and salts thereof.
- Heteropoly acids are of growing importance in the field of catalysis of commercially important processes. Heteropoly acids have been widely used in the selective transformations of organic substances, for instance oxidation of methacrolein, hydration of olefins such as propylene or butylene and polymerisation of tetrahydrofuran. Recently it has been shown that heteropoly acids can be used as catalysts for low temperature organic reactions in the liquid phase, for instance in the synthesis of fine chemicals. Such heteropoly acids are for instance those of formula (1) given below.
- silicotungstic acid is produced by heating an aqueous mixture of sodium tungstate and sodium silicate followed by the addition of about 2.5 moles of hydrochloric acid per mole of sodium tungstate. Since this process results in the generation of a silicic acid gel product, this has to be removed for instance by filtration. Such a filtration step is disadvantageous since this means additional processing. The filtered product has to be treated with over 1.5 moles of hydrochloric acid per mole of sodium tungstate in order to generate the free acid form of the product. Apart from the disadvantageous formation of the silicic acid gel by-product, this process also has the disadvantage of requiring over 4 moles of hydrochloric acid per mole of sodium tungstate.
- a process for making heteropolyacids involves first forming sodium germanate solution by combining germanium dioxide with sodium hydroxide and then separately combining hydrochloric acid with sodium tungstate solution at a molar ratio of acid to tungstate of 0.68:1. The germanate and acidified tungstate solutions are then mixed together and heated followed by further acidification, then boiling, followed by further acidification steps. The final product is said to have been extracted and filtered.
- Other heteropolyacids based on silicon, phosphorus, vanadium, molybdenum, tungsten, including silicotungstic acid are also said to be made by the method.
- A is selected from the group consisting of hydrogen, alkali metal and ammonium,
- X is silicon or phosphorus
- M is selected from the group consisting of molybdenum, tungsten and vanadium, and Y is an integer from 1 to 8. which process comprises forming an aqueous liquor comprising the components,
- component (c) an acid having a pKa below 4. increasing the temperature of the aqueous liquor, and optionally adding more acid having a pKa below 4, characterised in that the aqueous liquor is formed at a temperature of below 50°C and i) has a pH of below 2 or ii) in which component (c) is present in an amount between 1 and 3 moles per mole of component (b).
- the process can be used to prepare sodium silicotungstate Na SiW ⁇ 2 0 4 o, potassium silicotungstate K4SiW 12 O 4 o , ammonium silicotungstate (NH ) 4 SiW 12 0 4 o, silicotungstic acid H SiW ⁇ 2 0 4u , sodium phosphorotungstate Na 3 PW 12 0 4 o, potassium phosphorotungstate K 3 PW l2 0 4 o, ammonium phosphorotungstate (NH 4 ) 3 PW ⁇ 2 0 4 o, phosphorotungstic acid H 3 PW 12 0 4 o, sodium silicovanadate Na 4 SiV ⁇ 2 0 4 o, potassium silicovanadate (NH 4 )4SiW 12 O 0 , ammonium silicovanadate (NH 4 ) 4 SiV ⁇ 2 0 4 o, silicovanadic acid H SiV 12 0 4 o, sodium phosphorovanadate Na 3 PV 2
- Compounds that can be used as component (a) in the process include suitable alkali metal salts of compounds containing an atom denoted by X, for instance sodium silicate, trisodium phosphate, disodium hydrogen phosphate or sodium dihydrogen phosphate.
- X is silicon and component (a) is an alkali metal salt of a silicon compound, for instance silicic acid, wherein the preferred alkali metal salt is sodium silicate.
- M is preferably tungsten and component (b) is an alkali metal salt of a tungsten compound, for instance sodium tungstate.
- the compound of formula (1) is an alkali metal salt of silico tungstic acid, more preferably sodium silicotungstate Na SiW 12 O 40 .
- the aqueous liquor can be formed by first forming an aqueous solution of both component (a) and component (b) and then adding component (c).
- component (c) One way of ensuring that the temperature remains below 50°C is by adding component (c) slowly so as to avoid an excessive increase in temperature due to the exotherm.
- Another way of maintaining the temperature below 50°C is to apply cooling to the aqueous solution during the addition of component (c).
- the temperature may be allowed to increase to above 50°C and further component (c) may be added.
- the aqueous liquor is formed at a temperature in the range 30°C to below 50°C, more preferably 35°C to 45°C.
- the process may conveniently proceed if molar ratio of component (a) to (b) is between 1 :1 and 1 :12. If the ratio exceeds 1 :12 the reaction will still proceed though the amount of unreacted component (b) will start to become significant and this would affect the economical viability of the process. If the molar ratio component (a) to component (b) is below 1 :1 the reaction would proceed more slowly and furthermore would result in the significant quantities of unreacted component (a). In order to maximise the yield of heteropoly acid the molar ratio of component (a) to (b) is preferably between about 1 :10 and 1 :12.
- component (c) it is important for the reaction to proceed for component (c) to be a strong acid, with a pKa below 4.
- the strong acid is an acid with a pKa below 3.
- the acid is for instance a mineral acid selected from the group consisting of hydrochloric acid, sulphuric acid and nitric acid. Generally hydrochloric acid is preferred.
- the process proceeds more effectively if the acid is concentrated. Therefore it is highly desired if the strength of the acid is in excess of 10 wt. %, preferably at least 30 wt. % most preferably around 36.5 wt. %.
- the aqueous liquor is formed from 1 to 3 moles of component (c), for instance 1 to 2.5 moles of component (c) per mole of component (b). More preferably though the amount of component (c) present in the aqueous liquor will be for instance between 1.5 and 2.25 moles, especially around 2 moles per mole of component (b).
- the aqueous liquor that is formed has a pH of below 2. More preferably the aqueous liquor has a pH in the range of from 1 to below 2.
- the compound of formula (1) is formed by subjecting the aqueous liquor to reaction conditions at an elevated temperature.
- the elevated temperature should be at least 50°C.
- the aqueous liquor is heated to a temperature in excess of 60°C or 70°C, preferably above 80°C, more preferably above 95°C.
- Most preferably the aqueous liquor is refluxed for example for at least 15 minutes, preferably at least 30 minutes and more preferably around 60 minutes.
- component (c) As described earlier it is possible for additional amounts of component (c) to be added to the aqueous liquor once the temperature has reached 50°C or more.
- the total amount of component (c) incorporated in the aqueous liquor is preferably not more than 3.5 moles per mole of component (b).
- the total amount of component (c) used in the process is between 1 and 3.5 moles per mole of component (b).
- an aqueous liquor comprising component (a), component (b) and 1 to 2.5 moles of component (c) per mole of component (b), at a temperature below 50°C.
- the temperature of the aqueous liquor has been elevated to at least 50°C, up to a further 1 mole of component (c) per mole of component (b) could be added to the aqueous liquor.
- up to 2.5 moles of component (c) per mole of component (b) is used to form the aqueous liquor at a temperature of below 50°C.
- the aqueous liquor is formed at a temperature from 30°C to below 50°C, most preferably in the range 35°C to 45°C.
- the heteropoly acid is prepared in essentially free acid form.
- the aqueous medium comprising the heteropoly acid as a fully or partially neutralised alkali metal or ammonium salt, is further treated using up to 1 mole of acid per mole of component (b) used in the aqueous liquor.
- the heteropoly acid can be conveniently extracted from the aqueous medium by the use of a suitable non-polar solvent.
- suitable non-polar solvents include oxygen containing non-polar organic solvents, for instance ethers or ketones.
- Preferred organic solvents are C . 8 ethers, especially tertiary butyl methyl ether, methyl ethyl ketone or diethyl ether.
- sufficient organic solvent is added to the aqueous medium to enable the heteropoly acid contained therein to be extracted.
- One way of achieving this is by adding sufficient organic solvent to the aqueous solution and stirring vigorously, for example between 5 and 15 minutes, for instance 10 minutes. On settling the mixture will form an organic phase into which the heteropoly acid has been extracted.
- phase containing the extracted heteropoly acid is separated and the heteropoly acid contained therein recovered.
- One way of achieving this is to solvent swap the organic phase containing the extracted heteropoly acid with water. The organic phase can then be removed resulting in an aqueous solution of the heteropoly acid.
- the solvent extracted heteropoly acid is washed at least once, preferably between two and four times, more preferably three times prior to solvent swap with water.
- the acid is the same acid as component (c) used to form the aqueous liquor.
- the acid is hydrochloric acid of between 5 weight % and 37 weight %, preferably at least 15 weight %.
- the solvent extracted heteropoly acid which has been washed is then essentially in free acid form, containing no or virtually no alkali metal or ammonium ions.
- the process can be used to provide heteropoly acid of purity greater than 95%, preferably at least 96%, more preferably at least 97% or 98%, and most preferably at least 99%.
- the process of the invention also provides a means for obtaining heteropoly acids and their alkali metal or ammonium salts in yields of at least 95%, preferably at least 96%, .
- M is tungsten, and A and Y have the same meaning as above, by reacting at an elevated temperature, an aqueous liquor comprising,
- component (a) Compounds that can be used as component (a) in the process include suitable alkali metal salts of compounds containing silicon.
- component (a) is an alkali metal silicate, for instance sodium silicate.
- component (b) is sodium tungstate.
- the compound of formula 1 is sodium silicotungstate Na 4 SiW l2 0 4 o or silicotungstic acid H 4 SiW-
- Component (a) is an alkali metal salt of a silicon compound, for instance silicic acid, wherein the preferred alkali metal salt is sodium silicate.
- Component (b) is an alkali metal salt of a tungsten compound, for instance sodium tungstate.
- the compound of formula (1) is an alkali metal salt of silicotungstic acid, more preferably sodium silicotungstate, most preferably silicotungstic acid in essentially free acid form.
- the process can be used to provide silicotungstic acid H 4 SiW ⁇ 2 0 4u at a purity of greater than 95%, preferably at least 96%, more preferably at least 97% or 98%, and most preferably at least 99%.
- the process of the invention also provides a means for obtaining silico tungstic acid H 4 SiW ⁇ 2 O 40 at yields of at least 95%, preferably at least 96%.
- the aqueous liquor comprises as component (a) an alkali metal silicate, for example sodium silicate, and as component (b) an alkali metal tungstate, for example sodium tungstate.
- 2 0 4u is desirably prepared comprises the steps of:
- step (ii) adding to the aqueous liquor between 1 and 2.5 moles of hydrochloric acid per mole of tungstate used in step (a), (iii) heating the resulting aqueous liquor that forms to a temperature in excess of
- the molar ratio of silicate to tungstate to silicate is around 1 :12.
- the aqueous liquor in step (iii) is formed at a temperature below 50°C, preferably between 35°C and 45°C, before being refluxed between 30 and 70 minutes, preferably around 60 minutes.
- the organic solvent in step (e) is tertiary butyl methyl ether, diethyl ether or methyl ethyl ketone.
- 1800g of a commercial grade sodium tungstate is added to 1800g water at ambient temperature (about 15°C) and allowed to stir for approximately 10 minutes.
- 98.1g sodium metasilicate is then added to the aqueous solution and stirring continues for a further 10 minutes.
- 1080ml concentrated hydrochloric acid (36.5wt.%) is then added drop-wise over 1.5 to 2 hours and the aqueous solution is allowed to exotherm to between 35-45°C.
- the aqueous liquor that is formed is heated to reflux and maintained at reflux for 1 hour. The solution is them cooled to ambient temperature and stirred for approximately 10 minutes. The resultant aqueous solution contained no silica gel by-product. 82ml concentrated hydrochloric acid (36.5wt.%) is then added drop-wise to the aqueous solution over 30-60 min. The aqueous solution is then cooled to ambient temperature.
- the resultant aqueous liquid is a solution of silicotungstic acid (about 50wt. %). The yield of the silicotungstic acid is 99.32wt.%.
- Example 1 is repeated using tertiary butyl methyl ether in place of diethyl ether.
- the yield of silicotungstic acid is 98.7wt.%
- Example 2 is repeated except using 700 ml tertiary butyl methyl ether.
- the yield of silicotungstic acid is 98.3wt.%.
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Catalysts (AREA)
Abstract
A process for preparing a compound of formula (1): AYXM12O40, wherein A is selected from the group consisting of hydrogen, alkali metal and ammonium, X is silicon or phosphorus, M is selected from the group consisting of molybdenum, tungsten and vanadium, and Y is an integer from 1 to 8, which process comprises forming an aqueous liquor comprising the components, (a) an alkali metal salt of a compound comprising an atom denoted by X, (b) an alkali metal salt of a compound comprising an atom denoted by M, and (c) an acid having a pKa below 4, increasing the temperature of the aqueous liquor, and optionally adding more acid, having a pKa below 4, characterised in that the aqueous liquor is formed at a temperature of below 50 °C and i) has a pH of below 2 or ii) in which component (c) is present in an amount between 1 and 3 moles per mole of components (b). The invention provides a simple, economic process for the convenient preparation of heteropoly acids, especially silicotungstic acid with a low counter ion content in high yield and high purity and avoids the undesirable formation of silicic acid gels.
Description
Process for the Preparation of Inorganic Compounds
The present invention relates to a process for the preparation of high purity heteropoly acids of tungsten, vanadium and molybdenum in high yield. In particular the invention provides a convenient and economic process for making silicotungstic acid and salts thereof.
Heteropoly acids are of growing importance in the field of catalysis of commercially important processes. Heteropoly acids have been widely used in the selective transformations of organic substances, for instance oxidation of methacrolein, hydration of olefins such as propylene or butylene and polymerisation of tetrahydrofuran. Recently it has been shown that heteropoly acids can be used as catalysts for low temperature organic reactions in the liquid phase, for instance in the synthesis of fine chemicals. Such heteropoly acids are for instance those of formula (1) given below.
It is known to produce heteropoly acids by reacting the corresponding alkali metal tungstate, vanadate or molybdenate salts with the corresponding alkali metal silicate or phosphate salts. Generally the yields are not high since large amounts of byproduct are formed. This is a particular problem when producing silicon containing heteropoly acids since silicic acid gels form. Generally, by-products such as silicic acid gels need to be removed from the final product as otherwise the activity of the final heteropoly acid would be impaired.
Generally silicotungstic acid is produced by heating an aqueous mixture of sodium tungstate and sodium silicate followed by the addition of about 2.5 moles of hydrochloric acid per mole of sodium tungstate. Since this process results in the generation of a silicic acid gel product, this has to be removed for instance by filtration. Such a filtration step is disadvantageous since this means additional processing. The filtered product has to be treated with over 1.5 moles of hydrochloric acid per mole of sodium tungstate in order to generate the free acid form of the
product. Apart from the disadvantageous formation of the silicic acid gel by-product, this process also has the disadvantage of requiring over 4 moles of hydrochloric acid per mole of sodium tungstate.
It is also known to produce silicotungstic acid avoiding the formation of silica gel and avoiding hydrochloric acid contamination by the use of an ion exchange resin in the hydrogen cycle. The ion exchange resin is combined with the mixture of sodium silicate and sodium tungstate and the mixture is heated above 50°C. The process merely requires that the reaction medium is maintained at a pH between 2 and 6. Although it is possible to carry out the process at pH 6 it is generally desired to maintain a pH at less than 6 in order to prevent the silicotungstate from breaking down. At pH 6 the degradation of silicotungstic acid would severely affect the yield. Furthermore, it would be hard to generate sufficient acidity when using an ion exchange resin to efficiently drive the reaction towards the synthesis of the silicotungstate. Another disadvantage of using ion exchange resins is that these would need to be separated from the final product and regenerated which would require additional processing steps.
In GB-A-1520726 a process for making heteropolyacids is described, which process involves first forming sodium germanate solution by combining germanium dioxide with sodium hydroxide and then separately combining hydrochloric acid with sodium tungstate solution at a molar ratio of acid to tungstate of 0.68:1. The germanate and acidified tungstate solutions are then mixed together and heated followed by further acidification, then boiling, followed by further acidification steps. The final product is said to have been extracted and filtered. Other heteropolyacids based on silicon, phosphorus, vanadium, molybdenum, tungsten, including silicotungstic acid are also said to be made by the method. However, this process which uses less than 1 mole of acid per mole of tungstate prior to heating the acidified germanate/tungstate mixture does not overcome the problem of producing by-products, with the inevitable poor yield. The tungstate solution is said to have a pH of 6.8 to 7.0 prior to combining with the alkaline sodium germanate. In addition the process requires several
acidification steps subsequent to heating, such that the total amount of acid used in the process is more than 4 moles per mole of tungstate.
It would therefore be desired to provide a process for the convenient preparation of heteropoly acids in high purity and yield which avoids the formation of by-products. Furthermore it would be particularly desired to conveniently prepare silicotungstic acid in high purity and yield by a process which avoids the formation of silicic acid gel and the excessive total use of hydrochloric acid and also avoids the use of ion exchange resin.
Thus the invention provides a process for preparing a compound of formula (1)
A YXM12O40 (1),
wherein
A is selected from the group consisting of hydrogen, alkali metal and ammonium,
X is silicon or phosphorus,
M is selected from the group consisting of molybdenum, tungsten and vanadium, and Y is an integer from 1 to 8. which process comprises forming an aqueous liquor comprising the components,
(a) an alkali metal salt of a compound comprising an atom denoted by X
(b) an alkali metal salt of a compound comprising an atom denoted by M and,
(c) an acid having a pKa below 4. increasing the temperature of the aqueous liquor, and optionally adding more acid having a pKa below 4, characterised in that the aqueous liquor is formed at a temperature of below 50°C and i) has a pH of below 2 or ii) in which component (c) is present in an amount between 1 and 3 moles per mole of component (b).
Typically the process can be used to prepare sodium silicotungstate Na SiWι204o, potassium silicotungstate K4SiW12O4o , ammonium silicotungstate (NH )4SiW1204o,
silicotungstic acid H SiWι204u, sodium phosphorotungstate Na3PW1204o, potassium phosphorotungstate K3PWl204o, ammonium phosphorotungstate (NH4)3PWι204o, phosphorotungstic acid H3PW1204o, sodium silicovanadate Na4SiVι204o, potassium silicovanadate (NH4)4SiW12O 0, ammonium silicovanadate (NH4)4SiVι204o, silicovanadic acid H SiV1204o, sodium phosphorovanadate Na3PV 204o, potassium phosphorovanadate K3PVl204o, ammonium phosphorovanadate (NH )3PVι20 o, phosphorovanadic acid H3PVι2O40 , sodium silicomolybdenate Na4SiMo-ι204o, potassium silicomolybdenate K4SiMθι204o, ammonium silicomolybdenate (NH )4SiMo1204o> silicomolybdenic acid H4SiMθι20 o, sodium phosphoromolybdenate Na3PMθι2O 0, potassium phosphoromolybdenate K3PMθι204o, ammonium phosphoromolybdenate (NH4)4SiWι204o and phosphoromolybdenic acid H3PMθι2O 0.
Compounds that can be used as component (a) in the process include suitable alkali metal salts of compounds containing an atom denoted by X, for instance sodium silicate, trisodium phosphate, disodium hydrogen phosphate or sodium dihydrogen phosphate.
Preferably X is silicon and component (a) is an alkali metal salt of a silicon compound, for instance silicic acid, wherein the preferred alkali metal salt is sodium silicate.
M is preferably tungsten and component (b) is an alkali metal salt of a tungsten compound, for instance sodium tungstate.
In one preferred aspect of the invention the compound of formula (1) is an alkali metal salt of silico tungstic acid, more preferably sodium silicotungstate Na SiW12O40.
It is possible to combine the components (a), (b) and (c) in any order as long as the temperature is maintained below 50°C during the formation of the liquor. Preferably
the aqueous liquor can be formed by first forming an aqueous solution of both component (a) and component (b) and then adding component (c). One way of ensuring that the temperature remains below 50°C is by adding component (c) slowly so as to avoid an excessive increase in temperature due to the exotherm. Another way of maintaining the temperature below 50°C is to apply cooling to the aqueous solution during the addition of component (c). Once the aqueous liquor has been formed the temperature may be allowed to increase to above 50°C and further component (c) may be added. Preferably the aqueous liquor is formed at a temperature in the range 30°C to below 50°C, more preferably 35°C to 45°C.
Although it is possible for the process to be conducted by employing component (a) and component (b) in approximately equimolar proportions it is generally preferred to use greater proportions of (b). For instance the process may conveniently proceed if molar ratio of component (a) to (b) is between 1 :1 and 1 :12. If the ratio exceeds 1 :12 the reaction will still proceed though the amount of unreacted component (b) will start to become significant and this would affect the economical viability of the process. If the molar ratio component (a) to component (b) is below 1 :1 the reaction would proceed more slowly and furthermore would result in the significant quantities of unreacted component (a). In order to maximise the yield of heteropoly acid the molar ratio of component (a) to (b) is preferably between about 1 :10 and 1 :12.
It is important for the reaction to proceed for component (c) to be a strong acid, with a pKa below 4. Ideally the strong acid is an acid with a pKa below 3. The acid is for instance a mineral acid selected from the group consisting of hydrochloric acid, sulphuric acid and nitric acid. Generally hydrochloric acid is preferred. The process proceeds more effectively if the acid is concentrated. Therefore it is highly desired if the strength of the acid is in excess of 10 wt. %, preferably at least 30 wt. % most preferably around 36.5 wt. %.
Preferably the aqueous liquor is formed from 1 to 3 moles of component (c), for instance 1 to 2.5 moles of component (c) per mole of component (b). More
preferably though the amount of component (c) present in the aqueous liquor will be for instance between 1.5 and 2.25 moles, especially around 2 moles per mole of component (b).
In one aspect of the invention the aqueous liquor that is formed has a pH of below 2. More preferably the aqueous liquor has a pH in the range of from 1 to below 2.
The compound of formula (1) is formed by subjecting the aqueous liquor to reaction conditions at an elevated temperature. The elevated temperature should be at least 50°C. Desirably the aqueous liquor is heated to a temperature in excess of 60°C or 70°C, preferably above 80°C, more preferably above 95°C. Most preferably the aqueous liquor is refluxed for example for at least 15 minutes, preferably at least 30 minutes and more preferably around 60 minutes.
As described earlier it is possible for additional amounts of component (c) to be added to the aqueous liquor once the temperature has reached 50°C or more. When component (c) is added to the aqueous liquor at a temperature of at least 50°C, the total amount of component (c) incorporated in the aqueous liquor is preferably not more than 3.5 moles per mole of component (b). Thus according to the invention the total amount of component (c) used in the process is between 1 and 3.5 moles per mole of component (b). For instance it would be possible to form an aqueous liquor comprising component (a), component (b) and 1 to 2.5 moles of component (c) per mole of component (b), at a temperature below 50°C. Once the temperature of the aqueous liquor has been elevated to at least 50°C, up to a further 1 mole of component (c) per mole of component (b) could be added to the aqueous liquor. In one preferred aspect of the invention up to 2.5 moles of component (c) per mole of component (b) is used to form the aqueous liquor at a temperature of below 50°C. Preferably the aqueous liquor is formed at a temperature from 30°C to below 50°C, most preferably in the range 35°C to 45°C.
In one further aspect of the invention the heteropoly acid is prepared in essentially free acid form. After the reaction of components (a), (b) and (c) is complete, the aqueous medium, comprising the heteropoly acid as a fully or partially neutralised alkali metal or ammonium salt, is further treated using up to 1 mole of acid per mole of component (b) used in the aqueous liquor. Preferably between 0.1 and 0.5 moles of acid per mole of component (b) are used to treat the heteropoly acid salt.
The heteropoly acid can be conveniently extracted from the aqueous medium by the use of a suitable non-polar solvent. Suitable non-polar solvents include oxygen containing non-polar organic solvents, for instance ethers or ketones. Preferred organic solvents are C .8 ethers, especially tertiary butyl methyl ether, methyl ethyl ketone or diethyl ether. Ideally sufficient organic solvent is added to the aqueous medium to enable the heteropoly acid contained therein to be extracted. One way of achieving this is by adding sufficient organic solvent to the aqueous solution and stirring vigorously, for example between 5 and 15 minutes, for instance 10 minutes. On settling the mixture will form an organic phase into which the heteropoly acid has been extracted. Thus the phase containing the extracted heteropoly acid is separated and the heteropoly acid contained therein recovered. One way of achieving this is to solvent swap the organic phase containing the extracted heteropoly acid with water. The organic phase can then be removed resulting in an aqueous solution of the heteropoly acid.
It may also be desirable to treat the heteropoly acid in solvent by washing it with acid. This ensures that traces of residual counter-ions are removed, thus providing the heteropoly acid in essentially high purity free acid form. Desirably the solvent extracted heteropoly acid is washed at least once, preferably between two and four times, more preferably three times prior to solvent swap with water. Typically the acid is the same acid as component (c) used to form the aqueous liquor. Preferably the acid is hydrochloric acid of between 5 weight % and 37 weight %, preferably at least 15 weight %. The solvent extracted heteropoly acid which has been washed is then essentially in free acid form, containing no or virtually no alkali metal or ammonium
ions. The process can be used to provide heteropoly acid of purity greater than 95%, preferably at least 96%, more preferably at least 97% or 98%, and most preferably at least 99%.
The process of the invention also provides a means for obtaining heteropoly acids and their alkali metal or ammonium salts in yields of at least 95%, preferably at least 96%, .
The process is of particular importance in the synthesis of a compound of formula 1
wherein
X is silicon,
M is tungsten, and A and Y have the same meaning as above, by reacting at an elevated temperature, an aqueous liquor comprising,
(a) an alkali metal salt of a silicon compound,
(b) an alkali metal salt of a tungsten compound,
(c) an acid having a pKa below 4, increasing the temperature of the aqueous liquor, and optionally adding more acid, having a pKa of below 4, characterised in that the aqueous liquor is formed at a temperature of below 50°C.
Compounds that can be used as component (a) in the process include suitable alkali metal salts of compounds containing silicon. Desirably component (a) is an alkali metal silicate, for instance sodium silicate. Typically component (b) is sodium tungstate.
In one preferred aspect of the invention the compound of formula 1 is sodium silicotungstate Na4SiWl204o or silicotungstic acid H4SiW-|20 o.
Component (a) is an alkali metal salt of a silicon compound, for instance silicic acid, wherein the preferred alkali metal salt is sodium silicate.
Component (b) is an alkali metal salt of a tungsten compound, for instance sodium tungstate.
In one preferred aspect of the invention the compound of formula (1) is an alkali metal salt of silicotungstic acid, more preferably sodium silicotungstate, most preferably silicotungstic acid in essentially free acid form.
The process can be used to provide silicotungstic acid H 4SiWι204u at a purity of greater than 95%, preferably at least 96%, more preferably at least 97% or 98%, and most preferably at least 99%.
The process of the invention also provides a means for obtaining silico tungstic acid H 4SiWι2O40 at yields of at least 95%, preferably at least 96%.
The general process requirements described previously also apply to the specific process of making sodium silicotungstate and silicotungstic acid in essentially free acid form, where component (a) an alkali metal or ammonium salt of a silicon compound, component (b) is an alkali metal or ammonium salt of a tungsten compound and (c) an acid with a pKa below 4. Preferably the aqueous liquor comprises as component (a) an alkali metal silicate, for example sodium silicate, and as component (b) an alkali metal tungstate, for example sodium tungstate.
Silicotungstic acid H 4SiW-|204u is desirably prepared comprises the steps of:
(i) forming an aqueous liquor by combining an alkali metal silicate with an alkali metal tungstate in a molar ratio of silicate to tungstate of between 1 :10 to 1 :12,
(ii) adding to the aqueous liquor between 1 and 2.5 moles of hydrochloric acid per mole of tungstate used in step (a),
(iii) heating the resulting aqueous liquor that forms to a temperature in excess of
95°C for at least 15 minutes,
(iv) adding between 0.1 and 0.5 mole of hydrochloric acid,
(v) adding to the aqueous liquor a non-polar organic solvent selected from the group consisting of C2-s ketones and C2.s ethers, to form a separate organic phase into which the silicotungstate is extracted,
(vi) washing the extracted silicotungstate in acid to provide silicotungstic acid.
More preferably in the process the molar ratio of silicate to tungstate to silicate is around 1 :12.
In a still preferred aspect of the process the aqueous liquor in step (iii) is formed at a temperature below 50°C, preferably between 35°C and 45°C, before being refluxed between 30 and 70 minutes, preferably around 60 minutes. In a yet more preferred aspect of the process the organic solvent in step (e) is tertiary butyl methyl ether, diethyl ether or methyl ethyl ketone.
The following examples demonstrate the invention.
Example 1
1800g of a commercial grade sodium tungstate is added to 1800g water at ambient temperature (about 15°C) and allowed to stir for approximately 10 minutes. 98.1g sodium metasilicate is then added to the aqueous solution and stirring continues for a further 10 minutes. 1080ml concentrated hydrochloric acid (36.5wt.%) is then added drop-wise over 1.5 to 2 hours and the aqueous solution is allowed to exotherm to between 35-45°C.
Once all of the hydrochloric acid has been added the aqueous liquor that is formed is heated to reflux and maintained at reflux for 1 hour. The solution is them cooled to ambient temperature and stirred for approximately 10 minutes. The resultant aqueous solution contained no silica gel by-product. 82ml concentrated hydrochloric acid (36.5wt.%) is then added drop-wise to the aqueous solution over 30-60 min. The aqueous solution is then cooled to ambient temperature.
972 ml diethyl ether is then added to the solution and the mixture is agitated thoroughly for 10 minutes. The resulting mixture has three layers. The bottom layer is separated and combined with 1035 ml water. The resulting mixture is then subjected to evaporative distillation to remove the ether from the aqueous mixture, initially at about 35°C and finally allowing the temperature of the resultant aqueous liquid rise to 80°C to remove residual ether. The resultant aqueous liquid is a solution of silicotungstic acid (about 50wt. %). The yield of the silicotungstic acid is 99.32wt.%.
Example 2
Example 1 is repeated using tertiary butyl methyl ether in place of diethyl ether. The yield of silicotungstic acid is 98.7wt.%
Example 3
Example 2 is repeated except using 700 ml tertiary butyl methyl ether. The yield of silicotungstic acid is 98.3wt.%.
Claims
1. A process for preparing a compound of formula (1)
AYXM12O40 (1),
wherein
A is selected from the group consisting of hydrogen, alkali metal and ammonium
X is silicon or phosphorus,
M is selected from the group consisting of molybdenum, tungsten and vanadium, and Y is an integer from 1 to 8, which process comprises forming an aqueous liquor comprising the components, a) an alkali metal salt of a compound comprising an atom denoted by X b) an alkali metal salt of a compound comprising an atom denoted by M, and c) an acid having a pKa below 4. increasing the temperature of the aqueous liquor, and optionally adding more acid, having a pKa below 4, characterised in that the aqueous liquor is formed at a temperature of below 50°C and i) has a pH of below 2 or ii) in which component (c) is present in an amount between 1 and 3 moles per mole of component (b).
2. A process according to claim 1 in which the aqueous liquor is formed at a pH of below 2.
3. A process according to claim 1 or claim 2 in which the aqueous liquor is formed comprising between 1 and 3 moles of component (c) per mole of component (b).
4. A process according to any of claims 1 to 3 in which X is silicon and component (a) is an alkali metal salt of silicic acid, M is tungsten and component (b) is an alkali metal salt of tungstic acid.
5. A process according to any one of claims 1 to 4 in which the compound of formula (1) is Na4SiW12O 0 or H 4SiW12O40.
6. A process according to any of claims 1 to 5 in which the aqueous liquor is formed by first combining components (a) and (b) followed by combining component (c).
7. A process according to any of claims 1 to 6 in which the molar ratio of component (a) to component (b) is between 1 :1 and 1 :15.
8. A process according to any of claims 1 to 7 in which the molar ratio of component (a) to component (b) is between about 1 :10 and 1 :12.
9. A process according to any of claims 1 to 8 in which component (c) is a mineral acid having a pKa below 3.
10. A process according to any of claims 1 to 9 in which component (c) is hydrochloric acid.
11. A process according to claims 1 to 10 in which component (c) is present in the aqueous liquor in an amount of between 1 and 2.5 moles per mole of component (b).
12. A process according to any of claims 1 to 11 in which the aqueous liquor is formed at a temperature in the range of 35°C to 45°C.
13. A process according to any of claims 1 to 12 in which the temperature of the aqueous liquor after formation is increased to above 50°C.
14. A process according to any of claims 1 to 13 in which the aqueous liquor after formation is heated to a temperature above 80°C, preferably above 95°C.
15. A process according to any of claims 1 to 14 in which the aqueous liquor after formation is refluxed for at least 15 minutes, preferably at least 30 minutes.
16. A process according to any of claims 1 to 15 in which up to 1 mole of acid per mole of component (b) is added after the temperature of the aqueous liquor has been increased above 50°C.
17. A process according to any of claims 1 to 16 in which the total amount of component (c) used in the process is between 1 and 3.5 moles per mole of component (b).
18. A process according to any of claims 1 to 17 in which the compound of formula (1) is extracted into an oxygen-containing non-polar organic solvent.
19. A process according to claim 18 in which the organic solvent is selected from the group consisting of C4.s ethers and C .s ketones.
20. A process according to claim 18 or claim 19 in which the organic solvent is diethyl ether, tertiary butyl methyl ether or methyl ethyl ketone.
21. A process according to any of claims 18 to 20 in which the solvent extracted compound of formula (1) is washed at least once with an acid to provide the compound of formula (1) in essentially free acid form.
22. A process according to any of claims 1 to 21 in which the compound of formula (1) is H 4SiW12O40 of purity at least 99 wt.%.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB9901174 | 1999-01-20 | ||
| GBGB9901174.4A GB9901174D0 (en) | 1999-01-20 | 1999-01-20 | Process for the preparation of inorganic compounds |
| PCT/EP2000/000161 WO2000043315A1 (en) | 1999-01-20 | 2000-01-12 | Process for the preparation of inorganic compounds |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| EP1144308A1 true EP1144308A1 (en) | 2001-10-17 |
Family
ID=10846149
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP00907465A Withdrawn EP1144308A1 (en) | 1999-01-20 | 2000-01-12 | Process for the preparation of inorganic compounds |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP1144308A1 (en) |
| AU (1) | AU2904400A (en) |
| GB (1) | GB9901174D0 (en) |
| WO (1) | WO2000043315A1 (en) |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1339176A (en) * | 1971-01-22 | 1973-11-28 | Murex Ltd | Heteropolyacid salts |
| GB1376432A (en) * | 1971-09-14 | 1974-12-04 | Murex Ltd | 12-heteropolyphosphates |
| GB1520726A (en) * | 1975-07-23 | 1978-08-09 | Standard Oil Co | Liquid phase process for the manufacture of methyl tertiary alkyl ethers |
| US4889703A (en) * | 1987-12-07 | 1989-12-26 | Gte Products Corporation | Process for producing tungstosilicic acid |
-
1999
- 1999-01-20 GB GBGB9901174.4A patent/GB9901174D0/en not_active Ceased
-
2000
- 2000-01-12 AU AU29044/00A patent/AU2904400A/en not_active Abandoned
- 2000-01-12 WO PCT/EP2000/000161 patent/WO2000043315A1/en not_active Ceased
- 2000-01-12 EP EP00907465A patent/EP1144308A1/en not_active Withdrawn
Non-Patent Citations (1)
| Title |
|---|
| See references of WO0043315A1 * |
Also Published As
| Publication number | Publication date |
|---|---|
| GB9901174D0 (en) | 1999-03-10 |
| WO2000043315A1 (en) | 2000-07-27 |
| AU2904400A (en) | 2000-08-07 |
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