EP1143031A3 - Plasma boronizing - Google Patents
Plasma boronizing Download PDFInfo
- Publication number
- EP1143031A3 EP1143031A3 EP01110904A EP01110904A EP1143031A3 EP 1143031 A3 EP1143031 A3 EP 1143031A3 EP 01110904 A EP01110904 A EP 01110904A EP 01110904 A EP01110904 A EP 01110904A EP 1143031 A3 EP1143031 A3 EP 1143031A3
- Authority
- EP
- European Patent Office
- Prior art keywords
- minimum
- excited
- specified
- amount
- medium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 238000005271 boronizing Methods 0.000 title 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 abstract 1
- 229910052796 boron Inorganic materials 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
- C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
- C23C8/38—Treatment of ferrous surfaces
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
- C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
- C23C8/08—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases only one element being applied
Abstract
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19755595 | 1997-12-15 | ||
DE19755595 | 1997-12-15 | ||
EP98965249A EP1044289B1 (en) | 1997-12-15 | 1998-12-11 | Plasma boronizing |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP98965249A Division EP1044289B1 (en) | 1997-12-15 | 1998-12-11 | Plasma boronizing |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1143031A2 EP1143031A2 (en) | 2001-10-10 |
EP1143031A3 true EP1143031A3 (en) | 2004-04-28 |
Family
ID=7851902
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP98965249A Expired - Lifetime EP1044289B1 (en) | 1997-12-15 | 1998-12-11 | Plasma boronizing |
EP01110904A Ceased EP1143031A3 (en) | 1997-12-15 | 1998-12-11 | Plasma boronizing |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP98965249A Expired - Lifetime EP1044289B1 (en) | 1997-12-15 | 1998-12-11 | Plasma boronizing |
Country Status (8)
Country | Link |
---|---|
US (1) | US6783794B1 (en) |
EP (2) | EP1044289B1 (en) |
JP (1) | JP4588213B2 (en) |
KR (1) | KR100583262B1 (en) |
CN (1) | CN1198953C (en) |
AT (1) | ATE215132T1 (en) |
DE (1) | DE59803574D1 (en) |
WO (1) | WO1999031291A2 (en) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SE524493C2 (en) * | 2002-02-25 | 2004-08-17 | Telia Ab | Estimator and method for determining the position of a mobile station in a mobile communication system |
WO2007038192A2 (en) | 2005-09-22 | 2007-04-05 | Skaffco Engineering & Manufacturing, Inc. | Plasma boriding method |
WO2007124018A2 (en) * | 2006-04-20 | 2007-11-01 | Skaff Corporation Of America, Inc. | Mechanical parts having increased wear resistance |
CA2680858A1 (en) * | 2007-03-22 | 2008-09-25 | Skaff Corporation Of America, Inc. | Mechanical parts having increased wear-resistance |
US8338317B2 (en) * | 2011-04-06 | 2012-12-25 | Infineon Technologies Ag | Method for processing a semiconductor wafer or die, and particle deposition device |
CN104233425B (en) * | 2014-09-29 | 2017-01-25 | 河海大学常州校区 | Micro-arc boriding catalyzing solution, micro-arc boriding solution, and micro-arc boriding method |
KR102084296B1 (en) * | 2016-12-15 | 2020-03-03 | 도쿄엘렉트론가부시키가이샤 | Film forming method, boron film, and film forming apparatus |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3677799A (en) * | 1970-11-10 | 1972-07-18 | Celanese Corp | Vapor phase boron deposition by pulse discharge |
US4406765A (en) * | 1980-01-28 | 1983-09-27 | Fuji Photo Film Co., Ltd. | Apparatus and process for production of amorphous semiconductor |
DE3322341A1 (en) * | 1983-06-22 | 1985-01-03 | Siegfried Dr.-Ing. 5135 Selfkant Strämke | METHOD AND DEVICE FOR THE SURFACE TREATMENT OF WORKPIECES BY GLIMMER DISCHARGE |
DE4003623A1 (en) * | 1990-02-07 | 1991-08-08 | Kloeckner Ionon | METHOD FOR CONTROLLING A PLANT TREATMENT SYSTEM FOR WORKPIECES |
EP0603864A2 (en) * | 1992-12-23 | 1994-06-29 | Hughes Aircraft Company | Surface potential control in plasma processing of materials |
FR2708624A1 (en) * | 1993-07-30 | 1995-02-10 | Neuville Stephane | Process for deposition of a protective coating based on amorphous diamond pseudocarbon or on modified silicon carbide |
EP0695813A2 (en) * | 1994-08-06 | 1996-02-07 | ALD Vacuum Technologies GmbH | Process for carburizing carburisable work pieces under the action of plasma-pulses |
WO1997027345A1 (en) * | 1996-01-25 | 1997-07-31 | Elektroschmelzwerk Kempten Gmbh | Process for producing wear-resistant boride layers on metal material surfaces |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5118944A (en) * | 1974-08-07 | 1976-02-14 | Suwa Seikosha Kk | KISOHOKAHO |
DE3908200C1 (en) * | 1989-03-14 | 1989-09-07 | Degussa Ag, 6000 Frankfurt, De | |
US5286534A (en) * | 1991-12-23 | 1994-02-15 | Minnesota Mining And Manufacturing Company | Process for plasma deposition of a carbon rich coating |
US5354381A (en) * | 1993-05-07 | 1994-10-11 | Varian Associates, Inc. | Plasma immersion ion implantation (PI3) apparatus |
JPH07286254A (en) * | 1994-04-21 | 1995-10-31 | Sumitomo Metal Ind Ltd | Steel sheet excellent in secondary working brittleness resistance and its production |
JP3050361B2 (en) * | 1994-07-19 | 2000-06-12 | 株式会社ライムズ | Ion nitriding method for metal members |
US5578725A (en) | 1995-01-30 | 1996-11-26 | Regents Of The University Of Minnesota | Delta opioid receptor antagonists |
JPH0982495A (en) * | 1995-09-18 | 1997-03-28 | Toshiba Corp | Plasma producing device and method |
US6306225B1 (en) * | 1996-01-25 | 2001-10-23 | Bor Tec Gmbh | Process for producing wear-resistant boride layers on metallic material surfaces |
DE19629877C1 (en) * | 1996-07-24 | 1997-03-27 | Schott Glaswerke | CVD for internal coating of hollow articles with barrier film |
US5654043A (en) * | 1996-10-10 | 1997-08-05 | Eaton Corporation | Pulsed plate plasma implantation system and method |
US6101971A (en) * | 1998-05-13 | 2000-08-15 | Axcelis Technologies, Inc. | Ion implantation control using charge collection, optical emission spectroscopy and mass analysis |
US20040016402A1 (en) * | 2002-07-26 | 2004-01-29 | Walther Steven R. | Methods and apparatus for monitoring plasma parameters in plasma doping systems |
-
1998
- 1998-12-11 EP EP98965249A patent/EP1044289B1/en not_active Expired - Lifetime
- 1998-12-11 AT AT98965249T patent/ATE215132T1/en not_active IP Right Cessation
- 1998-12-11 EP EP01110904A patent/EP1143031A3/en not_active Ceased
- 1998-12-11 WO PCT/EP1998/008079 patent/WO1999031291A2/en active IP Right Grant
- 1998-12-11 CN CNB988121832A patent/CN1198953C/en not_active Expired - Fee Related
- 1998-12-11 JP JP2000539186A patent/JP4588213B2/en not_active Expired - Fee Related
- 1998-12-11 DE DE59803574T patent/DE59803574D1/en not_active Expired - Lifetime
- 1998-12-11 KR KR1020007006436A patent/KR100583262B1/en not_active IP Right Cessation
-
2000
- 2000-06-15 US US09/594,905 patent/US6783794B1/en not_active Expired - Fee Related
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3677799A (en) * | 1970-11-10 | 1972-07-18 | Celanese Corp | Vapor phase boron deposition by pulse discharge |
US4406765A (en) * | 1980-01-28 | 1983-09-27 | Fuji Photo Film Co., Ltd. | Apparatus and process for production of amorphous semiconductor |
DE3322341A1 (en) * | 1983-06-22 | 1985-01-03 | Siegfried Dr.-Ing. 5135 Selfkant Strämke | METHOD AND DEVICE FOR THE SURFACE TREATMENT OF WORKPIECES BY GLIMMER DISCHARGE |
DE4003623A1 (en) * | 1990-02-07 | 1991-08-08 | Kloeckner Ionon | METHOD FOR CONTROLLING A PLANT TREATMENT SYSTEM FOR WORKPIECES |
EP0603864A2 (en) * | 1992-12-23 | 1994-06-29 | Hughes Aircraft Company | Surface potential control in plasma processing of materials |
FR2708624A1 (en) * | 1993-07-30 | 1995-02-10 | Neuville Stephane | Process for deposition of a protective coating based on amorphous diamond pseudocarbon or on modified silicon carbide |
EP0695813A2 (en) * | 1994-08-06 | 1996-02-07 | ALD Vacuum Technologies GmbH | Process for carburizing carburisable work pieces under the action of plasma-pulses |
WO1997027345A1 (en) * | 1996-01-25 | 1997-07-31 | Elektroschmelzwerk Kempten Gmbh | Process for producing wear-resistant boride layers on metal material surfaces |
Also Published As
Publication number | Publication date |
---|---|
ATE215132T1 (en) | 2002-04-15 |
WO1999031291A3 (en) | 1999-09-10 |
EP1044289B1 (en) | 2002-03-27 |
DE59803574D1 (en) | 2002-05-02 |
CN1198953C (en) | 2005-04-27 |
US6783794B1 (en) | 2004-08-31 |
KR20010033075A (en) | 2001-04-25 |
CN1282383A (en) | 2001-01-31 |
EP1044289A2 (en) | 2000-10-18 |
WO1999031291A2 (en) | 1999-06-24 |
JP4588213B2 (en) | 2010-11-24 |
KR100583262B1 (en) | 2006-05-25 |
JP2002508448A (en) | 2002-03-19 |
EP1143031A2 (en) | 2001-10-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
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AC | Divisional application: reference to earlier application |
Ref document number: 1044289 Country of ref document: EP |
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RIN1 | Information on inventor provided before grant (corrected) |
Inventor name: BIEMER, SWEN Inventor name: RIE, KYONG-TSCHONG Inventor name: LAUDIEN, GUENTHER Inventor name: RODRIGUEZ CABEO, EMILIO DR. |
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PUAL | Search report despatched |
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RIC1 | Information provided on ipc code assigned before grant |
Ipc: 7C 23C 16/28 B Ipc: 7C 23C 8/08 B Ipc: 7C 23C 8/38 B Ipc: 7C 23C 8/36 A |
|
17P | Request for examination filed |
Effective date: 20041028 |
|
AKX | Designation fees paid |
Designated state(s): AT DE ES FR GB IT PT SE |
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17Q | First examination report despatched |
Effective date: 20070523 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION HAS BEEN REFUSED |
|
18R | Application refused |
Effective date: 20110403 |