EP1068629A1 - Canon a electrons de type "torche a electrons" - Google Patents
Canon a electrons de type "torche a electrons"Info
- Publication number
- EP1068629A1 EP1068629A1 EP99911868A EP99911868A EP1068629A1 EP 1068629 A1 EP1068629 A1 EP 1068629A1 EP 99911868 A EP99911868 A EP 99911868A EP 99911868 A EP99911868 A EP 99911868A EP 1068629 A1 EP1068629 A1 EP 1068629A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- membrane
- electron
- electron beam
- cathode
- microtip
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J33/00—Discharge tubes with provision for emergence of electrons or ions from the vessel; Lenard tubes
Definitions
- the invention relates to the production of an electron gun, in particular of the "electron torch” type, as well as various applications of this electron gun.
- the strongest possible electron beam is sought so that the density of charges injected into the gas is high.
- the dimensions of the first device are large, an electron gun measuring several centimeters.
- the distance of about 20 mm necessary to be able to establish a potential difference of 20 keV between the filament and the membrane, leads to a burst of the electron beam emitted and a very low efficiency since only a fraction of the emitted beam passes through the membrane. Because of these losses of electrons in the membrane support as well as in the enclosure, the latter is not portal with bare hand without thermal protection.
- the invention firstly relates to an electron emitting device comprising: - an enclosure, closed on one side by a membrane which can be crossed by an electron beam, - a cathode with at least one microtip, for emitting an electron beam.
- microtip cathode which emits a directional beam, makes it possible to produce a device of small dimensions, presenting no heating problem, therefore portable with bare hands and insertable into a cryogenic assembly.
- Means for guiding an electron beam emitted by the cathode can also be provided. These means reinforce the directive nature of the beam.
- the power consumption is low and reduced compared to the consumption of known torches, due to the fact that there is no loss of power, neither in the enclosure, nor in the membrane or its possible support.
- the microtip cathode has a distribution of microtip zones, according to a certain drawing, the membrane having flat and thin zones and thicker reinforcement zones, separating the flat and thin zones according to the drawing of distribution of microtip zones.
- the emissive parts of the cathode and the flat portions of the membrane, located between the reinforcement zones correspond in pairs.
- each microtip zone corresponds to a flat zone of the membrane, it may be that a flat zone corresponds (s) to one or more microtip zones.
- the reinforcements have only a mechanical action and do not necessarily follow the design of the microtip zones;
- the means for guiding the electron beam include means for produce a magnetic field.
- This magnetic field can be adjustable in intensity and direction.
- the invention also relates to various applications of the electron source described above.
- the electron source can be applied:
- FIG. 2 shows an example of a microtip cathode.
- FIG. 1 A first embodiment of the invention is illustrated in FIG. 1.
- a microtip cathode 2 is disposed in an enclosure 8. It produces and directs an electron beam 4 towards a membrane 6, which closes the enclosure 8 on one of its sides.
- the cathode 2 is itself polarized at -lOkV or -20kV relative to the enclosure 8 and to the membrane 6.
- Means can also be provided (for example permanent magnets)
- a magnetic field B for example from 1000G to 2000G which can be directed, and possibly be adjustable in direction and intensity, so that the impact of the electrons is made on the membrane 6 itself, and not on enclosure 8 and the thicker periphery of the membrane.
- These means for guiding the electron beam may not be provided, for example in the case where the beam is not very intense (for example: a few uA which pass through the membrane for a few tens of amps emitted).
- the transmission of the membrane is high.
- the surface of the membrane is typically of the order of mm 2 .
- the dimensions of such a torch, with a single cathode, can be, for example:
- - diameter of this enclosure 10-15 mm
- - material of enclosure 8 conductive or ceramic, for example stainless steel or alumina
- - membrane extension of a few mm 2 for the thinnest area (100n); material: Si 3 N 4 , Si, Sic, diamond, etc.
- - vacuum in enclosure 8 of the order of 10 "8 mbar, - cathode 2: emissive surface ⁇ lmm 2 ; emitted current: 1mA for 100V of extraction voltage,
- Cathode 2 consists of a microtip cathode, for example of the same type as that used and described in patent FR-B-2 679 653 (EP-A-0 524 870), and which is illustrated in FIG. 2
- This cathode essentially comprises, on a substrate 11, for example made of glass, a layer of silica 13 covered with a resistive layer 15, for example made of silicon.
- a resistive layer 15 for example made of silicon.
- An insulating layer 18 pierced with holes in which the microtips 17 are located separates the electrode or cathode electrodes 16 from the electrode or electrodes of the electron extraction grid 19 (which may be made of Niobium).
- the electron extraction grid 19 is perforated above each microtip 17 so as to allow the emission of electrons.
- the microtips 17 being brought to a potential V p , the grid electrodes 19 to a potential Vq , the electrons are emitted with an initial kinetic energy -e- (Vg-V p ).
- the microtip cathode 22 can itself be structured (possibly in the form of a matrix cathode, with zones independent of each other) so that the emitted electrons go to the thinned zones 26-1, 26-3 rather only in the thick areas of the membrane 26-2, 26-4, 26-6 (which would otherwise lead to heating of the membrane, due to a strong absorption of the electron beam and, perhaps , when it breaks).
- the enclosures 8, 28 are further connected to pumping means, not shown in FIGS. 1, 3 to achieve a vacuum at a desired pressure, for example of the order of 10 "7 to 10 ⁇ 8 mbar.
- references 20, 30 both designate a tank of the enclosure 8, 28, and the references 12, 32 a trap (or “getter”) making it possible to absorb residual impurities, contained in the enclosure 8, 28 in order to maintain the basic vacuum when the pumping means have been disconnected.
- Means 14, 34 for supplying voltage supply the voltages necessary for the operation of the cathodes 2, 22.
- FIG. 4 Another exemplary embodiment is given in FIG. 4.
- a membrane 36 is produced on a reinforcing structure 37, and has a diameter D of approximately 3 mm.
- the microtip cathode 42 has as many emissive zones as there are planar zones in the membrane 36.
- the cathode emits several electron beams simultaneously.
- Each zone of the microtip cathode can, for example, emit a beam with a diameter of 100 ⁇ m. All the emissive areas of the cathode are produced on a substrate 44 of width L ⁇ lOmm.
- the microtip cathode can have any distribution of microtip areas, depending on the desired application. Whatever the distribution of the microtips, the membrane can be provided with a reinforcement grid reproducing the design of the complementary part of this distribution, so that the cathode and membrane are two homologous, even homothetic, images.
- a slender-shaped membrane placed behind a cathode which is also slender, while having a uniform electron emission over the entire length of the membrane.
- This possibility does not exist with a source of electron type "filament”, because the central part of it is always much hotter than its edges and, therefore, the emission of electrons is much stronger in the center only on the edges.
- the device can be used to generate an electron beam of 10 to 20 keV.
- This beam strikes a light emitting sample, of the III-V semiconductor compound type, to generate blue or ultraviolet light (GaN or AIN type compound in quantum well structure).
- It is a "microtip laser", in which the light source is placed outside the vacuum, although as close as possible to the membrane.
- the electrons produced can be injected into a gas or a liquid in order to induce there a light excitation (for example in gaseous or liquid xenon (-110 ° C), the de-excitation of the excimers producing transitions 1 0
- the device can be that of the ieser article, the electron source being that according to the invention.
- an electron beam produced by the source according to the invention for:
- a target with a material capable of producing X-ray radiation, for example a material such as Mo or Cr "stuck" against the membrane or close to it, and producing an X emission.
- a material capable of producing X-ray radiation for example a material such as Mo or Cr "stuck" against the membrane or close to it.
- the cooling of the target is then greatly facilitated by the fact that it is outside the vacuum of the chamber containing the electron source.
- the anode is easily interchangeable.
- this source can be placed in a high pressure plasma source, in order to inject electrons into it.
Landscapes
- Cold Cathode And The Manufacture (AREA)
- Electron Sources, Ion Sources (AREA)
Abstract
Description
Claims
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR9804177 | 1998-04-03 | ||
| FR9804177A FR2777113B1 (fr) | 1998-04-03 | 1998-04-03 | Canon a electrons de type "torche a electrons" |
| PCT/FR1999/000775 WO1999052124A1 (fr) | 1998-04-03 | 1999-04-02 | Canon a electrons de type 'torche a electrons' |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP1068629A1 true EP1068629A1 (fr) | 2001-01-17 |
| EP1068629B1 EP1068629B1 (fr) | 2002-07-17 |
Family
ID=9524836
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP99911868A Expired - Lifetime EP1068629B1 (fr) | 1998-04-03 | 1999-04-02 | Canon a electrons de type "torche a electrons" |
Country Status (5)
| Country | Link |
|---|---|
| EP (1) | EP1068629B1 (fr) |
| JP (1) | JP2002510848A (fr) |
| DE (1) | DE69902156T2 (fr) |
| FR (1) | FR2777113B1 (fr) |
| WO (1) | WO1999052124A1 (fr) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2015125414A1 (fr) * | 2014-02-19 | 2015-08-27 | Hitachi Zosen Corporation | Irradiateur à faisceau d'électrons à efficacité de refroidissement renforcée de la fenêtre de transmission |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2823907A1 (fr) * | 2001-09-06 | 2002-10-25 | Commissariat Energie Atomique | Procede et dispositif de focalisation d'un faisceau d'electrons |
| WO2005055269A2 (fr) * | 2003-12-01 | 2005-06-16 | Mbda Uk Limited | Ameliorations apportees ou relatives a un canon electronique et une fenetre de faisceau d'electrons |
| FI121654B (sv) | 2006-07-10 | 2011-02-28 | Kwh Mirka Ab Oy | Förfarande för tillverkning av en flexibel sliprondell och en flexibel sliprondell |
| DE102007049350B4 (de) | 2007-10-15 | 2011-04-07 | Bruker Daltonik Gmbh | APCI Ionenquelle |
| SE0802101A2 (sv) * | 2008-10-07 | 2010-07-20 | Tetra Laval Holdings & Finance | Omkopplingsbar anordning för elektronstrålesterilisering |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3890503A (en) * | 1968-11-29 | 1975-06-17 | Hewlett Packard Co | Stimulated emission light source pumped by electron beam of field emission initiated vacuum arc |
| US3683179A (en) * | 1970-03-11 | 1972-08-08 | John R Norman | Means for irradiating materials |
| US3956712A (en) * | 1973-02-05 | 1976-05-11 | Northrop Corporation | Area electron gun |
| DE2950897C2 (de) * | 1979-12-18 | 1985-05-09 | M.A.N. Maschinenfabrik Augsburg-Nürnberg AG, 8000 München | Einrichtung zur Erzeugung von Elektronenstrahlen |
| US4396841A (en) * | 1981-06-16 | 1983-08-02 | Razin Gennady I | Device for scanning a beam of charged particles |
-
1998
- 1998-04-03 FR FR9804177A patent/FR2777113B1/fr not_active Expired - Fee Related
-
1999
- 1999-04-02 JP JP2000542783A patent/JP2002510848A/ja active Pending
- 1999-04-02 EP EP99911868A patent/EP1068629B1/fr not_active Expired - Lifetime
- 1999-04-02 WO PCT/FR1999/000775 patent/WO1999052124A1/fr not_active Ceased
- 1999-04-02 DE DE69902156T patent/DE69902156T2/de not_active Expired - Fee Related
Non-Patent Citations (1)
| Title |
|---|
| See references of WO9952124A1 * |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2015125414A1 (fr) * | 2014-02-19 | 2015-08-27 | Hitachi Zosen Corporation | Irradiateur à faisceau d'électrons à efficacité de refroidissement renforcée de la fenêtre de transmission |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2777113B1 (fr) | 2000-05-05 |
| DE69902156D1 (de) | 2002-08-22 |
| JP2002510848A (ja) | 2002-04-09 |
| WO1999052124A1 (fr) | 1999-10-14 |
| DE69902156T2 (de) | 2003-03-27 |
| FR2777113A1 (fr) | 1999-10-08 |
| EP1068629B1 (fr) | 2002-07-17 |
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