EP1021588A4 - Fluid delivery apparatus and method - Google Patents
Fluid delivery apparatus and methodInfo
- Publication number
- EP1021588A4 EP1021588A4 EP98934511A EP98934511A EP1021588A4 EP 1021588 A4 EP1021588 A4 EP 1021588A4 EP 98934511 A EP98934511 A EP 98934511A EP 98934511 A EP98934511 A EP 98934511A EP 1021588 A4 EP1021588 A4 EP 1021588A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- fluid delivery
- delivery apparatus
- fluid
- delivery
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J4/00—Feed or outlet devices; Feed or outlet control devices
- B01J4/001—Feed or outlet devices as such, e.g. feeding tubes
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US5244297P | 1997-07-14 | 1997-07-14 | |
US52442P | 1997-07-14 | ||
PCT/US1998/014525 WO1999004060A1 (en) | 1997-07-14 | 1998-07-14 | Fluid delivery apparatus and method |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1021588A1 EP1021588A1 (en) | 2000-07-26 |
EP1021588A4 true EP1021588A4 (en) | 2002-11-06 |
Family
ID=21977635
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP98934511A Withdrawn EP1021588A4 (en) | 1997-07-14 | 1998-07-14 | Fluid delivery apparatus and method |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP1021588A4 (en) |
AU (1) | AU8401698A (en) |
WO (1) | WO1999004060A1 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20050056216A1 (en) * | 2003-09-15 | 2005-03-17 | Intel Corporation | Precursor delivery system |
US8322571B2 (en) | 2005-04-25 | 2012-12-04 | Advanced Technology Materials, Inc. | Liner-based liquid storage and dispensing systems with empty detection capability |
KR20080039373A (en) | 2005-06-06 | 2008-05-07 | 어드밴스드 테크놀러지 머티리얼즈, 인코포레이티드 | Fluid storage and dispensing systems and processes |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02156085A (en) * | 1988-12-08 | 1990-06-15 | Koujiyundo Kagaku Kenkyusho:Kk | Method and device for transporting raw liquid material |
WO1994021840A1 (en) * | 1993-03-18 | 1994-09-29 | Advanced Technology Materials, Inc. | Apparatus and method for delivering reagents in vapor form to a cvd reactor |
EP0622475A1 (en) * | 1993-04-29 | 1994-11-02 | Applied Materials, Inc. | Method and apparatus for degassing semiconductor processing liquids |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3035614A (en) * | 1959-11-04 | 1962-05-22 | Jr Chester H Kirk | Expansion tank |
US3524475A (en) * | 1968-01-10 | 1970-08-18 | American Tube & Controls Inc | Expansion tank |
US3741240A (en) * | 1971-08-02 | 1973-06-26 | Dresser Ind | Fluid compensator valve |
US3886733A (en) * | 1973-08-24 | 1975-06-03 | Nrg Inc | Pneumatic energy source utilizing liquid oxygen |
US4132165A (en) * | 1976-10-08 | 1979-01-02 | Woodward Governor Company | Fuel supply system for a missile or the like |
US4341202A (en) * | 1978-01-19 | 1982-07-27 | Aptec Corporation | Phase-change heat transfer system |
US4321014A (en) * | 1979-12-31 | 1982-03-23 | Polaroid Corporation | Constant flow pumping apparatus |
US5330576A (en) * | 1990-04-26 | 1994-07-19 | Baldwin-Gegenheimer Gmbh | Recirculating coating liquid supply system with viscosity regulation |
US5098741A (en) * | 1990-06-08 | 1992-03-24 | Lam Research Corporation | Method and system for delivering liquid reagents to processing vessels |
US5304390A (en) * | 1992-06-30 | 1994-04-19 | Union Carbide Chemicals & Plastics Technology Corporation | Supercritical ratio control system utilizing a sonic flow venturi and an air-driven positive displacement pump |
US5430229A (en) * | 1992-12-30 | 1995-07-04 | Hercules Incorporated | Chemical process for disposal of rocket propellant containing nitrate ester |
US5620524A (en) * | 1995-02-27 | 1997-04-15 | Fan; Chiko | Apparatus for fluid delivery in chemical vapor deposition systems |
-
1998
- 1998-07-14 AU AU84016/98A patent/AU8401698A/en not_active Abandoned
- 1998-07-14 EP EP98934511A patent/EP1021588A4/en not_active Withdrawn
- 1998-07-14 WO PCT/US1998/014525 patent/WO1999004060A1/en not_active Application Discontinuation
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02156085A (en) * | 1988-12-08 | 1990-06-15 | Koujiyundo Kagaku Kenkyusho:Kk | Method and device for transporting raw liquid material |
WO1994021840A1 (en) * | 1993-03-18 | 1994-09-29 | Advanced Technology Materials, Inc. | Apparatus and method for delivering reagents in vapor form to a cvd reactor |
EP0622475A1 (en) * | 1993-04-29 | 1994-11-02 | Applied Materials, Inc. | Method and apparatus for degassing semiconductor processing liquids |
Non-Patent Citations (3)
Title |
---|
DATABASE WPI Derwent World Patents Index; AN 1990-228065 * |
PATENT ABSTRACTS OF JAPAN vol. 014, no. 412 (C - 0755) 6 September 1990 (1990-09-06) * |
See also references of WO9904060A1 * |
Also Published As
Publication number | Publication date |
---|---|
WO1999004060A1 (en) | 1999-01-28 |
AU8401698A (en) | 1999-02-10 |
EP1021588A1 (en) | 2000-07-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 20000118 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE |
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A4 | Supplementary search report drawn up and despatched |
Effective date: 20020919 |
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AK | Designated contracting states |
Kind code of ref document: A4 Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE |
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STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
|
18D | Application deemed to be withdrawn |
Effective date: 20021121 |