EP0956909B1 - Method and apparatus for continuous electrostatic application of a powder substance to a substrate - Google Patents

Method and apparatus for continuous electrostatic application of a powder substance to a substrate Download PDF

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Publication number
EP0956909B1
EP0956909B1 EP98870128A EP98870128A EP0956909B1 EP 0956909 B1 EP0956909 B1 EP 0956909B1 EP 98870128 A EP98870128 A EP 98870128A EP 98870128 A EP98870128 A EP 98870128A EP 0956909 B1 EP0956909 B1 EP 0956909B1
Authority
EP
European Patent Office
Prior art keywords
substrate
enclosure
powder
electric field
deposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP98870128A
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German (de)
French (fr)
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EP0956909A1 (en
Inventor
Jean Schrijnemackers
Pierre Vanden Brande
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ArcelorMittal Liege Upstream SA
Original Assignee
Cockerill Sambre SA
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Publication date
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Publication of EP0956909A1 publication Critical patent/EP0956909A1/en
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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B5/00Electrostatic spraying apparatus; Spraying apparatus with means for charging the spray electrically; Apparatus for spraying liquids or other fluent materials by other electric means
    • B05B5/025Discharge apparatus, e.g. electrostatic spray guns
    • B05B5/057Arrangements for discharging liquids or other fluent material without using a gun or nozzle
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B5/00Electrostatic spraying apparatus; Spraying apparatus with means for charging the spray electrically; Apparatus for spraying liquids or other fluent materials by other electric means
    • B05B5/08Plant for applying liquids or other fluent materials to objects
    • B05B5/14Plant for applying liquids or other fluent materials to objects specially adapted for coating continuously moving elongated bodies, e.g. wires, strips, pipes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00Processes for applying liquids or other fluent materials
    • B05D1/007Processes for applying liquids or other fluent materials using an electrostatic field
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00Processes for applying liquids or other fluent materials
    • B05D1/30Processes for applying liquids or other fluent materials performed by gravity only, i.e. flow coating
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B5/00Electrostatic spraying apparatus; Spraying apparatus with means for charging the spray electrically; Apparatus for spraying liquids or other fluent materials by other electric means
    • B05B5/16Arrangements for supplying liquids or other fluent material
    • B05B5/1683Arrangements for supplying liquids or other fluent material specially adapted for particulate materials
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C9/00Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
    • B05C9/04Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material to opposite sides of the work
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D2401/00Form of the coating product, e.g. solution, water dispersion, powders or the like
    • B05D2401/30Form of the coating product, e.g. solution, water dispersion, powders or the like the coating being applied in other forms than involving eliminable solvent, diluent or dispersant
    • B05D2401/32Form of the coating product, e.g. solution, water dispersion, powders or the like the coating being applied in other forms than involving eliminable solvent, diluent or dispersant applied as powders

Definitions

  • the present invention relates to a method for the continuous application of a powdered substance, in particular of powder paint, on an elongated substrate, presenting preferably in the form of a continuous band, running substantially vertically in the direction of its length through an enclosure deposit into which the above powder is introduced in a manner substantially continuous and in which an electric field is created allowing this powder to be applied to at least one of the two faces of the substrate.
  • One of the essential aims of the present invention is to offer an extremely simple and reliable process to very large yield allowing to obtain a highly uniform powder deposit both over the entire width of the substrate to be coated and over its length, and this at very small thicknesses, of the order of 10 microns, up to relatively large thicknesses, of the order of 250 microns, without need to take special precautions.
  • the invention also relates to a device for application of the above process.
  • a device is provided as indicated to claim 12.
  • Other embodiments of a device according to the invention are indicated in claims 13 to 20.
  • This device is essentially characterized by the fact that the deposit enclosure has, at its upper part, an opening feed for the powder so that it can fall out freely as a relatively homogeneous and uniform current powdery particles along the substrate surface (s) running in the depository parallel to the downdraft of this powder.
  • the walls of the enclosure are made made of an electrical insulating material or are covered internally of such material.
  • the enclosure comprises, along its walls facing the plane according to which the substrate can pass through the enclosure, at least one electrode, but preferably a succession of electrodes made up by a series of conducting wires extending at a certain distance one on the other along the above-mentioned plane, these wires being separated from these walls allowing the passage for powder that can be poured from a continuously and at a controllable flow rate across the top of the enclosure.
  • the method according to the invention is on the continuous electrostatic application of a substance in powder on an elongated substrate, consisting for example of a continuous strip, such as a steel sheet in the form of a continuous rollable tape.
  • the powdered substance can be very varied in nature, allowing for example to form on a substrate a layer of protection or an electrically insulating layer on a substrate conductive or a decorative layer in case the powder contains pigments or dyes.
  • this substrate is scrolled vertically following the direction of its length through a deposit enclosure in which the above-mentioned powder is introduced continuously, according to a uniform current, and at an adjustable rate while creating a field electric allowing to apply this powder on one or on two sides of the substrate.
  • This process is characterized in relation to the processes known by the fact that the powder is fed to the upper part of the depository by means of a device or installation suitable, in such a way as to allow this powder to move essentially by simple gravity along the surface (s) of the substrate to which it is to be fixed.
  • Figure 1 relates to a first embodiment of a particular device for implementing this method.
  • This is in particular a device for the application electrostatic continuous powder paint 5 on one side of a continuous strip of a substrate 1 which runs vertically, from bottom to top or top to bottom, in a storage enclosure 2.
  • enclosure 2 It is an enclosure 2 whose walls 3 are made of an electrical insulating material, preferably a plastic material transparent, like Plexiglas or polycarbonate. In some case, the interior faces of these walls can simply be covered by electrical insulating material.
  • This enclosure is formed by a standing box having at its upper end an opening 4 for feeding the powder 5 in the deposition chamber 2 and for the passage of the substrate 1 moving vertically over the entire height of the latter. So, a slot or opening 6 for the passage of the substrate 1 is provided in the bottom 7 of enclosure 2.
  • this bottom 7 has a hopper 8 making it possible to harvest the excess powder which may not have been deposited on the substrate, which can then be evacuated through an orifice 8 '.
  • This 8 'orifice can be connected to an installation of recycling, not shown, in which the collected powder is sucked so that it can be reused.
  • the electric field is created in the deposit enclosure 2 at means of electrodes 9 which can be brought to a high DC voltage, preferably negative, with respect to substrate 1, the latter being preferably grounded.
  • these electrodes 9 consist of a series of conductive wires extending a certain distance above each other opposite the face of the substrate 1, on which the powder 5 must be fixed, transversely to the direction of travel of the latter, parallel to each other and fixed by their ends to the side walls extending in planes perpendicular to the plane in which the substrate 1 moves.
  • these conductive wires are located at a certain distance from the wall 3 of the box 2 opposite to the face of the substrate 1 to cover with powder 5. They can, for example be made of copper, in tungsten or steel.
  • this powder 5 is moves in the deposit enclosure 2 up and down only under the effect of gravity.
  • the conductive wires, forming the electrodes are arranged in such a way that, when the powder 5 falls, it basically goes in the area of enclosure 2 between these wires and the substrate 1 and is negatively electrostatically charged by corona effect to then be attracted to substrate 1 thanks to the field intense electric prevailing in the powder passage zone between the substrate and the wires.
  • Working parameters and conditions can be set in such a way that the powder 5 arises with a very high application yield on substrate 1, generally greater than 95%.
  • the conducting wires are brought to a high voltage continuous negative and that the substrate is grounded reduces maximum risk of breakdown and powder deposition on the wires.
  • the value of the high voltage should be the most high possible so as to form a crown discharge around the wires, but in practice this value is limited by the breakdown limit which could ignite the powder. Furthermore, too low a voltage does not not achieve the desired crown discharge around the wires and negatively influences the efficiency of the deposit on the substrate.
  • an ideal and safe value of the electric field is located around 3500 volts per cm.
  • Lead wires should be located at a certain distance from the substrate which must at least be such as to avoid the physical contact between the wires and the substrate. This distance cannot be too large for economic and technical reasons, in particular to avoid having to use too high voltages.
  • a possible value of wire-substrate distance is approximately 5 to 12 cm. A preference is given for a distance of the order of 7 cm with a voltage of the order of 25 kV.
  • the number of conducting wires depends on the flow of the powder 5 which enters the deposit vessel 2 and which must be deposited on the substrate 1.
  • An ideal value for obtaining a deposit yield greater than 95%, the other conditions being optimal, is of the order of 700 to 900 g of powder per minute, per meter of width of the substrate and by common thread.
  • the distance between the wires can also have an effect on the yield of the deposit formed by the powder 5 on the substrate 1.
  • this distance will be as large as possible. According to the invention, it has been found that a distance giving excellent results is around 20 cm between two consecutive wires.
  • the conductive wires are not applied against the wall 3 of the enclosure 2 opposite and parallel to the substrate 1. It has indeed been found that, in this case, the deposition efficiency is relatively reduced. Ideally, the wires 9 must be at least 5 to 10 cm away from this wall 3.
  • the diameter of the wires is also a parameter important, since the crown effect is all the more intense as the wire diameter is small due to the tip effect. It was found that excellent results have been obtained with wires of a diameter about 100 to 250 microns.
  • Figure 2 relates to a second embodiment of a device according to the invention.
  • This device is distinguished from that shown in the Figure 1 by the fact that it is provided for the simultaneous fixing of powder 5 on both sides of a substrate 1.
  • the enclosure deposit 2 extends symmetrically on either side of the plane in which must pass the substrate 1 on which the powder 5 must be fixed.
  • the powder is fed on either side of this plane and the wires conductors are also provided on each side of this plane.
  • the apparatus 10 used to introduce the powder by gravity in the upper part of the enclosure can be very varied in nature. What matters above all is that it makes it possible to obtain a distribution uniform and controllable flow rate of the powder 5 introduced by gravity by the feed opening 4 in the deposit enclosure 2.
  • this device 10 should preferably make it possible to adapt the width of feeding the powder as a function of the width of the substrate to be coated.
  • it must make it possible to deliver a relatively large quantity powder in a continuous, regular and homogeneous way across the width desired.
  • the powder flow can vary from 0 g to a value of the order 10,000 g per minute and per meter of width of the substrate.
  • this device 10 allows to regulate the powder flow linearly.
  • a supply apparatus 10 meeting these requirements has was shown schematically in Figure 3. It is a kind of sprinkler that is mounted directly above the opening supply 4 of the storage enclosure 2.
  • This device includes a mounted feed hopper 11 above a cylinder 12 which can rotate, at an adjustable speed, around a horizontal axis 13 in the direction of arrow 14.
  • the surface of the cylinder 12 is coated with metal studs 15, so as to allow, during the rotation of the cylinder 12 about its axis 13, to cause, by the lower opening 16 of the hopper 11, a metered quantity of powder, contained in the hopper, on the cylindrical surface of cylinder 12 in the direction of the arrow 14.
  • a rotary brush 17 which can rotate at a speed adjustable around a horizontal axis 18 in the direction of arrow 19 is applied against this cylindrical surface, on the side of the hopper 11 where the powder 5 is removed from the latter by the pins 15 on this cylindrical surface and is applied against said surface to allow detach the powder, break up any agglomerates and spray the powder down.
  • the axis of rotation 18 of this brush 17 is preferably located substantially at the same level as the axis 13 of the cylinder 12 and its rotation speed is generally continuously adjustable between 0 and 4500 rpm.
  • this brush 17 includes pins relatively rigid metals, for example steel, of a length between 1 and 2 cm, and the distance from the axis 13 of cylinder 12 is such that the end of the pins 20 is just in contact with the surface of it, as these pass into the plane defined by the axes of rotation 13 and 18.
  • the width of the powder feed on the surface of the cylinder 12 can be adjusted by positioning two cheeks, not shown, located in the hopper 11 and parallel to the walls transverse of the latter. Thus, a width of more than 2 m is easily conceivable.
  • the powder flow is linearly adjustable by playing only on the speed of rotation of the cylinder 12 around its axis 13.
  • the latter can optionally be heated so as to subject this powder to at least partial melting to form a coating substantially uniform and durable on this substrate.
  • This heating can be provided directly at the place where the substrate leaves the deposit enclosure.
  • the substrate has a face to be coated made of an electrically conductive material, such as a sheet metal steel, it can advantageously be subjected to firing by induction after fixing the powder on the substrate.
  • This subsequent heating is advantageously carried out as the substrate moves vertically, in the same way so that when applying the powder and this in order to reduce the surface on the ground, to precisely position the substrate 1 between the turns of the inductor, not shown in the figures, and avoid the need use intermediate support cylinders.
  • the object of the invention is further illustrated by a few concrete examples of applying a powder paint on a substrate formed by a steel strip in a device of the type such as shown in the accompanying figures.
  • the invention is not limited to the use of a specific powder supply system.
  • this powder can move substantially by gravity through the depository, and this in a continuous and homogeneous manner at a relatively high throughput.
  • the method according to the invention is not only applicable on a metallic substrate, such as steel, coated steel or aluminum for example, but also on a substrate made electrically conductive, such as paper, cardboard, plastic, textiles, etc., for example covered with a film driver.

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  • Application Of Or Painting With Fluid Materials (AREA)
  • Electrostatic Spraying Apparatus (AREA)

Abstract

An electrically conducting oblong substrata (1) in the form of a continuous band moves vertically through a depositing enclosure (2). The powder is introduced into the enclosure continuously and an electric field is created in the enclosure, by means of electrodes (9), enabling the powder (5) to be applied on one of the faces of the substrata. The powder is supplied in the upper part of the enclosure so as to move by gravity along the substrata surface.

Description

La présente invention est relative à un procédé pour l'application en continu d'une substance en poudre, notamment de peinture en poudre, sur un substrat de forme allongée, se présentant de préférence sous forme d'une bande continue, défilant sensiblement verticalement suivant la direction de sa longueur à travers une enceinte de dépôt dans laquelle est introduite la poudre susdite d'une manière sensiblement continue et dans laquelle est créé un champ électrique permettant d'appliquer cette poudre sur au moins une des deux faces du substrat.The present invention relates to a method for the continuous application of a powdered substance, in particular of powder paint, on an elongated substrate, presenting preferably in the form of a continuous band, running substantially vertically in the direction of its length through an enclosure deposit into which the above powder is introduced in a manner substantially continuous and in which an electric field is created allowing this powder to be applied to at least one of the two faces of the substrate.

Il est actuellement très courant d'appliquer de la peinture sur des bandes métalliques, principalement des bandes d'acier et d'aluminium, défilant en continu. Lorsque cette peinture est liquide, l'application s'effectue à l'aide de machines équipées de rouleaux.It is currently very common to apply paint on metal strips, mainly steel strips and aluminum, running continuously. When this paint is liquid, the application is carried out using machines fitted with rollers.

Toutefois, pour diverses raisons d'ordre écologiques, économiques ou qualitatives, on souhaite de plus en plus à remplacer les peintures liquides par des peintures à 100% d'extrait sec, c'est-à-dire sans solvant. Les peintures en poudre et les peintures à réticulation sous radiations UV ou sous faisceaux d'électrons sont les principaux représentants de telles peintures.However, for various ecological reasons, economic or qualitative, we increasingly want to replace liquid paints with 100% dry extract paints, i.e. solvent free. Powder coatings and crosslinked paints under UV radiation or under electron beams are the main representatives of such paintings.

Généralement, la ligne connue pour peintures en poudre utilise des projecteurs électrostatiques fonctionnant selon le principe corona ou tribo. Generally the known line for powder coatings uses electrostatic headlights operating on the principle corona or tribo.

Les inconvénients liés à l'utilisation de tels projecteurs sont tout d'abord dus à leur faible débit, de l'ordre de 100 à 500 g/min, ce qui nécessite l'utilisation simultanée d'un grand nombre de tels projecteurs pour obtenir un rendement économiquement justifié. Toutefois, les vitesses des lignes utilisant ce procédé ne dépassent cependant généralement pas 30 m/min. De plus, l'utilisation de ces projecteurs pose souvent des problèmes d'homogénéité de répartition de la poudre sur la surface à peindre.The disadvantages of using such projectors are first of all due to their low flow rate, of the order of 100 to 500 g / min, which requires the simultaneous use of a large number of such projectors to obtain an economically justified return. However, line speeds using this process however do not exceed generally not 30 m / min. In addition, the use of these projectors poses often problems of homogeneity of distribution of the powder on the surface to be painted.

Les documents US 4.795.339 et US 5.279.863 décrivent des appareils pour former un revêtement sur un substrat conducteur et des procédés électrostatiques à partir d'une substance poudreuse.Documents US 4,795,339 and US 5,279,863 describe apparatus for forming a coating on a conductive substrate and electrostatic processes using a powdery substance.

Ces procédés et appareils connus présentent le grand inconvénient que l'alimentation de l'enceinte de dépôt par des substances en poudre est très compliquée à réguler et à mettre au point nécessitant entre autres l'utilisation d'une surpression à l'entrée et d'une dépression à la sortie de l'enceinte de dépôt, outre des installations de pompage coûteuses. Ceci peut entraíner la formation de couches de revêtement très hétérogènes donnant des produits de qualité médiocre qui ne conviennent pas pour la plupart des applications.These known methods and devices have the great disadvantage that the supply of the deposit enclosure by powdered substances is very complicated to regulate and develop requiring, among other things, the use of an overpressure at the inlet and a depression at the outlet of the depository, in addition to the expensive pumping. This can lead to the formation of layers of very heterogeneous coating giving poor quality products which are not suitable for most applications.

Un des buts essentiels de la présente invention est de proposer un procédé extrêmement simple et fiable à très grand rendement permettant d'obtenir un dépôt de poudre hautement uniforme aussi bien sur toute la largeur du substrat à revêtir que sur sa longueur, et ceci à de très faibles épaisseurs, de l'ordre de 10 microns, jusqu'à des épaisseurs relativement importantes, de l'ordre de 250 microns, sans nécessiter de prendre des précautions particulières.One of the essential aims of the present invention is to offer an extremely simple and reliable process to very large yield allowing to obtain a highly uniform powder deposit both over the entire width of the substrate to be coated and over its length, and this at very small thicknesses, of the order of 10 microns, up to relatively large thicknesses, of the order of 250 microns, without need to take special precautions.

A cet effet, suivant l'invention, on prévoit un procédé tel qu'indiqué dans la revendication 1. D'autres modes de réalisation du procédé sont indiqués dans les revendications 2 à 11. To this end, according to the invention, there is provided a method as set forth in claim 1. Other embodiments of the method are indicated in claims 2 to 11.

L'invention se rapporte également à un dispositif pour l'application du procédé susdit.The invention also relates to a device for application of the above process.

Suivant l'invention, on prévoit un dispositif tel qu'indiqué à la revendication 12. D'autres formes de réalisation d'un dispositif suivant l'invention sont indiquées aux revendications 13 à 20.According to the invention, a device is provided as indicated to claim 12. Other embodiments of a device according to the invention are indicated in claims 13 to 20.

Ce dispositif est essentiellement caractérisé par le fait que l'enceinte de dépôt présente, à sa partie supérieure, une ouverture d'alimentation pour la poudre afin que cette dernière puisse ainsi tomber librement sous forme d'un courant relativement homogène et uniforme de particules poudreuses le long de la ou des surfaces du substrat défilant dans l'enceinte de dépôt parallèlement au courant descendant de cette poudre.This device is essentially characterized by the fact that the deposit enclosure has, at its upper part, an opening feed for the powder so that it can fall out freely as a relatively homogeneous and uniform current powdery particles along the substrate surface (s) running in the depository parallel to the downdraft of this powder.

Avantageusement, les parois de l'enceinte sont réalisées en un matériau isolant électrique ou sont recouvertes intérieurement d'un tel matériau.Advantageously, the walls of the enclosure are made made of an electrical insulating material or are covered internally of such material.

Suivant une forme de réalisation préférentielle de l'invention, l'enceinte comprend, le long de ses parois en regard du plan suivant lequel le substrat peut défiler à travers l'enceinte, au moins une électrode, mais de préférence une succession d'électrodes constituées par une série de fils conducteurs s'étendant à une certaine distance l'un de l'autre le long du plan susdit, ces fils étant écartés de ces parois en permettant le passage pour la poudre pouvant être déversée d'une manière continue et à un débit contrôlable dans la partie supérieure de l'enceinte.According to a preferred embodiment of the invention, the enclosure comprises, along its walls facing the plane according to which the substrate can pass through the enclosure, at least one electrode, but preferably a succession of electrodes made up by a series of conducting wires extending at a certain distance one on the other along the above-mentioned plane, these wires being separated from these walls allowing the passage for powder that can be poured from a continuously and at a controllable flow rate across the top of the enclosure.

D'autres détails et particularités de l'invention ressortiront de la description donnée ci-après, à titre d'exemple non limitatif, de quelques formes de réalisation particulières de l'invention avec référence aux dessins annexés.

  • La figure 1 est une représentation schématique en élévation et en coupe verticale d'une première forme de réalisation du dispositif suivant l'invention.
  • La figure 2 est une vue schématique analogue à celle de la figure 1 d'une deuxième forme de réalisation de l'invention.
  • La figure 3 est, à plus grande échelle, une vue schématique en élévation de l'appareil d'alimentation de poudre utilisé dans les deux formes de réalisation montrées aux figures 1 et 2.
  • Other details and particularities of the invention will emerge from the description given below, by way of nonlimiting example, of some particular embodiments of the invention with reference to the accompanying drawings.
  • Figure 1 is a schematic representation in elevation and in vertical section of a first embodiment of the device according to the invention.
  • Figure 2 is a schematic view similar to that of Figure 1 of a second embodiment of the invention.
  • FIG. 3 is, on a larger scale, a schematic elevation view of the powder supply apparatus used in the two embodiments shown in FIGS. 1 and 2.
  • Dans les différentes figures, les mêmes chiffres de référence se rapportent aux mêmes éléments.In the different figures, the same figures of reference relate to the same items.

    D'une façon générale, le procédé suivant l'invention est relatif à l'application électrostatique en continu d'une substance en poudre sur un substrat de forme allongée, constitué par exemple d'une bande continue, telle qu'une tôle d'acier se présentant sous forme d'une bande continue enroulable.In general, the method according to the invention is on the continuous electrostatic application of a substance in powder on an elongated substrate, consisting for example of a continuous strip, such as a steel sheet in the form of a continuous rollable tape.

    La substance en poudre peut être de nature très variée, permettant par exemple de former sur un substrat une couche de protection ou une couche électriquement isolante sur un substrat conducteur ou encore une couche décorative dans le cas où la poudre contient des pigments ou des colorants.The powdered substance can be very varied in nature, allowing for example to form on a substrate a layer of protection or an electrically insulating layer on a substrate conductive or a decorative layer in case the powder contains pigments or dyes.

    Suivant ce procédé, on fait défiler ce substrat verticalement suivant la direction de sa longueur à travers une enceinte de dépôt dans laquelle est introduite la poudre susdite d'une manière continue, suivant un courant uniforme, et à un débit réglable pendant qu'on crée un champ électrique permettant ainsi d'appliquer cette poudre sur une ou sur les deux faces du substrat.According to this process, this substrate is scrolled vertically following the direction of its length through a deposit enclosure in which the above-mentioned powder is introduced continuously, according to a uniform current, and at an adjustable rate while creating a field electric allowing to apply this powder on one or on two sides of the substrate.

    Ce procédé se caractérise par rapport aux procédés connus par le fait que l'on alimente la poudre à la partie supérieure de l'enceinte de dépôt au moyen d'un appareil ou d'une installation appropriée, d'une manière telle à permettre à cette poudre de se déplacer essentiellement par simple gravité le long de la ou des surfaces du substrat sur laquelle ou lesquelles celle-ci doit être fixée.This process is characterized in relation to the processes known by the fact that the powder is fed to the upper part of the depository by means of a device or installation suitable, in such a way as to allow this powder to move essentially by simple gravity along the surface (s) of the substrate to which it is to be fixed.

    La figure 1 est relative à une première forme de réalisation d'un dispositif particulier pour la mise en oeuvre de ce procédé.Figure 1 relates to a first embodiment of a particular device for implementing this method.

    Il s'agit notamment d'un dispositif pour l'application électrostatique en continu de peinture en poudre 5 sur une des faces d'une bande continue d'un substrat 1 qui défile verticalement, de bas en haut ou de haut en bas, dans une enceinte de dépôt 2.This is in particular a device for the application electrostatic continuous powder paint 5 on one side of a continuous strip of a substrate 1 which runs vertically, from bottom to top or top to bottom, in a storage enclosure 2.

    Il s'agit d'une enceinte 2 dont les parois 3 sont réalisées en un matériau isolant électrique, de préférence une matière plastique transparente, comme le Plexiglas ou le polycarbonate. Dans certains cas, les faces intérieures de ces parois peuvent simplement être couvertes par un matériau isolant électrique.It is an enclosure 2 whose walls 3 are made of an electrical insulating material, preferably a plastic material transparent, like Plexiglas or polycarbonate. In some case, the interior faces of these walls can simply be covered by electrical insulating material.

    Cette enceinte est formée d'un caisson debout présentant à son extrémité supérieure une ouverture 4 pour l'alimentation de la poudre 5 dans la chambre de dépôt 2 et pour le passage du substrat 1 se déplaçant verticalement sur toute la hauteur de cette dernière. Ainsi, une fente ou ouverture 6 pour le passage du substrat 1 est prévue dans le fond 7 de l'enceinte 2.This enclosure is formed by a standing box having at its upper end an opening 4 for feeding the powder 5 in the deposition chamber 2 and for the passage of the substrate 1 moving vertically over the entire height of the latter. So, a slot or opening 6 for the passage of the substrate 1 is provided in the bottom 7 of enclosure 2.

    Par ailleurs, ce fond 7 présente une trémie 8 permettant de récolter l'excès de poudre éventuellement non déposée sur le substrat, qui peut alors être évacuée par un orifice 8'. Furthermore, this bottom 7 has a hopper 8 making it possible to harvest the excess powder which may not have been deposited on the substrate, which can then be evacuated through an orifice 8 '.

    Cet orifice 8' peut être connecté à une installation de recyclage, non représentée, dans laquelle la poudre récoltée est aspirée pour pouvoir être réutilisée.This 8 'orifice can be connected to an installation of recycling, not shown, in which the collected powder is sucked so that it can be reused.

    Le champ électrique est créé dans l'enceinte de dépôt 2 au moyen d'électrodes 9 pouvant être portées à une haute tension continue, de préférence négative, par rapport au substrat 1, ce dernier étant de préférence mis à la terre.The electric field is created in the deposit enclosure 2 at means of electrodes 9 which can be brought to a high DC voltage, preferably negative, with respect to substrate 1, the latter being preferably grounded.

    Dans la forme de réalisation particulière représentée à la figure 1, ces électrodes 9 sont constituées d'une série de fils conducteurs s'étendant à une certaine distance l'un au-dessus de l'autre en regard de la face du substrat 1, sur laquelle la poudre 5 doit être fixée, transversalement par rapport à la direction de défilement de ce dernier, parallèlement entre eux et fixés par leurs extrémités aux parois latérales s'étendant dans des plans perpendiculaires au plan dans lequel le substrat 1 se déplace.In the particular embodiment shown in Figure 1, these electrodes 9 consist of a series of conductive wires extending a certain distance above each other opposite the face of the substrate 1, on which the powder 5 must be fixed, transversely to the direction of travel of the latter, parallel to each other and fixed by their ends to the side walls extending in planes perpendicular to the plane in which the substrate 1 moves.

    De plus, ces fils conducteurs se situent à une certaine distance de la paroi 3 du caisson 2 opposée à la face du substrat 1 à couvrir par la poudre 5. Ils peuvent, par exemple être réalisés en cuivre, en tungstène ou en acier.In addition, these conductive wires are located at a certain distance from the wall 3 of the box 2 opposite to the face of the substrate 1 to cover with powder 5. They can, for example be made of copper, in tungsten or steel.

    Comme déjà mentionné ci-dessus, cette poudre 5 se déplace dans l'enceinte de dépôt 2 de haut en bas uniquement sous l'effet de la gravité. Les fils conducteurs, formant les électrodes, sont disposés d'une manière telle que, lors de la chute de la poudre 5, celle-ci passe essentiellement dans la zone de l'enceinte 2 entre ces fils et le substrat 1 et se charge électrostatiquement de manière négative par effet corona pour ensuite être attirée vers le substrat 1 grâce au champ électrique intense régnant dans la zone de passage de la poudre entre le substrat et les fils. Les paramètres et les conditions de travail peuvent être réglés d'une manière telle que la poudre 5 se pose avec un rendement d'application très élevé sur le substrat 1, généralement supérieur à 95 %.As already mentioned above, this powder 5 is moves in the deposit enclosure 2 up and down only under the effect of gravity. The conductive wires, forming the electrodes, are arranged in such a way that, when the powder 5 falls, it basically goes in the area of enclosure 2 between these wires and the substrate 1 and is negatively electrostatically charged by corona effect to then be attracted to substrate 1 thanks to the field intense electric prevailing in the powder passage zone between the substrate and the wires. Working parameters and conditions can be set in such a way that the powder 5 arises with a very high application yield on substrate 1, generally greater than 95%.

    Le fait que, dans une forme de réalisation préférée de l'invention, les fils conducteurs sont portés à une haute tension continue négative et que le substrat est relié à la terre permet de réduire au maximum le risque de claquage et le dépôt de poudre sur les fils.The fact that in a preferred embodiment of the invention, the conducting wires are brought to a high voltage continuous negative and that the substrate is grounded reduces maximum risk of breakdown and powder deposition on the wires.

    Idéalement, la valeur de la haute tension doit être la plus élevée possible de manière à former une décharge couronne autour des fils, mais, en pratique, cette valeur est limitée par la limite de claquage qui risque d'enflammer la poudre. Par ailleurs, une tension trop basse ne permet pas d'obtenir la décharge couronne souhaitée autour des fils et influence négativement l'efficacité du dépôt sur le substrat. Suivant l'invention, une valeur idéale et sûre du champ électrique se situe aux environs de 3500 volts par cm.Ideally, the value of the high voltage should be the most high possible so as to form a crown discharge around the wires, but in practice this value is limited by the breakdown limit which could ignite the powder. Furthermore, too low a voltage does not not achieve the desired crown discharge around the wires and negatively influences the efficiency of the deposit on the substrate. next the invention, an ideal and safe value of the electric field is located around 3500 volts per cm.

    Il a été constaté que la limite de claquage change dans de l'air lorsque celui-ci contient de la poudre. Ainsi, la poudre, à la concentration utilisée, réduit environ de moitié la tension de claquage, qui est de l'ordre de 10 kV par cm dans l'air sec. Par contre, aucune influence notable du taux d'humidité de l'air dans l'enceinte sur l'efficacité du dépôt n'a été constatée. Suivant l'invention, il est toutefois recommandé de travailler dans une atmosphère contrôlée d'air sec et frais à une température de tout au plus 20°C, afin d'éviter, d'une part, l'agglomération de la poudre et, d'autre part, toute préréaction chimique anticipée.It has been observed that the breakdown limit changes within air when it contains powder. So the powder, at the concentration used, halves the breakdown voltage, which is around 10 kV per cm in dry air. However, none notable influence of the humidity level of the air in the enclosure on the effectiveness of the deposit has not been established. According to the invention, it is however recommended to work in a controlled atmosphere of dry air and fresh at a temperature of at most 20 ° C, in order to avoid, on the one hand, agglomeration of the powder and, on the other hand, any chemical preaction anticipated.

    Les fils conducteurs doivent être situés à une certaine distance du substrat qui doit au moins être telle qu'elle permet d'éviter le contact physique entre les fils et le substrat. Cette distance ne peut pas être trop grande pour des raisons économiques et techniques, notamment pour éviter de devoir utiliser de trop hautes tensions. Une valeur possible de distance fil-substrat est environ de 5 à 12 cm. Une préférence est donnée pour une distance de l'ordre de 7 cm avec une tension de l'ordre de 25 kV.Lead wires should be located at a certain distance from the substrate which must at least be such as to avoid the physical contact between the wires and the substrate. This distance cannot be too large for economic and technical reasons, in particular to avoid having to use too high voltages. A possible value of wire-substrate distance is approximately 5 to 12 cm. A preference is given for a distance of the order of 7 cm with a voltage of the order of 25 kV.

    Le nombre de fils conducteurs est fonction du débit de la poudre 5 qui entre dans l'enceinte de dépôt 2 et qui doit être déposée sur le substrat 1. Une valeur idéale pour obtenir un rendement de dépôt supérieur à 95 %, les autres conditions étant optimales, est de l'ordre de 700 à 900 g de poudre par minute, par mètre de largeur du substrat et par fil conducteur.The number of conducting wires depends on the flow of the powder 5 which enters the deposit vessel 2 and which must be deposited on the substrate 1. An ideal value for obtaining a deposit yield greater than 95%, the other conditions being optimal, is of the order of 700 to 900 g of powder per minute, per meter of width of the substrate and by common thread.

    La distance entre les fils peut également avoir un effet sur le rendement du dépôt formé par la poudre 5 sur le substrat 1. En effet, plus les fils sont proches l'un de l'autre, moins ils se comportent de manière indépendante et moins le courant électrique total qui passe entre les fils et le substrat 1, formé par exemple par une bande continue, est élevé. Idéalement, cette distance sera aussi grande que possible. Suivant l'invention, il a été constaté qu'une distance donnant d'excellents résultats est de l'ordre de 20 cm entre deux fils consécutifs.The distance between the wires can also have an effect on the yield of the deposit formed by the powder 5 on the substrate 1. In fact, the closer the wires are to each other, the less they behave independently and minus the total passing electrical current between the wires and the substrate 1, formed for example by a strip continues, is high. Ideally, this distance will be as large as possible. According to the invention, it has been found that a distance giving excellent results is around 20 cm between two consecutive wires.

    Comme déjà mentionné ci-dessus, il est préférable que les fils conducteurs ne soient pas appliqués contre la paroi 3 de l'enceinte 2 opposée et parallèle au substrat 1. Il a, en effet, été constaté que, dans ce cas, l'efficacité de dépôt est relativement réduite. Idéalement, les fils 9 doivent être éloignés d'au moins 5 à 10 cm de cette paroi 3.As already mentioned above, it is preferable that the conductive wires are not applied against the wall 3 of the enclosure 2 opposite and parallel to the substrate 1. It has indeed been found that, in this case, the deposition efficiency is relatively reduced. Ideally, the wires 9 must be at least 5 to 10 cm away from this wall 3.

    Le diamètre des fils est également un paramètre important, puisque l'effet couronne est d'autant plus intense que le diamètre des fils est faible, par suite de l'effet de pointe. Il a été constaté que d'excellents résultats ont été obtenus avec des fils d'un diamètre d'environ 100 à 250 microns.The diameter of the wires is also a parameter important, since the crown effect is all the more intense as the wire diameter is small due to the tip effect. It was found that excellent results have been obtained with wires of a diameter about 100 to 250 microns.

    Le figure 2 concerne une deuxième forme de réalisation d'un dispositif suivant l'invention. Figure 2 relates to a second embodiment of a device according to the invention.

    Ce dispositif se distingue par rapport à celui montré à la figure 1 par le fait qu'il est prévu pour la fixation simultanée de poudre 5 sur les deux faces d'un substrat 1.This device is distinguished from that shown in the Figure 1 by the fact that it is provided for the simultaneous fixing of powder 5 on both sides of a substrate 1.

    Ainsi, dans cette deuxième forme de réalisation, l'enceinte de dépôt 2 s'étend symétriquement de part et d'autre du plan dans lequel doit défiler le substrat 1 sur lequel la poudre 5 doit être fixée. L'alimentation de la poudre a lieu de part et d'autre de ce plan et des fils conducteurs sont également prévus de chaque côté de ce plan.Thus, in this second embodiment, the enclosure deposit 2 extends symmetrically on either side of the plane in which must pass the substrate 1 on which the powder 5 must be fixed. The powder is fed on either side of this plane and the wires conductors are also provided on each side of this plane.

    Toutefois, dans certains cas où le dépôt à former sur une des faces doit être différent de celui de l'autre face, il est possible d'adapter les paramètres et les conditions de travail d'un côté de ce plan entièrement indépendants des paramètres et des conditions de travail de l'autre côté de ce plan. Ceci peut, par exemple, être le cas pour l'emplacement et le nombre des fils conducteurs et la tension appliquée.However, in certain cases where the deposit to be formed on a of the sides must be different from that of the other side, it is possible to adapt the parameters and working conditions on one side of this plan entirely independent of the parameters and conditions of work on the other side of this plan. This can, for example, be the case for location and number of wires and voltage applied.

    L'appareil 10 utilisé pour introduire la poudre par gravité dans la partie supérieure de l'enceinte peut être de nature très variée. Ce qui importe surtout est qu'il permette d'obtenir une répartition uniforme et contrôlable du débit de la poudre 5 introduite par gravité par l'ouverture d'alimentation 4 dans l'enceinte de dépôt 2. De plus, cet appareil 10 doit de préférence permettre d'adapter la largeur de l'alimentation de la poudre en fonction de la largeur du substrat à revêtir. De plus, il doit permettre de délivrer une quantité relativement importante de poudre d'une manière continue, régulière et homogène sur la largeur désirée. Le débit de la poudre peut varier de 0 g à une valeur de l'ordre de 10.000 g par minute et par mètre de largeur du substrat.The apparatus 10 used to introduce the powder by gravity in the upper part of the enclosure can be very varied in nature. What matters above all is that it makes it possible to obtain a distribution uniform and controllable flow rate of the powder 5 introduced by gravity by the feed opening 4 in the deposit enclosure 2. In addition, this device 10 should preferably make it possible to adapt the width of feeding the powder as a function of the width of the substrate to be coated. In addition, it must make it possible to deliver a relatively large quantity powder in a continuous, regular and homogeneous way across the width desired. The powder flow can vary from 0 g to a value of the order 10,000 g per minute and per meter of width of the substrate.

    Il peut également être important que cet appareil 10 permette de régler le débit de la poudre linéairement.It may also be important that this device 10 allows to regulate the powder flow linearly.

    Un appareil d'alimentation 10 répondant à ces exigences a été représenté schématiquement par la figure 3. Il s'agit d'une sorte de saupoudreuse qui est montée directement au-dessus de l'ouverture d'alimentation 4 de l'enceinte de dépôt 2.A supply apparatus 10 meeting these requirements has was shown schematically in Figure 3. It is a kind of sprinkler that is mounted directly above the opening supply 4 of the storage enclosure 2.

    Cet appareil comprend une trémie d'alimentation 11 montée au-dessus d'un cylindre 12 pouvant tourner, à une vitesse réglable, autour d'un axe horizontal 13 dans la sens de la flèche 14. La surface du cylindre 12 est revêtue de picots métalliques 15, de manière à permettre, lors de la rotation du cylindre 12 autour de son axe 13, d'entraíner, par l'ouverture inférieure 16 de la trémie 11, une quantité dosée de poudre, contenue dans la trémie, sur la surface cylindrique du cylindre 12 dans le sens de la flèche 14.This device includes a mounted feed hopper 11 above a cylinder 12 which can rotate, at an adjustable speed, around a horizontal axis 13 in the direction of arrow 14. The surface of the cylinder 12 is coated with metal studs 15, so as to allow, during the rotation of the cylinder 12 about its axis 13, to cause, by the lower opening 16 of the hopper 11, a metered quantity of powder, contained in the hopper, on the cylindrical surface of cylinder 12 in the direction of the arrow 14.

    Une brosse rotative 17 pouvant tourner à une vitesse réglable autour d'un axe horizontal 18 dans le sens de la flèche 19 est appliquée contre cette surface cylindrique, du côté de la trémie 11 où la poudre 5 est enlevée de cette dernière par les picots 15 sur cette surface cylindrique et est appliquée contre ladite surface pour permettre d'en détacher la poudre, de briser d'éventuels agglomérats et de projeter la poudre vers le bas.A rotary brush 17 which can rotate at a speed adjustable around a horizontal axis 18 in the direction of arrow 19 is applied against this cylindrical surface, on the side of the hopper 11 where the powder 5 is removed from the latter by the pins 15 on this cylindrical surface and is applied against said surface to allow detach the powder, break up any agglomerates and spray the powder down.

    L'axe de rotation 18 de cette brosse 17 est de préférence situé sensiblement au même niveau que l'axe 13 du cylindre 12 et sa vitesse de rotation est généralement réglable de manière continue entre 0 et 4500 tours/minute. De plus, cette brosse 17 comprend des picots métalliques 20 relativement rigides, par exemple en acier, d'une longueur comprise entre 1 et 2 cm, et la distance par rapport à l'axe 13 du cylindre 12 est telle que l'extrémité des picots 20 est juste en contact avec la surface de celui-ci, au moment où ces derniers passent dans le plan défini par les axes de rotation 13 et 18.The axis of rotation 18 of this brush 17 is preferably located substantially at the same level as the axis 13 of the cylinder 12 and its rotation speed is generally continuously adjustable between 0 and 4500 rpm. In addition, this brush 17 includes pins relatively rigid metals, for example steel, of a length between 1 and 2 cm, and the distance from the axis 13 of cylinder 12 is such that the end of the pins 20 is just in contact with the surface of it, as these pass into the plane defined by the axes of rotation 13 and 18.

    La largeur d'alimentation de la poudre sur la surface du cylindre 12 peut être réglée par le positionnement de deux joues, non représentées, situées dans la trémie 11 et parallèles aux parois transversales de cette dernière. Ainsi, une largeur de plus de 2 m est facilement envisageable.The width of the powder feed on the surface of the cylinder 12 can be adjusted by positioning two cheeks, not shown, located in the hopper 11 and parallel to the walls transverse of the latter. Thus, a width of more than 2 m is easily conceivable.

    Le débit de la poudre est réglable linéairement en jouant uniquement sur la vitesse de rotation du cylindre 12 autour de son axe 13.The powder flow is linearly adjustable by playing only on the speed of rotation of the cylinder 12 around its axis 13.

    L'avantage de cet appareil d'alimentation 10 est triple :

  • 1) il permet de délivrer une quantité importante de poudre de manière continue, régulière et homogène à travers l'ouverture d'alimentation 4 et ceci sur toute la largeur du substrat 1 défilant dans l'enceinte de dépôt 2;
  • 2) la quantité de poudre délivrée est proportionnelle à la vitesse de rotation du cylindre 12 qui peut être asservie à la vitesse de ligne de l'installation entière ;
  • 3) le principe de fonctionnement de cet appareil 10 est extrêmement simple et ne nécessite qu'un paramètre de réglage, à savoir la vitesse de rotation du cylindre 13.
  • The advantage of this supply device 10 is threefold:
  • 1) it makes it possible to deliver a large quantity of powder in a continuous, regular and homogeneous manner through the feed opening 4 and this over the entire width of the substrate 1 passing through the deposition enclosure 2;
  • 2) the quantity of powder delivered is proportional to the speed of rotation of the cylinder 12 which can be controlled by the line speed of the entire installation;
  • 3) the operating principle of this device 10 is extremely simple and requires only one adjustment parameter, namely the speed of rotation of the cylinder 13.
  • Après la fixation de la poudre 5 sur le substrat 1, celui-ci peut éventuellement être chauffé de manière à soumettre cette poudre à une fusion au moins partielle permettant de former un revêtement sensiblement uniforme et durable sur ce substrat. Ce chauffage peut être prévu directement à l'endroit où le substrat sort de l'enceinte de dépôt.After fixing the powder 5 on the substrate 1, the latter can optionally be heated so as to subject this powder to at least partial melting to form a coating substantially uniform and durable on this substrate. This heating can be provided directly at the place where the substrate leaves the deposit enclosure.

    Dans le cas où le substrat présente une face à revêtir constituée d'une matière conductrice de l'électricité, telle qu'une tôle d'acier, celle-ci peut avantageusement être soumise à une cuisson par induction après la fixation de la poudre sur le substrat.In the case where the substrate has a face to be coated made of an electrically conductive material, such as a sheet metal steel, it can advantageously be subjected to firing by induction after fixing the powder on the substrate.

    Ce chauffage subséquent est avantageusement réalisé pendant que le substrat se déplace verticalement, de la même façon donc que lors de l'application de la poudre et ceci afin de réduire la surface au sol, de positionner précisément le substrat 1 entre les spires de l'inducteur, non représenté aux figures, et d'éviter la nécessité d'utiliser des cylindres supports intermédiaires.This subsequent heating is advantageously carried out as the substrate moves vertically, in the same way so that when applying the powder and this in order to reduce the surface on the ground, to precisely position the substrate 1 between the turns of the inductor, not shown in the figures, and avoid the need use intermediate support cylinders.

    De tels moyens de chauffage n'ont pas été représentés aux figures, étant donné qu'il s'agit d'une technique connue en soi.Such heating means have not been shown in the figures, since it is a technique known per se.

    L'objet de l'invention est illustré davantage par quelques exemples concrets d'application d'une peinture en poudre sur un substrat formé par une bande d'acier dans un dispositif du type tel que montré aux figures annexées.The object of the invention is further illustrated by a few concrete examples of applying a powder paint on a substrate formed by a steel strip in a device of the type such as shown in the accompanying figures.

    ExemplesExamples Exemple 1Example 1

    • application verticale sur une face ; la bande défile de bas en haut.vertical application on one side; the strip scrolls from bottom to top.
    • poudre : polyester-TGIC de répartition granulométrique comprise entre 1 et 150 µ avec un maximum de la courbe à 50 µ.powder: polyester-TGIC with particle size distribution included between 1 and 150 µ with a maximum of the curve at 50 µ.
    • vitesse de ligne : 30 m/min.line speed: 30 m / min.
    • débit de poudre : 5280 g/min * m de largepowder flow: 5280 g / min * m wide
    • 6 fils de cuivre de 100 µm de diamètre espacés de 20 cm et placés à 7 cm de la tôle6 copper wires of 100 µm in diameter spaced 20 cm apart and placed at 7 cm from the sheet
    • tension appliquée = 25 kVapplied voltage = 25 kV
    • épaisseur moyenne mesurée après cuisson : 80 µ (avec un Δ de 5 % maximum sur la largeur)average thickness measured after baking: 80 µ (with an Δ of 5% maximum across the width)
    Exemple 2Example 2

    • application verticale sur une face ; la bande défile de bas en hautvertical application on one side; the strip scrolls from bottom to top
    • poudre : polyester-TGIC de répartition granulométrique comprise entre 1 et 150 µ avec un maximum de la courbe à 50 µpowder: polyester-TGIC with particle size distribution included between 1 and 150 µ with a maximum of the curve at 50 µ
    • vitesse de ligne : 50 m/minline speed: 50 m / min
    • débit de poudre : 8800 g/min * m de largepowder flow: 8800 g / min * m wide
    • 12 fils de cuivre de 100 µm de diamètre espacés de 20 cm et placés à 7 cm de la tôle12 copper wires of 100 µm diameter spaced 20 cm apart and placed at 7 cm from the sheet
    • tension appliquée = 25 kV applied voltage = 25 kV
    • épaisseur moyenne mesurée après cuisson : 78 µ (avec un Δ de 5 % maximum sur la largeur)average thickness measured after baking: 78 µ (with an Δ of 5% maximum across the width)
    Exemple 3Example 3

    • application verticale sur une face ; la bande défile de bas en hautvertical application on one side; the strip scrolls from bottom to top
    • poudre : polyester-TGIC de répartition granulométrique comprise entre 1 et 150 µ avec un maximum de la courbe à 50 µpowder: polyester-TGIC with particle size distribution included between 1 and 150 µ with a maximum of the curve at 50 µ
    • vitesse de ligne: 70 m/minline speed: 70 m / min
    • débit de poudre : 8800 g/min * m de largepowder flow: 8800 g / min * m wide
    • 12 fils de cuivre de 100 µm de diamètre espacés de 20 cm et placés à 7 cm de la tôle12 copper wires of 100 µm diameter spaced 20 cm apart and placed at 7 cm from the sheet
    • tension appliquée = 25 kVapplied voltage = 25 kV
    • épaisseur mesurée après cuisson : 58 µ (avec un Δ de 5 % maximum sur la largeur)thickness measured after firing: 58 µ (with a Δ of 5% maximum across the width)
    Exemple 4Example 4

    • application verticale sur une face ; la bande défile de bas en hautvertical application on one side; the strip scrolls from bottom to top
    • poudre : polyester-TGIC de répartition granulométrique comprise entre 1 et 150 µ avec un maximum de la courbe à 50 µpowder: polyester-TGIC with particle size distribution included between 1 and 150 µ with a maximum of the curve at 50 µ
    • vitesse de ligne : 30 m/minline speed: 30 m / min
    • débit de poudre : 5280 g/min * m de largepowder flow: 5280 g / min * m wide
    • 6 fils de cuivre de 1 mm de diamètre espacés de 5 cm et placés à 7 cm de la tôle6 copper wires of 1 mm in diameter spaced 5 cm apart and placed at 7 cm from the sheet
    • tension appliquée = 22 kVapplied voltage = 22 kV
    • épaisseur mesurée après cuisson : 45 µ (avec un Δ de 5 % maximum sur la largeur).thickness measured after baking: 45 µ (with a Δ of 5% maximum across the width).

    Il est bien entendu que l'invention n'est pas limitée aux formes de réalisation décrites ci-dessus, mais que bien des variantes peuvent être envisagées sans sortir du cadre de l'invention.It is understood that the invention is not limited to embodiments described above, but many variations can be envisaged without departing from the scope of the invention.

    Ainsi, l'invention n'est pas limitée à l'utilisation d'un système déterminé d'alimentation de la poudre. La seule exigence est que cette poudre puisse se déplacer sensiblement par gravité à travers l'enceinte de dépôt, et ceci d'une manière continue et homogène à un débit relativement important.Thus, the invention is not limited to the use of a specific powder supply system. The only requirement is that this powder can move substantially by gravity through the depository, and this in a continuous and homogeneous manner at a relatively high throughput.

    Il n'est toutefois pas exclu qu'une légère aspiration pourrait être réalisée par le fond de l'enceinte pour contrôler quelque peu le mouvement de descente de cette poudre. Ceci pourrait par exemple être le cas pour des poudres très légères, mais il y a toutefois lieu de noter que la gravité constituera toujours le paramètre essentiel pour le déplacement de la poudre.It is however not excluded that a slight aspiration could be carried out by the bottom of the enclosure to somewhat control the downward movement of this powder. This could for example be the case for very light powders, but it should however be noted that gravity will always be the essential parameter for the displacement of the powder.

    Par ailleurs, le procédé suivant l'invention est non seulement applicable sur un substrat métallique, tel que de l'acier, de l'acier revêtu ou de l'aluminium par exemple, mais également sur un substrat rendu conducteur d'électricité, tel que du papier, du carton, de la matière plastique, du textile, etc., recouvert par exemple d'un film conducteur.Furthermore, the method according to the invention is not only applicable on a metallic substrate, such as steel, coated steel or aluminum for example, but also on a substrate made electrically conductive, such as paper, cardboard, plastic, textiles, etc., for example covered with a film driver.

    Claims (20)

    1. Method of continuously applying a powdered substance (5), in particular a powdered paint, to an oblong substrate (1) which is electrically conductive or has been rendered electrically conductive, having two faces, preferably in the form of a c ontinuous strip, which consists in
         feeding the substrate (1) substantially vertically in its lengthwise direction through a deposition enclosure (2),
         introducing the powder into the enclosure in a substantially continuous manner, and
         creating an electric field in the enclosure by means of electrodes (9), enabling this powder to be applied to the substrate,
      characterised in that it further consists in
         creating at least one electric field between at least one electrode (9) and coating the face or faces of the substrate to be coated,
         feeding in the powder (5) from a top part of the deposition enclosure,
         allowing a uniform stream of powder particles to flow by gravity along the face or faces of the substrate to be coated, between the latter and said at least one electrode (9), and
         electrostatically charging the powder particles during said flow, attracting them onto the corresponding face of the substrate (1) to be coated due to said at least one electric field created.
    2. Method as claimed in claim 1, character ised in that an enclosure (2) is used which has walls (3) made from or internally lined with an electrical insulating material, preferably a transparent plastics material.
    3. Method as claimed in either of claims 1 and 2, characterised in that the electric field inside the deposition enclosure (2) is created by means of electrodes (9) to which a continuous high voltage is applied, preferably negative relative to the substrate (1), the latter preferably being connected to ground.
    4. Method as claimed in any one of claims 1 to 3, characterised in that the electric field is created in the deposition enclosure (2) by means of a series of conductor wires extending at a certain distance apart, one above the other, facing at least one of the faces of the substrate, spaced apart from the walls (3) of the enclosure opposite these faces, and transversely relative to the feed direction of the substrate.
    5. Method as claimed in any one of claims 1 to 4, characterised in that the powder in the deposition enclosure (2) is electrostatically charged in a negative manner by a corona effect so that it is subsequently attracted to the substrate due to the presence of the electric field.
    6. Method as claimed in any one of claims 1 to 5, characterised in that an electric field in the order of 3,500 Volts per cm is created in the deposition enclosure (2).
    7. Method as claimed in any one of claims 1 to 6, characterised in that the powder is introduced into the deposition enclosure (2) at a rate of up to 10,000 g per minute and p er metre of width of the substrate to be treated.
    8. Method as claimed in claim 7, characterised in that the flow rate of the powder in the deposition enclosure (2) is regulated between 700 and 900 grams per minute, per metre of width of the substrate and per conductor wire.
    9. Method as claimed in any one of claims 1 to 8, characterised in that, after fixing the powder (5) on the substrate (1), the latter is heated, causing this powder to fuse, at least partially, enabling a substantially uniform coating to form on the substrate.
    10. Method as claimed in claim 9, characterised in that, if the substrate (1) has a face to be coated that is made from an electrically conductive material, it is heated by induction after fixing the powder on this face.
    11. Method as claimed in either of claims 9 and 10, characterised in that said heating is effected immediately at the outlet from the deposition enclosure (2) as the substrate is vertically displaced.
    12. Device for continuously applying a powdered substance (5), in particular a powdered paint, to an oblong substrate (1) that is electrically conductive or has been rendered electrically conductive, having two faces, preferably in the form of a continuous strip, comprising
         a deposition enclosure (2) with an openi ng at its top part (4) and at its bottom part (6) through which said substrate (1) is fed in this enclosure (2),
         a supply apparatus (10) enabling said powder (5) to be introduced into this deposition enclosure (2) in a substantially continuous manner as the substrate (1) is fed through and
         means for creating at least one electric field in this enclosure (2), enabling this powder (5) to be applied to at least one of the faces of the substrate (1),
      characterised in that the enclosure has a feed inlet opening (4) for the powder (5) at its top part, enabling the latter to be introduced into this enclosure,
      and in that said means for creating at least one electric field comprise at least one electrode and the face or faces of the substrate to be coated, between which a stream of particles of said introduced powder flows by gravity, along said at least one face of the substrate to be coated, the powder particles thus being electrostatically charged due to said at least one created electric field and attracted onto the corresponding face of the substrate to be coated.
    13. Device as claimed in claim 12, characterised in that the walls of the enclosure (2) are made from an electrical insulating material, preferably a transparent plastics material.
    14. Device as claimed in either of claims 12 and 13, characterised in that the enclosure (2) has, along its walls facing the plane along which the substrate (1) can be fed through the enclosure (2), at least one electrode (9), to which a continuous high voltage can be appli ed relative to this substrate (1).
    15. Device as claimed in claim 14, characterised in that the enclosure (2) contains a series of successive electrodes (9) distributed across the height of the enclosure (2) facing the plane in which the substrate (1) can be fed through the latter.
    16. Device as claimed in claim 15, characterised in that said electrodes (9) consist of a series of conductor wires extending at a certain distance apart from one another in the plane along which the substrate can be fed through the enclosure, these wires being spaced apart from the walls of the enclosure (2) opposite this plane, leaving a passage for the powder so that it can be displaced by gravity through this enclosure.
    17. Device as claimed in any one of claims 12 to 16, characterised in that means (8') are provided in order to recycle any powder which has not been applied to the substrate (1) and collects at the bottom of the enclosure.
    18. Device as claimed in claim 17, characterised in that the conductor wires have a di ameter of 100 to 250 microns.
    19. Device as claimed in any one of claims 12 to 18, characterised in that the supply apparatus (10) comprises a hopper (11) mounted above a cylinder (12) capable of rotating about a substantially horizontal axis (13) and having an opening (16) at its base, against which the surface of the cylinder (12) is disposed, this surface being provided with driving members (15), such as metal pins, so that a metered quantity of powder (5) can be drawn out of the hopper (11) when the cylinder (12) is rotated about its axis (13), through said opening (16) and onto the cylindrical surface of the cylinder (12), a rotary brush (17) being provided in order to lift the powder off said cylindrical surface in a continuous manner.
    20. Device as claimed in claim 19, characterised in that the axis of rotation (18) of the brush (17) is located substantially on a level with the axis of rotation (13) of the cylinder (12), this brush (17) having relatively rigid pins (20) extending as far as the surface of the cylinder (12) at the instant at which they are disposed substantially in the plane coinciding with the axes of rotation (13) and (18).
    EP98870128A 1998-05-14 1998-06-05 Method and apparatus for continuous electrostatic application of a powder substance to a substrate Expired - Lifetime EP0956909B1 (en)

    Applications Claiming Priority (2)

    Application Number Priority Date Filing Date Title
    BE9800367A BE1011917A6 (en) 1998-05-14 1998-05-14 Method and device for the continuous application electrostatic powder of substance to a substrate.
    BE9800367 1998-05-14

    Publications (2)

    Publication Number Publication Date
    EP0956909A1 EP0956909A1 (en) 1999-11-17
    EP0956909B1 true EP0956909B1 (en) 2003-03-05

    Family

    ID=3891248

    Family Applications (1)

    Application Number Title Priority Date Filing Date
    EP98870128A Expired - Lifetime EP0956909B1 (en) 1998-05-14 1998-06-05 Method and apparatus for continuous electrostatic application of a powder substance to a substrate

    Country Status (5)

    Country Link
    EP (1) EP0956909B1 (en)
    AT (1) ATE233609T1 (en)
    BE (1) BE1011917A6 (en)
    DE (1) DE69811858T2 (en)
    ES (1) ES2193506T3 (en)

    Families Citing this family (5)

    * Cited by examiner, † Cited by third party
    Publication number Priority date Publication date Assignee Title
    US4954669A (en) 1989-01-25 1990-09-04 W. L. Gore & Associates, Inc. Coaxial cable connector assembly
    BE1013690A3 (en) * 2000-09-19 2002-06-04 Cockerill Rech & Dev Application device coating powder electrostatic.
    DE602005010817D1 (en) 2005-02-10 2008-12-18 Dmsys Plant and method for continuous, electrostatic coating of substrates with powder
    FI125920B (en) * 2013-09-09 2016-04-15 Beneq Oy Method of coating substrates
    WO2024182808A1 (en) * 2023-03-02 2024-09-06 AM Batteries, Inc. Electrostatic coating system

    Family Cites Families (9)

    * Cited by examiner, † Cited by third party
    Publication number Priority date Publication date Assignee Title
    GB1075946A (en) * 1963-07-17 1967-07-19 Jan Gunnar Myhre Apparatus for coating strips of metal or the like with plastics material
    US3857362A (en) * 1972-05-23 1974-12-31 D Brooks Metal powder coating apparatus
    US3916826A (en) * 1973-09-18 1975-11-04 Electrostatic Equip Corp Electrostatic coating apparatus
    US4084019A (en) * 1976-02-05 1978-04-11 Armco Steel Corporation Electrostatic coating grid and method
    US4188413A (en) * 1976-10-18 1980-02-12 General Electric Company Electrostatic-fluidized bed coating of wire
    US4243696A (en) * 1979-01-22 1981-01-06 W. S. Rockwell Company Method of making a particle-containing plastic coating
    US4795339A (en) * 1985-09-09 1989-01-03 Terronics Development Corp. Method and apparatus for depositing nonconductive material onto conductive filaments
    US5279863A (en) * 1989-10-10 1994-01-18 David A. Lundy Electrostatic powder coating apparatus and method
    WO1995032809A1 (en) * 1994-05-26 1995-12-07 Electrostatic Technology, Inc. Vertical electrostatic coater having vortex effect

    Also Published As

    Publication number Publication date
    ES2193506T3 (en) 2003-11-01
    DE69811858D1 (en) 2003-04-10
    ATE233609T1 (en) 2003-03-15
    EP0956909A1 (en) 1999-11-17
    BE1011917A6 (en) 2000-03-07
    DE69811858T2 (en) 2004-03-04

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