EP0803755A3 - Projection optical system and exposure apparatus with the same - Google Patents

Projection optical system and exposure apparatus with the same Download PDF

Info

Publication number
EP0803755A3
EP0803755A3 EP96108775A EP96108775A EP0803755A3 EP 0803755 A3 EP0803755 A3 EP 0803755A3 EP 96108775 A EP96108775 A EP 96108775A EP 96108775 A EP96108775 A EP 96108775A EP 0803755 A3 EP0803755 A3 EP 0803755A3
Authority
EP
European Patent Office
Prior art keywords
optical system
projection optical
exposure apparatus
same
aberration
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP96108775A
Other languages
German (de)
French (fr)
Other versions
EP0803755B1 (en
EP0803755A2 (en
Inventor
Hitoshi c/o Nikon Corporation Matsuzawa
Yutaka c/o Nikon Corporation Suenaga
Misako c/o Nikon Corporation Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=14414829&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=EP0803755(A3) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Nikon Corp, Nippon Kogaku KK filed Critical Nikon Corp
Publication of EP0803755A2 publication Critical patent/EP0803755A2/en
Publication of EP0803755A3 publication Critical patent/EP0803755A3/en
Application granted granted Critical
Publication of EP0803755B1 publication Critical patent/EP0803755B1/en
Anticipated expiration legal-status Critical
Revoked legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/22—Telecentric objectives or lens systems

Abstract

The present invention relates to a both-side telecentric projection optical system and an exposure apparatus equipped with this projection optical system. In particular, the projection optical system has a structure for quite favorably correcting various kinds of aberration such as distortion in particular, while securing a relatively broad exposure area and a large numerical aperture.
EP96108775A 1996-04-25 1996-05-31 Projection optical system and exposure apparatus with the same Revoked EP0803755B1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP10570796 1996-04-25
JP10570796A JP3750123B2 (en) 1996-04-25 1996-04-25 Projection optical system
JP105707/96 1996-04-25

Publications (3)

Publication Number Publication Date
EP0803755A2 EP0803755A2 (en) 1997-10-29
EP0803755A3 true EP0803755A3 (en) 2000-03-08
EP0803755B1 EP0803755B1 (en) 2003-07-30

Family

ID=14414829

Family Applications (1)

Application Number Title Priority Date Filing Date
EP96108775A Revoked EP0803755B1 (en) 1996-04-25 1996-05-31 Projection optical system and exposure apparatus with the same

Country Status (5)

Country Link
US (1) US5781278A (en)
EP (1) EP0803755B1 (en)
JP (1) JP3750123B2 (en)
KR (1) KR100446130B1 (en)
DE (1) DE69629277T2 (en)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3500745B2 (en) * 1994-12-14 2004-02-23 株式会社ニコン Projection optical system, projection exposure apparatus, and projection exposure method
USRE38465E1 (en) 1994-12-14 2004-03-16 Nikon Corporation Exposure apparatus
JPH116957A (en) * 1997-04-25 1999-01-12 Nikon Corp Projection optical system, projection exposure system and projection exposure method
JP3925576B2 (en) 1997-07-24 2007-06-06 株式会社ニコン Projection optical system, exposure apparatus including the optical system, and device manufacturing method using the apparatus
JPH1195095A (en) 1997-09-22 1999-04-09 Nikon Corp Projection optical system
JPH11214293A (en) 1998-01-22 1999-08-06 Nikon Corp Projection optical system and aligner therewith, and device manufacture
US6700645B1 (en) 1998-01-22 2004-03-02 Nikon Corporation Projection optical system and exposure apparatus and method
US6198576B1 (en) * 1998-07-16 2001-03-06 Nikon Corporation Projection optical system and exposure apparatus
DE19855157A1 (en) 1998-11-30 2000-05-31 Zeiss Carl Fa Projection lens
WO2000033138A1 (en) * 1998-11-30 2000-06-08 Carl Zeiss Large-apertured projection lens with minimal diaphragm error
DE19855108A1 (en) 1998-11-30 2000-05-31 Zeiss Carl Fa Microlithographic reduction lens, projection exposure system and method
DE19901756B4 (en) * 1999-01-18 2004-02-05 Siemens Ag Method for operating a device terminating a subscriber line on the subscriber or exchange side in a data transmission network
JP2001051193A (en) * 1999-06-03 2001-02-23 Nikon Corp Projection optical system projection exposing device provided with the system and manufacture of device
US6600550B1 (en) * 1999-06-03 2003-07-29 Nikon Corporation Exposure apparatus, a photolithography method, and a device manufactured by the same
EP1139138A4 (en) 1999-09-29 2006-03-08 Nikon Corp Projection exposure method and apparatus and projection optical system
WO2001023933A1 (en) * 1999-09-29 2001-04-05 Nikon Corporation Projection optical system
KR100866818B1 (en) * 2000-12-11 2008-11-04 가부시키가이샤 니콘 Projection optical system and exposure apparatus comprising the same
DE10064685A1 (en) * 2000-12-22 2002-07-04 Zeiss Carl Lithography lens with a first lens group consisting exclusively of lenses with positive refractive power
JP2002244034A (en) 2001-02-21 2002-08-28 Nikon Corp Projection optical system and exposure device provided with it
JP2002323652A (en) 2001-02-23 2002-11-08 Nikon Corp Projection optical system, projection exposure apparatus provided with the same, and projection exposure method
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US20080151365A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
KR20170129271A (en) 2004-05-17 2017-11-24 칼 짜이스 에스엠티 게엠베하 Catadioptric projection objective with intermediate images
US7511798B2 (en) 2004-07-30 2009-03-31 Asml Holding N.V. Off-axis catadioptric projection optical system for lithography
US20080019574A1 (en) * 2006-07-20 2008-01-24 Anthony Scalise Machine-controlled image cropping with default
KR101407076B1 (en) 2012-05-24 2014-06-13 주식회사 비엘시스템 exposure apparatus for lithography printer using near-infrared ray
CN116736494B (en) * 2023-08-14 2023-11-03 武汉高明兰光电科技有限公司 Low-light night vision lens

Citations (4)

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Publication number Priority date Publication date Assignee Title
JPS63118115A (en) * 1986-11-06 1988-05-23 Sigma:Kk Projection lens
JPH0442208A (en) * 1990-06-08 1992-02-12 Dainippon Screen Mfg Co Ltd Telecentric projection lens
JPH04157412A (en) * 1990-10-22 1992-05-29 Olympus Optical Co Ltd Projector lens system
JPH05173065A (en) * 1991-10-24 1993-07-13 Olympus Optical Co Ltd Reduction projection lens

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US354961A (en) † 1886-12-28 Michael hoffman wilson
US3391974A (en) † 1965-01-15 1968-07-09 Bausch & Lomb Progressively powered singlets for aplanatic optical objective for spherical interferometers
US3897138A (en) † 1971-11-24 1975-07-29 Canon Kk Projection lens for mask pattern printing
US3737215A (en) † 1972-04-06 1973-06-05 Eastman Kodak Co Six element unit magnification lens
JPS5336326B2 (en) † 1972-12-26 1978-10-02
JPS5416410B2 (en) † 1974-03-07 1979-06-22
JPS5820402B2 (en) † 1975-10-14 1983-04-22 オリンパス光学工業株式会社 All-purpose lens
JPS58147708A (en) † 1982-02-26 1983-09-02 Nippon Kogaku Kk <Nikon> Optical device for illumination
JPS59149312A (en) * 1983-02-16 1984-08-27 Asahi Optical Co Ltd Photographic lens of high aperture ratio
US4666273A (en) † 1983-10-05 1987-05-19 Nippon Kogaku K. K. Automatic magnification correcting system in a projection optical apparatus
GB2153543B (en) † 1983-12-28 1988-09-01 Canon Kk A projection exposure apparatus
US4811055A (en) † 1984-02-27 1989-03-07 Canon Kabushiki Kaisha Projection exposure apparatus
JPS60188917A (en) * 1984-03-07 1985-09-26 Asahi Optical Co Ltd Lens system for photographing short distance
US4772107A (en) † 1986-11-05 1988-09-20 The Perkin-Elmer Corporation Wide angle lens with improved flat field characteristics
US4770477A (en) † 1986-12-04 1988-09-13 The Perkin-Elmer Corporation Lens usable in the ultraviolet
US5105075A (en) † 1988-09-19 1992-04-14 Canon Kabushiki Kaisha Projection exposure apparatus
US5253110A (en) † 1988-12-22 1993-10-12 Nikon Corporation Illumination optical arrangement
SU1659955A1 (en) † 1989-07-31 1991-06-30 Конструкторское бюро точного электронного машиностроения 1,5 magnification projection objective
JPH03288112A (en) † 1990-04-04 1991-12-18 Dainippon Screen Mfg Co Ltd Achromatic lens system
JP3126028B2 (en) † 1990-07-06 2001-01-22 オリンパス光学工業株式会社 High magnification objective lens
US5052763A (en) † 1990-08-28 1991-10-01 International Business Machines Corporation Optical system with two subsystems separately correcting odd aberrations and together correcting even aberrations
JP3353902B2 (en) † 1990-12-12 2002-12-09 オリンパス光学工業株式会社 Projection lens system
US5172275A (en) † 1990-12-14 1992-12-15 Eastman Kodak Company Apochromatic relay lens systems suitable for use in a high definition telecine apparatus
JP2830492B2 (en) † 1991-03-06 1998-12-02 株式会社ニコン Projection exposure apparatus and projection exposure method
US5097291A (en) † 1991-04-22 1992-03-17 Nikon Corporation Energy amount control device
JPH04369209A (en) † 1991-06-17 1992-12-22 Nikon Corp Illumination apparatus for exposure use
EP0554440B1 (en) † 1991-08-23 1997-11-12 Eastman Kodak Company High aperture lens system and printer using the lens system
US5572364A (en) * 1991-09-13 1996-11-05 Mitsubishi Denki Kabushiki Kaisha Projection lens system
US5333035A (en) † 1992-05-15 1994-07-26 Nikon Corporation Exposing method
JPH06300965A (en) * 1993-04-13 1994-10-28 Nikon Corp Wide-angle lens
US5589988A (en) * 1993-04-26 1996-12-31 Nikon Corporation Retrofocus-type wide angle lens system having a fixed front lens group and a movable rear lens group
JPH06313845A (en) † 1993-04-28 1994-11-08 Olympus Optical Co Ltd Projection lens system
JP3255490B2 (en) * 1993-06-08 2002-02-12 富士写真光機株式会社 Retrofocus large aperture lens
US5557472A (en) * 1993-06-16 1996-09-17 Asahi Kogaku Kogyo Kabushiki Kaisha Fast aspherical lens system
US5404247A (en) * 1993-08-02 1995-04-04 International Business Machines Corporation Telecentric and achromatic f-theta scan lens system and method of use
JP3360387B2 (en) † 1993-11-15 2002-12-24 株式会社ニコン Projection optical system and projection exposure apparatus
JP3396935B2 (en) † 1993-11-15 2003-04-14 株式会社ニコン Projection optical system and projection exposure apparatus
JPH08179204A (en) † 1994-11-10 1996-07-12 Nikon Corp Projection optical system and projection aligner
JP3500745B2 (en) † 1994-12-14 2004-02-23 株式会社ニコン Projection optical system, projection exposure apparatus, and projection exposure method
JP3624973B2 (en) † 1995-10-12 2005-03-02 株式会社ニコン Projection optical system

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63118115A (en) * 1986-11-06 1988-05-23 Sigma:Kk Projection lens
JPH0442208A (en) * 1990-06-08 1992-02-12 Dainippon Screen Mfg Co Ltd Telecentric projection lens
JPH04157412A (en) * 1990-10-22 1992-05-29 Olympus Optical Co Ltd Projector lens system
US5260832A (en) * 1990-10-22 1993-11-09 Olympus Optical Co., Ltd. Projection lens system
JPH05173065A (en) * 1991-10-24 1993-07-13 Olympus Optical Co Ltd Reduction projection lens

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 012, no. 366 (P - 765) 30 September 1988 (1988-09-30) *
PATENT ABSTRACTS OF JAPAN vol. 016, no. 218 (P - 1357) 21 May 1992 (1992-05-21) *
PATENT ABSTRACTS OF JAPAN vol. 016, no. 448 (P - 1423) 17 September 1992 (1992-09-17) *
PATENT ABSTRACTS OF JAPAN vol. 017, no. 586 (P - 1633) 26 October 1993 (1993-10-26) *

Also Published As

Publication number Publication date
EP0803755B1 (en) 2003-07-30
JP3750123B2 (en) 2006-03-01
JPH09292568A (en) 1997-11-11
EP0803755A2 (en) 1997-10-29
US5781278A (en) 1998-07-14
KR970071147A (en) 1997-11-07
KR100446130B1 (en) 2005-07-04
DE69629277D1 (en) 2003-09-04
DE69629277T2 (en) 2004-05-13

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