EP0596924A1 - Continuous vacuum arc broad beam ion source - Google Patents
Continuous vacuum arc broad beam ion sourceInfo
- Publication number
- EP0596924A1 EP0596924A1 EP92915546A EP92915546A EP0596924A1 EP 0596924 A1 EP0596924 A1 EP 0596924A1 EP 92915546 A EP92915546 A EP 92915546A EP 92915546 A EP92915546 A EP 92915546A EP 0596924 A1 EP0596924 A1 EP 0596924A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- cathode
- anode
- ion
- vacuum arc
- ion source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/08—Ion sources; Ion guns using arc discharge
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/48—Ion implantation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/08—Ion sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/31701—Ion implantation
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US872971 | 1978-02-28 | ||
US72856691A | 1991-07-11 | 1991-07-11 | |
US728566 | 1991-07-11 | ||
US87297192A | 1992-04-23 | 1992-04-23 | |
PCT/US1992/005399 WO1993001327A1 (en) | 1991-07-11 | 1992-06-25 | Continuous vacuum arc broad beam ion source |
Publications (1)
Publication Number | Publication Date |
---|---|
EP0596924A1 true EP0596924A1 (en) | 1994-05-18 |
Family
ID=27111712
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP92915546A Withdrawn EP0596924A1 (en) | 1991-07-11 | 1992-06-25 | Continuous vacuum arc broad beam ion source |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP0596924A1 (ja) |
JP (1) | JPH06508887A (ja) |
WO (1) | WO1993001327A1 (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07155618A (ja) * | 1993-12-06 | 1995-06-20 | Hitachi Ltd | 担持金属触媒、及びその製造方法 |
DE29505888U1 (de) * | 1995-04-05 | 1995-05-24 | Ardenne Anlagentech Gmbh | Vorrichtung zum Zünden eines Vakuumlichtbogens |
DE19621874C2 (de) * | 1996-05-31 | 2000-10-12 | Karlsruhe Forschzent | Quelle zur Erzeugung von großflächigen, gepulsten Ionen- und Elektronenstrahlen |
RU2685893C1 (ru) * | 2018-05-08 | 2019-04-23 | федеральное государственное бюджетное образовательное учреждение высшего образования "Уфимский государственный авиационный технический университет" | Способ упрочнения лопаток блиска из легированных сталей |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3555332A (en) * | 1967-10-25 | 1971-01-12 | Perkin Elmer Corp | Apparatus for producing a high energy beam of selected metallic ions |
SU953004A1 (ru) * | 1980-12-12 | 1982-08-23 | Предприятие П/Я А-1614 | Электродуговой испаритель металлов |
US4929322A (en) * | 1985-09-30 | 1990-05-29 | Union Carbide Corporation | Apparatus and process for arc vapor depositing a coating in an evacuated chamber |
FR2619247A1 (fr) * | 1987-08-05 | 1989-02-10 | Realisations Nucleaires Et | Implanteur d'ions metalliques |
US5126030A (en) * | 1990-12-10 | 1992-06-30 | Kabushiki Kaisha Kobe Seiko Sho | Apparatus and method of cathodic arc deposition |
-
1992
- 1992-06-25 EP EP92915546A patent/EP0596924A1/en not_active Withdrawn
- 1992-06-25 JP JP4511565A patent/JPH06508887A/ja active Pending
- 1992-06-25 WO PCT/US1992/005399 patent/WO1993001327A1/en not_active Application Discontinuation
Non-Patent Citations (1)
Title |
---|
See references of WO9301327A1 * |
Also Published As
Publication number | Publication date |
---|---|
WO1993001327A1 (en) | 1993-01-21 |
JPH06508887A (ja) | 1994-10-06 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 19940210 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AT BE CH DE DK ES FR GB GR IT LI LU MC NL SE |
|
18W | Application withdrawn |
Withdrawal date: 19950510 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION HAS BEEN WITHDRAWN |
|
R18W | Application withdrawn (corrected) |
Effective date: 19950510 |