EP0462377A3 - Ion source - Google Patents

Ion source Download PDF

Info

Publication number
EP0462377A3
EP0462377A3 EP19910106642 EP91106642A EP0462377A3 EP 0462377 A3 EP0462377 A3 EP 0462377A3 EP 19910106642 EP19910106642 EP 19910106642 EP 91106642 A EP91106642 A EP 91106642A EP 0462377 A3 EP0462377 A3 EP 0462377A3
Authority
EP
European Patent Office
Prior art keywords
ion source
ion
source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP19910106642
Other languages
German (de)
Other versions
EP0462377B1 (en
EP0462377A2 (en
Inventor
Juergen Dr. Mueller
Roland Dr. Gesche
Manfred Dipl.-Ing. Zipf (Fh)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Balzers und Leybold Deutschland Holding AG
Original Assignee
Leybold AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leybold AG filed Critical Leybold AG
Publication of EP0462377A2 publication Critical patent/EP0462377A2/en
Publication of EP0462377A3 publication Critical patent/EP0462377A3/en
Application granted granted Critical
Publication of EP0462377B1 publication Critical patent/EP0462377B1/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Plasma Technology (AREA)
EP91106642A 1990-06-21 1991-04-25 Ion source Expired - Lifetime EP0462377B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE4019729A DE4019729A1 (en) 1990-06-21 1990-06-21 ION SOURCE
DE4019729 1990-06-21

Publications (3)

Publication Number Publication Date
EP0462377A2 EP0462377A2 (en) 1991-12-27
EP0462377A3 true EP0462377A3 (en) 1992-05-13
EP0462377B1 EP0462377B1 (en) 1996-05-22

Family

ID=6408764

Family Applications (1)

Application Number Title Priority Date Filing Date
EP91106642A Expired - Lifetime EP0462377B1 (en) 1990-06-21 1991-04-25 Ion source

Country Status (4)

Country Link
US (1) US5124526A (en)
EP (1) EP0462377B1 (en)
JP (1) JPH06342637A (en)
DE (2) DE4019729A1 (en)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5308461A (en) * 1992-01-14 1994-05-03 Honeywell Inc. Method to deposit multilayer films
US5216330A (en) * 1992-01-14 1993-06-01 Honeywell Inc. Ion beam gun
DE4242894A1 (en) * 1992-12-18 1994-06-23 Leybold Ag Multiple HF line to cathode feeding device
KR100456465B1 (en) * 2000-03-20 2004-11-10 현대종합금속 주식회사 Flux cored wire for ferrite stainless steel
US7459899B2 (en) 2005-11-21 2008-12-02 Thermo Fisher Scientific Inc. Inductively-coupled RF power source
US8994270B2 (en) 2008-05-30 2015-03-31 Colorado State University Research Foundation System and methods for plasma application
JP2011521735A (en) 2008-05-30 2011-07-28 コロラド ステート ユニバーシティ リサーチ ファンデーション System, method and apparatus for generating plasma
JP2011522381A (en) 2008-05-30 2011-07-28 コロラド ステート ユニバーシティ リサーチ ファンデーション Plasma-based chemical source apparatus and method of use thereof
US8222822B2 (en) 2009-10-27 2012-07-17 Tyco Healthcare Group Lp Inductively-coupled plasma device
JP5553460B2 (en) 2010-03-31 2014-07-16 コロラド ステート ユニバーシティー リサーチ ファウンデーション Liquid-gas interface plasma device
CA2794895A1 (en) 2010-03-31 2011-10-06 Colorado State University Research Foundation Liquid-gas interface plasma device
US9532826B2 (en) 2013-03-06 2017-01-03 Covidien Lp System and method for sinus surgery
US9555145B2 (en) 2013-03-13 2017-01-31 Covidien Lp System and method for biofilm remediation

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3530335A (en) * 1969-02-03 1970-09-22 Humphreys Corp Induction plasma generator with high velocity sheath
US3814983A (en) * 1972-02-07 1974-06-04 C Weissfloch Apparatus and method for plasma generation and material treatment with electromagnetic radiation
US3958883A (en) * 1974-07-10 1976-05-25 Baird-Atomic, Inc. Radio frequency induced plasma excitation of optical emission spectroscopic samples
EP0261338A2 (en) * 1986-09-24 1988-03-30 Leybold Aktiengesellschaft Inductively excited ion source

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4381453A (en) * 1980-12-31 1983-04-26 International Business Machines Corporation System and method for deflecting and focusing a broad ion beam
US4629940A (en) * 1984-03-02 1986-12-16 The Perkin-Elmer Corporation Plasma emission source
DE3729347A1 (en) * 1986-09-05 1988-03-17 Mitsubishi Electric Corp PLASMA PROCESSOR
US4795880A (en) * 1986-09-11 1989-01-03 Hayes James A Low pressure chemical vapor deposition furnace plasma clean apparatus

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3530335A (en) * 1969-02-03 1970-09-22 Humphreys Corp Induction plasma generator with high velocity sheath
US3814983A (en) * 1972-02-07 1974-06-04 C Weissfloch Apparatus and method for plasma generation and material treatment with electromagnetic radiation
US3958883A (en) * 1974-07-10 1976-05-25 Baird-Atomic, Inc. Radio frequency induced plasma excitation of optical emission spectroscopic samples
EP0261338A2 (en) * 1986-09-24 1988-03-30 Leybold Aktiengesellschaft Inductively excited ion source

Also Published As

Publication number Publication date
EP0462377B1 (en) 1996-05-22
DE59107831D1 (en) 1996-06-27
JPH06342637A (en) 1994-12-13
EP0462377A2 (en) 1991-12-27
DE4019729A1 (en) 1992-01-02
US5124526A (en) 1992-06-23

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