EP0448094B1 - Objectif pour un microscope - Google Patents

Objectif pour un microscope Download PDF

Info

Publication number
EP0448094B1
EP0448094B1 EP91104423A EP91104423A EP0448094B1 EP 0448094 B1 EP0448094 B1 EP 0448094B1 EP 91104423 A EP91104423 A EP 91104423A EP 91104423 A EP91104423 A EP 91104423A EP 0448094 B1 EP0448094 B1 EP 0448094B1
Authority
EP
European Patent Office
Prior art keywords
lens system
objective lens
lenses
image formation
microscope
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP91104423A
Other languages
German (de)
English (en)
Other versions
EP0448094A3 (en
EP0448094A2 (fr
Inventor
Takahisa Dainippon Screen Mfg. Co. Ltd Hayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dainippon Screen Manufacturing Co Ltd
Original Assignee
Dainippon Screen Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2074297A external-priority patent/JP2582917B2/ja
Priority claimed from JP2109849A external-priority patent/JP2584526B2/ja
Priority claimed from JP11241890A external-priority patent/JPH049814A/ja
Application filed by Dainippon Screen Manufacturing Co Ltd filed Critical Dainippon Screen Manufacturing Co Ltd
Publication of EP0448094A2 publication Critical patent/EP0448094A2/fr
Publication of EP0448094A3 publication Critical patent/EP0448094A3/en
Application granted granted Critical
Publication of EP0448094B1 publication Critical patent/EP0448094B1/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/02—Objectives

Definitions

  • the present invention relates to an objective lens system for use within a microscope which is employable in ultraviolet range, in particular, in far ultraviolet range, in which light has a wavelength of shorter than 300 nm, wherein a said lenses are made of quartz and fluoride.
  • objective lens system for use within a microscope comprises lenses made of quartz and fluoride is disclosed in EP-A-347-838.
  • a microscope has a property that, assuming numerical aperture (NA) of an objective lens system used within microscope remains constant, the shorter a wavelength of light used therein, the better its resolution limit. Thus, it is possible to observe a sample in greater detail by shortening the wavelength of illumination light.
  • illuminating a sample with ultraviolet light would often result in fluorecence of stronger intensity discharged from a sample than fluorecence obtained by illuminating with visible light.
  • a microscope employable in ultraviolet range is preferred in the art, because of obtaining more information by observing a sample through.such a microscope.
  • an objective lens system for use within a microscope must be employable in ultraviolet and/or far ultraviolet range.
  • an objective lens system 170 includes a first lens 171 made of fluorite, a second lens group 172 and a third lens group 173 disposed in that order from an object side (left-hand side of the figure) to an image formation side (right-hand side of the figure).
  • the second lens group 172 includes two convex lenses 172b and 172c both made of fluorite and a concave lens 172a made of quartz.
  • the second lens group 172 is formed by holding the concave lens 172a between the convex lenses 172b and 172c and joining the same to each other.
  • the third lens group 173 is formed, in a similar manner to the second lens group 172, by holding a concave lens 173a made of quartz between two convex lenses 173b and 173c both made of fluorite and joining the same to each other.
  • the objective lens system 170 is capable of transmitting ultraviolet and/or far ultraviolet light, and hence, employable in ultraviolet and/or far ultraviolet range.
  • chromatic aberration can be corrected in the objective lens system 170, since the second lens group 172 is composed of the concave lens 172a made of quartz and the convex lenses 172b and 172c made of fluorite while the third lens group 173 is composed of the concave lens 173a made of quartz and the convex lenses 173b and 173c made of fluorite.
  • the convex lens 172b, the concave lens 172a and the convex lens 172c of the second lens group 172 are brought into optical contact and joined to each other.
  • the convex lens 173b, the concave lens 173a and the convex lens 173c are brought into optical contact thereby to be joined to each other. This is attributable to the current technical level that adhesive which transmits far ultraviolet light is not available yet. Further, when a junction surface between lenses has to completely eliminate reflection thereat, there is no option other than cementing by optical contact. Thus, in the process of manufacturing the objective lens system 170, junction surfaces must be finished with extremely high accuracy, which would result in largely increased cost.
  • Fig. 2 shows an objective lens system for use within a microscope, namely, objective lens system 160, according to an embodiment of the precedent applications.
  • the suggested objective 160 includes lenses 161 to 163, which are made of either quartz or fluorite.
  • the lenses 161 to 163, i.e., a first to a third lenses, are displaced in that order from an object side (left-hand side in the figure) to an image formation side (right-hand side in the figure) with preselected air spaces therebetween.
  • the objective lens system 160 This enables the objective lens system 160 to be employable in both ultraviolet and far ultraviolet range.
  • the lenses 161 to 163, as just has been mentioned, are separated from each other; that is, the objective lens system 160 includes no junction surfaces. Thus, including no optical contact, the objective lens system 160 is free from the problem relating to manufacture cost.
  • the objective lens system 160 cooperates with an image formation lens system (detailed structure thereof will be given later) in order to form an image of an object to be observed on the focal plane of the image formation lens system at a predetermined imaging magnification M.
  • an objective lens system is replaced with other one while an image formation lens system is fixed, whereby the imaging magnification M is changed.
  • Objective lens systems for replacement are necessary for this end, each of the lens systems having a focal length different from the focal length f1.
  • the equation (1) gives that an objective lens system for replacement which has a focal length of 2 ⁇ f1 is necessary to halve the imaging magnification M. If being required here is nothing more than to form the other objective lens system for replacement such that its focal length becomes 2 ⁇ f1, the demanded objective lens system for replacement merely has to have a size of a proportionally enlarged objective lens system 160.
  • an objective lens system for replacement must have:
  • an objective lens system for replacement which has a focal length of 5 ⁇ f1 is necessary to observe an object at an imaging magnification of M/5.
  • an objective lens system for replacement must have:
  • the present invention is directed to an objective lens system for use within a microscope.
  • the system includes: a first lens made of either quartz or fluorite, the first lens having a positive power; a second and a third lenses made of quartz, both of the second and third lenses having a negative power; and a fourth lens made of fluorite, the fourth lens having a positive power, wherein the first to the fourth lenses are disposed in that order from an object side to an image formation side with predetermined air spacings therebetween, wherein the inequalities of claim 1 are satisfied.
  • the present invention also relates to an apparatus for measuring the thickness of a film on a sample, the apparatus including: means for illuminating a sample, and a microscopic optical system for imaging ultraviolet and/or far ultraviolet light from the sample, the microscopic optical system including an objective lens system for converging the light in an image formation direction with the features of claim 1 or 2.
  • An object of the present invention is to provide an inexpensive objective lens system for use within a microscope which is employable in ultraviolet and/or far ultraviolet range and which is different in structure from the objective lens system according to the precedent applications.
  • Another object of the present invention is to provide an objective lens system for use within a microscope which has a focal length approximately half, parfocality, and a pupil roughly the same as those of the objective lens system of the precedent applications which forms an image on an image plane of an image formation lens system at a predetermined imaging magnification when cooperates with the image formation lens system.
  • Another object of the present invention is to provide an apparatus which uses ultraviolet and/or far ultraviolet light to accurately measure the thickness of a film which is formed on a sample.
  • An objective lens system includes a first to a fourth lenses disposed in that order from an object side to an image formation side with predetermined air spacings therebetween.
  • the first lens is made of either quartz or fluorite, and has a positive power.
  • the second and the third lenses are made of quartz, and have a negative power.
  • the fourth lens is made of fluorite, and has a positive power. This enables the objective lens system to transmit ultraviolet and/or far ultraviolet light, and hence to be employed in ultraviolet and/or far ultraviolet range.
  • the first to the fourth lenses are separated from each other by a predetermined air space; that is, the objective lens system needs no optical contact. This enables large reduction in cost for the objective lens system.
  • first and the fourth lenses have a positive power
  • second and the third lenses have a negative power. This enables corrections of aberrations such as spherical and chromatic aberrations.
  • Aberrations can be further moderated especially when the objective lens system satisfies the following inequities: 0.54 ⁇
  • the objective lens system according to the first embodiment is interchangeable with other objective lens system, according to the precedent applications, for forming an image by cooperating with an image formation lens system.
  • the third lens having the negative power and the fourth lens having the positive power are provided, resulting of correction for chromatic aberration.
  • the second lens has the large negative power, so that the objective lens system is a so-called telephoto type lens system.
  • the focal length of the objective lens system grows larger compared to the total length thereof.
  • the first lens has the positive power, allowing the objective lens system to have a telecentric characteristic on the object side.
  • the composite lens system consisting of the second to the fourth lenses has a large focal length and functions as a teleconverter for the first lens. That is, the composite lens system magnifies the focal length of the first lens so as to adjust the focal length of the objective lens system to a desired value.
  • the correction of the chromatic aberration is carried out by the combination of the third and fourth lenses.
  • is preferably set within the range of 1.3 to 1.4 in consideration of the dispersion of fluorite and quartz.
  • the objective lens system includes the first to the fourth lenses, however, it is rather preferable to design the objective lens system so that a composite lens system consisting of the third and the fourth lenses excessively corrects the aberration, the reason being for the correction of the aberration caused by the first and second lenses.
  • the following inequality must be satisfied: 0.60 ⁇
  • the focal point of the objective lens system on the image side is located substantially in the composite lens system consisting of the third and the fourth lenses, and where the parfocal length of the objective lens system is 3/4 times larger than the focal length thereof.
  • Fig. 3 is a block diagram of an objective lens system according to a preferred example of the first embodiment.
  • an objective lens system 10 includes a first to a fourth lenses 11 to 14.
  • the lenses 11 to 14 are serially arranged in that order from an object side (left-hand side of the figure) to an image side (right-hand side of the figure) with predetermined air spaces therebetween.
  • the first and the fourth lenses 11 and 14 have a positive power, whereas the second and the third lenses 12 and 13 have a negative power.
  • the focal length f of the objective lens system 10 is 60, the numerical aperture (NA) thereof is 1/24, and the image size thereof is 10.6.
  • the objective lens system 10 is designed as a so-called infinity corrected objective system so as to be in use within a reflecting type microscope. That is, the objective lens system 10, when used in combination with an image formation lens system, forms an image of an object on the focal plane of the image formation lens system.
  • the image formation lens system is described in the following:
  • Fig. 4 is a block diagram of the image formation lens system, the image formation lens system being identical to the one disclosed in the precedent applications, namely, Japanese Patent Laid-Open Gazette Nos. 1-319719 and 1-319720.
  • an image formation lens system 150 includes a first to a third lenses 151 to 153. The first, the second and the third lenses 151, 152 and 153 are displaced in that order from an object side (left-hand side of the figure) to an image formation side (right-hand side of the figure) with predetermined air spaces therebetween.
  • Table 2 below shows data of the image formation lens system 150.
  • the symbol R i represents radius of curvature of an i-th lens surface from the object side (left-hand side in the figure), and the symbol D i represents a distance between the i-th lens surface and an (i + 1)-th lens surface along an optical axis Z.
  • the first lens 151 is made of fluorite
  • the second and the third lenses 152 and 153 are both made of quartz.
  • the focal length f′ of the image formation lens system 150 is 300.
  • Figs. 5A and 5B illustrate spherical aberration and sine condition, respectively, caused in the optical system formed by the image formation lens system 150 and the objective lens system 10.
  • alphabetic characters A, B, C and D show a value with respect to light of wavelengths of 298.06 nm, 202.54 nm, 398.84 nm and 253.70 nm, respectively.
  • Figs. 5A and 5B clearly show that the objective lens system 10 successfully restrains aberrations at ultraviolet and far ultraviolet light.
  • the objective lens system 10 is employable in ultraviolet and far ultraviolet range.
  • Figs. 5C and 5D show that serious astigmatism and distortion do not occur in the optical system utilizing the objective lens system 10.
  • Fig. 6 is a block diagram of an objective lens system according to another example of the first embodiment.
  • An objective lens system 20 is basically identical to the objective lens system 10 in structure. That is, the objective lens system 20 includes a first to a fourth lenses 21 to 24, the first to the fourth lenses being serially disposed in that order from an object side (left-hand side of the figure) to an image formation side (right-hand side of the figure) with predetermined air spaces therebetween.
  • Data of the objective lens system 20 are available from Table 3.
  • the first to the third lenses 21 to 23 are all made of quartz, while the fourth lens 24 is made of fluorite.
  • the focal length f of the objective lens system 20 is 60, the numerical aperture (NA) thereof is 1/24, and the image size thereof is 10.6.
  • the objective lens system 20 is an infinity corrected objective system, similarly to the objective lens system 10, and acts in combination with the image formation lens system 150.
  • Figs. 7A and 7B illustrate spherical aberration and sine condition, respectively, in the optical system utilizing the objective lens system 20 and the image formation lens system 150, while Figs. 7C and 7D showing astigmatism and distortion at light of a wavelength of 298.06 nm, respectively.
  • Figs. 7A and 7B serious aberrations at ultraviolet and far ultraviolet light do not occur in the objective lens system 20.
  • the objective lens system 20 is obviously employable in ultraviolet and far ultraviolet range.
  • astigmatism and distortion are restrained in the optical system in which the objective lens system 20 is used (according to Figs. 7C and 7D).
  • Fig. 8 is a block diagram of an objective lens system according to further example of the first embodiment.
  • An objective lens system 30 is basically identical to the objective lens system 10 in structure. That is, the objective lens system 30 includes a first to a fourth lenses 31 to 34, the first to the fourth lenses being serially disposed in that order from an object side (left-hand side of the figure) to an image formation side (right-hand side of the figure) with predetermined air spaces therebetween.
  • the first to the third lenses 31 to 33 are made of quartz, whereas the fourth lens 34 is made of fluorite.
  • the focal length f of the objective lens system 30 is 60, the numerical aperture (NA) thereof is 1/24, and the image size thereof is 10.6.
  • the objective lens system 30 is an infinity corrected objective system, similarly to the objective lens system 10, and acts in combination with the image formation lens system 150.
  • Figs. 9A and 9B illustrate spherical aberration and sine condition, respectively, in the optical system utilizing the objective lens system 30 and the image formation lens system 150, while Figs. 9C and 9D showing astigmatism and distortion at light of a wavelength of 298.06 nm, respectively.
  • Figs. 9A and 9B serious aberrations at ultraviolet and far ultraviolet light do not occur in the objective lens system 30.
  • the objective lens system 30 is obviously employable in ultraviolet and far ultraviolet range.
  • astigmatism and distortion are restrained in the optical system in which the objective lens system 30 is used (according to Figs. 9C and 9D).
  • Fig. 10 is a block diagram of an objective lens system according to further example of the first embodiment.
  • An objective lens system 40 is identical to the objective lens system 10 in structure. That is, the objective lens system 40 includes a first to a fourth lenses 41 to 44, the first to the fourth lenses being serially disposed in that order from an object side (left-hand side of the figure) to an image formation side (right-hand side of the figure) with predetermined air spaces therebetween.
  • the first and the fourth lenses 41 and 44 are made of fluorite, whereas the second and the third lenses 42 and 43 are made of quartz.
  • the focal length f of the objective lens system 40 is 60, the numerical aperture (NA) thereof is 1/24, and the image size thereof is 10.6.
  • the objective lens system 40 is an infinity corrected objective system, similarly to the objective lens system 10, and acts in combination with the image formation lens system 150.
  • Figs. 11A and 11B illustrate spherical aberration and sine condition, respectively, in the optical system utilizing the objective lens system 40 and the image formation lens system 150, while Figs. 11C and 11D showing astigmatism and distortion at light of a wavelength of 298.06 nm, respectively.
  • Figs. 11A and 11B serious aberrations at ultraviolet and far ultraviolet light do not occur in the objective lens system 40.
  • the objective lens system 40 is obviously employable in ultraviolet and far ultraviolet range.
  • astigmatism and distortion are restrained in the optical system in which the objective lens system 40 is used (according to Figs. 11C and 11D).
  • the objective lens systems 10, 20, 30 and 40 according to the first embodiment are all employable in ultraviolet and/or far ultraviolet range and display excellent properties at light of these ranges. Moreover, in the objective lens systems of the first embodiment, the first to the fourth lenses are separated from each other. This eliminates optical contact between the lenses, and hence would successfully lead to cost reduction.
  • the objective lens systems 10, 20, 30 and 40 are employable in a very wide range, i.e., from infrared to far ultraviolet.
  • the objective lens system 160 (Fig. 2) is combined with the image formation lens system 150, thereby to obtain the imaging magnification M of -10. More precisely, the focal length of the objective lens system 160 is 30, whereas the focal length of any of the objective lens systems 10, 20, 30 and 40 is 60. Hence, the imaging magnification M can be varied from -10 to -5 by replacing, for instance, the objective lens system 160 with the objective lens system 10 of the first embodiment while fixing the image formation lens system 150 in the same position.
  • Each of the objective lens systems 10, 20, 30 and 40 has a parfocal relation with respect to the objective lens system 160 as set forth. This eliminates time consuming process of bringing the microscope into focus after replacement (for example, after the objective lens system 10 has replaced the objective lens system 160), whereby operation of the microscope would be greately improved.
  • the objective lens systems 10, 20, 30 and 40 have a pupil diameter of which roughly coincides with the pupil of the objective lens system 160. In consequence, the replacement accompanies only negligible changes in quantity of illumination light onto an object, promising fairy good observation.
  • Fig. 12 is a schematic block diagram of a system 102 for measuring film thickness.
  • the system 102 includes a microspectroscope 101 for detecting spectrum of a sample to be measured and an arithmetic unit 103 for calculating the film thickness of the measured sample S on the basis of spectral data obtained by the microspectroscope 101.
  • the microspectroscope 101 includes an illuminating optical system 110, a microscopic optical system 120, a reflecting mirror 130, a spectroscopic unit 140, and a monitoring optical system 145.
  • the illuminating optical system 110 includes a light source 111 for projecting light which includes ultraviolet and far ultraviolet rays, a condenser lens 112, an aperture stop 113, a field stop 114 and another condenser lens 115.
  • a light source 111 for projecting light which includes ultraviolet and far ultraviolet rays
  • a condenser lens 112 for projecting light which includes ultraviolet and far ultraviolet rays
  • an aperture stop 113 illuminating light from the light source 111
  • the field stop 114 includes illuminating light from the light source 111
  • another condenser lens 115 includes illuminating light from the light source 111 to the microscopic optical system 120 through the condenser lens 112, the aperture stop 113, the field stop 114 and the condenser lens 115.
  • the microscopic optical system 120 includes an objective lens system 121 which is identical to that shown in Fig. 3, an image formation lens system 124 which is identical to that shown in Fig. 4 and a beam splitter 123 provided between the objective lens system 121 and the image formation lens system 124.
  • Symbol 122 denotes a pupil position of the objective lens system 121.
  • the illuminating light from the light source 111 passes through the condenser lens 112, the aperture stop 113, the field stop 114 and the condenser lens 115, and is guided to the objective lens system 121 by the beam splitter 123.
  • the illuminating light is through the objective lens system 121 and is applied onto the surface of a measured sample S.
  • the sample S is supported by a sample holder (not shown).
  • Reflected light from the surface of the measured sample S is enlarged by the lens 121 and imaged at a position close to the reflecting mirror 130, the beam splitter 123 and the image formation lens system 124.
  • the reflecting mirror 130 is provided with a pinhole 131. Reflected light L S passing through the pinhole 131 enters the spectroscopic unit 140.
  • the spectroscopic unit 140 is formed by a diffraction grating 141 for separating the reflected light L S into spectral components and a photo detector 142 for detecting the spectrum of the spectrally diffracted light.
  • the diffraction grating 141 may be prepared by a flat field type diffraction grating which images a spectrum on a flat plane. Alternatively, the diffraction grating may have a sweeper.
  • the photo detector 142 which is formed by a photodiode array or a CCD, for example, is conjugate with the pinhole 131. Alternatively, the photo detector 142 may include a photomultiplier.
  • the spectroscopic unit 140 Since the spectroscopic unit 140 has the aforementioned structure, the reflected light L S is separated into its spectral components by the diffraction grating 141, and the respective spectral components are received by the photo detector 142, which in turn outputs a signal corresponding to the spectrum of the light L S .
  • the light reflected by the reflecting mirror 130 enters the monitoring optical system 145, and is imaged at an image-formation position 147 through a relay lens 146.
  • an enlarged image of the surface of the sample S is imaged on an image-formation plane, so that the measuring position of the sample S can be confirmed and focusing can be performed on the basis of the enlarged image.
  • Fig. 13 is a flow chart of a method of measuring film thickness.
  • an operator inputs spectrum data B( ⁇ ) of a sample (hereinafter referred to as "standard sample"), whose spectrum data is known, in the arithmetic unit 103 through a keyboard (not shown), to store the data in a memory (not shown) provided in the arithmetic unit 103.
  • the standard sample may be prepared by a silicon substrate, a substrate which is deposited with aluminum on its surface, or the like.
  • step S1 the operator sets the standard sample on the sample holder of the microspectroscope 101 (step S1), and supplies a command for detecting calibration data to the arithmetic unit 103.
  • the microspectroscope 101 detects the spectrum of the standard sample, to store data B′( ⁇ ) relating to the spectrum in the memory of the arithmetic nit 103 (step S2).
  • the operator removes the standard sample from the microspectroscope 101 and sets the measured sample S on the sample holder (step S3). Thereafter, the operator supplies a command to the arithmetic unit 103 to start measurement, so that the microspectroscope 101 detects the spectrum of the measured sample S in response to a command from the arithmetic unit 103, to store data S′( ⁇ ) relating to the spectrum thereof in the memory of the arithmetic unit 103 (step S4).
  • the data S( ⁇ ) corresponds to a signal from the microspectroscope 101 on the assumption that absolutely no influence is caused by the factors such as spectral transmittance characteristics of the illuminating optical system 110 and the microscopic optical system 120.
  • the data S( ⁇ ) shows the true spectrum of the measured sample S.
  • the arithmetic unit 103 calculates the thickness of the thin film (step S6).
  • the principle of calculates film thickness is well known in the art, and hence description thereof is omitted.
  • the data S′( ⁇ ) relating to the actually measured spectrum is calibrated in the aforementioned manner to obtain the data S( ⁇ ) relating to the true spectrum, whereby the film thickness can be accurately measured.
  • the present invention can be employed within the restricted to use within a system for measuring film thickness.
  • the invention has general applications as an objective lens optical system.

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Lenses (AREA)

Claims (3)

  1. Système de lentille destiné à être utilisé dans un microscope, comportant :
    une première lentille (11, 21, 31, 41) réalisée en quartz ou en fluorure, ladite première lentille ayant une puissance positive;
    une deuxième lentille (12, 22, 32, 42) réalisée en quartz, ladite deuxième lentille ayant une puissance négative;
    caractérisé par :
    une troisième lentille (13, 23, 33, 43) réalisée en quartz, ladite troisième lentille ayant une puissance négative;
    une quatrième lentille (14, 24, 34, 44) réalisée en fluorite, ladite quatrième lentille ayant une puissance positive;
    lesdites première à quatrième lentilles (11 à 16, 21 à 26) étant disposées dans cet ordre depuis un côté objet jusqu'à un côté de formation d'image avec des vides d'air prédéterminés entre-elles,
    les inégalités suivantes étant satisfaites : 0,54 < | φ1 / φ2 | < 0,75
    Figure imgb0069
     0,90 < | φ4 / φ3 | < 0,95
    Figure imgb0070
     où φ1, φ2, φ3 et φ4 sont les puissances desdites première à quatrième lentilles respectivement.
  2. Microscope comportant un système de lentille selon la revendication 1, qui est monté de façon interchangeable dans ledit microscope, et un autre système de lentille destiné à former une image avec un grandissement d'image prédéterminé.
  3. Appareil destiné à mesurer l'épaisseur d'un film sur un échantillon, ledit appareil comportant :
    des moyens destinés à éclairer un échantillon; et
    un système optique de microscope destiné à former une image en lumière ultraviolette et/ou dans l'ultraviolet lointain à partir dudit échantillon, ledit système optique de microscope comprenant un système de lentille destiné à faire converger ladite lumière dans une direction de formation d'image, caractérisé par un système de lentille selon la revendication 1.
EP91104423A 1990-03-23 1991-03-21 Objectif pour un microscope Expired - Lifetime EP0448094B1 (fr)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP74297/90 1990-03-23
JP2074297A JP2582917B2 (ja) 1990-03-23 1990-03-23 顕微鏡用対物レンズ
JP2109849A JP2584526B2 (ja) 1990-04-24 1990-04-24 顕微鏡用対物レンズ
JP109849/90 1990-04-24
JP11241890A JPH049814A (ja) 1990-04-27 1990-04-27 顕微鏡用対物レンズ
JP112418/90 1990-04-27

Publications (3)

Publication Number Publication Date
EP0448094A2 EP0448094A2 (fr) 1991-09-25
EP0448094A3 EP0448094A3 (en) 1992-09-02
EP0448094B1 true EP0448094B1 (fr) 1995-06-14

Family

ID=27301465

Family Applications (1)

Application Number Title Priority Date Filing Date
EP91104423A Expired - Lifetime EP0448094B1 (fr) 1990-03-23 1991-03-21 Objectif pour un microscope

Country Status (3)

Country Link
US (1) US5159492A (fr)
EP (1) EP0448094B1 (fr)
DE (1) DE69110325T2 (fr)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5469299A (en) * 1990-05-15 1995-11-21 Olympus Optical Co., Ltd. Objective lens system
JPH0519162A (ja) * 1991-05-02 1993-01-29 Asahi Optical Co Ltd 対物レンズ及び対物レンズの測定方法
DE4219205A1 (de) * 1992-06-12 1993-12-16 Leica Mikroskopie & Syst Verfahren zur Herstellung von UV-Mikroskop - Trockenobjektiven und nach diesem Verfahren hergestellte Mikroskopobjektive
US5532873A (en) * 1993-09-08 1996-07-02 Dixon; Arthur E. Scanning beam laser microscope with wide range of magnification
DE19931949A1 (de) * 1999-07-09 2001-01-11 Leica Microsystems DUV-taugliches Mikroskop-Objektiv mit parfokalem IR-Fokus
JP2001108523A (ja) * 1999-10-14 2001-04-20 Matsushita Electric Ind Co Ltd 分光測定装置
TWI656376B (zh) 2017-08-30 2019-04-11 大立光電股份有限公司 影像擷取系統鏡片組、取像裝置及電子裝置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2363770A (en) * 1943-09-22 1944-11-28 Spencer Lens Co Lens system
US3035490A (en) * 1958-12-31 1962-05-22 Ibm Ultra-violet lens
JPS5436747A (en) * 1977-08-26 1979-03-17 Olympus Optical Co Ltd Objective lens of microscope
US4349249A (en) * 1980-05-21 1982-09-14 The United States Of America As Represented By The United States Department Of Energy Compound lens
US5121255A (en) * 1988-06-21 1992-06-09 Dainippon Screen Mfg. Co. Objective lens system for microscope

Also Published As

Publication number Publication date
EP0448094A3 (en) 1992-09-02
EP0448094A2 (fr) 1991-09-25
US5159492A (en) 1992-10-27
DE69110325D1 (de) 1995-07-20
DE69110325T2 (de) 1995-10-19

Similar Documents

Publication Publication Date Title
US5121255A (en) Objective lens system for microscope
US5311021A (en) Spectroscopic sampling accessory having dual measuring and viewing systems
Maksutov New catadioptric meniscus systems
US7230697B2 (en) Method and apparatus for multi-mode spectral imaging
EP0454090B1 (fr) Système de lentilles pour l&#39;objectif d&#39;un microscope
JPH09230245A (ja) 共焦点顕微鏡
EP0447990B1 (fr) Objectif pour un microscope
EP0448094B1 (fr) Objectif pour un microscope
US6018416A (en) Secondary image formation type view finder
EP0452963A2 (fr) Système objectif de lentille pour l&#39;utilisation avec un microscope
US20060285219A1 (en) Tube lens unit with chromatically compensating effect
Mohanan et al. Understanding the limits of remote focusing
US20210096349A1 (en) Imaging device and method for imaging an object using a microscope
US20080144167A1 (en) Optical imaging system and method for high speed and high resolution
US11808933B2 (en) Liquid immersion objective, microscope, and observation method
US8094384B2 (en) Camera, handlens, and microscope optical system for imaging and coupled optical spectroscopy
Skobeleva et al. A new set of lens objectives for luminescence microscopes that operate in the 250–1000-nm region
JP2584526B2 (ja) 顕微鏡用対物レンズ
SU1658114A1 (ru) Планапохроматический объектив микроскопа
JP4792170B2 (ja) 顕微鏡用対物レンズ組立体
JP2000121945A (ja) 集光装置
JP2003156691A (ja) 顕微鏡コンデンサーレンズ
JP2582917B2 (ja) 顕微鏡用対物レンズ
CN117538291A (zh) 一种光学材料折射率的快速测试方法及系统
JP2001141608A (ja) ラジアル型ｇｒｉｎレンズの色収差測定機および色収差測定方法

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

AK Designated contracting states

Kind code of ref document: A2

Designated state(s): DE FR GB

PUAL Search report despatched

Free format text: ORIGINAL CODE: 0009013

AK Designated contracting states

Kind code of ref document: A3

Designated state(s): DE FR GB

17P Request for examination filed

Effective date: 19921204

17Q First examination report despatched

Effective date: 19940707

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE PATENT HAS BEEN GRANTED

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): DE FR GB

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: FR

Effective date: 19950614

REF Corresponds to:

Ref document number: 69110325

Country of ref document: DE

Date of ref document: 19950720

EN Fr: translation not filed
PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

26N No opposition filed
PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: GB

Payment date: 20000315

Year of fee payment: 10

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: DE

Payment date: 20000318

Year of fee payment: 10

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: GB

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20010321

GBPC Gb: european patent ceased through non-payment of renewal fee

Effective date: 20010321

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: DE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20020101