EP0281804A3 - Stabilized alcaline gold plating bath without current - Google Patents
Stabilized alcaline gold plating bath without current Download PDFInfo
- Publication number
- EP0281804A3 EP0281804A3 EP88102273A EP88102273A EP0281804A3 EP 0281804 A3 EP0281804 A3 EP 0281804A3 EP 88102273 A EP88102273 A EP 88102273A EP 88102273 A EP88102273 A EP 88102273A EP 0281804 A3 EP0281804 A3 EP 0281804A3
- Authority
- EP
- European Patent Office
- Prior art keywords
- stabilized
- gold
- alcaline
- current
- plating bath
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/42—Coating with noble metals
- C23C18/44—Coating with noble metals using reducing agents
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemically Coating (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Abstract
Die Erfindung betrifft ein stabilisiertes, wässriges, alkalisches Goldbad, ent haltend einen Dicyanogold(I)-Komplex, einen Komplexbildner, ein Alkalihydroxid und ein Reduktionsmittel, zur stromlosen Abscheidung von Gold auf Gold und Me talle, die unedler als Gold sind, sowie auf Legierungen dieser Metalle, dadurch gekennzeichnet, daß es als Stabilisator mindestens eine Verbindung aus der Klasse der Glykolderivate oder der Polyethylenimine enthält. The invention relates to a stabilized, aqueous, alkaline gold bath, ent holding a dicyanogold (I) complex, a complexing agent, an alkali hydroxide and a reducing agent for electroless deposition of gold on gold and me talle, which are less noble than gold, as well as on alloys of these metals, thereby characterized in that it acts as a stabilizer at least one compound from the Contains class of glycol derivatives or polyethyleneimines.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19873707817 DE3707817A1 (en) | 1987-03-09 | 1987-03-09 | STABILIZED ALKALINE GOLD BATH FOR ELECTRIC DEPOSIT OF GOLD |
DE3707817 | 1987-03-09 |
Publications (2)
Publication Number | Publication Date |
---|---|
EP0281804A2 EP0281804A2 (en) | 1988-09-14 |
EP0281804A3 true EP0281804A3 (en) | 1989-03-15 |
Family
ID=6322785
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP88102273A Ceased EP0281804A3 (en) | 1987-03-09 | 1988-02-17 | Stabilized alcaline gold plating bath without current |
Country Status (5)
Country | Link |
---|---|
US (1) | US4838937A (en) |
EP (1) | EP0281804A3 (en) |
JP (1) | JPS6425987A (en) |
CA (1) | CA1290993C (en) |
DE (1) | DE3707817A1 (en) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4919720A (en) * | 1988-06-30 | 1990-04-24 | Learonal, Inc. | Electroless gold plating solutions |
GB2225026A (en) * | 1988-11-22 | 1990-05-23 | American Chem & Refining Co | Electroless gold plating composition |
DE4024764C1 (en) * | 1990-08-02 | 1991-10-10 | Schering Ag Berlin-Bergkamen, 1000 Berlin, De | |
JP2927142B2 (en) * | 1993-03-26 | 1999-07-28 | 上村工業株式会社 | Electroless gold plating bath and electroless gold plating method |
US5803957A (en) * | 1993-03-26 | 1998-09-08 | C. Uyemura & Co.,Ltd. | Electroless gold plating bath |
US5338343A (en) * | 1993-07-23 | 1994-08-16 | Technic Incorporated | Catalytic electroless gold plating baths |
JP3395854B2 (en) * | 1994-02-02 | 2003-04-14 | 日立化成工業株式会社 | Chemical reduction solution of copper oxide and method for producing multilayer printed wiring board using the same |
CN1053231C (en) * | 1996-10-16 | 2000-06-07 | 南京大学 | Plating bath for chemical plating nickel-phosphorus alloy and chemical plating process |
JP4932094B2 (en) * | 2001-07-02 | 2012-05-16 | 日本リーロナール有限会社 | Electroless gold plating solution and electroless gold plating method |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2441666A1 (en) * | 1978-11-16 | 1980-06-13 | Prost Tournier Patrick | PROCESS FOR CHEMICAL DEPOSITION OF GOLD BY SELF-CATALYTIC REDUCTION |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5020012B1 (en) * | 1964-06-24 | 1975-07-11 | ||
US3589916A (en) * | 1964-06-24 | 1971-06-29 | Photocircuits Corp | Autocatalytic gold plating solutions |
US4091128A (en) * | 1976-10-08 | 1978-05-23 | Ppg Industries, Inc. | Electroless gold plating bath |
-
1987
- 1987-03-09 DE DE19873707817 patent/DE3707817A1/en not_active Withdrawn
-
1988
- 1988-02-17 EP EP88102273A patent/EP0281804A3/en not_active Ceased
- 1988-03-08 CA CA000560784A patent/CA1290993C/en not_active Expired
- 1988-03-08 JP JP63052778A patent/JPS6425987A/en active Pending
- 1988-03-09 US US07/165,832 patent/US4838937A/en not_active Expired - Fee Related
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2441666A1 (en) * | 1978-11-16 | 1980-06-13 | Prost Tournier Patrick | PROCESS FOR CHEMICAL DEPOSITION OF GOLD BY SELF-CATALYTIC REDUCTION |
Also Published As
Publication number | Publication date |
---|---|
JPS6425987A (en) | 1989-01-27 |
US4838937A (en) | 1989-06-13 |
CA1290993C (en) | 1991-10-22 |
EP0281804A2 (en) | 1988-09-14 |
DE3707817A1 (en) | 1988-09-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 19880217 |
|
AK | Designated contracting states |
Kind code of ref document: A2 Designated state(s): BE CH DE ES FR GB IT LI LU NL SE |
|
PUAL | Search report despatched |
Free format text: ORIGINAL CODE: 0009013 |
|
AK | Designated contracting states |
Kind code of ref document: A3 Designated state(s): BE CH DE ES FR GB IT LI LU NL SE |
|
17Q | First examination report despatched |
Effective date: 19901120 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION HAS BEEN REFUSED |
|
18R | Application refused |
Effective date: 19911024 |