EP0272362A3 - Method and apparatus for lapping or polishing optical surfaces - Google Patents

Method and apparatus for lapping or polishing optical surfaces Download PDF

Info

Publication number
EP0272362A3
EP0272362A3 EP87102822A EP87102822A EP0272362A3 EP 0272362 A3 EP0272362 A3 EP 0272362A3 EP 87102822 A EP87102822 A EP 87102822A EP 87102822 A EP87102822 A EP 87102822A EP 0272362 A3 EP0272362 A3 EP 0272362A3
Authority
EP
European Patent Office
Prior art keywords
workpiece
tool
elements
lapping
optical surfaces
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP87102822A
Other languages
German (de)
French (fr)
Other versions
EP0272362A2 (en
Inventor
Erich Dr. Heynacher
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Publication of EP0272362A2 publication Critical patent/EP0272362A2/en
Publication of EP0272362A3 publication Critical patent/EP0272362A3/en
Withdrawn legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B13/00—Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor
    • B24B13/015—Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor of television picture tube viewing panels, headlight reflectors or the like
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B21/00—Machines or devices using grinding or polishing belts; Accessories therefor
    • B24B21/16—Machines or devices using grinding or polishing belts; Accessories therefor for grinding other surfaces of particular shape

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

Das relativ zum Werkzeug bewegte Werkstück (1) wird mit einem Werkzeug in Form einer streifenförmig ausgebildeten flexiblen Membran (5) bearbeitet, auf deren Rückseite Belastungselemente (7) mit einzeln ansteuerbarer Andruckkraft angeordnet sind. Die von den Belastungselementen (7) auf das Werkstück (1) ausgeübte Druckverteilung wird zeitlich, abhängig von der Position des Werkstücks (1) variiert. The workpiece (1) moved relative to the tool is moved with a Tool in the form of a strip-shaped flexible Diaphragm (5) processed, on the back of the load elements (7) are arranged with individually controllable pressing force. The exerted by the loading elements (7) on the workpiece (1) Pressure distribution is timed depending on the position of the Workpiece (1) varies.

Mit Hilfe des Verfahrens lassen sich große optische Elemente wie z.B. Teleskopspiegel und Glanzwinkeloptik für Röntgen­ teleskope schneller als mit den bisher bekannten Verfahren polieren, wobei auch nicht-rotationssymmetrische Fehler der Oberfläche beseitigt werden können. With the help of the method, large optical elements can be created such as. Telescope mirror and glossy angle optics for X-ray telescopes faster than with the previously known methods polish, including non-rotationally symmetrical errors of Surface can be eliminated.

EP87102822A 1986-12-22 1987-02-27 Method and apparatus for lapping or polishing optical surfaces Withdrawn EP0272362A3 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19863643914 DE3643914A1 (en) 1986-12-22 1986-12-22 METHOD AND DEVICE FOR LAPPING OR POLISHING OPTICAL SURFACES
DE3643914 1986-12-22

Publications (2)

Publication Number Publication Date
EP0272362A2 EP0272362A2 (en) 1988-06-29
EP0272362A3 true EP0272362A3 (en) 1990-05-02

Family

ID=6316884

Family Applications (1)

Application Number Title Priority Date Filing Date
EP87102822A Withdrawn EP0272362A3 (en) 1986-12-22 1987-02-27 Method and apparatus for lapping or polishing optical surfaces

Country Status (4)

Country Link
US (2) US4802309A (en)
EP (1) EP0272362A3 (en)
JP (1) JPS63162150A (en)
DE (1) DE3643914A1 (en)

Families Citing this family (69)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0661691B2 (en) * 1989-09-29 1994-08-17 オリンパス光学工業株式会社 Optical element polishing method and apparatus
US5029416A (en) * 1990-03-12 1991-07-09 Roberts Tiner E Electronic brake for lens generator device
DE69206676T2 (en) * 1991-05-10 1996-05-02 Hughes Aircraft Co Device for finishing a cone-like surface
US5230184A (en) * 1991-07-05 1993-07-27 Motorola, Inc. Distributed polishing head
EP0597709A1 (en) * 1992-11-12 1994-05-18 Hughes Aircraft Company Means and method for fabrication of grazing incidence optics
US5411617A (en) * 1993-04-26 1995-05-02 Hughes Aircraft Company Method for use in fabricating and/or testing a thin mirror
US5486129A (en) * 1993-08-25 1996-01-23 Micron Technology, Inc. System and method for real-time control of semiconductor a wafer polishing, and a polishing head
US5643060A (en) * 1993-08-25 1997-07-01 Micron Technology, Inc. System for real-time control of semiconductor wafer polishing including heater
US5658183A (en) * 1993-08-25 1997-08-19 Micron Technology, Inc. System for real-time control of semiconductor wafer polishing including optical monitoring
US5700180A (en) 1993-08-25 1997-12-23 Micron Technology, Inc. System for real-time control of semiconductor wafer polishing
US5477602A (en) * 1994-08-29 1995-12-26 Bosma Machine & Tool Corporation Method and apparatus for producing a radially and circularly contoured surface
US5575707A (en) * 1994-10-11 1996-11-19 Ontrak Systems, Inc. Polishing pad cluster for polishing a semiconductor wafer
IL113829A (en) 1995-05-23 2000-12-06 Nova Measuring Instr Ltd Apparatus for optical inspection of wafers during polishing
US7169015B2 (en) * 1995-05-23 2007-01-30 Nova Measuring Instruments Ltd. Apparatus for optical inspection of wafers during processing
US20070123151A1 (en) * 1995-05-23 2007-05-31 Nova Measuring Instruments Ltd Apparatus for optical inspection of wafers during polishing
GB9512262D0 (en) * 1995-06-16 1995-08-16 Bingham Richard G Tool for computer-controlled machine for optical polishing and figuring
NL1001418C2 (en) * 1995-10-13 1997-04-15 Tno Method and device for forming a rotationally symmetrical surface.
US5662518A (en) * 1996-05-03 1997-09-02 Coburn Optical Industries, Inc. Pneumatically assisted unidirectional conformal tool
US5928063A (en) * 1996-05-03 1999-07-27 Coburn Optical Industries, Inc. Pneumatically assisted unidirectional arcuate diaphragm conformal tool
US5947797A (en) * 1996-09-11 1999-09-07 Buzzetti; Mike Computer-controlled method for polishing
US5868896A (en) * 1996-11-06 1999-02-09 Micron Technology, Inc. Chemical-mechanical planarization machine and method for uniformly planarizing semiconductor wafers
DE19714672C1 (en) * 1997-04-09 1998-03-12 Georg Dipl Ing Weber Pressure beam for belt-type grinder
US5882243A (en) * 1997-04-24 1999-03-16 Motorola, Inc. Method for polishing a semiconductor wafer using dynamic control
US5827111A (en) * 1997-12-15 1998-10-27 Micron Technology, Inc. Method and apparatus for grinding wafers
JP4048396B2 (en) * 1998-04-21 2008-02-20 旭硝子株式会社 Pressing method and pressing device for plate-like material
US6302763B1 (en) 1998-06-29 2001-10-16 Mike Buzzetti Apparatus for polishing
US6454631B1 (en) 1998-06-29 2002-09-24 Mike Buzzetti Polishing apparatus and method
US7425250B2 (en) * 1998-12-01 2008-09-16 Novellus Systems, Inc. Electrochemical mechanical processing apparatus
US6468139B1 (en) 1998-12-01 2002-10-22 Nutool, Inc. Polishing apparatus and method with a refreshing polishing belt and loadable housing
US6103628A (en) 1998-12-01 2000-08-15 Nutool, Inc. Reverse linear polisher with loadable housing
US6589105B2 (en) 1998-12-01 2003-07-08 Nutool, Inc. Pad tensioning method and system in a bi-directional linear polisher
US6464571B2 (en) * 1998-12-01 2002-10-15 Nutool, Inc. Polishing apparatus and method with belt drive system adapted to extend the lifetime of a refreshing polishing belt provided therein
US6798579B2 (en) * 1999-04-27 2004-09-28 Optical Products Development Corp. Real imaging system with reduced ghost imaging
US6598976B2 (en) * 2001-09-05 2003-07-29 Optical Products Development Corp. Method and apparatus for image enhancement and aberration corrections in a small real image projection system, using an off-axis reflector, neutral density window, and an aspheric corrected surface of revolution
US6935747B2 (en) * 1999-04-27 2005-08-30 Optical Products Development Image enhancement and aberration corrections in a small real image projection system
US6110017A (en) * 1999-09-08 2000-08-29 Savoie; Marc Y. Method and apparatus for polishing ophthalmic lenses
WO2001018860A2 (en) * 1999-09-09 2001-03-15 Alliedsignal Inc. Improved apparatus and methods for integrated circuit planarization
US7824244B2 (en) * 2007-05-30 2010-11-02 Corning Incorporated Methods and apparatus for polishing a semiconductor wafer
US6607425B1 (en) * 2000-12-21 2003-08-19 Lam Research Corporation Pressurized membrane platen design for improving performance in CMP applications
US6776695B2 (en) 2000-12-21 2004-08-17 Lam Research Corporation Platen design for improving edge performance in CMP applications
DE10214333B4 (en) * 2002-03-28 2004-11-11 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Method and system for numerically controlled polishing of a workpiece
US6939203B2 (en) * 2002-04-18 2005-09-06 Asm Nutool, Inc. Fluid bearing slide assembly for workpiece polishing
US6918816B2 (en) 2003-01-31 2005-07-19 Adc Telecommunications, Inc. Apparatus and method for polishing a fiber optic connector
AU2003221014A1 (en) 2003-03-31 2004-10-25 Fujitsu Limited Machining method and machining device
DE10319945A1 (en) * 2003-05-02 2005-01-27 Loh Optikmaschinen Ag Tool for fine machining of optically effective surfaces
US7018273B1 (en) 2003-06-27 2006-03-28 Lam Research Corporation Platen with diaphragm and method for optimizing wafer polishing
US7648622B2 (en) * 2004-02-27 2010-01-19 Novellus Systems, Inc. System and method for electrochemical mechanical polishing
US20050221736A1 (en) * 2004-03-30 2005-10-06 Nikon Corporation Wafer polishing control system for chemical mechanical planarization machines
US6955588B1 (en) 2004-03-31 2005-10-18 Lam Research Corporation Method of and platen for controlling removal rate characteristics in chemical mechanical planarization
US7352938B2 (en) * 2004-06-14 2008-04-01 Adc Telecommunications, Inc. Drive for system for processing fiber optic connectors
US7068906B2 (en) * 2004-06-14 2006-06-27 Adc Telecommunications, Inc. Fixture for system for processing fiber optic connectors
US7209629B2 (en) * 2004-06-14 2007-04-24 Adc Telecommunications, Inc. System and method for processing fiber optic connectors
TW200846137A (en) * 2007-05-17 2008-12-01 Nat Univ Chung Cheng Low-stress polishing apparatus
JP5369478B2 (en) * 2008-04-11 2013-12-18 株式会社ニコン Polishing equipment
FR2932897B1 (en) * 2008-06-20 2010-07-30 Europ De Systemes Optiques Soc METHOD FOR FORMING AN ASPHERIC OPTICAL ELEMENT
KR101004435B1 (en) * 2008-11-28 2010-12-28 세메스 주식회사 Substrate polishing apparatus and method of polishing substrate using the same
JP5388212B2 (en) * 2009-03-06 2014-01-15 エルジー・ケム・リミテッド Lower unit for float glass polishing system
JP5408789B2 (en) * 2009-03-06 2014-02-05 エルジー・ケム・リミテッド Float glass polishing system
KR101170760B1 (en) * 2009-07-24 2012-08-03 세메스 주식회사 Substrate polishing apparatus
GB2477557A (en) * 2010-02-08 2011-08-10 Qioptiq Ltd Aspheric optical surface polishing tool with individually movable polishing pads
US8672730B2 (en) * 2010-12-23 2014-03-18 Exelis, Inc. Method and apparatus for polishing and grinding a radius surface on the axial end of a cylinder
JP6071335B2 (en) * 2011-09-05 2017-02-01 キヤノン株式会社 Processing apparatus and optical member manufacturing method
US9266212B2 (en) * 2013-02-05 2016-02-23 Silhouette Sander, LLC Sanding devices and methods
DE102014109654B4 (en) * 2014-07-10 2022-05-12 Carl Zeiss Jena Gmbh Devices for processing optical workpieces
DE102015008814A1 (en) * 2015-07-10 2017-01-12 Thielenhaus Technologies Gmbh Pressure shoe with expansion chamber
US9962805B2 (en) * 2016-04-22 2018-05-08 Taiwan Semiconductor Manufacturing Company, Ltd. Chemical mechanical polishing apparatus and method
JP6888476B2 (en) * 2016-08-23 2021-06-16 信越化学工業株式会社 Substrate manufacturing method
CN111975562B (en) * 2020-08-06 2022-04-19 江苏北特汽车零部件有限公司 Polishing device for automobile chassis parts
DE102020007920A1 (en) 2020-12-30 2022-06-30 SatisIoh GmbH METHOD AND DEVICE FOR FINISHING AXICONS, SUITABLE FINISHING MACHINE FOR THIS AND THEIR USE

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3589078A (en) * 1968-07-26 1971-06-29 Itek Corp Surface generating apparatus
FR2448417A1 (en) * 1979-02-09 1980-09-05 Inst Kosm I Control system to finish large optical surface - uses sensors to measure momentary work and tool coordinates to control tool pressures and dwell times
GB2163076A (en) * 1984-08-18 1986-02-19 Zeiss Stiftung Lapping and polishing optical surfaces
DE3509004A1 (en) * 1985-03-13 1986-09-25 Georg 8640 Kronach Weber Belt-grinding machine

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2399924A (en) * 1945-02-17 1946-05-07 Hayward Roger Device for grinding and polishing surfaces
US3167889A (en) * 1962-02-07 1965-02-02 Walter Jacobi & Sons Inc Apparatus for finishing wood and the like
US3676960A (en) * 1970-05-25 1972-07-18 Itek Corp Optical surface generating apparatus
DE2320345A1 (en) * 1973-04-21 1974-11-07 Karl Heesemann BELT SANDING MACHINE
SU683886A2 (en) * 1977-06-17 1979-09-05 Предприятие П/Я Г-4671 Multielement tool for grinding and polishing optical parts
US4512107A (en) * 1982-11-16 1985-04-23 The Perkin-Elmer Corporation Automated polisher for cylindrical surfaces

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3589078A (en) * 1968-07-26 1971-06-29 Itek Corp Surface generating apparatus
FR2448417A1 (en) * 1979-02-09 1980-09-05 Inst Kosm I Control system to finish large optical surface - uses sensors to measure momentary work and tool coordinates to control tool pressures and dwell times
GB2163076A (en) * 1984-08-18 1986-02-19 Zeiss Stiftung Lapping and polishing optical surfaces
DE3509004A1 (en) * 1985-03-13 1986-09-25 Georg 8640 Kronach Weber Belt-grinding machine

Also Published As

Publication number Publication date
US4802309A (en) 1989-02-07
DE3643914A1 (en) 1988-06-30
JPS63162150A (en) 1988-07-05
EP0272362A2 (en) 1988-06-29
US4850152A (en) 1989-07-25

Similar Documents

Publication Publication Date Title
EP0272362A3 (en) Method and apparatus for lapping or polishing optical surfaces
EP0259187A3 (en) Method and apparatus for grinding and polishing lenses on same machine spindle
NL7900298A (en) MIXTURE FOR POLISHING SILICON AND GERMANIUM, PROCEDURE FOR POLISHING A SURFACE OF SILICON OR GERMANIUM AND AN OBJECT WITH A SURFACE OF SILICON OR GERMANIUM, POLISHED BY THIS PROCESS.
JPS5339593A (en) Device for polishing or grinding optical surface
EP0706769A3 (en) Working height adjustment device for a table desktop or the like
EP1389505A3 (en) Polishing apparatus
EP0454362A3 (en) Backing pad, method for precision surface machining thereof, and method for polishing semiconductor wafer by use of the backing pad
EP0471641A3 (en) An apparatus for surface finishing
DE59000498D1 (en) METHOD FOR GALVANIC COATING OF SEGMENT SURFACES, THAT ARE ARRANGED ON THE SURFACE OF A BASIC BODY, AND A TOOL PRODUCED THEREFORE, IN PARTICULAR GRINDING WHEEL.
CA2036294A1 (en) Soft contact lens processing aid
IT8423136A0 (en) METALLIC SILICON PRODUCTION PROCEDURE SUITABLE FOR USE IN THE PHOTOVOLTAIC INDUSTRY.
FR1282633A (en) Method for inspecting the polish or paste quality of a transparent sheet
ATE6837T1 (en) FINISHING TOOL.
DE69323178D1 (en) POLISHING METHOD, DEVICE DETERMINED FOR THIS AND BAKING / POLISHING DISC
FR2330502A1 (en) Final polishing of optical lenses - uses polishing pad which is interposed between primary grinding surface and lens
JPS53132891A (en) Adapter for use in finishing surface of lens
SE8201948L (en) SET AND DEVICE FOR GRINDING CHECK
EP0127799A3 (en) Autoclave and method for bonding composite lenses
EP0180316A3 (en) Apparatus for use in spacing letters
IT7822776A0 (en) DEVICE FOR MEASURING THE INCLINATION ANGLE OF A SURFACE OF A WORKPIECE.
ES8407596A1 (en) Astigmatic optical element, its manufacturing process, illuminating apparatus including the same and articles treated by the same.
JPH05157940A (en) Automatically polishing machine for optical connector
JPS6445552A (en) Grinding device for rectangular frame
RU1815202C (en) Material for the polisher
EP0803326A3 (en) Polishing apparatus

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

AK Designated contracting states

Kind code of ref document: A2

Designated state(s): DE FR NL

PUAL Search report despatched

Free format text: ORIGINAL CODE: 0009013

AK Designated contracting states

Kind code of ref document: A3

Designated state(s): DE FR NL

17P Request for examination filed

Effective date: 19900323

17Q First examination report despatched

Effective date: 19910830

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN

18D Application deemed to be withdrawn

Effective date: 19921124

RIN1 Information on inventor provided before grant (corrected)

Inventor name: HEYNACHER, ERICH, DR.