EP0176862B1 - Electrostatic spray apparatus - Google Patents
Electrostatic spray apparatus Download PDFInfo
- Publication number
- EP0176862B1 EP0176862B1 EP85111763A EP85111763A EP0176862B1 EP 0176862 B1 EP0176862 B1 EP 0176862B1 EP 85111763 A EP85111763 A EP 85111763A EP 85111763 A EP85111763 A EP 85111763A EP 0176862 B1 EP0176862 B1 EP 0176862B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- movement
- workpieces
- electrostatic spraying
- spraying device
- electrostatic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
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- 239000007921 spray Substances 0.000 title description 12
- 239000007788 liquid Substances 0.000 claims abstract description 31
- 238000007590 electrostatic spraying Methods 0.000 claims abstract description 14
- 230000010355 oscillation Effects 0.000 claims abstract description 14
- 230000000737 periodic effect Effects 0.000 claims abstract description 12
- 239000004922 lacquer Substances 0.000 claims abstract description 7
- 239000011261 inert gas Substances 0.000 claims description 17
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 10
- 229910052757 nitrogen Inorganic materials 0.000 claims description 5
- 239000003973 paint Substances 0.000 description 18
- 238000005507 spraying Methods 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 238000000889 atomisation Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 238000007591 painting process Methods 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 235000012431 wafers Nutrition 0.000 description 4
- 230000005684 electric field Effects 0.000 description 3
- 230000003667 anti-reflective effect Effects 0.000 description 2
- 230000001427 coherent effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000004880 explosion Methods 0.000 description 2
- 230000002349 favourable effect Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000010422 painting Methods 0.000 description 2
- 239000002966 varnish Substances 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical group [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 230000005686 electrostatic field Effects 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 230000009931 harmful effect Effects 0.000 description 1
- 238000000265 homogenisation Methods 0.000 description 1
- 238000009688 liquid atomisation Methods 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 238000002604 ultrasonography Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B5/00—Electrostatic spraying apparatus; Spraying apparatus with means for charging the spray electrically; Apparatus for spraying liquids or other fluent materials by other electric means
- B05B5/08—Plant for applying liquids or other fluent materials to objects
- B05B5/082—Plant for applying liquids or other fluent materials to objects characterised by means for supporting, holding or conveying the objects
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B13/00—Machines or plants for applying liquids or other fluent materials to surfaces of objects or other work by spraying, not covered by groups B05B1/00 - B05B11/00
- B05B13/02—Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work
- B05B13/0221—Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work characterised by the means for moving or conveying the objects or other work, e.g. conveyor belts
- B05B13/0235—Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work characterised by the means for moving or conveying the objects or other work, e.g. conveyor belts the movement of the objects being a combination of rotation and linear displacement
Definitions
- the invention relates to an electrostatic spray device according to the preamble of claim 1.
- Such electrostatic spraying devices for paints are known, for example, from “Lueger Lexicon of Technology” Volume 9, L-Z, Deutsche Verlags-Anstalt Stuttgart, 1968, pp. 14 to 16.
- lacquers the forces occurring in an electrostatic high-voltage field are used to transport the droplets of lacquer to the workpiece, the atomization of the lacquer being carried out mechanically or likewise by means of electrical forces.
- the paint droplets in the high-voltage field are charged or ionized, i. H. they are moved along the lines of force of the field by electric field forces. This movement then ends on the workpiece surface, where the paint droplets discharge and cover the workpiece as a paint film.
- a method is further described which makes it possible to electrostatically apply a film, which consists of a certain material, to the inner surface of a hollow body.
- these are fluorescent powdery substances which, after application of a film of water, are applied to the inner surface of a lamp body to be coated under the action of an electrostatic field with the aid of translational and / or rotational movements.
- the movements mentioned here are relative movements between an application device and the recipient, here the lamp body. In other words, the relative movements associated with their timing are necessary in order to obtain the desired film layer uniformly at all points of the recipient. Statements about the material yield and quality of the film layer are only made insofar as the quality of the raw material provided is varied.
- liquids have to be applied to silicon wafers in such a way that a very thin and completely uniform, homogeneous film is formed over the entire surface.
- These liquids which are, for example, masking, doping and anti-reflective lacquers, have previously been applied by centrifugal processes or by dipping.
- these painting methods were unable to meet the requirements placed on the quality of the paint films in general and especially in solar technology.
- the invention has for its object to provide a device for painting workpieces, in particular silicon wafers, which enables the production of extremely thin, completely uniform, pore and crack-free paint films.
- the invention is based on the finding that extremely thin and completely uniform films can be produced when applying liquids by electrostatic spraying, provided the workpieces are subjected to a periodic translational and / or rotational movement in the form of a high-frequency vibration during the spraying process.
- the liquid droplets that initially hit the workpiece surface unite very quickly due to the periodic movement of the workpiece and thus form a coherent, uniform film within a very short time.
- closed and pore-free films can also be guaranteed with much smaller layer thicknesses than previously.
- varnishing silicon wafers a varnish yield of over 90% is achieved, whereas only varnish yields of at most 30% have been achieved in the previously used centrifugal processes.
- This high paint yield and the correspondingly low level of contamination of the electrostatic spraying device then made it possible to significantly increase the economy of the paint job.
- the electrostatic spraying device according to the invention can advantageously be used wherever very thin and completely uniform, homogeneous films are to be produced on the surface of workpieces.
- other areas of application include the application of adhesives, synthetic resins or lubricants.
- a periodic translational movement in the application direction of the liquid can be impressed on the workpieces by the movement device.
- Such a periodic translational movement aligned perpendicular to the workpiece surface has proven to be particularly favorable with regard to the acceleration of the film formation.
- the workpieces are impressed with a periodic translational movement that is normal to the direction of application of the liquid.
- a rotational movement can be impressed on the workpiece in order to accelerate the film formation by means of the movement device, the axis of rotation of which in the application direction of the liquid and centrally to the electrostatic high voltage field is aligned.
- the movement device is then preferably designed as a piezoelectric oscillation device, with which ultrasonic vibrations can be generated in a relatively simple manner.
- the movement device is then expediently coupled to a workpiece support via a vibration converter.
- the vibration can then be amplified according to the respective requirements with the help of the vibration converter.
- the vibration converter is attached to the underside of a horizontally oriented workpiece support.
- This horizontal arrangement has a particularly favorable effect on the uniformity of the film, in particular in the case of workpieces with flat surfaces, since this favors the unification of the paint droplets but prevents uneven flow.
- a plurality of inert gas jets can be directed onto the workpiece surface from an inert gas shower arranged at a distance from the workpiece surface. It is particularly economical if nitrogen can be supplied as an inert gas to the inert gas shower.
- the inert gas shower reduces the risk of explosion in some liquids to be applied.
- the inert gas shower prevents harmful effects of atmospheric oxygen on the liquid droplets and on the formation of the film on the workpiece surface.
- the workpiece W which is a silicon wafer
- a horizontally aligned workpiece support Wa is arranged on a horizontally aligned workpiece support Wa.
- a purely schematically illustrated movement device B which has the task of imparting a periodic translation and / or rotation movement to the workpiece support Wa and thus to the workpiece W during the painting process.
- the periodic translational movement can be an oscillation in the vertical direction or an oscillation in the horizontal direction, it also being possible to superimpose both forms of oscillation.
- An arrow R indicates that the workpiece support Wa can also be rotated about a vertically aligned, central axis of rotation Ra during the painting process.
- This rotational movement possibly superimposed on the translational movements Tv or Th, can be an oscillating rotary movement or a continuous rotation, but in the latter case one revolution per painting process should not be exceeded.
- the anti-reflective lacquer which is accommodated in the form of a liquid F in a storage container V, is fed via a line L to an atomizing device Z, which produces a mist of fine liquid droplets.
- a high-voltage generator H that can be set to different voltage values and has a maximum voltage of, for example, 100 kV is connected with its positive pole to the grounded workpiece support Wa and with its negative pole to the atomizing device Z and the storage container V. This creates an electrostatic high-voltage field between the atomizing device Z and the workpiece W electrically conductively connected to the workpiece support Wa, along the force lines K of which the negatively charged liquid droplets are specifically moved to the workpiece surface by the electrical field forces.
- the liquid droplets discharge there and combine to form a coherent film. Due to the periodic movement impressed on the workpiece W with the aid of the movement device B, the unification of the liquid droplets and the homogenization of the layer are greatly promoted, so that the painting process can be ended quickly and a very thin and completely uniform film is formed over the entire surface.
- FIG. 2 shows a first embodiment of an electrostatic paint spraying device, in which the movement device designated here B 'is designed as a piezoelectric oscillation device, which is coupled to the underside of the workpiece support Wa via a oscillation transducer Sw that serves to transmit and amplify oscillations.
- the piezoelectric oscillation device is connected to an ultrasound generator US, which can be set to frequencies between 20 and 100 kHz and whose feed lines are connected to an electrode E of the piezoceramic and the oscillation converter Sw.
- the piezoelectric oscillation device generates a high-frequency translation movement Tv acting in the vertical direction, which is transmitted to the workpiece W via the vibration transducer Sw designed as a solid aluminum part and the workpiece support Wa.
- the liquid F supplied via the line L from the storage container V drips down through the upper opening widening funnel T and then reaches the top of a rotating and horizontally aligned disc S.
- This disc S is driven by a magnetic coupling M and an air motor LM, which can be adjusted to a pressure of 20,000 to 70,000 rpm via a compressed air supply Pv with variable pressure can.
- the liquid droplets hitting the rotating disc S are thrown against the inner wall of the funnel T, which is connected to the negative pole of the high-frequency generator H.
- the liquid F then atomizes at the lower edge of the funnel T, since the electrical forces exceed the surface forces.
- the amount of liquid supplied to the lower edge of the funnel T as a fine film breaks down into individual small liquid droplets which are ionized and migrate along the force lines K of the high-voltage field between the spray edge of the funnel T and the workpiece W.
- the charge of the liquid droplets is very high, which leads to a degree of separation or a paint yield of well over 90%.
- FIG. 2 also shows an inert gas shower ID arranged above the spray edge of the funnel T, from which a large number of inert gas jets IS are directed onto the workpiece surface.
- This inert gas shower ID prevents on the one hand the risk of an explosion and on the other hand an oxidation of the finely atomized liquid droplets or of the film formed from these liquid droplets.
- Nitrogen from a nitrogen supply Sv is supplied to the inert gas shower ID as the inert gas, the pressure of which is set to, for example, 4 bar.
- FIG. 4 shows a second embodiment of an electrostatic paint spraying device, in which the movement device B 'already explained in connection with FIG. 2 is used again.
- the atomizing device Z 'used in this second embodiment comprises an automatic spray gun Sp with an extended spray tube Sr with radial spraying action.
- the spray gun Sp is supplied with the paint in the form of a liquid F via a first line and the spray air SI required for atomization via a second line.
- compressed air PI is introduced into a tube Ro concentrically surrounding the spray tube Sr for additional regulation of the spray jet.
- an inert gas in particular nitrogen, can also be introduced into the tube Ro, in order to produce effects similar to the inert gas shower ID shown in FIG.
- a ring electrode Re arranged around the gun outlet is connected to the negative pole of the high-voltage generator H, so that an electrostatic high-voltage field is generated between this ring electrode Re and the workpiece W, the lines of force of which are again denoted by K.
- the liquid droplets generated by the spray gun Sp are ionized by the corona effect on the lower edge of the ring electrode Re and reach the electrostatic high-voltage field as negatively charged floating particles, where they migrate along the lines of force K to the workpiece W, discharge there and a closed, form extremely thin and uniform homogeneous film.
Landscapes
- Electrostatic Spraying Apparatus (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Confectionery (AREA)
- Catching Or Destruction (AREA)
Abstract
Description
Die Erfindung betrifft eine elektrostatische Spritzeinrichtung nach dem Oberbegriff des Anspruchs 1.The invention relates to an electrostatic spray device according to the preamble of claim 1.
Derartige elektrostatische Spritzeinrichtungen für Lacke sind beispielsweise aus « Lueger Lexikon der Technik » Band 9, L-Z, Deutsche Verlags-Anstalt Stuttgart, 1968, S. 14 bis 16 bekannt. Zum Auftragen von Lacken werden die in einem elektrostatischen Hochspannungsfeld auftretenden Kräfte für den Transport der Lacktröpfchen zum Werkstück herangezogen, wobei die Zerstäubung des Lackes mechanisch oder ebenfalls mittels elektrischer Kräfte durchgeführt wird. Dabei besteht zwischen einer negativ gepolten Elektrode und dem positiv gepolten Werkstück eine Spannung von beispielsweise 100 bis 150 kV und dadurch ein Feld hoher elektrischer Feldstärke. Die sich in dem Hochspannungsfeld befindlichen Lacktröpfchen sind aufgeladen bzw. ionisiert, d. h. sie werden durch elektrische Feldkräfte längs der Kraftlinien des Feldes bewegt. Diese Bewegung endet dann an der Werkstückoberfläche, wo sich die Lacktröpfchen entladen und als Lackfilm das Werkstück bedecken.Such electrostatic spraying devices for paints are known, for example, from “Lueger Lexicon of Technology” Volume 9, L-Z, Deutsche Verlags-Anstalt Stuttgart, 1968, pp. 14 to 16. For the application of lacquers, the forces occurring in an electrostatic high-voltage field are used to transport the droplets of lacquer to the workpiece, the atomization of the lacquer being carried out mechanically or likewise by means of electrical forces. There is a voltage of, for example, 100 to 150 kV between a negatively polarized electrode and the positively polarized workpiece and thereby a field of high electric field strength. The paint droplets in the high-voltage field are charged or ionized, i. H. they are moved along the lines of force of the field by electric field forces. This movement then ends on the workpiece surface, where the paint droplets discharge and cover the workpiece as a paint film.
In der Druckschrift FR-A-1 272 250 wird weiterhin ein Verfahren beschrieben, das es ermöglicht elektrostatisch einen Film, der aus einem bestimmten Material besteht, auf der inneren Oberfläche eines hohlen Körpers aufzutragen. Dies sind in diesem Fall, insbesondere für die Glühlampenfertigung, floreszierende pulverförmige Substanzen, die nach einem Aufbringen eines Filmes aus Wasser auf die zu beschichtende innere Oberfläche eines Lampenkörpers unter der Wirkung eines elektrostatischen Feldes unter Zuhilfenahme von Translations- und/oder Rotationsbewegungen aufgetragen werden. Die genannten Bewegungen sind hierbei Relativbewegungen zwischen einer Auftragsvorrichtung und dem Rezipienten, hier dem Lampenkörper. Anders ausgedrückt sind die Relativbewegungen verbunden mit deren zeitlicher Steuerung notwendig, um die gewünschte Filmschicht an allen Stellen des Reszipienten gleichmäßig zu erhalten. Aussagen über Materialausbeute und Qualität der Filmschicht werden nur insofern getätigt, als die Qualität des bereitgestellten Ausgangsmateriales variiert wird.In the document FR-A-1 272 250 a method is further described which makes it possible to electrostatically apply a film, which consists of a certain material, to the inner surface of a hollow body. In this case, in particular for the manufacture of incandescent lamps, these are fluorescent powdery substances which, after application of a film of water, are applied to the inner surface of a lamp body to be coated under the action of an electrostatic field with the aid of translational and / or rotational movements. The movements mentioned here are relative movements between an application device and the recipient, here the lamp body. In other words, the relative movements associated with their timing are necessary in order to obtain the desired film layer uniformly at all points of the recipient. Statements about the material yield and quality of the film layer are only made insofar as the quality of the raw material provided is varied.
In der Halbleitertechnik und insbesondere auch in der Solartechnik müssen beispielsweise auf Siliziumscheiben Flüssigkeiten derart aufgetragen werden, daß sich über der gesamten Fläche ein sehr dünner und vollkommen gleichmäßiger, homogener Film bildet. Das Auftragen dieser Flüssigkeiten, bei welchen es sich beispielsweise um Abdeck-, Dotier- und Antireflexlacke handelt, erfolgte bisher durch Schleuderverfahren oder durch Tauchen. Durch diese Lackiermethoden konnten jedoch die in der Halbleitertechnik allgemein und Speziell auch in der Solartechnik an die Qualität der Lackfilme gestellten Anforderungen nicht erfüllt werden.In semiconductor technology and in particular in solar technology, for example, liquids have to be applied to silicon wafers in such a way that a very thin and completely uniform, homogeneous film is formed over the entire surface. These liquids, which are, for example, masking, doping and anti-reflective lacquers, have previously been applied by centrifugal processes or by dipping. However, these painting methods were unable to meet the requirements placed on the quality of the paint films in general and especially in solar technology.
Der Erfindung liegt die Aufgabe zugrunde, eine Einrichtung zum Lackieren von Werkstücken, insbesondere von Siliziumscheiben, zu schaffen, welche die Herstellung äußerst dünner, vollkommen gleichmäßiger, poren- und rißfreier Lackfilme ermöglicht.The invention has for its object to provide a device for painting workpieces, in particular silicon wafers, which enables the production of extremely thin, completely uniform, pore and crack-free paint films.
Diese Aufgabe wird bei einer gattungsgemäßen elektrostatischen Spritzeinrichtun'g durch die kennzeichnenden Merkmale des Anspruchs 1 gelöst.This object is achieved in a generic electrostatic spray device by the characterizing features of claim 1.
Der Erfindung liegt die Erkenntnis zugrunde, daß beim Auftragen von Flüssigkeiten durch elektrostatisches Spritzen äußerst dünne und vollkommen gleichmäßige Filme erzeugt werden können, sofern den Werkstücken während des Spritzvorganges eine periodische Translations- und/ oder Rotationsbewegung in Form einer hochfrequenten Schwingung aufgeprägt wird. Die auf der Werkstückoberfläche zunächst einzeln auftreffenden Flüssigkeitströpfchen vereinigen sich durch die periodische Bewegung des Werkstücks sehr rasch und bilden somit innerhalb kürzester Zeit einen zusammenhängenden, gleichmäßigen Film. Durch diese beschleunigte Filmbildung können dann aber auch bei wesentlich geringeren Schichtdicken als bisher geschlossene und porenfreie Filme gewährleistet werden. Außerdem wird beispielsweise beim Lackieren von Siliziumscheiben eine Lackausbeute von über 90 % erreicht, während bei den bisher gebräuchlichen Schleuderverfahren nur Lackausbeuten von allenfalls 30 % erreicht wurden. Durch diese hohe Lackausbeute und die entsprechend geringe Verunreinigung der elektrostatischen Spritzeinrichtung konnte dann auch die Wirtschaftlichkeit der Lackierung wesentlich gesteigert werden.The invention is based on the finding that extremely thin and completely uniform films can be produced when applying liquids by electrostatic spraying, provided the workpieces are subjected to a periodic translational and / or rotational movement in the form of a high-frequency vibration during the spraying process. The liquid droplets that initially hit the workpiece surface unite very quickly due to the periodic movement of the workpiece and thus form a coherent, uniform film within a very short time. Through this accelerated film formation, however, closed and pore-free films can also be guaranteed with much smaller layer thicknesses than previously. In addition, for example, when varnishing silicon wafers, a varnish yield of over 90% is achieved, whereas only varnish yields of at most 30% have been achieved in the previously used centrifugal processes. This high paint yield and the correspondingly low level of contamination of the electrostatic spraying device then made it possible to significantly increase the economy of the paint job.
Die erfindungsgemäße elektrostatische Spritzeinrichtung kann mit Vorteil überall dort eingesetzt werden, wo auf der Oberfläche von Werkstücken sehr dünne und vollkommen gleichmäßige, homogene Filme erzeugt werden sollen. Neben dem Auftragen von Lacken sind dabei als weitere Einsatzgebiete das Auftragen von Klebern, von Kunstharzen oder von Schmierstoffen zu nennen.The electrostatic spraying device according to the invention can advantageously be used wherever very thin and completely uniform, homogeneous films are to be produced on the surface of workpieces. In addition to the application of paints, other areas of application include the application of adhesives, synthetic resins or lubricants.
Gemäß einer weiteren Ausgestaltung der Erfindung ist den Werkstücken durch die Bewegungseinrichtung eine periodische Translationsbewegung in Auftragsrichtung der Flüssigkeit aufprägbar. Eine derartige senkrecht zur Werkstückoberfläche ausgerichtete periodische Translationsbewegung hat sich im Hinblick auf die Beschleunigung der Filmbildung als besonders günstig herausgestellt.According to a further embodiment of the invention, a periodic translational movement in the application direction of the liquid can be impressed on the workpieces by the movement device. Such a periodic translational movement aligned perpendicular to the workpiece surface has proven to be particularly favorable with regard to the acceleration of the film formation.
Es ist aber auch für die Filmbildung vorteilhaft, wenn den Werkstücken durch die Bewegungseinrichtung eine zur Auftragsrichtung der Flüssigkeit normale periodische Translationsbewegung aufgeprägt wird. Ferner kann dem Werkstück zur Beschleunigung der Filmbildung durch die Bewegungseinrichtung eine Rotationsbewegung aufgeprägt werden, deren Rotationsachse in Auftragsrichtung der Flüssigkeit und zentrisch zum elektrostatischen Hochspannungsfeld ausgerichtet ist.However, it is also advantageous for film formation if the workpieces are impressed with a periodic translational movement that is normal to the direction of application of the liquid. Furthermore, a rotational movement can be impressed on the workpiece in order to accelerate the film formation by means of the movement device, the axis of rotation of which in the application direction of the liquid and centrally to the electrostatic high voltage field is aligned.
Die Bewegungseinrichtung ist dann vorzugsweise als piezoelektrische Schwingeinrichtung ausgebildet, mit welcher auf relativ einfache Weise Ultraschallschwingungen erzeugt werden können.The movement device is then preferably designed as a piezoelectric oscillation device, with which ultrasonic vibrations can be generated in a relatively simple manner.
Die Bewegungseinrichtung ist dann zweckmäßigerweise über einen Schwingungswandler an eine Werkstückauflage angekoppelt. Die Schwingung kann dann mit Hilfe des Schwingungswandlers den jeweiligen Erfordernissen entsprechend verstärkt werden.The movement device is then expediently coupled to a workpiece support via a vibration converter. The vibration can then be amplified according to the respective requirements with the help of the vibration converter.
Gemäß einer weiteren besonders bevorzugten Ausgestaltung der Erfindung ist der Schwingungswandler an die Unterseite einer horizontal ausgerichteten Werkstückauflage angebracht. Diese horizontale Anordnung wirkt sich insbesondere bei Werkstücken mit ebenen Oberflächen auf die Gleichmäßigkeit des Films besonders günstig aus, da hierdurch die Vereinigung der Lacktröpfchen begünstigt aber ein ungleichmäßiges Verfließen verhindert wird.According to a further particularly preferred embodiment of the invention, the vibration converter is attached to the underside of a horizontally oriented workpiece support. This horizontal arrangement has a particularly favorable effect on the uniformity of the film, in particular in the case of workpieces with flat surfaces, since this favors the unification of the paint droplets but prevents uneven flow.
Weiterhin ist es zweckmäßig, wenn aus einer im Abstand zur Werkstückoberfläche angeordneten Inertgas-Dusche eine Vielzahl von Inertgas-Strahlen auf die Werkstückoberfläche richtbar ist. Besonders wirtschaftlich ist es dann, wenn der Inertgas-Dusche Stickstoff als Inertgas zuführbar ist. Die Inertgas-Dusche verringert dabei eine bei manchen aufzutragenden Flüssigkeiten bestehende Explosionsgefahr. Außerdem verhindert die Inertgas-Dusche schädliche Einwirkungen des Luftsauerstoffs auf die Flüssigkeitströpfchen und auf die Bildung des Films auf der Werkstückoberfläche.Furthermore, it is expedient if a plurality of inert gas jets can be directed onto the workpiece surface from an inert gas shower arranged at a distance from the workpiece surface. It is particularly economical if nitrogen can be supplied as an inert gas to the inert gas shower. The inert gas shower reduces the risk of explosion in some liquids to be applied. In addition, the inert gas shower prevents harmful effects of atmospheric oxygen on the liquid droplets and on the formation of the film on the workpiece surface.
Im folgenden werden Ausführungsbeispiele der Erfindung anhand der Zeichnung näher erläutert. Es zeigen :
- Figur 1 das Grundprinzip einer erfindungsgemäßen elektrostatischen Lackspritzeinrichtung,
- Figur 2 eine erste Ausführungsform einer elektrostatischen Lackspritzeinrichtung in stark vereinfachter schematischer Darstellung,
- Figur 3 das Prinzip der Lackzerstäubung bei der ersten Ausführungsform nach Figur 2 und
- Figur 4 eine zweite Ausführungsform einer elektrostatischen Lackspritzeinrichtung in stark vereinfachter schematischer Darstellung.
- 1 shows the basic principle of an electrostatic paint spraying device according to the invention,
- FIG. 2 shows a first embodiment of an electrostatic paint spraying device in a highly simplified schematic illustration,
- Figure 3 shows the principle of paint atomization in the first embodiment of Figure 2 and
- Figure 4 shows a second embodiment of an electrostatic paint spraying device in a highly simplified schematic representation.
Gemäß Figur 1 ist das Werkstück W, bei welchem es sich um eine Siliziumscheibe handelt, auf einer horizontal ausgerichteten Werkstückauflage Wa angeordnet. Unterhalb der Werkstückauflage Wa befindet sich eine rein schematisch dargestellte Bewegungseinrichtung B, welche die Aufgabe hat, der Werkstückauflage Wa und damit dem Werkstück W während des Lackiervorganges eine periodische Translations- und/oder Rotationsbewegung aufzuprägen. Dabei ist durch Doppelpfeile Tv und Th angedeutet, daß es sich bei der periodischen Translationsbewegung um eine Schwingung in vertikaler Richtung bzw. um eine Schwingung in horizontaler Richtung handeln kann, wobei auch eine Überlagerung beider Schwingungsformen möglich ist. Durch einen Pfeil R ist angedeutet, daß die Werkstückauflage Wa während des Lackiervorganges auch um eine vertikal ausgerichtete, zentrische Rotationsachse Ra gedreht werden kann. Bei dieser den Translationsbewegungen Tv bzw. Th ggf. überlagerten Rotationsbewegung kann es sich um eine oszillierende Drehbewegung oder um eine kontinuierliche Drehung handeln, wobei in letzterem Fall aber eine Umdrehung pro Lackiervorgang nicht überschritten werden sollte.According to FIG. 1, the workpiece W, which is a silicon wafer, is arranged on a horizontally aligned workpiece support Wa. Below the workpiece support Wa is a purely schematically illustrated movement device B, which has the task of imparting a periodic translation and / or rotation movement to the workpiece support Wa and thus to the workpiece W during the painting process. It is indicated by double arrows Tv and Th that the periodic translational movement can be an oscillation in the vertical direction or an oscillation in the horizontal direction, it also being possible to superimpose both forms of oscillation. An arrow R indicates that the workpiece support Wa can also be rotated about a vertically aligned, central axis of rotation Ra during the painting process. This rotational movement, possibly superimposed on the translational movements Tv or Th, can be an oscillating rotary movement or a continuous rotation, but in the latter case one revolution per painting process should not be exceeded.
Der in Form einer Flüssigkeit F in einem Vorratsbehälter V untergebrachte Antireflexlack wird über eine Leitung L einer Zerstäubungseinrichtung Z zugeführt, welche einen Nebel von feinen Flüssigkeitströpfchen erzeugt. Ein auf verschiedene Spannungswerte einstellbarer Hochspannungsgenerator H mit einer maximalen Spannung von beispielsweise 100 kV ist mit seinem positiven Pol an die geerdete Werkstückauflage Wa und mit seinem negativen Pol an die Zerstäubungseinrichtung Z und den Vorratsbehälter V angeschlossen. Hierdurch entsteht zwischen der Zerstäubungseinrichtung Z und dem elektrisch leitend mit der Werkstückauflage Wa verbundenen Werkstück W ein elektrostatisches Hochspannungsfeld, entlang dessen Kraftlinien K die negativ aufgeladenen Flüssigkeitströpfchen durch die elektrischen Feldkräfte gezielt zur Werkstückoberfläche bewegt werden. Dort entladen sich die Flüssigkeitströpfchen und vereinigen sich zu einem zusammenhängenden Film. Durch die mit Hilfe der Bewegungseinrichtung B dem Werkstück W aufgeprägte periodische Bewegung wird dabei die Vereinigung der Flüssigkeitströpfchen und die Vergleichmäßigung der Schicht stark begünstigt, so daß der Lackiervorgang rasch beendet werden kann und ein sehr dünner und vollkommen gleichmäßiger Film über der gesamten Fläche entsteht.The anti-reflective lacquer, which is accommodated in the form of a liquid F in a storage container V, is fed via a line L to an atomizing device Z, which produces a mist of fine liquid droplets. A high-voltage generator H that can be set to different voltage values and has a maximum voltage of, for example, 100 kV is connected with its positive pole to the grounded workpiece support Wa and with its negative pole to the atomizing device Z and the storage container V. This creates an electrostatic high-voltage field between the atomizing device Z and the workpiece W electrically conductively connected to the workpiece support Wa, along the force lines K of which the negatively charged liquid droplets are specifically moved to the workpiece surface by the electrical field forces. The liquid droplets discharge there and combine to form a coherent film. Due to the periodic movement impressed on the workpiece W with the aid of the movement device B, the unification of the liquid droplets and the homogenization of the layer are greatly promoted, so that the painting process can be ended quickly and a very thin and completely uniform film is formed over the entire surface.
Figur 2 zeigt eine erste Ausführungsform einer elektrostatischen Lackspritzeinrichtung, bei welcher die hier mit B' bezeichnete Bewegungseinrichtung afs piezoetektrische Schwingeinrichtung ausgebildet ist, welche über einen zur Schwingungsübertragung und Schwingungsverstärkung dienenden Schwingungswandler Sw an die Unterseite der Werkstückauflage Wa angekoppelt ist. Die piezoelektrische Schwingeinrichtung ist an einen Ultraschallgenerator US angeschlossen, der auf Frequenzen zwischen 20 und 100 kHz eingestellt werden kann und dessen Zuleitungen mit einer Elektrode E der Piezokeramik und dem Schwingungswandler Sw verbunden sind.FIG. 2 shows a first embodiment of an electrostatic paint spraying device, in which the movement device designated here B 'is designed as a piezoelectric oscillation device, which is coupled to the underside of the workpiece support Wa via a oscillation transducer Sw that serves to transmit and amplify oscillations. The piezoelectric oscillation device is connected to an ultrasound generator US, which can be set to frequencies between 20 and 100 kHz and whose feed lines are connected to an electrode E of the piezoceramic and the oscillation converter Sw.
Die piezoelektrische Schwingeinrichtung erzeugt eine in vertikaler Richtung wirkende hochfrequente Translationsbewegung Tv, welche über den als massives Aluminiumteil ausgebildeten Schwingungswandler Sw und die Werkstückauflage Wa auf das Werkstück W übertragen wird.The piezoelectric oscillation device generates a high-frequency translation movement Tv acting in the vertical direction, which is transmitted to the workpiece W via the vibration transducer Sw designed as a solid aluminum part and the workpiece support Wa.
Zur Erläuterung des Prinzips der Flüssigkeitszerstäubung in der Zerstäubungseinrichtung Z wird zusätzlich auf die Figur 3 verwiesen. Wie dort zu erkennen ist, tropft die über die Leitung L aus dem Vorratsbehälter V zugeführte Flüssigkeit F durch die obere Öffnung eines sich nach unten erweiternden Trichters T und gelangt dann auf die Oberseite einer rotierenden und horizontal ausgerichteten Scheibe S. Diese Scheibe S wird über eine Magnetkupplung M und einen Luftmotor LM angetrieben, welcher über eine Preßluftversorgung Pv mit variablem Druck auf 20 000 bis 70 000 U/min eingestellt werden kann. Die auf der rotierenden Scheibe S auftreffenden Flüssigkeitströpfchen werden gegen die Innenwandung des Trichters T geschleudert, welcher an den Minuspol des Hochfrequenzgenerators H angeschlossen ist. Durch rein elektrische Kräfte aufgeladen, zerstäubt die Flüssigkeit F dann an der unteren Kante des Trichters T, da die elektrischen Kräfte die Oberflächenkräfte übersteigen. Die der unteren Kante des Trichters T als feiner Film zugeführte Flüssigkeitsmenge zerfällt in einzelne kleine Flüssigkeitströpfchen, die ionisiert sind, und entlang der Kraftlinien K des Hochspannungsfeldes zwischen der Sprühkante des Trichters T und dem Werkstück W wandern. Die Aufladung der Flüssigkeitströpfchen ist dabei sehr hoch, was zu einem Abscheidegrad bzw. einer Lackausbeute von weit über 90 % führt.For an explanation of the principle of liquid atomization in the atomization device Z, reference is also made to FIG. 3. As can be seen there, the liquid F supplied via the line L from the storage container V drips down through the upper opening widening funnel T and then reaches the top of a rotating and horizontally aligned disc S. This disc S is driven by a magnetic coupling M and an air motor LM, which can be adjusted to a pressure of 20,000 to 70,000 rpm via a compressed air supply Pv with variable pressure can. The liquid droplets hitting the rotating disc S are thrown against the inner wall of the funnel T, which is connected to the negative pole of the high-frequency generator H. Charged by purely electrical forces, the liquid F then atomizes at the lower edge of the funnel T, since the electrical forces exceed the surface forces. The amount of liquid supplied to the lower edge of the funnel T as a fine film breaks down into individual small liquid droplets which are ionized and migrate along the force lines K of the high-voltage field between the spray edge of the funnel T and the workpiece W. The charge of the liquid droplets is very high, which leads to a degree of separation or a paint yield of well over 90%.
In Figur 2 ist ferner noch eine oberhalb der Sprühkante des Trichters T angeordnete Inertgas-Dusche ID zu erkennen, aus welcher eine Vielzahl von Inertgas-Strahlen IS auf die Werkstückoberfläche gerichtet werden. Diese Inertgas-Dusche ID verhindert einerseits die Gefahr einer Explosion und andererseits eine Oxydation der fein zerstäubten Flüssigkeitströpfchen bzw. des aus diesen Flüssigkeitströpfchen gebildeten Films. Als Inertgas wird der Inertgas-Dusche ID dabei Stickstoff aus einer Stickstoffversorgung Sv zugeführt, deren Druck auf beispielsweise 4 bar eingestellt wird.FIG. 2 also shows an inert gas shower ID arranged above the spray edge of the funnel T, from which a large number of inert gas jets IS are directed onto the workpiece surface. This inert gas shower ID prevents on the one hand the risk of an explosion and on the other hand an oxidation of the finely atomized liquid droplets or of the film formed from these liquid droplets. Nitrogen from a nitrogen supply Sv is supplied to the inert gas shower ID as the inert gas, the pressure of which is set to, for example, 4 bar.
Figur 4 zeigt eine zweite Ausführungsform einer elektrostatischen Lackspritzeinrichtung, bei welcher wieder die im Zusammenhang mit der Figur 2 bereits erläuterte Bewegungseinrichtung B' eingesetzt wird. Die bei dieser zweiten Ausführungsform verwendete Zerstäubungseinrichtung Z' umfaßt eine automatische Spritzpistole Sp mit verlängertem Spritzrohr Sr mit radialer Spritzwirkung. Der Spritzpistole Sp wird über eine erste Leitung der Lack in Form einer Flüssigkeit F und über eine zweite Leitung die für die Zerstäubung erforderliche Spritzluft SI zugeführt. Außerdem wird in ein das Spritzrohr Sr konzentrisch umgebendes Rohr Ro Preßluft PI zur zusätzlichen Regulierung des Spritzstrahles eingeleitet. Anstelle dieser Preßluft PI kann in das Rohr Ro aber auch ein Inertgas, insbesondere Stickstoff eingeleitet werden, um ähnliche Wirkungen wie die in Figur 2 dargestellte Inertgas-Dusche ID zu erzeugen. Eine um den Pistolenausgang angeordnete Ringelektrode Re ist an den Minuspol des Hochspannungsgenerators H angeschlossen, so daß zwischen dieser Ringelektrode Re und dem Werkstück W ein elektrostatisches Hochspannungsfeld erzeugt wird, dessen Kraftlinien wieder mit K bezeichnet sind. Die von der Spritzpistole Sp erzeugten Flüssigkeitströpfchen werden durch den Koronaeffekt an der Unterkante der Ringelektrode Re ionisiert und gelangen als negativ geladene Schwebeteilchen in das elektrostatische Hochspannungsfeld, wo sie entlang der Kraftlinien K zum Werkstück W wandern, sich dort entladen und auf der Oberfläche einen geschlossenen, äußerst dünnen und gleichmäßigen homogenen Film bilden.FIG. 4 shows a second embodiment of an electrostatic paint spraying device, in which the movement device B 'already explained in connection with FIG. 2 is used again. The atomizing device Z 'used in this second embodiment comprises an automatic spray gun Sp with an extended spray tube Sr with radial spraying action. The spray gun Sp is supplied with the paint in the form of a liquid F via a first line and the spray air SI required for atomization via a second line. In addition, compressed air PI is introduced into a tube Ro concentrically surrounding the spray tube Sr for additional regulation of the spray jet. Instead of this compressed air PI, an inert gas, in particular nitrogen, can also be introduced into the tube Ro, in order to produce effects similar to the inert gas shower ID shown in FIG. A ring electrode Re arranged around the gun outlet is connected to the negative pole of the high-voltage generator H, so that an electrostatic high-voltage field is generated between this ring electrode Re and the workpiece W, the lines of force of which are again denoted by K. The liquid droplets generated by the spray gun Sp are ionized by the corona effect on the lower edge of the ring electrode Re and reach the electrostatic high-voltage field as negatively charged floating particles, where they migrate along the lines of force K to the workpiece W, discharge there and a closed, form extremely thin and uniform homogeneous film.
Claims (9)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| AT85111763T ATE38947T1 (en) | 1984-09-20 | 1985-09-17 | ELECTROSTATIC SPRAYING EQUIPMENT. |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE3434561 | 1984-09-20 | ||
| DE3434561 | 1984-09-20 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP0176862A1 EP0176862A1 (en) | 1986-04-09 |
| EP0176862B1 true EP0176862B1 (en) | 1988-11-30 |
Family
ID=6245904
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP85111763A Expired EP0176862B1 (en) | 1984-09-20 | 1985-09-17 | Electrostatic spray apparatus |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP0176862B1 (en) |
| AT (1) | ATE38947T1 (en) |
| DE (1) | DE3566507D1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3919653A1 (en) * | 1989-06-16 | 1990-12-20 | Alfo Ag | Electrostatic spray gun with ring electrode - has pressure electrode formed as spray pipe coupled to flame quench gas source via valve |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB8715035D0 (en) * | 1987-06-26 | 1987-08-05 | Sansome D H | Spray depositing of metals |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1272250A (en) * | 1960-10-25 | 1961-09-22 | Gen Electric Co Ltd | Process for forming internal coatings on hollow containers |
| CH615356A5 (en) * | 1976-04-07 | 1980-01-31 | Kreuzig Franz | Apparatus for uniform spraying of thin-layer plates with reagents for quantitative thin-layer chromatography |
| US4197000A (en) * | 1978-05-23 | 1980-04-08 | Fsi Corporation | Positive developing method and apparatus |
| DE3122204C2 (en) * | 1981-06-04 | 1983-03-03 | Erich 8000 München Ortmeier | Process for the electrostatic application of powdery substances on workpieces and coating booth for carrying out the process |
-
1985
- 1985-09-17 DE DE8585111763T patent/DE3566507D1/en not_active Expired
- 1985-09-17 EP EP85111763A patent/EP0176862B1/en not_active Expired
- 1985-09-17 AT AT85111763T patent/ATE38947T1/en not_active IP Right Cessation
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3919653A1 (en) * | 1989-06-16 | 1990-12-20 | Alfo Ag | Electrostatic spray gun with ring electrode - has pressure electrode formed as spray pipe coupled to flame quench gas source via valve |
Also Published As
| Publication number | Publication date |
|---|---|
| DE3566507D1 (en) | 1989-01-05 |
| EP0176862A1 (en) | 1986-04-09 |
| ATE38947T1 (en) | 1988-12-15 |
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