EP0154797A2 - Manufacturing process for multichannel plates, and their use - Google Patents

Manufacturing process for multichannel plates, and their use Download PDF

Info

Publication number
EP0154797A2
EP0154797A2 EP85101038A EP85101038A EP0154797A2 EP 0154797 A2 EP0154797 A2 EP 0154797A2 EP 85101038 A EP85101038 A EP 85101038A EP 85101038 A EP85101038 A EP 85101038A EP 0154797 A2 EP0154797 A2 EP 0154797A2
Authority
EP
European Patent Office
Prior art keywords
produced
mold
channel
channels
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP85101038A
Other languages
German (de)
French (fr)
Other versions
EP0154797B1 (en
EP0154797A3 (en
Inventor
Erwin Prof. Dr. Becker
Wolfgang Dr. Ehrfeld
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Forschungszentrum Karlsruhe GmbH
Original Assignee
Kernforschungszentrum Karlsruhe GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kernforschungszentrum Karlsruhe GmbH filed Critical Kernforschungszentrum Karlsruhe GmbH
Priority to AT85101038T priority Critical patent/ATE37757T1/en
Publication of EP0154797A2 publication Critical patent/EP0154797A2/en
Publication of EP0154797A3 publication Critical patent/EP0154797A3/en
Application granted granted Critical
Publication of EP0154797B1 publication Critical patent/EP0154797B1/en
Expired legal-status Critical Current

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J43/00—Secondary-emission tubes; Electron-multiplier tubes
    • H01J43/04—Electron multipliers
    • H01J43/06—Electrode arrangements
    • H01J43/18—Electrode arrangements using essentially more than one dynode
    • H01J43/24—Dynodes having potential gradient along their surfaces
    • H01J43/246—Microchannel plates [MCP]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/12—Manufacture of electrodes or electrode systems of photo-emissive cathodes; of secondary-emission electrodes
    • H01J9/125—Manufacture of electrodes or electrode systems of photo-emissive cathodes; of secondary-emission electrodes of secondary emission electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2201/00—Electrodes common to discharge tubes
    • H01J2201/32—Secondary emission electrodes

Definitions

  • the invention relates to a method for producing multi-channel plates for amplifying optical images or other areal signal distributions by means of secondary electron multiplication, and to the use of a stack of multi-channel plates produced by this method.
  • multi-channel image intensifier plate also name: channel multiplier plate, multi- or micro-channel plate. It consists of an approximately 1 mm thick glass plate enclosed in an evacuated vessel, which is penetrated perpendicularly or obliquely to the surface by many closely adjacent channels of approximately 30 micrometers in diameter. Through the use of glasses containing lead oxide and a post-treatment with reducing gases at elevated temperature, the inner surfaces of the channels are rendered weakly electrically conductive. By applying a voltage of approximately 1000 volts between the metal-coated surfaces of the plate, a potential gradient is generated in the channels, whereby each channel is given the properties of a secondary electron multiplier.
  • An inclination of the channels favors the collision of the primary particles with the channel walls and thus the desired electron release.
  • it enables the construction of a plate stack with a zigzag-shaped channel structure, which increases the unwanted acceleration of parasitic Ions suppressed.
  • a similar effect can be achieved by a weak curvature of the channels.
  • metal core process a fine, uniform wire is coated with heated glass and wrapped around a polygonal drum. Individual blocks are cut out of the winding and the glass coatings of the wires are melted together. The block is then cut into thin slices, from which the wire cores are removed by etching.
  • a major disadvantage of the metal core process described is seen in the fact that the metal cores and thus the channels have uniform diameters, but their distances differ greatly from one another.
  • fine parallel grooves are etched into the surfaces of thin glass plates by photolithography.
  • the plates are stacked so that the grooves of plates lying on top of one another together form the desired channels.
  • the plates are melted into blocks from which the multi-channel plates are then cut.
  • the distance der'Rillen can be regulated exactly at the p hotolithographischen etching. You can also use this method to make the channels relatively slightly curved or zigzag.
  • the width and depth of the grooves can hardly be controlled during the etching and the melting process. The result is that the multi-channel plates the picture distorted so much during amplification that the method was eventually abandoned.
  • multi-channel plates are usually manufactured using the so-called double-drawing process: hollow glass cylinders or glass cylinders filled with a more soluble glass are drawn out into glass threads, which are bundled, fused and further drawn out, after which the processes of bundling and fusing are repeated. The final bundle is cut into approximately 1 mm thick plates, from which are dissolved out to a diameter of about 30 / um pulled cores made of light soluble glass. Due to the manufacturing principle, certain variations in the cross-sections and positions of the ducts must also be accepted in the double drawing process.
  • the scatter in the cross sections and positions of the channels in the known multi-channel plates prevents or complicates the exact assignment of other optical and / or electrical components produced using methods of microfabrication to individual channels or channel groups of the image intensifier. However, such an assignment is important, for example, for the separate electrical further processing of the electrical currents supplied by the individual channels or channel groups.
  • the scatter in the cross sections and positions of the channels in the previously known multi-channel plates is also responsible for the fact that in the construction of a plate stack mentioned at the outset zigzag-shaped channel structure result in significant losses in resolution.
  • Layered multi-channel plates for image intensifiers with dynodes in the form of perforated dynode plates are known from DE-OS 31 50 257 and DE-PS 24 14 658, in which photo-etching technology is proposed as the preferred method for producing the channel system.
  • the dynode material e.g. a BeCu alloy, etched.
  • This technique good results are achieved in practice if the diameter of the channels and the thickness of the dynode are approximately the same (see column 3, lines 5 to 10 of DE-PS 24 14 658).
  • the photoetching technique can no longer be used with the desired success. (see also Spectrum of Science, Jan. 1982, left column, lines 26ff).
  • the object of the invention is to demonstrate a method for producing multi-channel plates of the generic type and their use, in which the thickness of the plates is a multiple of the channel diameter given precisely specified cross sections and positions of the individual channels can.
  • the cross-sectional shapes and the positions of the individual channels can be specified with a tolerance of the order of magnitude of one micrometer even in the case of relatively thick multi-channel plates.
  • the method also has the advantage that it has a particularly large ratio of the sum of the channel cross-sectional areas to the total area the plate ie a particularly high transparency of the multi-channel plates can be achieved.
  • Both corpuscular rays and electromagnetic waves in particular the X-rays (synchrotron radiation) generated by an electron synchrotron, can be considered as high-energy radiation. While one uses masks in a known manner when using electromagnetic waves to produce the desired structures, the structure can also be generated by electromagnetic control when using corpuscular beams.
  • the material for the production of the multichannel positive molds according to claim 1 or the primary multichannel positive molds according to claim 2 depends on the type of high-energy radiation, corresponding regulations being, for example, DE-PS 29 22 642 and DE-OS 32 21 981 can be removed.
  • the metallic multi-channel negative mold is produced by galvanic molding of the multi-channel positive mold connected to a metal electrode.
  • the metal electrode can be used as the base plate of the metallic multi-channel negative mold.
  • it is also possible to continue the galvanic deposition of metal until the multichannel positive form is covered by a continuous metal layer which, optionally after smoothing its surface, is used as the base plate of the metallic multichannel negative form.
  • a suitable choice of the electrode material possibly in connection with a passivation of its surface, can prevent the electroplating from adhering to the electrode in a known manner. It is then possible to Separate positive form together with the electrode connected to it from the generated multichannel negative form without damage, which makes repeated use of the multichannel positive form possible.
  • the glass containing lead oxide used to manufacture the previously known multi-channel plates can be used to fill the metallic multi-channel negative mold.
  • the glass can be melted or sintered in using glass powder.
  • other electrically non-conductive or only weakly conductive ones are used for filling
  • Materials for example A1203 powder, in question, which can also be sintered together at a higher temperature to a shape-retaining body.
  • the aftertreatment with H 2 which is customary in the case of lead oxide-containing glasses may have to be replaced by another aftertreatment, for example using the known CVD method ("chemical vapor deposition").
  • the method of the invention can be modified in accordance with claim 2, details of which can be found, for example, in DE-PS 32 06 820.4.
  • Non-adhesive reactive resins are particularly suitable as impression materials.
  • multi-channel plates produced according to the invention can be inclined to the plate surface Channels are also stacked together so that there are zigzag channel structures. While in the case of stacking of known multichannel plates, losses in spatial resolution have to be accepted due to the inevitable scatter in the cross sections and positions of the channels, the stacking in the multichannel plates produced according to the invention can be carried out by mutually aligning the channel openings while largely avoiding this disadvantage.
  • a 0.5 mm thick plate 1 made of polymethyl methacrylate (PMMA) serves as the starting material for the production of the multi-channel positive mold, which is firmly adhered to a metallic base plate 2 made of an iron-nickel alloy and serving as an electrode.
  • the PMMA plate 1 is irradiated with synchrotron radiation 3 via an X-ray mask, which is directed obliquely to the surfaces of the PMMA plate and the X-ray mask.
  • the X-ray mask consists of a carrier 4, which only weakly absorbs the X-ray radiation, and a grid-like absorber 5, which strongly absorbs the X-radiation, by means of which the cross-sectional shapes and the positions of the channels are specified.
  • the PMMA in the regions 6 not covered by the absorber is chemically changed.
  • the irradiated areas 6 are removed by introducing the PMMA into a developer solution, so that a multi-channel positive mold 7 with channel-shaped openings 8 according to FIG. 3 is produced.
  • a mixture of a substance from the glycol ether group, a substance from the primary amines, is used as the developer solution and water and a substance of the azine group according to DE-OS 30 39 110 used.
  • the channel-shaped openings 8 have a hexagonal cross-sectional shape with a width of approximately 30 ⁇ m, the thickness of the walls 8a is approximately 3 ⁇ m.
  • an iron-nickel alloy is electrodeposited into the channel-shaped openings 8, column-like structures 9 being formed from this alloy on the electrically conductive base plate 2 in the grid-shaped multi-channel positive form 7.
  • the multichannel positive form is then removed by dissolving in a solvent, so that a metallic negative form of the multichannel plate according to FIG. 5 is exposed.
  • the spaces 10 between the columnar structures 9 of the metallic negative form are filled with a lead glass melt 11 under vacuum (FIG. 6).
  • a lead glass melt 11 under vacuum FOG. 6
  • the iron-nickel alloy mentioned above it can be ensured that the lead glass and the alloy have approximately the same thermal expansion coefficient; so that the stresses that occur during cooling do not lead to cracking in the glass.
  • the structure consisting of glass 11 and metal 9 is finally ground and the metal 9 is removed by dissolving it in a selective etching.
  • the multi-channel plate provided with the openings 12 is finally covered in a known manner by sputtering metal on both sides with thin conductive layers 13, while the inner surfaces of the channels are made electrically weakly conductive by heating in hydrogen (FIG. 7).
  • the primary metallic negative shape which corresponds to the shape shown in FIG. 5, is filled with a reaction resin which does not adhere to the metal as an impression material beyond the columnar structures of the metallic negative shapes.
  • the reaction resin has hardened, the secondary multichannel positive form formed therefrom and the primary metallic negative form are separated from one another, whereupon the secondary multichannel positive form is firmly attached with the side having the openings to a metallic base plate serving as an electrode.
  • the secondary multi-channel positive form closed on the top is then removed to such an extent that the channel openings are exposed.
  • Subsequent galvanic molding produces secondary metallic negative shapes, which in turn correspond to the shape shown in FIG. 5.
  • the production of the multi-channel plate is continued in accordance with the production steps already explained with reference to FIGS. 6 and 7.
  • the secondary multichannel positive molds made from the reaction resin can also be repeatedly electroplated.
  • a thin release agent film is applied in a known manner by immersion in a release agent solution.

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Electron Tubes For Measurement (AREA)
  • Blow-Moulding Or Thermoforming Of Plastics Or The Like (AREA)
  • Paper (AREA)

Abstract

A method for producing a multichannel plate containing a plurality of generally parallel channels for use in structures for amplifying or converting optical images or other two-dimensional signal patterns by secondary electron multiplication, which method includes: producing a positive mold of the plate, by the steps of: (i) providing a body having the external shape of the plate to be produced and made of a material whose ability to be removed from the body is altered by exposure to a selected radiation; (ii) irradiating the body with the selected radiation in a pattern corresponding to the plate to be produced and in a manner to render the portions of the body corresponding to the channels more easily removable than the remaining portions of the body; and (iii) removing the more easily removable portions of the body; forming a metal negative mold, by the steps of: (i) attaching the positive mold to a metal electrode; (ii) electrolytically depositing metal on the electrode and in the openings created in the positive mold by said step of removing more easily removable portions; and (iii) removing the positive mold from the deposited metal; and forming the multichannel plate from the negative mold.

Description

Die Erfindung betrifft ein Verfahren zur Herstellung von Vielkanalplatten für die Verstärkung von optischen Bildern oder anderen flächenhaften Signalverteilungen mittels Sekundärelektronenvervielfachung sowie die Verwendung eines nach diesem Verfahren hergestellten Stapels von Vielkanalplatten.The invention relates to a method for producing multi-channel plates for amplifying optical images or other areal signal distributions by means of secondary electron multiplication, and to the use of a stack of multi-channel plates produced by this method.

Es ist bekannt, optische Bilder oder andere flächenhafte Signalverteilungen mit einer sogenannten Vielkanal-Bildverstärkerplatte (andere Bezeichnung: Kanal-Vervielfacherplatte, Multi- bzw. Micro-Channel-Plate) zu verstärken. Sie besteht aus einer etwa 1 mm dicken in einem evakuierten Gefäß eingeschlossenen Glasplatte, die senkrecht oder schräg zur Oberfläche von vielen eng benachbarten Kanälen von etwa 30 Mikrometer Durchmesser durchsetzt ist. Durch Verwendung Bleioxyd-haltiger Gläser und eine Nachbehandlung mit reduzierenden Gasen bei erhöhter Temperatur sind die inneren Oberflächen der Kanäle schwach elektrisch leitend gemacht. Durch Anlegen einer Spannung von etwa 1000 Volt zwischen den mit Metallüberzügen versehenen Oberflächen der Platte wird in den Kanälen ein Potentialgefälle erzeugt, wodurch jeder Kanal die Eigenschaften eines Sekundärelektronenvervielfachers erhält. Eine Schrägstellung der Kanäle begünstigt die Kollision der Primärteilchen mit den Kanalwänden und damit die gewünschte Elektronenauslösung. Daneben ermöglicht sie den Aufbau eines Plattenstapels mit zick-zack-förmiger Kanalstruktur, die die unerwünschte Beschleunigung parasitärer Ionen unterdrückt. Eine ähnliche Wirkung kann durch eine schwache Krümmung der Kanäle erreicht werden.It is known to amplify optical images or other areal signal distributions with a so-called multi-channel image intensifier plate (other name: channel multiplier plate, multi- or micro-channel plate). It consists of an approximately 1 mm thick glass plate enclosed in an evacuated vessel, which is penetrated perpendicularly or obliquely to the surface by many closely adjacent channels of approximately 30 micrometers in diameter. Through the use of glasses containing lead oxide and a post-treatment with reducing gases at elevated temperature, the inner surfaces of the channels are rendered weakly electrically conductive. By applying a voltage of approximately 1000 volts between the metal-coated surfaces of the plate, a potential gradient is generated in the channels, whereby each channel is given the properties of a secondary electron multiplier. An inclination of the channels favors the collision of the primary particles with the channel walls and thus the desired electron release. In addition, it enables the construction of a plate stack with a zigzag-shaped channel structure, which increases the unwanted acceleration of parasitic Ions suppressed. A similar effect can be achieved by a weak curvature of the channels.

Für die Vielkanalplatten sind mehrere Herstellungsverfahren bekannt: vgl. z.B. Michael Lampton, Spektrum der Wissenschaften, Januar 1982, S.44-55, aus Scientific American, November 1981 .Auch die Verwendung von solchen Vielkanalplatten ist aus dieser Literaturstelle bekannt.Several manufacturing processes are known for the multi-channel plates: cf. e.g. Michael Lampton, Spectrum of Sciences, January 1982, pp. 44-55, from Scientific American, November 1981. The use of such multi-channel plates is also known from this reference.

Beim sog. Metallkernverfahren wird ein feiner, gleichmäßiger Draht mit erhitztem Glas beschichtet und um eine polygonale Trommel gewickelt. Aus der Wicklung schneidet man einzelne Blöcke heraus und verschmilzt die Glasüberzüge der Drähte miteinander. Anschließend wird der Block in dünne Scheiben zerschnitten, aus denen man die Drahtkerne durch Ätzen entfernt. Ein wesentlicher Nachteil des beschriebenen Metallkernverfahrens wird in der Tatsache gesehen, daß die Metallkerne und damit die Kanäle zwar einheitliche Durchmesser haben, ihre Abstände aber stark voneinander abweichen.In the so-called metal core process, a fine, uniform wire is coated with heated glass and wrapped around a polygonal drum. Individual blocks are cut out of the winding and the glass coatings of the wires are melted together. The block is then cut into thin slices, from which the wire cores are removed by etching. A major disadvantage of the metal core process described is seen in the fact that the metal cores and thus the channels have uniform diameters, but their distances differ greatly from one another.

Bei einem anderen Herstellungsverfahren ätzt man auf photolithographischem Weg feine parallele Rillen in die Oberflächen dünner Glasplatten. Die Platten werden so gestapelt, daß die Rillen aufeinanderliegender Platten gemeinsam die gewünschten Kanäle bilden. Danach werden die Platten zu Blöcken zusammengeschmolzen aus denen dann die Vielkanalplatten geschnitten werden. Für diese Methode spricht, daß sich der Abstand der'Rillen bei der photolithographischen Ätzung genau regulieren läßt. Auch kann man nach dieser Methode die Kanäle relativ leicht gekrümmt oder zickzackförmig herstellen. Allerdings zeigte sich, daß Breite und Tiefe der Rillen während der Ätzung und des Schmelzprozesses kaum zu kontrollieren sind. Die Folge ist, daß die Vielkanalplatten das Bild bei der Verstärkung so stark verzerren, daß man das Verfahren schließlich aufgeben mußte.In another manufacturing process, fine parallel grooves are etched into the surfaces of thin glass plates by photolithography. The plates are stacked so that the grooves of plates lying on top of one another together form the desired channels. Then the plates are melted into blocks from which the multi-channel plates are then cut. In favor of this method is that the distance der'Rillen can be regulated exactly at the p hotolithographischen etching. You can also use this method to make the channels relatively slightly curved or zigzag. However, it was found that the width and depth of the grooves can hardly be controlled during the etching and the melting process. The result is that the multi-channel plates the picture distorted so much during amplification that the method was eventually abandoned.

Heute werden Vielkanalplatten gewöhnlich nach dem sogenannten Doppelziehverfahren hergestellt: Dabei werden hohle oder mit einem leichter löslichen Glas gefüllte Glaszylinder zu Glasfäden ausgezogen, die gebündelt, verschmolzen und weiter ausgezogen werden, wonach die Vorgänge des Bündelns .und Verschmelzens wiederholt werden. Das endgültige Bündel wird in etwa 1 mm dicke Platten zerschnitten, aus denen die auf einen Durchmesser von etwa 30/um heruntergezogenenKerne aus leichter löslichem Glas herausgelöst werden. Auch beim Doppelziehverfahren müssen aufgrund des Herstellungsprinzips gewisse Streuungen in den Querschnitten und Positionen der Kanäle in Kauf genommen werden.Today, multi-channel plates are usually manufactured using the so-called double-drawing process: hollow glass cylinders or glass cylinders filled with a more soluble glass are drawn out into glass threads, which are bundled, fused and further drawn out, after which the processes of bundling and fusing are repeated. The final bundle is cut into approximately 1 mm thick plates, from which are dissolved out to a diameter of about 30 / um pulled cores made of light soluble glass. Due to the manufacturing principle, certain variations in the cross-sections and positions of the ducts must also be accepted in the double drawing process.

Die Streuung in den Querschnitten und Positionen der Kanäle bei den vorbekannten Vielkanalplatten verhindert oder erschwert die genaue Zuordnung von anderen mit Methoden der Mikrofertigung hergestellten optischen und/oder elektrischen Bauteilen zu einzelnen Kanälen oder Kanalgruppen des Bildverstärkers. Eine solche Zuordnung ist aber beispielsweise für die getrennte elektrische Weiterverarbeitung der von den einzelnen Kanälen oder Kanalgruppen gelieferten elektrischen Ströme von Bedeutung. Die Streuung in den Querschnitten und Positionen der Kanäle bei den vorbekannten Vielkanalplatten ist auch dafür verantwortlich, daß sich bei dem eingangs erwähnten Aufbau eines Plattenstapels mit zick-zack-förmiger Kanalstruktur erhebliche Verluste im Auflösungsvermögen ergeben.The scatter in the cross sections and positions of the channels in the known multi-channel plates prevents or complicates the exact assignment of other optical and / or electrical components produced using methods of microfabrication to individual channels or channel groups of the image intensifier. However, such an assignment is important, for example, for the separate electrical further processing of the electrical currents supplied by the individual channels or channel groups. The scatter in the cross sections and positions of the channels in the previously known multi-channel plates is also responsible for the fact that in the construction of a plate stack mentioned at the outset zigzag-shaped channel structure result in significant losses in resolution.

Aus der DE-OS 31 50 257 und der DE-PS 24 14 658 sind geschichtete Vielkanalplatten für Bildverstärker mit Dynoden in Form von perforierten Dynodenplatten bekannt, bei denen als bevorzugtes Verfahren für die Herstellung des Kanalsystems die Photoätztechnik vorgeschlagen wird. Dabei wird durch belichtete und entwickelte Photolackmasken hindurch das Dynodenmaterial,z.B. eine BeCu-Legierung, geätzt. Mit dieser Technik werden in der Praxis gute Ergebnisse erzielt, wenn die Durchmesser der Kanäle und die Dicke der Dynode ungefähr gleich sind (s. Spalte 3, Zeilen 5 bis 10 der DE-PS 24 14 658). Bei Vielkanalplatten, deren Dicke erheblich größer ist als der Durchmesser der einzuarbeitenden Kanäle, läßt sich die Photoätztechnik nicht mehr mit dem gewünschten Erfolg anwenden. (s.a. Spektrum der Wissenschaft, Jan. 1982,linke Spalte, Zeilen 26ff).Layered multi-channel plates for image intensifiers with dynodes in the form of perforated dynode plates are known from DE-OS 31 50 257 and DE-PS 24 14 658, in which photo-etching technology is proposed as the preferred method for producing the channel system. The dynode material, e.g. a BeCu alloy, etched. With this technique, good results are achieved in practice if the diameter of the channels and the thickness of the dynode are approximately the same (see column 3, lines 5 to 10 of DE-PS 24 14 658). With multi-channel plates, the thickness of which is considerably greater than the diameter of the channels to be incorporated, the photoetching technique can no longer be used with the desired success. (see also Spectrum of Science, Jan. 1982, left column, lines 26ff).

Ausgehend von dem zuletzt erörterten Stande der Technik liegt der Erfindung die Aufgabe zugrunde, ein Verfahren zur Herstellung von Vielkanalplatten der gattungsgemäßen Art sowie-deren Verwendung aufzuzeigen, bei dem bei genau vorgegebenen Querschnitten und Positionen der einzelnen Kanäle die Dicke der Platten ein vielfaches der Kanaldurchmesser betragen kann.Starting from the last discussed prior art, the object of the invention is to demonstrate a method for producing multi-channel plates of the generic type and their use, in which the thickness of the plates is a multiple of the channel diameter given precisely specified cross sections and positions of the individual channels can.

Diese Aufgabe wird durch die im Kennzeichen des Anspruchs 1 angegebenen Merkmale gelöst.This object is achieved by the features specified in the characterizing part of claim 1.

Mit dem erfindungsgemäßen Herstellungsverfahren lassen sich auch bei relativ dicken Vielkanalplatten die Querschnittsformen und die Positionen der einzelnen Kanäle mit einer Toleranz in der Größenordnung von einem Mikrometer vorgeben. Das Verfahren hat darüber hinaus den Vorteil, daß mit ihm ein besonders großes Verhältnis von Summe der Kanalquerschnittsflächen zur Gesamtfläche der Platte d.h. eine besonders hohe Transparenz der Vielkanalplaate erreicht werden kann.With the manufacturing method according to the invention, the cross-sectional shapes and the positions of the individual channels can be specified with a tolerance of the order of magnitude of one micrometer even in the case of relatively thick multi-channel plates. The method also has the advantage that it has a particularly large ratio of the sum of the channel cross-sectional areas to the total area the plate ie a particularly high transparency of the multi-channel plates can be achieved.

Als energiereiche Strahlung kommen sowohl Korpuskularstrahlen als auch elektromagnetische Wellen, insbesondere die von einem Elektronensynchrotron erzeugte Röntgenstrahlung (Synchrotronstrahlung), in Frage. Während man bei der Verwendung elektromagnetischer Wellen zur Erzeugung der gewünschten Strukturen in bekannter Weise mit Masken arbeitet, kann man bei Verwendung von Korpuskularstrahlen die Struktur auch durch elektromagnetische Steuerung erzeugen.Both corpuscular rays and electromagnetic waves, in particular the X-rays (synchrotron radiation) generated by an electron synchrotron, can be considered as high-energy radiation. While one uses masks in a known manner when using electromagnetic waves to produce the desired structures, the structure can also be generated by electromagnetic control when using corpuscular beams.

Das Material für die Herstellung der Vielkanal-Positiv-formen gemäß Anspruch 1 bzw. der primären Vielkanalpositivformen gemäß Anspruch 2 richtet sich nach der Art der energiereichen Strahlung, wobei entsprechende Vorschriften beispeilsweise der DE-PS 29 22 642 und der DE-OS 32 21 981 entnommen werden können.The material for the production of the multichannel positive molds according to claim 1 or the primary multichannel positive molds according to claim 2 depends on the type of high-energy radiation, corresponding regulations being, for example, DE-PS 29 22 642 and DE-OS 32 21 981 can be removed.

Die Herstellung der metallischen Vielkanal-Negativ-Form erfolgt durch galvanische Abformung der mit einer Metallelektrode verbundenen Vielkanal-Positiv-Form. Dabei kann die Metallelektrode als Grundplatte der metallischen Vielkanal-Negativ-Form verwendet werden. Es ist aber .auch möglich, die galvanische Abscheidung von Metall solange fortzusetzen, bis die Vielkanal-Positiv-Form von einer durchgehenden Metallschicht bedeckt ist, die, gegebenenfalls nach einer Glättung ihrer Oberfläche, als Grundplatte der metallischen Vielkanal-Negativ-Form verwendet wird. Durch geeignete Wahl des Elektrodenmaterials, gegebenenfalls in Verbindung mit einer Passivierung seiner Oberfläche, kann in diesem Fall ein Haften der Galvanik an der Elektrode in bekannter Weise verhindert werden. Es ist dann möglich, die Vielkanal- Positiv-Form samt der mit ihr verbundenen Elektrode ohne Beschädigung von der erzeugten Vielkanal-Negativ-Form zu trennen, was eine wiederholte Benutzung der Vielkanal- Positiv-Form möglich macht.The metallic multi-channel negative mold is produced by galvanic molding of the multi-channel positive mold connected to a metal electrode. The metal electrode can be used as the base plate of the metallic multi-channel negative mold. However, it is also possible to continue the galvanic deposition of metal until the multichannel positive form is covered by a continuous metal layer which, optionally after smoothing its surface, is used as the base plate of the metallic multichannel negative form. In this case, a suitable choice of the electrode material, possibly in connection with a passivation of its surface, can prevent the electroplating from adhering to the electrode in a known manner. It is then possible to Separate positive form together with the electrode connected to it from the generated multichannel negative form without damage, which makes repeated use of the multichannel positive form possible.

Zur Fixierung der Positionen der metallischen Negativ-Formen der Kanäle kann es vorteilhaft sein, die freien Enden der säulenförmigen Negativ-Formen durch Metallbrücken miteinander zu verbinden.To fix the positions of the metallic negative shapes of the channels, it can be advantageous to connect the free ends of the columnar negative shapes to one another by means of metal bridges.

Zum Auffüllen der metallischen Vielkanal-Negativ-Form kann das zu Herstellung der vorbekannten Vielkanalplatten verwendete Bleioxyd enthaltende Glas benutzt werden. Das Glas kann eingeschmolzen oder, unter Verwendung von Glaspulver, eingesintert werden. Für das Auffüllen kommen aber auch andere elektrisch nicht oder nur schwach leitendeThe glass containing lead oxide used to manufacture the previously known multi-channel plates can be used to fill the metallic multi-channel negative mold. The glass can be melted or sintered in using glass powder. However, other electrically non-conductive or only weakly conductive ones are used for filling

Materialien beispielsweise A1203-pulver,in Frage, das sich bei höherer Temperatur ebenfalls zu einem formbebeständigen Körper zusammensintern läßt. Zur Erzielung einer ausreichenden elektrischen Leitfähigkeit muß dabei gegebenenfalls die bei den bleioxydhaltigen Gläsern übliche Nachbehandlung mit H2 durch eine andere Nachbehandlung z.B. nach der bekannten CVD-Methode ("Chemical vapor deposition") ersetzt werden.Materials, for example A1203 powder, in question, which can also be sintered together at a higher temperature to a shape-retaining body. In order to achieve sufficient electrical conductivity, the aftertreatment with H 2 which is customary in the case of lead oxide-containing glasses may have to be replaced by another aftertreatment, for example using the known CVD method ("chemical vapor deposition").

Zur Verbilligung der Massenfertigung von Vielkanalplatten der im Oberbegriff von Anspruch 1 beschriebenen Art kann das Verfahren der Erfindung entsprechend Anspruch 2 abgewandelt werden, wobei Einzelheiten in bezug auf die Abformung beispielsweise der DE-PS 32 06 820.4 zu entnehmen sind. Als Abformmasse sind besonders nichthaftende Reaktionsharze geeignet.To reduce the cost of mass production of multi-channel plates of the type described in the preamble of claim 1, the method of the invention can be modified in accordance with claim 2, details of which can be found, for example, in DE-PS 32 06 820.4. Non-adhesive reactive resins are particularly suitable as impression materials.

Zur Unterdrückung der unerwünschten Beschleunigung parasitärer Ionen können erfindungsgemäß hergestellte Vielkanalplatten mit zur Plattenoberfläche schrägen Kanälen auch stapelartig so zusammengesetzt werden, daß sich zick-zack-förmige Kanalstrukturen ergeben. Während beim Stapeln vorbekannter Vielkanalplatten aufgrund der unvermeidlichen Streuung in den Querschnitten und Positionen der Kanäle Einbußen im räumlichen Auflösungsvermögen in Kauf genommen werden müssen, kann das Stapeln bei den erfindungsgemäß hergestellten Vielkanalplatten durch gegenseitiges Ausrichten der Kanalöffnungen unter weitgehender Vermeidung dieses Nachteils erfolgen.To suppress the undesired acceleration of parasitic ions, multi-channel plates produced according to the invention can be inclined to the plate surface Channels are also stacked together so that there are zigzag channel structures. While in the case of stacking of known multichannel plates, losses in spatial resolution have to be accepted due to the inevitable scatter in the cross sections and positions of the channels, the stacking in the multichannel plates produced according to the invention can be carried out by mutually aligning the channel openings while largely avoiding this disadvantage.

Das erfindungsgemäße Verfahren wird im folgenden anhand der Zeichnungen beispielhaft erläutert:

  • Die Figuren 1 bis 7 zeigen schematisch die einzelnen Schritte der Herstellung einer Vielkanalplatte; die Figur 8 zeigt in perspektivischer Darstellung schematisch den Aufbau eines Stapels von Vielkanalplatten.
The method according to the invention is explained below using the drawings as an example:
  • Figures 1 to 7 schematically show the individual steps in the manufacture of a multi-channel plate; FIG. 8 schematically shows in perspective the structure of a stack of multi-channel plates.

Als Ausgangsmaterial für die Herstellung der Vielkanal- positiv-Form dient gemäß Fig. 1 eine O,5 mm starke Platte 1 aus Polymethylmethacrylat (PMMA), die festhaftend auf einer als Elektrode dienenden metallischen Grundplatte 2 aus einer Eisen-Nickel-Legierung aufgebracht ist. Die PMMA-Platte 1 wird gemäß Fig. 2 über eine Röntgenmaske mit Synchrotronstrahlung 3 bestrahlt, die schräg zu den Oberflächen der PMMA-Platte und der Röntgenmaske gerichtet ist. Die Röntgenmaske besteht aus einem die Röntgenstrahlung nur schwach absorbierenden,Träger 4 und einem die Röntgenstrahlung stark absorbierenden, gitterartigen Absorber 5, durch den die Qerschnittsformen und die Positionen der Kanäle vorgegeben werden. Durch die hochintensive parallele Synchrotonstrahlung wird das PMMA in den nicht vom Absorber abgedeckten Bereichen 6 strahlenchemisch verändert. Die bestrahlten Bereiche 6 werden durch Einbringen des PMMA in eine Entwicklerlösung entfernt, so daß eine Vielkanalpositiv-Form 7 mit kanalförmigen Durchbrüchen 8 gemäß Fig. 3 entsteht. Als Entwicklerlösung wird ein Gemisch aus einem Stoff der Glykoläther-Gruppe, einem Stoff der Primär-Amine sowie Wasser und einem Stoff der Azingruppe gemäß DE-OS 30 39 110 verwendet. Die kanalförmigen Durchbrüche 8 haben eine sechseckige Querschnittsform mit einer Weite von ca. 30 pm, die Stärke der Wände 8a beträgt ca. 3 um.According to FIG. 1, a 0.5 mm thick plate 1 made of polymethyl methacrylate (PMMA) serves as the starting material for the production of the multi-channel positive mold, which is firmly adhered to a metallic base plate 2 made of an iron-nickel alloy and serving as an electrode. 2, the PMMA plate 1 is irradiated with synchrotron radiation 3 via an X-ray mask, which is directed obliquely to the surfaces of the PMMA plate and the X-ray mask. The X-ray mask consists of a carrier 4, which only weakly absorbs the X-ray radiation, and a grid-like absorber 5, which strongly absorbs the X-radiation, by means of which the cross-sectional shapes and the positions of the channels are specified. Due to the high-intensity parallel synchrotron radiation, the PMMA in the regions 6 not covered by the absorber is chemically changed. The irradiated areas 6 are removed by introducing the PMMA into a developer solution, so that a multi-channel positive mold 7 with channel-shaped openings 8 according to FIG. 3 is produced. A mixture of a substance from the glycol ether group, a substance from the primary amines, is used as the developer solution and water and a substance of the azine group according to DE-OS 30 39 110 used. The channel-shaped openings 8 have a hexagonal cross-sectional shape with a width of approximately 30 μm, the thickness of the walls 8a is approximately 3 μm.

Im nächsten Fertigungsschritt wird gemäß Fig. 4 eine Eisen-Nickel-Legierung galvanisch in die kanalförmigen Durchbrüche 8 abgeschieden, wobei säulenartige Strukturen 9 aus dieser Legierung auf der elektrisch leitenden Grundplatte 2 in der gitterförmigen Vielkanalpositiv-Form 7 ausgebildet werden. Die Vielkanalpositiv-Form wird dann durch Auflösen in einem Lösungsmittel entfernt, so daß eine metallische Negativ-Form der Vielkanalplatte gemäß Fig. 5 freigelegt wird.4, an iron-nickel alloy is electrodeposited into the channel-shaped openings 8, column-like structures 9 being formed from this alloy on the electrically conductive base plate 2 in the grid-shaped multi-channel positive form 7. The multichannel positive form is then removed by dissolving in a solvent, so that a metallic negative form of the multichannel plate according to FIG. 5 is exposed.

In den weiteren Fertigungsschritten werden die Zwischenräume 10 zwischen den säulenartigen Strukturen 9 der metallischen Negativ-Form mit einer Bleiglasschmelze 11 unter Vakuum aufgefüllt (Fig. 6). Durch die Verwendung der oben erwähnten Eisen-Nickel-Legierung kann dabei sichergestellt werden, daß das Bleiglas und die Legierung annähernd gleiche thermische Ausdehnungskoeffizienten besitzen; so daß die beim Abkühlen auftretenden Spannungen nicht zu einer Rißbildung im Glas führen. Die aus Glas 11 und Metall 9 bestehende Struktur wird schließlich überschliffenf und das Metall 9 wird durch Auflösen in einer selektiven Ätze entfernt.In the further manufacturing steps, the spaces 10 between the columnar structures 9 of the metallic negative form are filled with a lead glass melt 11 under vacuum (FIG. 6). By using the iron-nickel alloy mentioned above, it can be ensured that the lead glass and the alloy have approximately the same thermal expansion coefficient; so that the stresses that occur during cooling do not lead to cracking in the glass. The structure consisting of glass 11 and metal 9 is finally ground and the metal 9 is removed by dissolving it in a selective etching.

Die mit den Durchbrüchen 12 versehene Vielkanalplatte wird schließlich in bekannter Weise durch Aufsputtern von Metall beidseitig mit dünnen Leitschichten 13 überzogen, während die inneren Oberflächen der Kanäle durch Erhitzen in Wasserstoff elektrisch schwach leitend gemacht werden (Fig. 7).The multi-channel plate provided with the openings 12 is finally covered in a known manner by sputtering metal on both sides with thin conductive layers 13, while the inner surfaces of the channels are made electrically weakly conductive by heating in hydrogen (FIG. 7).

Bei der Durchführung des Verfahrens gemäß Anspruch 2 wird die primäre metallische Negativ-Form, die der in Fig. 5 gezeigten Form entspricht, mit einem nicht auf dem Metall haftenden Reaktionsharz als Abformmasse aufgefüllt über die säulenförmigen Strukturen der metallischen Negativ-Formen hinaus. Nach dem Aushärten des Reaktionsharzes werden die daraus gebildete sekundäre Vielkanalpositiv-Form und die primäre metallische Negativ-Form voneinander getrennt, worauf die sekundäre Vielkanalpositiv-Form mit der die Öffnungen aufweisenden Seite auf eine als Elektrode dienende metallische Grundplatte fest aufgebracht wird. Die auf der Oberseite geschlossene sekundäre Vielkanalpositiv-Form wird dann soweit abgetragen, daß die Kanalöffnungen freiliegen. Durch anschließende galvanische Abformung werden sekundäre metallische Negativ-Formen erzeugt, die wiederum der in Fig. 5 gezeigten Form entsprechen. Der weitere Fortgang der Herstellung der Vielkanalplatte erfolgt gemäß den bereits anhand der Figuren 6 und 7 erläuterten Fertigungsschritte.When carrying out the method according to claim 2, the primary metallic negative shape, which corresponds to the shape shown in FIG. 5, is filled with a reaction resin which does not adhere to the metal as an impression material beyond the columnar structures of the metallic negative shapes. After the reaction resin has hardened, the secondary multichannel positive form formed therefrom and the primary metallic negative form are separated from one another, whereupon the secondary multichannel positive form is firmly attached with the side having the openings to a metallic base plate serving as an electrode. The secondary multi-channel positive form closed on the top is then removed to such an extent that the channel openings are exposed. Subsequent galvanic molding produces secondary metallic negative shapes, which in turn correspond to the shape shown in FIG. 5. The production of the multi-channel plate is continued in accordance with the production steps already explained with reference to FIGS. 6 and 7.

Die aus dem Reaktionsharz hergestellten sekundären Vielkanalpositiv-Formen können ebenfalls mehrfach galvanisch abgeformt werden. Zur besseren Trennung der mehrfach verwendbaren sekundären Vielkanalpositiv-Form von den sekundären Vielkanalnegativ-Formen erweist es sich als vorteilhaft, vor der galvanischen Abformung einen dünnen Trennmittelfilm auf die Kanalwände der sekundären Vielkanalpositiv-Form aufzubringen. Die Aufbringung des Trennmittelfilms erfolgt in bekannter Weise durch Eintauchen in eine Trennmittellösung.The secondary multichannel positive molds made from the reaction resin can also be repeatedly electroplated. For better separation of the secondary multi-channel positive form, which can be used multiple times, from the secondary multi-channel negative forms, it has proven to be advantageous to apply a thin release agent film to the channel walls of the secondary multi-channel positive form before the galvanic impression. The release agent film is applied in a known manner by immersion in a release agent solution.

Claims (3)

1. Verfahren zur Herstellung von Vielkanalplatten für die Verstärkung von optischen Bildern oder anderen flächenhaften Signalverteilungen mittels Sekundärelektronenvervielfachung, dadurch gekennzeichnet,daß a) zunächst eine Vielkanal-Positiv-Form (7) hergestellt wird, in dem in eine Platte (1) aus durch energiereiche Strahlung in seinen Eigenschaften veränderbarem Material durch partielles Bestrahlen und partielles Entfernen dieses Materials unter Ausnutzung der durch die Bestrahlung erzeugten unterschiedlichen Materialeigenschaftenfsenkrecht oder schräg zur Plattenoberfläche Kanäle (8) mit vorgegebenen Querschnitten und Positionen eingearbeitet werden, b) von der so entstandenen Vielkanal-Positiv-Form (7) unter Verwendung einer mit ihr verbundenen Metallelektrode_(2)durch galvanische Abformung und anschließende Entfernung der Vielkanal-Positiv-Form eine metallische Negativ-Form (9) hergestellt wird, und c) die metallische Negativ-Form mit einem für den Aufbau von Vielkanalplatten geeigneten Material (11) aufgefüllt und anschließend die metallische Negativ-Form entfernt wird. 1. A method for producing multi-channel plates for the amplification of optical images or other areal signal distributions by means of secondary electron multiplication, characterized in that a) a multichannel positive mold (7) is first produced in which, in a plate (1) made of material whose properties can be changed by high-energy radiation, by partial irradiation and partial removal of this material, taking advantage of the different material properties produced by the irradiation, vertically or Channels (8) with specified cross sections and positions are worked in at an angle to the plate surface, b) a metallic negative mold (9) is produced from the resulting multichannel positive mold (7) using a metal electrode (2) connected to it by galvanic molding and subsequent removal of the multichannel positive mold, and c) the metallic negative mold is filled with a material (11) suitable for the construction of multi-channel plates and then the metallic negative mold is removed. 2. Verfahren nach Anspruch 1, dadurch gekennzeichnet daß nach Schritt b) durch wiederholtes Abformen der primären metallischen Negativ-Form mit einer Abformmasse mehrere sekundäre Vielkanal-Positiv-Formen hergestellt werden, und daß von den so entstandenen sekundären Vielkanal- Positiv-Formen unter Verwendung von mit ihnen verbundenen Metallektroden durch galvanische Abformung und anschließende Entfernung der sekundären Vielkanal-Positiv-Formen sekundäre metallische Negativ-Formen hergestellt werden, die gemäß Schritt c) mit einem für den Aufbau von Vielkanalplatten geeigneten Material aufgefüllt und anschließend entfernt werden.2. The method according to claim 1, characterized in that after step b) by repeated molding of the primary metallic negative mold with a molding compound several secondary multichannel positive molds are produced, and that of the secondary multichannel positive molds thus created using metal electrodes connected to them by galvanic molding and subsequent removal of the secondary multichannel positive molds secondary metallic negative molds are produced, which are filled up according to step c) with a material suitable for the construction of multi-channel plates and then removed. 3. Verwendung von nach einem der Ansprüche 1 oder 2 hergestellten Vielkanalplatten zur Bildung eines Stapels aus mindestens zwei Vielkanalplatten mit zur Plattenoberfläche schrägen Kanälen (12), bei denen die miteinander ausgerichteten Kanäle von aufeinanderfolgenden Vielkanalplatten zickzackförmige Strukturen bilden (Fig. 8).3. Use of multi-channel plates produced according to one of claims 1 or 2 to form a stack of at least two multi-channel plates with channels (12) which are oblique to the plate surface, in which the channels of successive multi-channel plates aligned with one another form zigzag structures (FIG. 8).
EP85101038A 1984-03-10 1985-02-01 Manufacturing process for multichannel plates, and their use Expired EP0154797B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AT85101038T ATE37757T1 (en) 1984-03-10 1985-02-01 PROCESS FOR MANUFACTURE OF MULTI-CHANNEL PLATES AND THEIR USE.

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE3408848A DE3408848C2 (en) 1984-03-10 1984-03-10 Process for the production of multi-channel plates
DE3408848 1984-03-10

Publications (3)

Publication Number Publication Date
EP0154797A2 true EP0154797A2 (en) 1985-09-18
EP0154797A3 EP0154797A3 (en) 1986-12-30
EP0154797B1 EP0154797B1 (en) 1988-10-05

Family

ID=6230128

Family Applications (1)

Application Number Title Priority Date Filing Date
EP85101038A Expired EP0154797B1 (en) 1984-03-10 1985-02-01 Manufacturing process for multichannel plates, and their use

Country Status (6)

Country Link
US (1) US4563250A (en)
EP (1) EP0154797B1 (en)
JP (1) JPS60208041A (en)
AT (1) ATE37757T1 (en)
BR (1) BR8501058A (en)
DE (1) DE3408848C2 (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3841621A1 (en) * 1988-12-10 1990-07-12 Draegerwerk Ag ELECTROCHEMICAL MEASURING CELL WITH MICROSTRUCTURED CAPILLARY OPENINGS IN THE MEASURING ELECTRODE
EP0413482B1 (en) * 1989-08-18 1997-03-12 Galileo Electro-Optics Corp. Thin-film continuous dynodes
US5189777A (en) * 1990-12-07 1993-03-02 Wisconsin Alumni Research Foundation Method of producing micromachined differential pressure transducers
US5206983A (en) * 1991-06-24 1993-05-04 Wisconsin Alumni Research Foundation Method of manufacturing micromechanical devices
US5190637A (en) * 1992-04-24 1993-03-02 Wisconsin Alumni Research Foundation Formation of microstructures by multiple level deep X-ray lithography with sacrificial metal layers
US5378583A (en) * 1992-12-22 1995-01-03 Wisconsin Alumni Research Foundation Formation of microstructures using a preformed photoresist sheet
EP0872331A1 (en) 1997-04-16 1998-10-21 Matsushita Electric Industrial Co., Ltd. Stamper protecting layer for optical disk molding apparatus, optical disk molding apparatus and optical disk molding method using the stamper protecting layer
US6521149B1 (en) * 2000-06-06 2003-02-18 Gerald T. Mearini Solid chemical vapor deposition diamond microchannel plate
DE10305427B4 (en) * 2003-02-03 2006-05-24 Siemens Ag Production method for a perforated disk for ejecting a fluid
US7154086B2 (en) * 2003-03-19 2006-12-26 Burle Technologies, Inc. Conductive tube for use as a reflectron lens
US20080073516A1 (en) * 2006-03-10 2008-03-27 Laprade Bruce N Resistive glass structures used to shape electric fields in analytical instruments

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4031423A (en) * 1969-04-30 1977-06-21 American Optical Corporation Channel structure for multi-channel electron multipliers and method of making same
GB2029088A (en) * 1978-08-21 1980-03-12 Philips Nv Microchannel plate multipliers

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1434053A (en) * 1973-04-06 1976-04-28 Mullard Ltd Electron multipliers
DE2922642C2 (en) * 1979-06-02 1981-10-01 Kernforschungszentrum Karlsruhe Gmbh, 7500 Karlsruhe Process for the manufacture of plates for the construction of separation nozzle elements
DE3039110A1 (en) * 1980-10-16 1982-05-13 Siemens AG, 1000 Berlin und 8000 München METHOD FOR THE STRESS-FREE DEVELOPMENT OF IRRADIATED POLYMETHYL META ACRYLATE LAYERS
DE3150257A1 (en) * 1981-12-18 1983-06-30 Siemens AG, 1000 Berlin und 8000 München Image intensifier
DE3206820C2 (en) * 1982-02-26 1984-02-09 Kernforschungszentrum Karlsruhe Gmbh, 7500 Karlsruhe Process for making separation nozzle elements
DE3221981C2 (en) * 1982-06-11 1985-08-29 Kernforschungszentrum Karlsruhe Gmbh, 7500 Karlsruhe Process for the production of separating nozzle elements consisting of separating bodies with end plates for separating gaseous or vaporous mixtures

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4031423A (en) * 1969-04-30 1977-06-21 American Optical Corporation Channel structure for multi-channel electron multipliers and method of making same
GB2029088A (en) * 1978-08-21 1980-03-12 Philips Nv Microchannel plate multipliers

Also Published As

Publication number Publication date
JPH0552618B2 (en) 1993-08-05
ATE37757T1 (en) 1988-10-15
US4563250A (en) 1986-01-07
DE3408848A1 (en) 1985-09-19
DE3408848C2 (en) 1987-04-16
EP0154797B1 (en) 1988-10-05
JPS60208041A (en) 1985-10-19
BR8501058A (en) 1985-10-29
EP0154797A3 (en) 1986-12-30

Similar Documents

Publication Publication Date Title
DE2628099C2 (en) Method of making a mask
DE19542658B4 (en) Method for producing a stamping mold
DE4341149C2 (en) Multipole device and method for producing a multipole device
DE3106368C2 (en) DC gas discharge indicator
EP0154797B1 (en) Manufacturing process for multichannel plates, and their use
DE69608713T2 (en) Manufacturing method of a field emission device with wave-shaped support columns for high dielectric strength
DE2716202A1 (en) ION SOURCE
DE102006007431B4 (en) Sample carrier formed by semiconductor silicon process technology and method for production
EP0024515B1 (en) Process for manufacturing separating nozzles for separating gaseous or vaporous mixtures, particularly isotopic mixtures, and separating nozzles produced according to this process
DE2951287A1 (en) METHOD FOR PRODUCING PLANE SURFACES WITH THE FINEST TIPS IN THE MICROMETER AREA
EP0283773B1 (en) Miniaturized secondary electron multiplier and its manufacturing procedure
DE2700625A1 (en) ELECTRIC DISCHARGE DEVICE
DE1002089B (en) Electromagnetic deflection system for beam control of a cathode ray tube and method for manufacturing such a deflection system
DE3909449C2 (en)
DE3408849C2 (en) Process for producing layered metal multi-channel plates for image intensifiers and use of the multi-channel plates thus produced
DE3221981C2 (en) Process for the production of separating nozzle elements consisting of separating bodies with end plates for separating gaseous or vaporous mixtures
DE3517729C2 (en)
DE2325245A1 (en) MICROCHANNEL PLATE FOR SECONDARY ELECTRON EMISSION AND A METHOD OF MANUFACTURING SUCH PLATE
EP0010222B1 (en) Control plate for a flat plasma display screen
DE1275699B (en) Method of making a thin film magnetic assembly
DE2700141A1 (en) COLOR TUBE AND METHOD OF MANUFACTURING THEREOF
DE102017115940A1 (en) 3D printing process and 3D printing device
DE69710493T2 (en) BLASTING DEVICE WITH POWDER WITH NON-METAL BLASTING MASK
DE2421442A1 (en) MULTIPLEX SCREEN CONSTRUCTION OF A COLOR CATHODE BEAM TUBE AND MANUFACTURING PROCESS
DE2700139A1 (en) METHOD OF MANUFACTURING A COLOR TUBE

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

AK Designated contracting states

Designated state(s): AT CH FR GB IT LI NL SE

17P Request for examination filed

Effective date: 19850805

PUAL Search report despatched

Free format text: ORIGINAL CODE: 0009013

AK Designated contracting states

Kind code of ref document: A3

Designated state(s): AT CH FR GB IT LI NL SE

17Q First examination report despatched

Effective date: 19880311

ITF It: translation for a ep patent filed
GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): AT CH FR GB IT LI NL SE

REF Corresponds to:

Ref document number: 37757

Country of ref document: AT

Date of ref document: 19881015

Kind code of ref document: T

ET Fr: translation filed
GBT Gb: translation of ep patent filed (gb section 77(6)(a)/1977)
PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

26N No opposition filed
ITTA It: last paid annual fee
PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: AT

Payment date: 19940224

Year of fee payment: 10

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: GB

Payment date: 19941116

Year of fee payment: 11

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: CH

Payment date: 19941221

Year of fee payment: 11

EAL Se: european patent in force in sweden

Ref document number: 85101038.9

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: AT

Effective date: 19950201

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: SE

Payment date: 19950216

Year of fee payment: 11

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: NL

Payment date: 19950228

Year of fee payment: 11

Ref country code: FR

Payment date: 19950228

Year of fee payment: 11

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: GB

Effective date: 19960201

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SE

Effective date: 19960202

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LI

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 19960228

Ref country code: CH

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 19960228

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: NL

Effective date: 19960901

GBPC Gb: european patent ceased through non-payment of renewal fee

Effective date: 19960201

REG Reference to a national code

Ref country code: CH

Ref legal event code: PL

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: FR

Effective date: 19961031

NLV4 Nl: lapsed or anulled due to non-payment of the annual fee

Effective date: 19960901

REG Reference to a national code

Ref country code: FR

Ref legal event code: ST