EP0135115B1 - Gas discharge display device with a post-acceleration space - Google Patents
Gas discharge display device with a post-acceleration space Download PDFInfo
- Publication number
- EP0135115B1 EP0135115B1 EP84109448A EP84109448A EP0135115B1 EP 0135115 B1 EP0135115 B1 EP 0135115B1 EP 84109448 A EP84109448 A EP 84109448A EP 84109448 A EP84109448 A EP 84109448A EP 0135115 B1 EP0135115 B1 EP 0135115B1
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- European Patent Office
- Prior art keywords
- post
- acceleration
- gas discharge
- cathode
- space
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J17/00—Gas-filled discharge tubes with solid cathode
- H01J17/38—Cold-cathode tubes
- H01J17/48—Cold-cathode tubes with more than one cathode or anode, e.g. sequence-discharge tube, counting tube, dekatron
- H01J17/49—Display panels, e.g. with crossed electrodes, e.g. making use of direct current
- H01J17/498—Display panels, e.g. with crossed electrodes, e.g. making use of direct current with a gas discharge space and a post acceleration space for electrons
Definitions
- the invention relates to a display device according to the preamble of claim 1.
- a plasma panel belongs to the subject of the publication "Electronic”, 14 (1982), 79-82.
- DE-A 2929270 therefore also discusses filling the display with H 2 , using an Al cathode and constantly keeping the cathode surface under a thin oxide layer during gas discharge. Practice has shown, however, that these measures are not yet sufficient, especially in cases where the display is in continuous operation for a long time. The ratios do not get much better if one goes to other gases or cover layers, such as a Ne-Ar mixture and a MgO / Al 2 O 3 Ta / Mo skin (IBM Techn. Discl. Bull. 25 (1982 ) 658).
- the invention is based on the object of further developing a plasma panel of the type mentioned at the outset in such a way that the operating voltage remains constant, in particular even under continuous loads. According to the invention, this object is achieved by a display device having the features of patent claim 1.
- the indication "high-melting” means that the (average) melting temperature is above 1730 ° C.
- the proposed solution is based on the observation that the main cause of the rise in interference voltage is a gradual decrease in the gas pressure. Ions are generated in the post-acceleration space, which collide with the post-acceleration cathode and some of them are captured there. This implantation effect, which depends on the nature of the gas and the electrode and is particularly pronounced when using helium and aluminum, can lead to gas consumption of up to 40%.
- the protective layer provided according to the invention consists of materials which have a relatively high degree of reflection for ions of the types and energies in question here.
- the ions striking the protective layer give off most of their kinetic energy, but are scattered back in most cases. Endurance tests have shown that this way you can easily slow down the rise in the operating voltage by a factor greater than 3 and stabilize the voltage even at a significantly lower level.
- the protective layer provided according to the invention is normally between 10 -3 ⁇ m and 10 -1 ⁇ m, preferably between 5 ⁇ 10 -3 ⁇ m and 4x 10 -2 ⁇ m, thick.
- the layer metal is best an element from subgroup A of the fourth to seventh group and sixth period of the periodic table.
- the protective layer does not need to consist entirely of the metal; perfect results are also obtained if the layer surface is hardened by a chemical process, for example by oxidation.
- the panel shown which is intended for a data display device, contains a vacuum envelope with a front plate 1, a rear plate 2 and a control unit 3. All three parts extend in mutually parallel planes.
- the control unit divides the interior of the envelope into a gas discharge space 4 and a post-acceleration space 5.
- the back plate 2 is provided on its front side with a plurality of mutually parallel conductor strips (plasma cathodes 6).
- the front plate 1 has on its back a cathodoluminescent layer 7 (phosphor layer) and a continuous layer electrode (post-acceleration anode 8).
- the control unit 3 comprises two carrier plates 9, 10, which are coated on both sides with electrodes.
- the rear plate 9 carries row conductors (plasma anode) 11 on its rear side and column conductors 12 on its front side. The conductors of both groups of conductors are perpendicular to one another, can be controlled individually and together form the actual control matrix.
- the front plate 10 is provided on the rear with tetrode conductors 13 parallel to the line conductors and on the front with a Ni pentode (post-acceleration cathode 14) applied over the entire area and approximately 2 pm thick.
- the entire control unit has a continuous opening 15 in the area of each matrix element and is spaced apart from the rear and front plates by a spacing frame 16 and 17, respectively. All parts are connected to each other in a vacuum-tight manner via glass solder seams 18, 19, 20, 21 and 23.
- the post-acceleration cathode 14 is covered with a further metal layer (implantation protection layer 22).
- This layer - it has a thickness between 10 -2 ⁇ m and 2x10 -2 ⁇ m and consists of W - is applied in a conventional vacuum technique.
- the internal voltage U b measured in V, was recorded as a function of the operating time t, measured in hours, with a 2 ⁇ m thick Ni post-acceleration cathode that was once unprotected (Fig. 2) and once wore a 4x 10 -2 ⁇ m thick Ta layer (Fig. 3). In both cases, the display was controlled dynamically. A comparison of the two curves shows that the protective layer delays the voltage rise considerably, limits it to lower values and also lowers the switch-on voltage.
- a wedge-shaped gas discharge burns between one of the plasma cathodes and one of the row conductors (plasma anode).
- This plasma is advanced on a line-by-line basis, and all column conductors receive the associated line information during the scanning time of a line conductor. According to this information, the electrons are passed through the control openings, then enter the post-acceleration space as point-like electron beams and are accelerated to 4kV and brought to the phosphor layer.
- the invention is not limited to the embodiment shown. So it is irrelevant how the gas discharge is generated and what form it takes; A static transverse plasma is therefore also an option.
- the implantation protection layer could also be realized as an alloy on the basis of one of the stressed materials and, if necessary, its surface could be tempered in another way - for example by conversion into a carbide, boride or silicide.
- the protective layer does not need to adhere particularly firmly to its base.
- With a relatively loose adhesion the ions, which have only penetrated to a small extent anyway, can diffuse back into the gas space through a relatively porous interface and diffuse towards the base metallization. In this respect, a multi-layer protective layer could also be recommended.
- the person skilled in the art is free to also coat other surfaces at risk of implantation with the protective layer proposed here.
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- Gas-Filled Discharge Tubes (AREA)
Abstract
Description
Die Erfindung bezieht sich auf eine Anzeigevorrichtung gemäss dem Oberbegriff des Anspruchs 1. Ein solches Plasmapanel gehört zum Gegenstand der Druckschrift «Electronic», 14 (1982), 79-82.The invention relates to a display device according to the preamble of claim 1. Such a plasma panel belongs to the subject of the publication "Electronic", 14 (1982), 79-82.
Bei dem Flachbildschirm der zitierten Anmeldung werden Elektronen einer Gasentladung durch selektiv geöffnete Löcher einer Steuereinheit in einen plasmafreien Raum geschickt, in dem sie Energien von einigen kV aufnehmen und schliesslich auf einem Leuchtschirm Lichtpunkte erzeugen.In the flat screen of the cited application, electrons from a gas discharge are sent through selectively opened holes in a control unit into a plasma-free space, in which they absorb energies of a few kV and finally generate light spots on a fluorescent screen.
Mit dem Konzept der getrennten Elektronenerzeugung und -beschleunigung kann man bereits farbige Videobilder in durchaus akzeptabler Qualität darstellen. Es ist allerdings noch nicht gelungen, alle wichtigen Betriebsparameter auch über längere Betriebszeiten hinweg stabil zu halten. So steigt vor allem die Brennspannung des Plasmas regelmässig an und kann, wenn der Bildschirm ständig hellgeschaltet ist, schon nach wenigen hundert Betriebsstunden den zweifachen Wert annehmen. Eine derartige Spannungsdrift stellt enorme Anforderungen an die Ansteuerschaltung und die Kathode und sollte unbedingt vermieden werden.With the concept of separate electron generation and acceleration, color video images can already be displayed in acceptable quality. However, it has not yet been possible to keep all important operating parameters stable even over longer operating times. Above all, the burning voltage of the plasma rises regularly and, if the screen is constantly on, can take on twice the value after just a few hundred hours of operation. Such a voltage drift places enormous demands on the control circuit and the cathode and should be avoided at all costs.
In der DE-A 2929270 wird deshalb auch schon diskutiert, das Display mit H2 zu füllen, eine Al-Kathode zu verwenden und die Kathodenoberfläche während der Gasentladung ständig unter einer dünnen Oxidschicht zu halten. Die Praxis hat jedoch gezeigt, dass diese Massnahmen vor allem in Fällen, in denen das Display längere Zeit durchgehend in Funktion ist, noch nicht ausreichen. Die Verhältnisse werden auch nicht wesentlich besser, wenn man zu anderen Gasen oder Deckschichten übergeht, etwa zu einer Ne-Ar-Mischung und einer MgO/AI203-Ta/Mo-Haut (IBM Techn. Discl. Bull. 25 (1982) 658).DE-A 2929270 therefore also discusses filling the display with H 2 , using an Al cathode and constantly keeping the cathode surface under a thin oxide layer during gas discharge. Practice has shown, however, that these measures are not yet sufficient, especially in cases where the display is in continuous operation for a long time. The ratios do not get much better if one goes to other gases or cover layers, such as a Ne-Ar mixture and a MgO / Al 2 O 3 Ta / Mo skin (IBM Techn. Discl. Bull. 25 (1982 ) 658).
Der Erfindung liegt die Aufgabe zugrunde, ein Plasmapanel der eingangs genannten Art so weiterzuentwickeln, dass die Brennspannung konstant bleibt, und zwar insbesondere auch unter Dauerbelastungen. Diese Aufgabe wird erfindungsgemäss durch eine Anzeigevorrichtung mit den Merkmalen des Patentanspruchs 1 gelöst. Dabei bedeutet die Angabe «hochschmeizend», dass die (mittlere) Schmelztemperatur über 1730 °C liegt.The invention is based on the object of further developing a plasma panel of the type mentioned at the outset in such a way that the operating voltage remains constant, in particular even under continuous loads. According to the invention, this object is achieved by a display device having the features of patent claim 1. Here, the indication "high-melting" means that the (average) melting temperature is above 1730 ° C.
Der Lösungsvorschlag geht von der Beobachtung-aus, dass die Hauptursache für den Störspannungsanstieg ein allmähliches Absinken des Gasdrucks ist. Im Nachbeschleunigungsraum werden Ionen erzeugt, die auf die Nachbeschleunigungskathode aufprallen und dort zu einem Teil eingefangen werden. Dieser lmplantationseffekt, der von der Beschaffenheit des Gases und der Elektrode abhängt und bei Verwendung von Helium und Aluminium besonders ausgeprägt ist, kann zu einer Gasaufzehrung bis 40% führen.The proposed solution is based on the observation that the main cause of the rise in interference voltage is a gradual decrease in the gas pressure. Ions are generated in the post-acceleration space, which collide with the post-acceleration cathode and some of them are captured there. This implantation effect, which depends on the nature of the gas and the electrode and is particularly pronounced when using helium and aluminum, can lead to gas consumption of up to 40%.
Die erfindungsgemäss vorgesehene Schutzschicht besteht aus Materialien, die für Ionen der hier in Betracht kommenden Arten und Energien einen relativ hohen Reflexionsgrad haben. Die auf die Schutzschicht treffenden Ionen geben zwar den grössten Teil ihrer kinetischen Energie ab, werden aber in den meisten Fällen wieder zurückgestreut. Dauerversuche haben gezeigt, dass man auf diesem Weg den Anstieg der Brennspannung ohne weiteres um einen Faktor grösser als 3 verlangsamen und die Spannung selbst auf einem deutlich niedrigeren Niveau stabilisieren kann.The protective layer provided according to the invention consists of materials which have a relatively high degree of reflection for ions of the types and energies in question here. The ions striking the protective layer give off most of their kinetic energy, but are scattered back in most cases. Endurance tests have shown that this way you can easily slow down the rise in the operating voltage by a factor greater than 3 and stabilize the voltage even at a significantly lower level.
Die Tatsache, dass Metalle mit hoher Kernladungszahl leichte Ionen stark reflektieren, ist an sich bekannt; vergleiche hierzu Nucl. Instr. and Meth. 132 (1976) 647. Diese Arbeit liegt allerdings auf einem fremden Gebiet und hat eine andere Zielsetzung; es geht dort - im Rahmen einer kontrollierten Kernfusion - vornehmlich darum, Aufschlüsse über die Energie- und Dichteverteilung der reflektierten Ionen zu erhalten.The fact that metals with a high atomic number strongly reflect light ions is known per se; compare Nucl. Instr. and Meth. 132 (1976) 647. However, this work lies in a foreign area and has a different purpose; In the context of a controlled nuclear fusion, the main aim is to obtain information about the energy and density distribution of the reflected ions.
Die erfindungsgemäss vorgesehene Schutzschicht ist normalerweise zwischen 10-3µm und 10-1µm, vorzugsweise zwischen 5×10-3µm und 4x 10-2µm, dick. Das Schichtmetall ist am besten ein Element aus der Untergruppe A der vierten bis siebten Gruppe und sechsten Periode des Periodensystems. Die Schutzschicht braucht übrigens, wie sich ergeben hat, durchaus nicht vollständig aus dem Metall zu bestehen; man kommt auch dann zu einwandfreien Ergebnissen, wenn die Schichtoberfläche durch einen chemischen Prozess, etwa durch eine Oxidation, gehärtet ist.The protective layer provided according to the invention is normally between 10 -3 μm and 10 -1 μm, preferably between 5 × 10 -3 μm and 4x 10 -2 μm, thick. The layer metal is best an element from subgroup A of the fourth to seventh group and sixth period of the periodic table. Incidentally, the protective layer does not need to consist entirely of the metal; perfect results are also obtained if the layer surface is hardened by a chemical process, for example by oxidation.
Weitere vorteilhafte Ausgestaltungen und Weiterbildungen der Erfindungen sind Gegenstand zusätzlicher Ansprüche.Further advantageous refinements and developments of the inventions are the subject of additional claims.
Der Lösungsvorschlag soll nun anhand eines Ausführungsbeispiels, in Verbindung mit der beigefügten Zeichnung, näher erläuter werden. In der Zeichnung zeigen
- Fig. das Ausführungsbeispiel in einem schematischen Seitenschnitt;
- Fig.2 die Brennspannung in Abhängigkeit von der Betriebszeit, und zwar bei Verwendung einer ungeschützten Nachbeschleunigungskathode; und
- Fig. 3 den gleichen Parameter, mit einer Implantationsschutzschicht auf der Nachbeschleunigungskathode.
- Fig. The embodiment in a schematic side section;
- 2 shows the operating voltage as a function of the operating time, specifically when using an unprotected post-acceleration cathode; and
- 3 shows the same parameter, with an implantation protection layer on the post-acceleration cathode.
Das dargestellte Panel, das für ein Datensichtgerät gedacht ist, enthält eine Vakuumhülle mit einer Frontplatte 1, einer Rückplatte 2 und einer Steuereinheit 3. Alle drei Teile erstrecken sich in zueinander parallelen Ebenen. Die Steuereinheit teilt dabei das Hülleninnere in einen Gasentladungsraum 4 und einen Nachbeschleunigungsraum 5.The panel shown, which is intended for a data display device, contains a vacuum envelope with a front plate 1, a
Die Rückplatte 2 ist auf ihrer Vorderseite mit mehreren, zueinander parallelen Leiterstreifen (Plasmakathoden 6) versehen. Die Frontplatte 1 trägt auf ihrer Rückseite eine kathodolumineszente Schicht 7 (Phosphorschicht) und eine durchgehende Schichtelektrode (Nachbeschleunigungsanode 8). Die Steuereinheit 3 umfasst zwei Trägerplatten 9,10, die beidseitig jeweils mit Elektroden beschichtet sind. Die hintere Platte 9 trägt auf ihrer Rückseite Zeilenleiter (Plasmanode) 11 und auf ihrer Vorderseite Spaltenleiter 12. Die Leiter beider Leiterscharen stehen senkrecht zueinander, sind einzeln ansteuerbar und bilden zusammen die eigentliche Steuermatrix. Die vordere Platte 10 ist rückseitig mit zeilenleiterparallelen Tetrodenleitern 13 und frontseitig mit einer ganzflächig aufgebrachten, ca. 2pm starken Ni-Pentode (Nachbeschleunigungskathode 14) versehen. Die gesamte Steuereinheit hat im Bereich jedes Matrixelements eine durchgehende Öffnung 15 und ist gegen die Rück- und Frontplatte jeweils durch einen Abstandsrahmen 16 bzw. 17 distanziert. Alle Teile sind über Glaslotnähte 18, 19, 20, 21 und 23 vakuumdicht miteinander verbunden.The
Die Nachbeschleunigungskathode 14 ist, wie der Figur 1 zu entnehmen, mit einer weiteren Metallschicht (Implantationsschutzschicht 22) bedeckt. Diese Schicht - sie hat eine Dicke zwischen 10-2µm und 2x10-2µm und besteht aus W - ist in einer üblichen Vakuumtechnik aufgetragen.As can be seen in FIG. 1, the
Um den Stabilisierungseffekt der Implantationsschutzschicht zu demonstrieren, wurde die Brennspannung Ub, gemessen in V, als Funktion der Betriebsdauer t, gemessen in Stunden, aufgenommen, und zwar mit einer 2µm dicken Ni-Nachbeschleunigungskathode, die einmal ungeschützt war (Fig.2) und einmal eine 4x 10-2µm dicke Ta-Schicht trug (Fig.3). In beiden Fällen wurde das Display dynamisch angesteuert. Ein Vergleich der beiden Kurven zeigt, dass die Schutzschicht den Spannungsanstieg erheblich verzögert, auf geringere Werte begrenzt und darüber hinaus sogar auch noch die Einschaltspannung absenkt.In order to demonstrate the stabilizing effect of the implantation protection layer, the internal voltage U b , measured in V, was recorded as a function of the operating time t, measured in hours, with a 2 µm thick Ni post-acceleration cathode that was once unprotected (Fig. 2) and once wore a 4x 10 -2 µm thick Ta layer (Fig. 3). In both cases, the display was controlled dynamically. A comparison of the two curves shows that the protective layer delays the voltage rise considerably, limits it to lower values and also lowers the switch-on voltage.
Im Betrieb des Displays brennt jeweils zwischen einer der Plasmakathoden und einem der Zeilenleiter (Plasmanode) eine keilförmige Gasentladung. Dieses Plasma wird zeilenleiterweise fortgeschaltet, und während der Tastzeit eines Zeilenleiters erhalten sämtliche Spaltenleiter die zugehörige Zeileninformation. Die Elektronen werden entsprechend dieser Information durch die Steueröffnungen geschleust, treten dann als punktförmige Elektronenstrahlen in den Nachbeschleunigungsraum und werden dort - beschleunigt auf 4kV - auf die Phosphorschicht gebracht. Weitere Betriebs- und Konstruktionseinzelheiten gehen aus der eingangs zitierten Offenlegungsschrift oder aus dem in «Elektronik» 14 (1982) 79 erschienenen Artikel hervor.During operation of the display, a wedge-shaped gas discharge burns between one of the plasma cathodes and one of the row conductors (plasma anode). This plasma is advanced on a line-by-line basis, and all column conductors receive the associated line information during the scanning time of a line conductor. According to this information, the electrons are passed through the control openings, then enter the post-acceleration space as point-like electron beams and are accelerated to 4kV and brought to the phosphor layer. Further operational and design details emerge from the initially cited published specification or from the article published in “Electronics” 14 (1982) 79.
Die Erfindung beschränkt sich nicht nur auf die dargestellte Ausführungsform. So ist es ohne Belang, wie die Gasentladung erzeugt wird und welche Form sie erhält; in Frage kommt deshalb beispielsweise auch ein statisches Querplasma. Davon abgesehen könnte man auch die Implantationsschutzschicht als eine Legierung auf der Basis eines der beanspruchten Werkstoffe realisieren und ggf. ihre Oberfläche auf andere Weise - etwa durch Umwandlung in ein Carbid, Borid oder Silicid - vergüten. Die Schutzschicht braucht im übrigen auf ihrer Unterlage nicht sonderlich fest zu haften. Im Gegenteil: Bei einer relativ lockeren Haftung können die-ohnehin nur zu einem geringen Teil - in die Schicht eingedrungenen und zur Grundmetallisierung hin diffundierenden Ionen durch eine relativ poröse Grenzfläche wieder in den Gasraum zurückkehren. Insofern könnte sich auch eine mehrlagige Schutzschicht empfehlen. Schliesslich bleibt es dem Fachmann unbenommen, auch andere implantationsgefährdete Oberflächen mit der hier vorgeschlagenen Schutzschicht zu überziehen.The invention is not limited to the embodiment shown. So it is irrelevant how the gas discharge is generated and what form it takes; A static transverse plasma is therefore also an option. Apart from that, the implantation protection layer could also be realized as an alloy on the basis of one of the stressed materials and, if necessary, its surface could be tempered in another way - for example by conversion into a carbide, boride or silicide. The protective layer does not need to adhere particularly firmly to its base. On the contrary: With a relatively loose adhesion, the ions, which have only penetrated to a small extent anyway, can diffuse back into the gas space through a relatively porous interface and diffuse towards the base metallization. In this respect, a multi-layer protective layer could also be recommended. Finally, the person skilled in the art is free to also coat other surfaces at risk of implantation with the protective layer proposed here.
Claims (7)
characterised in that the post-acceleration cathode (14) is coated with an implantation protective layer (22) made of a high-melting metal which comes from the sub-groups A of the fourth to eighth groups and from the fifth to sixth periods ot the periodic system of the elements.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| AT84109448T ATE26767T1 (en) | 1983-08-11 | 1984-08-08 | GAS DISCHARGE INDICATOR WITH A POST-ACCELERATION SECTION. |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE3329106 | 1983-08-11 | ||
| DE19833329106 DE3329106A1 (en) | 1983-08-11 | 1983-08-11 | GAS DISCHARGE DISPLAY DEVICE WITH A RE-ACCELERATION RANGE |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP0135115A1 EP0135115A1 (en) | 1985-03-27 |
| EP0135115B1 true EP0135115B1 (en) | 1987-04-22 |
Family
ID=6206364
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP84109448A Expired EP0135115B1 (en) | 1983-08-11 | 1984-08-08 | Gas discharge display device with a post-acceleration space |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US4634935A (en) |
| EP (1) | EP0135115B1 (en) |
| JP (1) | JPS6056336A (en) |
| AT (1) | ATE26767T1 (en) |
| DE (2) | DE3329106A1 (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3730744A1 (en) * | 1987-09-12 | 1989-03-23 | Graetz Nokia Gmbh | FLAT IMAGE DISPLAY DEVICE |
| JP2596651B2 (en) * | 1991-05-27 | 1997-04-02 | 株式会社クボタ | Axial flow threshing device handling cylinder structure |
| US5302881A (en) * | 1992-06-08 | 1994-04-12 | The United States Of America As Represented By The Secretary Of The Air Force | High energy cathode device with elongated operating cycle time |
| WO2007033247A2 (en) * | 2005-09-14 | 2007-03-22 | Littelfuse, Inc. | Gas-filled surge arrester, activating compound, ignition stripes and method therefore |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3914635A (en) * | 1971-09-30 | 1975-10-21 | Owens Illinois Inc | Gaseous discharge display/memory device with improved memory margin |
| JPS5566819A (en) * | 1978-11-15 | 1980-05-20 | Hitachi Ltd | Oxide cathode for electron tube |
| US4297613A (en) * | 1979-05-08 | 1981-10-27 | International Business Machines Corporation | D.C. Scan panel |
| DE2929270A1 (en) * | 1979-07-19 | 1981-02-12 | Siemens Ag | PLASMA IMAGE DISPLAY DEVICE |
| DE2952528C2 (en) * | 1979-12-28 | 1985-10-10 | Siemens AG, 1000 Berlin und 8000 München | Gas discharge indicator |
| US4475060A (en) * | 1981-05-05 | 1984-10-02 | International Business Machines Corporation | Stabilized plasma display device |
| DE3207685A1 (en) * | 1982-03-03 | 1983-09-15 | Siemens AG, 1000 Berlin und 8000 München | GAS DISCHARGE INDICATOR |
-
1983
- 1983-08-11 DE DE19833329106 patent/DE3329106A1/en not_active Withdrawn
-
1984
- 1984-07-31 JP JP59161465A patent/JPS6056336A/en active Pending
- 1984-08-08 AT AT84109448T patent/ATE26767T1/en not_active IP Right Cessation
- 1984-08-08 EP EP84109448A patent/EP0135115B1/en not_active Expired
- 1984-08-08 DE DE8484109448T patent/DE3463316D1/en not_active Expired
- 1984-08-10 US US06/640,008 patent/US4634935A/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6056336A (en) | 1985-04-01 |
| ATE26767T1 (en) | 1987-05-15 |
| US4634935A (en) | 1987-01-06 |
| DE3329106A1 (en) | 1985-02-21 |
| EP0135115A1 (en) | 1985-03-27 |
| DE3463316D1 (en) | 1987-05-27 |
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Legal Events
| Date | Code | Title | Description |
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