EP0128949A1 - Supports recouverts pour enregistrements optiques et techniques de revetement relatives - Google Patents

Supports recouverts pour enregistrements optiques et techniques de revetement relatives

Info

Publication number
EP0128949A1
EP0128949A1 EP84900365A EP84900365A EP0128949A1 EP 0128949 A1 EP0128949 A1 EP 0128949A1 EP 84900365 A EP84900365 A EP 84900365A EP 84900365 A EP84900365 A EP 84900365A EP 0128949 A1 EP0128949 A1 EP 0128949A1
Authority
EP
European Patent Office
Prior art keywords
layer
disk
recited
coating
prescribed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
EP84900365A
Other languages
German (de)
English (en)
Other versions
EP0128949A4 (fr
Inventor
Michael D. Temple
Thomas Mayer
Norman L. Boling
James D. Rancourt
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Unisys Corp
Original Assignee
Burroughs Corp
Unisys Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Burroughs Corp, Unisys Corp filed Critical Burroughs Corp
Publication of EP0128949A1 publication Critical patent/EP0128949A1/fr
Publication of EP0128949A4 publication Critical patent/EP0128949A4/fr
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/2403—Layers; Shape, structure or physical properties thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/26—Processes for applying liquids or other fluent materials performed by applying the liquid or other fluent material from an outlet device in contact with, or almost in contact with, the surface
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B23/00—Record carriers not specific to the method of recording or reproducing; Accessories, e.g. containers, specially adapted for co-operation with the recording or reproducing apparatus ; Intermediate mediums; Apparatus or processes specially adapted for their manufacture
    • G11B23/0057—Intermediate mediums, i.e. mediums provided with an information structure not specific to the method of reproducing or duplication such as matrixes for mechanical pressing of an information structure ; record carriers having a relief information structure provided with or included in layers not specific for a single reproducing method; apparatus or processes specially adapted for their manufacture
    • G11B23/0064—Intermediate mediums, i.e. mediums provided with an information structure not specific to the method of reproducing or duplication such as matrixes for mechanical pressing of an information structure ; record carriers having a relief information structure provided with or included in layers not specific for a single reproducing method; apparatus or processes specially adapted for their manufacture mediums or carriers characterised by the selection of the material
    • G11B23/0071—Intermediate mediums, i.e. mediums provided with an information structure not specific to the method of reproducing or duplication such as matrixes for mechanical pressing of an information structure ; record carriers having a relief information structure provided with or included in layers not specific for a single reproducing method; apparatus or processes specially adapted for their manufacture mediums or carriers characterised by the selection of the material additional layers for lubrication or wear protection
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G11B7/266—Sputtering or spin-coating layers

Definitions

  • the present invention relates to a novel high density information storage medium, and more particularly to such a medium including a recording layer adapted for optical data recording having protective overcoat means and related coatings adapted to enhance recording characteristics.
  • Optical storage of digital data is a relatively new technology, concerned with the storage and retrieval of digital information utilizing optical techniques and using a special related (ODD, "optical digital data") medium, such as an ODD disk.
  • ODD optical digital data
  • ODD optical digital data
  • Extended Archival life Optical data storage technology is attractive because it promises increased storage capacity.
  • An optical data disk as here contemplated will be assumed to store information thereon for an extended archival life; the goal is 5-10 years or more under typical, and extreme, service conditions for data processing (DP) apparatus.
  • DP data processing
  • Such extended life is a goal as ' yet unattained in the art, though workers have long striven towards it.
  • the present invention points toward improved ODD media better adapted for such archival life; media which are especially adapted for "optical mass memory” and like applications, with emphasis on improved overcoat and/or spacer means.
  • the spacer layer may preferably comprise a "soft pad” which is vapor-deposited on a reflector layer, and upon which the absorber (recording) layer may in turn be deposited.
  • This spacer layer may comprise a so-deposited fluoropolymer which is highly transparent to the contemplated read-write wavelengths and which also provides good thermal and mechanical insulation, isolating the absorber layer from the reflector layer, (note the reflector is typically a highly conductive metal which could otherwise function as a heat sink, draining recording energy away from the absorber layer and reducing its effectiveness) .
  • a vacuum-evaporated fluoropolymer like polytetrafluoroethylene (PTFE) or fluorinated ethylene propylene copolymer (FEP).
  • PTFE polytetrafluoroethylene
  • FEP fluorinated ethylene propylene copolymer
  • a "low-energy" recording pulse (moderate-to-low power for about 40 n.sec) has difficulty recording when a single quarter-wave optical thickness of SiO, is used (atop Al reflector) ⁇ this very thin spacer evidently allows too much recording heat to escape and be wasted.
  • thicker spacer layers are possible, of course; however, thicker SiO- layers can complicate and degrade production processes, especially because they typically will constrict the absorber and drop sensitivity and because they can narrow the bandwidth where low reflectivity obtains (cf. "Design and Production of Tellurium Optical Data Disk” by J. Rancourt, SPIE Proceedings; Advances in Laser Scan Technology, page 57 Vol. 299, 1981).
  • OMPI One aspect of this disclosure is to teach the preparation and use of such a "soft pad" spacer material, including associated deposition methods, and especially such apt for such OD disks — and even more especially such which are typically convenient for low-energy recording with present laser equipment (e.g., writing with a He-Ne laser in a 5-20 mW/40 n.sec pulse — cf 25 MHz rate) .
  • —Overcoat generally:
  • bits are contemplated as being about one micrometer in diameter. But surface
  • another aspect of this disclosure is to provide an overcoating which avoids most or all of the foregoing shortcomings, doing so by providing a two-part overcoating made up of a "soft pad” inner layer and a “hard” outer sealing layer — i.e. with a “Hard/Soft” overcoat.
  • the soft inner pad is intended to be yielding and quite compressible (as a “mushy cushion") allowing the subjacent absorber to distort and/or move during write- heating, while also providing good thermal insulation low thermal conductivity; relatively low specific heat) .
  • this "soft pad” seems to better isolate ne absorber, mechanically and thermally; while the "hard” outer coat gives optimal mechanical protection (e.g. a seal against vapor entry).
  • such layers should also bond well, be highly transparent to the contemplated read/write wavelengths and preferably be convenient and inexpensive to apply.
  • a "soft pad” is so effective as such isolation that even where only used as a subjacent "spacer” (e.g. with Si0 2 directly over absorber) it has been seen to enhance sensitivity (e.g., vs. replacing it with an SiO- spacer).
  • such a "soft pad” coating is preferably applied as a vacuum-evaporated film with essentially the same facilities as those used to deposit the absorber layer (e.g., during a related, succeeding deposition step, and with common equipment) .
  • the consequent convenience and reduced cost, time, etc. will be evident.
  • preferred materials satisfying most or all of these rather stringent "soft pad” requirements such as the mentioned fluoropolymers (FEP and PTFE).
  • FEP and PTFE fluoropolymers
  • a class of plasma polymerized polymers such as a polyethylene or "Parylene” (TM, as para-xylene by Union Carbide, cf U.S. 3,342,754).
  • TM polyethylene or "Parylene”
  • xhe thickness of this "soft pad” overcoat is preferably such as to so decouple the absorber layer (thermally and mechanically) from any supercoating (especially a "hard” layer applied over the "soft pad”) — and also to bond favorably with the underlying absorber (e.g.
  • the absorber' is suitably “decoupled” from a hard “outer” overcoating, while also preventing the hard overcoating, and/or any stress therefrom, from constraining the absorber and so interfering with pit-formation therein — yet bonded well enough to the "hard” coat to prevent "delamination", moisture intrusion, etc. in service, these easily upsetting the needed optical properties — cf. a mere 100 A° shift can destroy the required "tuning") .
  • SiO or SiO- as known applied directly on the absorber layer can be expected to constrict it, and restrain such deformation or translation during "bit-writing” — thus interfering with bit formation and degrading sensitivity and recording efficiency, so that more write-energy is needed.
  • most silicon oxides absorb too much moisture.
  • SiO- evaporo- deposited on a "cool” substrate
  • materials like FEP or PTFE cf these can be deposited as relatively "non-porous” films under like circumstances.
  • workers will see how important and useful a proper "soft pad” of the type described can be, especially where one wants to enhance the recording efficiency of an adjacent OD absorber layer.
  • Another form of this feature is to so provide a "soft pad” coating over an absorber layer and, where possible to do so using common deposition techniques.
  • a related feature is to provide a like "soft pad” spacer layer beneath the absorber in some instances — whereby one may thermally and mechanically isolate the absorber from interference generated from above and/or below.
  • a related feature is to superpose a "hard” protective overcoating outward of this "soft pad”, overcoat e.g. to serve as a good vapor barrier, and as a mechanical "cover” and an anti-static surface, as well as to complete the necessary optical thickness for "defocusing" surface contaminants — i.e., a "Hard/Soft” overcoat.
  • OMPI A further improvement on the above is to so apply a ( luoropolymer) "soft pad” which is sufficiently soft and yielding as to mechanically decouple the adjacent absorber layer, freeing it to "move” as written, while also isolating it thermally (i.e. to so function, either as a subjacent '"spacer” or as an overlying "soft overcoat” or as both) .
  • a further improvement is to so provide such a "soft pad” spacer using an organic layer which is made strongly adherent to an underlying reflector layer while also being relatively differently adherent to a superposed absorber layer.
  • a related feature is to provide such a "soft pad” overcoat which bonds to a superposed hard overcoat relatively firmly but bonds differently to a subjacent absorber.
  • a novel pre-polymer formulation is described below (e.g. see Mix H-l).; it is intended to provide such a "hard” protective overcoating for such OD disks (extended archival life, etc.) and especially as a super-coat over such a "soft pad” overcoat. Mdre particularly, it is intended to provide a "clear” coating (transparent at the contemplated R/W wavelengths), of a thickness to help "defocus" surface dust, etc. (e.g., up to 6-8 mils here) and to provide an environmental
  • OMPI barrier against mechanical interference or vapor intrusion especially water, aqueous aerosols, sulfates or NaCL or other chlorides. It is intended to so function rather like known overcoatings (of a "glass” for instance), and to provide good mechanical protection, (e.g. allowing one to lightly squeeze the disk, though it need not resist a positive cutting action, such as scraping with fingernail — note: without some such a hard super-coating, the soft FEP layer can be wiped-off readily) .
  • known "hard" overcoatings of a "glass” for instance
  • radiation-cured polymers especially acrylics
  • a hard protective overcoat for such optical data disks as well as teaching related methods of preparing and applying them.
  • a preferred family of hard coat materials is made up of a number of "acrylated monomers” (or “pre-poly ers”, i.e. a ligomer or resin that will undergo further polymerization — especially where the principal constituent is a suitable
  • CMPI acrylate or acrylamide CMPI acrylate or acrylamide
  • a preferred version includes an appropriate acrylated epoxide and acrylated acrylate, together with an acrylate cross-linker and associated acrylate diluent plus photo-initiator, and preferably including a prescribed "setting surfactant".
  • a minor portion (e.g., 10%) of the Mix may comprise one or more additives (preferably organics which will participate in the UV polymerization, e.g. styrene or like vinyl-ethers do this) .
  • additives preferably organics which will participate in the UV polymerization, e.g. styrene or like vinyl-ethers do this.
  • Such acrylics are evidently eminently suitable for several reasons: they do not include (any significant portion of) problematic components like "shrink-prone solvents" and they require no problematic cure conditions (such as extreme heat). They seem to be especially apt for providing a final "Hard” polymeric overcoat which has the required characteristics.
  • cure- radiation may be something as inexpensive, quick and convenient as a few seconds exposure to a UV source (of appropriate ⁇ ; intensity, etc.) and involve as little as 5% shrinkage. Or, where cost is not a major concern, one may instead cure with electron-beam or gamma radiation. Alternatively, a peroxide (catalyst) curing may be feasible in some cases. And, whatever the primary curing mode, it will be understood that light supplemental heat may, in certain cases, be so applied to hasten complete curing.
  • acrylic overcoat polymers are preferably applied in a spiral configuration on a host substrate-disk, being evenly distributed thereon (e.g., with appropriate disk rotation and inclusion of a certain particular fluoropolymer "setting-agent"), and allowed (or in some cases induced) to settle and flow-out evenly.
  • This is seen to spread the mix across this surface with exceptional smoothness and uniform thickness — e.g. giving a thickness variation as little as + 0.7 to 7.0 micrometers in a 7 mil coating across a disk-band several inches wide (e.g., the outer-half of a 14" disk).
  • This is quite striking. Workers in the art, whether involved with such acrylic coatings or other coatings, will recognize that the simplicity and novel advantages of such a coating technique are quite remarkable.
  • the related discovery of a particular "setting-agent” is, surprisingly, seen to not only provide the usual surfactant properties (such as enhancing wetting, leveling, etc.) to a remarkable degree, but also to "set” the mix — i.e. to cause the spiral rows, once applied to the host disk, to "set up” and remain in place until self-leveling (or being contacted with an appropriate leveling-solvent) .
  • Such a “setting action” will be seen to enhance the simplicity of the coating technique; for instance, it allows the host disk surface to be slowly rotated in the course of applying these spiral rows without the material deforming or moving asymmetrically under associated centrifugal forces.
  • OMPI One variant of this novel application technique includes a "solvent leveling" step wherein the spiral rows of the mixture so-applied on the disk, may be induced, upon contact by a proper solvent vapor, to "wet” (with the disk surface) and spread themselves across the disk surface with remarkable uniformity and speed.
  • Particular solvents are suggested for this, especially apt for the preferred coating materials and substrate surface.
  • a further object is to teach preparation of such "soft pad” layers using fluoropolymer materials, especially as deposited by vacuum evaporation. Another object is to provide such "hard” overcoatings and associated preferred materials and application techniques. DESCRIPTION OF THE DRAWINGS
  • FIG. 1 provides a cross-sectional view of an idealized portion of a prior art recording medium
  • FIG. 2 provides a similar view of a novel preferred recording medium embodiment exhibiting a construction in accordance with features of the present invention
  • FIG. 3 very schematically indicates a preferred method of applying overcoat material according to another feature hereof, while FIG. 4 shows a very idealized sectional view of material so applied; and
  • FIG. 5 shows a like sectional view under modified conditions;
  • FIG. 6 is a profile of outer-coating thickness variation
  • FIG. 8 is a plot of Table rpm and arm velocity as a function of radial position on a disk, ' these values being tabulated in FIG. 7.
  • FIG. 1 will be understood to (schematically and in idealized fashion) depict a fragmentary section of an optical data disk R-dd, including a substrate disk S supporting a recording tri-layer T and overlying protective overcoat 100.
  • Disk R-dd will be understood as intended and adapted for recording by a known radiation source (Laser L) directing a beam LB at tri-layer T so as to record certain bits therein (cf sample "bit-hole” 98-a in absorber layer 98) — these to be “read” using prescribed associated detect means (DET).
  • the wavelength of the reading laser beam (LB of FIG. 1) is chosen so that unrecorded regions of disk R-dd exhibit the desired anti-reflection condition; read-beam intensity will be kept low enough so as to not disturb the integrity of data recorded on the disk.
  • Substrate ' S preferably comprises a relatively conventional magnetic recording disk 90 with a smoothing layer 92. applied thereon as necessary.
  • Tri-layer T comprises a transparent spacer layer 96 atop a reflector film 94, with a suitable absorber or recording film 98 superposed on layer 96.
  • the reflected read-beam will be intensity-modulated by optically detectable changes at bit sites where data was recorded, (e.g., at "hole” 98-a).
  • the read beam will experience relatively high reflection when incident on a "bit” (e.g. "hole” 98-a) and relatively low reflection when incident on unwritten regions.
  • Protective layer 100 is chosen and arranged so that dust particles on its upper surface will be displaced far from the focal plane of the optical system (i.e, placed out of focus); and so have a negligible effect on the recording and reading operations.
  • absorber film 98 At any given bit-site (98-a) , must be heated to a prescribed (minimum) write-temperature (Tw) .
  • Tw write-temperature
  • the level of minimum temperature Tw is believed to depend on the properties of absorber 98 (e.g. on its thickness, metallurgy, microscopic structure, etc.) and also on the properties of subjacent spacer 96, as well as upon "interface characteristics" between the spacer 96 and absorber 98, and possibly between overcoat 100 and absorber 98. It will be found that a finite time is required for writing at a "bit site” (e.g. region 98-a on which the writing laser beam is here assumed to be focused) to reach this requisite minimum "recording temperature” Tw.
  • PTFE polytetra- fluoro-ethylene
  • FEP fluorinated
  • fluorinated polymers commercially available (e.g., under the name “Teflon", a trademark of DuPont) .
  • Teflon a trademark of DuPont
  • Such a fluorinated polymer can be vaporized and deposited over the reflective layer 94 (FIG. 1) in thin uniform layers; especially, for
  • the aluminum 94 may be so evaporated under high vacuum, in a large, batch-coating chamber with corresponding large coating distances and "double-rotation" of substrate, etc., to better ensure uniformity. All dust and stains on parts should be reduced to a strict minimum, using rigorous "Clean Room” techniques.
  • the spacer 96 is similarly deposited atop reflector 94.
  • a film of tellurium on the order of 50 Angstroms thick will be assumed as the illustrative absorbing layer.
  • Analogous uses of tellurium are presently known in the art (e.g., see above cited references; also see "Optical Properties of Tellurium Films Used for Data Recording" by Ash and Allen, SPIE Proceedings, #222, 1980; and see
  • Tellurium, or some other "absorber metal" having a low melting point and poor conductivity is commonly preferred by workers because it is felt to exhibit superior sensitivity, thus minimizing required (threshold) laser write-power. It is not particularly recommended here because of its poor archivability; but it is very useful for purposes of illustrating the invention because it is so well understood by workers (also because its "deformational" hole-forming mechanism seems well-suited for taking advantage of "soft pad supercoats” as here taught) . For instance, in U.S.
  • the optical data disk is constructed to comprise a polished glass substrate on which is laid an aluminum reflective film about 600 A° thick; then, on the aluminum, an FEP (fluoroethylene-propylene) copolymer as a "soft pad" spacer layer approximately 1100 A° thick, with a tellurium absorber film approximately 66 A° thick laid upon the spacer.
  • the reflector, spacer and absorber layers are deposited, in a single continuous sequence and with a single common apparatus, by vacuum evaporation, as described above and consistent with present good practice.
  • the material is resistanc ⁇ '-wire heated in a "boat" or like vessel in the high-vacuum chamber (e.g., FEP rods may be cut to convenient sizes for placement in the boat; relatively little heat is needed to vaporize the FEP since its boiling point is quite low. Electron gun vaporization is disfavored as it will likely decompose FEP) . And in certain instances, a like chlorinated hydrocarbon, such as "Parylene” (Union Carbide, Trade Name), may be substituted. A "modified" form of FEP will be understood as so-deposited; e.g., when a relatively high molecular wt.
  • fluoropolymer like "Teflon 140" by DuPont is cut from rods into bits and so vacuum evaporated, we conjecture that it deposits, on the A1 reflector film as a "different" polymer, probably of lower molecular wt. and characterized by shorter-chains, cross-linked weakly, if at all, (e.g., it is so soft and weakly-bonded, a finger stroke will wipe it off).
  • the FEP breaks down, then migrates to the relatively cool Al surface when it condenses and re-polymerizes (whereas when so heated in-air, FEP is believed to decompose into perfluoro-propylene and tetrafluoroethylene monomers) .
  • Fluoropolymers like FEP and PTFE are of a generally paraffinic structure, with some or all of the hydrogen replaced by fluorine. Both are sold by DuPont Co. under the trademark "TEFLCN”. They are highly inert
  • FEP copolymer is made by copolymerizing tetrafluoroethylene and hexafluoropropylene. FEP has a crystalline melting point of 290 c and its molecular structure consists predominantly of linear chains as:
  • PTFE is a highly crystalline fully-fluorinated polymer made by (free radical initiated) polymerization of tetrafluoroethylene.
  • PTFE polymer has a crystalline melting point of 327 C; its molecular structure consists predominately of linear chains, as:
  • Such an Al substrate should be somewhat reactive and can likely promote polymerization and cross-linking (like a "Ziegler catalyst"; e.g. cf. article by M.S. Toy, 34 J. Polym. Sci. 273, 1971), as well as possibly inducing a relatively strong chemical bond either to Al metal or to an Al intermediate.
  • a "Ziegler catalyst” e.g. cf. article by M.S. Toy, 34 J. Polym. Sci. 273, 1971
  • cross-linking of the FEP would be expected to be maximal immediately adjacent the Al film, and to decrease as one proceeded away from the Al up through the FEP-spacer thickness. (This may, or may not, be significant for deriving the desired "absorber isolation", enhanced sensitivity, etc.).
  • Sensitivity will be understood as characterizing the write-energy E , i.e., the laser beam necessary to change reflectivity (or a like read-out characteristic) sufficient to give the specified minimum read-out.
  • the intensity and time exposure of the focused Write-Beam here will be understood as sufficient to so elevate the temperature of absorber layer 98 as to cause the indicated change in reflectivity, giving desired read-out quality, etc. (e.g. so that adequate contrast, S/N ratio) may 'be realized, as understood by workers in the art, — cf an exemplary S/N ratio of 40-50 dB (peak-to-peak signal vs. RMS noise) for a bandwidth of about 15 Mhz.
  • Laser recordings are made on the resulting optical medium at 2400 revolutions per minute using apparatus of the general type referred-to in connection with FIG. 1 (above).
  • a Helium-Neon laser is again used for recording (wavelength of 0.633 um) .
  • the focused laser beam "spot" on the- medium film 98 is approximately 0.5 um. Resulting sensitivity of such recordings will be found to be quite good — better than conventional approaches, like that of Sample 0, have lead one to expect (e.g., tests indicate that only about one-half the expected write-energy is necessary for acceptable recording; and leakage of write-heat from a bit-site down into the spacer was found to be quite low using FEP — something that is quite desirable, e.g., evidently helping to enhance "sensitivity").
  • FEP gives the desired adhesion, bonding rather strongly to the Al reflector film, but differently (evidently) to the overlying (Te) absorber film.
  • cross-linking was found to be at a maximum immediately adjacent the Al layer, while decreasing (lower density) as one proceeds away from the Al, and weakest
  • the FEP gives a nice optically-clear layer with a relatively low refractive index (about 1.3 vs. about 1.5 for fused silica, a value somewhat higher than optimum).
  • Sample II-A (i.e. Sample 0, as so-overcoated) gave no satisfactory read-out. This is a striking difference in sensitivity ⁇ something not fully appreciated heretofore, and evidently due to the improved heat conservation and mechanical compliance of the "soft pad" spacer.
  • the disk of Sample II is duplicated, except that ⁇ che absorber film is covered with a layer of FEP (like the spacer layer, and likewise deposited) , about 9500 A° thick (no Si0 2 supercoat) .
  • Disk ⁇ in FIG. 2 illustrates a preferred example of the features mentioned above, and especially the (general) teaching of a "Hard” overcoat applied over a "soft pad” layer covering an absorber recording film — i.e. a novel "Hard/Soft” overcoating structure 0-C (cf FIG. 1, Hard coat g and soft pad layer f over absorber e, which is part of the same sort of ODD "tri-layer" T-L as before, applied on substrate S'). It will now be described with reference to this schematic showing.
  • the substrate portion may be thought of as the aluminum substrate disk A, treated, when necessary, with a smoothing or subbing layer B to make its surface sufficiently smooth.
  • substrate A is preferably a common "Winchester" disk, of an aluminum alloy and prepared as is typical for fabricating disks for high speed magnetic recording of digital data (e.g., as used in computer memory systems) .
  • the surface of such disks is commonly polished, diamond-turned or otherwise smoothed, as workers well know.
  • a suitable glass or plastic disk may be substituted in certain instances.
  • “Subbing” layer B will be understood as applied to the bare, well-cleaned disk surface.
  • the “subbing” preferably comprises an organic material to so smooth the microscopic irregularities on tne surface of substrate A to well under "hole size” (e.g., about 0.5 um or less in diameter). If €he surface is already smooth enough (e.g. if a highly polished glass disk is used), a subbing layer may not be necessary, as workers know.
  • This substrate is thus understood as preferably comprising a 14" disk to be operated at about 1800 (to several thousand) rpra, with good surface smoothness.
  • a radiation (laser) beam of prescribed energy and wavelength will be understood as applied to medium R_ from a laser source L (see FIG. 1), being activated and focused at "write time” so as to render a "pit", “hole” or like optical "anomaly” apt for the contemplated read-out on recording layer e in the course of "writing” (e.g. analogous to site 98-a in FIG. 1). More particularly, one may, for example, contemplate using a 10 mW gaussian beam with diameter of 0.8 vim (i.e. 8000 A°) and scanning at 45 m/sec. to form an optical transition with a certain minimum length
  • the coating parameters here will be understood as selected to preferably provide an "anti- reflective" condition for the so-coated disk at the contemplated recording frequency when the write beam is focused on this absorber layer.
  • the recording face of disk R_ may be visualized as an "absorber layer” (e) together with an appropriate subjacent “spacer layer” (d) and a “reflector layer” (c), below spacer d, as well known in the art.
  • aborber layer e
  • spacer layer d
  • reflector layer c
  • such layers ( ⁇ , d and e) are preferably applied by successive evaporative coating sequences with appropriate materials in a single high- vacuum chamber, and preferably together with "soft pad” overcoating (f) also as described below.
  • these applications might be rendered by a suitable plasma polymerization technique or other appropriate methods for producing films of the mentioned type.
  • Reflector layer c comprises, preferably, a layer of high reflectivity metal such as vapor-deposited aluminum as above discussed; e.g., deposited until layer c is "just opaque” under the contemplated illumination, as viewed through layer c (as workers knowledgable about making evaporated reflectors well know, too thick a reflector will degrade reflectivity) . And as workers know, other metals can be used so long as they provide sufficient high reflectance at the contemplated R/W wavelengths — however, unless great care is. taken, a substitute reflector metal may not yield the reactivity and bonding synergism that Al seems to exhibit with FEP (and equivalent spacer material) . Another option is to use dielectric films of alternating high and low index, and with a quarter- ⁇ wave reflector.
  • Spacer layer d is intended to function, in combination with the reflector layer c and absorber layer e, to reduce the reflectance of the "tri-layer" assembly to zero, or to some other predetermined reflectance value.
  • the materials used will preferably be relatively “non- absorbing” and highly transparent to the contemplated R/W wavelengths.
  • the thickness of spacer d will depend on its - J5 -
  • a thickness of 0.5 to 1.5 quarter waves will be used.
  • the subject spacer material preferably comprises FEP, PTFE or a like fluoropolymer — preferably as vapor-deposited, as above described; e.g., in a common vacuum apparatus, along with layers ⁇ and e (and possibly with layer f, as well) .
  • j_ayer e (FIG. 2, still) is the absorbing film in which'the working incident "write energy" is to be concentrated. The absorber of Sample I will be assumed. —Overcoat portion:
  • Soft pad coating f preferably consists of a convenient thickness (e.g., a few thousand A°) of FEP or a like polymer (e.g. preferably and conveniently be the same material and deposition method as for spacer layer d) , Iti is preferably formulated and deposited (on absorber e) as the FEP coatings described above, most preferably D ⁇ ing laid- down in the same overall ⁇ eposition sequence; cf with tri-layer T-L for convenience. Where using the "tri-layer”, it will be convenient to detect and control thickness with layer f being deposited as one or more half-waves. As workers will realize, a number of half-wave thicknesses will make tne soft overcoating "disappear" optically, and thus not reflect read/write energy meant for the absorber layer (— this would reduce system efficiency) .
  • SfcEAi OMPI "Soft pad" supercoating f will be sufficiently yielding and compressible to maximize sensitivity, will oe relatively non-porous, thermally insulative, with a relatively low specific heat, as well as being highly transparent to the contemplated R/W wavelengths ( r) as mentioned above. Also, it will bond firmly to a superposed barrier layer, but couple rather loosely to the underlying absorber (e.g. which preferably will be relatively non-reactive with the "pad”) — also a flash inter-coatings can, of course, be used.
  • FEP and PTFE as above-described will be found to meet most, if not all, these stringent requirements (as summarized in Table I above), though other like materials (e.g. like "weakly-polymerized” fluoropolymers) will be suitable in appropriate instances. And, when such "soft pads” sandwich an absorber on both sides, the "thermal-mechanical isolation” thus afforded will be recognized as exceptional.
  • overcoating 0-C on absorber e i.e. the outer portion
  • absorber e i.e. the outer portion
  • Hard overcoating layer g preferably of the below-specified acrylics. This serves not only to provide outer mechanical protection and the needed defocusing thickness (with pad f) , but also serves as a good vapor barrier and anti-static surface.
  • the preferred formulations for hard overcoat g and related preferred methods for preparing and applying such are detailed below.
  • the thickness of layer g will, to some extent, depend on the optical system used (e.g., correcting spherical aberration in the focusing objective may be -involved) ; it has been fo ⁇ nd that thicknesses on the order of 100 -180 micrometers are quite suitable for this embodiment.
  • PTFE PTFE
  • fused silica e.g. reducing required write-energy, giving longer; better environmental stability and service — especially in respect of moisture uptake — e.g., when combined with a suitable "Hard” overcoating
  • the "Hard” overcoat resulting will exhibit the usual properties expected of such a protective outercoat (e.g., hardness, abrasion resistance, non-tacky) , be readily cleaned (e.g., of dust, oil, fingerprints), be clear and transparent to 5 " N. and exhibit low permeability to contaminants like water vapor, oxygen, etc. Also, it bonds satisfactorily to the "soft pad".
  • a Hard coat material is applied- by spin-coating (according to present good practice) or by other suitable techniques known to workers (e.g. in certain instances, spray-coating, dip-coating, flow-coating or curtain coating may be feasible alternatives). Radiation-cured acrylic coatings like those detailed below will be understood as apt for most instances. —Other materials for Hard/soft overcoating:
  • the hard overcoat may take the form of a transparent sheet; e.g. or quartz, or a similar glassy material, laminated onto the "soft pad” or vice versa — in some instances the "soft pad” may also serve as the adhesive for the Hard coat.
  • the hard overcoat may take the form of a transparent sheet; e.g. or quartz, or a similar glassy material, laminated onto the "soft pad” or vice versa — in some instances the "soft pad” may also serve as the adhesive for the Hard coat.
  • hard coating material to an OD disk or like substrate.
  • Example I ("Hard” coating on Sample IV; preparation, application, curing):
  • This Example is intended to describe the preparation and characteristics of a preferred radiation-cured acrylic hard coating mixture "H-l" as applied to the Sample IV embodiment (on FEP “soft-pad” supercoat over absorber) and also to describe a general method of applying this to a substrate and then curing it in situ; later, further details of a particular preferred method for applying this to a prescribed optical data disk will be described (see description in connection with FIGS. 3 and 4).
  • the following "Hard overcoat" prepolymer mixture H-l is prepared, being intended for application as a “Hard” protective overcoating, about 7 mils thick, and having the described characteristics as uniformly spread and cured on a prescribed optical data disk surface.
  • This surface may be understood as comprising a properly-treated aluminum disk substrate (e.g., with smoothing pre-coat thereon) with a tri-layer optical recording matrix superposed thereon, rollowed by a vacuum-evaporated thin, "soft pad” supercoating (of FEP or a like "soft pad” luoropolymer, evaporated, deposited and repolymerized and about 9500 A° thick) .
  • a vacuum-evaporated thin, "soft pad” supercoating of FEP or a like "soft pad” luoropolymer, evaporated, deposited and repolymerized and about 9500 A° thick
  • Such a "modified FEP polymer” is, thus, the substrate of choice here. Mix H-l Parts, by wt. Pref. Range
  • Celrad 1700 (Celanese Corp) 120 105 to 135 Celrad 3200 (Celanese Corp) 40 35 to 45 TMPTA 160 145 to 175 2-ethylhexyl acrylate (2-EhA 180 160 to 200 "FC-430"(3M Co.) 2. 5 2.5 Darocure 1173 (E.M. Chemicals) 5 5
  • the Celrad 1700 will be understood to be an acrylated acrylate of relatively high molecular weight and readily cured by ultraviolet light (as below) when properly initiated.
  • This basic pre-polymer entity is selected to impart the desired toughness, strength and chemical stability to the cured * coating over relatively extended service life; and because it very quickly and conveniently cures and yields good clarity; also like all the other constituents it is preferred here because it is generally low-cost, easy to formulate and apply, and because it yields the desired "archival" protective coating (as mentioned elsewhere) .
  • the Celrad 3200 is an acrylated epoxide of relatively low molecular weight (1000-2000 .w.
  • this formulation would be too thick and viscous to apply (see preferred spiral application technique below — e.g., mix must flow through a dispensing nozzle) . Also, the cured coating would likely tend to swell and crack. And, the "3200" is relatively inexpensive, compatible with the other ingredients and is believed to participate in the desired polymerization.
  • low-viscosity co-monomers or pre-polymer, low-viscosity diluents
  • low-viscosity co-monomers or pre-polymer, low-viscosity diluents
  • other Celrad formulations are lower in molecular weight and and could be substituted for the Celrad 1700 to drop viscosity even lower.
  • other common coating polymers are not feasible; for instance certain silicone resins raise solubility and curing problems.
  • TMPTA trimethyl-ol propane triacrylate
  • Other like cross-linking agents might be substituted, such as trimethyl-ol trimethacrylate.
  • Some such cross-linker will usually be used, — to enhance coating strength, etc., as workers well know —preferably another "low m.w.” cross-linker.
  • the 2-ethylhexyl acrylate (2-EhA) is an organic diluent, supplemental to the "3200"; it is added, here, to improve flexibility (e.g., scratch-resistance) of the final polymer coat and also to adjust (lower) viscosity. Workers will recognize that other such diluents may be substituted such as iso-decyl acrylate (though hardness, toughness and strength will suffer a bit) .
  • the "Darocure 1173" is a photo-initiator apt for such (UV) curing of such a mixture.
  • FC-430 is a fluoropolymer "surfactant” additive characterized as a "non-ionic surfactant” for organic polymeric coating systems and also exhibiting the mentioned "setting” functionality. It is known to help with wetting, leveling, spreading functions and as a flow control agent, being adapted for reducing surface tension of certain coatings on certain substrates. It is promoted as being “ very non-reactive and as compatible with water-based or solvent-based systems (and with most polymers) .
  • FC-430 might, with certain adjustments, be replaced by a like surfactant “FC-431” (also by 3M Co. — is diluted 50% by isopropanol and ethyl acetate; it has a higher molecular wt. and is not preferred here).
  • FC-430 may also be replaced by other such surfactants which also give the described "setting” action (for an acrylic mix like H-l on a substrate like "modified FEP”).
  • FC-430 is intended to enhance this "setting action" in cases of the type illustrated in FIGS. 3 and 4, where, in the course of distributing the monomeric mix on the disk, one rotates the disk — because the so-applied "beads" must resist centrifugal rotational forces lest they be shifted 'asymmetrically; something that can cause an uneven coating, as workers will understand.
  • FC-430 additive might not be critical and might be omitted (e.g., one might employ a different "non-setting” surfactant) ; tor instance if the substrate disk were not kept rotating during mix application (—e.g., the mixture might be made "self- leveling” — see below) .
  • the Mixture H-l is, in any case, "viscosity-adjusted" to optimize spreading and disk-application; here, final viscosity should be in the 100 to 150 cp range, given the subject ambient conditions (room temperature, FEP substrate surface, etc.) .
  • the coating is photo-cured by exposure to ultraviolet light for a few minutes while the disk is slowly rotated. This renders a good fully-cured "hard” overcoating (no supplemental heat needed, no aging time necessary for complete polymerization) . More particularly, and preferably, a nitrogen pre-flush is invoked (e.g., for about 30 sec. to drive off all oxygen) ; then exposure, under nitrogen, to UV for about one to three minutes, or sufficient to cure the coating as desired.
  • a nitrogen pre-flush is invoked (e.g., for about 30 sec. to drive off all oxygen) ; then exposure, under nitrogen, to UV for about one to three minutes, or sufficient to cure the coating as desired.
  • this is done while slowly rotating the disk (e.g. to 2 rpm — while exposing about a 40° to 80 sector to the UV at any one time; note: the preferred UV beam is passed through two heat filters; it is not monochromatic, but fall mostly in ⁇ .3 to 0.4 um. range, with intensity varying with A— e.g. 100 mW/cm for to 5 minutes at .366 um. -- longer if less initiator is used; curiously, such a brief relatively high-intensity exposure seems preferable to longer equivalent low-intensity exposure, evidently because it counteracts "oxygen-quench") .
  • A e.g. 100 mW/cm for to 5 minutes at .366 um.
  • Radiation-curing is preferred over other ⁇ superficially-related) methods.
  • "peroxide curing” is unduly complex and hard to control, and it exhibits short “pot life” (further, workers will recognize that the peroxide cure reaction is exothermic and "gassy", and subject to overheating, making it difficult to control and ⁇ angerous to handle — e.g., for good control of the peroxide cure, ⁇ temperatures should be kept low, thus undesirably extending cure-time; also since gases are evolved, if the cure proceeds too quickly, these gases can't adequately escape and be dissipated, but will induce an undesirable cloudy, semi-opaque light-scattering coating) .
  • Moisture resistance was particularly surprising and impressive — e.g., though not 100% impermeable, this hard coat will exhibit no swell-cracking even after extended immersion in water (14 days in one test). Similarly, the hard overcoat has been observed to withstand extended extreme temp./humidity cycling (e.g. from room temperature to 140°C and from about 40% humidity up to 80% humidity, for many weeks) .
  • this Hard outer-coating will be observed to exhibit extended stability ⁇ e.g. withstanding extended exposure to a rather extreme temperature/humidity cycling; also, the ttard coating appears free of "low molecular weight 5.
  • components like the surfactant or the photosensitizer or their by-products
  • This "stability" and associated toughness, etc. is believed to derive from the relatively cross-linked, long-chain polymer groups produced.
  • this hard coat adheres (satisfactorily) to the FEP "soft pad", as is desired. Such adhesion might not result where the hard coat and/or the "soft pad” were changed — in such a case, an intermediate.compatible (e.g.
  • Celrad 1700 80 120 Celrad 3200 80 ( 40 TMPTA 160 same 2-EhA 180 II FC-430 2.5 II Darocure 1173 5 ⁇ 1
  • Example I is replicated except that a variant mix "H-2" is formulated as indicated below, being otherwise similarly formulated, applied and cured.
  • H-3 Another alternative Mix, H-3, is formulated, applied and cured as with H-l, except that iso-decyl acrylate replaces 2-EhA: Mix H-3 Parts, by Wt. Celrad 1700 120 Celrad 3200 40 TMPTA 160
  • the desired coating thickness may readily convert this to a corresponding bead-mass/per running-cm (gm/cm) value for the "bead", whereby to empirically determine the desired number of spirals, with spiral spacing predetermined by the leveling mechanism (e.g.,for a spiral band extending from a radius of about 3.5" to about 7", close to band B. in FIG. 3, it has been found that 20 to 30 spirals under these conditions gives a very uniform coating approximately 7 mils thick; whereas 10 spirals or less badly upset thickness uniformity; and much more than 30 is too many — in any case, the spirals must not overlap) .
  • the leveling mechanism e.g., for a spiral band extending from a radius of about 3.5" to about 7
  • the method will be seen as involving the deposition of the coating material on the prescribed (FEP disk surface in a prescribed number of spiral rows, or “beads”; then inducing the ' spreading-out, or “leveling", of the "beads” into a very smooth, very uniform coating; and thereafter curing and hardening this coating to render the desired "Hard” protective overcoat.
  • a preferred Hard coating mix (preferably "H-l” described above) , will be understood as selected, prepared and disposed for application to the disk in a spiral row of uniform symmetrical "beads", being thereafter "solvent-leveled” (induce a rapid, highly-uniform "leveling" of the beads on the prescribed FEP surface) with the disk contemporaneously rotated slowly — i.e., only fast enough to compensate for asymmetrical gravitational forces, (wobble, or uneven disk orientation) and slow enough to assure that no centrifugal forces will upset the bi-directional, symmetrical, settling of the material, once so-softened into a smooth, uniform layer.
  • Mix H-l will be supplied as known by workers to a prescribed controiled-rate dispensing means n (like a syringe-nozzle n, as workers know) affixed on a reciprocable arm A.
  • Nozzle n is adapted and controlled (by known means) to dispense a prescribed, carefully-controlled, uniform stream st of the mix down onto the receiving (FEP) surface of the subject disk d at a constant rate — preferably starting at the disk periphery as indicated in
  • FIG. 3 (this way, centrifugal force F is opposed, and to some extent offset by a push-force F from an adjacent, spreading bead — as indicated below relative to FIG. 5).
  • Thewhile arm - will be understood as to be continuously shifted radially (inward) of disk d, carefully controlled so that this stream st moves radially of disk d while the disk rotates whereby to describe the specified spiral SR (e.g., arm A translated by a linear motor as with magnetic recording heads — maintaining uniform separation, and size, of the beads) .
  • Disk rpm may also be varied, as necessary, (see below).
  • nozzle n is controllably swept across a prescribed radius of disk d, as the disk is rotated, deploying mix in the continuous uniform spiral SR (of "bead" segments b being of uniform separation, size and shape, as workers in the art will appreciate).
  • the Mix may be supplied to nozzle n via known pressure-orifice control means (not detailed), arranged to dispense at a prescribed constant rate to form such a spiral (e.g., 25 beads across 3.5" radial band B-) • Workers will appreciate the resultant bead-distribution as artistically indicated in the partial sectional schematic view of FIG. 4 showing three adjacent bead rows b. The rows are separated by a prescribed constant gap gg (note: they cannot touch or overlap) and their cross-sectional configuration, size and linear mass will be kept at a prescribed constant value, adapted (by appropriate prior computation, as known in the art) to — once leveled uniformly — result in the desired protective overcoat thickness on the disk d (cf. outer coating g, FIG. 2).
  • disk rotation may be varied to lay down a uniform bead (e.g., on the order of 4 to 5 rpm at innermost radius, slowing gradually to finish at about 2 rpm at the outermost, thus giving uniform, linear bead-mass) .
  • nozzle n by arm A is also controllably varied (according to its distance from disk center) to maintain uniform, equally-spaced rows b, as known in the art.
  • dispensing rate may be varied to render the same uniform spiral, as workers well know.
  • the spiral array of beads is exposed to a homogeneous "fog” of solvent vapor whereupon the surface of the beads and intervening (FEP) substrate are quickly “wet” (with solvent condensate — preferably yielding a relatively continuous micro-film of condensate across all beads and exposed substrate) , such as to immediately drop wetting surface tension and induce the beads to "soften” and quickly “level” (i.e., immediately spread-out, gravity-urged, and symmetrically level themselves into the desired uniform coating) .
  • FEP intervening
  • disk d is preferably so rotated (e.g., 1-2 rpm here) — so the bead-flow will give relatively perfect coating uniformity — yet not so fast as to induce any centrifugal flow.
  • Solvent volatility is preferably kept quite high so that, once the beads and intervening (FEP) disk surface are fully “wetted", the solvent vapor will quickly volatilize and dissipate (or otherwise be withdrawn — e.g. by pumping) . Thus, during leveling, little or no solvent should remain present, preferably.
  • solvent characteristics, modifications The solvent will be selected, in light of the subject operating temperature, substrate surface and mix chemistry, so as to decrease the mix surface tension relative to the substrate (here FEP) at this temperature — whereby to soften it and induce a ready flow and "leveling".
  • the solvent is specified for these conditions and may require adjustment if they change — e.g., for a different coating mix or for a different substrate surface.
  • One advantage in using a solvent like acetone is that little or no residual solvent remains, unvaporized, before curing starts; otherwise one should substitute a solvent which can be expected to co-polymerize with the coating Mix H-l (cf methyl acrylate solvents can be so co—polymerized); and that will nowise inhibit polymerization or otherwise interfere with desired characteristics.
  • a styrene monomer may be used as the leveling solvent providing it is made sufficiently volatile, or a solvent like ethyl acetate, methylene chloride or methyl ethyl ketone (MEK) , as workers in the art will recognize.
  • Styrene can be expected to copolymerize, to some extent at least, with the acrylic mix; but the others will not and this should be fully volatilized-away.
  • disk rotation may cease and the disk be subjected to curing conditions — preferably without moving it from the "solvent leveling" station, lest coating uniformity be disturbed or contaminants be introduced (e.g., dust settle on the now-tacky surface).
  • UV curing is invoked at the solvent-leveling station. That is, with the material evenly spread across the subject disk surface, the coating is photo-cured by exposure to ultraviolet light under an inert atmosphere
  • UV e.g., 100 mW/cm intensity at .366 um.
  • workers will understand that other like curing methods (e.g., e-beam or IR radiation) may be used in certain instances, with appropriate adjustments (e.g., of the type, concentration of photo-initiator).
  • the thickness uniformity (on the order of +.7 to 0.7 um. over a 3.5" band for a nominal 7 rail coating) is quite remarkable, especially in view of the simplicity of the application apparatus and the type of 0 coating mixture involved.
  • the cure times and temperatures are quite convenient, as are the rest of the treatment conditions.
  • Example M-2 (no "solvent-leveling"): Example M-l is repeated except as otherwise specified below, with the beads being laid down in virtual contiguous contact, or near-contact, to induce immediate "self-leveling", 5 without need to invoke a solvent-leveling step.
  • the Hard coating mix (e.g. H-l) is again prepared (FC-430 may be unnecessary ⁇ see above) and is dispensed on the disk as a continuous spiral array, except that the inter-bead gap gg (FIG. 4) is reduced to 0 zero, essentially.
  • FIG. 5 where an initial bead b-1 is shown in phantom. Bead b-1 will virtually immediately “slump” and level itself (b-1 in full-line) so that when the adjacent bead, b-2, is laid down it will likely be contiguous with b-1 ( "as spread” a bit) .
  • FIGS. 6, 7 and 8 are offered.
  • FIG. 6 depicts (very schematically) how final coating thickness t will vary across the disk radius, with flow rate (r f ) kept constant; disk rpm (w,) and arm velocity (v ) are rather uniformly increased (e.g. in roughly 2:1 fashion, starting from disk periphery). It becomes apparent that this "self-settling" action is complicating the uniform coating process. To remedy this, we propose coating under a modified mode with rpm continuing to increase ( ⁇ w- • * ⁇ ⁇ - * ⁇ ⁇ radius) and with arm acceleration (aa » ⁇ va/t) first increasing some, then decreasing some, and finally increasing
  • Disk rpm will, in any case, preferably be minimized: i.e., generally, just about enough to allow the spirals to "inter-flow".
  • Example M-4 (as M-l, FEP sandwiches the absorber): Sample IV is duplicated, with both FEP layers being vapor-deposited from a vacuum chamber in common with the tri-layer.
  • the FEP "spacer” is of n A optical thickness, while the FEP “soft pad” supercoat is about 1-2 um. thick (e.g. preferably the order of 100X the thickness of the absorber film) .
  • the "Hard” overcoating is thick enough to defocus surface dust, etc. and is applied, as in the preferred Method M-2 above.
  • soft pad coatings like those disclosed herein will also be applicable for protecting other substrates and/or with other super-coatings (e.g. to advantageously use the imparted "isolation”).
  • the present invention is applicable for providing "isolation 0 layers" adjacent other similar recording material.
  • Hard outer coatings like those here taught may, of course, be used to cover and protect other substrates for like purposes; also the described “spiral” coating methods may be used with other materials (with appropriate 5 adjustments) .
  • coating structures may in appropriate instances be otherwise rendered — e.g. deposit a "soft pad” onto a “Hard coating” substrate (e.g. a 7 mil acrylate disk) , then deposit absorber onto soft pad, then deposit spacer/reflector, etc., onto absorber as required; 0 and, finally, applying adhesive and press-bonding this onto associated "Winchester disk", or like “carrier”.
  • WBPO herein are also applicable to "soft-pad” coated" recording tape, floppy disks and the like. Also, the present invention is applicable for providing a like protective outer coating for media used in other forms of recording and/or reproducing systems, such as those in which data is recorded and/or reproduced using IR exposure.

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)
  • Manufacturing Optical Record Carriers (AREA)

Abstract

Système optique de stockage de données utilisant un rayon laser d'écriture modulé par les données (L) et un rayon laser de lecture sans effacement de longueur d'onde prédéterminée. On décrit des supports optiques améliorés pour ces systèmes, caractérisés par des couches multiples (c, d, e, f, g) dont les caractéristiques optiques et l'épaisseur sont choisies pour s'adapter à une énergie de lecture et d'écriture et à une longueur d'onde prédéterminée de manière à obtenir une condition d'"anti-réflexion" pour les parties non enregistrées du support et une réflectivité relativement élevée pour les parties enregistrées. Un support optique préféré comprend une couche d'aluminium très réfléchissante (c), une couche d'écartement en polymère relativement transparent (d) recouvrant la couche réfléchissante, et une couche optiquement absorbante (d'enregistrement) (e) recouvrant la couche d'écartement. Une structure de recouvrement est spécifiée et peut consister par exemple en une couche d'une "pastille souple" (f) (par exemple, fluoropolymère) sur la couche absorbante, avec une couche "dure" (g) (par exemple acrylique polymérisé par radiation) déposée sur la "pastille souple" en tant que revêtement protecteur externe. De même, la "couche d'écartement" peut être réalisée en tant que "pastille souple". On décrit également des techniques de dépôt d'un revêtement acrylique dur par le procédé du "dépôt en spirale" (Fig. 3), etc.
EP19840900365 1982-12-17 1983-12-16 Supports recouverts pour enregistrements optiques et techniques de revetement relatives. Pending EP0128949A4 (fr)

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JPS61123033A (ja) * 1984-11-20 1986-06-10 Matsushita Electric Ind Co Ltd 保護膜構造体
JPH03225650A (ja) * 1990-01-31 1991-10-04 Sony Corp 光ディスクシステム

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4025671A (en) * 1973-01-12 1977-05-24 Philip Morris Incorporated Method for applying continuous longitudinal bands of liquid coating to a moving strip
DE2824403A1 (de) * 1978-06-03 1979-12-13 Veba Glas Ag Verfahren und vorrichtung zum beschichten von gegenstaenden, insbesondere glasflaschen

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3342754A (en) * 1966-02-18 1967-09-19 Union Carbide Corp Para-xylylene polymers
US4216501A (en) * 1977-03-28 1980-08-05 Rca Corporation Optical anti-reflective information record
US4101907A (en) * 1977-08-29 1978-07-18 Rca Corporation Overcoat structure for optical video disc
US4195313A (en) * 1978-02-24 1980-03-25 Rca Corporation Antireflective information record having an optically passive transparent layer
US4195312A (en) * 1978-02-24 1980-03-25 Rca Corporation Recorder and antireflective record blank having an optically passive transparent layer
JPS5558832A (en) * 1978-10-24 1980-05-01 Mitsubishi Electric Corp Signal recording and reproducing unit of optical type
US4222071A (en) * 1978-12-22 1980-09-09 Rca Corporation Sensitivity information record
JPS5613534A (en) * 1979-07-16 1981-02-09 Toshiba Corp Optical recording body and its manufacture

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4025671A (en) * 1973-01-12 1977-05-24 Philip Morris Incorporated Method for applying continuous longitudinal bands of liquid coating to a moving strip
DE2824403A1 (de) * 1978-06-03 1979-12-13 Veba Glas Ag Verfahren und vorrichtung zum beschichten von gegenstaenden, insbesondere glasflaschen

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of WO8402289A1 *

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