EP0068012A4 - A photomask and method of fabricating same. - Google Patents
A photomask and method of fabricating same.Info
- Publication number
- EP0068012A4 EP0068012A4 EP19820900445 EP82900445A EP0068012A4 EP 0068012 A4 EP0068012 A4 EP 0068012A4 EP 19820900445 EP19820900445 EP 19820900445 EP 82900445 A EP82900445 A EP 82900445A EP 0068012 A4 EP0068012 A4 EP 0068012A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- coverplate
- baseplate
- photomask
- index matching
- fluid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
- G03F1/48—Protective coatings
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
- Y10T428/24851—Intermediate layer is discontinuous or differential
- Y10T428/24868—Translucent outer layer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
- Y10T428/24917—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including metal layer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
- Y10T428/24926—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including ceramic, glass, porcelain or quartz layer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31—Surface property or characteristic of web, sheet or block
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Description
Claims
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US22245181A | 1981-01-05 | 1981-01-05 | |
US222451 | 1981-01-05 | ||
US06/287,970 US4361643A (en) | 1981-01-05 | 1981-07-29 | Photomask and method of using same |
US287970 | 1994-08-09 |
Publications (3)
Publication Number | Publication Date |
---|---|
EP0068012A1 EP0068012A1 (en) | 1983-01-05 |
EP0068012A4 true EP0068012A4 (en) | 1983-07-04 |
EP0068012B1 EP0068012B1 (en) | 1986-04-23 |
Family
ID=26916806
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP82900445A Expired EP0068012B1 (en) | 1981-01-05 | 1981-12-17 | A photomask and method of fabricating same |
Country Status (5)
Country | Link |
---|---|
US (1) | US4361643A (en) |
EP (1) | EP0068012B1 (en) |
GB (1) | GB2092773B (en) |
IT (1) | IT1140429B (en) |
WO (1) | WO1982002361A1 (en) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4537813A (en) * | 1982-09-27 | 1985-08-27 | At&T Technologies, Inc. | Photomask encapsulation |
US4499162A (en) * | 1983-06-24 | 1985-02-12 | At&T Technologies, Inc. | Photomask and method of using same |
US4537498A (en) * | 1984-05-03 | 1985-08-27 | At&T Technologies, Inc. | Focal plane adjusted photomask and methods of projecting images onto photosensitized workpiece surfaces |
US4529299A (en) * | 1984-05-03 | 1985-07-16 | At&T Technologies, Inc. | Interposer element for photomasks in projection printer |
US4915058A (en) * | 1988-11-21 | 1990-04-10 | Murray Douglas A | Window mask with releasable securing means |
US5076654A (en) * | 1990-10-29 | 1991-12-31 | At&T Bell Laboratories | Packaging of silicon optical components |
US5656093A (en) * | 1996-03-08 | 1997-08-12 | Applied Materials, Inc. | Wafer spacing mask for a substrate support chuck and method of fabricating same |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1803275A1 (en) * | 1967-10-17 | 1969-12-11 | Ppg Industries Inc | Process for the production of flat optical plates |
FR1596843A (en) * | 1967-12-12 | 1970-06-22 | ||
FR2280924A1 (en) * | 1974-08-02 | 1976-02-27 | Silec Semi Conducteurs | Protection of photoengraving mask in semiconductor circuit mfr. - by deposition of thin transparent layer on mask |
DE2845147B1 (en) * | 1978-10-17 | 1980-01-17 | Censor Patent Versuch | Projection mask |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1985074A (en) * | 1932-11-02 | 1934-12-18 | Zeiss Carl | Illumination system |
US2175343A (en) * | 1937-09-24 | 1939-10-10 | Radio Keith Orpheum Corp | Plate cooler for stereopticon slides |
US2317550A (en) * | 1941-06-17 | 1943-04-27 | Joseph D Ramsey | Projection device |
US3193840A (en) * | 1961-10-27 | 1965-07-06 | Raymond C Mercer | Apparatus for liquid immersion motion picture film projection |
US3400995A (en) * | 1965-12-09 | 1968-09-10 | Gen Precision Systems Inc | Heat dissipating film gate |
US3906133A (en) * | 1974-04-23 | 1975-09-16 | Harris Corp | Nitrocellulose protective coating on masks used in IC manufacture |
US4201581A (en) * | 1978-03-13 | 1980-05-06 | Eastman Kodak Company | Method of providing close contact for contact printing |
US4256787A (en) * | 1978-05-03 | 1981-03-17 | Massachusetts Institute Of Technology | Orientation of ordered liquids and their use in devices |
-
1981
- 1981-07-29 US US06/287,970 patent/US4361643A/en not_active Expired - Lifetime
- 1981-12-17 EP EP82900445A patent/EP0068012B1/en not_active Expired
- 1981-12-17 WO PCT/US1981/001681 patent/WO1982002361A1/en active IP Right Grant
- 1981-12-30 GB GB8139104A patent/GB2092773B/en not_active Expired
- 1981-12-30 IT IT25925/81A patent/IT1140429B/en active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1803275A1 (en) * | 1967-10-17 | 1969-12-11 | Ppg Industries Inc | Process for the production of flat optical plates |
FR1596843A (en) * | 1967-12-12 | 1970-06-22 | ||
FR2280924A1 (en) * | 1974-08-02 | 1976-02-27 | Silec Semi Conducteurs | Protection of photoengraving mask in semiconductor circuit mfr. - by deposition of thin transparent layer on mask |
DE2845147B1 (en) * | 1978-10-17 | 1980-01-17 | Censor Patent Versuch | Projection mask |
Also Published As
Publication number | Publication date |
---|---|
GB2092773A (en) | 1982-08-18 |
EP0068012A1 (en) | 1983-01-05 |
GB2092773B (en) | 1985-06-05 |
EP0068012B1 (en) | 1986-04-23 |
WO1982002361A1 (en) | 1982-07-22 |
US4361643A (en) | 1982-11-30 |
IT1140429B (en) | 1986-09-24 |
IT8125925A0 (en) | 1981-12-30 |
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Legal Events
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