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JPH04204946A - Exposing device - Google Patents

Exposing device

Info

Publication number
JPH04204946A
JPH04204946A JP33932790A JP33932790A JPH04204946A JP H04204946 A JPH04204946 A JP H04204946A JP 33932790 A JP33932790 A JP 33932790A JP 33932790 A JP33932790 A JP 33932790A JP H04204946 A JPH04204946 A JP H04204946A
Authority
JP
Grant status
Application
Patent type
Prior art keywords
lens
light
projection
mask
glass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP33932790A
Inventor
Yasuyuki Minamino
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70216Systems for imaging mask onto workpiece

Abstract

PURPOSE: To decrease the weight of a lens, to reduce the cost of an entire device and to make a gap between a glass mask and a transfer member large by constituting a projection lens of the assembly of a specified rod lens.
CONSTITUTION: Light emitted from a light source 1 is turned into the parallel rays of light by a condenser lens 2 to irradiate the glass mask 3, then the light in accordance with the projection pattern 3a of the mask 3 is allowed to pass through the projection lens 4 to irradiate a transfer member 5. Then, the rod lens 4a by which the light having refractive index distribution in a radial direction is bent is used as the lens 4, where many lenses 4a are regularly arranged. The gap between the lenses is filled with black silicone resin 4b so as to be attached, and the periphery of the lens is fixed with glass fabric base material epoxy resin black laminating plate 4c having nearly the same characteristic as the thermal expansion coefficient of the lens 4a.
COPYRIGHT: (C)1992,JPO&Japio
JP33932790A 1990-11-30 1990-11-30 Exposing device Pending JPH04204946A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP33932790A JPH04204946A (en) 1990-11-30 1990-11-30 Exposing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP33932790A JPH04204946A (en) 1990-11-30 1990-11-30 Exposing device

Publications (1)

Publication Number Publication Date
JPH04204946A true true JPH04204946A (en) 1992-07-27

Family

ID=18326407

Family Applications (1)

Application Number Title Priority Date Filing Date
JP33932790A Pending JPH04204946A (en) 1990-11-30 1990-11-30 Exposing device

Country Status (1)

Country Link
JP (1) JPH04204946A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001222003A (en) * 2000-02-10 2001-08-17 Dainippon Printing Co Ltd Method of forming pattern, and color filter
US6351305B1 (en) 1993-06-30 2002-02-26 Nikon Corporation Exposure apparatus and exposure method for transferring pattern onto a substrate

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7023527B2 (en) 1993-06-30 2006-04-04 Nikon Corporation Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
US6351305B1 (en) 1993-06-30 2002-02-26 Nikon Corporation Exposure apparatus and exposure method for transferring pattern onto a substrate
US6480262B1 (en) 1993-06-30 2002-11-12 Nikon Corporation Illumination optical apparatus for illuminating a mask, method of manufacturing and using same, and field stop used therein
US6509954B1 (en) 1993-06-30 2003-01-21 Nikon Corporation Aperture stop having central aperture region defined by a circular ARC and peripheral region with decreased width, and exposure apparatus and method
US6556278B1 (en) 1993-06-30 2003-04-29 Nikon Corporation Exposure/imaging apparatus and method in which imaging characteristics of a projection optical system are adjusted
US6795169B2 (en) 1993-06-30 2004-09-21 Nikon Corporation Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
US7088425B2 (en) 1993-06-30 2006-08-08 Nikon Corporation Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
JP2001222003A (en) * 2000-02-10 2001-08-17 Dainippon Printing Co Ltd Method of forming pattern, and color filter
JP4616439B2 (en) * 2000-02-10 2011-01-19 大日本印刷株式会社 Method of producing a color filter

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