EP0004880A1 - Electrodes for electrolytic processes, especially perchlorate production - Google Patents
Electrodes for electrolytic processes, especially perchlorate production Download PDFInfo
- Publication number
- EP0004880A1 EP0004880A1 EP79100917A EP79100917A EP0004880A1 EP 0004880 A1 EP0004880 A1 EP 0004880A1 EP 79100917 A EP79100917 A EP 79100917A EP 79100917 A EP79100917 A EP 79100917A EP 0004880 A1 EP0004880 A1 EP 0004880A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- weight
- coating
- platinum
- tin
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 19
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 title claims abstract description 12
- 238000000034 method Methods 0.000 title claims description 9
- VLTRZXGMWDSKGL-UHFFFAOYSA-M perchlorate Inorganic materials [O-]Cl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-M 0.000 title description 7
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims abstract description 41
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims abstract description 38
- 239000002184 metal Substances 0.000 claims abstract description 36
- 229910052751 metal Inorganic materials 0.000 claims abstract description 33
- 238000000576 coating method Methods 0.000 claims abstract description 31
- 239000011248 coating agent Substances 0.000 claims abstract description 27
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims abstract description 24
- 229910052697 platinum Inorganic materials 0.000 claims abstract description 15
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims abstract description 13
- 229910052763 palladium Inorganic materials 0.000 claims abstract description 12
- 229910052718 tin Inorganic materials 0.000 claims abstract description 12
- 239000000758 substrate Substances 0.000 claims abstract description 10
- XTEGARKTQYYJKE-UHFFFAOYSA-M Chlorate Chemical class [O-]Cl(=O)=O XTEGARKTQYYJKE-UHFFFAOYSA-M 0.000 claims abstract description 6
- 239000000203 mixture Substances 0.000 claims abstract description 6
- 238000005260 corrosion Methods 0.000 claims abstract description 5
- 230000007797 corrosion Effects 0.000 claims abstract description 5
- 239000011135 tin Substances 0.000 claims description 15
- -1 platinum group metal Chemical class 0.000 claims description 14
- 229910044991 metal oxide Inorganic materials 0.000 claims description 6
- 229910052787 antimony Inorganic materials 0.000 claims description 3
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims description 3
- 229910052797 bismuth Inorganic materials 0.000 claims description 3
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims description 3
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 claims description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 2
- 229910052785 arsenic Inorganic materials 0.000 claims description 2
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 claims description 2
- 229910052793 cadmium Inorganic materials 0.000 claims description 2
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 claims description 2
- 238000005868 electrolysis reaction Methods 0.000 claims description 2
- 229910052711 selenium Inorganic materials 0.000 claims description 2
- 239000011669 selenium Substances 0.000 claims description 2
- 229910052725 zinc Inorganic materials 0.000 claims description 2
- 239000011701 zinc Substances 0.000 claims description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 13
- 229910052760 oxygen Inorganic materials 0.000 description 13
- 239000001301 oxygen Substances 0.000 description 13
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 8
- 229910052719 titanium Inorganic materials 0.000 description 8
- 239000010936 titanium Substances 0.000 description 8
- 239000000956 alloy Substances 0.000 description 7
- 229910045601 alloy Inorganic materials 0.000 description 6
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Inorganic materials O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- YADSGOSSYOOKMP-UHFFFAOYSA-N dioxolead Chemical compound O=[Pb]=O YADSGOSSYOOKMP-UHFFFAOYSA-N 0.000 description 4
- 239000002019 doping agent Substances 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 3
- BAZAXWOYCMUHIX-UHFFFAOYSA-M sodium perchlorate Chemical compound [Na+].[O-]Cl(=O)(=O)=O BAZAXWOYCMUHIX-UHFFFAOYSA-M 0.000 description 3
- 229910001488 sodium perchlorate Inorganic materials 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 229910052715 tantalum Inorganic materials 0.000 description 3
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- WMWLMWRWZQELOS-UHFFFAOYSA-N bismuth(III) oxide Inorganic materials O=[Bi]O[Bi]=O WMWLMWRWZQELOS-UHFFFAOYSA-N 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000005764 inhibitory process Effects 0.000 description 2
- 229910000765 intermetallic Inorganic materials 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- JRKICGRDRMAZLK-UHFFFAOYSA-L persulfate group Chemical group S(=O)(=O)([O-])OOS(=O)(=O)[O-] JRKICGRDRMAZLK-UHFFFAOYSA-L 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- BZSXEZOLBIJVQK-UHFFFAOYSA-N 2-methylsulfonylbenzoic acid Chemical compound CS(=O)(=O)C1=CC=CC=C1C(O)=O BZSXEZOLBIJVQK-UHFFFAOYSA-N 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- 229910001252 Pd alloy Inorganic materials 0.000 description 1
- 229910001260 Pt alloy Inorganic materials 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 229910001362 Ta alloys Inorganic materials 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 1
- 229910002064 alloy oxide Inorganic materials 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000010405 anode material Substances 0.000 description 1
- 229910000410 antimony oxide Inorganic materials 0.000 description 1
- LJCFOYOSGPHIOO-UHFFFAOYSA-N antimony pentoxide Inorganic materials O=[Sb](=O)O[Sb](=O)=O LJCFOYOSGPHIOO-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 238000006056 electrooxidation reaction Methods 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 150000004967 organic peroxy acids Chemical class 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical class [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 description 1
- CJJMLLCUQDSZIZ-UHFFFAOYSA-N oxobismuth Chemical class [Bi]=O CJJMLLCUQDSZIZ-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- PXXKQOPKNFECSZ-UHFFFAOYSA-N platinum rhodium Chemical compound [Rh].[Pt] PXXKQOPKNFECSZ-UHFFFAOYSA-N 0.000 description 1
- HWLDNSXPUQTBOD-UHFFFAOYSA-N platinum-iridium alloy Chemical compound [Ir].[Pt] HWLDNSXPUQTBOD-UHFFFAOYSA-N 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- VSSLEOGOUUKTNN-UHFFFAOYSA-N tantalum titanium Chemical compound [Ti].[Ta] VSSLEOGOUUKTNN-UHFFFAOYSA-N 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical class Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
- 238000009423 ventilation Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
- C25B11/093—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds at least one noble metal or noble metal oxide and at least one non-noble metal oxide
Definitions
- the invention relates to electrodes for use in electrolytic processes, of the type comprising an electrically-conductive and corrosion-resistant substrate having an electrocatalytically-active surface coating, and to electrolytic processes using such electrodes, especially (but not exclusively) as anodes for the production of chlorates, perchlorates and other persalts and percompounds including organic peroxyacids.
- Patent Specification 3,882,002 proposed an anode for chlorine production having a valve metal substrate coated with an intermediate layer of tin dioxide which was covered with an outer layer of a platinum group metal or oxide thereof. Neither of these proposals was directed to improving electrolytic performance in the production of percompounds.
- An object of the invention therefore is to provide an improved electrode suitable for use as an anode for the production of perchlorates and other persalts, but which may also be used in other applications, such as chlorate production.
- an electrode comprises an electrically-conductive corrosion-resistant substrate having an electrocatalytic coating and is characterized in that the coating contains a mixture of at least one platinum group metal and tin dioxide dispersed in one another throughout the coating in the ratio of 8.5:1 to 3:2 by weight of the platinum group metals to the tin (as metal) of the tin dioxide.
- the platinum group metal/tin dioxide coating may also contain a stabilizer/binder, for example a compound such as titanium dioxide, zirconium dioxide or silicon dioxide. Additionally, the coating may include a filler, e.g. particles or fibres of an inert material, such as silica or alumina, particles of titanium, or zirconium silicate. Furthermore, the coating may also contain, e.g. as a dopant the tin dioxide in a quantity up to about 30% by weight (as metal) of the tin dioxide, of at least one additional metal or oxide of zinc, cadmium, arsenic, antimony, bismuth, selenium and tellurium.
- a stabilizer/binder for example a compound such as titanium dioxide, zirconium dioxide or silicon dioxide.
- the coating may include a filler, e.g. particles or fibres of an inert material, such as silica or alumina, particles of titanium, or zirconium silicate.
- the coating may also contain
- Such stabilizers or binders, fillers and dopants generally do not account for more than 70% of the total weight of the coating, usually far less.
- the preferred amount corresponds to a ratio expressed as parts by weight of Sb/Bi:Sn (as metal) of at most about 1:4 to about 1:10 or even as low as 1:100.
- the platinum group metals are ruthenium, rhodium, palladium, osmium, iridium and platinum. Platinum is the preferred platinum group metal in the coating, when a single metal is present, especially in anodes for perchlorate production. However, it is understood that alloys such as platinum-iridium and platinum-rhodium, also are useful for other applications. An alloy of platinum-palladium containing up to 20% palladium by weight of the alloy has given very satisfactory results for perchlorate production.
- platinum group metal(s) with one or more non-platinum group metals, for example an alloy or an intermetallic compound with one of the valve metals titanium, zirconium, hafnium, vanadium, niobium and tantalum, or with another transition metal, for example a metal such as tungsten, manganese or cobalt.
- non-platinum group metals for example an alloy or an intermetallic compound with one of the valve metals titanium, zirconium, hafnium, vanadium, niobium and tantalum, or with another transition metal, for example a metal such as tungsten, manganese or cobalt.
- the substrate may consist of any of the aforementioned valve metals or alloys thereof, porous sintered titanium being preferred.
- porous sintered titanium being preferred.
- other electrically-conductive and corrosion-resistant substrates may be used, such as expanded graphite.
- platinum group metal(s) and tin dioxide with possible additional dopants may be co-deposited chemically from solutions of appropriate salts which are painLed, sprayed of otherwise applied on the substrate and then subjected to heat treatment, this process being repeated until a sufficiently thick layer has been built up.
- thin layers of different components can be built up in such a way that the components are effectively mixed and dispersed in one another throughout the coating, possibly with diffusion between the layers, in contrast to the known prior art coatings such as that of U. S. Patent Specification 3,882,002, in which the tin dioxide was applied as a separate intermediate layer covered by a platinum group metal.
- alternate layers it is possible to deposit thin layers of platinum galvanically, which is advantageous, because galvanically-deposited platinum has a lower oxygen evolution potential than chemi-deposited platinum.
- the platinum-group metal or alloy/tin dioxide layer may be applied directly to the substrate, or to an intermediate layer, e.g. of co-deposited tin and antimony oxides or tin and bismuth oxides, or to intermediate layers consisting of one or more platinum group metals or their oxides, mixtures or mixed crystals of platinum group metals and valve metal oxides, intermetallics of platinum group metals and non-platinum group metals, and so forth.
- an intermediate layer e.g. of co-deposited tin and antimony oxides or tin and bismuth oxides
- intermediate layers consisting of one or more platinum group metals or their oxides, mixtures or mixed crystals of platinum group metals and valve metal oxides, intermetallics of platinum group metals and non-platinum group metals, and so forth.
- the coating comprises 40 to 85 parts by weight of platinum, 0 to 20 parts by weight of palladium and 15 to 40 parts by weight (as Sn metal) of tin dioxide on a titanium, tantalum or titanium-tantalum alloy substrate.
- This embodiment of an electrode of the invention when used as anode for perchlorate or persulphate production, has been found to have selective properties favouring the persalt production while hindering oxygen evolution.
- the platinum metal acts as a catalyst for persalt production.
- the tin dioxide acts as an oxygen evolution inhibitor by blocking peroxide decomposition, which can be regarded as the intermediate step of the unwanted oxygen evolution reaction.
- the palladium acts as a diluent for the relatively more expensive platinum, without adversely affecting the oxygen inhibition effect of the tin dioxide.
- Another aspect of the Invention is a process for the production of chlorates, perchlorates and other percompounds, e.g. persulphates, which is characterised by using as anode an electrode according to the invention, as defined above.
- Titanium coupons measuring 10 x 10 x 1 mm were sandblasted and etched in 20% hydrochloric acid and were thoroughly washed in water. The coupons were then coated with an aqueous solution of chlorides of platinum and tin in different weight ratios, dried at 95° to 100 C and then heated at 450°C for 15 minutes in an oven with forced air ventilation. The procedure was. repeated five times and the coupons were given a final heat treatment at 450°C for 60 minutes.
- the coatings-so produced contained Sn0 2 and platinum metal dispersed in one another.
- the coated coupons were tested as anodes for the production of sodium perchlorate by the electrolysis of a solution consisting of 100g/1 NaC10 3 , 400g/l NaClO 4 and 5g/l Na 2 Cr0 4 at 30°C using a stainless steel cathode and a current density of 2KA/m 2 .
- Sodium chlorate was supplied and sodium perchlorate removed to maintain the concentrations in the electrolyte at a steady state.
- the faraday efficiency of the oxygen evolution reaction i.e. the unwanted side reaction in perchlorate production
- Titanium coupons were coated as in Example I, but using various coating solutions containing platinum, palladium and tin chlorides, to produce mixed Pt-Pd-Sn02 coatings having compositions as follows:
- Example I and II were tested at different current densities, and it was found that the oxygen evolution faraday efficiency decreased with increasing current density up to about 2 KA/m 2 , then remained stable above 2 KA/ m 2 .
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
Abstract
Description
- The invention relates to electrodes for use in electrolytic processes, of the type comprising an electrically-conductive and corrosion-resistant substrate having an electrocatalytically-active surface coating, and to electrolytic processes using such electrodes, especially (but not exclusively) as anodes for the production of chlorates, perchlorates and other persalts and percompounds including organic peroxyacids.
- For the production of perchlorate, various anode materials have been used commercially, including smooth massive platinum, platinized titanium or tantalum (despite a tendency to produce excess oxygen) and lead dioxide coated on titanium or graphite, although these lead dioxide anodes have a high overvoltage and wear rapidly.
- Some proposals have already been made to combine platinum group metals and tin dioxide in electrode coating materials. For example, U.S. Patent Specification 3,701,724 mentioned an anode for chlorine production having a coating consisting essentially of a minor amount of a platinum group metal and/or platinum group metal oxides with a major amount of Sn02, Sb205, Sb203 or Ge°2 and mixtures thereof. However, the claims and examples of this patent are directed solely to such coatings containing platinum group metal oxides and there is no enabling disclosure of a coating containing a platinum group metal. Also, U.S. Patent Specification 3,882,002 proposed an anode for chlorine production having a valve metal substrate coated with an intermediate layer of tin dioxide which was covered with an outer layer of a platinum group metal or oxide thereof. Neither of these proposals was directed to improving electrolytic performance in the production of percompounds.
- An object of the invention therefore is to provide an improved electrode suitable for use as an anode for the production of perchlorates and other persalts, but which may also be used in other applications, such as chlorate production.
- According to a main aspect of the invention, an electrode comprises an electrically-conductive corrosion-resistant substrate having an electrocatalytic coating and is characterized in that the coating contains a mixture of at least one platinum group metal and tin dioxide dispersed in one another throughout the coating in the ratio of 8.5:1 to 3:2 by weight of the platinum group metals to the tin (as metal) of the tin dioxide.
- The platinum group metal/tin dioxide coating may also contain a stabilizer/binder, for example a compound such as titanium dioxide, zirconium dioxide or silicon dioxide. Additionally, the coating may include a filler, e.g. particles or fibres of an inert material, such as silica or alumina, particles of titanium, or zirconium silicate. Furthermore, the coating may also contain, e.g. as a dopant the tin dioxide in a quantity up to about 30% by weight (as metal) of the tin dioxide, of at least one additional metal or oxide of zinc, cadmium, arsenic, antimony, bismuth, selenium and tellurium. Such stabilizers or binders, fillers and dopants generally do not account for more than 70% of the total weight of the coating, usually far less. In the case of antimony trioxide or bismuth trioxide as dopant, the preferred amount corresponds to a ratio expressed as parts by weight of Sb/Bi:Sn (as metal) of at most about 1:4 to about 1:10 or even as low as 1:100.
- The platinum group metals are ruthenium, rhodium, palladium, osmium, iridium and platinum. Platinum is the preferred platinum group metal in the coating, when a single metal is present, especially in anodes for perchlorate production. However, it is understood that alloys such as platinum-iridium and platinum-rhodium, also are useful for other applications. An alloy of platinum-palladium containing up to 20% palladium by weight of the alloy has given very satisfactory results for perchlorate production. Also, in some instances, it may be advantageous to alloy the platinum group metal(s) with one or more non-platinum group metals, for example an alloy or an intermetallic compound with one of the valve metals titanium, zirconium, hafnium, vanadium, niobium and tantalum, or with another transition metal, for example a metal such as tungsten, manganese or cobalt.
- The substrate may consist of any of the aforementioned valve metals or alloys thereof, porous sintered titanium being preferred. However, other electrically-conductive and corrosion-resistant substrates may be used, such as expanded graphite.
- The platinum group metal(s) and tin dioxide with possible additional dopants, such as antimony trioxide or bismuth trioxide, may be co-deposited chemically from solutions of appropriate salts which are painLed, sprayed of otherwise applied on the substrate and then subjected to heat treatment, this process being repeated until a sufficiently thick layer has been built up.
- Alternatively, thin layers of different components (e.g. alternate platinum or Pt/Pd alloy layers and layers of pure or doped tin dioxide) can be built up in such a way that the components are effectively mixed and dispersed in one another throughout the coating, possibly with diffusion between the layers, in contrast to the known prior art coatings such as that of U. S. Patent Specification 3,882,002, in which the tin dioxide was applied as a separate intermediate layer covered by a platinum group metal. Using this procedure of applying alternate layers, it is possible to deposit thin layers of platinum galvanically, which is advantageous, because galvanically-deposited platinum has a lower oxygen evolution potential than chemi-deposited platinum.
- The platinum-group metal or alloy/tin dioxide layer may be applied directly to the substrate, or to an intermediate layer, e.g. of co-deposited tin and antimony oxides or tin and bismuth oxides, or to intermediate layers consisting of one or more platinum group metals or their oxides, mixtures or mixed crystals of platinum group metals and valve metal oxides, intermetallics of platinum group metals and non-platinum group metals, and so forth.
- In a preferred embodiment, the coating comprises 40 to 85 parts by weight of platinum, 0 to 20 parts by weight of palladium and 15 to 40 parts by weight (as Sn metal) of tin dioxide on a titanium, tantalum or titanium-tantalum alloy substrate. This embodiment of an electrode of the invention, when used as anode for perchlorate or persulphate production, has been found to have selective properties favouring the persalt production while hindering oxygen evolution. The platinum metal acts as a catalyst for persalt production. The tin dioxide acts as an oxygen evolution inhibitor by blocking peroxide decomposition, which can be regarded as the intermediate step of the unwanted oxygen evolution reaction. Finally, the palladium acts as a diluent for the relatively more expensive platinum, without adversely affecting the oxygen inhibition effect of the tin dioxide.
- Another aspect of the Invention is a process for the production of chlorates, perchlorates and other percompounds, e.g. persulphates, which is characterised by using as anode an electrode according to the invention, as defined above.
- In the accompanying drawings:
- Fig. 1 shows a graph of the faraday efficiency of oxygen evolution as ordinate plotted against the tin content of the electrode coating as abscissa, the electrode being that described below in detail in Example I;
- Fig. 2 shows a graph of the faraday efficiency of oxygen evolution as ordinate plotted against the palladium content of the electrode coating as abscissa, the electrode being that described below in detail in Example II.
- The following Examples are given to illustrate the invention,
- Titanium coupons measuring 10 x 10 x 1 mm were sandblasted and etched in 20% hydrochloric acid and were thoroughly washed in water. The coupons were then coated with an aqueous solution of chlorides of platinum and tin in different weight ratios, dried at 95° to 100 C and then heated at 450°C for 15 minutes in an oven with forced air ventilation. The procedure was. repeated five times and the coupons were given a final heat treatment at 450°C for 60 minutes. The coatings-so produced contained Sn02 and platinum metal dispersed in one another.
- The coated coupons were tested as anodes for the production of sodium perchlorate by the electrolysis of a solution consisting of 100g/1 NaC103, 400g/l NaClO4 and 5g/l Na2Cr04 at 30°C using a stainless steel cathode and a current density of 2KA/m2. Sodium chlorate was supplied and sodium perchlorate removed to maintain the concentrations in the electrolyte at a steady state. The faraday efficiency of the oxygen evolution reaction (i.e. the unwanted side reaction in perchlorate production) was measured as a function of the percentage by weight of tin (as metal) in the mixed Pt-SnO2 coating. The results obtained are shown in Fig. 1, from which it can be seen that there is an optimum oxygen-inhibition effect for a tin content in the range of about 25%-35% of the total weight of tin and platinum metals, and a very appreciable inhibition of oxygen evolution for a tin content in the larger range from about 15% to about 40%.
-
- These coupons were tested as anodes for perchlorate production under the same conditions as used in Example I. The faraday efficiency of the unwanted oxygen evolution reaction was measured as a function of the palladium metal content, and the results are shown in Fig. 2. This graph shows that, for a palladium content up to 20%, the faraday efficiency remained low, i.e. the palladium did not adversely affect the performance of the coating to inhibit oxygen evolution. However, above the critical Pd content of 20%, the faraday efficiency abruptly increased, the stahility of the coating was lowered and some electrochemical corrosion took place.
- The coatings of Examples I and II were tested at different current densities, and it was found that the oxygen evolution faraday efficiency decreased with increasing current density up to about 2 KA/m2, then remained stable above 2 KA/m2.
Claims (6)
characterized in
that the coating contains a mixture of at least one platinum group metal and tin dioxide dispersed in one another throughout the coating in the ratio of from 8.5:1 to 3:2 by weight of the platinum group metal(s) to the tin of the tin dioxide.
characterized in
that the platinum group metal is platinum.
characterised in
that the coating comprises 40 to 85 parts by weight of platinum, 0 to 20 parts by weight of palladium and 15 to 40 parts by weight of tin.
that the coating also contains at least one additional metal or oxide of zinc, cadmium, arsenic, antimony, bismuth, selenium and tellerium in a quantity up to 30% by weight of the tin.
characterized in
that the coating contains one or more oxides of antimony and/or bismuth in an amount of at most 1 part by weight of Sb/Bi to 4 parts by weight of Sn.
characterized by
using as anode an electrode as claimed in any preceding claim.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB1205278 | 1978-03-28 | ||
GB1205278 | 1978-03-28 |
Publications (2)
Publication Number | Publication Date |
---|---|
EP0004880A1 true EP0004880A1 (en) | 1979-10-31 |
EP0004880B1 EP0004880B1 (en) | 1983-07-06 |
Family
ID=9997561
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP79100917A Expired EP0004880B1 (en) | 1978-03-28 | 1979-03-27 | Electrodes for electrolytic processes, especially perchlorate production |
EP79900338A Withdrawn EP0018970A1 (en) | 1978-03-28 | 1979-11-05 | Electrodes for electrolytic processes, especially perchlorate production |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP79900338A Withdrawn EP0018970A1 (en) | 1978-03-28 | 1979-11-05 | Electrodes for electrolytic processes, especially perchlorate production |
Country Status (5)
Country | Link |
---|---|
EP (2) | EP0004880B1 (en) |
CA (1) | CA1129809A (en) |
DE (1) | DE2965811D1 (en) |
FI (1) | FI66919C (en) |
WO (1) | WO1979000843A1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2436826A1 (en) * | 1978-09-22 | 1980-04-18 | Permelec Electrode Ltd | IMPROVED ELECTRODE FOR THE ELECTROLYSIS OF AQUEOUS METAL HALIDE SOLUTIONS |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1814576A1 (en) * | 1967-12-14 | 1970-11-26 | Oronzio De Nora Impianti | Electrode made of a metal for tubes with a semiconducting surface made of tube metal oxide |
-
1979
- 1979-03-26 FI FI791004A patent/FI66919C/en not_active IP Right Cessation
- 1979-03-27 CA CA324,281A patent/CA1129809A/en not_active Expired
- 1979-03-27 DE DE7979100917T patent/DE2965811D1/en not_active Expired
- 1979-03-27 WO PCT/EP1979/000022 patent/WO1979000843A1/en unknown
- 1979-03-27 EP EP79100917A patent/EP0004880B1/en not_active Expired
- 1979-11-05 EP EP79900338A patent/EP0018970A1/en not_active Withdrawn
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1814576A1 (en) * | 1967-12-14 | 1970-11-26 | Oronzio De Nora Impianti | Electrode made of a metal for tubes with a semiconducting surface made of tube metal oxide |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2436826A1 (en) * | 1978-09-22 | 1980-04-18 | Permelec Electrode Ltd | IMPROVED ELECTRODE FOR THE ELECTROLYSIS OF AQUEOUS METAL HALIDE SOLUTIONS |
Also Published As
Publication number | Publication date |
---|---|
FI66919B (en) | 1984-08-31 |
WO1979000843A1 (en) | 1979-11-01 |
EP0004880B1 (en) | 1983-07-06 |
DE2965811D1 (en) | 1983-08-11 |
EP0018970A1 (en) | 1980-11-26 |
FI791004A (en) | 1979-09-29 |
CA1129809A (en) | 1982-08-17 |
FI66919C (en) | 1984-12-10 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US3948751A (en) | Valve metal electrode with valve metal oxide semi-conductive face | |
US4003817A (en) | Valve metal electrode with valve metal oxide semi-conductive coating having a chlorine discharge in said coating | |
EP0004387B1 (en) | Electrodes for electrolytic processes | |
US4555317A (en) | Cathode for the electrolytic production of hydrogen and its use | |
US4484999A (en) | Electrolytic electrodes having high durability | |
HU215459B (en) | Cathode for generating hydrogen from alkaline solutions and process for preparing cathode | |
EP0083554B1 (en) | Electrocatalytic electrode | |
EP0715002B1 (en) | Stable coating solutions for preparing electrocatalytic mixed oxide coatings on metal substrates or metal-coated conductive substrates, and a method for the preparation of dimensionally stable anodes using such solutions | |
US3917518A (en) | Hypochlorite production | |
US4446245A (en) | Recoating of electrodes | |
JPS622038B2 (en) | ||
EP0004386B1 (en) | Electrodes for electrolytic processes, especially metal electrowinning | |
JP2000110000A (en) | Oxygen generating anode for electrolytic process | |
US4267025A (en) | Electrodes for electrolytic processes, especially perchlorate production | |
US4072585A (en) | Valve metal electrode with valve metal oxide semi-conductive coating having a chlorine discharge catalyst in said coating | |
US4313814A (en) | Electrode for electrolysis and manufacture thereof | |
EP0004880A1 (en) | Electrodes for electrolytic processes, especially perchlorate production | |
Narasimham et al. | Lead dioxide anode in the preparation of perchlorates | |
GB1573173A (en) | Electrode manufacture | |
JP3236653B2 (en) | Electrode for electrolysis | |
Krstajić et al. | A selective catalyst for titanium anodes | |
Bagri | Evaluation of Coated Titanium Anodes | |
JPH0578879A (en) | Metallic anode for electrolytic acid solution containing fluoride or fluoroaniline complex |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
AK | Designated contracting states |
Designated state(s): BE CH DE FR GB IT NL SE |
|
17P | Request for examination filed | ||
ITF | It: translation for a ep patent filed | ||
RAP1 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: DIAMOND SHAMROCK TECHNOLOGIES S.A. |
|
GRAA | (expected) grant |
Free format text: ORIGINAL CODE: 0009210 |
|
AK | Designated contracting states |
Designated state(s): BE CH DE FR GB IT NL SE |
|
REF | Corresponds to: |
Ref document number: 2965811 Country of ref document: DE Date of ref document: 19830811 |
|
ET | Fr: translation filed | ||
PLBE | No opposition filed within time limit |
Free format text: ORIGINAL CODE: 0009261 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT |
|
26N | No opposition filed | ||
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: DE Payment date: 19890210 Year of fee payment: 11 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: NL Payment date: 19890331 Year of fee payment: 11 |
|
REG | Reference to a national code |
Ref country code: CH Ref legal event code: PUE Owner name: PERMELEC S.A. |
|
ITTA | It: last paid annual fee | ||
REG | Reference to a national code |
Ref country code: FR Ref legal event code: TP |
|
NLS | Nl: assignments of ep-patents |
Owner name: DE NORA PERMELEC S.P.A. TE MILAAN, ITALIE. |
|
NLT1 | Nl: modifications of names registered in virtue of documents presented to the patent office pursuant to art. 16 a, paragraph 1 |
Owner name: DST SA TE CAROUGE, ZWITSERLAND. |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: NL Effective date: 19901001 |
|
REG | Reference to a national code |
Ref country code: GB Ref legal event code: 732 |
|
NLV4 | Nl: lapsed or anulled due to non-payment of the annual fee | ||
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: DE Effective date: 19901201 |
|
EAL | Se: european patent in force in sweden |
Ref document number: 79100917.8 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: SE Payment date: 19960315 Year of fee payment: 18 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: SE Effective date: 19970328 |
|
EUG | Se: european patent has lapsed |
Ref document number: 79100917.8 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: FR Payment date: 19980312 Year of fee payment: 20 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: GB Payment date: 19980318 Year of fee payment: 20 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: BE Payment date: 19980402 Year of fee payment: 20 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: CH Payment date: 19980406 Year of fee payment: 20 |
|
BE20 | Be: patent expired |
Free format text: 19990327 *DE NORA S.P.A. |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: GB Free format text: LAPSE BECAUSE OF EXPIRATION OF PROTECTION Effective date: 19990326 Ref country code: CH Free format text: LAPSE BECAUSE OF EXPIRATION OF PROTECTION Effective date: 19990326 |
|
REG | Reference to a national code |
Ref country code: GB Ref legal event code: PE20 Effective date: 19990326 |
|
REG | Reference to a national code |
Ref country code: CH Ref legal event code: PL |