DZ3047A1 - Sel mutuel d'amlopidine et d'atorvastatine, procédé pour sa préparation et compositions pharmaceutiques les contenant. - Google Patents

Sel mutuel d'amlopidine et d'atorvastatine, procédé pour sa préparation et compositions pharmaceutiques les contenant.

Info

Publication number
DZ3047A1
DZ3047A1 DZ000091A DZ000091A DZ3047A1 DZ 3047 A1 DZ3047 A1 DZ 3047A1 DZ 000091 A DZ000091 A DZ 000091A DZ 000091 A DZ000091 A DZ 000091A DZ 3047 A1 DZ3047 A1 DZ 3047A1
Authority
DZ
Algeria
Prior art keywords
amlopidine
atorvastatin
preparation
pharmaceutical compositions
compositions containing
Prior art date
Application number
DZ000091A
Other languages
English (en)
Inventor
George Chang
Ernest Seiichi Hamanaka
Original Assignee
Pfizer Prod Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Pfizer Prod Inc filed Critical Pfizer Prod Inc
Application granted granted Critical
Publication of DZ3047A1 publication Critical patent/DZ3047A1/fr

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0057—Reactive sputtering using reactive gases other than O2, H2O, N2, NH3 or CH4
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0694—Halides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
DZ000091A 1999-05-27 2000-05-24 Sel mutuel d'amlopidine et d'atorvastatine, procédé pour sa préparation et compositions pharmaceutiques les contenant. DZ3047A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US13629699P 1999-05-27 1999-05-27

Publications (1)

Publication Number Publication Date
DZ3047A1 true DZ3047A1 (fr) 2004-03-27

Family

ID=37744308

Family Applications (1)

Application Number Title Priority Date Filing Date
DZ000091A DZ3047A1 (fr) 1999-05-27 2000-05-24 Sel mutuel d'amlopidine et d'atorvastatine, procédé pour sa préparation et compositions pharmaceutiques les contenant.

Country Status (2)

Country Link
US (1) US6315873B1 (fr)
DZ (1) DZ3047A1 (fr)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ITRM20010060A1 (it) * 2001-02-06 2001-05-07 Carlo Misiano Perfezionamento di un metodo e apparato per la deposizione di film sottili, soprattutto in condizioni reattive.
US6946408B2 (en) * 2001-10-24 2005-09-20 Applied Materials, Inc. Method and apparatus for depositing dielectric films
US20040006249A1 (en) * 2002-07-08 2004-01-08 Showa Denko K.K., Nikon Corporation Fluorination treatment apparatus, process for producing fluorination treated substance, and fluorination treated substance
EP1380855A3 (fr) * 2002-07-08 2005-06-08 Showa Denko K.K. Dispositif et procédé pour le traitement des substrats par fluorination
JP4201259B2 (ja) * 2002-08-22 2008-12-24 日東電工株式会社 被膜シートの製造方法
JP2005054220A (ja) * 2003-08-01 2005-03-03 Canon Inc フッ化物薄膜の形成方法及びその形成装置
DE102004004844B4 (de) * 2004-01-30 2009-04-09 Interpane Entwicklungs- Und Beratungsgesellschaft Mbh & Co Kg Vorrichtung zum Beschichten eines Substrats mit einer Absorberanordnung
KR20120023725A (ko) * 2009-11-17 2012-03-13 제이엑스 닛코 닛세키 킨조쿠 가부시키가이샤 란탄 산화물 타겟의 보관 방법 및 진공 밀봉한 란탄 산화물 타겟

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5698475A (en) * 1980-01-08 1981-08-07 Toshiba Corp Forming method for thin film of fluoro-resin
US4992839A (en) * 1987-03-23 1991-02-12 Canon Kabushiki Kaisha Field effect thin film transistor having a semiconductor layer formed from a polycrystal silicon film containing hydrogen atom and halogen atom and process for the preparation of the same
JPH02289495A (ja) * 1989-04-28 1990-11-29 Matsushita Electric Ind Co Ltd 多結晶シリコンの製法

Also Published As

Publication number Publication date
US6315873B1 (en) 2001-11-13

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